CN108170000A - The production method of mask plate and colored filter - Google Patents
The production method of mask plate and colored filter Download PDFInfo
- Publication number
- CN108170000A CN108170000A CN201810079698.9A CN201810079698A CN108170000A CN 108170000 A CN108170000 A CN 108170000A CN 201810079698 A CN201810079698 A CN 201810079698A CN 108170000 A CN108170000 A CN 108170000A
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- China
- Prior art keywords
- mask plate
- colored filter
- pattern
- area
- production method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/76—Patterning of masks by imaging
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Filters (AREA)
Abstract
The production method that the present invention provides a kind of mask plate and colored filter.The mask plate of the present invention is used to make colored filter, with area of the pattern, the area of the pattern is semi-transparent region, and the light transmittance of the area of the pattern from the surrounding boundary of mask plate to center at successively decrease, so as to make the irradiation energy by mask plate from surrounding boundary to center at successively decrease, colored filter is made using the mask plate, the problem of causing the stretching of its figure inhomogenous due to mask plate dead weight is bent downwardly in the prior art and then causing colorized optical filtering on piece dimension of picture size inhomogenous can be effectively improved, obtains the uniform pattern of line width.The production method of the colored filter of the present invention can be obtained the uniform pattern of line width, be effectively improved large scale and show the problem of dimension of picture size is inhomogenous on colored filter in product using above-mentioned mask plate.
Description
Technical field
The present invention relates to display technology field more particularly to the production methods of a kind of mask plate and colored filter.
Background technology
Thin-film transistor LCD device (Thin Film Transistor Liquid Crystal Display,
TFT-LCD) there are many merits such as thin fuselage, power saving, radiationless, be widely used.Liquid crystal on existing market
Showing device is largely backlight liquid crystal display device, including liquid crystal display panel and backlight module (backlight
module).Usual liquid crystal display panel by color film (CF, Color Filter) substrate, tft array substrate, be sandwiched in color membrane substrates
Liquid crystal (LC, Liquid Crystal) and the sealing frame glue'' (Sealant) composition between tft array substrate；Its moulding process
It generally comprises：Leading portion array (Array) processing procedure and CF processing procedures (film, yellow light, etching and stripping), stage casing are into box (Cell) processing procedure
(tft array substrate is bonded with CF substrates) and back segment module group assembling (Module) processing procedure (driving IC is pressed with printed circuit board)；
Wherein, leading portion Array processing procedures mainly form TFT substrate, in order to control the movement of liquid crystal molecule；Leading portion CF processing procedures are mainly
Form CF substrates；Stage casing Cell processing procedures mainly add liquid crystal between TFT substrate and CF substrates；Back segment module group assembling processing procedure master
If driving IC pressings and the integration of printed circuit board, and then liquid crystal molecule rotation is driven, show image.
CF substrates are the main devices that LCD is used for realizing colored display, form and generally include substantially：It is glass substrate, black
Colour moment battle array (Black Matrix, BM), colored color blocking layer etc..The light that backlight is sent out is incident on by the modulation of liquid crystal molecule
CF substrates, the filter action for the red color resistance of color blocking layer, green color blocking and the blue color blocking of being enameled by CF substrates, respectively
Show three kinds of light of red, green, blue, the light of the color blocking difference TEM investigation color bands of different colours, so as to fulfill display
Colour display.In CF processing procedures, including processing procedures such as light blockage coating, exposure, developments, wherein, light blockage coating is undoubtedly most attached most importance to
The link wanted, the uniformity of light blockage coating and the thickness of photoresist have display effect critically important influence.
As shown in Figure 1, in the manufacturing process of large size TFT-LCD color membrane substrates, since the dead weight of mask plate 10 leads to it
Central area 13 is bent downwardly, its central area 13 and 11 figure of fringe region is caused to stretch in different size, is passed through edge
It is respectively CD1, CD2, CD3 that region 11, central region 12, central area 13, which are exposed on the dimension of picture obtained on color membrane substrates 1,
In this way in technological parameters such as light exposures (projection exposure) all under the same conditions, it is caused since the dead weight of mask plate 10 is bent downwardly
It is inhomogenous to expose obtained dimension of picture size, i.e. CD1<CD2<CD3, so as to influence the quality of colored filter.
In actual production technique, it is smaller that above-mentioned difference shows as the dimension of picture CD1 obtained by fringe region 11, holds
Light leakage is easily caused, and it is larger by the dimension of picture CD3 that nucleus 13 obtains, colour mixture is be easy to cause, considerably increases colour
The difficulty of filter technology debugging.
Invention content
The purpose of the present invention is to provide a kind of mask plates, make colored filter using the mask plate, can obtain line
Wide uniform pattern is effectively improved large scale and shows the problem of dimension of picture size is inhomogenous on colored filter in product.
It, can using above-mentioned mask plate the present invention also aims to provide a kind of production method of colored filter
The uniform pattern of line width is obtained, large scale is effectively improved and shows in product that dimension of picture size is inhomogenous on colored filter and ask
Topic.
To achieve the above object, the present invention provides a kind of mask plate, for making colored filter, has area of the pattern,
Metal film and multiple semi-permeable membranes including glass substrate and on the glass substrate；
The metal film forms lightproof area on the glass substrate, and several open is equipped on the correspondence area of the pattern
Mouthful；
The multiple semi-permeable membrane is correspondingly arranged on the area of the pattern, and the area of the pattern is semi-transparent region；
The light transmittance of multiple semi-permeable membranes on the area of the pattern from the surrounding boundary of mask plate to center at successively decrease.
The light transmittance of multiple semi-permeable membranes on the area of the pattern is 50%-100%.
The material of the metal film is chromium.
The glass substrate is quartz glass substrate.
The thickness of the mask plate is 5-20mm.
The present invention also provides a kind of production methods of colored filter, include the following steps：
Step S1, one underlay substrate is provided, photoresist is coated on the underlay substrate and forms photoresist layer；
Step S2, mask plate as described above is provided, the photoresist layer is exposed using the mask plate；
Step S3, develop to the photoresist layer after exposure, obtain the color blocking figure needed for the colorized optical filtering on piece
Case.
The underlay substrate is color membrane substrates or thin film transistor base plate.
In the step S2, the photoresist layer is exposed by exposure machine, the exposure machine is projection exposure machine.
In the step S1, the photoresist being coated with is positive-tone photo glue material；
The photoresist being coated with is red, green or blue Other substrate materials.
The step S3 is further included, and after developing to the photoresist layer, the photoresist layer is toasted.
Beneficial effects of the present invention：The mask plate of the present invention has area of the pattern, the figure for making colored filter
Case region be semi-transparent region, and the light transmittance of the area of the pattern from the surrounding boundary of mask plate to center at successively decrease, from
And make the irradiation energy by mask plate from surrounding boundary to center at successively decrease, using the mask plate make colored filter,
The uniform pattern of line width can be obtained, is effectively improved and its figure is caused to stretch due to mask plate dead weight is bent downwardly in the prior art
It is inhomogenous and then the problem of cause colorized optical filtering on piece dimension of picture size inhomogenous.The making side of the colored filter of the present invention
Method uses above-mentioned mask plate, can obtain the uniform pattern of line width, is effectively improved large scale and shows colored filter in product
The problem of upper dimension of picture size is inhomogenous.
Description of the drawings
For further understanding of the features and technical contents of the present invention, it please refers to below in connection with the detailed of the present invention
Illustrate and attached drawing, however, the drawings only provide reference and explanation, is not intended to limit the present invention.
In attached drawing,
Fig. 1 generates the inhomogenous schematic diagram of dimension of picture size to make colored filter using existing mask plate；
Fig. 2 is the structure diagram of the mask plate of the present invention；
Fig. 3 is the flow diagram of the production method of the colored filter of the present invention；
Fig. 4 is the schematic diagram of the step S1 of the production method of the colored filter of the present invention；
Fig. 5 is the schematic diagram of the step S2 of the production method of the colored filter of the present invention；
Fig. 6 is the schematic diagram of the step S3 of the production method of the colored filter of the present invention.
Specific embodiment
The technological means and its effect taken further to illustrate the present invention, below in conjunction with the preferred implementation of the present invention
Example and its attached drawing are described in detail.
Referring to Fig. 2, present invention firstly provides a kind of mask plate, for making colored filter, there is area of the pattern, packet
Include glass substrate 101 and metal film 102 and multiple semi-permeable membranes 103 on the glass substrate 101；
The metal film 102 is light tight, lightproof area is formed on glass substrate 101, and with pattern described in correspondence
Area of the pattern is equipped with several openings 104；
The multiple semi-permeable membrane 103 is correspondingly arranged on the area of the pattern, i.e., described area of the pattern is semi-transparent region；
The light transmittance of upper multiple semi-permeable membranes 103 of the area of the pattern from the surrounding boundary of mask plate to center at pass
Subtract so that by the irradiation energy of mask plate from surrounding boundary to center at successively decrease, so as to mask plate dead weight be bent downwardly
Cause its figure amount of tension from surrounding boundary to center at be incremented by and the effect of colorized optical filtering on piece figure deformation is caused to offset
Disappear, and then be effectively improved large scale and show the problem of dimension of picture size is inhomogenous on colored filter in product.
Specifically, several openings 104 are in matrix distribution, and the multiple semi-permeable membrane 103 is respectively arranged on described several open
In mouth 104.
Specifically, the light transmittance of multiple semi-permeable membranes 103 on the area of the pattern be 50%-100%, the area of the pattern
Light transmittance from the surrounding boundary of mask plate to the amplitude successively decreased at center depending on the bending status of mask plate.
Specifically, the material of the metal film 102 is preferably chromium (Cr), but is not limited.
Specifically, the glass substrate 101 is quartz glass substrate.
Specifically, the thickness of the mask plate is 5-20mm.
The mask plate of the present invention has area of the pattern, the area of the pattern is semi-opaque region for making colored filter
Domain, and the light transmittance of the area of the pattern from the surrounding boundary of mask plate to center at successively decrease, so as to make through mask plate
Irradiation energy from surrounding boundary to center at successively decrease, using the mask plate make colored filter, it is uniform line width can be obtained
Pattern, be effectively improved and its figure caused to stretch inhomogenous due to mask plate dead weight is bent downwardly in the prior art and then lead to coloured silk
The problem of dimension of picture size is inhomogenous on colo(u)r filter.
Based on above-mentioned mask plate, referring to Fig. 3, the present invention also provides a kind of production method of colored filter, including
Following steps：
Step S1, as shown in figure 4, providing a underlay substrate 200, photoresist shape is coated on the underlay substrate 200
Into photoresist layer 300.
Specifically, the underlay substrate 200 is color membrane substrates or thin film transistor base plate.
Specifically, in the step S1, the photoresist that is coated with is positive-tone photo glue material, and the photoresist material being coated with
Expect the Other substrate materials for other colors such as red, green or blues.
Step S2, as shown in figure 5, providing mask plate 100 as described above, using the mask plate 100 to the photoresist
Layer 300 is exposed, and the particular technique feature of the mask plate 100 is identical with the specific embodiment of above-mentioned mask plate, herein not
It repeats again.
Specifically, in the step S2, the photoresist layer 300 is exposed by exposure machine, the exposure machine is throws
Shadow formula exposure machine.
Specifically, the photoresist layer 300 is exposed by ultraviolet light.
Step S3, as shown in fig. 6, developing to the photoresist layer 300 after exposure, the colorized optical filtering on piece is obtained
Required color blocking pattern 350.
Specifically, the step S3 is further included, after developing to the photoresist layer 300, to the photoresist layer 300 into
Row baking.
Specifically, the colored filter includes red color resistance unit, green color blocking unit, blue color blocking unit.
It should be noted which kind of color the photoresist being coated in the step S1 is, i.e., in described step S3
The photoresist being coated with into the pattern of the color blocking unit of the colorized optical filtering on piece corresponding color, such as the step S1 is
Red Other substrate materials obtain the pattern of the colorized optical filtering on piece red color resistance unit in that is, described step S3.
Mask plate 100 used by the production method of the colored filter of the present invention has area of the pattern, the pattern area
Domain be semi-transparent region, and the light transmittance of the area of the pattern from the surrounding boundary of mask plate 100 to center at successively decrease, so as to
Make the irradiation energy by mask plate 100 from surrounding boundary to center at successively decrease, use the mask plate 100 make colorized optical filtering
Piece can obtain the uniform pattern of line width, be effectively improved and cause its figure due to the dead weight of mask plate 100 is bent downwardly in the prior art
Shape stretches inhomogenous and then the problem of cause colorized optical filtering on piece dimension of picture size inhomogenous.
In conclusion the mask plate of the present invention has area of the pattern, the area of the pattern is for making colored filter
Semi-transparent region, and the light transmittance of the area of the pattern from the surrounding boundary of mask plate to center at successively decrease, so as to make to pass through
The irradiation energy of mask plate from surrounding boundary to center at successively decrease, using the mask plate make colored filter, can obtain
The uniform pattern of line width, be effectively improved in the prior art because mask plate dead weight be bent downwardly due to cause its figure stretch it is inhomogenous into
And the problem of causing colorized optical filtering on piece dimension of picture size inhomogenous.The production method of the colored filter of the present invention is using upper
The mask plate stated can obtain the uniform pattern of line width, be effectively improved in large scale display product graphic scale on colored filter
The problem of very little size is inhomogenous.
The above, for those of ordinary skill in the art, can according to the technique and scheme of the present invention and technology
Other various corresponding changes and deformation are made in design, and all these changes and deformation should all belong to the claims in the present invention
Protection domain.
Claims (10)
1. a kind of mask plate, which is characterized in that for making colored filter, there is area of the pattern, including glass substrate
(101) metal film (102) and multiple semi-permeable membranes (103) and on the glass substrate (101)；
The metal film (102) forms lightproof area on glass substrate (101), and number is equipped on the correspondence area of the pattern
A opening (104)；
The multiple semi-permeable membrane (103) is correspondingly arranged on the area of the pattern, and the area of the pattern is semi-transparent region；
The light transmittance of multiple semi-permeable membranes (103) on the area of the pattern from the surrounding boundary of mask plate to center at successively decrease.
2. mask plate as described in claim 1, which is characterized in that multiple semi-permeable membranes (103) on the area of the pattern it is saturating
Light rate is 50%-100%.
3. mask plate as described in claim 1, which is characterized in that the material of the metal film (102) is chromium.
4. mask plate as described in claim 1, which is characterized in that the glass substrate (101) is quartz glass substrate.
5. mask plate as described in claim 1, which is characterized in that its thickness is 5-20mm.
6. a kind of production method of colored filter, which is characterized in that include the following steps：
One underlay substrate (200) step S1, is provided, photoresist is coated on the underlay substrate (200) and forms photoresist layer
(300)；
Step S2, the mask plate (100) as described in any one of claim 1-5 is provided, using the mask plate (100) to institute
Photoresist layer (300) is stated to be exposed；
Step S3, develop to the photoresist layer (300) after exposure, obtain the color blocking figure needed for the colorized optical filtering on piece
Case (350).
7. the production method of colored filter as claimed in claim 6, which is characterized in that the underlay substrate (200) is coloured silk
Ilm substrate or thin film transistor base plate.
8. the production method of colored filter as claimed in claim 6, which is characterized in that in the step S2, pass through exposure
Machine is exposed the photoresist layer (300), and the exposure machine is projection exposure machine.
9. the production method of colored filter as claimed in claim 6, which is characterized in that in the step S1, be coated with
Photoresist is positive-tone photo glue material；The photoresist being coated with is red, green or blue Other substrate materials.
10. the production method of colored filter as claimed in claim 6, which is characterized in that the step S3 is further included, right
After the photoresist layer (300) is developed, the photoresist layer (300) is toasted.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810079698.9A CN108170000A (en) | 2018-01-26 | 2018-01-26 | The production method of mask plate and colored filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810079698.9A CN108170000A (en) | 2018-01-26 | 2018-01-26 | The production method of mask plate and colored filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108170000A true CN108170000A (en) | 2018-06-15 |
Family
ID=62516176
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810079698.9A Pending CN108170000A (en) | 2018-01-26 | 2018-01-26 | The production method of mask plate and colored filter |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108170000A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020056866A1 (en) * | 2018-09-20 | 2020-03-26 | 武汉华星光电半导体显示技术有限公司 | Oled display panel and preparation method therefor, and mask plate for evaporation plating |
| CN111965887A (en) * | 2020-09-18 | 2020-11-20 | 信利(仁寿)高端显示科技有限公司 | Mask manufacturing method and color film substrate manufacturing process |
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| CN104280942A (en) * | 2014-10-31 | 2015-01-14 | 合肥京东方光电科技有限公司 | Mask plate |
| CN105404093A (en) * | 2016-01-06 | 2016-03-16 | 京东方科技集团股份有限公司 | Mask plate, display substrate and preparation method thereof, display panel and display device |
| CN106909023A (en) * | 2017-03-30 | 2017-06-30 | 合肥京东方光电科技有限公司 | A kind of mask plate and its manufacture method |
| CN107153323A (en) * | 2017-06-12 | 2017-09-12 | 东旭（昆山）显示材料有限公司 | Mask plate and preparation method thereof, color membrane substrates and preparation method thereof and bore hole 3D display device and application |
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2018
- 2018-01-26 CN CN201810079698.9A patent/CN108170000A/en active Pending
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| CN104267518A (en) * | 2014-09-24 | 2015-01-07 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and manufacturing method thereof |
| CN104280942A (en) * | 2014-10-31 | 2015-01-14 | 合肥京东方光电科技有限公司 | Mask plate |
| CN105404093A (en) * | 2016-01-06 | 2016-03-16 | 京东方科技集团股份有限公司 | Mask plate, display substrate and preparation method thereof, display panel and display device |
| CN106909023A (en) * | 2017-03-30 | 2017-06-30 | 合肥京东方光电科技有限公司 | A kind of mask plate and its manufacture method |
| CN107153323A (en) * | 2017-06-12 | 2017-09-12 | 东旭（昆山）显示材料有限公司 | Mask plate and preparation method thereof, color membrane substrates and preparation method thereof and bore hole 3D display device and application |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020056866A1 (en) * | 2018-09-20 | 2020-03-26 | 武汉华星光电半导体显示技术有限公司 | Oled display panel and preparation method therefor, and mask plate for evaporation plating |
| CN111965887A (en) * | 2020-09-18 | 2020-11-20 | 信利(仁寿)高端显示科技有限公司 | Mask manufacturing method and color film substrate manufacturing process |
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Application publication date: 20180615 |
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