CN109136835A - A kind of OLED display panel and preparation method thereof, vapor deposition use mask plate - Google Patents
A kind of OLED display panel and preparation method thereof, vapor deposition use mask plate Download PDFInfo
- Publication number
- CN109136835A CN109136835A CN201811100465.9A CN201811100465A CN109136835A CN 109136835 A CN109136835 A CN 109136835A CN 201811100465 A CN201811100465 A CN 201811100465A CN 109136835 A CN109136835 A CN 109136835A
- Authority
- CN
- China
- Prior art keywords
- barrier film
- transmitance
- vapor deposition
- mask plate
- opening portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
The application provides a kind of OLED display panel and preparation method thereof, vapor deposition mask plate, and the vapor deposition mask plate includes: opening portion, corresponds to multiple coating film areas；Occlusion part, corresponding to the non-coating film area except multiple coating film areas；Barrier film is correspondingly arranged in the opening portion position, and is fixed on the occlusion part；Wherein, the transmitance of transmitance of the barrier film to control membrane material, the different zones of the barrier film is different.
Description
Technical field
This application involves display manufacturing technology fields more particularly to a kind of OLED display panel and preparation method thereof, vapor deposition
Use mask plate.
Background technique
In OLED technique, the index for evaluating its performance has very much, such as luminous efficiency, response time, visual angle, production work
Skill, Flexible Displays, device lifetime, display inhomogeneities etc..Wherein, the uneven colour cast that will lead to of display is obvious, entire to shine
The brightness in region is inconsistent or color has difference.
Cause to have the reason of showing inhomogeneities very much, is roughly divided into two classes: first is that the problem of OLED；Second is that TFT problem.
For with regard to the OLED the problem of, current EL material vapor deposition, using fine metal mask plate (Fine Metal Mask, FMM) mode
It carries out, then just will appear above-mentioned described display unevenness colour cast problem, because of the material in the center and peripheral region of pixel
The reason of thickness has differences, and leads to this species diversity is that, in the open area FMM of respective pixel, material is in center and peripheral
Deposition rate is inconsistent, causes film thickness uneven, that is, usually said edge shadow effect (shadow effect).
Therefore, the prior art is defective, needs to improve.
Summary of the invention
The application provides a kind of OLED display panel and preparation method thereof, vapor deposition mask plate, can weaken edge shadow
Effect guarantees the uniformity of display.
To achieve the above object, technical solution provided by the present application is as follows:
The application provides a kind of vapor deposition mask plate, comprising:
Opening portion corresponds to multiple coating film areas；
Occlusion part, corresponding to the non-coating film area except multiple coating film areas；
Barrier film is correspondingly arranged in the opening portion position, and is fixed on the occlusion part；
Wherein, transmitance of the barrier film to control membrane material, the transmitance of the different zones of the barrier film
It is different.
In the vapor deposition mask plate of the application, the transmitance of the barrier film fringe region is higher than the transmission of central area
Rate.
In the vapor deposition mask plate of the application, the corresponding barrier film in an opening portion, and the barrier film
Area is more than or equal to the area of the opening portion.
In the vapor deposition mask plate of the application, the barrier film is attached at the first surface or the second table of the occlusion part
Face, and the barrier film includes at least multiple barrier zones of the corresponding opening portion, and the transmission of the different barrier zones
Rate is different；Alternatively, the transmitance of the different location in each barrier zones is different.
In the vapor deposition mask plate of the application, the buckle for fixing the barrier film is provided on the occlusion part,
The buckle is for the fixed barrier film with different transmitances.
To achieve the above object, the application also provides a kind of using above-mentioned vapor deposition mask plate preparation OLED display panel
Method the described method comprises the following steps:
Step S10, provides the array substrate of an organic luminous layer to be prepared, and the array substrate is formed with pixel openings area
The mask plate is placed in the array substrate top position by domain, and the opening portion corresponds to the pixel openings region, described
Occlusion part blocks the part between the corresponding adjacent two pixel openings region；
Step S20 carries out the vapor deposition of luminous organic material using the mask plate as exposure mask；
Step S30, the luminous organic material being deposited to the corresponding occlusion part are blocked by the occlusion part, and vapor deposition arrives
The luminous organic material of the corresponding opening portion is deposited through the barrier film to the corresponding pixel openings region, shape
At the organic luminous layer；
Wherein, transmitance of the luminous organic material on the barrier film of the correspondence opening portion is different, so that
The thickness of the organic luminous layer formed is uniform.
In the present processes, transmitance of the luminous organic material in barrier film edge region is higher than
The transmitance of central area.
In the present processes, the luminous organic material is in the marginal portion of the barrier zones of the barrier film
Transmitance be higher than central part transmitance.
In the present processes, after the step S30, the method also includes following steps:
Step S40 prepares cathode layer in the array substrate.
To achieve the above object, the application also provides a kind of OLED display panel prepared using the above method, comprising:
Underlay substrate；
Tft layer is prepared on the underlay substrate；
Pixel defining layer is prepared on the tft layer, and defines pixel region；
Organic luminous layer is prepared in the pixel region that the pixel defining layer defines；
Wherein, the thicknesses of layers of the different location of the organic luminous layer is uniform.
Having the beneficial effect that for the application is mentioned compared to existing OLED display panel and its vapor deposition mask plate, the application
For OLED display panel and preparation method thereof, vapor deposition mask plate, added by the opening portion in mask plate have it is different saturating
Cross the barrier film of rate, preferably the transmitance of the barrier film corresponding opening portion fringe region transmitance that is higher than central area, so that
The deposition rate at center and peripheral position of luminous organic material during vapor deposition in respective pixel region is consistent, from
And keep the film thickness of the organic luminous layer formed uniform, and then avoid or weaken edge shadow effect, guarantee the uniformity of display.
Detailed description of the invention
It, below will be to embodiment or the prior art in order to illustrate more clearly of embodiment or technical solution in the prior art
Attached drawing needed in description is briefly described, it should be apparent that, the accompanying drawings in the following description is only some of application
Embodiment for those of ordinary skill in the art without creative efforts, can also be attached according to these
Figure obtains other attached drawings.
Fig. 1 is vapor deposition mask structure being schematic diagram provided by the embodiments of the present application；
Fig. 2 is the method flow diagram that OLED display panel is prepared using the mask plate in Fig. 1.
Specific embodiment
The explanation of following embodiment is referred to the additional illustration, the particular implementation that can be used to implement to illustrate the application
Example.The direction term that the application is previously mentioned, such as [on], [under], [preceding], [rear], [left side], [right side], [interior], [outer], [side]
Deng being only the direction with reference to annexed drawings.Therefore, the direction term used be to illustrate and understand the application, rather than to
Limit the application.The similar unit of structure is with being given the same reference numerals in the figure.
The application be directed to the prior art OLED display panel, due to luminescent material during vapor deposition in respective pixel
The deposition rate of the center and peripheral position in region is inconsistent, and causes film thickness uneven, so as to cause display panel edge shadow
The technical issues of effect, the present embodiment are able to solve the defect.
As shown in Figure 1, for vapor deposition mask structure being schematic diagram provided by the embodiments of the present application.Vapor deposition mask plate packet
Include: opening portion 10 corresponds to multiple coating film areas；Occlusion part 11, corresponding to the non-plated film area except multiple coating film areas
Domain；Barrier film 12, is correspondingly arranged in the position of the opening portion 10, and is fixed on the occlusion part 11；Wherein, the blocking
The transmitance of transmitance of the film 12 to control membrane material, the different zones of the barrier film 12 is different.Wherein, it is opened described in one
Oral area 10 corresponds to a barrier film 12, and the area of the barrier film 12 is more than or equal to the area of the opening portion 10.It is described
Barrier film 12 can be in unitary design with the occlusion part 11 during prepared by the mask plate；Alternatively, preparing
The position that the opening portion 10 is corresponded on the mask plate attaches the barrier film 12, and the surrounding bound pair of the barrier film 12 is answered
On the occlusion part 11.
In addition, the area of the barrier film 12 can also correspond to whole Zhang Suoshu mask plate, i.e., the boundary of the described barrier film 12
The corresponding marginal position for being located at the mask plate；The barrier film 12 can be attached at the first surface or of the occlusion part 11
Two surfaces, and the barrier film 12 includes at least multiple barrier zones of the corresponding opening portion 10, and the different Resistance
The transmitance in domain is different；Alternatively, the transmitance of the different location in each barrier zones is different.
The mask plate and the barrier film 12 can also be split-type design, i.e., the described mask plate design has described block
Portion 11 and the opening portion 10, and the buckle on the occlusion part 11, the barrier film 12 are fixed by the buckle
On the occlusion part 11, mask assembly is formed.And according to practical process requirements, the barrier film 12 can be replaced at any time, institute
The barrier film 12 with different transmitances can be fixed by stating buckle, to meet different process requirements, and be eliminated because different saturating
It crosses the demand of rate and remakes the cost of the mask plate.Certainly, barrier film 12 described herein may be used also with the occlusion part 11
To be fixed using other modes, herein without limitation.
In a preferred embodiment, the mask plate is applied to the vapor deposition of the luminous organic material of OLED display panel,
In, the luminous organic material is higher than the transmitance of central area 120 in the transmitance of 12 fringe region of barrier film；Or
Person, transmitance of the luminous organic material in the marginal portion of the barrier zones of the barrier film 12 are higher than central part
Transmitance.Wherein, described in the fringe region of 120 periphery of the central area 120 and the central area corresponds to
The position of opening portion 10.It is designed by this so that the luminous organic material is during vapor deposition, in respective pixel region
The deposition rate of central part and edge is consistent, to keep the film thickness for the organic luminous layer to be formed uniform, in turn
The edge shadow effect for avoiding or weakening OLED display panel guarantees the uniformity of display.
In addition, central part described in the central area 120/ for the barrier film 12 and the fringe region/
The determination of the range of marginal portion, it is preferred that be not blocked and steamed from different position or orientations with the luminous organic material
Being plated to position corresponding to the pixel region is central part described in the central area 120/, and the opening portion corresponds in described
Region except central part described in heart district domain 120/ is the fringe region/marginal portion.
The present embodiment to the material and thickness of the barrier film 12 without limitation, as long as the film layer for enabling to vapor deposition to be formed
Thickness is uniform.The transmitance of the barrier film 12 can be according to items such as the selection of the barrier film 12 and surface apertures sizes
Part is set.
The application also provides a kind of method using above-mentioned vapor deposition mask plate preparation OLED display panel, as shown in Fig. 2,
It the described method comprises the following steps:
Step S10, provides the array substrate of an organic luminous layer to be prepared, and the array substrate is formed with pixel openings area
The mask plate is placed in the array substrate top position by domain, and the opening portion corresponds to the pixel openings region, described
Occlusion part blocks the part between the corresponding adjacent two pixel openings region；
It is understood that the array substrate includes the tft layer being sequentially prepared on underlay substrate, anode
Other film layers such as layer, pixel defining layer.The opening portion of the mask plate corresponds to the pixel openings region, and the pixel is opened
The i.e. corresponding coating film area in mouth region domain, the i.e. corresponding non-coating film area of the occlusion part.
Step S20 carries out the vapor deposition of luminous organic material using the mask plate as exposure mask；
Wherein, the barrier film or the barrier zones correspond to the pixel openings region；Preferably, the organic light emission
Transmitance of the material in barrier film edge region is higher than the transmitance of central area；Or the luminous organic material
Transmitance in the marginal portion of the barrier zones of the barrier film is higher than the transmitance of central part.
Step S30, the luminous organic material being deposited to the corresponding occlusion part are blocked by the occlusion part, and vapor deposition arrives
The luminous organic material of the corresponding opening portion is deposited through the barrier film to the corresponding pixel openings region, shape
At the organic luminous layer；
Wherein, the difference of the transmitance due to the luminous organic material on the barrier film of the correspondence opening portion
It is different, so that the thickness of the different parts of the organic luminous layer formed is uniform.
After the step S30, the method also includes following steps:
Step S40 prepares cathode layer in the array substrate.
Certainly, further include preparing the techniques such as encapsulated layer on the cathode layer, be not repeated herein.
The application also provides a kind of OLED display panel prepared using the above method, comprising: underlay substrate；Film crystal
Tube layer is prepared on the underlay substrate；Pixel defining layer is prepared on the tft layer, and defines pixel region
Domain；Organic luminous layer is prepared in the pixel region that the pixel defining layer defines；Wherein, the organic luminous layer
The thicknesses of layers of different location keeps uniform, the marginal portion of the organic luminous layer including a corresponding pixel region with
The thickness of central part is uniform.In addition, the OLED display panel further includes other conventional film layers, such as flatness layer, anode
Layer, cathode layer, thin-film encapsulation layer etc., herein without limitation.
OLED display panel provided by the present application and preparation method thereof, vapor deposition mask plate, pass through the opening in mask plate
Portion adds the barrier film with different transmitances, and the preferably transmitance of barrier film corresponding opening portion fringe region is higher than center
The transmitance in domain so that luminous organic material during vapor deposition respective pixel region center and peripheral position deposition
Rate is consistent, to keep the film thickness for the organic luminous layer to be formed uniform, and then avoids or weaken edge shadow effect, is protected
Demonstrate,prove the uniformity of display.
Although above preferred embodiment is not to limit in conclusion the application is disclosed above with preferred embodiment
The application processed, those skilled in the art are not departing from spirit and scope, can make various changes and profit
Decorations, therefore the protection scope of the application subjects to the scope of the claims.
Claims (10)
1. a kind of vapor deposition mask plate characterized by comprising
Opening portion corresponds to multiple coating film areas；
Occlusion part, corresponding to the non-coating film area except multiple coating film areas；
Barrier film is correspondingly arranged in the opening portion position, and is fixed on the occlusion part；
Wherein, the transmitance of transmitance of the barrier film to control membrane material, the different zones of the barrier film is different.
2. vapor deposition mask plate according to claim 1, which is characterized in that the transmitance of the barrier film fringe region is high
Transmitance in central area.
3. vapor deposition mask plate according to claim 1, which is characterized in that the corresponding blocking in an opening portion
Film, and the area of the barrier film is more than or equal to the area of the opening portion.
4. vapor deposition mask plate according to claim 1, which is characterized in that the barrier film is attached at the occlusion part
First surface or second surface, and the barrier film includes at least multiple barrier zones of the corresponding opening portion, and different institutes
The transmitance for stating barrier zones is different；Alternatively, the transmitance of the different location in each barrier zones is different.
5. vapor deposition mask plate according to claim 1, which is characterized in that be provided on the occlusion part for fixing
The buckle of barrier film is stated, the buckle is for the fixed barrier film with different transmitances.
6. a kind of side for preparing OLED display panel with mask plate using vapor deposition described in Claims 1 to 5 any claim
Method, which is characterized in that the described method comprises the following steps:
Step S10 provides the array substrate of an organic luminous layer to be prepared, and the array substrate is formed with pixel openings region,
The mask plate is placed in the array substrate top position, and the opening portion corresponds to the pixel openings region, the screening
Stopper blocks the part between the corresponding adjacent two pixel openings region；
Step S20 carries out the vapor deposition of luminous organic material using the mask plate as exposure mask；
Step S30, the luminous organic material being deposited to the corresponding occlusion part are blocked by the occlusion part, vapor deposition to correspondence
The luminous organic material of the opening portion is deposited through the barrier film to the corresponding pixel openings region, forms institute
State organic luminous layer；
Wherein, transmitance of the luminous organic material on the barrier film of the correspondence opening portion is different, so that being formed
The organic luminous layer thickness it is uniform.
7. according to the method described in claim 6, it is characterized in that, the luminous organic material is in the barrier film edge
The transmitance in region is higher than the transmitance of central area.
8. according to the method described in claim 6, it is characterized in that, the luminous organic material the barrier film the resistance
The transmitance for keeping off the marginal portion in region is higher than the transmitance of central part.
9. according to the method described in claim 6, it is characterized in that, the method also includes following after the step S30
Step:
Step S40 prepares cathode layer in the array substrate.
10. a kind of OLED display panel prepared using method of claim 6 characterized by comprising
Underlay substrate；
Tft layer is prepared on the underlay substrate；
Pixel defining layer is prepared on the tft layer, and defines pixel region；
Organic luminous layer is prepared in the pixel region that the pixel defining layer defines；
Wherein, the thicknesses of layers of the different location of the organic luminous layer is uniform.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811100465.9A CN109136835A (en) | 2018-09-20 | 2018-09-20 | A kind of OLED display panel and preparation method thereof, vapor deposition use mask plate |
| PCT/CN2018/113273 WO2020056866A1 (en) | 2018-09-20 | 2018-11-01 | Oled display panel and preparation method therefor, and mask plate for evaporation plating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811100465.9A CN109136835A (en) | 2018-09-20 | 2018-09-20 | A kind of OLED display panel and preparation method thereof, vapor deposition use mask plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109136835A true CN109136835A (en) | 2019-01-04 |
Family
ID=64815381
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811100465.9A Pending CN109136835A (en) | 2018-09-20 | 2018-09-20 | A kind of OLED display panel and preparation method thereof, vapor deposition use mask plate |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN109136835A (en) |
| WO (1) | WO2020056866A1 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110048030A (en) * | 2019-04-02 | 2019-07-23 | 深圳市华星光电技术有限公司 | A kind of mask plate |
| CN110928050A (en) * | 2019-12-17 | 2020-03-27 | 京东方科技集团股份有限公司 | Curved surface display panel, display device and manufacturing method |
| CN110983248A (en) * | 2019-12-18 | 2020-04-10 | 京东方科技集团股份有限公司 | Mask plate, display panel, manufacturing method of display panel and display device |
| CN111969005A (en) * | 2019-05-20 | 2020-11-20 | 京东方科技集团股份有限公司 | Display panel and method of manufacturing the same |
| CN113416925A (en) * | 2021-06-22 | 2021-09-21 | 合肥维信诺科技有限公司 | Mask plate, forming method and method for forming OLED cathode pattern |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115679254A (en) * | 2022-09-08 | 2023-02-03 | 京东方科技集团股份有限公司 | Mask plate, display substrate and display device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105132861A (en) * | 2015-10-13 | 2015-12-09 | 京东方科技集团股份有限公司 | Evaporation mask plate and evaporation device |
| CN107686961A (en) * | 2016-08-04 | 2018-02-13 | 鸿富锦精密工业（深圳）有限公司 | For depositing the mask of OLED display panel |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101158025A (en) * | 2003-03-07 | 2008-04-09 | 精工爱普生株式会社 | Mask, manufacturing method for mask, manufacturing apparatus for mask |
| JP2009009777A (en) * | 2007-06-27 | 2009-01-15 | Canon Inc | Film forming mask |
| CN106909023B (en) * | 2017-03-30 | 2021-11-16 | 合肥京东方光电科技有限公司 | Mask plate and manufacturing method thereof |
| CN108232041A (en) * | 2018-01-03 | 2018-06-29 | 京东方科技集团股份有限公司 | A kind of mask plate and preparation method thereof |
| CN108170000A (en) * | 2018-01-26 | 2018-06-15 | 深圳市华星光电技术有限公司 | The production method of mask plate and colored filter |
-
2018
- 2018-09-20 CN CN201811100465.9A patent/CN109136835A/en active Pending
- 2018-11-01 WO PCT/CN2018/113273 patent/WO2020056866A1/en active Application Filing
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105132861A (en) * | 2015-10-13 | 2015-12-09 | 京东方科技集团股份有限公司 | Evaporation mask plate and evaporation device |
| CN107686961A (en) * | 2016-08-04 | 2018-02-13 | 鸿富锦精密工业（深圳）有限公司 | For depositing the mask of OLED display panel |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110048030A (en) * | 2019-04-02 | 2019-07-23 | 深圳市华星光电技术有限公司 | A kind of mask plate |
| CN111969005A (en) * | 2019-05-20 | 2020-11-20 | 京东方科技集团股份有限公司 | Display panel and method of manufacturing the same |
| WO2020233305A1 (en) * | 2019-05-20 | 2020-11-26 | 京东方科技集团股份有限公司 | Display panel and method for manufacturing display panel |
| CN111969005B (en) * | 2019-05-20 | 2021-09-17 | 京东方科技集团股份有限公司 | Display panel and method of manufacturing the same |
| US11538877B2 (en) | 2019-05-20 | 2022-12-27 | Chengdu Boe Optoelectronics Technology Co., Ltd. | Display panel and method of manufacturing display panel |
| CN110928050A (en) * | 2019-12-17 | 2020-03-27 | 京东方科技集团股份有限公司 | Curved surface display panel, display device and manufacturing method |
| CN110928050B (en) * | 2019-12-17 | 2022-10-04 | 京东方科技集团股份有限公司 | Curved surface display panel, display device and manufacturing method |
| CN110983248A (en) * | 2019-12-18 | 2020-04-10 | 京东方科技集团股份有限公司 | Mask plate, display panel, manufacturing method of display panel and display device |
| CN113416925A (en) * | 2021-06-22 | 2021-09-21 | 合肥维信诺科技有限公司 | Mask plate, forming method and method for forming OLED cathode pattern |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2020056866A1 (en) | 2020-03-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN109136835A (en) | A kind of OLED display panel and preparation method thereof, vapor deposition use mask plate | |
| CN107699854B (en) | Mask assembly and its manufacturing method | |
| KR100837475B1 (en) | Vapor deposition system and a method of manufacturing an organic light emiting device | |
| CN111088474B (en) | Mask plate and manufacturing method thereof | |
| JP2004199919A (en) | Method for manufacturing organic el display panel | |
| EP3636797B1 (en) | Evaporation mask plate, evaporation mask plate set, and alignment testing method | |
| WO2019228006A1 (en) | Manufacturing method for evaporation mask, and evaporation mask | |
| KR101865926B1 (en) | Method for fabricating Shadow mask for organic electroluminescent display device | |
| CN108470753A (en) | A kind of electroluminescence display panel, its production method and display device | |
| US20210336147A1 (en) | Mask | |
| JP2020536176A (en) | Mask plate and vapor deposition equipment | |
| CN104611668A (en) | Mask plate frame and mask plate | |
| US11066742B2 (en) | Vapor deposition mask | |
| CN107507915B (en) | A kind of substrate and evaporation coating device manufacturing organic light emitting display panel | |
| CN205556762U (en) | Mask plate, mother board, mask plate manufacture equipment and display substrates coating by vaporization system | |
| KR20020092793A (en) | Organic electro-luminescent display apparatus and method for manufacturing the same | |
| CN106384744B (en) | Method for manufacturing organic light emitting display device | |
| CN110299387A (en) | OLED display panel and preparation method | |
| TW200537982A (en) | A divided shadow mask device for fabricating organic light emitting diode display | |
| WO2021189562A1 (en) | Display panel and preparation method therefor, and mask | |
| JP5557653B2 (en) | Thin film deposition apparatus and organic light emitting display device manufacturing method using the same | |
| JP2020535577A (en) | Method for manufacturing organic light emitting diode display board, organic light emitting diode display device and organic light emitting diode display board | |
| WO2014023041A1 (en) | Mask apparatus for evaporation of organic material of organic light emitting diode display | |
| JP2020532652A (en) | FMM processing for high resolution FMM | |
| CN108914057B (en) | Mask assembly and display panel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20190104 |
|
| WD01 | Invention patent application deemed withdrawn after publication |