CN108469718A - A kind of developing method and device of mask - Google Patents
A kind of developing method and device of mask Download PDFInfo
- Publication number
- CN108469718A CN108469718A CN201810360554.0A CN201810360554A CN108469718A CN 108469718 A CN108469718 A CN 108469718A CN 201810360554 A CN201810360554 A CN 201810360554A CN 108469718 A CN108469718 A CN 108469718A
- Authority
- CN
- China
- Prior art keywords
- mask
- developer solution
- development
- nozzle
- plummer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 19
- 239000007921 spray Substances 0.000 claims abstract description 19
- 239000007788 liquid Substances 0.000 claims abstract description 7
- 230000002093 peripheral effect Effects 0.000 claims abstract description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 238000000605 extraction Methods 0.000 claims description 5
- 230000035484 reaction time Effects 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
Abstract
The present invention provides a kind of developing methods of mask, and the present invention also provides the developing apparatus for using this method.It can guarantee that the developer solution covering of mask center and edge is uniform, and effect promotes the development of the wide uniformity of mask strips.A kind of developing method of mask, it is characterised in that：It is arranged above development nozzle round plummer, the cross section of the development nozzle is rectangular shape, diameter of the cornerwise length of the development nozzle not less than the round plummer, and development nozzle is horizontally parallel to the round plummer arrangement, the spray apertures of rectangular array arrangement are evenly equipped on the lower face of the development nozzle, the spray apertures are disposed vertically downward, mask is installed in the plummer upper surface, while driving plummer rotation, developer solution is pumped by liquid pump and covers the face domain corresponding to the mask of lower section by spray apertures by the development nozzle, in mask rotary course, at the center and peripheral of developer solution uniform fold mask.
Description
Technical field
The present invention relates to the technical field of mask development, specially a kind of developing method of mask, the present invention also provides
Use the developing apparatus of this method.
Background technology
Due to the effect of Moore's Law, semiconductor devices becomes smaller and smaller, the pattern dimension formed on wafer also with
Become smaller, with wafer size become larger and to develop resolution requirement promotion, for wanting for the wide uniformity of item in technique
It asks and is also improving, since the item width of mask and wafer is a certain proportion of projection relation, to the wide uniformity of the item of mask
It is required that being also increasingly stringenter.The influence wherein developed to line width uniformity is very big, previous developing method, by platform in blocks
Several spray tubes are arranged in top, and then every spray tube docks a nozzle so that the developer solution that nozzle sprays is coated on fixation
On the mask of platform in blocks, since nozzle cannot cover all regions, developer solution at center and peripheral can be caused to cover not
The poor problem of the wide uniformity of item caused by uniformly.
Invention content
In view of the above-mentioned problems, the present invention provides a kind of developing method of mask, mask center and edge can guarantee
Developer solution covering it is uniform, effect promotes the development of the wide uniformity of mask strips.
A kind of developing method of mask, it is characterised in that：It is arranged above development nozzle round plummer, described
The cross section of development nozzle is rectangular shape, and cornerwise length of the development nozzle is straight not less than the round plummer
Diameter, and development nozzle is horizontally parallel to the round plummer arrangement, it is evenly equipped with rectangle on the lower face of the development nozzle
The spray apertures of array arrangement, the spray apertures are disposed vertically downward, and mask is installed in the plummer upper surface, driving carrying
While platform rotates, developer solution is pumped by liquid pump and is covered corresponding to the mask of lower section by spray apertures by the development nozzle
Face domain, in mask rotary course, at the center and peripheral of developer solution uniform fold mask.
It is further characterized by：The face domain center of the development nozzle coincides with the face domain center of the round plummer
Arrangement；
Cornerwise length of the development spraying is equal to the diameter of the round plummer, it is ensured that cost of manufacture is minimum；
When the developer solution is pumped into development nozzle：The developer temperatur is 22 ± 1 DEG C, the flow of developer solution is 200~
260L/min, solution level are 2%~3%, and developer solution reaction time 100s~150s, spray pressure is 0.2~0.3MPa；
Preferably, the rotary speed of the plummer is 10~5000rpm/min；
A concentration of the 2.38% of the developer solution.
A kind of developing apparatus of mask, it is characterised in that：It includes the development shell of upper surface opening, the bottom for the shell that develops
Portion is provided with recessed developer solution outflow chamber, and the developer solution outflow chamber flows out extra developer solution by external discharge pipe, described aobvious
The bottom centre position of shadow liquid shell through the inner cavity of the shaft for having rotation suction nozzle, the rotation suction nozzle by being provided with gas circuit chamber
Body, the gas circuit cavity are external to air extraction structure by connecting gas circuit, and the upper surface of the rotation suction nozzle is for sticking mask
The top ring wall of lower face, the development shell is provided with developer solution cavity, and the outer ring surface of the developer solution cavity is separately connected
There are water inlet, high concentration developer solution entrance, at least two efferent ducts are provided on the inner ring surface of the developer solution cavity, it is described defeated
The output end of outlet pipe is respectively and fixedly connected with the input terminal of development nozzle, and the output end of the development nozzle is disposed with the nozzle of rectangular array
Hole, the showerhead hole are disposed vertically downward, and the development nozzle is located at the surface arrangement of the rotation suction nozzle, and the rotation is inhaled
Head is round plummer, and the cross section of the development nozzle is rectangle, the catercorner length of the cross section of the development nozzle
Not less than the mask diameters.
It is further characterized by：The gas circuit cavity to connection gas circuit positioned at the vertical of spindle central by being external to pumping
Depressed structure；
The high concentration developer solution entrance is circumscribed with developer solution inlet tube, and the outer ring surface of the developer solution inlet tube is set with
Water jacket；
Two efferent ducts are provided on the inner ring surface of the development cavity, two efferent ducts are located at the rotation suction nozzle
Both sides arrangement, two differences of the vertical upper surface that the development nozzle is respectively and fixedly connected with to output end of two efferent ducts
Position, it is ensured that the solid and reliable convenient installation for the nozzle that develops；
The development inside cavity is provided with pump configuration, which is used to adjust the stream that developer solution enters development nozzle
Amount；
It is provided with thermometer in the development cavity, it is ensured that the temperature for being pumped into the developer solution of development nozzle reaches design and wants
It asks.
After applying the present invention, by using mask rotation, the development fixed method of nozzle, when can shorten developer solution coating
Between, simultaneously because developer solution is pumped by liquid pump and covers the face corresponding to the mask of lower section by spray apertures by development nozzle
Domain improves the developer solution uneven problem of at the heart and edge covering in the mask, improves line width uniformity.
Description of the drawings
Fig. 1 is the structure schematic diagram of the device of the invention；
Fig. 2 is the face domain projection relation structural schematic diagram of the development nozzle and mask of the device of the invention；
Title in figure corresponding to serial number is as follows：
Develop shell 1, developer solution outflow chamber 2, discharge pipe 3, rotation suction nozzle 4, shaft 5, connection gas circuit 6, developer solution cavity
7, water inlet 8, high concentration developer solution entrance 9, efferent duct 10, development nozzle 11, showerhead hole 12, developer solution inlet tube 13, water jacket
14, vertically to output end 15, mask 16.
Specific implementation mode
A kind of developing method of mask：It is arranged above development nozzle round plummer, the nozzle that develops it is transversal
Face is rectangular shape, and the cornerwise length for the nozzle that develops is not less than the diameter of round plummer, and development nozzle level is put down
Row arranges in round plummer, is evenly equipped with the spray apertures of rectangular array arrangement on the lower face for the nozzle that develops, spray apertures vertically to
Mask is installed in plummer upper surface by lower arrangement, and while driving plummer rotates, development nozzle will be developed by liquid pump
Liquid pump enters and covers the face domain corresponding to the mask of lower section by spray apertures, and in mask rotary course, developer solution uniform fold is covered
At the center and peripheral of mould.
The face domain center of development nozzle coincides with the face domain center arrangement of round plummer；
Cornerwise length of development spraying is equal to the diameter of round plummer, it is ensured that cost of manufacture is minimum；
When developer solution is pumped into development nozzle：Developer temperatur is 22 ± 1 DEG C, and the flow of developer solution is 200~260L/
Min, solution level are 2%~3%, and developer solution reaction time 100s~150s, spray pressure is 0.2~0.3MPa；
The rotary speed of plummer is 10~5000rpm/min；
In specific embodiment, a concentration of the 2.38% of developer solution, it is obtained by water and the mixing of high concentration developer solution.
A kind of developing apparatus of mask, is shown in Fig. 1, Fig. 2：It includes the development shell 1 of upper surface opening, development shell 1
Bottom is provided with recessed developer solution outflow chamber 2, and developer solution outflow chamber 2 flows out extra developer solution, developer solution by external discharge pipe 3
The bottom centre position of shell 1 through the inner cavity of the shaft 5 for having rotation suction nozzle 4, rotation suction nozzle 4 by being provided with gas circuit cavity, gas
Road cavity is external to air extraction structure (being not drawn into figure) by connecting gas circuit 6, and the upper surface of rotation suction nozzle 4 is for sticking mask
The top ring wall of lower face, development shell 1 is provided with developer solution cavity 7, and the outer ring surface of developer solution cavity 7 is connected separately with water and enters
Mouthfuls 8, high concentration developer solution entrance 9 is provided at least two efferent ducts 10 on the inner ring surface of developer solution cavity 7, efferent duct 10
Output end is respectively and fixedly connected with the input terminal of development nozzle 11, and the output end of development nozzle 11 is disposed with the showerhead hole 12 of rectangular array,
Showerhead hole 12 is disposed vertically downward, and development nozzle 11 is located at the surface arrangement of rotation suction nozzle 4, and rotation suction nozzle 4 is that circle is held
The cross section of microscope carrier, development nozzle 11 is rectangle, and the catercorner length of the cross section for the nozzle 11 that develops is straight not less than mask 16
Diameter.
Gas circuit cavity to connection gas circuit positioned at the vertical of 5 center of shaft by being external to air extraction structure；
High concentration developer solution entrance 9 is circumscribed with developer solution inlet tube 13, and the outer ring surface of developer solution inlet tube 13 is set with water
Set 14；
Two efferent ducts 10 are provided on the inner ring surface of development cavity 7, two efferent ducts 10 are located at the both sides of rotation suction nozzle 4
Arrangement, two different locations of the vertical upper surface that development nozzle 11 is respectively and fixedly connected with to output end 15 of two efferent ducts 10, really
Protect the solid and reliable convenient installation of development nozzle 11；
Development cavity 7 is internally provided with pump configuration and (is not drawn into figure, arranges corresponding model and position according to actual conditions
Set), which is used to adjust the flow that developer solution enters development nozzle 11；
Thermometer (be not drawn into figure, arrange corresponding model and position according to actual conditions) is provided in development cavity 7,
Ensure that the temperature for being pumped into the developer solution of development nozzle 11 reaches design requirement.
Specific embodiments of the present invention are described in detail above, but content is only the preferable implementation of the invention
Example, should not be construed as limiting the practical range of the invention.It is all to become according to impartial made by the invention application range
Change and improve etc., it should all still belong within this patent covering scope.
Claims (10)
1. a kind of developing method of mask, it is characterised in that：It is arranged above development nozzle round plummer, described aobvious
The cross section of shadow nozzle is rectangular shape, and cornerwise length of the development nozzle is straight not less than the round plummer
Diameter, and development nozzle is horizontally parallel to the round plummer arrangement, it is evenly equipped with rectangle on the lower face of the development nozzle
The spray apertures of array arrangement, the spray apertures are disposed vertically downward, and mask is installed in the plummer upper surface, driving carrying
While platform rotates, developer solution is pumped by liquid pump and is covered corresponding to the mask of lower section by spray apertures by the development nozzle
Face domain, in mask rotary course, at the center and peripheral of developer solution uniform fold mask.
2. a kind of developing method of mask as described in claim 1, it is characterised in that：The face domain center weight of the development nozzle
Together in the face domain center arrangement of the round plummer.
3. a kind of developing method of mask as claimed in claim 2, it is characterised in that：Cornerwise length of the development spraying
Degree is equal to the diameter of the round plummer.
4. a kind of developing method of mask as claimed in claim 3, it is characterised in that：The developer solution is pumped into development nozzle
When：The developer temperatur is 22 ± 1 DEG C, and the flow of developer solution is 200~260L/min, and solution level is 2%~3%,
Developer solution reaction time 100s~150s, spray pressure are 0.2~0.3MPa.
5. a kind of developing method of mask as claimed in claim 4, it is characterised in that：The rotary speed of the plummer is 10
~5000rpm/min.
6. a kind of developing method of mask as claimed in claim 4, it is characterised in that：The developer solution it is a concentration of
2.38%.
7. a kind of developing apparatus of mask, it is characterised in that：It includes the development shell of upper surface opening, the bottom for the shell that develops
It is provided with recessed developer solution outflow chamber, the developer solution outflow chamber flows out extra developer solution, the development by external discharge pipe
Liquid shell bottom centre position by through have rotation suction nozzle shaft, it is described rotation suction nozzle inner cavity be provided with gas circuit cavity,
The gas circuit cavity is external to air extraction structure by connecting gas circuit, and the upper surface of the rotation suction nozzle is used for the lower end of sticking mask
The top ring wall in face, the development shell is provided with developer solution cavity, and the outer ring surface of the developer solution cavity is connected separately with water
Entrance, high concentration developer solution entrance are provided at least two efferent ducts, the efferent duct on the inner ring surface of the developer solution cavity
Output end be respectively and fixedly connected with the input terminal of development nozzle, the output end of the development nozzle is disposed with the showerhead hole of rectangular array,
The showerhead hole is disposed vertically downward, and the development nozzle is located at the surface arrangement of the rotation suction nozzle, the rotation suction nozzle
The cross section of as round plummer, the development nozzle is rectangle, and the catercorner length of the cross section of the development nozzle is not
Less than the mask diameters.
8. a kind of developing apparatus of mask as claimed in claim 7, it is characterised in that：The gas circuit cavity is by being located at shaft
The vertical of center is external to air extraction structure to connection gas circuit.
9. a kind of developing apparatus of mask as claimed in claim 7, it is characterised in that：The high concentration developer solution entrance is external
There are developer solution inlet tube, the outer ring surface of the developer solution inlet tube to be set with water jacket.
10. a kind of developing apparatus of mask as claimed in claim 7, it is characterised in that：On the inner ring surface of the development cavity
It is provided with two efferent ducts, two efferent ducts are located at the both sides arrangement of the rotation suction nozzle, and two efferent ducts hang down
Two different locations of the upper surface of the development nozzle are directly respectively and fixedly connected with to output end.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810360554.0A CN108469718A (en) | 2018-04-20 | 2018-04-20 | A kind of developing method and device of mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810360554.0A CN108469718A (en) | 2018-04-20 | 2018-04-20 | A kind of developing method and device of mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108469718A true CN108469718A (en) | 2018-08-31 |
Family
ID=63263364
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810360554.0A Pending CN108469718A (en) | 2018-04-20 | 2018-04-20 | A kind of developing method and device of mask |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108469718A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112612188A (en) * | 2020-12-17 | 2021-04-06 | 泉芯集成电路制造(济南)有限公司 | Developing device |
| WO2023050198A1 (en) * | 2021-09-29 | 2023-04-06 | 华为技术有限公司 | Developing device, developing method, and dispensing developing system |
Citations (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4281620A (en) * | 1979-09-28 | 1981-08-04 | Xerox Corporation | Liquid developer spear head access mechanism |
| JPH05257390A (en) * | 1992-03-11 | 1993-10-08 | Olympus Optical Co Ltd | Wet type developing device |
| JPH06314031A (en) * | 1993-04-30 | 1994-11-08 | Olympus Optical Co Ltd | Liquid developing device |
| JPH1012529A (en) * | 1996-06-26 | 1998-01-16 | Advanced Display:Kk | Method and apparatus for resist developing |
| JP2000124126A (en) * | 1998-02-17 | 2000-04-28 | Ishikawa Seisakusho Ltd | Developing solution discharge nozzle for resist developing apparatus |
| KR20010008673A (en) * | 1999-07-02 | 2001-02-05 | 윤종용 | A mask develop apparatus |
| KR20020061797A (en) * | 2001-01-18 | 2002-07-25 | 삼성전자 주식회사 | Ink delivery system for liquid color printer |
| JP2002316084A (en) * | 2001-04-19 | 2002-10-29 | Tdk Corp | Spin coating apparatus using mask and mask for spin coating |
| JP2003007581A (en) * | 2001-06-19 | 2003-01-10 | Matsushita Electric Ind Co Ltd | Developing method and developer |
| JP2005251908A (en) * | 2004-03-03 | 2005-09-15 | Tokyo Electron Ltd | Development processor |
| CN1918694A (en) * | 2003-12-26 | 2007-02-21 | 东京毅力科创株式会社 | Development device and developing method |
| KR20080072415A (en) * | 2007-02-02 | 2008-08-06 | 주식회사 하이닉스반도체 | Apparatus of developer for manufacturing mask |
| CN101382742A (en) * | 2008-10-15 | 2009-03-11 | 清溢精密光电（深圳）有限公司 | Developing method for mask plate |
| CN102096343A (en) * | 2009-12-09 | 2011-06-15 | 北大方正集团有限公司 | Developing cavity and developing machine base |
| CN202794854U (en) * | 2012-10-11 | 2013-03-13 | 中芯国际集成电路制造(北京)有限公司 | Developing device |
| CN103809388A (en) * | 2012-11-06 | 2014-05-21 | 沈阳芯源微电子设备有限公司 | Developing method |
| CN103809390A (en) * | 2012-11-14 | 2014-05-21 | 沈阳芯源微电子设备有限公司 | Developing nozzle |
| CN104122905A (en) * | 2013-04-28 | 2014-10-29 | 天津市德堡印刷有限公司 | Printing developer concentration adjusting and control device |
| CN104122762A (en) * | 2013-04-28 | 2014-10-29 | 天津市德堡印刷有限公司 | Developing liquid recycling equipment |
| WO2015039484A1 (en) * | 2013-09-17 | 2015-03-26 | 珠海赛纳打印科技股份有限公司 | Developer supply device |
| CN106200280A (en) * | 2016-09-07 | 2016-12-07 | 深圳清溢光电股份有限公司 | A kind of sheathed developing method coordinated with slit liquid curtain |
| CN106610568A (en) * | 2015-10-27 | 2017-05-03 | 沈阳芯源微电子设备有限公司 | Glue coating development process module and control method for module internal environment parameters |
-
2018
- 2018-04-20 CN CN201810360554.0A patent/CN108469718A/en active Pending
Patent Citations (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4281620A (en) * | 1979-09-28 | 1981-08-04 | Xerox Corporation | Liquid developer spear head access mechanism |
| JPH05257390A (en) * | 1992-03-11 | 1993-10-08 | Olympus Optical Co Ltd | Wet type developing device |
| JPH06314031A (en) * | 1993-04-30 | 1994-11-08 | Olympus Optical Co Ltd | Liquid developing device |
| JPH1012529A (en) * | 1996-06-26 | 1998-01-16 | Advanced Display:Kk | Method and apparatus for resist developing |
| JP2000124126A (en) * | 1998-02-17 | 2000-04-28 | Ishikawa Seisakusho Ltd | Developing solution discharge nozzle for resist developing apparatus |
| KR20010008673A (en) * | 1999-07-02 | 2001-02-05 | 윤종용 | A mask develop apparatus |
| KR20020061797A (en) * | 2001-01-18 | 2002-07-25 | 삼성전자 주식회사 | Ink delivery system for liquid color printer |
| JP2002316084A (en) * | 2001-04-19 | 2002-10-29 | Tdk Corp | Spin coating apparatus using mask and mask for spin coating |
| JP2003007581A (en) * | 2001-06-19 | 2003-01-10 | Matsushita Electric Ind Co Ltd | Developing method and developer |
| CN1918694A (en) * | 2003-12-26 | 2007-02-21 | 东京毅力科创株式会社 | Development device and developing method |
| JP2005251908A (en) * | 2004-03-03 | 2005-09-15 | Tokyo Electron Ltd | Development processor |
| KR20080072415A (en) * | 2007-02-02 | 2008-08-06 | 주식회사 하이닉스반도체 | Apparatus of developer for manufacturing mask |
| CN101382742A (en) * | 2008-10-15 | 2009-03-11 | 清溢精密光电（深圳）有限公司 | Developing method for mask plate |
| CN102096343A (en) * | 2009-12-09 | 2011-06-15 | 北大方正集团有限公司 | Developing cavity and developing machine base |
| CN202794854U (en) * | 2012-10-11 | 2013-03-13 | 中芯国际集成电路制造(北京)有限公司 | Developing device |
| CN103809388A (en) * | 2012-11-06 | 2014-05-21 | 沈阳芯源微电子设备有限公司 | Developing method |
| CN103809390A (en) * | 2012-11-14 | 2014-05-21 | 沈阳芯源微电子设备有限公司 | Developing nozzle |
| CN104122905A (en) * | 2013-04-28 | 2014-10-29 | 天津市德堡印刷有限公司 | Printing developer concentration adjusting and control device |
| CN104122762A (en) * | 2013-04-28 | 2014-10-29 | 天津市德堡印刷有限公司 | Developing liquid recycling equipment |
| WO2015039484A1 (en) * | 2013-09-17 | 2015-03-26 | 珠海赛纳打印科技股份有限公司 | Developer supply device |
| CN106610568A (en) * | 2015-10-27 | 2017-05-03 | 沈阳芯源微电子设备有限公司 | Glue coating development process module and control method for module internal environment parameters |
| CN106200280A (en) * | 2016-09-07 | 2016-12-07 | 深圳清溢光电股份有限公司 | A kind of sheathed developing method coordinated with slit liquid curtain |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112612188A (en) * | 2020-12-17 | 2021-04-06 | 泉芯集成电路制造(济南)有限公司 | Developing device |
| WO2023050198A1 (en) * | 2021-09-29 | 2023-04-06 | 华为技术有限公司 | Developing device, developing method, and dispensing developing system |
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