CN108350174A - 光对准材料 - Google Patents

光对准材料 Download PDF

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Publication number
CN108350174A
CN108350174A CN201680065631.9A CN201680065631A CN108350174A CN 108350174 A CN108350174 A CN 108350174A CN 201680065631 A CN201680065631 A CN 201680065631A CN 108350174 A CN108350174 A CN 108350174A
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China
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groups
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CN201680065631.9A
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English (en)
Chinese (zh)
Inventor
S·沙佩莱
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Rolic Technologies Ltd
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Rolic AG
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Priority to CN202410245499.6A priority Critical patent/CN118027412A/zh
Publication of CN108350174A publication Critical patent/CN108350174A/zh
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/24Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/38Polysiloxanes modified by chemical after-treatment
    • C08G77/382Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
    • C08G77/385Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing halogens
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/26Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/06Preparatory processes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/38Polysiloxanes modified by chemical after-treatment
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/38Polysiloxanes modified by chemical after-treatment
    • C08G77/382Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
    • C08G77/388Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing nitrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/04Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
    • C09K19/38Polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/52Liquid crystal materials characterised by components which are not liquid crystals, e.g. additives with special physical aspect: solvents, solid particles
    • C09K19/54Additives having no specific mesophase characterised by their chemical composition
    • C09K19/56Aligning agents
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • C09K2323/02Alignment layer characterised by chemical composition
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • C09K2323/02Alignment layer characterised by chemical composition
    • C09K2323/023Organic silicon compound, e.g. organosilicon
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • C09K2323/02Alignment layer characterised by chemical composition
    • C09K2323/027Polyimide

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Liquid Crystal (AREA)
  • Silicon Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CN201680065631.9A 2015-11-11 2016-11-09 光对准材料 Pending CN108350174A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202410245499.6A CN118027412A (zh) 2015-11-11 2016-11-09 光对准材料

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP15194024 2015-11-11
EP15194024.4 2015-11-11
PCT/EP2016/077077 WO2017081056A1 (en) 2015-11-11 2016-11-09 Photoalignment materials

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN202410245499.6A Division CN118027412A (zh) 2015-11-11 2016-11-09 光对准材料

Publications (1)

Publication Number Publication Date
CN108350174A true CN108350174A (zh) 2018-07-31

Family

ID=54542019

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201680065631.9A Pending CN108350174A (zh) 2015-11-11 2016-11-09 光对准材料
CN202410245499.6A Pending CN118027412A (zh) 2015-11-11 2016-11-09 光对准材料

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN202410245499.6A Pending CN118027412A (zh) 2015-11-11 2016-11-09 光对准材料

Country Status (7)

Country Link
US (3) US10696795B2 (enExample)
EP (1) EP3374416A1 (enExample)
JP (2) JP2019500445A (enExample)
KR (1) KR102637838B1 (enExample)
CN (2) CN108350174A (enExample)
TW (1) TWI787155B (enExample)
WO (1) WO2017081056A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113544184A (zh) * 2019-04-10 2021-10-22 Jsr株式会社 膜形成用组合物、硬化膜及相位差膜

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10696795B2 (en) 2015-11-11 2020-06-30 Rolic Technologies AG Photoaligning materials
EP3491434B1 (en) 2016-07-29 2020-09-02 Rolic Technologies AG Method for generating alignment on top of a liquid crystal polymer material
WO2020175560A1 (ja) * 2019-02-27 2020-09-03 日産化学株式会社 樹脂組成物、樹脂膜及び液晶表示素子
US11124472B2 (en) * 2019-04-08 2021-09-21 Genhealth Pharma Co., Ltd. Myocardial regeneration promoting compounds, preparation method thereof, and pharmaceutical composition
EP3725763A1 (en) * 2019-04-17 2020-10-21 Genhealth Pharma Co., Ltd. Myocardial regeneration promoting compounds, preparation method thereof, pharmaceutical composition, and their use
KR20220038353A (ko) 2019-07-24 2022-03-28 롤릭 테크놀로지스 아게 광-정렬성 포지티브 c-플레이트 리타더
CN119331249B (zh) * 2024-07-22 2025-05-27 波米科技有限公司 一种聚硅氧烷及其制备方法和应用

Citations (6)

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CN1195015A (zh) * 1997-02-05 1998-10-07 罗利克有限公司 可光交联的硅烷衍生物
CN101687996A (zh) * 2007-08-01 2010-03-31 Jsr株式会社 聚有机硅氧烷、液晶取向膜和液晶显示元件
CN101779159A (zh) * 2007-08-21 2010-07-14 Jsr株式会社 液晶取向剂、液晶取向膜的制造方法以及液晶显示元件
CN101812303A (zh) * 2009-02-19 2010-08-25 Jsr株式会社 液晶取向剂、液晶取向膜和液晶显示元件
JP2011132494A (ja) * 2009-11-26 2011-07-07 Jsr Corp 有機半導体素子用絶縁性配向組成物、有機半導体素子用絶縁性配向膜、有機半導体素子及びその製造方法
CN103842329A (zh) * 2011-10-03 2014-06-04 罗利克有限公司 光定向材料

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NL231511A (enExample) 1957-09-23
GB872355A (en) 1960-04-26 1961-07-05 Grace W R & Co Improvements in or relating to the production of a tetrabasic acid and esters thereof
JPS58109479A (ja) 1981-12-22 1983-06-29 Japan Synthetic Rubber Co Ltd テトラカルボン酸無水物の製造方法
JPH0231681B2 (ja) 1983-04-14 1990-07-16 Japan Synthetic Rubber Co Ltd Tetorakarubonsannoseizohoho
JPH0235738B2 (ja) 1983-07-05 1990-08-13 Japan Synthetic Rubber Co Ltd Tetorakarubonsannoseizohoho
KR100574190B1 (ko) 1997-09-25 2006-04-27 롤리크 아게 광 가교결합성 폴리이미드, 이를 사용한 배향층의 제조방법 및 당해 배향층을 갖는 광학장치 또는 전기 광학장치
GB9907801D0 (en) 1999-04-06 1999-06-02 Rolic Ag Photoactive polymers
DE60106213T2 (de) 2000-01-24 2006-03-02 Rolic Ag Photoaktive polyimide, polyamidsäuren oder -ester mit seitenständigen, photovernetzbaren gruppen
JP4416054B2 (ja) * 2007-08-21 2010-02-17 Jsr株式会社 液晶配向剤、液晶配向膜の形成方法および液晶表示素子
CN101802691B (zh) 2007-08-21 2012-04-18 Jsr株式会社 液晶取向剂、液晶取向膜的制造方法和液晶显示元件
JP4458299B2 (ja) 2007-09-03 2010-04-28 Jsr株式会社 液晶配向剤および液晶表示素子
TWI490316B (zh) 2009-07-09 2015-07-01 Rolic Ag 用於光學或光電元件之含酯基液晶
JP5747515B2 (ja) * 2010-03-01 2015-07-15 Jsr株式会社 有機el発光体配向制御用組成物、有機el発光体配向制御膜、有機el素子及びその製造方法
JP5716428B2 (ja) * 2011-02-04 2015-05-13 Jsr株式会社 液晶表示素子及びその製造方法
US10696795B2 (en) 2015-11-11 2020-06-30 Rolic Technologies AG Photoaligning materials

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1195015A (zh) * 1997-02-05 1998-10-07 罗利克有限公司 可光交联的硅烷衍生物
CN101687996A (zh) * 2007-08-01 2010-03-31 Jsr株式会社 聚有机硅氧烷、液晶取向膜和液晶显示元件
CN101779159A (zh) * 2007-08-21 2010-07-14 Jsr株式会社 液晶取向剂、液晶取向膜的制造方法以及液晶显示元件
CN101812303A (zh) * 2009-02-19 2010-08-25 Jsr株式会社 液晶取向剂、液晶取向膜和液晶显示元件
JP2011132494A (ja) * 2009-11-26 2011-07-07 Jsr Corp 有機半導体素子用絶縁性配向組成物、有機半導体素子用絶縁性配向膜、有機半導体素子及びその製造方法
CN103842329A (zh) * 2011-10-03 2014-06-04 罗利克有限公司 光定向材料

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113544184A (zh) * 2019-04-10 2021-10-22 Jsr株式会社 膜形成用组合物、硬化膜及相位差膜
CN113544184B (zh) * 2019-04-10 2024-05-14 Jsr株式会社 膜形成用组合物、硬化膜、液晶取向膜及相位差膜

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Publication number Publication date
EP3374416A1 (en) 2018-09-19
CN118027412A (zh) 2024-05-14
TWI787155B (zh) 2022-12-21
US20180319939A1 (en) 2018-11-08
US11634544B2 (en) 2023-04-25
US20210340330A1 (en) 2021-11-04
JP2021176965A (ja) 2021-11-11
TW201734094A (zh) 2017-10-01
US10696795B2 (en) 2020-06-30
US20200223984A1 (en) 2020-07-16
WO2017081056A1 (en) 2017-05-18
KR102637838B1 (ko) 2024-02-16
JP2019500445A (ja) 2019-01-10
KR20180082537A (ko) 2018-07-18
US11098164B2 (en) 2021-08-24
JP7161001B2 (ja) 2022-10-25

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Application publication date: 20180731