CN108620371A - Substrate cleaning method and cleaning equipment - Google Patents
Substrate cleaning method and cleaning equipment Download PDFInfo
- Publication number
- CN108620371A CN108620371A CN201710418550.9A CN201710418550A CN108620371A CN 108620371 A CN108620371 A CN 108620371A CN 201710418550 A CN201710418550 A CN 201710418550A CN 108620371 A CN108620371 A CN 108620371A
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- CN
- China
- Prior art keywords
- substrate
- roller group
- chamber
- cleaning
- moving
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 125
- 238000004140 cleaning Methods 0.000 title claims abstract description 88
- 238000000034 method Methods 0.000 title claims abstract description 42
- 239000007788 liquid Substances 0.000 claims abstract description 24
- 239000007921 spray Substances 0.000 claims abstract description 15
- 230000033001 locomotion Effects 0.000 claims description 36
- 238000005507 spraying Methods 0.000 abstract description 2
- 230000008569 process Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
Abstract
The invention discloses a cleaning device which comprises a first chamber, a moving element, a roller group, a bearing element and a spray pipe element. The moving element is located within the first chamber. The roller group is accommodated in the first chamber, the bearing element is positioned in the first chamber, and the bearing element is used for bearing the substrate conveyed by the moving element. The nozzle element is positioned in the first chamber and below the bearing element, and the nozzle element is used for spraying liquid towards the lower surface of the substrate in the hollow part of the bearing element. In addition, a substrate cleaning method is also provided.
Description
Technical field
The invention relates to a kind of manufacturing method thereof and process apparatus, and in particular to a kind of substrate-cleaning method with
Cleaning equipment.
Background technology
During the manufacture of Modern high-tech industry, substrate is by such as cleaning, etching, coating, develop, drying is more
Procedure manufactures, and is equipped with conveying device in each manufacturing process, can so be delivered the substrate to by conveying device
The position of each road manufacturing process, and carry out related process processing.
Before processing procedure substrate, the action of cleaning base plate need to be first passed through, in response to needed for processing procedure, it is necessary to prevent certain of substrate
The processing procedure face of processing procedure (be used for) is cleaned on one side, thus can only cleaning base plate another side (non-processing procedure face), in right current mechanism
For the opposing sides of cleaning base plate.
Therefore, how to reach the single surface of above-mentioned cleaning base plate, be the important topic of current industry.
Invention content
In order to solve the above-mentioned technical problem, a purpose of the invention is, can reach the single surface of cleaning base plate.
The present invention provides a kind of substrate-cleaning method, which is suitable for a cleaning equipment, the cleaning equipment
Including a roller group, at least a jet pipe element, at least a moving element and a bearer element, the roller group is in a transfer position
One substrate of upper conveying, the transfer position are to be somebody's turn to do on a first position of the shift motion that the roller group is located at the moving element
Outflow location be the roller group leave the shift motion, the moving element along the shift motion by the substrate in the first position,
Moved between one second position and a third place, the second position be higher than the first position, the third place less than this first
Position, which is set to the third place, and the bearer element has a hollow-out parts, which includes following
Step：
By the moving element by the substrate along the shift motion by moving to the second position on the first position；
The roller group is moved to the outflow location by the transfer position；
By the moving element, by the substrate, along the shift motion, by the second position is displaced downwardly in the third place, this holds
Connect element；And
A lower surface of the jet pipe element towards the substrate in the hollow-out parts of the bearer element sprays liquid.
Wherein, it carries out the jet pipe element and sprays liquid towards substrate lower surface in the hollow-out parts of the bearer element
It is further comprising the steps of after step：
By the moving element by the substrate along the shift motion by moving to the second position in the third place；
The roller group is moved to the transfer position by the outflow location；And
The substrate is displaced downwardly to the first position by the second position along the shift motion by the moving element, makes the substrate position
In in the roller group.
Wherein, further comprising the steps of after carrying out the step of roller group is moved to the outflow location by the transfer position：
Clean the roller group.
Wherein, it carries out the jet pipe element and sprays liquid towards the lower surface of the substrate in the hollow-out parts of the bearer element
The step of before, it is further comprising the steps of：
One lid covers a upper surface of the substrate.
Wherein, it carries out the jet pipe element and sprays liquid towards the lower surface of the substrate in the hollow-out parts of the bearer element
The step of after, it is further comprising the steps of：
The lid is detached from the upper surface of the substrate.
Wherein, further comprising the steps of after carrying out the step of lid covers the upper surface of the substrate：
In in the lid towards the upper surface of the substrate provide an air-flow.
Wherein, carry out by the moving element by the substrate along the shift motion by moved on the first position this second
It is further comprising the steps of before position：
The substrate is moved to the first position by the roller group.
The present invention also provides a kind of cleaning equipments, including：
One first chamber；
One moving element is located in the first chamber, and the moving element is along a shift motion by the substrate in a first position, one
Moved between the second position and a third place, the wherein second position is higher than the first position, the third place less than this
One position；
One roller group is placed in the first chamber, which is with a transfer position and an outflow location, the transfer position
The roller group is located on the first position of the shift motion, which is that the roller group leaves the shift motion；
One bearer element is located in the first chamber, and the bearer element is set to the third place, which has one to engrave
Empty portion, the bearer element is accepting the substrate that the moving element is transmitted；And
An at least jet pipe element, be located at the first chamber in, and this at least a jet pipe element is located under the bearer element, the spray
Tube elements spray liquid to a lower surface of the substrate in the hollow-out parts towards the bearer element.
Wherein, above-mentioned cleaning equipment further includes：
One cleaning element, is located in the first chamber, and the cleaning element is cleaning the roller group.
Wherein, above-mentioned cleaning equipment further includes：
One lid, is located in the first chamber, and the lid is covering a upper surface of the substrate；
Wherein, above-mentioned cleaning equipment further includes：
One airflow member, be located at the lid in, the airflow member in the lid towards the upper surface of the substrate provide an air-flow.
Wherein, above-mentioned cleaning equipment further includes：
One second chamber is accepted and cleans the substrate conveyed from the first chamber；And
One third chamber, accepts the substrate that is conveyed from the second chamber, and the third chamber is providing an air-flow to blow
Do the substrate.
Based on above-mentioned, in the substrate-cleaning method and cleaning equipment of the present invention, by moving element by substrate by idler wheel
Group is moved to bearer element so that the lower surface of substrate is exposed to the hollow-out parts of bearer element.Under configured in this way, jet pipe element
The liquid sprayed is sprayed to the lower surface of substrate after the hollow-out parts of bearer element, to reach the single table of cleaning base plate
The purpose in face.
Description of the drawings
Fig. 1 is the schematic diagram of the cleaning equipment of the present invention.
Fig. 2 is the flow chart of the substrate-cleaning method of the present invention.
Fig. 3 to Figure 11 is the flow diagram of the cleaning equipment corresponding diagram 2 of the present invention.
Figure 12 is the flow chart of one embodiment of Fig. 2 substrate-cleaning methods.
Figure 13 is the flow chart of one embodiment of Fig. 2 substrate-cleaning methods.
Reference numeral：
50 substrates；
52 upper surfaces；
54 lower surfaces；
100 cleaning equipments；
110 first chambers；
120 roller groups；
122 actuated elements；
124 idler wheels；
130 transfer elements；
132 connectors；
134 slides；
136 sliding rails；
140 moving elements；
142 ejector pins；
144 gears are arranged；
146 gears；
150 bearer elements；
152 hollow-out parts；
154 bearing and leaning portions；
160 jet pipe elements；
162 nozzles；
170 cleaning elements；
172 nozzles；
180 lids；
182 moving members；
190 airflow members；
192 nozzles；
112 second chambers；
112A roller groups；
114 third chambers；
114A roller groups；
G1 cleaning solutions；
G2 liquid；
G3 air-flows；
L1 shift motions；
P1 transfer positions；
P2 outflow locations；
The first positions P3；
The second positions P4；
P5 the third places；
S10 substrate-cleaning methods；
S110 ~ S220 steps.
Specific implementation mode
Below in conjunction with drawings and examples, the specific implementation mode of the present invention is further described.Following embodiment is only
For clearly illustrating technical scheme of the present invention, and cannot be limited the scope of the invention with this.
Fig. 1 is the schematic diagram of the cleaning equipment of the present invention.Referring to Fig. 1, the cleaning equipment 100 of the present embodiment includes one the
One chamber 110, a roller group 120, one transfer element 130, a moving element 140, a bearer element 150, at least jet pipe member
Part 160 (Fig. 1 is painted a jet pipe element 160), 190 (figure of a cleaning element 170, a lid 180 and an at least airflow member
1 is painted an airflow member 190).
Roller group 120 is placed in first chamber 110.Specifically, roller group 120 includes an actuated element 122 and more
A idler wheel 124, multiple idler wheels 124 are connected to actuated element 122, and actuated element 122 is to drive idler wheel 124 to rotate, by rolling
124 rotation of wheel is to achieve the purpose that transmit substrate.In the present embodiment, actuated element 122 is, for example, the combination of gear and motor,
So the present invention limits not to this.
Transfer element 130 is located in first chamber 110, and transfers the outer side edges that element 130 is located at roller group 120.Specifically
For, transfer element 130 includes a connection piece 132, a slide 134 and a sliding rail 136, and wherein connector 132 is connected to rolling
Wheel group 120, connector 132 are connected to slide 134, and slide 134 is slidably connected to sliding rail 136.In the present embodiment, it transfers
Element 130 is coupled to a dynamical element (not being painted), and dynamical element is, for example, a cylinder, can make whereby using cylinder as power
Slide 134 moves on sliding rail 136.
Moving element 140 is located in first chamber 110, and moving element 140 is located at the lower section of roller group 120.Mobile member
Part 140 has a shift motion L1.Specifically, moving element 140 include 142, one gear of an ejector pin (pin) row 144 and
Multiple gears 146, multiple gears 146 are connected to gear row 144, and ejector pin 142 is coupled to multiple gears 146, thus, by
The mutual start of gear 146 and gear row 144, to drive ejector pin 142 that can be moved along shift motion L1.
Bearer element 150 is located in first chamber 110, and bearer element 150 is located under roller group 120.In the present embodiment
In, bearer element 150 is, for example, an accommodating groove body.It is a hole that bearer element 150, which has a hollow-out parts 152, hollow-out parts 152,
The present embodiment is to form hollow-out parts 152 in 150 bottom opening of bearer element.150 top surface of bearer element, two side-line is held equipped with one
Relying part 154.The bearing and leaning portion 154 of bearer element 150 is accepting the substrate that moving element 140 is conveyed.
Jet pipe element 160 is located in first chamber 110, and jet pipe element 160 is located under bearer element 150, that is, accepts
Element 150 is between roller group 120 and jet pipe element 160.Jet pipe element 160 is equipped with nozzle 162, and nozzle 162 holds to court
It connects and sprays a liquid in the hollow-out parts 152 of element 150.It should be noted that the liquid flow sprayed in order to avoid jet pipe element 160
Enter to moving element 140, jet pipe element 160 can be separately positioned on different zones in first chamber with moving element 140 and (do not painted
Show), jet pipe element 160 and moving element 140 is isolated, achieve the purpose that separating dry space from moist space whereby.Cleaning element 170 is located at first
In chamber 110, and cleaning element 170 is located under transfer element 130, and the nozzle 172 of cleaning element 170 is providing a cleaning
Liquid, to clean roller group 120.
Lid 180 is located in first chamber 110, and lid 180 is located on roller group 120.Lid 180 includes a moving member
182, moving member 182 is set to first chamber 110.When substrate is delivered to bearer element 150 by moving element 140, moving member 182
Lid 180 is moved along stroke L1 movements, to achieve the purpose that lid 180 covers in the upper surface of substrate.Air-flow member
Part 190 is located in lid 180, and when lid 180 covers in the upper surface of substrate, the nozzle 192 of airflow member 190 is providing
One air-flow is to the upper surface of substrate.
Fig. 2 is the flow chart of the substrate-cleaning method of the present invention.Fig. 3 to Figure 11 is the cleaning equipment corresponding diagram 2 of the present invention
Flow diagram.It should be noted that Fig. 3 to Figure 10 is similar to Fig. 1, wherein identical element is indicated and had with identical label
There is identical effect without repeating explanation.And Figure 11 then illustrates to draw out other chambers in cleaning equipment 100.Please referring initially to figure
2.The substrate-cleaning method S10 of the present embodiment is suitable for cleaning equipment 100 as shown in Figure 1.Substrate-cleaning method S10 include with
Lower step S110 to step S220.
Step S110 is carried out, substrate 50 is moved to first position P3 by roller group 120.As shown in figure 3, roller group
In conveying substrate 50 on a transfer position P1, first position P3 is delivered to by multiple idler wheels 124 by 120 for substrate 50, wherein
On the first position P3 for the shift motion L1 that transfer position P1 is located at moving element 140 for roller group 120, and bearer element 150
It is less than first position P3 set on the third place P5, the third place P5.
Referring back to Fig. 2, step S120 is carried out, substrate 50 is moved along into stroke L1 by first by moving element 140
Second position P4 is moved on the P3 of position.As shown in figure 4, by the mutual start of gear 146 and gear row 144, to drive ejector pin
142 can contact along shift motion L1 to substrate 50, then ejector pin 142 continue up with by substrate 50 by being moved on the P3 of first position
Second position P4, wherein second position P4 are higher than first position P3.
Referring back to Fig. 2, step S130 is carried out, roller group 120 is moved to outflow location P2 by transfer position P1, wherein moving
Out position P2 is that roller group 120 leaves shift motion L1.As shown in figure 5, the slide 134 in transfer element 130 is on sliding rail 136
Mobile, the left and right sides that connector 132 drives the idler wheel 124 that part connected piece 132 connects towards shift motion L1 move, with
Detach roller group 120.It should be noted that when the idler wheel 124 of this part connected piece 132 connection detaches, it is connect with idler wheel 124
Actuated element 122 (such as gear and motor) also and then detaches.
Please refer to Fig.1 the flow chart that 2, Figure 12 is one embodiment of Fig. 2 substrate-cleaning methods.Roller group 120 is carried out by conveying
After position P1 is moved to the step S130 of outflow location P2, step S132 is then carried out, cleans roller group 120.As shown in fig. 6,
The nozzle 172 of cleaning element 170 sprays a cleaning solution G1 towards the idler wheel 124 in roller group 120, to clean idler wheel 124.In this way,
The idler wheel 124 in roller group 120 can be also polluteed in transmission process due to contaminated substrate 50, is come by step S132 clear
Roller group 120 is washed, therefore, when being moved back into again to roller group 120 after substrate 50 is cleaned, the substrate 50 after cleaning will not be by idler wheel
Group 120 pollutes again, so lifting the effect that can ensure that cleaning base plate.
Referring back to Fig. 2, step S140 is carried out, substrate 50 is moved along into stroke L1 by second by moving element 140
Position P4 is displaced downwardly to the bearer element 150 in the third place P5, and in other words, the present embodiment moving element 140 can be along shift motion
L1 moves substrate 50 between first position P3, second position P4 and the third place P5.As shown in fig. 7, by mobile member
Part 140 makes the bearing and leaning portion 154 of bearer element 150 accept and moves to drive substrate 50 to be displaced downwardly to the third place P5 by second position P4
The substrate 50 that dynamic element 140 is transmitted.When substrate 50 is located at bearer element 150,54 both sides of lower surface of substrate 50 are born against
Bearing and leaning portion 154, and the lower surface 54 of substrate is made to be exposed to hollow-out parts 152.It should be noted that being in the upper surface of this substrate 50 52
For the processing procedure face of processing procedure, and the lower surface of substrate 50 is non-processing procedure face.
Referring back to Fig. 2, step S150, the upper surface 52 of 180 hiding substrate 50 of a lid are carried out.As shown in figure 8, mobile
Lid 180 is moved along stroke L1 movements by part 182, makes the upper surface 52 of 180 hiding substrate 50 of lid.
Referring back to Fig. 2, step S160 is carried out, jet pipe element 160 is towards the substrate in the hollow-out parts 152 of bearer element 150
Liquid G2 is sprayed in 50 lower surface 54, as shown in figure 9, jet pipe element 160 is towards flushing liquor in the hollow-out parts 152 of bearer element 150
Body G2 so that liquid G2 can be sprayed to the lower surface 54 of substrate 50, wherein institute by the hollow-out parts 142 of bearer element 140
It is, for example, a cleaning solution to state liquid G2.It can reach the following table of cleaning base plate 50 by above-mentioned step flow (S110 ~ S160)
The purpose in face 54 (the non-processing procedure face for being used as basal plate making process).
It should be noted that in one embodiment, can abovementioned steps S140 by substrate 50 be moved to bearer element 150 it
Afterwards, in other words above-mentioned steps S150 can optionally and selectively be carried out by then carrying out step S160, equally also may achieve clear
Wash the purpose of the lower surface 54 of substrate 50.Certainly, if selection carries out above-mentioned steps S150, in addition to the following table of above-mentioned cleaning base plate 50
Other than the effect of face 54, as shown in figure 13, Figure 13 is the flow chart of one embodiment of Fig. 2 substrate-cleaning methods.Carry out step S150
Afterwards, the present embodiment includes the following steps S152.Step S152 is carried out, as shown in Figure 10, in the upper table towards substrate 50 in lid 180
The effect of face 52 provides an air-flow G3, and air-flow G3 is blown to the upper surface 52 of substrate 50, step S152 is, since air-flow G3 is blown to
The upper surface 52 of substrate 50 avoids the liquid G2 that jet pipe element 160 sprays from spraying past to the upper surface 52 of substrate 50, in turn whereby
Get the upper surface 52 of substrate 50 wet.
Referring back to Fig. 2, step S170 is carried out, lid 180 is detached from the upper surface 52 of substrate 50.In other words, moving member 182
Lid 180 is moved along into stroke L1 and is moved away from bearer element 150, and then lid 180 is resetted into (process of such as Fig. 8 to Fig. 7).Into
Row step S180, by moving element 140 by substrate 50 along shift motion L1 by moving to second position P4 on the third place P5.It borrows
Ejector pin 142 is driven by gear 146, enable ejector pin 142 along shift motion L1 continue up with by substrate 50 by as shown in Figure 7 the
Second position P4 (as shown in Figure 5 or Figure 6) is moved on three position P5.Step S190 is carried out, shown in the process such as Fig. 5 to Fig. 4,
Roller group 120 is moved to transfer position P1 by outflow location P2.Slide 134 in transfer element 130 moves on sliding rail 136,
The idler wheel 124 that connector 132 drives part connected piece 132 to connect moves, and roller group 120 is resetted.Step S210 is carried out,
Substrate 50 is displaced downwardly to first position P3 by second position P4 along shift motion L1 by moving element 140, substrate 50 is made to be located at
On the idler wheel 124 of roller group 120.In the present embodiment, it is arranged under 144 mutual starts by gear 146 and gear, drives ejector pin
142 enable ejector pin 142 to continue downwards being displaced downwardly to substrate 50 such as figure by second position P4 as shown in Figure 4 along shift motion L1
First position P3 shown in 3.
Step S220 is carried out, substrate 50 is delivered to the downstream of first position P3 by roller group 120.In one embodiment,
The downstream of the first position P3 is second chamber 112 (as shown in figure 11), i.e. substrate 50 is sent to second from first chamber 110
Chamber 112.In another embodiment, the downstream of the first position P3 is substrate 50 from a certain section of idler wheel in roller group 120
It is delivered to next section of idler wheel, the present invention limits not to this, and end can be designed depending on physical device.
As shown in figure 11, the cleaning equipment 100 of the present embodiment includes a second chamber 112 and a third chamber 114.The
Roller group 112A in two chambers 112 is accepted and is cleaned the substrate 50 conveyed from first chamber 110.In addition, second chamber
The 112 same configurations having such as first chamber 110 and step method, difference are only that second chamber 112 is cleaned using water
Substrate.Then, the roller group 114A in third chamber 114 accepts what the roller group 112A in second chamber 112 was conveyed
Substrate, third chamber 114 is providing an air-flow to dry up substrate 50.
Certainly, the content of above-mentioned Figure 11 by way of example only, is not intended to limit the present invention, is matched in cleaning equipment 100
The chamber and function set can change according to actual demand, and the present invention is not limited thereto.
In conclusion in the substrate-cleaning method and cleaning equipment of the present invention, by moving element by substrate by idler wheel
Group is moved to bearer element so that the lower surface of substrate is exposed to the hollow-out parts of bearer element.Under configured in this way, jet pipe element
The liquid sprayed is sprayed to lower surface (the non-system for being used as basal plate making process of substrate after the hollow-out parts of bearer element
Journey face), the upper surface (the processing procedure face for being used as basal plate making process) without cleaning to substrate, to reach the single of cleaning base plate
The purpose on surface.
Furthermore when substrate is moved into bearer element, cover board by hiding substrate above substrate upper surface so that accept
Element and lid constitute a cleaning space, without overflowing in outside cleaning space in the hollow-out parts that liquid passes through bearer element, into
And avoid influencing external mechanism (such as roller group), it can achieve the purpose that conveying is detached with cleaning whereby.
Further, when the upper surface of aforementioned lid hiding substrate, air-flow is provided through towards the upper surface of substrate so that
Air-flow is blown to the upper surface of substrate, avoids the liquid that jet pipe element sprays to spray toward to the upper surface of substrate whereby, this measure is not only
It being avoided that other than the upper surface for getting substrate wet, by the guiding of said flow, it is ensured that liquid can be cleaned in the lower surface of substrate, with
Achieve the purpose that the single face of cleaning base plate.
In addition, roller group can be cleaned in outflow location, therefore, when lower surface (surface of contact roller group) quilt of substrate
When cleaning and being moved back into roller group, the lower surface of substrate will not again be polluted by roller group, and can ensure that under cleaning base plate
The effect on surface.
Embodiment described above is only to absolutely prove preferred embodiment that is of the invention and being lifted, protection model of the invention
It encloses without being limited thereto.Those skilled in the art on the basis of the present invention made by equivalent substitute or transformation, in the present invention
Protection domain within.Protection scope of the present invention is subject to claims.
Claims (12)
1. a kind of substrate-cleaning method, which is suitable for a cleaning equipment, which is characterized in that the cleaning equipment packet
Containing a roller group, at least a jet pipe element, at least a moving element and a bearer element, the roller group is on a transfer position
A substrate is conveyed, which is the shifting on a first position of the shift motion that the roller group is located at the moving element
Out position is that the roller group leaves the shift motion, and the moving element is along the shift motion by the substrate in the first position, one
It is moved between the second position and a third place, which is higher than the first position, which is less than this first
It sets, which is set to the third place, and the bearer element has a hollow-out parts, which includes following step
Suddenly：
By the moving element by the substrate along the shift motion by moving to the second position on the first position；
The roller group is moved to the outflow location by the transfer position；
By the moving element, by the substrate, along the shift motion, by the second position is displaced downwardly in the third place, this holds
Connect element；And
A lower surface of the jet pipe element towards the substrate in the hollow-out parts of the bearer element sprays liquid.
2. substrate-cleaning method as described in claim 1, which is characterized in that carry out the jet pipe element being somebody's turn to do towards the bearer element
It is further comprising the steps of after the step of liquid is sprayed in substrate lower surface in hollow-out parts：
By the moving element by the substrate along the shift motion by moving to the second position in the third place；
The roller group is moved to the transfer position by the outflow location；And
The substrate is displaced downwardly to the first position by the second position along the shift motion by the moving element, makes the substrate position
In in the roller group.
3. substrate-cleaning method as described in claim 1, which is characterized in that carry out the roller group and be moved to by the transfer position
It is further comprising the steps of after the step of outflow location：
Clean the roller group.
4. substrate-cleaning method as described in claim 1, which is characterized in that carry out the jet pipe element being somebody's turn to do towards the bearer element
It is further comprising the steps of before the step of lower surface sprinkling liquid of the substrate in hollow-out parts：
One lid covers a upper surface of the substrate.
5. substrate-cleaning method as claimed in claim 4, which is characterized in that carry out the jet pipe element being somebody's turn to do towards the bearer element
It is further comprising the steps of after the step of lower surface sprinkling liquid of the substrate in hollow-out parts：
The lid is detached from the upper surface of the substrate.
6. substrate-cleaning method as claimed in claim 4, which is characterized in that carry out the upper surface that the lid covers the substrate
The step of after, it is further comprising the steps of：
In in the lid towards the upper surface of the substrate provide an air-flow.
7. substrate-cleaning method as described in claim 1, which is characterized in that carry out by the moving element by the substrate along
The shift motion is further comprising the steps of by before moving to the second position on the first position：
The substrate is moved to the first position by the roller group.
8. a kind of cleaning equipment, which is characterized in that including：
One first chamber；
One moving element is located in the first chamber, and the moving element is along a shift motion by the substrate in a first position, one
Moved between the second position and a third place, the wherein second position is higher than the first position, the third place less than this
One position；
One roller group is placed in the first chamber, which is with a transfer position and an outflow location, the transfer position
The roller group is located on the first position of the shift motion, which is that the roller group leaves the shift motion；
One bearer element is located in the first chamber, and the bearer element is set to the third place, which has one to engrave
Empty portion, the bearer element is accepting the substrate that the moving element is transmitted；And
An at least jet pipe element, be located at the first chamber in, and this at least a jet pipe element is located under the bearer element, the spray
Tube elements spray liquid to a lower surface of the substrate in the hollow-out parts towards the bearer element.
9. cleaning equipment as claimed in claim 8, which is characterized in that further include：
One cleaning element, is located in the first chamber, and the cleaning element is cleaning the roller group.
10. cleaning equipment as claimed in claim 8, which is characterized in that further include：
One lid, is located in the first chamber, and the lid is covering a upper surface of the substrate.
11. cleaning equipment as claimed in claim 10, which is characterized in that further include：
One airflow member, be located at the lid in, the airflow member in the lid towards the upper surface of the substrate provide an air-flow.
12. cleaning equipment as claimed in claim 8, which is characterized in that further include：
One second chamber is accepted and cleans the substrate conveyed from the first chamber；And
One third chamber, accepts the substrate that is conveyed from the second chamber, and the third chamber is providing an air-flow to blow
Do the substrate.
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| TW106108967A TWI623359B (en) | 2017-03-17 | 2017-03-17 | Substrate cleaning method and cleaning device |
| TW106108967 | 2017-03-17 |
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| CN108620371A true CN108620371A (en) | 2018-10-09 |
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0733563A1 (en) * | 1995-03-22 | 1996-09-25 | Toyokanetsu Kabushiki Kaisha | Merchandise handling equipment and merchandise storage equipment |
| KR20050115514A (en) * | 2004-06-04 | 2005-12-08 | 삼성전자주식회사 | Apparatus for rinsing wafer back side |
| CN101339316A (en) * | 2007-07-02 | 2009-01-07 | 显示器生产服务株式会社 | Substrate conveyer device |
| CA2630885C (en) * | 2005-11-26 | 2014-02-18 | Acp-Advanced Clean Production Gmbh | Apparatus and method for wet-chemical processing of flat, thin substrates in a continuous method |
| CN104037108A (en) * | 2013-03-08 | 2014-09-10 | 株式会社东芝 | Processing Apparatus And Processing Method |
| CN104419914A (en) * | 2013-08-30 | 2015-03-18 | 亚智科技股份有限公司 | Substrate transfer and processing system and apparatus thereof |
| TW201609279A (en) * | 2014-09-12 | 2016-03-16 | 斯克林集團公司 | Substrate cleaning method and substrate cleaning apparatus |
| CN106276010A (en) * | 2011-12-21 | 2017-01-04 | Tgw物流集团有限公司 | Shelf warehousing system and the method being used for running shelf warehousing system |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5242242B2 (en) * | 2007-10-17 | 2013-07-24 | 株式会社荏原製作所 | Substrate cleaning device |
-
2017
- 2017-03-17 TW TW106108967A patent/TWI623359B/en active
- 2017-06-06 CN CN201710418550.9A patent/CN108620371B/en active Active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0733563A1 (en) * | 1995-03-22 | 1996-09-25 | Toyokanetsu Kabushiki Kaisha | Merchandise handling equipment and merchandise storage equipment |
| KR20050115514A (en) * | 2004-06-04 | 2005-12-08 | 삼성전자주식회사 | Apparatus for rinsing wafer back side |
| CA2630885C (en) * | 2005-11-26 | 2014-02-18 | Acp-Advanced Clean Production Gmbh | Apparatus and method for wet-chemical processing of flat, thin substrates in a continuous method |
| CN101339316A (en) * | 2007-07-02 | 2009-01-07 | 显示器生产服务株式会社 | Substrate conveyer device |
| CN106276010A (en) * | 2011-12-21 | 2017-01-04 | Tgw物流集团有限公司 | Shelf warehousing system and the method being used for running shelf warehousing system |
| CN104037108A (en) * | 2013-03-08 | 2014-09-10 | 株式会社东芝 | Processing Apparatus And Processing Method |
| CN104419914A (en) * | 2013-08-30 | 2015-03-18 | 亚智科技股份有限公司 | Substrate transfer and processing system and apparatus thereof |
| TW201609279A (en) * | 2014-09-12 | 2016-03-16 | 斯克林集團公司 | Substrate cleaning method and substrate cleaning apparatus |
| US20170309472A1 (en) * | 2014-09-12 | 2017-10-26 | SCREEN Holdings Co., Ltd. | Substrate cleaning method and substrate cleaning apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI623359B (en) | 2018-05-11 |
| CN108620371B (en) | 2020-09-15 |
| TW201834756A (en) | 2018-10-01 |
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