CN108828908B - 一种显影液处理装置 - Google Patents
一种显影液处理装置 Download PDFInfo
- Publication number
- CN108828908B CN108828908B CN201810679597.5A CN201810679597A CN108828908B CN 108828908 B CN108828908 B CN 108828908B CN 201810679597 A CN201810679597 A CN 201810679597A CN 108828908 B CN108828908 B CN 108828908B
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- developing solution
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- liquid cavity
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- 238000010129 solution processing Methods 0.000 title claims abstract description 12
- 239000007788 liquid Substances 0.000 claims abstract description 61
- 239000007921 spray Substances 0.000 claims abstract description 31
- 238000000034 method Methods 0.000 claims abstract description 7
- 238000011084 recovery Methods 0.000 claims abstract description 4
- 238000001914 filtration Methods 0.000 claims description 6
- 239000012535 impurity Substances 0.000 claims description 3
- 238000000206 photolithography Methods 0.000 claims description 2
- 238000001259 photo etching Methods 0.000 abstract description 4
- 239000000243 solution Substances 0.000 description 35
- 238000005507 spraying Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
Abstract
Description
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201810679597.5A CN108828908B (zh) | 2018-06-27 | 2018-06-27 | 一种显影液处理装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201810679597.5A CN108828908B (zh) | 2018-06-27 | 2018-06-27 | 一种显影液处理装置 |
Publications (2)
Publication Number | Publication Date |
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CN108828908A CN108828908A (zh) | 2018-11-16 |
CN108828908B true CN108828908B (zh) | 2021-11-19 |
Family
ID=64139251
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201810679597.5A Active CN108828908B (zh) | 2018-06-27 | 2018-06-27 | 一种显影液处理装置 |
Country Status (1)
Country | Link |
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CN (1) | CN108828908B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110012604A (zh) * | 2019-04-01 | 2019-07-12 | 上达电子(深圳)股份有限公司 | 一种用于cof湿制程的液浮喷盘 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003103030A1 (fr) * | 2002-06-04 | 2003-12-11 | Tokyo Electron Limited | Dispositif et procede de traitement de substrat, et injecteur y relatif |
CN103116251A (zh) * | 2013-01-18 | 2013-05-22 | 清华大学深圳研究生院 | 抗变形排孔显影喷嘴及其制备方法 |
CN104345580A (zh) * | 2013-08-05 | 2015-02-11 | 东京毅力科创株式会社 | 显影方法和显影装置 |
CN105045049A (zh) * | 2015-07-31 | 2015-11-11 | 清华大学深圳研究生院 | 一种具有排气通道的显影喷嘴 |
CN105404102A (zh) * | 2014-09-04 | 2016-03-16 | 东京毅力科创株式会社 | 显影方法和显影装置 |
CN105487353A (zh) * | 2014-10-13 | 2016-04-13 | 沈阳芯源微电子设备有限公司 | 一种液体涂布装置 |
-
2018
- 2018-06-27 CN CN201810679597.5A patent/CN108828908B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003103030A1 (fr) * | 2002-06-04 | 2003-12-11 | Tokyo Electron Limited | Dispositif et procede de traitement de substrat, et injecteur y relatif |
CN103116251A (zh) * | 2013-01-18 | 2013-05-22 | 清华大学深圳研究生院 | 抗变形排孔显影喷嘴及其制备方法 |
CN104345580A (zh) * | 2013-08-05 | 2015-02-11 | 东京毅力科创株式会社 | 显影方法和显影装置 |
CN105404102A (zh) * | 2014-09-04 | 2016-03-16 | 东京毅力科创株式会社 | 显影方法和显影装置 |
CN105487353A (zh) * | 2014-10-13 | 2016-04-13 | 沈阳芯源微电子设备有限公司 | 一种液体涂布装置 |
CN105045049A (zh) * | 2015-07-31 | 2015-11-11 | 清华大学深圳研究生院 | 一种具有排气通道的显影喷嘴 |
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Publication number | Publication date |
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CN108828908A (zh) | 2018-11-16 |
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SE01 | Entry into force of request for substantive examination | ||
CB03 | Change of inventor or designer information |
Inventor after: He Yan Inventor after: Sun Derui Inventor after: Liu Dan Inventor before: Sun Derui Inventor before: Liu Dan |
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CB03 | Change of inventor or designer information | ||
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20211103 Address after: 201703 room 4014, science and technology incubation service center, 1155 Gongyuan East Road, Qingpu District, Shanghai Applicant after: Shanghai Demai Shiou Chemical Co.,Ltd. Address before: 250000 1-905-42a Ginza Digital Plaza, 43 Jiefang Road, Lixia District, Jinan City, Shandong Province Applicant before: SHANDONG AOTIAN ENVIRONMENTAL PROTECTION TECHNOLOGY CO.,LTD. |
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder |
Address after: 201703 room 4014, science and technology incubation service center, 1155 Gongyuan East Road, Qingpu District, Shanghai Patentee after: Shanghai Demai Shiou Technology Co.,Ltd. Address before: 201703 room 4014, science and technology incubation service center, 1155 Gongyuan East Road, Qingpu District, Shanghai Patentee before: Shanghai Demai Shiou Chemical Co.,Ltd. |
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CP01 | Change in the name or title of a patent holder | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A Developing Solution Processing Device Effective date of registration: 20230817 Granted publication date: 20211119 Pledgee: Societe Generale Bank Co.,Ltd. Qingpu Branch of Shanghai Pledgor: Shanghai Demai Shiou Technology Co.,Ltd. Registration number: Y2023310000479 |
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PE01 | Entry into force of the registration of the contract for pledge of patent right |