CN108594606A - 一种负性光刻胶显影液 - Google Patents
一种负性光刻胶显影液 Download PDFInfo
- Publication number
- CN108594606A CN108594606A CN201810329307.4A CN201810329307A CN108594606A CN 108594606 A CN108594606 A CN 108594606A CN 201810329307 A CN201810329307 A CN 201810329307A CN 108594606 A CN108594606 A CN 108594606A
- Authority
- CN
- China
- Prior art keywords
- developing solution
- negative photo
- photo glue
- glue developing
- weight percent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810329307.4A CN108594606A (zh) | 2018-04-13 | 2018-04-13 | 一种负性光刻胶显影液 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810329307.4A CN108594606A (zh) | 2018-04-13 | 2018-04-13 | 一种负性光刻胶显影液 |
Publications (1)
Publication Number | Publication Date |
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CN108594606A true CN108594606A (zh) | 2018-09-28 |
Family
ID=63622111
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201810329307.4A Pending CN108594606A (zh) | 2018-04-13 | 2018-04-13 | 一种负性光刻胶显影液 |
Country Status (1)
Country | Link |
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CN (1) | CN108594606A (zh) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1614539A1 (en) * | 2004-07-08 | 2006-01-11 | Agfa-Gevaert | Method for making a lithographic printing plate |
CN104460245A (zh) * | 2014-12-24 | 2015-03-25 | 保定乐凯照相化学有限公司 | 一种彩色相纸显影浓缩液 |
CN106527065A (zh) * | 2017-01-25 | 2017-03-22 | 绵阳艾萨斯电子材料有限公司 | 一种光刻胶显影液 |
CN107728438A (zh) * | 2017-10-30 | 2018-02-23 | 江门市奔力达电路有限公司 | 一种新型阻焊显影液及其制备方法 |
-
2018
- 2018-04-13 CN CN201810329307.4A patent/CN108594606A/zh active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1614539A1 (en) * | 2004-07-08 | 2006-01-11 | Agfa-Gevaert | Method for making a lithographic printing plate |
CN104460245A (zh) * | 2014-12-24 | 2015-03-25 | 保定乐凯照相化学有限公司 | 一种彩色相纸显影浓缩液 |
CN106527065A (zh) * | 2017-01-25 | 2017-03-22 | 绵阳艾萨斯电子材料有限公司 | 一种光刻胶显影液 |
CN107728438A (zh) * | 2017-10-30 | 2018-02-23 | 江门市奔力达电路有限公司 | 一种新型阻焊显影液及其制备方法 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20190327 Address after: 516265 West of Maintenance Workshop of McCort Science and Technology Industrial Park, Weilong Management Zone, Liangjing Town, Huiyang District, Huizhou City, Guangdong Province Applicant after: Huizhou Dacheng Microelectronic Materials Co.,Ltd. Address before: 518000 No. 54 Huansheng Avenue, Yanchuan Community, Songgang Street, Baoan District, Shenzhen City, Guangdong Province Applicant before: SHENZHEN DACHENG ABLUENT CO.,LTD. |
|
TA01 | Transfer of patent application right | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20180928 |
|
RJ01 | Rejection of invention patent application after publication |