CN108411270B - 一种立式硅片磁控溅射镀膜机 - Google Patents
一种立式硅片磁控溅射镀膜机 Download PDFInfo
- Publication number
- CN108411270B CN108411270B CN201810448149.4A CN201810448149A CN108411270B CN 108411270 B CN108411270 B CN 108411270B CN 201810448149 A CN201810448149 A CN 201810448149A CN 108411270 B CN108411270 B CN 108411270B
- Authority
- CN
- China
- Prior art keywords
- silicon wafer
- chamber
- water
- electrode
- hanging plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810448149.4A CN108411270B (zh) | 2018-05-11 | 2018-05-11 | 一种立式硅片磁控溅射镀膜机 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810448149.4A CN108411270B (zh) | 2018-05-11 | 2018-05-11 | 一种立式硅片磁控溅射镀膜机 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN108411270A CN108411270A (zh) | 2018-08-17 |
CN108411270B true CN108411270B (zh) | 2023-03-07 |
Family
ID=63138882
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201810448149.4A Active CN108411270B (zh) | 2018-05-11 | 2018-05-11 | 一种立式硅片磁控溅射镀膜机 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN108411270B (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110183113B (zh) * | 2019-05-22 | 2022-03-22 | 湖南天羿领航科技有限公司 | 防眩光玻璃的制备方法 |
CN110228950B (zh) * | 2019-05-22 | 2021-12-03 | 湖南天羿领航科技有限公司 | 一种防眩光玻璃的制备方法 |
CN110116927A (zh) * | 2019-06-11 | 2019-08-13 | 张家港市和瑞创先智能光学有限公司 | 一种基于磁铁的镀膜稳定输送机构 |
CN110699657A (zh) * | 2019-11-28 | 2020-01-17 | 湖南华庆科技有限公司 | 一种立式磁控溅射彩膜生产线装置 |
CN110777345A (zh) * | 2019-11-28 | 2020-02-11 | 湖南华庆科技有限公司 | 一种磁控光学镀膜设备 |
CN115466929B (zh) * | 2022-09-19 | 2024-03-01 | 中核四0四有限公司 | 一种放射性金属靶材及其制备方法 |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0384684A2 (en) * | 1989-02-22 | 1990-08-29 | Nippon Telegraph and Telephone Corporation | Charged particle beam generating apparatus |
JP2005256153A (ja) * | 2004-03-15 | 2005-09-22 | Shin Meiwa Ind Co Ltd | 真空成膜装置 |
CN102181839A (zh) * | 2011-06-03 | 2011-09-14 | 浙江大学 | 同端进出式连续溅射镀膜设备 |
CN102230164A (zh) * | 2011-07-12 | 2011-11-02 | 湖南菲尔姆光能有限公司 | 积木式结构的金属条带连续卷绕真空镀膜设备 |
CN102534539A (zh) * | 2011-12-31 | 2012-07-04 | 肇庆市腾胜真空技术工程有限公司 | 双片或双面镀膜系统 |
CN202881369U (zh) * | 2012-10-24 | 2013-04-17 | 爱发科东方真空(成都)有限公司 | 等离子清洗电极 |
US8470141B1 (en) * | 2005-04-29 | 2013-06-25 | Angstrom Sciences, Inc. | High power cathode |
CN105256284A (zh) * | 2015-11-17 | 2016-01-20 | 肇庆市科润真空设备有限公司 | 环保铝镜真空镀膜设备 |
KR101638344B1 (ko) * | 2015-12-04 | 2016-07-11 | 주식회사 유아이디 | 스퍼터링용 원판패널 고정 장치 및 방법 |
CN106935459A (zh) * | 2015-12-31 | 2017-07-07 | 核工业西南物理研究院 | 一种长脉冲高功率离子源电极栅冷却水路及真空密封结构 |
CN207176071U (zh) * | 2017-09-06 | 2018-04-03 | 上海福宜真空设备有限公司 | 一种多功能用途的水冷电极 |
CN208791741U (zh) * | 2018-05-11 | 2019-04-26 | 湖南菲尔姆真空设备有限公司 | 一种立式硅片磁控溅射镀膜机 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102008015982B3 (de) * | 2008-03-27 | 2009-07-30 | Grenzebach Maschinenbau Gmbh | Verfahren und Vorrichtung zur Fixierung und den Weitertransport stoßempfindlicher Platten in Sputter-Beschichtungsanlagen, Computerprogramm zur Durchführung des Verfahrens und maschinenlesbarer Träger hierzu |
-
2018
- 2018-05-11 CN CN201810448149.4A patent/CN108411270B/zh active Active
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0384684A2 (en) * | 1989-02-22 | 1990-08-29 | Nippon Telegraph and Telephone Corporation | Charged particle beam generating apparatus |
JP2005256153A (ja) * | 2004-03-15 | 2005-09-22 | Shin Meiwa Ind Co Ltd | 真空成膜装置 |
US8470141B1 (en) * | 2005-04-29 | 2013-06-25 | Angstrom Sciences, Inc. | High power cathode |
CN102181839A (zh) * | 2011-06-03 | 2011-09-14 | 浙江大学 | 同端进出式连续溅射镀膜设备 |
CN102230164A (zh) * | 2011-07-12 | 2011-11-02 | 湖南菲尔姆光能有限公司 | 积木式结构的金属条带连续卷绕真空镀膜设备 |
CN102534539A (zh) * | 2011-12-31 | 2012-07-04 | 肇庆市腾胜真空技术工程有限公司 | 双片或双面镀膜系统 |
CN202881369U (zh) * | 2012-10-24 | 2013-04-17 | 爱发科东方真空(成都)有限公司 | 等离子清洗电极 |
CN105256284A (zh) * | 2015-11-17 | 2016-01-20 | 肇庆市科润真空设备有限公司 | 环保铝镜真空镀膜设备 |
KR101638344B1 (ko) * | 2015-12-04 | 2016-07-11 | 주식회사 유아이디 | 스퍼터링용 원판패널 고정 장치 및 방법 |
CN106935459A (zh) * | 2015-12-31 | 2017-07-07 | 核工业西南物理研究院 | 一种长脉冲高功率离子源电极栅冷却水路及真空密封结构 |
CN207176071U (zh) * | 2017-09-06 | 2018-04-03 | 上海福宜真空设备有限公司 | 一种多功能用途的水冷电极 |
CN208791741U (zh) * | 2018-05-11 | 2019-04-26 | 湖南菲尔姆真空设备有限公司 | 一种立式硅片磁控溅射镀膜机 |
Non-Patent Citations (3)
Title |
---|
ITO玻璃镀膜生产线电气自动控制系统;杨雪来;《科技与创新》;20170605(第11期);第48-49页 * |
一种水冷空腔电弧阴极;王殿儒等;《电子与信息学报》;19831130(第06期);第407-408页 * |
多室镀膜机的结构特点与工业应用;杨乃恒等;《真空》;20130125(第01期);第1-9页 * |
Also Published As
Publication number | Publication date |
---|---|
CN108411270A (zh) | 2018-08-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN108411270B (zh) | 一种立式硅片磁控溅射镀膜机 | |
JP2014525516A (ja) | 物理気相堆積チャンバターゲット用の冷却リング | |
CN111542208A (zh) | 一种机电设备用循环抽风式除尘散热装置 | |
CN207819262U (zh) | 一种节能型室外防尘散热高压开关柜 | |
CN210420147U (zh) | 一种用于晶片加工的全区域镀膜设备 | |
CN210683926U (zh) | 一种可快速清扫内腔的真空镀膜机 | |
CN219689835U (zh) | 一种真空磁控溅射双面镀膜系统 | |
CN211531624U (zh) | 一种机电设备散热架 | |
CN209741256U (zh) | 一种真空镀膜机冷却装置 | |
JP5764467B2 (ja) | スパッタ装置、ターゲット装置 | |
CN209890728U (zh) | 磁控溅射反应腔室的冷却组件及其磁控溅射设备 | |
CN208791741U (zh) | 一种立式硅片磁控溅射镀膜机 | |
CN217797812U (zh) | 一种微波等离子清洗机 | |
CN208791742U (zh) | 一种应用于立式硅片磁控溅射镀膜机的离子清洗电极 | |
KR101385589B1 (ko) | 스퍼터 장치 | |
CN211147009U (zh) | 一种散热器水室生产用循环型冷却装置 | |
KR101385590B1 (ko) | 스퍼터 장치 | |
CN210165818U (zh) | 一种便于安装的冷却塔填料 | |
KR20130078371A (ko) | 스퍼터 장치 | |
KR20130088548A (ko) | 박막 증착용 인라인 스퍼터 장치 | |
CN214366572U (zh) | 一种液压系统的泵站油泵驱动装置 | |
CN219449859U (zh) | 泵盖组件及其pvd真空设备 | |
CN221197809U (zh) | 一种半导体超净真空烘箱 | |
CN219980599U (zh) | 新型水泵电机水冷结构 | |
CN219689836U (zh) | 一种真空磁控溅射双面镀膜机 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20220919 Address after: 3 / F, building A2, mangrove innovation and Development Zone, Hengshan Science City, Cailun Avenue, Yueping Town, Yanfeng District, Hengyang City, Hunan Province, 421000 Applicant after: Hunan Zhongyuan Technology Co.,Ltd. Applicant after: HUNAN NAVIGATE TECHNOLOGY CO.,LTD. Address before: No. 098, Jinzhou North Road, Jinzhou New District, Ningxiang County, Changsha City, Hunan Province, 410600 Applicant before: HUNAN FILM VACUUM EQUIPMENT CO.,LTD. Applicant before: HUNAN NAVIGATE TECHNOLOGY CO.,LTD. |
|
GR01 | Patent grant | ||
GR01 | Patent grant |