CN108193168A - Mask plate and preparation method thereof - Google Patents
Mask plate and preparation method thereof Download PDFInfo
- Publication number
- CN108193168A CN108193168A CN201810053569.2A CN201810053569A CN108193168A CN 108193168 A CN108193168 A CN 108193168A CN 201810053569 A CN201810053569 A CN 201810053569A CN 108193168 A CN108193168 A CN 108193168A
- Authority
- CN
- China
- Prior art keywords
- mask plate
- grid
- recessed portion
- open region
- strip structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Abstract
The present invention proposes a kind of mask plate, and including integrally formed framework, which is additionally provided with a recessed portion, and patterned grid is equipped in the recessed portion.Recessed portion is formed by being etched on an entire thin plate, recessed portion is an integral molding structure with being looped around the receptacle frame of recessed portion setting, and is carried out patterned process on recessed portion and formed grid, and accurate mask plate is finally laid on the grid.The grid of mask plate provided in this embodiment can be more docile on substrate, cost of manufacture is reduced relative to existing mask plate, the PPA stability of mask plate is improved, solves the problems, such as that the display such as colour mixture, variegation caused by since the bonding state of substrate and mask plate is bad is bad.
Description
Technical field
The present invention relates to a kind of display technology field more particularly to a kind of mask plates and its making side for OLED vapor depositions
Method.
Background technology
In recent years, Organic Light Emitting Diode (Organic Light Emitting Diode, OLED) display with it is frivolous,
Actively shine, fast response time, many advantages, such as visual angle is wide, rich in color, brightness is high, low in energy consumption and high-low temperature resistant and by industry
Boundary is considered the novel display technology after liquid crystal display (Liquid Crystal Display, LCD), OLED display
It can be widely applied to the end products such as smart mobile phone, tablet computer, TV.
In the prior art, it is that OLED is deposited under vacuum conditions, it will be as the oled substrate court of process object
Its vapor deposition face is installed downwards, when the metal cover of vapor deposition is configured between the vapor deposition face of oled substrate and evaporation source, will be steamed
Plating source is heated so that evaporation material evaporates, and it is made to be attached to oled substrate surface via the opening portion of metal cover and steamed
Plating.For example, current OLED vapor depositions use fine metal shade (Fine Metal Mask, FMM), it is contemplated that mode of throwing the net and
Be deposited processing procedure facility, the metal frame (Frame) of fine metal shade is often hollow out, then on the metal frame of hollow out by
One welding of throwing the net forms the shielding portion (Cover) of horizontal direction, then vertically forms support bar in the top of shielding portion
(Howling), multiple metal strips (Mask Sheet) and in the side for being parallel to shielding portion are set up, are blocked by shielding portion
Gap between two adjacent metal strips, and using support bar so as to support these metal strips.
In evaporation process, there cannot be gap between metal cover and the substrate to be deposited, in order to avoid cause evaporation material
It is excessive and generate shadow effect.It therefore, can be close when surface sets magnet plate by metal cover because the attraction of magnetic force
It is docile on substrate.At this point, metal cover is individually to be welded on metal frame, and magnet due to its support bar and shielding portion
Plate is non-uniformity, and support bar deforms the open region of metal cover with shielding portion discontinuity, during vapor deposition
Easily cause evaporation material vapor deposition leads to colour mixture less than the specific region of design, influences product yield.
Invention content
In view of this, the present invention is directed to propose a kind of mask plate and preparation method thereof, to solve mask plate in the prior art
Because its shielding portion and support bar are individually welded on metal frame, and the shielding portion of mask plate and the overlapping region of support bar is caused to exist
The magnetic force of magnet plate has subtle deformation under attracting, and it is specific less than design that evaporation material vapor deposition is easily caused during vapor deposition
Region leads to the problem of colour mixture.
The embodiment of the present invention provides a kind of mask plate, and including integrally formed framework, which is additionally provided with a recessed portion, should
Patterned grid is equipped in recessed portion.
Further, the grid include first part and second part, the first part include it is a plurality of in a first direction
The strip structure of parallel distribution, the second part include the strip structure of a plurality of parallel distribution in a second direction, this first
Point with the second part it is interlaced formed the grid, the first direction and the second direction are perpendicular.
Further, it is limited by the first part with the second part and to form multiple be not attached to each other and array arrangement is opened
Mouth region.
Further, the width of the first part and the second part is of same size, the thickness of the first part with should
The thickness of second part is identical.
Further, which further includes the accurate mask plate being set on the grid, which includes more
The strip structure of a spaced distribution is provided with area of the pattern on the strip structure.
Further, the parallel first part of multiple strip structures sets and covers the open region；Or, multiple strips
Parallelism structural sets in the second part and covers the open region, and the area of the pattern of the strip structure is corresponding with open region.
Based on same inventive concept, the embodiment of the present invention also provides a kind of mask board manufacturing method, which includes：
One thin plate is provided；
Photoresist is coated on the thin plate, development is exposed to the photoresist, forms a recessed portion, and recessed at this
There is photoresist protection zone to be integrally formed a framework on concave portion periphery；
Patterned process is carried out to the recessed portion, forms grid.
Further, the grid include first part and second part, the first part include it is a plurality of in a first direction
The strip structure of parallel distribution, the second part include the strip structure of a plurality of parallel distribution in a second direction, first direction
It is mutually perpendicular to second direction, is limited by the first part and the second part and form multiple be not attached to each other and in array arrangement
Open region.
Further, the width of the first part and the second part is of same size, the thickness of the first part with should
The thickness of second part is identical.
Further, the accurate mask plate of laying of throwing the net is carried out on the grid so that the strip structure of the precision mask plate
The first part is parallel to set and cover the open region；Or multiple strip structures are parallel to the second part and set and cover
The open region；The area of the pattern of the strip structure is corresponding with the open region.
Mask plate provided in an embodiment of the present invention and preparation method thereof forms recess by being etched on an entire thin plate
Portion, recessed portion are an integral molding structure with being looped around the framework on recessed portion periphery, and patterned process shape is carried out on recessed portion
Into grid, accurate mask plate is finally laid on the grid, can avoid in the prior art shielding portion independently formed with support bar
On metal frame, the shielding portion of mask plate and the overlapping region of support bar is caused to stretch and generate in the case where the magnetic force of magnet plate attracts
Creeping phenomenon causes open region to have the problem of subtle flow, and the grid of mask plate provided in this embodiment can be more docile in substrate
On, cost of manufacture is reduced relative to existing mask plate, improves PPA (aperture position precision) stability of mask plate, is solved
Determined due to the bonding state of substrate and mask plate it is bad caused by the bad problem of the display such as colour mixture, variegation.
Description of the drawings
Fig. 1 is the structure diagram of the mask plate of the embodiment of the present invention.
Fig. 2 is the manufacturing process schematic diagram of the mask plate of the embodiment of the present invention.
Fig. 3 is the flow diagram of the production method of the mask plate of the embodiment of the present invention.
Fig. 4 is the structure diagram of the mask plate of another embodiment of the present invention.
Specific embodiment
Technological means and effect used by further to illustrate the present invention to reach predetermined goal of the invention, below in conjunction with
Attached drawing and preferred embodiment to specific embodiment, structure, feature and its effect of the present invention, are described in detail as after.
[first embodiment]
Fig. 1 is the structure diagram of the mask plate of the embodiment of the present invention.Fig. 2 is the making of the mask plate of the embodiment of the present invention
Process schematic.Incorporated by reference to Fig. 1 and Fig. 2, a kind of mask plate 100 includes a framework 101, the downward recessed shape in 101 middle part of framework
Cheng Youyi recessed portions 103, the framework 101 are integrally formed with the recessed portion 103.The framework 101 is set around the recessed portion 103,
Patterned grid 105 is formed in the recessed portion 103.
Specifically, which includes first part 105a and second part 105b, and first part 105a includes a plurality of
The strip structure of parallel distribution in a first direction, second part 105b include the item of a plurality of parallel distribution in a second direction
Shape structure, first part 105a and second part 105b be interlaced to form the grid 105, the first direction with this second
Direction is mutually perpendicular to.For example, first part 105a is horizontally extending, second part 105b is extended in the vertical direction,
Its extending direction is not limited thereto.It is limited to be formed by first part 105a and second part 105b and multiple be not attached to each other
And the open region 107 of array arrangement, the open region 107 are the mesh of the grid 105, pass through the mesh having to display panel
Source region is deposited to form target pattern.Preferably, the width of first part 105a and second part 105b's is of same size, should
The thickness of first part 105a is identical with the thickness of second part 105b.
In the present embodiment, which further includes the accurate mask plate 108 being set on the grid 105, which covers
Diaphragm plate 108 includes the strip structure 108a of multiple spaced distributions, and area of the pattern is provided on strip structure 108a, such as schemes
Shown in 1, the area of the pattern in the present embodiment on strip structure 108a is formed by multiple vacancy sections for rectangle.Wherein, the figure
Case region is the target pattern needed, which may be alternatively provided as non-rectangle such as round, polygon or other are not advised
Then shape.
Specifically, multiple strip structure 108a are parallel to first part 105a and set and cover the open region 107, and
Area of the pattern on strip structure 108a is corresponding with the open region 107, so that evaporation material is by being attached on substrate.It should
Form, various structures when the area of the pattern in explanation, strip structure 108a, attached drawing only depicts simply illustrative
Figure.
In addition, it is necessary to which explanation is that open region 107 can be completely covered in accurate mask plate 108, can also partly cover out
Mouth region 107.
Based on same inventive concept, the present invention also provides a kind of mask board manufacturing method, Fig. 3 is covering for the embodiment of the present invention
The flow diagram of diaphragm plate production method, with reference to Fig. 3, which includes：
S1：One thin plate 10 is provided.During specific preparation, the thickness of thin plate 10 can be made to be reduced to certain journey by way of polishing
Degree, then carry out subsequent step.The thin plate 10 can be made of sheet metal or nonmetallic materials.
S2：Photoresist is coated on the thin plate 10, which is exposed, is developed so that the photoresist
Patterning photoresist layer is formed, and a recessed portion 103 is formed through overetch, it is noted that in this step not thin plate
It cuts through.Meanwhile on 103 periphery of recessed portion there is photoresist layer protection zone to form a framework 101.
S3：Patterned process is carried out to the recessed portion 103, forms grid 105.Specially by light of the shape for target pattern
Cover is placed on 103 top of recessed portion, and is exposed, develops so that the photoresist layer on recessed portion 103 forms patterned photoresist
Layer, is further etched to etch away without photoresist layer protection zone and then form grid 105.
Specifically, patterned grid 105 includes first part 105a and second part 105b, first part 105a packets
The strip structure of a plurality of parallel distribution in a first direction is included, second part 105b includes a plurality of parallel point in a second direction
The strip structure of cloth.It is limited by first part 105a and second part 105a and forms multiple be not attached to each other and in array row
The open region 107 of row.Specifically, which is the mesh of grid 105.In the present embodiment, the width of first part 105a
Degree is of same size with second part 105b's, while the thickness of the thickness of first part 105a and second part 105b
It is identical.
Then, it throws the net on the grid 105 and is laid with accurate mask plate 108, in the present embodiment, accurate mask plate 108 includes
Multiple strip structure 108a, multiple strip structure 108a are parallel to first part 105a and set and cover the open region 107.
Mask plate provided in an embodiment of the present invention and preparation method thereof forms recess by being etched on an entire thin plate
Portion 103, recessed portion 103 are an integral molding structure, and carried out on recessed portion 103 with the framework 101 set around recessed portion 103
Patterned process forms grid 105, and accurate mask plate 108 is finally laid on grid 105 with the open region of grid coverage 105
107, it is more docile on substrate since the first part 105a and second part 105b of grid 105 are an integral structure, so as to
Avoid the shielding portion for because shielding portion and support bar are individually formed on metal frame, leading to mask plate in the prior art and support bar
Overlapping region is stretched in the case where the magnetic force of magnet plate attracts and leading to the problem of creeping phenomenon causes open region to have subtle flow.This reality
Apply the grid 101 of the mask plate 100 of example more docile can reduce cost of manufacture on substrate relative to existing mask plate,
Improve the PPA stability of mask plate, solve due to the bonding state of substrate and mask plate it is bad caused by colour mixture, variegation etc.
Show bad problem.
[second embodiment]
The main distinction of second embodiment of the invention and above-mentioned first embodiment is：The precision mask plate 108 it is multiple
Area of the pattern on strip structure 108a is formed by multiple regularly arranged circular holes, and the area of the pattern of strip structure 108a is opened with this
Mouth region 107 corresponds to, and evaporation material is attached to substrate so as to form target pattern by the circular vapor deposition hole.It should in the present embodiment
Strip structure 108a is parallel to the second part 105b settings of the grid 105.
About the other structures of the present embodiment, above-mentioned first embodiment is may refer to, details are not described herein.
Specific case is applied herein to be expounded mask plate of the present invention and preparation method thereof and embodiment, more than
The explanation of embodiment is merely used to help understand the method and its core concept of the present invention；Meanwhile for the general of this field
Technical staff, thought according to the present invention, the there will be changes on specific embodiment and its application range, to sum up, this theory
Bright book content should not be construed as limiting the invention, and protection scope of the present invention should be subject to appended claim.
Claims (10)
1. a kind of mask plate (100), which is characterized in that including integrally formed framework (101), which is additionally provided with one
Recessed portion (103), the recessed portion (103) is interior to be formed with patterned grid (105).
2. mask plate (100) as described in claim 1, which is characterized in that the grid (105) including first part (105a) with
Second part (105b), the first part (105a) include the strip structure of a plurality of parallel distribution in a first direction, this second
Partly (105b) includes the strip structure of a plurality of parallel distribution in a second direction, the first part (105) and the second part
(105) interlaced formation grid (105), the first direction and the second direction are perpendicular.
3. mask plate (100) as claimed in claim 2, which is characterized in that by the first part (105a) and the second part
(105b) restriction forms multiple be not attached to each other and the open region of array arrangement (107).
4. mask plate (100) as claimed in claim 2, which is characterized in that the width of the first part (105a) with this second
Partly (105b's) is of same size, and the thickness of the first part (105a) is identical with the thickness of the second part (105b).
5. mask plate (100) as claimed in claim 4, which is characterized in that the mask plate (100), which further includes, is set to the grid
(105) the accurate mask plate (108) on, the precision mask plate (108) include the strip structure of multiple spaced distributions
(108a) is provided with area of the pattern on the strip structure (108a).
6. mask plate (100) as claimed in claim 5, which is characterized in that multiple strip structures (108a) be parallel to this
A part of (105a) sets and covers the open region (107)；Or, multiple strip structures (108a) are parallel to the second part
(105b) sets and covers the open region (107).
7. a kind of mask plate (100) production method, which is characterized in that the production method includes：
One thin plate (10) is provided；
Photoresist is coated on the thin plate (10), development is exposed to the photoresist, forms a recessed portion (103), and
On recessed portion (103) periphery there is photoresist protection zone to be integrally formed a framework (101)；
Patterned process is carried out to the recessed portion (103), forms grid (105).
8. mask plate (100) production method as claimed in claim 7, which is characterized in that the grid (105) is including first part
(105a) and second part (105b), the first part (105a) include the strip knot of a plurality of parallel distribution in a first direction
Structure, the second part (105b) include the strip structure of a plurality of parallel distribution in a second direction, the first direction with this second
Direction is mutually perpendicular to, and is limited by the first part (105a) and the second part (105b) and is formed multiple be not attached to each other and in battle array
Arrange the open region (107) of arrangement.
9. mask plate (100) production method as claimed in claim 8, which is characterized in that the width of the first part (105a)
With of same size, the thickness phase of the thickness of the first part (105a) and the second part (105b) of the second part (105b)
Together.
10. mask plate (100) production method as claimed in claim 8, which is characterized in that opened on the grid (105)
Net laying sets accurate mask plate (108) so that the strip structure (108a) of the precision mask plate (108) is parallel to the first part
(105a) sets and covers the open region (107)；Or multiple strip structures (108a) are parallel to the second part (105b) and set
It puts and covers the open region (107)；The area of the pattern of the strip structure (108a) is corresponding with the open region (107).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810053569.2A CN108193168B (en) | 2018-01-19 | 2018-01-19 | Mask plate and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810053569.2A CN108193168B (en) | 2018-01-19 | 2018-01-19 | Mask plate and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108193168A true CN108193168A (en) | 2018-06-22 |
| CN108193168B CN108193168B (en) | 2019-11-29 |
Family
ID=62590203
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810053569.2A Active CN108193168B (en) | 2018-01-19 | 2018-01-19 | Mask plate and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108193168B (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109023235A (en) * | 2018-08-13 | 2018-12-18 | 京东方科技集团股份有限公司 | mask substrate, mask assembly, display panel and display device |
| CN109735802A (en) * | 2019-03-11 | 2019-05-10 | 南京高光半导体材料有限公司 | A kind of support metal mask version and mask plate component and photomask manufacturing method |
| CN109913805A (en) * | 2019-03-27 | 2019-06-21 | 京东方科技集团股份有限公司 | A kind of mask plate |
| CN110857461A (en) * | 2018-08-22 | 2020-03-03 | 鋆洤科技股份有限公司 | Method for manufacturing fine metal mask and manufacturing system thereof |
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| JP2009074160A (en) * | 2007-08-24 | 2009-04-09 | Dainippon Printing Co Ltd | Vapor deposition mask and method for producing vapor deposition mask |
| WO2014155939A1 (en) * | 2013-03-29 | 2014-10-02 | Sony Corporation | Mask frame unit, mask apparatus, and processing method |
| CN104532183A (en) * | 2015-01-26 | 2015-04-22 | 深圳市华星光电技术有限公司 | Manufacturing method of high-precision mask |
| CN205845955U (en) * | 2016-06-07 | 2016-12-28 | 鄂尔多斯市源盛光电有限责任公司 | A kind of mask plate, oled display substrate and display device |
| CN106480404A (en) * | 2016-12-28 | 2017-03-08 | 京东方科技集团股份有限公司 | A kind of mask integrated framework and evaporation coating device |
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Patent Citations (5)
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| JP2009074160A (en) * | 2007-08-24 | 2009-04-09 | Dainippon Printing Co Ltd | Vapor deposition mask and method for producing vapor deposition mask |
| WO2014155939A1 (en) * | 2013-03-29 | 2014-10-02 | Sony Corporation | Mask frame unit, mask apparatus, and processing method |
| CN104532183A (en) * | 2015-01-26 | 2015-04-22 | 深圳市华星光电技术有限公司 | Manufacturing method of high-precision mask |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109023235A (en) * | 2018-08-13 | 2018-12-18 | 京东方科技集团股份有限公司 | mask substrate, mask assembly, display panel and display device |
| CN110857461A (en) * | 2018-08-22 | 2020-03-03 | 鋆洤科技股份有限公司 | Method for manufacturing fine metal mask and manufacturing system thereof |
| CN109735802A (en) * | 2019-03-11 | 2019-05-10 | 南京高光半导体材料有限公司 | A kind of support metal mask version and mask plate component and photomask manufacturing method |
| CN109913805A (en) * | 2019-03-27 | 2019-06-21 | 京东方科技集团股份有限公司 | A kind of mask plate |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108193168B (en) | 2019-11-29 |
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