CN108550656A - A kind of electrical pumping equilibrium annealing device - Google Patents
A kind of electrical pumping equilibrium annealing device Download PDFInfo
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- CN108550656A CN108550656A CN201810474721.4A CN201810474721A CN108550656A CN 108550656 A CN108550656 A CN 108550656A CN 201810474721 A CN201810474721 A CN 201810474721A CN 108550656 A CN108550656 A CN 108550656A
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- 238000000137 annealing Methods 0.000 title claims abstract description 55
- 238000005086 pumping Methods 0.000 title claims abstract description 38
- 238000000034 method Methods 0.000 claims abstract description 49
- 230000008569 process Effects 0.000 claims abstract description 46
- 238000010438 heat treatment Methods 0.000 claims abstract description 29
- 238000002347 injection Methods 0.000 claims abstract description 19
- 239000007924 injection Substances 0.000 claims abstract description 19
- 238000001816 cooling Methods 0.000 claims abstract description 13
- 239000002184 metal Substances 0.000 claims description 61
- 229910052751 metal Inorganic materials 0.000 claims description 61
- 238000005516 engineering process Methods 0.000 claims description 9
- 230000005611 electricity Effects 0.000 claims description 7
- 238000002791 soaking Methods 0.000 claims description 6
- 238000002513 implantation Methods 0.000 claims description 5
- 230000007812 deficiency Effects 0.000 claims description 3
- 239000010445 mica Substances 0.000 claims description 3
- 229910052618 mica group Inorganic materials 0.000 claims description 3
- 238000004321 preservation Methods 0.000 claims description 3
- 238000012546 transfer Methods 0.000 abstract description 7
- 239000007789 gas Substances 0.000 description 29
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 101001073212 Arabidopsis thaliana Peroxidase 33 Proteins 0.000 description 1
- 101001123325 Homo sapiens Peroxisome proliferator-activated receptor gamma coactivator 1-beta Proteins 0.000 description 1
- 102100028961 Peroxisome proliferator-activated receptor gamma coactivator 1-beta Human genes 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
- H01L31/1864—Annealing
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Tunnel Furnaces (AREA)
- Battery Electrode And Active Subsutance (AREA)
Abstract
The present invention relates to a kind of electrical pumping equilibrium annealing devices, it anneals for cell piece, including chassis body, the bottom of the chassis body is provided with idler wheel transport system, carrier for carrying cell piece passes through the feeding station successively through the conveying roller system, reverse current injects station, cooling station and discharge station are made annealing treatment, the reverse current injection station is used to carry out electrical pumping to the cell piece in the carrier, the reverse current injection station includes multiple process cavities, it is equipped with one group of concurrent heating system in each process cavity, for carrying out auxiliary heating to the cell piece carried on carrier to maintain cell piece or more temperature equalization.The present invention can realize the annealing under the electrical pumping situation for cell piece, can ensure up and down and the cell piece at middle part can keep temperature consistent, treatment effeciency is high, can effectively improve the transfer efficiency of cell piece.
Description
Technical field
The present invention relates to cell piece processing technique fields, more particularly to a kind of dress for annealing to cell piece
Set more particularly to a kind of achievable battery chip equalization of electrical pumping annealing device.
Background technology
Silicon chip（Cell piece）In containing aerobic, oxygen plays the role of suck up impurity, is made annealing treatment to silicon chip, can promote to deposit
It stays the oxygen in silicon to external diffusion, low-oxygen environment is formed in silicon chip surface（Clean area）, can even be eliminated by oxygen to reduce
Caused by crystal defect, be conducive to late device manufacture, wafer anneal can impact its resistivity and minority carrier life time.Separately
Outside, photo attenuation (LID) refers to solar cell and the component caused power attenuation phenomenon in During Illumination.In order to improve electricity
Pond efficiency, has developed PERC at present（Passivation emitter and back of the body local contact battery）High-efficiency battery, but found by practice, such as
Fruit is not handled finished battery, and the LID phenomenons of high-efficiency battery can reduce the efficiency gain of battery, reduce the conversion of cell piece
Efficiency.
In view of the foregoing drawbacks, annealing is mostly used now, but finds such as to maintain it in during wafer anneal logical
Electricity condition enables to the annealing effect of silicon chip more preferable, has more superior performance, but there is presently no wafer anneal equipment pair
This produces corresponding device, and it is difficult to ensure that whole temperature consistency when cell piece is annealed, therefore is badly in need of a kind of reliable work
The wafer anneal equipment of work solves the problems, such as this.
Invention content
The invention aims to provide a kind of electrical pumping equilibrium annealing device, the electrical pumping for cell piece can be realized
Annealing under situation can ensure up and down and the cell piece at middle part can keep temperature consistent, treatment effeciency height can be carried effectively
The transfer efficiency of high cell piece.
In order to achieve the above objectives, the technical solution adopted by the present invention is：
The present invention provides a kind of electrical pumping equilibrium annealing devices, anneal for cell piece, including chassis body, the frame master
The bottom of body is provided with idler wheel transport system, is sequentially arranged in chassis body described in the direction of travel along the conveying roller system
There are feeding station, reverse current injection station, cooling station and discharge station, for carrying the carrier of cell piece through described defeated
Roller system is sent to be carried out at annealing by the feeding station, reverse current injection station, cooling station and discharge station successively
Reason, the reverse current injection station are used to carry out electrical pumping to the cell piece in the carrier, and the reverse current injects work
Position includes multiple process cavities, and one group of concurrent heating system is equipped in each process cavity, for being carried out to the cell piece carried on carrier
Auxiliary heating is to maintain cell piece or more temperature equalization.
For above-mentioned technical proposal, inventor also has further Optimized Measures.
Preferably, every group of concurrent heating system includes upper auxiliary thermal auxiliary thermal under, and the upper auxiliary thermal includes fixing
The first metal heater plate below the arc-spark stand is connected, is configured in first metal heater plate for incuding upper cell
First thermocouple of piece temperature, auxiliary thermal includes the second metal heater plate being fixed in the chassis body, institute under described
State and be configured with the second thermocouple in the second metal heater plate, wherein first metal heater plate, the second metal heater plate it is outer
Shell is simultaneously for importing DC power supply, to the cell piece being clamped between first metal heater plate, the second metal heater plate
Carry out electrical pumping.
Further, the reverse current inject station in correspond to each process cavity be respectively configured there are one electric current note
Entering system, the current implantation systems include first electrode cylinder, first electrode frame, second electrode cylinder and second electrode frame,
The first electrode cylinder is fixed on the top in the chassis body and positioned at each process cavity, the first electrode frame vertically
It is fixed on the bottom of the first electrode cylinder, the upper auxiliary thermal is fixed on the lower section of the arc-spark stand, second electricity
Pole cylinder is fixed on the lower section in the chassis body and positioned at each process cavity vertically, and the second electrode frame is fixed on described
The top of second electrode cylinder, auxiliary thermal is fixed on the top of the second electrode frame under described.
Further, red corresponding to being provided in the middle part of the cell piece being stacked on carrier in the side plate of the chassis body
Outer sensor, the infrared sensor are used to detect the temperature of the cell piece positioned at middle part.
Further, first thermocouple measures the first METAL HEATING PROCESS plate temperature, and compared with setting value, temperature ratio is set
Definite value is low, opens the first metal heater plate, conversely, then close the first metal heater plate, thus keeps the first metal heater plate
Constant temperature；Second thermocouple measures the second METAL HEATING PROCESS plate temperature, and compared with setting value, temperature is lower than setting value, opens the second gold medal
Belong to heating plate, conversely, thus then closing the second metal heater plate keeps the second metal heater plate constant temperature；Infrared sensor measures
Cell piece temperature, compared with setting value, when temperature is lower than setting value, gas circuit can close, and when temperature is higher than setting value, gas circuit can be beaten
It opens, it is the uniform constant temperature field of temperature to remain internal in this way.
Further, the concurrent heating system further includes soaking gas path device, and the soaking gas path device includes fixed institute
The side plate for stating chassis body is fixedly arranged in the middle of gas circuit, middle gas circuit and lower gas circuit, be turned on and off the upper gas circuit, middle gas circuit or
Gas circuit under person, it is uniformly distributed for improving gas flowing progress heat to the cell piece air blast stacked on the carrier.
Preferably, the multiple process cavity includes at least one high-temperature technology chamber and at least one low temperature process chamber, described
Carrier drives the cell piece first annealing in high-temperature technology chamber to enter back into the low temperature process chamber and anneals.
Preferably, it is provided at the top of the chassis body for the extractor fan to each station exhausting temperature control, anti-
It is injected to electric current and is equipped with Middle pressure draught fan in station, the top for injecting station in the reverse current is arranged in medium pressure wind turbine, uses
In the temperature for controlling the reverse current injection station in exhausting deficiency, set on four walls that the reverse current injects station
There is heat preservation siding, and insulated door is both provided between each station, lifting cylinder, the liter are equipped in the side edge of insulated door
Sending down abnormally ascending cylinder is connected by connecting plate with the insulated door.
Preferably, the carrier includes the collet made of mica, and being fixed with several on the collet is vertically arranged
Baffle, several described baffles limit the carrying cavity of placing battery plate on the collet, wherein the bottom of the collet
Portion has trepanning, also symmetrical on the collet of the carrier for the lowest level cell piece that the contact of the second metal heater plate stacks
It is provided at least one set of jam plate, position of the cell piece on collet is limited for locking.
Further, the idler wheel transport system includes more idler wheels continuous and disposed in parallel, and idler wheel passes through its end
The idler wheel axis connection motor drive chain of setting, the idler wheel directly drive chain drive to drive, are filled successively on roller shaft by motor
There are c-type snap ring, bearing, fixed ring, fixed ring, bearing and bearing block flange.
Since above-mentioned technical proposal is used, the present invention has following advantages compared with prior art：
The electrical pumping annealing device of the present invention, wherein reverse current injection station are used to carry out electricity to the cell piece in the carrier
Injection realizes the direct current electrical pumping to cell piece in this way while annealing to cell piece, under such electrical pumping situation
It realizes the heating for cell piece, generates heat when being powered using silicon chip self-resistance, the annealing under such situation can improve battery
The transfer efficiency of piece reduces the photo attenuation of high-efficiency battery, to ensure the efficiency gain of battery.
Further, the process cavity configured with high temperature and low temperature in reverse current injection station, and match in process cavity
It is equipped with concurrent heating system, can realize the carry out temperature-compensating for cell piece in each process cavity, is realized for cell piece not equality of temperature
Annealing under degree, and upper and lower and middle part the temperature of cell piece in each process cavity is controlled by thermocouple, it adjusts and stacks
The bulk temperature of good cell piece improves the transfer efficiency of cell piece to realize the more efficient annealing effect for cell piece.
Further, the carrier of use can effectively stack a large amount of cell piece of carrying, while convenient for different size electricity
Arrangement of the pond piece on carrier, in addition, the structure of carrier is more suitable for the annealing feature of the cell piece in the present invention, the first metal
Heating plate, the second metal heater plate can be in direct contact the surface of cell piece, and energization or heat conduction can be carried out to cell piece, this
It is generated heat when being powered using silicon chip self-resistance using electrical heating cell piece annealing heating in invention, upper and lower auxiliary thermal
In metal heater plate be auxiliary heat, auxiliary heat can be turned on and off by actual production demand to maintain the uniform of cell piece temperature
Property, more preferably to improve annealing effect.
Description of the drawings
Some specific embodiments that the invention will be described in detail by way of example and not limitation with reference to the accompanying drawings hereinafter.
Identical reference numeral denotes same or similar component or part in attached drawing.It should be appreciated by those skilled in the art that these
What attached drawing was not necessarily drawn to scale.In attached drawing：
Fig. 1 is the overall structure diagram of electrical pumping equilibrium annealing device according to an embodiment of the invention；
Fig. 2 is the side block diagram of the reverse current injection station of the annealing device of electrical pumping equilibrium shown in Fig. 1；
Fig. 3 is the structural schematic diagram of the carrier used in electrical pumping annealing device shown in Fig. 1.
Wherein, the reference numerals are as follows：
1, chassis body, 11, horizontal frame；
2, idler wheel transport system, 21, idler wheel, 22, motor drive chain, 23, the groove body of roller shaft is set, 24, carrier return conveying
Device；
3, feeding station；
4, reverse current injects station, and 41, high-temperature technology chamber, 42, low temperature process chamber, 43, first electrode cylinder, the 44, first electricity
Pole frame, 45, second electrode cylinder, 46, second electrode frame, 47, insulated door, 48, lifting cylinder；
5, cooling station, 51, fan；
6, discharge station；
7, carrier, 71, collet, 72, baffle, 73, jam plate；
8, cell piece；
91, upper auxiliary thermal, the 911, first metal heater plate, 92, under auxiliary thermal, the 921, second metal heater plate, 93, infrared
Sensor, 941, upper gas circuit, 942, middle gas circuit, 943, lower gas circuit；
10, extractor fan；11, gas flow display device.
Specific implementation mode
Technical scheme of the present invention is clearly and completely described below in conjunction with attached drawing, it is clear that described implementation
Example is a part of the embodiment of the present invention, instead of all the embodiments.Based on the embodiments of the present invention, ordinary skill
The every other embodiment that personnel are obtained without making creative work, shall fall within the protection scope of the present invention.
In the description of the present invention, it should be noted that term "center", "upper", "lower", "left", "right", "vertical",
The orientation or positional relationship of the instructions such as "horizontal", "inner", "outside" be based on the orientation or positional relationship shown in the drawings, merely to
Convenient for the description present invention and simplify description, do not indicate or imply the indicated device or element must have a particular orientation,
With specific azimuth configuration and operation, therefore it is not considered as limiting the invention.In addition, term " first ", " second ",
" third " is used for description purposes only, and is not understood to indicate or imply relative importance.
As long as in addition, technical characteristic involved in invention described below different embodiments non-structure each other
It can be combined with each other at conflict.
Electrical pumping equilibrium annealing device described in the present embodiment is used for the annealing of cell piece 8, as shown in Figure 1, packet
Chassis body 1 is included, the bottom of the chassis body 1 is provided with idler wheel transport system 2, along the traveling side of the conveying roller system
Feeding station 3, reverse current injection station 4, cooling station 5 and discharge station 6 are sequentially provided with into the chassis body 1,
Carrier 7 for carrying cell piece 8 injects work by the feeding station 3, reverse current successively through the conveying roller system
Position 4, cooling station 5 and discharge station 6 are made annealing treatment, wherein the process of annealing is injected in station 4 in reverse current
It completes, anneals while electrical pumping.Auxiliary fast cooling is both provided in cooling station 5 and discharge station 6
Fan improves cooling efficiency.
Particularly, the reverse current injection station 4 is used to carry out electrical pumping, institute to the cell piece 8 in the carrier 7
It states in reverse current injection station 4 and is equipped at least two process cavities.Electrical pumping annealing device in the present embodiment, including indulge in either simplex
An equal feeding station 3 of bit length, three cooling stations 5 and a discharge station 6, and the reverse current injects work
Equipped with eight process cavities in position 4, and each length of process cavity（By direction of transfer）Equal to one feeding station 3（Or
One cooling station, 5, discharge stations 6）Length.
With each process time for a productive temp, a productive temp is often completed, the carrier 7 in annealing device is whole
Move forward a station, and according to the principle first gone out is arrived first, the carrier 7 being put into earliest completes all techniques and moves to discharging area earliest,
Wait for feeding.Station 4 is injected in reverse current, carrier 7 is limited by position sensor after being moved to process cavity, tumbled
It stops operating, direct current is introduced by the metal heater plate in upper and lower auxiliary thermal, then electrical pumping heating is carried out to cell piece 8,
In conjunction with external upper auxiliary thermal 91, auxiliary thermal 92 can ensure that cell piece 8 is heated evenly under, and annealing quality is good.In addition,
It is worth under explanation, DC power supply can be installed directly and is fixed in chassis body 1, and the introducing of direct current is convenient for.
The annealing device of the present embodiment, reverse current, which injects station 4, to be used to carry out the cell piece 8 in the carrier 7
Electrical pumping realizes the electrical pumping to cell piece 8 in this way while annealing to cell piece 8, under such electrical pumping situation
Annealing can improve the transfer efficiency of cell piece 8, the photo attenuation of high-efficiency battery is reduced, to ensure that the efficiency of battery increases
Benefit.
One group of concurrent heating system is equipped in each process cavity, every group of concurrent heating system includes the auxiliary thermal under of upper auxiliary thermal 91
92, for carrying out auxiliary heating to the cell piece 8 carried on carrier 7 to maintain about 8 temperature equalization of cell piece.For being stacked on
If dry plate cell piece 8 together, by being detected to its upper and lower temperature and carrying out the difference of the two and the threshold value set
Compare, can ensure that the temperature of each cell piece 8 is kept at a steady state, bulk temperature is more balanced, can ensure
The annealing consistency of each cell piece 8, properties of product are more superior.
It injects in station 4 in the reverse current and is respectively configured there are one current implantation systems corresponding to each process cavity,
Each current implantation systems include first electrode cylinder 43, first electrode frame 44, second electrode cylinder 45 and second electrode
Frame 46, the first electrode cylinder 43 are fixed in the chassis body 1 and vertically positioned at the tops of each process cavity, and described the
One arc-spark stand 44 is fixed on the bottom of the first electrode cylinder 43, and the upper auxiliary thermal 91 is fixed under the arc-spark stand
Side, the second electrode cylinder 45 are fixed in the chassis body 1 and vertically positioned at the lower sections of each process cavity, and described second
Arc-spark stand 46 is fixed on the top of the second electrode cylinder 45, and auxiliary thermal 92 is fixed on the second electrode frame 46 under described
Top.After carrier 7 drives cell piece 8 to enter process cavity, first electrode cylinder 43, which pushes, drives the upper auxiliary thermal 91
Move down, second electrode cylinder 45 move up drive it is described under auxiliary thermal 92 move up, such auxiliary thermal under of upper auxiliary thermal 91
92 after pushing down cell piece 8 simultaneously up and down, outer housing injection silicon chip of the direct current through upper auxiliary thermal 91, upper auxiliary thermal 91,
92 three of auxiliary thermal under of cell piece 8 constitutes the circuit of electric current injection.
Particularly, as shown in Fig. 2, the upper auxiliary thermal 91 includes the first gold medal being fixedly connected below the arc-spark stand
Belong to heating plate 911, is configured in first metal heater plate 911 for incuding the first of 911 temperature of the first metal heater plate
Thermocouple（It is not shown in figure, the setting of thermocouple uses conventional arrangement, and details are not described herein）, auxiliary thermal 92 includes under described
The second metal heater plate 921 being fixed in the chassis body 1, second metal heater plate 921 are interior configured with for feeling
Answer the second thermocouple of 921 temperature of the second metal heater plate（It is not shown in figure, ibid）, wherein first metal heater plate
911, the shell of the second metal heater plate 921 is simultaneously for importing DC power supply, to being clamped in first metal heater plate
911, the cell piece 8 between the second metal heater plate 921 carries out electrical pumping.Correspond in the side plate of the chassis body 1 and stacks
The middle part of cell piece 8 on carrier 7 is provided with infrared sensor 93, and the infrared sensor 93 is located at cell piece for detecting
8 temperature.
First thermocouple is measured into 911 temperature of the first metal heater plate, compared with setting value, temperature is lower than setting value
The first metal heater plate 911 is then opened, conversely, then close the first metal heater plate 911, thus keeps 911 heater of top
Constant temperature.Second thermocouple measures the second METAL HEATING PROCESS plate temperature 921, and compared with setting value, temperature is lower than setting value, opens
Two metal heater plates 921, conversely, thus then closing the second metal heater plate 921 keeps 921 constant temperature of the second metal heater plate.
Infrared sensor 93 measures 8 temperature of cell piece, and compared with setting value, when temperature is lower than setting value, gas circuit can close, temperature ratio
When setting value is high, gas circuit can be opened, and it is the uniform constant temperature field of temperature to remain internal in this way.
It can be appreciated that so temperature detection and heat compensation can be carried out for the whole of the cell piece 8 that heap is folded so that
Upper and lower temperature is consistent, while the outer housing of metal heater plate can serve as the conductive mechanism of external power supply importing so that whole
Structure is more compact, while the face between metal heater plate shell and cell piece 8 contacts can ensure that the reliable of electric current imports and walk
To uniformity.
It is found that the present embodiment injects the process cavity configured with high temperature and low temperature in station 4 in reverse current, and in technique
It is configured with concurrent heating system in chamber, can realize the carry out temperature-compensating for cell piece 8 in each process cavity, realizes for cell piece
Annealing under 8 different temperatures, and upper and lower and middle part the temperature of cell piece 8 in each process cavity is controlled by thermocouple,
The bulk temperature for adjusting the cell piece 8 that heap is folded improves cell piece 8 to realize the more efficient annealing effect for cell piece 8
Transfer efficiency.
Such as spoke hot systems in the reverse current injection station 4 in the present embodiment are not only able to carry out heat compensation, moreover it is possible to
If enough heats in each process cavity carry out equilibrium, undoubtedly more it can keep all cell pieces 8 that temperature can be kept consistent.
Concurrent heating system described in the present embodiment further includes soaking gas path device, and the soaking gas path device includes the fixed chassis body
1 side plate is fixedly arranged in the middle of gas circuit 941, middle gas circuit 942 and lower gas circuit 943, is turned on and off the upper gas circuit 941, middle gas
Road 942 or lower gas circuit 943, it is equal for improving gas flowing progress heat to 8 air blast of cell piece stacked on the carrier 7
Cloth.
Preferably, the multiple process cavity includes at least one high-temperature technology chamber 41 and at least one low temperature process chamber 42,
In the present embodiment, include 7 low temperature process chambers 42 of the fore 1 high-temperature technology chamber 41 of setting, rear portion.The carrier 7
It drives the first annealing in high-temperature technology chamber 41 of cell piece 8 to enter back into the low temperature process chamber 42 to anneal.
In addition, being provided with for the extractor fan 10 to each station exhausting temperature control, anti-at the top of the chassis body 1
It being injected to electric current and is equipped with Middle pressure draught fan in station 4, the top that station 4 is injected in the reverse current is arranged in medium pressure wind turbine,
The temperature that station 4 is injected for controlling the reverse current in exhausting deficiency injects four walls of station 4 in the reverse current
It is equipped with heat preservation siding, and is both provided with insulated door 47 between each station, lifting air is equipped in the side edge of insulated door 47
Cylinder 48, the lifting cylinder 48 are connected by connecting plate with the insulated door 47, and lifting cylinder 48 is used for cooperating beat band
Move the action of the insulated door 47.The internal layer of the insulated door 47 is equipped with thermal insulation layer, is sandwiched between thermal insulation material, can reduce
Process cavity heat loss speed makes process cavity have excellent heat-insulating property, energy-saving.
In addition, the idler wheel transport system 2 includes more idler wheels 21 continuous and disposed in parallel, idler wheel 21 passes through its end
The idler wheel axis connection motor drive chain 22 of setting, the idler wheel 21 are directly driven by motor drive chain 22 to drive.On roller shaft
It is sequentially arranged with c-type snap ring, bearing, fixed ring, fixed ring, bearing and bearing block flange.It can be straight after dismantling bearing block flange
It connects and extract idler wheel 21 and its component from intracavitary out so that dismounting facility, simple in structure, convenient operating maintenance.The roller shaft
Bearing is arranged on groove body 23, and the groove body 23 raises the length of horizontal frame 11 by adjusting bolt along the chassis body 1
Direction level is fixed, and the adjusting bolt is vertically arranged, for adjusting the upper-lower height of the groove body 23 and then adjusting the rolling
Take turns the level of transport system 2.
In addition, 1 downside of chassis body, which is provided with carrier, returns conveying device 24, for that will complete the carrier of annealing under
Material section is delivered to feeding section, helps to improve working efficiency.
In addition, gas flow display device 11 is provided in 1 outside of chassis body, for gas flow in each process cavity
It is shown, the sufficient gas energy of flow enough ensures that the temperature in process cavity is more uniformly distributed.
In the present embodiment, the carrier 7 includes collet 71 made of mica, several are fixed on the collet 71
The baffle 72 being vertically arranged, several described baffles 72 limit the carrying cavity of placing battery plate 8 on the collet 71,
In, the bottom of the collet 71 has trepanning, is passed through to contact heap with the second metal heater plate 921 in auxiliary thermal under facilitating
Folded lowest level cell piece 8.It is also symmetrically arranged at least one set of jam plate 73 on the collet 71 of the carrier 7, is limited for locking
Fixed position of the cell piece on collet 71.
Since the carrier 7 that the present embodiment uses can effectively stack a large amount of cell piece 8 of carrying, while being convenient for different size
Arrangement of the cell piece 8 on carrier 7, in addition, the structure of carrier 7 is more suitable for the annealing feature of the cell piece 8 in the present invention, the
One metal heater plate 911, the second metal heater plate 921 can be in direct contact the surface of cell piece 8, can be carried out to cell piece 8
Be powered or heat conduction, the present invention in 8 annealing heating of cell piece using electrical heating, using as the silicon chip of cell piece itself
Resistance generates heat when being powered, and the metal heater plate in upper and lower auxiliary thermal is that auxiliary heats, and can be opened or be closed by actual production demand
Auxiliary heat is closed to maintain the uniformity of cell piece temperature, more preferably to improve annealing effect.
The above embodiments merely illustrate the technical concept and features of the present invention, and its object is to allow person skilled in the art
Scholar cans understand the content of the present invention and implement it accordingly, and it is not intended to limit the scope of the present invention, all according to the present invention
Equivalent change or modification made by Spirit Essence, should be covered by the protection scope of the present invention.
Claims (10)
1. a kind of electrical pumping equilibrium annealing device is annealed for cell piece, including chassis body, the bottom of the chassis body are set
It is equipped with idler wheel transport system, is sequentially provided with feeding work in chassis body described in the direction of travel along the conveying roller system
Position, reverse current injection station, cooling station and discharge station, for carrying the carrier of cell piece through the conveying roller system
System is made annealing treatment by the feeding station, reverse current injection station, cooling station and discharge station successively, described
Reverse current, which injects station, to be used to carry out electrical pumping to the cell piece in the carrier, and the reverse current injection station includes
Multiple process cavities, which is characterized in that one group of concurrent heating system is equipped in each process cavity, for the cell piece to being carried on carrier into
Row auxiliary heating is to maintain cell piece or more temperature equalization.
2. electrical pumping equilibrium annealing device according to claim 1, which is characterized in that every group of concurrent heating system includes upper auxiliary heat
Device auxiliary thermal under, the upper auxiliary thermal includes the first metal heater plate being fixedly connected below the arc-spark stand, institute
It states configured with the first thermocouple for incuding upper cell piece temperature in the first metal heater plate, auxiliary thermal includes under described
The second metal heater plate being fixed in the chassis body, second metal heater plate is interior to be configured with the second thermocouple,
In, first metal heater plate, the second metal heater plate shell simultaneously for importing DC power supply, to being clamped in described the
Cell piece between one metal heater plate, the second metal heater plate carries out electrical pumping.
3. electrical pumping equilibrium annealing device according to claim 2, which is characterized in that inject station in the reverse current
In be respectively configured there are one current implantation systems corresponding to each process cavity, the current implantation systems include first electrode gas
Cylinder, first electrode frame, second electrode cylinder and second electrode frame, the first electrode cylinder are fixed on the chassis body vertically
The top of each process cavity is gone up and is located at, the first electrode frame is fixed on the bottom of the first electrode cylinder, described auxiliary
Thermal is fixed on the lower section of the arc-spark stand, and the second electrode cylinder is fixed in the chassis body and vertically positioned at every
The lower section of a process cavity, the second electrode frame are fixed on the top of the second electrode cylinder, and auxiliary thermal is fixed under described
In the top of the second electrode frame.
4. electrical pumping equilibrium annealing device according to claim 3, which is characterized in that in the side plate pair of the chassis body
Ying Yu, which is stacked in the middle part of the cell piece on carrier, is provided with infrared sensor, and the infrared sensor is located at middle part for detecting
Cell piece temperature.
5. electrical pumping equilibrium annealing device according to claim 4, which is characterized in that first thermocouple measures
One METAL HEATING PROCESS plate temperature, compared with setting value, temperature is lower than setting value, opens the first metal heater plate, conversely, then closing
Thus first metal heater plate keeps the first metal heater plate constant temperature；Second thermocouple measures the second METAL HEATING PROCESS plate temperature,
Compared with setting value, temperature is lower than setting value, opens the second metal heater plate, conversely, then closing the second metal heater plate thus
To keep the second metal heater plate constant temperature；Infrared sensor measures cell piece temperature, and compared with setting value, temperature is lower than setting value
When, gas circuit can close, and when temperature is higher than setting value, gas circuit can be opened, and it is the uniform constant temperature field of temperature to remain internal in this way.
6. electrical pumping equilibrium annealing device according to any one of claim 1 to 5, which is characterized in that the auxiliary heat system
System further includes soaking gas path device, and the soaking gas path device includes that the side plate of the fixed chassis body is fixedly arranged in the middle of gas
Road, middle gas circuit and lower gas circuit, are turned on and off the upper gas circuit, middle gas circuit or lower gas circuit, for being stacked on the carrier
Cell piece air blast improve gas flowing to carry out heat uniformly distributed.
7. electrical pumping equilibrium annealing device according to claim 1, which is characterized in that the multiple process cavity includes at least
One high-temperature technology chamber and at least one low temperature process chamber, the carrier drive cell piece first anneal in high-temperature technology chamber again into
Enter the low temperature process chamber to anneal.
8. electrical pumping equilibrium annealing device according to claim 1, which is characterized in that set at the top of the chassis body
It is equipped with for the extractor fan to each station exhausting temperature control, is injected in reverse current and be equipped with Middle pressure draught fan, medium pressure in station
The top that station is injected in the reverse current is arranged in wind turbine, injects station for controlling the reverse current in exhausting deficiency
Temperature, heat preservation siding is equipped on four walls that the reverse current injects station, and be both provided between each station every
Hot topic is equipped with lifting cylinder in the side edge of insulated door, and the lifting cylinder is connected by connecting plate with the insulated door.
9. electrical pumping equilibrium annealing device according to claim 1, which is characterized in that the carrier includes being made of mica
Collet, several baffles being vertically arranged are fixed on the collet, several described baffles limit on the collet
Go out the carrying cavity of placing battery plate, wherein the bottom of the collet has trepanning, is stacked for the contact of the second metal heater plate
Lowest level cell piece, at least one set of jam plate is also symmetrically arranged on the collet of the carrier, the electricity is limited for locking
Position of the pond piece on collet.
10. electrical pumping equilibrium annealing device according to claim 1, which is characterized in that the idler wheel transport system includes
More idler wheels continuous and disposed in parallel, for idler wheel by the idler wheel axis connection motor drive chain of its end set, the idler wheel is straight
It connects and drives chain drive to drive by motor, c-type snap ring, bearing, fixed ring, fixed ring, bearing and axis are sequentially arranged on roller shaft
Bearing flange.
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| CN108550656B (en) | 2023-11-21 |
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