CN208352320U - A kind of electrical pumping equilibrium annealing device - Google Patents

A kind of electrical pumping equilibrium annealing device Download PDF

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Publication number
CN208352320U
CN208352320U CN201820735805.4U CN201820735805U CN208352320U CN 208352320 U CN208352320 U CN 208352320U CN 201820735805 U CN201820735805 U CN 201820735805U CN 208352320 U CN208352320 U CN 208352320U
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cell piece
station
carrier
electrical pumping
temperature
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CN201820735805.4U
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Chinese (zh)
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蒋新
刘涛
陈国才
刘斌
窦福存
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Suzhou Kzone Equipment Technology Co Ltd
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Suzhou Kzone Equipment Technology Co Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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Abstract

The utility model relates to a kind of electrical pumping equilibrium annealing devices, it anneals for cell piece, including chassis body, the bottom of the chassis body is provided with idler wheel transportation system, carrier for carrying cell piece successively passes through the feeding station through the idler wheel transportation system, reverse current injects station, cooling station and discharge station are made annealing treatment, the reverse current injection station is used to carry out electrical pumping to the cell piece in the carrier, it include multiple process cavities in the reverse current injection station, one group of concurrent heating system is equipped in each process cavity, for carrying out auxiliary heating to the cell piece carried on carrier to maintain cell piece or more temperature equalization.The utility model can be realized the annealing under the electrical pumping situation for cell piece, can guarantee up and down and the cell piece at middle part to be able to maintain temperature consistent, treatment effeciency is high, can effectively improve the transfer efficiency of cell piece.

Description

A kind of electrical pumping equilibrium annealing device
Technical field
The utility model relates to cell piece processing technique field, more particularly to a kind of for annealing to cell piece A kind of device of the achievable battery chip equalization of device more particularly to electrical pumping annealing.
Background technique
Containing aerobic in silicon wafer (cell piece), oxygen plays the role of suck up impurity, makes annealing treatment to silicon wafer, can promote to deposit It stays the oxygen in silicon to external diffusion, low-oxygen environment (clean area) is formed in silicon chip surface, so that reducing can even eliminate by oxygen Caused by crystal defect, be conducive to late device manufacture, wafer anneal can impact its resistivity and minority carrier life time.Separately Outside, photo attenuation (LID) refers to solar battery and the component caused power attenuation phenomenon in During Illumination.In order to improve electricity Pond efficiency has developed PERC(passivation emitter and back local contact battery at present) high-efficiency battery, but by practice discovery, such as Fruit is not handled finished battery, and the LID phenomenon of high-efficiency battery can reduce the efficiency gain of battery, reduces the conversion of cell piece Efficiency.
In view of the foregoing drawbacks, annealing is mostly used now, but finds such as to maintain it in during wafer anneal logical Electricity condition enables to the annealing effect of silicon wafer more preferable, has more superior performance, but there is presently no wafer anneal equipment pair This produces corresponding device, and it is difficult to ensure that whole temperature consistency when cell piece is annealed, therefore is badly in need of a kind of reliable work The wafer anneal equipment of work solves the problems, such as this.
Utility model content
The purpose of this utility model is to provide for a kind of electrical pumping equilibrium annealing device, can be realized the electricity for cell piece Annealing under injection condition, can guarantee up and down and the cell piece at middle part to be able to maintain temperature consistent, treatment effeciency is high, Neng Gouyou Effect improves the transfer efficiency of cell piece.
In order to achieve the above objectives, the technical solution adopted in the utility model is:
The utility model provides a kind of electrical pumping equilibrium annealing device, anneals for cell piece, including chassis body, institute The bottom for stating chassis body is provided with idler wheel transportation system, in chassis body described in the direction of travel along the idler wheel transportation system It is sequentially provided with feeding station, reverse current injection station, cooling station and discharge station, the carrier for carrying cell piece passes through The idler wheel transportation system is successively carried out by the feeding station, reverse current injection station, cooling station and discharge station Annealing, the reverse current injection station are used to carry out electrical pumping, the reverse current to the cell piece in the carrier Injecting includes multiple process cavities in station, one group of concurrent heating system is equipped in each process cavity, for the battery carried on carrier Piece carries out auxiliary heating to maintain cell piece or more temperature equalization.
For above-mentioned technical proposal, there are also further Optimized Measures by inventor.
Preferably, every group of concurrent heating system includes upper auxiliary thermal auxiliary thermal under, and the upper auxiliary thermal includes fixing The first metal heater plate below connection electrode frame, first metal heater plate are interior configured with for incuding upper cell piece temperature First thermocouple of degree, auxiliary thermal includes the second metal heater plate being fixed in the chassis body under described, and described the The second thermocouple is configured in two metal heater plates, wherein first metal heater plate, the shell of the second metal heater plate are same When for importing DC power supply, carried out to the cell piece being clamped between first metal heater plate, the second metal heater plate Electrical pumping.
Further, each process cavity is corresponded in reverse current injection station and is each configured with an electric current note Entering system, the current implantation systems include first electrode cylinder, first electrode frame, second electrode cylinder and second electrode frame, The first electrode cylinder is fixed on the top in the chassis body and being located at each process cavity, the first electrode frame vertically It is fixed on the bottom of the first electrode cylinder, the upper auxiliary thermal is fixed on the lower section of the arc-spark stand, second electricity Pole cylinder is fixed on the lower section in the chassis body and being located at each process cavity vertically, and the second electrode frame is fixed on described The top of second electrode cylinder, auxiliary thermal is fixed on the top of the second electrode frame under described.
Further, red corresponding to being provided in the middle part of the cell piece being stacked on carrier in the side plate of the chassis body Outer sensor, the infrared sensor are used to detect the temperature of the cell piece positioned at middle part.
Further, first thermocouple measures the first METAL HEATING PROCESS plate temperature, and compared with setting value, temperature is than setting It is worth low, opens the first metal heater plate, conversely, then close the first metal heater plate, thus keeps the first metal heater plate permanent Temperature;Second thermocouple measures the second METAL HEATING PROCESS plate temperature, and compared with setting value, temperature is lower than setting value, opens the second metal Heating plate, conversely, thus then closing the second metal heater plate keeps the second metal heater plate constant temperature;Infrared sensor measures electricity Pond piece temperature, compared with setting value, when temperature is lower than setting value, gas circuit can be closed, and when temperature is higher than setting value, gas circuit can be beaten It opens, remaining internal in this way is the uniform constant temperature field of temperature.
Further, the concurrent heating system further includes soaking gas path device, and the soaking gas path device includes fixed institute State and be fixed with gas circuit, middle gas circuit and lower gas circuit in the middle part of the side plate of chassis body, open or close the upper gas circuit, middle gas circuit or It is uniformly distributed to improve gas flowing progress heat for the cell piece air blast to stacking on the carrier for gas circuit under person.
Preferably, the multiple process cavity includes at least one high-temperature technology chamber and at least one low temperature process chamber, described Carrier drives the cell piece first annealing in high-temperature technology chamber to enter back into the low temperature process chamber and anneals.
Preferably, it is provided at the top of the chassis body for the extractor fan to each station exhausting temperature control, anti- Middle pressure draught fan is equipped with into electric current injection station, medium pressure blower is arranged in the top of the reverse current injection station, uses In the temperature for controlling the reverse current injection station in exhausting deficiency, set on four walls of reverse current injection station There is heat preservation siding, and be provided with insulated door between each station, is equipped with lifting cylinder, the liter in the side edge of insulated door Sending down abnormally ascending cylinder is connected by connecting plate with the insulated door.
Preferably, the carrier includes the collet made of mica, is fixed with several on the collet and is vertically arranged Baffle, several described baffles limit the carrying cavity of placing battery plate on the collet, wherein the bottom of the collet Portion has aperture, also symmetrical on the collet of the carrier for the lowest level cell piece that the contact of the second metal heater plate stacks It is provided at least one set of jam plate, limits position of the cell piece on collet for locking.
Further, the idler wheel transportation system includes more idler wheels continuous and disposed in parallel, and idler wheel passes through its end The idler wheel axis connection motor driven chain of setting, the idler wheel are driven by motor chain conveyer directly to drive, successively fill on roller shaft There are c-type snap ring, fixed ring, bearing and bearing block flange.
Since above-mentioned technical proposal is used, the utility model has the advantage that compared with prior art
The electrical pumping annealing device of the utility model, wherein reverse current injection station is used for the battery in the carrier Piece, which carries out electrical pumping, realizes the direct current electrical pumping to cell piece in this way while annealing to cell piece, so electricity note Enter the heating realized under situation for cell piece, generates heat when being powered using silicon wafer self-resistance, the annealing under such situation can The transfer efficiency for improving cell piece, reduces the photo attenuation of high-efficiency battery, to guarantee the efficiency gain of battery.
Further, the process cavity configured with high temperature and low temperature in reverse current injection station, and match in process cavity It is equipped with concurrent heating system, can be realized the carry out temperature-compensating for cell piece in each process cavity, is realized for cell piece not equality of temperature Annealing under degree, and controlled by upper and lower and middle part temperature of the thermocouple to cell piece in each process cavity, it adjusts and stacks The bulk temperature of good cell piece improves the transfer efficiency of cell piece to realize the more efficient annealing effect for cell piece.
Further, the carrier of use can effectively stack a large amount of cell piece of carrying, while convenient for different size electricity Arrangement of the pond piece on carrier, in addition, the structure of carrier is more suitable for the annealing feature of the cell piece in the utility model, first Metal heater plate, the second metal heater plate can directly contact the surface of cell piece, can cell piece are powered or be led Heat is generated heat, up and down to cell piece annealing heating using electric heating in the utility model when being powered using silicon wafer self-resistance Metal heater plate in auxiliary thermal is auxiliary heating, can open or close auxiliary heat by actual production demand to maintain cell piece temperature The uniformity of degree, more preferably to improve annealing effect.
Detailed description of the invention
Some specific realities of the utility model are described in detail by way of example and not limitation with reference to the accompanying drawings hereinafter Apply example.Identical appended drawing reference denotes same or similar part or part in attached drawing.It should be appreciated by those skilled in the art that The drawings are not necessarily drawn to scale.In attached drawing:
Fig. 1 is the overall structure diagram according to the electrical pumping equilibrium annealing device of the utility model one embodiment;
Fig. 2 is the side block diagram of the reverse current injection station of the annealing device of electrical pumping equilibrium shown in Fig. 1;
Fig. 3 is the structural schematic diagram of the carrier used in electrical pumping annealing device shown in Fig. 1.
Wherein, the reference numerals are as follows:
1, chassis body, 11, horizontal frame;
2, idler wheel transportation system, 21, idler wheel, 22, motor driven chain, 23, be arranged roller shaft groove body, 24, carrier return Conveying device;
3, feeding station;
4, reverse current injects station, 41, high-temperature technology chamber, 42, low temperature process chamber, 43, first electrode cylinder, and 44, the One arc-spark stand, 45, second electrode cylinder, 46, second electrode frame, 47, insulated door, 48, lifting cylinder;
5, cooling station, 51, fan;
6, discharge station;
7, carrier, 71, collet, 72, baffle, 73, jam plate;
8, cell piece;
91, upper auxiliary thermal, the 911, first metal heater plate, 92, under auxiliary thermal, the 921, second metal heater plate, 93, Infrared sensor, 941, upper gas circuit, 942, middle gas circuit, 943, lower gas circuit;
10, extractor fan;11, gas flow display device.
Specific embodiment
The technical solution of the utility model is clearly and completely described below in conjunction with attached drawing, it is clear that described Embodiment is the utility model a part of the embodiment, instead of all the embodiments.Based on the embodiments of the present invention, originally Field those of ordinary skill every other embodiment obtained without making creative work belongs to practical Novel protected range.
It is in the description of the present invention, it should be noted that term " center ", "upper", "lower", "left", "right", " perpendicular Directly ", the orientation or positional relationship of the instructions such as "horizontal", "inner", "outside" is to be based on the orientation or positional relationship shown in the drawings, and is only For ease of description the utility model and simplify description, rather than the device or element of indication or suggestion meaning must have it is specific Orientation, be constructed and operated in a specific orientation, therefore should not be understood as limiting the present invention.In addition, term " the One ", " second ", " third " are used for descriptive purposes only and cannot be understood as indicating or suggesting relative importance.
In addition, as long as technical characteristic involved in the utility model different embodiments disclosed below is each other Not constituting conflict can be combined with each other.
Electrical pumping equilibrium annealing device described in the present embodiment, for the annealing of cell piece 8, as shown in Figure 1, packet Chassis body 1 is included, the bottom of the chassis body 1 is provided with idler wheel transportation system 2, along the traveling side of the idler wheel transportation system Feeding station 3, reverse current injection station 4, cooling station 5 and discharge station 6 are sequentially provided with into the chassis body 1, Carrier 7 for carrying cell piece 8 successively injects work by the feeding station 3, reverse current through the idler wheel transportation system Position 4, cooling station 5 and discharge station 6 are made annealing treatment, wherein the process of annealing is in reverse current injection station 4 It completes, anneals while electrical pumping.Auxiliary fast cooling is provided in cooling station 5 and discharge station 6 Fan improves cooling efficiency.
Particularly, the reverse current injection station 4 is used to carry out electrical pumping, institute to the cell piece 8 in the carrier 7 It states in reverse current injection station 4 and is equipped at least two process cavities.Electrical pumping annealing device in the present embodiment, including indulge in either simplex An equal feeding station 3 of bit length, three cooling stations 5 and a discharge station 6, and the reverse current injects work Be equipped with eight process cavities in position 4, and the length (press direction of transfer) of each process cavity be equal to one feeding station 3(or One cooling station, 5, discharge stations 6) length.
With each process time for a productive temp, one productive temp of every completions, the carrier 7 in annealing device is integrally Move forward a station, and according to the principle first gone out is arrived first, the carrier 7 being put into earliest completes all techniques earliest and moves to discharging area, Wait feeding.Station 4 is injected in reverse current, carrier 7 is limited by position sensor after being moved to process cavity, tumbled It stops operating, direct current is introduced by the metal heater plate in upper and lower auxiliary thermal, then electrical pumping heating is carried out to cell piece 8, In conjunction with external upper auxiliary thermal 91, auxiliary thermal 92 can guarantee that cell piece 8 is heated evenly under, and annealing quality is good.In addition, It is worth under explanation, DC power supply can be installed directly and is fixed in chassis body 1, convenient for the introducing of direct current.
The annealing device of the present embodiment, reverse current, which injects station 4, to be used to carry out the cell piece 8 in the carrier 7 Electrical pumping realizes the electrical pumping to cell piece 8 in this way while annealing to cell piece 8, under such electrical pumping situation Annealing can be improved the transfer efficiency of cell piece 8, the photo attenuation of high-efficiency battery is reduced, to guarantee that the efficiency of battery increases Benefit.
One group of concurrent heating system is equipped in each process cavity, every group of concurrent heating system includes upper auxiliary thermal 91 auxiliary thermal under 92, for carrying out auxiliary heating to the cell piece 8 carried on carrier 7 to maintain about 8 temperature equalization of cell piece.For being stacked on If dry plate cell piece 8 together, by carrying out detection to its upper and lower temperature and carrying out the difference of the two with the threshold value set Compare, can guarantee that the temperature of each cell piece 8 is kept at a steady state, bulk temperature is more balanced, can guarantee The annealing consistency of each cell piece 8, properties of product are more superior.
Correspond to each process cavity in reverse current injection station 4 and be each configured with a current implantation systems, Each current implantation systems include first electrode cylinder 43, first electrode frame 44, second electrode cylinder 45 and second electrode Frame 46, the first electrode cylinder 43 are fixed in the chassis body 1 vertically and are located at the top of each process cavity, and described the One arc-spark stand 44 is fixed on the bottom of the first electrode cylinder 43, and the upper auxiliary thermal 91 is fixed under the arc-spark stand Side, the second electrode cylinder 45 are fixed in the chassis body 1 vertically and are located at the lower section of each process cavity, and described second Arc-spark stand 46 is fixed on the top of the second electrode cylinder 45, and auxiliary thermal 92 is fixed on the second electrode frame 46 under described Top.After carrier 7 drives cell piece 8 to enter process cavity, first electrode cylinder 43, which pushes, drives the upper auxiliary thermal 91 Move down, second electrode cylinder 45 move up drive it is described under auxiliary thermal 92 move up, the so upper auxiliary thermal under of auxiliary thermal 91 92 after pushing down cell piece 8 simultaneously up and down, outer housing injection silicon wafer of the direct current through upper auxiliary thermal 91, upper auxiliary thermal 91, Auxiliary 92 three of thermal under of cell piece 8 constitutes the circuit of electric current injection.
Particularly, as shown in Fig. 2, the upper auxiliary thermal 91 includes the first gold medal being fixedly connected below the arc-spark stand Belong to heating plate 911, is configured in first metal heater plate 911 for incuding the first of 911 temperature of the first metal heater plate Thermocouple (is not shown in the figure, the setting of thermocouple uses conventional arrangement, and details are not described herein), and auxiliary thermal 92 includes under described The second metal heater plate 921 being fixed in the chassis body 1, second metal heater plate 921 are interior configured with for feeling Answer the second thermocouple (being not shown in the figure, ibid) of 921 temperature of the second metal heater plate, wherein first metal heater plate 911, the shell of the second metal heater plate 921 is used to import DC power supply simultaneously, to being clamped in first metal heater plate 911, the cell piece 8 between the second metal heater plate 921 carries out electrical pumping.Correspond in the side plate of the chassis body 1 and stacks The middle part of cell piece 8 on carrier 7 is provided with infrared sensor 93, and the infrared sensor 93 is located at cell piece for detecting 8 temperature.
First thermocouple is measured into 911 temperature of the first metal heater plate, compared with setting value, temperature is lower than setting value The first metal heater plate 911 is then opened, conversely, then close the first metal heater plate 911, thus keeps 911 heater of top Constant temperature.Second thermocouple measures the second METAL HEATING PROCESS plate temperature 921, and compared with setting value, temperature is lower than setting value, opens Two metal heater plates 921, conversely, thus then closing the second metal heater plate 921 keeps 921 constant temperature of the second metal heater plate. Infrared sensor 93 measures 8 temperature of cell piece, and compared with setting value, when temperature is lower than setting value, gas circuit can be closed, temperature ratio When setting value is high, gas circuit can be opened, and remaining internal in this way is the uniform constant temperature field of temperature.
It can be appreciated that can so temperature detection and heat compensation be carried out for the whole of the cell piece 8 that heap is folded, so that Upper and lower temperature is consistent, while the outer housing of metal heater plate can serve as the conductive mechanism of external power supply importing, so that whole Structure is more compact, while the face contact between metal heater plate shell and cell piece 8 can guarantee reliably importing and walk for electric current To uniformity.
It is found that the present embodiment process cavity configured with high temperature and low temperature in reverse current injection station 4, and in technique It is configured with concurrent heating system in chamber, can be realized the carry out temperature-compensating for cell piece 8 in each process cavity, realizes for cell piece Annealing under 8 different temperatures, and controlled by upper and lower and middle part temperature of the thermocouple to cell piece 8 in each process cavity, The bulk temperature for the cell piece 8 that heap is folded is adjusted, to realize the more efficient annealing effect for cell piece 8, improves cell piece 8 Transfer efficiency.
Such as spoke hot systems in the reverse current injection station 4 in the present embodiment are not only able to carry out heat compensation, moreover it is possible to Enough heats in each process cavity carry out it is balanced if, being undoubtedly more able to maintain all cell pieces 8, to be able to maintain temperature consistent. Concurrent heating system described in the present embodiment further includes soaking gas path device, and the soaking gas path device includes the fixed chassis body It is fixed with gas circuit 941, middle gas circuit 942 and lower gas circuit 943 in the middle part of 1 side plate, opens or closes the upper gas circuit 941, middle gas It is equal to improve gas flowing progress heat for 8 air blast of cell piece to stacking on the carrier 7 for road 942 or lower gas circuit 943 Cloth.
Preferably, the multiple process cavity includes at least one high-temperature technology chamber 41 and at least one low temperature process chamber 42, In the present embodiment, 7 low temperature process chambers 42 including the fore 1 high-temperature technology chamber 41 of setting, rear portion.The carrier 7 It drives the first annealing in high-temperature technology chamber 41 of cell piece 8 to enter back into the low temperature process chamber 42 to anneal.
In addition, being provided at the top of the chassis body 1 for the extractor fan 10 to each station exhausting temperature control, anti- Middle pressure draught fan is equipped with into electric current injection station 4, the top of the reverse current injection station 4 is arranged in medium pressure blower, For controlling the temperature of the reverse current injection station 4 in exhausting deficiency, in four walls of reverse current injection station 4 It is equipped with heat preservation siding, and is provided with insulated door 47 between each station, is equipped with lifting air in the side edge of insulated door 47 Cylinder 48, the lifting cylinder 48 are connected by connecting plate with the insulated door 47, and lifting cylinder 48 is used for cooperating beat band Move the movement of the insulated door 47.The internal layer of the insulated door 47 is equipped with thermal insulation layer, is sandwiched between thermal insulation material, can reduce Process cavity heat loss speed makes process cavity have excellent thermal insulation property, energy-saving.
In addition, the idler wheel transportation system 2 includes more idler wheels 21 continuous and disposed in parallel, idler wheel 21 passes through its end The transmission of chain 22 is driven by motor directly to drive in the idler wheel axis connection motor driven chain 22 of setting, the idler wheel 21.On roller shaft It is sequentially arranged with c-type snap ring, fixed ring, bearing and bearing block flange.After dismantling bearing block flange can directly by idler wheel 21 and Its component is from intracavitary extraction, so that dismounting convenience, structure is simple, convenient operating maintenance.The bearing of the roller shaft is arranged in slot On body 23, the groove body 23 is fixed by adjusting bolt along the length direction level that the chassis body 1 raises horizontal frame 11, The adjusting bolt is vertically arranged, for adjusting the upper-lower height of the groove body 23 and then adjusting the idler wheel transportation system 2 It is horizontal.
In addition, being provided with carrier on the downside of chassis body 1 returns conveying device 24, for that will complete the carrier of annealing under Material section is delivered to feeding section, helps to improve working efficiency.
In addition, gas flow display device 11 is provided on the outside of chassis body 1, for gas flow in each process cavity It is shown, sufficient gas flowing can guarantee that the temperature in process cavity is more uniform.
In the present embodiment, the carrier 7 includes collet 71 made of mica, is fixed with several on the collet 71 The baffle 72 being vertically arranged, several described baffles 72 limit the carrying cavity of placing battery plate 8 on the collet 71, In, the bottom of the collet 71 has aperture, passes through to contact heap with the second metal heater plate 921 in auxiliary thermal under facilitating Folded lowest level cell piece 8.It is also symmetrically arranged at least one set of jam plate 73 on the collet 71 of the carrier 7, is limited for locking Fixed position of the cell piece on collet 71.
Since the carrier 7 that the present embodiment uses can effectively stack a large amount of cell piece 8 of carrying, while being convenient for different size Arrangement of the cell piece 8 on carrier 7, in addition, the annealing that the structure of carrier 7 is more suitable for the cell piece 8 in the utility model is special Point, the first metal heater plate 911, the second metal heater plate 921 can directly contact the surface of cell piece 8, can be to cell piece 8 Energization or thermally conductive is carried out, to 8 annealing heating of cell piece using electric heating in the utility model, using as cell piece Silicon wafer self-resistance generates heat when being powered, and the metal heater plate in upper and lower auxiliary thermal is auxiliary heating, can be by actual production demand Auxiliary heat is opened or closed to maintain the uniformity of cell piece temperature, more preferably to improve annealing effect.
The above embodiments are only for explaining the technical ideas and features of the present invention, and its object is to allow be familiar with technique Personage can understand the content of the utility model and implement accordingly, do not limit the protection scope of the present invention, All equivalent change or modifications according to made by the spirit of the present invention essence, should all cover the protection scope of the utility model it It is interior.

Claims (9)

1. a kind of electrical pumping equilibrium annealing device is annealed for cell piece, including chassis body, the bottom of the chassis body are set It is equipped with idler wheel transportation system, is sequentially provided with feeding work in chassis body described in the direction of travel along the idler wheel transportation system Position, reverse current injection station, cooling station and discharge station, for carrying the carrier of cell piece through the idler wheel transportation system Successively made annealing treatment by the feeding station, reverse current injection station, cooling station and discharge station, it is described reversed Electric current injects station and is used to carry out the cell piece in the carrier electrical pumping, includes multiple in the reverse current injection station Process cavity, which is characterized in that one group of concurrent heating system is equipped in each process cavity, it is auxiliary for being carried out to the cell piece carried on carrier Help heating to maintain cell piece or more temperature equalization.
2. electrical pumping equilibrium annealing device according to claim 1, which is characterized in that every group of concurrent heating system includes upper auxiliary heat Device and under auxiliary thermal, the upper auxiliary thermal includes the first metal heater plate being fixedly connected below arc-spark stand, described the Configured with the first thermocouple for incuding upper cell piece temperature in one metal heater plate, auxiliary thermal includes fixing under described The second metal heater plate in the chassis body, second metal heater plate is interior to be configured with the second thermocouple, wherein institute State the first metal heater plate, the second metal heater plate shell and meanwhile be used to import DC power supply, to being clamped in first gold medal The cell piece belonged between heating plate, the second metal heater plate carries out electrical pumping.
3. electrical pumping equilibrium annealing device according to claim 2, which is characterized in that inject station in the reverse current In correspond to each process cavity be each configured with a current implantation systems, the current implantation systems include first electrode gas Cylinder, first electrode frame, second electrode cylinder and second electrode frame, the first electrode cylinder are fixed on the chassis body vertically The top of each process cavity is gone up and is located at, the first electrode frame is fixed on the bottom of the first electrode cylinder, described auxiliary Thermal is fixed on the lower section of the arc-spark stand, and the second electrode cylinder is fixed in the chassis body vertically and is located at every The lower section of a process cavity, the second electrode frame are fixed on the top of the second electrode cylinder, and auxiliary thermal is fixed under described In the top of the second electrode frame.
4. electrical pumping equilibrium annealing device according to claim 3, which is characterized in that in the side plate pair of the chassis body Ying Yu, which is stacked in the middle part of the cell piece on carrier, is provided with infrared sensor, and the infrared sensor is located at middle part for detecting Cell piece temperature.
5. electrical pumping equilibrium annealing device according to any one of claim 1 to 4, which is characterized in that the auxiliary heat system System further includes soaking gas path device, and the soaking gas path device includes that the side plate middle part of the fixed chassis body is fixed with gas Road, middle gas circuit and lower gas circuit, open or close the upper gas circuit, middle gas circuit or lower gas circuit, for stacking on the carrier Cell piece air blast, improving gas flowing, to carry out heat uniformly distributed.
6. electrical pumping equilibrium annealing device according to claim 1, which is characterized in that the multiple process cavity includes at least One high-temperature technology chamber and at least one low temperature process chamber, the carrier drive cell piece first anneal in high-temperature technology chamber again into Enter the low temperature process chamber to anneal.
7. electrical pumping equilibrium annealing device according to claim 1, which is characterized in that set at the top of the chassis body It is equipped with for the extractor fan to each station exhausting temperature control, is equipped with Middle pressure draught fan, medium pressure in reverse current injection station The top of the reverse current injection station is arranged in blower, for controlling the reverse current injection station in exhausting deficiency Temperature, heat preservation siding is equipped on four walls of reverse current injection station, and be provided between each station every Hot topic is equipped with lifting cylinder in the side edge of insulated door, and the lifting cylinder is connected by connecting plate with the insulated door.
8. electrical pumping equilibrium annealing device according to claim 1, which is characterized in that the carrier includes being made of mica Collet, several baffles being vertically arranged are fixed on the collet, several described baffles limit on the collet The carrying cavity of placing battery plate out, wherein the bottom of the collet has aperture, stacks for the contact of the second metal heater plate Lowest level cell piece, at least one set of jam plate is also symmetrically arranged on the collet of the carrier, limits the electricity for locking Position of the pond piece on collet.
9. electrical pumping equilibrium annealing device according to claim 1, which is characterized in that the idler wheel transportation system includes more Root is continuous and idler wheel disposed in parallel, the idler wheel axis connection motor driven chain that idler wheel is arranged by its end, the idler wheel are direct Chain conveyer is driven by motor to drive, c-type snap ring, fixed ring, bearing and bearing block flange are sequentially arranged on roller shaft.
CN201820735805.4U 2018-05-17 2018-05-17 A kind of electrical pumping equilibrium annealing device Active CN208352320U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021120495A1 (en) * 2019-12-17 2021-06-24 苏州巨能图像检测技术有限公司 Solar cell electrical injection device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021120495A1 (en) * 2019-12-17 2021-06-24 苏州巨能图像检测技术有限公司 Solar cell electrical injection device

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