CN102096343A - Developing cavity and developing machine base - Google Patents
Developing cavity and developing machine base Download PDFInfo
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- CN102096343A CN102096343A CN2009102421470A CN200910242147A CN102096343A CN 102096343 A CN102096343 A CN 102096343A CN 2009102421470 A CN2009102421470 A CN 2009102421470A CN 200910242147 A CN200910242147 A CN 200910242147A CN 102096343 A CN102096343 A CN 102096343A
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- developer solution
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- solution pipeline
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Abstract
The invention discloses a developing cavity and a developing machine base and relates to a technology for manufacturing a semiconductor chip. The developing cavity comprises a cavity body (201), a flushing pipeline (202) arranged in the cavity body, a developing solution pipeline (203) and a slide glass table (204), wherein the developing solution pipeline (203) has a diameter greater than 0.0625 inch, and a developing solution outlet of the developing solution pipeline (203) is formed above the slide glass table (204) and is vertical to the slide glass table (204). By increasing the diameter of a developing solution pipeline in the developing cavity and modifying the position of the developing solution outlet of the developing solution pipeline to be vertical to the slide glass table, the developing solution can be uniformly accumulated on a silicon chip in a shorter time; therefore, the developing effects of a series of small scale integration (SSI) series machine bases are optimized.
Description
Technical field
The present invention relates to the manufacturing technology of semi-conductor chip, relate in particular to development chamber and developing machine platform used in a kind of semi-conductor chip manufacture process.
Background technology
In the semi-conductor chip manufacture process, silicon chip needs and will the figure on the silicon chip be developed out through developing machine platform after gluing, exposure, the development capability of developing machine platform directly influence the homogeneity of figure live width in the silicon chip and number of defects purpose what.
The SSI board is the coating developing machine platform of producing in the semiconductor systems lnc. 80-90 of the company age, owing to the board capabilities limits, only is fit to do the technology of big live width.For the technology of little live width, the homogeneity of its live width is relatively poor, and the defective number is also more.
The development cavity configuration of SSI150 board comprises as shown in Figure 1: cavity 101, bath pipeline 102, developer solution pipeline 103 and slide holder 104, wherein:
The present inventor finds, because the diameter of development pipeline is too little, when the pressure of developer solution hour, the developer solution flow is less, reason owing to gravity, the fluid column of ejection and the angle between the silicon chip are greater than 45 degree, developer solution can't evenly be paved with whole silicon wafer, cause the silicon chip subregion to develop, perhaps development effect is very poor, though the time long enough of spray developer solution can reach fully and develop, developer solution is oversize towards the spray time in the subregion of silicon chip, can cause the live width of whole silicon wafer inhomogeneous; When developer solution pressure is big,, can not on silicon chip, gather, to such an extent as to can't develop because the effect of impulse force can make that again developer solution is thrown out of silicon chip easily.
Summary of the invention
The embodiment of the invention provides a kind of development chamber and developing machine platform, to optimize the development effect of SSI series board.
A kind of development chamber, comprise: cavity (201), be arranged on bath pipeline (202), developer solution pipeline (203) and slide holder (204) in the described cavity, the diameter of described developer solution pipeline (203) is greater than 0.0625 inch, and the developer solution flow export of described developer solution pipeline (203) is in described slide holder (204) top, and perpendicular to described slide holder (204).
Further, the diameter of described developer solution pipeline (203) is more than or equal to 0.1 inch, and is less than or equal to 0.5 inch.
Further, the diameter of described developer solution pipeline (203) is 0.26 inch.
Preferable, the developer solution flow export of described developer solution pipeline (203) be arranged on 1 centimetre-5 centimetres of described slide holder (204) distance centers the position directly over.
Better, the developer solution flow export of described developer solution pipeline (203) be arranged on 2 centimetres of described slide holder (204) distance centers the position directly over.
A kind of developing machine platform comprises the development chamber, and described development chamber comprises: cavity (201), bath pipeline (202), developer solution pipeline (203) and slide holder (204), wherein:
The diameter of described developer solution pipeline (203) is greater than 0.0625 inch, and the developer solution flow export of described developer solution pipeline (203) is in described slide holder (204) top, and perpendicular to described slide holder (204).
Further, the diameter of described developer solution pipeline (203) is more than or equal to 0.1 inch, and is less than or equal to 0.5 inch.
Further, the diameter of described developer solution pipeline (203) is 0.26 inch.
Preferable, the developer solution flow export of described developer solution pipeline (203) be arranged on 1 centimetre-5 centimetres of described slide holder (204) distance centers the position directly over.
Better, the developer solution flow export of described developer solution pipeline (203) be arranged on 2 centimetres of described slide holder (204) distance centers the position directly over.
The embodiment of the invention provides a kind of development chamber and developing machine platform, by increasing the diameter of developer solution pipe in the development chamber, and the position of the developer solution flow export of developer solution pipe is changed into perpendicular to slide holder, thereby make developer solution on silicon chip, evenly to gather in the short period of time, make that the development effect of SSI series board is optimized.
Description of drawings
Fig. 1 is the structural representation in development chamber in the prior art;
The structural representation in the development chamber that Fig. 2 provides for the embodiment of the invention.
Embodiment
The embodiment of the invention provides a kind of development chamber and developing machine platform, on the basis, development chamber of SSI series developing machine platform, increased the diameter of developer solution pipe, and the position of the developer solution flow export of developer solution pipe is changed into perpendicular to slide holder, and further make the developer solution flow export of developer solution pipe omit the relatively place at slide holder center, make the developer solution that the developer solution pipe flows out on silicon chip, to gather in the short period of time, and then optimize development effect.
As shown in Figure 1, a kind of development chamber that the embodiment of the invention provides comprises: cavity 201, bath pipeline 202, developer solution pipeline 203 and slide holder 204, wherein:
The diameter of developer solution pipeline 203 suitable increase on original 0.0625 inch basis in the embodiment of the invention, so that the developer solution that flows out in the developer solution pipeline 203 is under the less situation of the pressure of liquid, it is big that flow becomes, thereby can make developer solution be paved with silicon chip in the short period of time, simultaneously, make the appropriate location of developer solution pipeline 203 perpendicular to slide holder 204 tops, the developer solution that flows out from developer solution pipeline 203 will directly drop on the appropriate location on the silicon chip like this, has reduced the influence of the pressure of pump to the developer solution drop point.
Developer solution in the embodiment of the invention in the developer solution pipeline 203 is pumped by corresponding pump, when the pressure of pump is enough, it is bigger that the diameter of developer solution pipeline 203 just can be provided with, when increasing the diameter of developer solution pipeline 203, whether the pressure that must consider pump is enough, so that the developer solution in the developer solution pipeline 203 can flow out continuously, in general, when the diameter of developer solution pipeline 203 at 0.1 inch between 0.5 inch the time, development effect all is reasonable.
Further, evenly gather on silicon chip for making that developer solution is easier, prevent developer solution cause the live width of silicon chip center and silicon chip in center punch spray around difference excessive, the developer solution flow export of developer solution pipeline 203 can be arranged on slide holder slightly relatively the center the position directly over, developer solution will drop on the circumference of slightly being partial to the slide holder center like this, because the impulse force when falling and the rotation of silicon chip, developer solution is easier to distribute on silicon chip uniformly, and then make that the live width on the silicon chip is more even, in general, according to the diameter of developer solution pipeline 203, the developer solution flow export can be arranged on 1 centimetre to 5 centimetres of slide holder 204 distance center the position directly over.
When the diameter of developer solution pipeline 203 is 0.26 inch, the developer solution flow export of developer solution pipeline 203 be arranged on 2 centimetres of slide holder 204 distance centers the position directly over the time, the development capability in development chamber can reach the level of some advanced boards significantly better than before transforming.
The embodiment of the invention is also corresponding to provide a kind of developing machine platform, comprises aforesaid development chamber in the developing machine platform, promptly should the development chamber as shown in Figure 1, comprising: cavity 201, bath pipeline 202, developer solution pipeline 203 and slide holder 204, wherein:
The diameter of developer solution pipeline 203 is greater than 0.0625 inch, and the developer solution flow export of developer solution pipeline 203 is above slide holder 204, and perpendicular to slide holder 204.
The upper limit of developer solution pipeline 203 diameters can be according to the pressure setting of the pump that developer solution is pumped, and the pressure of pump is big more, and it is big more that the diameter of developer solution pipeline 203 just can be provided with.
The developer solution flow export of developer solution pipeline 203 is arranged on slide holder 204 tops and slightly is partial to the position at slide holder 204 centers, in general, according to the diameter of developer solution pipeline 203, the developer solution flow export can be arranged on 1 centimetre to 5 centimetres of slide holder 204 distance center the position directly over.
When the developer solution flow export of developer solution pipeline 203 be arranged on 2 centimetres of slide holder 204 distance centers the position directly over, when the diameter of developer solution pipeline 203 is 0.26 inch, the development effect of this developing machine platform obviously is improved.
The embodiment of the invention provides a kind of development chamber and developing machine platform, by increasing the diameter of developer solution pipe in the development chamber, and the position of the developer solution flow export of developer solution pipe is changed into perpendicular to slide holder, thereby make developer solution on silicon chip, evenly to gather in the short period of time, make that the development effect of SSI series board is optimized.
Obviously, those skilled in the art can carry out various changes and modification to the embodiment of the invention and not break away from the spirit and scope of the present invention.Like this, if of the present invention these are revised and modification belongs within the scope of claim of the present invention and equivalent technologies thereof, then the present invention also is intended to comprise these changes and modification interior.
Claims (10)
1. development chamber, comprise: cavity (201), be arranged on bath pipeline (202), developer solution pipeline (203) and slide holder (204) in the described cavity, it is characterized in that, the diameter of described developer solution pipeline (203) is greater than 0.0625 inch, and the developer solution flow export of described developer solution pipeline (203) is in described slide holder (204) top, and perpendicular to described slide holder (204).
2. development as claimed in claim 1 chamber is characterized in that, the diameter of described developer solution pipeline (203) is more than or equal to 0.1 inch, and is less than or equal to 0.5 inch.
3. development as claimed in claim 2 chamber is characterized in that, the diameter of described developer solution pipeline (203) is 0.26 inch.
4. development as claimed in claim 1 chamber is characterized in that, the developer solution flow export of described developer solution pipeline (203) be arranged on 1 centimetre-5 centimetres of described slide holder (204) distance centers the position directly over.
5. development as claimed in claim 4 chamber is characterized in that, the developer solution flow export of described developer solution pipeline (203) be arranged on 2 centimetres of described slide holder (204) distance centers the position directly over.
6. a developing machine platform comprises the development chamber, it is characterized in that, described development chamber comprises: cavity (201), bath pipeline (202), developer solution pipeline (203) and slide holder (204), wherein:
The diameter of described developer solution pipeline (203) is greater than 0.0625 inch, and the developer solution flow export of described developer solution pipeline (203) is in described slide holder (204) top, and perpendicular to described slide holder (204).
7. developing machine platform as claimed in claim 6 is characterized in that, the diameter of described developer solution pipeline (203) is more than or equal to 0.1 inch, and is less than or equal to 0.5 inch.
8. development as claimed in claim 7 chamber is characterized in that, the diameter of described developer solution pipeline (203) is 0.26 inch.
9. development as claimed in claim 6 chamber is characterized in that, the developer solution flow export of described developer solution pipeline (203) be arranged on 1 centimetre-5 centimetres of described slide holder (204) distance centers the position directly over.
10. development as claimed in claim 9 chamber is characterized in that, the developer solution flow export of described developer solution pipeline (203) be arranged on 2 centimetres of described slide holder (204) distance centers the position directly over.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009102421470A CN102096343A (en) | 2009-12-09 | 2009-12-09 | Developing cavity and developing machine base |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009102421470A CN102096343A (en) | 2009-12-09 | 2009-12-09 | Developing cavity and developing machine base |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102096343A true CN102096343A (en) | 2011-06-15 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009102421470A Pending CN102096343A (en) | 2009-12-09 | 2009-12-09 | Developing cavity and developing machine base |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103594392A (en) * | 2012-08-17 | 2014-02-19 | 北大方正集团有限公司 | Wafer rapid thermal processing machine platform |
| CN108469718A (en) * | 2018-04-20 | 2018-08-31 | 无锡中微掩模电子有限公司 | A kind of developing method and device of mask |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4068251A (en) * | 1975-02-17 | 1978-01-10 | Hoechst Aktiengesellschaft | Developing device for printing plates |
| JPH10144600A (en) * | 1996-11-08 | 1998-05-29 | Canon Sales Co Inc | Substrate treatment equipment |
| JP2002305133A (en) * | 2001-04-05 | 2002-10-18 | Sony Corp | Developing unit |
| CN1531745A (en) * | 2001-03-14 | 2004-09-22 | 先进微装置公司 | Method and evaporating solution for rinsing developed photoresist layer |
| US20070183775A1 (en) * | 2006-02-07 | 2007-08-09 | Tsuyoshi Mitsuhashi | Developing apparatus and developing method |
-
2009
- 2009-12-09 CN CN2009102421470A patent/CN102096343A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4068251A (en) * | 1975-02-17 | 1978-01-10 | Hoechst Aktiengesellschaft | Developing device for printing plates |
| JPH10144600A (en) * | 1996-11-08 | 1998-05-29 | Canon Sales Co Inc | Substrate treatment equipment |
| CN1531745A (en) * | 2001-03-14 | 2004-09-22 | 先进微装置公司 | Method and evaporating solution for rinsing developed photoresist layer |
| JP2002305133A (en) * | 2001-04-05 | 2002-10-18 | Sony Corp | Developing unit |
| US20070183775A1 (en) * | 2006-02-07 | 2007-08-09 | Tsuyoshi Mitsuhashi | Developing apparatus and developing method |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103594392A (en) * | 2012-08-17 | 2014-02-19 | 北大方正集团有限公司 | Wafer rapid thermal processing machine platform |
| CN103594392B (en) * | 2012-08-17 | 2016-07-06 | 北大方正集团有限公司 | A kind of wafer rapid thermal processes board |
| CN108469718A (en) * | 2018-04-20 | 2018-08-31 | 无锡中微掩模电子有限公司 | A kind of developing method and device of mask |
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Application publication date: 20110615 |