CN108103475A - A kind of high gas phase reaction depositing device of production efficiency for being used to prepare graphene - Google Patents
A kind of high gas phase reaction depositing device of production efficiency for being used to prepare graphene Download PDFInfo
- Publication number
- CN108103475A CN108103475A CN201810023138.1A CN201810023138A CN108103475A CN 108103475 A CN108103475 A CN 108103475A CN 201810023138 A CN201810023138 A CN 201810023138A CN 108103475 A CN108103475 A CN 108103475A
- Authority
- CN
- China
- Prior art keywords
- motor
- production efficiency
- furnace body
- gas phase
- phase reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4587—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically
- C23C16/4588—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically the substrate being rotated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps
Abstract
The present invention relates to a kind of high gas phase reaction depositing devices of production efficiency for being used to prepare graphene,Including furnace body and bell,The lower section of bell is equipped with interior heat engine structure,Deposition mechanism is equipped in furnace body,Deposition mechanism includes fastening assembly and several deposit subassemblies,Deposit subassembly includes montant,Lantern ring and two substrates,Fastening assembly includes the second motor,Driving wheel and several fastening units,Interior heat engine structure includes lifting assembly,Elevator and several second infrared lamps,The high gas phase reaction depositing device of production efficiency for being used to prepare graphene heats the inner surface of substrate by interior heat engine structure,Accelerate substrate heating,Accelerate the decomposition deposition velocity of carbon atom,So as to improve production efficiency,Moreover,Each substrate is fastened by the fastening assembly in deposition mechanism,Prevent that substrate from being influenced by air-flow and turntable rotation and is rotated,Influence the heated of substrate,So as to ensure that the production efficiency of graphene,Improve the practicability of equipment.
Description
Technical field
The present invention relates to new material production equipment field, more particularly to it is a kind of be used to prepare graphene production efficiency it is high
Gas phase reaction depositing device.
Background technology
Graphene is a kind of honeycomb flat film formed in a specific way by carbon atom, and being a kind of, there are one atomic layers
The quasi- two-dimensional material of thickness does monoatomic layer graphite so being called.The common power production method of graphene is mechanical glass at present
Glass method, oxidation-reduction method, silicon carbide epitaxial growth method etc., film production method be chemical vapour deposition technique (CVD), wherein CVD
Method can prepare the graphene of high quality large area, meet the requirement of prepare with scale high-quality graphene.
CVD method is when preparing graphene, usually using nickel as substrate, carbonaceous gas is passed through in cvd furnace, such as：Nytron
Object, carbon resolve into the surface that carbon atom is deposited on nickel at high temperature, form graphene, by slight chemical etching, make graphite
Alkene film and the isolated graphene film of nickel sheet.It can be obtained by the preparation method of graphene, graphene is mainly deposited on substrate
Surface, the degree of gas phase reaction depend on the depositing temperature of substrate surface, but in existing gaseous phase deposition stove, mostly only to base
The single side of piece is heated, and in another side, the temperature for realizing substrate surface by heat transfer rises, and this results in substrates
The surface temperature rate of climb is slow, and then affects sedimentation rate, and the production efficiency for causing graphene is low.
The content of the invention
The technical problem to be solved by the present invention is to：Graphite is used to prepare in order to overcome the deficiencies of the prior art and provide one kind
The high gas phase reaction depositing device of the production efficiency of alkene.
The technical solution adopted by the present invention to solve the technical problems is：A kind of production efficiency for being used to prepare graphene is high
Gas phase reaction depositing device, including furnace body, air inlet pipe, air outlet pipe, bell and at least two legs, the air inlet pipe is arranged on
The one side of furnace body, the air outlet pipe are arranged on the opposite side of furnace body, and the air inlet pipe and air outlet pipe are connected with furnace body, the branch
Foot is circumferentially evenly distributed on the lower section of furnace body, and the bell is arranged on the top of furnace body, and it is red to be equipped with several first in the furnace body
Outer fluorescent tube, first infrared lamp are circumferentially evenly distributed on the inner wall of furnace body, and the shape of the vertical cross-section of the bell is U
Shape, the lower section of the opening in the U-shaped section are equipped with interior heat engine structure, deposition mechanism are equipped in the furnace body；
The deposition mechanism includes the first motor, turntable, fastening assembly and several deposit subassemblies, and first motor is fixed
In the in vivo bottom of stove, first motor is sequentially connected with turntable, and the fastening assembly is arranged on the top of turntable, described heavy
Product component is circumferentially evenly distributed on the periphery of fastening assembly；
The deposit subassembly includes montant, lantern ring and two substrates, the bottom of the montant and is fixed on turntable, the set
Ring set is located on montant, and two substrates are separately positioned on the both sides of montant；
The fastening assembly includes the second motor, driving wheel and several fastening units, and second motor is fixed on turntable
Top, second motor and driving wheel be sequentially connected, and the fastening unit is circumferentially evenly distributed on the periphery of driving wheel, institute
Fastening unit is stated to correspond with deposit subassembly；
The interior heat engine structure includes lifting assembly, elevator and several second infrared lamps, the lifting assembly and lifting
Block is sequentially connected, and second infrared lamp is circumferentially evenly distributed on the periphery of elevator, and it is single that the lifting assembly includes driving
Member, movable block, fixed block, expansion bracket, hinged block and two struts, the driving unit is sequentially connected with movable block, described solid
Determine the lower section that block is fixed on bell, the both sides on the top of the expansion bracket are hinged respectively with movable block and fixed block, described flexible
The both sides of the bottom of frame are hinged respectively by two struts with hinged block, and the hinged block is fixed on the top of elevator.
Preferably, in order to be fastened to substrate, the fastening unit includes first connecting rod, second connecting rod, mobile bar
With two anchorage bars, one end and the driving wheel of the first connecting rod are hinged, the other end of the first connecting rod and second connecting rod
One end is hinged, and for the other end of the second connecting rod with being fixedly connected at the center of mobile bar, the anchorage bar is a pair of with substrate one
Should, two anchorage bars are separately positioned on the one side of the close substrate of mobile bar.
Preferably, in order to fix the moving direction of second connecting rod, the fastening unit further includes retainer ring, the fixation
Ring is fixed on the top of turntable, and the Fixing shrink ring is located on second connecting rod.
Preferably, in order to which movable block is driven to move, the driving unit includes the 3rd motor and the 3rd drive shaft, described
3rd motor is located at the one side of the separate fixed block of movable block, and the 3rd motor is fixed on the lower section of furnace body, and the described 3rd drives
Moving axis is arranged between the 3rd motor and fixed block, and the 3rd motor and the 3rd drive shaft are sequentially connected, the movable block set
It is located in the 3rd drive shaft, the periphery of the 3rd drive shaft is equipped with external screw thread, and internal thread, the shifting are equipped in the movable block
Internal thread in motion block matches with the external screw thread in the 3rd drive shaft.
Preferably, for the ease of the height distance of the second infrared lamp of detection and turntable, the bottom of the elevator is set
There is range sensor.
Preferably, in order to make between the bottom of substrate and turntable there are gap, convenient for reaction gas by the inside of substrate,
The montant is equipped with convex block, and the convex block is located at the lower section of retainer ring.
Preferably, for the ease of driving two substrates mobile simultaneously, the deposit subassembly further includes link, the company
The shape of the vertical cross-section of frame is connect as U-shaped, Open Side Down in the U-shaped section, and the both ends of the link are separately fixed at two
The top of a substrate.
Preferably, in order to which auxiliary turntable rotates, the lower section of the turntable is at least provided with two pillars, the pillar circumferential direction
Be evenly distributed on the periphery of the first motor, the bottom of the pillar is fixed on the in vivo bottom of stove, the top of the pillar against
In the lower section of turntable.
Preferably, rotating suffered frictional force to reduce turntable, the top of the pillar is equipped with recess, the recess
Interior to be equipped with steel ball, the steel ball matches with recess, and the centre of sphere of the steel ball is located in recess, and the steel ball is resisted against turntable
Lower section.
Preferably, in order to ensure the driving force of the second motor, second motor is DC servo motor.
The invention has the advantages that the high gas phase reaction depositing device of production efficiency for being used to prepare graphene passes through
Interior heat engine structure makes the second infrared lamp be heated between stretching into each deposit subassembly to the inner surface of substrate, accelerates substrate liter
Temperature accelerates the decomposition deposition velocity of carbon atom, so as to improve production efficiency, compared with existing interior heat engine structure, and the interior heat engine
Structure controls the lifting of elevator and the second infrared lamp by expansion bracket, reduces the space occupied, makes the structure of equipment more
It is compact, moreover, each substrate is fastened by the fastening assembly in deposition mechanism, prevents substrate by air-flow and turntable
The influence of rotation and rotate, the heated of substrate is influenced, so as to ensure that the production efficiency of graphene, with existing fastening group
Part is compared, which the fastening to multiple substrates can be realized by second motor, so as to by reducing by the second electricity
The quantity of machine reduces the cost of equipment, improves the practicability of equipment.
Description of the drawings
The present invention is further described with reference to the accompanying drawings and examples.
Fig. 1 is the structural representation of the high gas phase reaction depositing device of the production efficiency for being used to prepare graphene of the present invention
Figure；
Fig. 2 is the deposition mechanism of the high gas phase reaction depositing device of the production efficiency for being used to prepare graphene of the present invention
Structure diagram；
Fig. 3 is the deposit subassembly of the high gas phase reaction depositing device of the production efficiency for being used to prepare graphene of the present invention
Top view；
Fig. 4 is the interior heat engine structure of the high gas phase reaction depositing device of the production efficiency for being used to prepare graphene of the present invention
Structure diagram；
In figure：1. furnace body, 2. air inlet pipe, 3. air outlet pipes, 4. bells, 5. legs, 6. first motors, 7. turntables, 8. montants,
9. lantern ring, 10. substrates, 11. second motors, 12. driving wheels, 13. elevators, 14. second infrared lamps, 15. movable blocks, 16.
Fixed block, 17. expansion brackets, 18. hinged blocks, 19. struts, 20. first connecting rods, 21. second connecting rods, 22. mobile bars, 23. fastenings
Bar, 24. retainer rings, 25. the 3rd motors, 26. the 3rd drive shafts, 27. range sensors, 28. convex blocks, 29. links, 30.
Column, 31. steel balls, 32. first infrared lamps.
Specific embodiment
In conjunction with the accompanying drawings, the present invention is further explained in detail.These attached drawings are simplified schematic diagram, only with
Illustration illustrates the basic structure of the present invention, therefore it only shows composition related to the present invention.
As shown in Figure 1, a kind of high gas phase reaction depositing device of production efficiency for being used to prepare graphene, including furnace body 1,
Air inlet pipe 2, air outlet pipe 3,4 and at least two leg 5 of bell, the air inlet pipe 2 are arranged on the one side of furnace body 1, the air outlet pipe 3
The opposite side of furnace body 1 is arranged on, the air inlet pipe 2 and air outlet pipe 3 are connected with furnace body 1, and the leg 5 is circumferential to be evenly distributed on
The lower section of furnace body 1, the bell 4 are arranged on the top of furnace body 1, and several first infrared lamps 32 are equipped in the furnace body 1, described
First infrared lamp 32 is circumferential to be evenly distributed on the inner wall of furnace body 1, and the shape of the vertical cross-section of the bell 4 is U-shaped, described
The lower section of the opening in U-shaped section is equipped with interior heat engine structure, and deposition mechanism is equipped in the furnace body 1；
The gas phase reaction device is passed through when preparing graphene, by the hydrocarbon gas of reaction by air inlet pipe 2
In furnace body 1, inside furnace body 1, each first infrared lamp 32 emits infrared ray, and the outer surface absorption of deposition mechanism is exothermal infrared,
It elevates the temperature, so that the carbon in hydrocarbon decomposes at high temperature, forms graphene, be deposited in deposition mechanism, instead
Gas after answering is discharged from air outlet pipe 3, in order to accelerate reaction speed, improves production efficiency, by the interior heat engine structure of 4 lower section of bell
From being internally heated for deposition mechanism, accelerate temperature rate-of-rise, graphene is made to be deposited on the inside of deposition mechanism, is carried simultaneously
The high yield of graphene.
As Figure 2-3, the deposition mechanism includes the first motor 6, turntable 7, fastening assembly and several deposit subassemblies, institute
The bottom that the first motor 6 is fixed in furnace body 1 is stated, first motor 6 is sequentially connected with turntable 7, and the fastening assembly is set
In the top of turntable 7, the deposit subassembly is circumferentially evenly distributed on the periphery of fastening assembly；
The deposit subassembly includes montant 8, lantern ring 9 and two substrates 10, and the bottom of the montant 8 is fixed on turntable 7,
The lantern ring 9 is set on montant 8, and two substrates 10 are separately positioned on the both sides of montant 8；
The fastening assembly includes the second motor 11, driving wheel 12 and several fastening units, and second motor 11 is fixed
In the top of turntable 7, second motor 11 is sequentially connected with driving wheel 12, and the fastening unit is circumferentially evenly distributed on driving
The periphery of wheel 12, the fastening unit are corresponded with deposit subassembly；
In deposition mechanism, the first motor 6 drive turntable 7 move in a circle, the top of disk, each deposit subassembly with turn
The rotation of disk 7, in deposit subassembly, by the fixed montant 8 in 9 insertion position of lantern ring, the first infrared lamp 32 is to 9 both sides of lantern ring
The outer surface of substrate 10 is heated, and is decomposed the carbon atom of reaction gas and is deposited on 10 surface of substrate, forms graphene.In order to
The position of fixed substrate 10 prevents the rotation of turntable 7 and the influence of air-flow from substrate 10 being driven to rotate, influence substrate 10 by thermal effect
Fruit fastens the substrate 10 in each deposit subassembly using the fastening assembly at 7 upper center of turntable, in fastening assembly,
By the second motor 11 driving wheel 12 is driven to rotate, each fastening unit that driving wheel 12 drives periphery is made to be carried out to substrate 10 tightly
Gu.
As shown in figure 4, the interior heat engine structure includes lifting assembly, elevator 13 and several second infrared lamps 14, it is described
Lifting assembly is sequentially connected with elevator 13, the circumferential periphery for being evenly distributed on elevator 13 of the second infrared lamp 14, institute
Stating lifting assembly includes driving unit, movable block 15, fixed block 16, expansion bracket 17, hinged block 18 and two struts 19, the drive
Moving cell is sequentially connected with movable block 15, and the fixed block 16 is fixed on the lower section of bell 4, and the two of the top of the expansion bracket 17
Side is hinged with movable block 15 and fixed block 16 respectively, and the both sides of the bottom of the expansion bracket 17 pass through two struts 19 and hinge respectively
It is hinged to connect block 18, the hinged block 18 is fixed on the top of elevator 13.
In lifting assembly, moved by driving unit driving movable block 15, change between movable block 15 and fixed block 16 away from
From when the distance of the two reduces, expansion bracket 17 extends, and elevator 13 is made to stretch between each deposit subassembly, outside elevator 13
The second infrared lamp 14 transmitting infrared ray in week, makes the inside of substrate 10 absorb infrared light, and then raises the temperature of substrate 10,
The heating of substrate 10 is accelerated by the second infrared lamp 14, so as to accelerate reaction rate, while graphene can also be deposited
In the inside of substrate 10, the yield of graphene is improved.
As shown in figure 3, the fastening unit includes first connecting rod 20, second connecting rod 21, mobile bar 22 and two anchorage bars
23, one end of the first connecting rod 20 and driving wheel 12 are hinged, the other end of the first connecting rod 20 and the one of second connecting rod 21
End is hinged, and the other end of the second connecting rod 21 at the center of mobile bar 22 with being fixedly connected, the anchorage bar 23 and substrate 10
It corresponds, two anchorage bars 23 are separately positioned on the one side of the close substrate 10 of mobile bar 22.
With the rotation of driving wheel 12, first connecting rod 20 is driven to rotate, first connecting rod 20 drives second connecting rod 21 to deposition
Component is close, makes the substrate 10 that movable block 15 promotes anchorage bar 23 to deposit subassembly close, two anchorage bars 23 is made to be resisted against base
The surface of piece 10 so as to secure the position of substrate 10, is prevented during graphene is prepared, because of the influence of air-flow and turntable 7
Rotation drive substrate 10 rotate, reduce the heating effect of the first infrared lamp 32 and the second infrared lamp 14.
Preferably, in order to fix the moving direction of second connecting rod 21, the fastening unit further includes retainer ring 24, described
Retainer ring 24 is fixed on the top of turntable 7, and the retainer ring 24 is set on second connecting rod 21.Make the second company using retainer ring 24
Bar 21 is moved along fixed direction, so that the movement of second connecting rod 21 is more steady.
Preferably, in order to which movable block 15 is driven to move, the driving unit includes the 3rd motor 25 and the 3rd drive shaft
26, the 3rd motor 25 is located at the one side of the separate fixed block 16 of movable block 15, and the 3rd motor 25 is fixed on furnace body 1
Lower section, the 3rd drive shaft 26 are arranged between the 3rd motor 25 and fixed block 16, and the 3rd motor 25 and the 3rd drives
Axis 26 is sequentially connected, and the movable block 15 is set in the 3rd drive shaft 26, and the periphery of the 3rd drive shaft 26 is equipped with outer spiral shell
Line, is equipped with internal thread in the movable block 15, the internal thread in the movable block 15 and the external screw thread phase in the 3rd drive shaft 26
Matching.3rd motor 25 is run, and the 3rd drive shaft 26 is driven to rotate, the external screw thread in the 3rd drive shaft 26 is made to act on movable block
Internal thread in 15 so as to which movable block 15 be driven to be moved along the axis direction of the 3rd drive shaft 26, and then changes movable block
The distance between 15 and fixed block 16.
Preferably, for the ease of the height distance of the second infrared lamp of detection 14 and turntable 7, the bottom of the elevator 13
End is equipped with range sensor 27.The bottom of elevator 13 and the height distance of turntable 7 are detected using range sensor 27, so as to just
In the height and position for determining the second infrared lamp 14, convenient for changing the height of the second infrared lamp 14 by lifting assembly, make the
It is heated the inside that two infrared lamps 14 are radiated at substrate 10.
Preferably, in order to make to pass through substrate 10 there are gap convenient for reaction gas between the bottom of substrate 10 and turntable 7
Inside, the montant 8 are equipped with convex block 28, and the convex block 28 is located at the lower section of retainer ring 24.It is prevented using convex block 28 under lantern ring 9
It is sliding, so that there are certain gap air circulation is facilitated to be reacted between the bottom plate of substrate 10 and turntable 7.
Preferably, for the ease of driving two substrates 10 mobile simultaneously, the deposit subassembly further includes link 29, institute
The shape of the vertical cross-section of link 29 is stated as U-shaped, Open Side Down in the U-shaped section, the both ends difference of the link 29
It is fixed on the top of two substrates 10.It is moved by link 29 convenient for two substrates 10 of drive simultaneously.
Preferably, in order to which auxiliary turntable 7 rotates, the lower section of the turntable 7 is at least provided with two pillars 30, the pillar
The 30 circumferential peripheries for being evenly distributed on the first motor 6, the bottom of the pillar 30 is fixed on the bottom in furnace body 1, the pillar
30 top is resisted against the lower section of turntable 7.Using the rotation of 30 Auxiliary support turntable 7 of pillar, 7 stress deformation of turntable is prevented.
Preferably, rotating suffered frictional force to reduce turntable 7, the top of the pillar 30 is equipped with recess, described
Steel ball 31 is equipped in recess, the steel ball 31 matches with recess, and the centre of sphere of the steel ball 31 is located in recess, the steel ball 31
It is resisted against the lower section of turntable 7.Turntable 7 is rotated into suffered sliding friction using steel ball 31 and is changed into rolling friction, so as to reduce
Frictional force, convenient for the smooth rotation of turntable 7.
Preferably, using DC servo motor driving force it is strong the characteristics of, in order to ensure the driving force of the second motor 11, institute
The second motor 11 is stated as DC servo motor.
The gas phase reaction precipitation equipment is when preparing graphene, except the first infrared lamp 32 on 1 inner wall of furnace body is to base
While the outer surface of piece 10 is heated, also by lifting assembly elevator 13 is driven to decline, make the second infrared lamp 14 right
The inner surface of substrate 10 is heated, and is heated up so as to accelerate substrate 10, accelerates the decomposition deposition velocity of carbon atom, so as to improve
Production efficiency moreover, in process of production, drives driving wheel 12 to rotate, makes in fastening unit by fastening assembly
Anchorage bar 23 is resisted against on substrate 10, so as to secure the angle of substrate 10, is prevented in graphene preparation process, substrate 10 is bullied
Stream and turntable 7 rotate influence and rotate, affect the heating effect of the first infrared lamp 32 and the second infrared lamp 14,
So as to ensure that production efficiency.
Compared with prior art, which passes through interior heat
Mechanism makes the second infrared lamp 14 be heated between stretching into each deposit subassembly to the inner surface of substrate 10, accelerates 10 liters of substrate
Temperature accelerates the decomposition deposition velocity of carbon atom, so as to improve production efficiency, compared with existing interior heat engine structure, and the interior heat engine
Structure controls the lifting of 13 and second infrared lamp 14 of elevator by expansion bracket 17, reduces the space occupied, makes the knot of equipment
Structure is more compact, and moreover, each substrate 10 is fastened by the fastening assembly in deposition mechanism, prevent substrate 10 by
Influence that air-flow and turntable 7 rotate and rotate, influence the heated of substrate 10, so as to ensure that the production efficiency of graphene,
Compared with existing fastening assembly, which the fastening to multiple substrates 10 can be realized by second motor 11,
So as to reduce the cost of equipment by reducing the quantity of the second motor 11, the practicability of equipment is improved.
Using above-mentioned desirable embodiment according to the invention as enlightenment, by above-mentioned description, relevant staff is complete
Various changes and amendments can be carried out without departing from the scope of the technological thought of the present invention' entirely.The technology of this invention
Property scope is not limited to the content on specification, it is necessary to determine its technical scope according to right.
Claims (10)
1. a kind of high gas phase reaction depositing device of production efficiency for being used to prepare graphene, including furnace body (1), air inlet pipe (2),
Air outlet pipe (3), bell (4) and at least two legs (5), the air inlet pipe (2) are arranged on the one side of furnace body (1), the outlet
Pipe (3) is arranged on the opposite side of furnace body (1), and the air inlet pipe (2) and air outlet pipe (3) are connected with furnace body (1), the leg
(5) the circumferential lower section for being evenly distributed on furnace body (1), the bell (4) are arranged on the top of furnace body (1), are set in the furnace body (1)
There are several first infrared lamps (32), first infrared lamp (32) is circumferentially evenly distributed on the inner wall of furnace body (1), special
Sign is that the shape of the vertical cross-section of the bell (4) is U-shaped, and the lower section of the opening in the U-shaped section is equipped with interior heat engine structure,
Deposition mechanism is equipped in the furnace body (1)；
The deposition mechanism includes the first motor (6), turntable (7), fastening assembly and several deposit subassemblies, first motor
(6) bottom being fixed in furnace body (1), first motor (6) are sequentially connected with turntable (7), and the fastening assembly is arranged on
The top of turntable (7), the deposit subassembly are circumferentially evenly distributed on the periphery of fastening assembly；
The deposit subassembly includes montant (8), lantern ring (9) and two substrates (10), and the bottom of the montant (8) is fixed on turntable
(7) on, the lantern ring (9) is set on montant (8), and two substrates (10) are separately positioned on the both sides of montant (8)；
The fastening assembly includes the second motor (11), driving wheel (12) and several fastening units, and second motor (11) is solid
The top of turntable (7) is scheduled on, second motor (11) is sequentially connected with driving wheel (12), and the fastening unit is circumferential uniformly to be divided
Cloth is corresponded in the periphery of driving wheel (12), the fastening unit with deposit subassembly；
The interior heat engine structure include lifting assembly, elevator (13) and several second infrared lamps (14), the lifting assembly and
Elevator (13) is sequentially connected, and second infrared lamp (14) is circumferentially evenly distributed on the periphery of elevator (13), the liter
Part of coming down to a lower group includes driving unit, movable block (15), fixed block (16), expansion bracket (17), hinged block (18) and two struts (19),
The driving unit is sequentially connected with movable block (15), and the fixed block (16) is fixed on the lower section of bell (4), the expansion bracket
(17) both sides on top are hinged with movable block (15) and fixed block (16) respectively, the both sides point of the bottom of the expansion bracket (17)
Not hinged by two struts (19) and hinged block (18), the hinged block (18) is fixed on the top of elevator (13).
2. the high gas phase reaction depositing device of the production efficiency for being used to prepare graphene as described in claim 1, feature exist
In the fastening unit includes first connecting rod (20), second connecting rod (21), mobile bar (22) and two anchorage bars (23), described
One end of first connecting rod (20) is hinged with driving wheel (12), the other end of the first connecting rod (20) and the one of second connecting rod (21)
End is hinged, the other end of the second connecting rod (21) with being fixedly connected at the center of mobile bar (22), the anchorage bar (23) and
Substrate (10) corresponds, and two anchorage bars (23) are separately positioned on the one side of the close substrate (10) of mobile bar (22).
3. the high gas phase reaction depositing device of the production efficiency for being used to prepare graphene as described in claim 1, feature exist
In the fastening unit further includes retainer ring (24), and the retainer ring (24) is fixed on the top of turntable (7), the retainer ring
(24) it is set on second connecting rod (21).
4. the high gas phase reaction depositing device of the production efficiency for being used to prepare graphene as described in claim 1, feature exist
In the driving unit includes the 3rd motor (25) and the 3rd drive shaft (26), and the 3rd motor (25) is located at movable block
(15) one side of separate fixed block (16), the 3rd motor (25) are fixed on the lower section of furnace body (1), the 3rd drive shaft
(26) it is arranged between the 3rd motor (25) and fixed block (16), the 3rd motor (25) connects with the transmission of the 3rd drive shaft (26)
It connects, the movable block (15) is set in the 3rd drive shaft (26), and the periphery of the 3rd drive shaft (26) is equipped with external screw thread, institute
It states and internal thread is equipped in movable block (15), the internal thread in the movable block (15) and the external screw thread phase in the 3rd drive shaft (26)
Matching.
5. the high gas phase reaction depositing device of the production efficiency for being used to prepare graphene as described in claim 1, feature exist
In the bottom of the elevator (13) is equipped with range sensor (27).
6. the high gas phase reaction depositing device of the production efficiency for being used to prepare graphene as described in claim 1, feature exist
In the montant (8) is equipped with convex block (28), and the convex block (28) is located at the lower section of retainer ring (24).
7. the high gas phase reaction depositing device of the production efficiency for being used to prepare graphene as described in claim 1, feature exist
In the deposit subassembly further includes link (29), and the shape of the vertical cross-section of the link (29) is U-shaped, and the U-shaped is cut
Open Side Down in face, and the both ends of the link (29) are separately fixed at the top of two substrates (10).
8. the high gas phase reaction depositing device of the production efficiency for being used to prepare graphene as described in claim 1, feature exist
In at least provided with two pillars (30), the pillar (30) is circumferentially evenly distributed on the first motor for the lower section of the turntable (7)
(6) periphery, the bottom of the pillar (30) are fixed on the bottom in furnace body (1), and the top of the pillar (30), which is resisted against, to be turned
The lower section of disk (7).
9. the high gas phase reaction depositing device of the production efficiency for being used to prepare graphene as claimed in claim 8, feature exist
In the top of the pillar (30) is equipped with recess, and steel ball (31), the steel ball (31) and recess phase are equipped in the recess
Match somebody with somebody, the centre of sphere of the steel ball (31) is located in recess, and the steel ball (31) is resisted against the lower section of turntable (7).
10. the high gas phase reaction depositing device of the production efficiency for being used to prepare graphene as described in claim 1, feature exist
In second motor (11) is DC servo motor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810023138.1A CN108103475A (en) | 2018-01-10 | 2018-01-10 | A kind of high gas phase reaction depositing device of production efficiency for being used to prepare graphene |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810023138.1A CN108103475A (en) | 2018-01-10 | 2018-01-10 | A kind of high gas phase reaction depositing device of production efficiency for being used to prepare graphene |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108103475A true CN108103475A (en) | 2018-06-01 |
Family
ID=62218920
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810023138.1A Withdrawn CN108103475A (en) | 2018-01-10 | 2018-01-10 | A kind of high gas phase reaction depositing device of production efficiency for being used to prepare graphene |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108103475A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110042368A (en) * | 2019-05-14 | 2019-07-23 | 合肥本源量子计算科技有限责任公司 | A kind of device of chemical vapor deposition production graphene hetero-junctions |
| CN111261996A (en) * | 2020-01-19 | 2020-06-09 | 河南煜和石墨烯应用技术研究院有限公司 | Adjustable graphene radio frequency antenna for terminal communication equipment |
-
2018
- 2018-01-10 CN CN201810023138.1A patent/CN108103475A/en not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110042368A (en) * | 2019-05-14 | 2019-07-23 | 合肥本源量子计算科技有限责任公司 | A kind of device of chemical vapor deposition production graphene hetero-junctions |
| CN111261996A (en) * | 2020-01-19 | 2020-06-09 | 河南煜和石墨烯应用技术研究院有限公司 | Adjustable graphene radio frequency antenna for terminal communication equipment |
| CN111261996B (en) * | 2020-01-19 | 2020-12-22 | 河南煜和石墨烯应用技术研究院有限公司 | Adjustable graphene radio frequency antenna for terminal communication equipment |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108103475A (en) | A kind of high gas phase reaction depositing device of production efficiency for being used to prepare graphene | |
| US20160118291A1 (en) | Multi-wafer rotating disc reactor with inertial planetary drive | |
| CN207760424U (en) | A kind of gas phase reaction depositing device that the production efficiency being used to prepare graphene is high | |
| CN87105973A (en) | The pressing bend method of sheet material and equipment | |
| CN108193195A (en) | A kind of intelligent chemical gas phase reaction precipitation equipment for being used to prepare graphene | |
| CN103820769A (en) | Reaction chamber and MOCVD equipment | |
| CN102560432A (en) | Substrate loading device and substrate processing device applying same | |
| CN106221714A (en) | A kind of continuous pyrolysis stove | |
| CN108046245A (en) | A kind of chemical gas phase reaction precipitation equipment for being suitable for batch and preparing graphene | |
| CN208150972U (en) | A kind of chemical gas phase reaction precipitation equipment suitable for preparing graphene in batches | |
| CN103708718B (en) | Base glass material stretching device | |
| CN110026148A (en) | A kind of uniformly mixed reaction kettle being used to prepare Corvic | |
| CN101011690B (en) | Thermal rotational molding technique and device for inner wall and outer wall of metal pipe | |
| CN206591177U (en) | Multistation graphene fast-growth equipment | |
| CN207793423U (en) | A kind of intelligent chemical gas phase reaction precipitation equipment being used to prepare graphene | |
| CN103204625A (en) | Round table toughening furnace with reverse side at circumference | |
| CN113046826A (en) | Device and method capable of improving utilization rate of raw materials | |
| CN111486683A (en) | U-shaped quartz tube drying device | |
| CN209246664U (en) | Silicon carbide heating device | |
| CN117187785B (en) | Chemical vapor deposition device and method | |
| CN215050528U (en) | Heat treatment device for automobile fastener | |
| CN117804234A (en) | Oxygen injection calcining device for zinc oxide production | |
| CN200952892Y (en) | Uniform heating cyclone solidifying furnace | |
| CN2697549Y (en) | Rotary cocoon drying machine | |
| CN208201175U (en) | A kind of polycrystalline copper single crystallization production annealing device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WW01 | Invention patent application withdrawn after publication |
Application publication date: 20180601 |
|
| WW01 | Invention patent application withdrawn after publication |