CN108193195A - A kind of intelligent chemical gas phase reaction precipitation equipment for being used to prepare graphene - Google Patents
A kind of intelligent chemical gas phase reaction precipitation equipment for being used to prepare graphene Download PDFInfo
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- CN108193195A CN108193195A CN201810105369.7A CN201810105369A CN108193195A CN 108193195 A CN108193195 A CN 108193195A CN 201810105369 A CN201810105369 A CN 201810105369A CN 108193195 A CN108193195 A CN 108193195A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
The present invention relates to a kind of intelligent chemical gas phase reaction precipitation equipments for being used to prepare graphene,Including furnace body,Reaction mechanism is equipped in furnace body,Reaction mechanism includes planar movement mechanism,Translational block,Telescoping mechanism,Rotating mechanism,Movable plate,Substrate and two clamping devices,Planar movement mechanism includes the first motor,First connecting rod,Second connecting rod,Slide plate and lifting assembly,Clamping device includes connection component,First gear,Spring and fixture block,Rotating mechanism includes the second motor and two runner assemblies,Runner assembly includes the second drive shaft,Second gear and rack,The intelligent chemical gas phase reaction precipitation equipment for being used to prepare graphene drives substrate to do planar movement by planar movement mechanism,Reaction gas is made to be reacted in each position of substrate,It ensure that graphene depositing homogeneous,Moreover,Substrate is driven to rotate 180 ° by runner assembly,So as to enable graphene uniform deposition on the two sides of substrate,Improve the yield of graphene.
Description
Technical field
The present invention relates to new material production equipment field, more particularly to a kind of intelligent chemical gas for being used to prepare graphene
Phase reaction precipitation equipment.
Background technology
Graphene is a kind of honeycomb flat film formed in a specific way by carbon atom, and being a kind of, there are one atomic layers
The quasi- two-dimensional material of thickness does monoatomic layer graphite so being called.The common power production method of graphene is mechanical glass at present
Glass method, oxidation-reduction method, silicon carbide epitaxial growth method etc., film production method be chemical vapour deposition technique (CVD), wherein CVD
Method can prepare the graphene of high quality large area, meet the requirement of prepare with scale high-quality graphene.
CVD method is when preparing graphene, usually using nickel as substrate, carbonaceous gas is passed through in deposited roads, such as:Nytron
Object, carbon resolve into the surface that carbon atom is deposited on nickel at high temperature, and shape graphene by slight chemical etching, makes graphene
Film and the isolated graphene film of nickel sheet.Existing chemical vapour deposition reaction device is preparing graphene using CVD method
When, since position of the substrate in reacting furnace is fixed, and the in-position of carbonaceous gas is also fixed, cause deposition reaction mainly according to
By the dispersion of carbonaceous gas, since carbonaceous gas is unevenly distributed in furnace body, the graphene of deposition on substrate is caused to be distributed also not
Uniformly, the side of the separate air inlet pipe while in substrate since reaction gas distribution is few, leads to the graphene deposition of the side
Few, equipment can not make full use of the graphene that substrate preparation is evenly distributed.
Invention content
The technical problem to be solved by the present invention is to:Graphite is used to prepare in order to overcome the deficiencies of the prior art and provide one kind
The intelligent chemical gas phase reaction precipitation equipment of alkene.
The technical solution adopted by the present invention to solve the technical problems is:A kind of intelligent chemistry for being used to prepare graphene
Gas phase reaction precipitation equipment leads to including pedestal, furnace body, bell, controller, air inlet pipe, air outlet pipe and two stabilizer blades, the furnace body
The top that stabilizer blade is fixed on pedestal is crossed, the bell is arranged on the top of furnace body, and the controller is fixed on the top of pedestal, institute
It states and PLC is equipped in controller, the air inlet pipe and air outlet pipe are separately positioned on the both sides of furnace body, and the air inlet pipe and air outlet pipe are equal
It is connected with furnace body, reaction mechanism is equipped in the furnace body;
The reaction mechanism includes planar movement mechanism, translational block, telescoping mechanism, rotating mechanism, movable plate, substrate and two
A clamping device, the substrate and clamping device are arranged at the side of the close air inlet pipe of movable plate, the planar movement machine
Structure, translational block, telescoping mechanism and rotating mechanism are successively set on the opposite side of movable plate, and two clamping devices are separately positioned on base
The both sides of piece;
The planar movement mechanism includes the first motor, fixed link, fixed plate, first connecting rod, second connecting rod, slide plate and liter
It comes down to a lower group part, first motor and fixed plate are each attached on the inner wall of furnace body, and first motor is electrically connected with PLC, described
First motor is sequentially connected with first connecting rod, and the first connecting rod is hinged by the top of second connecting rod and slide plate, the slide plate
It is set in fixed link, the both ends of the fixed link are fixedly connected respectively with the first motor and fixed plate, and the lifting assembly is set
It puts in the side of the close movable plate of slide plate, the lifting assembly is sequentially connected with translational block;
The clamping device includes side plate, connection component, first gear, spring and fixture block, and the side plate is fixed on movement
On plate, the first gear is connect by connection component with side plate, and the fixture block is connect by spring with first gear, the bullet
Spring is in compressive state, and the fixture block is resisted against on substrate;
The rotating mechanism includes the second motor and two runner assemblies, and second motor is fixed on movable plate, institute
It states the second motor to be electrically connected with PLC, two runner assemblies are separately positioned on the both sides of the second motor, the runner assembly and clamping
Mechanism corresponds, and the runner assembly includes the second drive shaft, second gear and rack, and second motor drives by second
Moving axis and second gear drive connection, the second gear and first gear are arranged at the top of rack, the mobile sleeve-board
It is located on rack, the first gear and second gear are engaged with rack.
Preferably, in order to which translational block is driven to lift, the lifting assembly includes conveyer belt and two lifting units, two
Lifting unit is separately positioned on the both ends of conveyer belt, and the translational block is fixed on a moving belt, and the lifting unit includes third
Motor, buffer stopper, third drive shaft and driving wheel, the third motor and buffer stopper are each attached on slide plate, and the third is driven
Moving axis is arranged between third motor and buffer stopper, and the third motor is sequentially connected with third drive shaft, the driving wheel case
It is located in third drive shaft, the third motor is electrically connected with PLC.
Preferably, in order to ensure the steady movement of slide plate, the bottom end of the slide plate is equipped with sliding rail, the shape of the sliding rail
For U-shaped, the both ends of the sliding rail are fixed on the inner wall of furnace body, and the slide plate is set on sliding rail.
Preferably, for the moving direction of fixing clip, the both sides of the spring are equipped with positioning unit, and the positioning is single
Member includes convex block, locating rod and locating ring, and the convex block is fixed on by locating rod in first gear, and the locating ring is fixed on
On fixture block, the locating ring is arranged on the securing lever.
Preferably, for the ease of the rotation of first gear, the connection component includes rotating bar, connection ring and two the
One stent, the rotating bar are fixed in first gear, and the connection ring is set in rotating bar, and two first supports are set respectively
It puts in the both sides of connection ring, the connection ring is fixedly connected by first support with side plate.
Preferably, in order to fix the distance between first gear and side plate, the both sides of the connection ring are equipped with clamping plate, institute
Boards wall is stated in rotating bar.
Preferably, in order to which movable plate is driven to move, the telescoping mechanism includes the 4th motor, the 4th drive shaft and set
Pipe, the 4th motor are fixed in translational block, and the 4th motor is electrically connected with PLC, the 4th motor and the 4th driving
Axis is sequentially connected, and described sleeve pipe is set in the 4th drive shaft, and described sleeve pipe is fixedly connected with movable plate, the 4th drive shaft
Periphery be equipped with external screw thread, be equipped with internal thread in described sleeve pipe, the outer spiral shell on internal thread and the 4th drive shaft in described sleeve pipe
Line matches.
Preferably, in order to which casing is made smoothly to move, the telescoping mechanism further includes retainer ring and two second supports,
The Fixing shrink ring is located on casing, and two second supports are separately positioned on the both sides of retainer ring, and the retainer ring passes through second
Stent is fixedly connected with the 4th motor.
Preferably, for the second drive shaft turns of Auxiliary support, the runner assembly further includes support ring, the support
Ring is fixed on movable plate, and the support ring is set in the second drive shaft.
Preferably, for the ease of the distance of detection side plate and the inner wall of the side of the close air inlet pipe in furnace body, it is described
One end of the separate movable plate of side plate is equipped with range sensor, and the range sensor is electrically connected with PLC.
It is put down the invention has the advantages that the intelligent chemical gas phase reaction precipitation equipment for being used to prepare graphene passes through
Face mobile mechanism drives substrate to do planar movement, and reaction gas is made to be reacted in each position of substrate, ensure that graphene
Depositing homogeneous, compared with existing planar movement mechanism, the planar movement mechanism moving range is wide, ensure that the deposition of graphene
Area moreover, drives substrate to rotate 180 °, so as to enable graphene uniform deposition the two of substrate by runner assembly
Face improves the yield of graphene, and compared with existing rotating mechanism, the rotating mechanism is simple in structure, and function is reliable, Jin Erti
The high practicability of equipment.
Description of the drawings
The present invention is further described with reference to the accompanying drawings and examples.
Fig. 1 is the structure diagram of the intelligent chemical gas phase reaction precipitation equipment for being used to prepare graphene of the present invention;
Fig. 2 is the knot of the reaction mechanism of the intelligent chemical gas phase reaction precipitation equipment for being used to prepare graphene of the present invention
Structure schematic diagram;
Fig. 3 is the planar movement mechanism of the intelligent chemical gas phase reaction precipitation equipment for being used to prepare graphene of the present invention
Structure diagram;
Fig. 4 is the knot of the clamping device of the intelligent chemical gas phase reaction precipitation equipment for being used to prepare graphene of the present invention
Structure schematic diagram;
Fig. 5 is the knot of the telescoping mechanism of the intelligent chemical gas phase reaction precipitation equipment for being used to prepare graphene of the present invention
Structure schematic diagram;
In figure:1. pedestal, 2. furnace bodies, 3. bells, 4. controllers, 5. air inlet pipe, 6. air outlet pipes, 7. stabilizer blades, 8. translational blocks,
9. movable plate, 10. substrates, 11. first motors, 12. fixed links, 13. fixed plates, 14. first connecting rods, 15. second connecting rods, 16.
Slide plate, 17. side plates, 18. first gears, 19. springs, 20. fixture blocks, 21. second motors, 22. second drive shafts, 23. second teeth
Wheel, 24. racks, 25. conveyer belts, 26. third motors, 27. buffer stoppers, 28. third drive shafts, 29. driving wheels, 30. sliding rails,
31. convex block, 32. locating rods, 33. locating rings, 34. rotating bars, 35. connection rings, 36. first supports, 37. clamping plates, 38. the 4th electricity
Machine, 39. the 4th drive shafts, 40. casings, 41. retainer rings, 42. second supports, 43. support rings, 44. range sensors.
Specific embodiment
In conjunction with the accompanying drawings, the present invention is further explained in detail.These attached drawings are simplified schematic diagram, only with
Illustration illustrates the basic structure of the present invention, therefore it only shows composition related to the present invention.
As shown in Figure 1, a kind of intelligent chemical gas phase reaction precipitation equipment for being used to prepare graphene, including pedestal 1, stove
Body 2, bell 3, controller 4, air inlet pipe 5, air outlet pipe 6 and two stabilizer blades 7, the furnace body 2 are fixed on pedestal 1 by stabilizer blade 7
Top, the bell 3 are arranged on the top of furnace body 2, and the controller 4 is fixed on the top of pedestal 1, is set in the controller 4
Have a PLC, the air inlet pipe 5 and air outlet pipe 6 are separately positioned on the both sides of furnace body 2, the air inlet pipe 5 and air outlet pipe 6 with furnace body 2
Connection, the furnace body 2 is interior to be equipped with reaction mechanism;
In the gas phase reaction precipitation equipment, support furnace body 2 is fixed by stabilizer blade 7, the carbon containing of reaction is inputted by air inlet pipe 5
Gas makes graphene be deposited on the surface of substrate 10, and exhaust gas is discharged by air outlet pipe 6, after the completion of reaction, by opening bell 3,
Substrate 10 can be removed, the graphene of generation can be obtained by chemistry exploitation.
As shown in Fig. 2, the reaction mechanism includes planar movement mechanism, translational block 8, telescoping mechanism, rotating mechanism, movement
Plate 9, substrate 10 and two clamping devices, the substrate 10 and clamping device are arranged at the one of the close air inlet pipe 5 of movable plate 9
Side, the planar movement mechanism, translational block 8, telescoping mechanism and rotating mechanism are successively set on the opposite side of movable plate 9, two
Clamping device is separately positioned on the both sides of substrate 10;
In reaction mechanism, movable plate 9 is driven to move by telescoping mechanism, by two gripper mechanism grips substrates 10,
During reaction, movable plate 9 is driven to be moved to air inlet pipe 5 from telescoping mechanism, substrate 10 is made close to air inlet pipe 5 by clamping device, and
Translational block 8 is driven to do planar movement by planar movement mechanism afterwards, so as to which the substrate 10 for making 9 opposite side of movable plate is cooked planar movement,
The different location for making reaction gas that graphene be made to be deposited on substrate 10 after chemically reacting, makes graphene depositing homogeneous, then
Movable plate 9 is driven to drive clamping device operation far from air inlet pipe 5 by rotating mechanism, clamping device is made to drive base by telescoping mechanism
Piece 10 rotate 180 °, so as to make 10 another side of substrate be aligned air inlet pipe 5, then telescoping mechanism continue drive movable plate 9 close into
Tracheae 5 drives substrate 10 to do planar movement by planar movement mechanism, so as to which graphene be made to be deposited on the another side of substrate 10, leads to
It crosses reaction mechanism and makes full use of substrate 10, graphene is enable to be deposited on the two sides of substrate 10, improve the yield of graphene.
As shown in figure 3, the planar movement mechanism includes the first motor 11, fixed link 12, fixed plate 13, first connecting rod
14th, second connecting rod 15, slide plate 16 and lifting assembly, first motor 11 and fixed plate 13 are each attached on the inner wall of furnace body 2,
First motor 11 is electrically connected with PLC, and first motor 11 is sequentially connected with first connecting rod 14, and the first connecting rod 14 is logical
It crosses second connecting rod 15 and the top of slide plate 16 is hinged, the slide plate 16 is set in fixed link 12, the both ends of the fixed link 12
It is fixedly connected respectively with the first motor 11 and fixed plate 13, the lifting assembly is arranged on the one of the close movable plate 9 of slide plate 16
Side, the lifting assembly are sequentially connected with translational block 8;
In planar movement mechanism, by the first motor 11 and fixed plate 13 that are fixed on 2 inner wall of furnace body to fixed link 12
It is fixed, then PLC controls the first motor 11 to start, and first connecting rod 14 is driven to rotate, makes slide plate 16 by second connecting rod 15
It is moved along the axis direction of fixed link 12, it is achieved thereby that slide plate 16 moves horizontally, and on slide plate 16, utilize lifting group
Part drives translational block 8 to move in the vertical direction, so as to which planar movement mechanism be made to realize the planar movement of translational block 8.
As shown in figure 3, the clamping device includes side plate 17, connection component, first gear 18, spring 19 and fixture block 20,
The side plate 17 is fixed on movable plate 9, and the first gear 18 is connect by connection component with side plate 17, and the fixture block 20 is logical
It crosses spring 19 to connect with first gear 18, the spring 19 is in compressive state, and the fixture block 20 is resisted against on substrate 10;
In clamping device, first gear 18 is facilitated by connection component and is smoothly rotated, and first gear 18 and side plate
17 distance and positions remained fixed in the opposite side of first gear 18, make fixture block 20 be resisted against substrate by the spring 19 of compression
On 10, so as to which the fixture block 20 in two clamping devices be made to bear against the clamping in the both sides of substrate 10, realized to substrate 10.
As shown in Fig. 2, the rotating mechanism includes the second motor 21 and two runner assemblies, second motor 21 is fixed
On movable plate 9, second motor 21 is electrically connected with PLC, and two runner assemblies are separately positioned on the both sides of the second motor 21,
The runner assembly is corresponded with clamping device, and the runner assembly includes the second drive shaft 22, second gear 23 and rack
24, second motor 21 is sequentially connected by the second drive shaft 22 with second gear 23,23 and first tooth of second gear
Wheel 18 is arranged at the top of rack 24, and the movable plate 9 is set on rack 24, the first gear 18 and second gear 23
Engaged with rack 24.
When needing the another side of substrate 10 being directed at air inlet pipe 5, the second motor 21 is controlled to start by PLC, the second motor
21 drive second gear 23 to rotate by the second drive shaft 22, and second gear 23 is made to act on the rack 24 of lower section, band carry-over bar
24 movements, after rack 24 moves, act in first gear 18, first gear 18 are made to rotate 180 °, so as to drive 20 turns of fixture block
It is 180 ° dynamic, the another side of substrate 10 is made to be directed at air inlet pipe 5.
As shown in figure 3, the lifting assembly includes conveyer belt 25 and two lifting units, two lifting units are set respectively
At the both ends of conveyer belt 25, the translational block 8 is fixed on conveyer belt 25, and the lifting unit includes third motor 26, buffering
Block 27, third drive shaft 28 and driving wheel 29, the third motor 26 and buffer stopper 27 are each attached on slide plate 16, the third
Drive shaft 28 is arranged between third motor 26 and buffer stopper 27, and the third motor 26 is sequentially connected with third drive shaft 28,
The driving wheel 29 is set in third drive shaft 28, and the third motor 26 is electrically connected with PLC.
Third motor 26 in PLC control lifting units starts, and third drive shaft 28 is driven to rotate, makes 29 turns of driving wheel
It is dynamic, the inside of conveyer belt 25 is acted on, so as to which conveyer belt 25 be driven to rotate, is lifted translational block 8.
Preferably, in order to ensure the steady movement of slide plate 16, the bottom end of the slide plate 16 is equipped with sliding rail 30, the sliding rail
30 shape is U-shaped, and the both ends of the sliding rail 30 are fixed on the inner wall of furnace body 2, and the slide plate 16 is set on sliding rail 30.Profit
With the bottom end of 30 Auxiliary support slide plate 16 of sliding rail, so as to which slide plate 16 be made smoothly to be moved.
Preferably, for the moving direction of fixing clip 20, the both sides of the spring 19 are equipped with positioning unit, described fixed
Bit location includes convex block 31, locating rod 32 and locating ring 33, and the convex block 31 is fixed on by locating rod 32 in first gear 18,
The locating ring 33 is fixed on fixture block 20, and the locating ring 33 is set in locating rod 32.Pass through the fixed locating rod in position
32 secure the moving direction of locating ring 33, and so as to secure the moving direction of fixture block 20, locating rod 32 is prevented using convex block 31
Locating ring 33 is detached from, so as to ensure that the steady movement of fixture block 20.
As shown in figure 4, the connection component includes rotating bar 34, connection ring 35 and two first supports 36, the rotation
Bar 34 is fixed in first gear 18, and the connection ring 35 is set in rotating bar 34, and two first supports 36 are separately positioned on
The both sides of connection ring 35, the connection ring 35 are fixedly connected by first support 36 with side plate 17.Pass through two first supports 36
Position of the connection ring 35 relative to side plate 17 is secured, so as to which rotating bar 34 be made to be rotated along the axis of connection ring 35, Jin Ergu
The rotation direction of first gear 18 is determined.
Preferably, in order to fix the distance between first gear 18 and side plate 17, the both sides of the connection ring 35 are equipped with
Clamping plate 37, the clamping plate 37 are fixed in rotating bar 34.Prevent connection ring 35 from being slided in locating rod 32 using two clamping plates 37,
So as to fix locating rod 32 and the distance of side plate 17, and then the distance between first gear 18 and side plate 17 are secured, ensured
The smooth rotation of first gear 18.
As shown in figure 5, the telescoping mechanism includes the 4th motor 38, the 4th drive shaft 39 and casing 40, the 4th electricity
Machine 38 is fixed in translational block 8, and the 4th motor 38 is electrically connected with PLC, and the 4th motor 38 is passed with the 4th drive shaft 39
Dynamic connection, described sleeve pipe 40 are set in the 4th drive shaft 39, and described sleeve pipe 40 is fixedly connected with movable plate 9, the 4 wheel driven
The periphery of moving axis 39 is equipped with external screw thread, is equipped with internal thread in described sleeve pipe 40, and the internal thread in described sleeve pipe 40 drives with the 4th
External screw thread on axis 39 matches.
When needing that movable plate 9 is driven to be moved, PLC controls the 4th motor 38 to run, and the 4th drive shaft 39 is driven to revolve
Turn, the external screw thread in the 4th drive shaft 39 is made to act on the internal thread in casing 40, and then drive sleeve 40 is along the 4th driving
The axis reverse movement of axis 39, realizes the movement of movable plate 9.
Preferably, in order to make casing 40 smoothly mobile, the telescoping mechanism further includes retainer ring 41 and two second
Stent 42, the retainer ring 41 are set on casing 40, and two second supports 42 are separately positioned on the both sides of retainer ring 41, described
Retainer ring 41 is fixedly connected by second support 42 with the 4th motor 38.Make retainer ring 41 and the 4th using two second supports 42
Motor 38 is fixedly connected, and when preventing the rotation of the 4th drive shaft 39, casing 40 is driven to rotate, and then realize the steady shifting of casing 40
It is dynamic.
Preferably, in order to which the second drive shaft of Auxiliary support 22 rotates, the runner assembly further includes support ring 43, described
Support ring 43 is fixed on movable plate 9, and the support ring 43 is set in the second drive shaft 22.Utilize the fixed support ring in position
43 pair of second 22 Auxiliary support of drive shaft, prevents 22 stress deformation of the second drive shaft, makes turning for 22 held stationary of the second drive shaft
It is dynamic.
Preferably, for the ease of the distance of detection side plate 17 and the inner wall of the side of the close air inlet pipe 5 in furnace body 2,
One end of the separate movable plate 9 of the side plate 17 is equipped with range sensor 44, and the range sensor 44 is electrically connected with PLC.Profit
The distance of side plate 17 and the inner wall of 5 side of close air inlet pipe of furnace body 2 is detected with range sensor 44, and range data is fed back
To PLC, PLC is made to can determine the position of movable plate 9, when ensureing that gas phase reaction carries out, substrate 10 can be close to air inlet pipe 5.
The chemical gas phase reaction precipitation equipment drives 16 carry out level shifting of slide plate when preparing graphene, by the first motor 11
Dynamic, the lifting assembly on slide plate 16 drives translational block 8 to lift, and then realize the planar movement of substrate 10, makes to spray from air inlet pipe 5
The reaction gas gone out can carry out reactive deposition in each position of substrate 10, ensure that the depositing homogeneous of graphene, not only such as
This, the runner assembly for driving both sides by the second motor 21 is run, and the rack 24 in runner assembly is made to act on first gear 18
On, fixture block 20 and substrate 10 is driven to rotate 180 °, makes the another side face air inlet pipe 5 of substrate 10, consequently facilitating graphene deposits
In the another side of substrate 10, substrate 10 is made full use of, improves the yield of graphene.
Compared with prior art, which is moved by plane
Motivation structure drives substrate 10 to do planar movement, and reaction gas is made to be reacted in each position of substrate 10, ensure that graphene
Depositing homogeneous, compared with existing planar movement mechanism, the planar movement mechanism moving range is wide, ensure that the deposition of graphene
Area moreover, drives substrate 10 to rotate 180 °, so as to enable graphene uniform deposition in substrate 10 by runner assembly
Two sides, improve the yield of graphene, compared with existing rotating mechanism, the rotating mechanism is simple in structure, and function is reliable, into
And improve the practicability of equipment.
Using above-mentioned desirable embodiment according to the present invention as enlightenment, by above-mentioned description, relevant staff is complete
Various changes and amendments can be carried out without departing from the scope of the technological thought of the present invention' entirely.The technology of this invention
Property range is not limited to the content on specification, it is necessary to determine its technical scope according to right.
Claims (10)
1. a kind of intelligent chemical gas phase reaction precipitation equipment for being used to prepare graphene, which is characterized in that including pedestal (1),
Furnace body (2), bell (3), controller (4), air inlet pipe (5), air outlet pipe (6) and two stabilizer blades (7), the furnace body (2) pass through branch
Foot (7) is fixed on the top of pedestal (1), and the bell (3) is arranged on the top of furnace body (2), and the controller (4) is fixed on bottom
The top of seat (1), the controller (4) is interior to be equipped with PLC, and the air inlet pipe (5) and air outlet pipe (6) are separately positioned on furnace body (2)
Both sides, the air inlet pipe (5) and air outlet pipe (6) connect with furnace body (2), and reaction mechanism is equipped in the furnace body (2);
The reaction mechanism includes planar movement mechanism, translational block (8), telescoping mechanism, rotating mechanism, movable plate (9), substrate
(10) and two clamping devices, the substrate (10) and clamping device are arranged at the one of the close air inlet pipe (5) of movable plate (9)
Side, the planar movement mechanism, translational block (8), telescoping mechanism and rotating mechanism are successively set on the opposite side of movable plate (9),
Two clamping devices are separately positioned on the both sides of substrate (10);
The planar movement mechanism includes the first motor (11), fixed link (12), fixed plate (13), first connecting rod (14), second
Connecting rod (15), slide plate (16) and lifting assembly, first motor (11) and fixed plate (13) are each attached to the inner wall of furnace body (2)
On, first motor (11) is electrically connected with PLC, and first motor (11) and first connecting rod (14) are sequentially connected, and described the
One connecting rod (14) is hinged by second connecting rod (15) and the top of slide plate (16), and the slide plate (16) is set in fixed link (12)
On, the both ends of the fixed link (12) are fixedly connected respectively with the first motor (11) and fixed plate (13), and the lifting assembly is set
It puts in the side of the close movable plate (9) of slide plate (16), the lifting assembly is sequentially connected with translational block (8);
The clamping device includes side plate (17), connection component, first gear (18), spring (19) and fixture block (20), the side
Plate (17) is fixed on movable plate (9), and the first gear (18) is connect by connection component with side plate (17), the fixture block
(20) connect by spring (19) with first gear (18), the spring (19) in compressive state, the fixture block (20) against
On substrate (10);
The rotating mechanism includes the second motor (21) and two runner assemblies, and second motor (21) is fixed on movable plate
(9) on, second motor (21) is electrically connected with PLC, and two runner assemblies are separately positioned on the both sides of the second motor (21), institute
It states runner assembly to correspond with clamping device, the runner assembly includes the second drive shaft (22), second gear (23) and tooth
Item (24), second motor (21) are sequentially connected by the second drive shaft (22) and second gear (23), the second gear
(23) and first gear (18) is arranged at the tops of rack (24), and the movable plate (9) is set on rack (24), and described
One gear (18) and second gear (23) are engaged with rack (24).
2. the intelligent chemical gas phase reaction precipitation equipment as described in claim 1 for being used to prepare graphene, which is characterized in that
The lifting assembly includes conveyer belt (25) and two lifting units, and two lifting units are separately positioned on the two of conveyer belt (25)
End, the translational block (8) is fixed on conveyer belt (25), and the lifting unit includes third motor (26), buffer stopper (27), the
Three drive shafts (28) and driving wheel (29), the third motor (26) and buffer stopper (27) are each attached on slide plate (16), described
Third drive shaft (28) is arranged between third motor (26) and buffer stopper (27), the third motor (26) and third drive shaft
(28) it is sequentially connected, the driving wheel (29) is set in third drive shaft (28), and the third motor (26) is electrically connected with PLC
It connects.
3. the intelligent chemical gas phase reaction precipitation equipment as described in claim 1 for being used to prepare graphene, which is characterized in that
The bottom end of the slide plate (16) is equipped with sliding rail (30), and the shape of the sliding rail (30) is U-shaped, and the both ends of the sliding rail (30) are fixed
On the inner wall of furnace body (2), the slide plate (16) is set on sliding rail (30).
4. the intelligent chemical gas phase reaction precipitation equipment as described in claim 1 for being used to prepare graphene, which is characterized in that
The both sides of the spring (19) are equipped with positioning unit, and the positioning unit includes convex block (31), locating rod (32) and locating ring
(33), the convex block (31) is fixed on by locating rod (32) in first gear (18), and the locating ring (33) is fixed on fixture block
(20) on, the locating ring (33) is set in locating rod (32).
5. the intelligent chemical gas phase reaction precipitation equipment as described in claim 1 for being used to prepare graphene, which is characterized in that
The connection component includes rotating bar (34), connection ring (35) and two first supports (36), and the rotating bar (34) is fixed on
In first gear (18), the connection ring (35) is set in rotating bar (34), two first support (36) companies of being separately positioned on
The both sides of ring (35) are connect, the connection ring (35) is fixedly connected by first support (36) with side plate (17).
6. the intelligent chemical gas phase reaction precipitation equipment as claimed in claim 5 for being used to prepare graphene, which is characterized in that
The both sides of the connection ring (35) are equipped with clamping plate (37), and the clamping plate (37) is fixed in rotating bar (34).
7. the intelligent chemical gas phase reaction precipitation equipment as described in claim 1 for being used to prepare graphene, which is characterized in that
The telescoping mechanism includes the 4th motor (38), the 4th drive shaft (39) and casing (40), and the 4th motor (38) is fixed on
In translational block (8), the 4th motor (38) is electrically connected with PLC, and the 4th motor (38) is driven with the 4th drive shaft (39)
Connection, described sleeve pipe (40) are set in the 4th drive shaft (39), and described sleeve pipe (40) is fixedly connected with movable plate (9), described
The periphery of 4th drive shaft (39) is equipped with external screw thread, is equipped with internal thread in described sleeve pipe (40), the interior spiral shell in described sleeve pipe (40)
Line matches with the external screw thread in the 4th drive shaft (39).
8. the intelligent chemical gas phase reaction precipitation equipment as claimed in claim 7 for being used to prepare graphene, which is characterized in that
The telescoping mechanism further includes retainer ring (41) and two second supports (42), and the retainer ring (41) is set in casing (40)
On, two second supports (42) are separately positioned on the both sides of retainer ring (41), and the retainer ring (41) passes through second support (42)
It is fixedly connected with the 4th motor (38).
9. the intelligent chemical gas phase reaction precipitation equipment as described in claim 1 for being used to prepare graphene, which is characterized in that
The runner assembly further includes support ring (43), and the support ring (43) is fixed on movable plate (9), support ring (43) set
It is located in the second drive shaft (22).
10. the intelligent chemical gas phase reaction precipitation equipment as described in claim 1 for being used to prepare graphene, feature exist
Be equipped with range sensor (44) in one end of, the separate movable plate (9) of the side plate (17), the range sensor (44) with
PLC is electrically connected.
Priority Applications (1)
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CN201810105369.7A CN108193195A (en) | 2018-02-02 | 2018-02-02 | A kind of intelligent chemical gas phase reaction precipitation equipment for being used to prepare graphene |
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CN201810105369.7A CN108193195A (en) | 2018-02-02 | 2018-02-02 | A kind of intelligent chemical gas phase reaction precipitation equipment for being used to prepare graphene |
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CN201810105369.7A Withdrawn CN108193195A (en) | 2018-02-02 | 2018-02-02 | A kind of intelligent chemical gas phase reaction precipitation equipment for being used to prepare graphene |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108624869A (en) * | 2018-07-16 | 2018-10-09 | 深圳先进技术研究院 | Fixture and precipitation equipment for sheet material double-sided deposition coating |
CN112575372A (en) * | 2020-12-05 | 2021-03-30 | 王力群 | Laminated external expanding type silicon rod forming equipment |
CN113862639A (en) * | 2021-09-15 | 2021-12-31 | 杭州中欣晶圆半导体股份有限公司 | Continuous preparation system and preparation method of CVD low-temperature oxide film |
CN114031070A (en) * | 2021-12-18 | 2022-02-11 | 北京泰科诺科技有限公司 | Device capable of realizing continuous growth of graphene |
-
2018
- 2018-02-02 CN CN201810105369.7A patent/CN108193195A/en not_active Withdrawn
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108624869A (en) * | 2018-07-16 | 2018-10-09 | 深圳先进技术研究院 | Fixture and precipitation equipment for sheet material double-sided deposition coating |
CN112575372A (en) * | 2020-12-05 | 2021-03-30 | 王力群 | Laminated external expanding type silicon rod forming equipment |
CN113862639A (en) * | 2021-09-15 | 2021-12-31 | 杭州中欣晶圆半导体股份有限公司 | Continuous preparation system and preparation method of CVD low-temperature oxide film |
CN113862639B (en) * | 2021-09-15 | 2024-03-01 | 杭州中欣晶圆半导体股份有限公司 | Continuous preparation system and preparation method for CVD low-temperature oxide film |
CN114031070A (en) * | 2021-12-18 | 2022-02-11 | 北京泰科诺科技有限公司 | Device capable of realizing continuous growth of graphene |
CN114031070B (en) * | 2021-12-18 | 2022-05-24 | 北京泰科诺科技有限公司 | Device capable of realizing continuous growth of graphene |
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