CN206721352U - A kind of mask plate - Google Patents

A kind of mask plate Download PDF

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Publication number
CN206721352U
CN206721352U CN201720514260.XU CN201720514260U CN206721352U CN 206721352 U CN206721352 U CN 206721352U CN 201720514260 U CN201720514260 U CN 201720514260U CN 206721352 U CN206721352 U CN 206721352U
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CN
China
Prior art keywords
mask plate
sub
stop part
frame
adjacent
Prior art date
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Active
Application number
CN201720514260.XU
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Chinese (zh)
Inventor
修海志
马群
王建强
王铁
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
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BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
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Priority to CN201720514260.XU priority Critical patent/CN206721352U/en
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Abstract

The utility model provides a kind of mask plate, including the sub- mask plate that stop part and multiple splicings are set, and stop part covers the gap between adjacent sub- mask plate in the orthographic projection of plane where sub- mask plate, and the material of stop part is nonmagnetic substance.During evaporation, magnetic force produced by magnetic force component will not produce suction to stop part, corresponding stop part will not apply active force to sub- mask plate, therefore, the deflection at the edge of sub- mask plate can be reduced, sub- mask plate is avoided to deform or fold, colour mixture is bad so as to avoid backboard from producing, and then improves the yield of evaporation process.

Description

A kind of mask plate
Technical field
It the utility model is related to OLED vacuum evaporation technologies field, and in particular to a kind of mask plate.
Background technology
It is organic in the manufacturing process of OLED (Organic Light-Emitting Diode, Organic Light Emitting Diode) Material evaporation process refers to be vaporized on luminous organic material using FMM (Fine Metal Mask, high-precision metal mask plate) In the specific pixel of backboard, the luminous organic material is set to be combined with the drive circuit in the pixel, to form specific photophore The technique of part.Existing FMM is spliced by more sub- mask plates, and stop part is additionally provided between adjacent sub- mask plate, described Stop part is located at the lower section of sub- mask plate, for stopping the organic material passed through from the gap between adjacent sub- mask plate, avoids Backboard is polluted, wherein, the material of sub- mask plate and stop part is magnetic material.FMM is crucial group of organic material evaporation process Part, it is the main reason for causing evaporation process yield relatively low because colour mixture is bad caused by FMM deformations, it is existing in evaporation process In, magnetic force component is set generally above FMM, using the suction of magnetic force component generation straight up, to reduce FMM in itself weight Sag of chain caused by power effect is lower.
The part but existing FMM structures come with some shortcomings:
The lower section at the sub- mask plate edge that stop part is located at, during evaporation, magnetic force component is big to the suction of stop part In the suction to sub- mask plate, and the homogeneity of suction caused by magnetic force component is poor, so as to which stop part can be to sub- mask plate Edge, which is put, applies uneven active force, causes sub- mask plate edge deformation amount larger, and corresponding sub- mask plate deforms or pleat Wrinkle, producing backboard, colour mixture is bad, and then influences the yield of evaporation process.
The content of the invention
The utility model is for above shortcomings in the prior art, there is provided a kind of mask plate, at least partly to solve Certainly existing mask plate during evaporation produce fold the problem of.To achieve the above object, the utility model provides a kind of mask Plate, including the sub- mask plate that stop part and multiple splicings are set, the positive throwing of stop part plane where the sub- mask plate Shadow covers the gap between the adjacent sub- mask plate, and the material of the stop part is nonmagnetic substance.
Preferably, the mask plate also includes the frame of hollow, and the sub- mask plate and the stop part are fixed on institute State on frame, the stop part is located at the side of the sub- mask plate away from the frame.
Preferably, the stop part is in strip, and is set in the same direction with the sub- mask plate.
Preferably, the stop part is multiple, and the gap between each adjacent sub- mask plate corresponds.
Preferably, the sub- mask plate includes multiple hollow-out parts;The mask plate also includes supporting part, and the supporting part is consolidated It is scheduled on the frame, and positioned at the sub- mask plate adjacent to the side of the frame, and, institute arranged in a crossed manner with the stop part Supporting part is stated to fall into the orthographic projection of the sub- mask plate in the region between the adjacent hollow-out parts.
Preferably, the supporting part is multiple, and the region between each adjacent hollow-out parts corresponds.
Preferably, the material of the supporting part is nonmagnetic substance.
Preferably, the mask plate also includes the contraposition part for aligning, and the contraposition part is fixed on the frame, with The sub- mask plate is set in the same direction, positioned at outermost sub- mask plate adjacent to the side of the frame, and is located at the supporting part Side away from the frame.
Preferably, the mask plate also includes the frame of hollow, and the sub- mask plate and the stop part are fixed on institute State on frame, the stop part is located at the sub- mask plate adjacent to the side of the frame.
Preferably, the sub- mask plate includes multiple hollow-out parts;The mask plate also includes supporting part, and the supporting part is consolidated It is scheduled on the frame, and is located at side of the stop part away from the frame, and it is arranged in a crossed manner with the stop part, it is described Supporting part is fallen into the orthographic projection of the sub- mask plate in the region between the adjacent hollow-out parts.
The utility model has the advantages that:
The utility model provides a kind of mask plate, including the sub- mask plate that stop part and multiple splicings are set, stop part exist The orthographic projection of plane covers the gap between adjacent sub- mask plate where sub- mask plate, and the material of stop part is non magnetic material Material.During evaporation, magnetic force produced by magnetic force component will not produce suction to stop part, and corresponding stop part will not be to sub- mask Plate applies active force, it is thereby possible to reduce the deflection at the edge of sub- mask plate, avoids sub- mask plate from deforming or fold, So as to avoid backboard from producing, colour mixture is bad, and then improves the yield of evaporation process.
Brief description of the drawings
Fig. 1 is the top view for the mask plate that the present embodiment 1 provides;
Fig. 2 is the sectional view for the mask plate that the present embodiment 1 provides;
Fig. 3 is the top view for the mask plate that the present embodiment 2 provides;
Fig. 4 is the sectional view for the mask plate that the present embodiment 2 provides.
Marginal data:
1st, sub- mask plate 2, stop part 3, frame 4, supporting part 5, hollow-out parts
6th, contraposition part
Embodiment
To make those skilled in the art more fully understand the technical solution of the utility model, below in conjunction with the accompanying drawings to this reality It is described in detail with a kind of mask plate of new offer.
The utility model provides a kind of mask plate, as shown in figure 1, the mask plate includes the sub- mask that multiple splicings are set Plate 1 and stop part 2, stop part 2 cover the gap between adjacent sub- mask plate 1 in the orthographic projection of the sub- place plane of mask plate 1, and The material of stop part 2 is nonmagnetic substance.
Specifically, sub- mask plate 1 includes multiple hollow-out parts 5, hollow-out parts 5 are corresponding with the pixel cell on backboard, organic Luminescent material can pass through hollow-out parts 5, be deposited in the pixel cell to backboard.Stop part 2 is in the sub- place plane of mask plate 1 Orthographic projection also covers the edge of adjacent sub- mask plate 1, that is to say, that is covered with two adjacent sons at two edges of stop part 2 Diaphragm plate 1 is overlapping, and the center section of stop part 2 and adjacent two sub- mask plates 1 are not overlapping.
It should be noted that nonmagnetic substance can be copper, aluminium or magnesium metal, skilled person will appreciate that, it is any not The material that can be magnetized is nonmagnetic substance, within the scope of protection of the utility model.
The mask plate that the utility model embodiment provides, including the sub- mask plate 1 that stop part 2 and multiple splicings are set, resistance Stopper 2 covers the gap between adjacent sub- mask plate 1 in the orthographic projection of the sub- place plane of mask plate 1, and the material of stop part 2 is Nonmagnetic substance.During evaporation, magnetic force produced by magnetic force component will not produce suction to stop part 2, and corresponding stop part 2 is not Active force can be applied to sub- mask plate 1, it is thereby possible to reduce the deflection at the edge of sub- mask plate 1, avoids engraving for sub- mask plate 1 Empty portion 5 deforms or fold, and so as to avoid backboard from occurring, colour mixture is bad, and then improves the yield of evaporation process.
With reference to embodiments 1 and embodiment 2 specific two kinds of implementations provided by the utility model are carried out it is detailed Explanation.
Embodiment 1
With reference to shown in Fig. 1 and Fig. 2, the mask plate can also include frame 3, and frame 3 is in hollow, the sub- He of mask plate 1 Stop part 2 is fixed on frame 3, and stop part 2 is located at sub- side of the mask plate 1 away from frame 3.Specifically, sub- mask plate 1 and resistance The both ends (i.e. the upper and lower ends of stop part 2 in Fig. 1) of stopper 2 are fixed on frame 3, and hollow-out parts 5 are located above hollow, so that Luminous organic material can diffuse to hollow-out parts 5 through frame 3.Preferably, sub- mask plate 1 and stop part 2 connect with the welding of frame 3 Connect, to improve connectivity robustness and stability.
It is welded to connect after sub- mask plate 1 and frame 3 are welded to connect, then by stop part 2 and frame 3, so, had been deposited Cheng Zhong, stop part 2 can be deformed with the edge of repressor mask plate 1, avoid the hollow-out parts 5 of sub- mask plate 1 deform or Fold it is better, moreover, during evaporation, suction of the magnetic force component to sub- mask plate 1 can also be increased, to reduce son The caused sag of chain under self gravitation effect of mask plate 1, the hollow-out parts 5 of sub- mask plate 1 are further avoided to deform or pleat Wrinkle.
Because sub- mask plate 1 is generally in strip, therefore, as shown in figure 1, in the present embodiment, stop part 2 is also in strip, And set in the same direction with sub- mask plate 1,, can be with during evaporation so that stop part 2 can cover the edge of sub- mask plate 1 Reduce the deflection at the sub- edge of mask plate 1, avoid the hollow-out parts 5 of sub- mask plate 1 from deforming or fold.
Preferably, stop part 2 is multiple, and the gap between each stop part 2 and each adjacent sub- mask plate 1 corresponds, That is, each stop part 2 covers the edge of each sub- mask plate 1.
Further, with reference to shown in Fig. 1 and Fig. 2, the mask plate can also include supporting part 4, and supporting part 4 is fixed on side On frame 3, and supporting part 4 is located at the side of the adjacent bezel 3 of sub- mask plate 1, and arranged in a crossed manner with stop part 2.Need what is illustrated It is that, in order to avoid supporting part 4 stops that luminous organic material diffuses to hollow-out parts 5, caused evaporation process is bad, it is necessary to will support Portion 4 is arranged in the non-evaporation area of sub- mask plate 1, i.e., supporting part 4 falls into adjacent hollow-out parts 5 in the orthographic projection of sub- mask plate 1 Between region in.Specifically, the both ends (i.e. the left and right ends of supporting part 4 in Fig. 1) of supporting part 4 are fixed on frame 3, preferably , supporting part 4 is welded to connect with frame 3.
It is welded to connect after supporting part 4 is welded to connect with frame 3, then by sub- mask plate 1 with frame 3, so, supporting part 4 can branch chapelet mask plate 1, further reduce sub- mask plate 1 caused sag of chain under self gravitation effect, avoid sub- mask The hollow-out parts 5 of plate 1 deform or fold it is better.
Preferably, supporting part 4 is multiple, and the region between each supporting part 4 and each adjacent hollow-out parts 5 corresponds. That is, supporting part 4 is evenly distributed in the lower section of sub- mask plate 1, can uniformly reduce under the sub- each position of mask plate 1 Hang down amount, avoid sub- mask plate 1 deform or fold it is better.
Preferably, the material of supporting part 4 is also nonmagnetic substance.It is non-during supporting part 4 is welded on into frame 3 Supporting part 4 made of magnetic material can not have to reserve sag of chain to offset the upward deformation caused by magnetic force component, from And supporting part 4 to the support effect of sub- mask plate 1 more preferably, accordingly avoid sub- mask plate 1 deform or fold it is better.
Further, with reference to shown in Fig. 1 and Fig. 2, the mask plate can also include contraposition part 6, and contraposition part 6 is fixed on side On frame 3, set in the same direction with sub- mask plate 1, positioned at the side of the outermost sub- adjacent bezel 3 of mask plate 1, and be located at supporting part 4 Side away from frame 3.Specifically, contraposition part 6 is two, two contraposition parts 6 leftmost side shown in the figure and most right respectively The side of the adjacent bezel 3 of the sub- mask plate 1 of side.Be provided with aligning graph on contraposition part 6, aligning graph can with backboard Figure matches, to adjust the relative position of mask plate and backboard.
Contraposition part 6 is located at the top of supporting part 4.Preferably, after sub- mask plate 1 and frame 3 are welded to connect, then will contraposition Portion 6 is welded to connect with frame 3, and so, contraposition part 6 can cover the edge of the outermost adjacent bezel 3 of sub- mask plate 1, accordingly The deflection at the edge of the outermost adjacent bezel 3 of sub- mask plate 1 can be reduced.
Embodiment 2
Embodiment 2 is the utility model another kind implementation, and the mask plate that embodiment 2 provides provides with embodiment 1 The difference of mask plate is:Stop part 2 is located at the side of the sub- adjacent bezel 3 of mask plate 1.Miscellaneous part is homogeneous with annexation Together, will not be repeated here.
Specifically, with reference to shown in Fig. 3 and Fig. 4, it is neighbouring to be located at sub- mask plate 1 for stop part 2 in the mask plate that embodiment 2 provides The side of frame 3, i.e., after stop part 2 and frame 3 are welded to connect, then sub- mask plate 1 and frame 3 be welded to connect, so, During evaporation, due to magnetic force produced by magnetic force component will not to stop part 2 produce suction, so stop part 2 will not antithetical phrase cover Diaphragm plate 1 applies active force, so as to reduce the deflection at the edge of sub- mask plate 1, avoids the hollow-out parts 5 of sub- mask plate 1 from sending out The shape that changes or fold.
It should be noted that embodiment 1 is compared with Example 2, embodiment 1 is preferred implementation.Resistance in embodiment 1 Stopper 2 can not only reduce the deflection at the edge of sub- mask plate 1, can be deformed, kept away with the edge of repressor mask plate 1 Exempt from sub- mask plate 1 hollow-out parts 5 deform or fold it is better.
With reference to shown in Fig. 3 and Fig. 4, supporting part 4 is located at the side of the remote frame 3 of stop part 2, i.e., stop part 2 with After frame 3 is welded to connect, then supporting part 4 and frame 3 be welded to connect, so, supporting part 4 is compared to 2 more neighbouring son of stop part Mask plate 1, supporting part 4 more preferably, accordingly reduce sub- mask plate 1 and produced under self gravitation effect to the support effect of sub- mask plate 1 Raw sag of chain it is better.
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present and the exemplary implementation that uses Mode, but the invention is not limited in this.For those skilled in the art, the essence of the present invention is not being departed from In the case of refreshing and essence, various changes and modifications can be made therein, and these variations and modifications are also considered as protection scope of the present invention.

Claims (10)

1. a kind of mask plate, including the sub- mask plate that stop part and multiple splicings are set, it is characterised in that the stop part is in institute The orthographic projection of plane covers the gap between the adjacent sub- mask plate where stating sub- mask plate, and the material of the stop part is Nonmagnetic substance.
2. mask plate according to claim 1, it is characterised in that the also frame including hollow, the sub- mask plate and The stop part is fixed on the frame, and the stop part is located at the side of the sub- mask plate away from the frame.
3. mask plate according to claim 2, it is characterised in that the stop part is in strip, and with the sub- mask plate Set in the same direction.
4. mask plate according to claim 3, it is characterised in that the stop part to be multiple, and with each adjacent son Gap between mask plate corresponds.
5. mask plate according to claim 2, it is characterised in that the sub- mask plate includes multiple hollow-out parts;It is described to cover Diaphragm plate also includes supporting part, and the supporting part is fixed on the frame, and positioned at the sub- mask plate adjacent to the frame Side, and arranged in a crossed manner with the stop part, the supporting part the orthographic projection of the sub- mask plate fall into it is adjacent described in engrave In region between empty portion.
6. mask plate according to claim 5, it is characterised in that the supporting part to be multiple, and with it is each it is adjacent described in Region between hollow-out parts corresponds.
7. mask plate according to claim 5, it is characterised in that the material of the supporting part is nonmagnetic substance.
8. mask plate according to claim 5, it is characterised in that also include the contraposition part for aligning, the contraposition part It is fixed on the frame, is set in the same direction with the sub- mask plate, positioned at outermost sub- mask plate adjacent to the one of the frame Side, and it is located at side of the supporting part away from the frame.
9. mask plate according to claim 1, it is characterised in that the also frame including hollow, the sub- mask plate and The stop part is fixed on the frame, and the stop part is located at the sub- mask plate adjacent to the side of the frame.
10. mask plate according to claim 9, it is characterised in that the sub- mask plate includes multiple hollow-out parts;It is described to cover Diaphragm plate also includes supporting part, and the supporting part is fixed on the frame, and is located at one of the stop part away from the frame Side, and it is arranged in a crossed manner with the stop part, and the supporting part falls into the adjacent hollow out in the orthographic projection of the sub- mask plate In region between portion.
CN201720514260.XU 2017-05-10 2017-05-10 A kind of mask plate Active CN206721352U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201720514260.XU CN206721352U (en) 2017-05-10 2017-05-10 A kind of mask plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201720514260.XU CN206721352U (en) 2017-05-10 2017-05-10 A kind of mask plate

Publications (1)

Publication Number Publication Date
CN206721352U true CN206721352U (en) 2017-12-08

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108359935A (en) * 2018-05-22 2018-08-03 京东方科技集团股份有限公司 Mask plate and preparation method thereof, evaporation coating method
CN110541144A (en) * 2019-09-29 2019-12-06 昆山国显光电有限公司 Mask frame, mask plate and mask structure
CN112725728A (en) * 2020-12-17 2021-04-30 合肥维信诺科技有限公司 Mask plate
WO2021098336A1 (en) * 2019-11-21 2021-05-27 昆山国显光电有限公司 Mask plate and evaporation system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108359935A (en) * 2018-05-22 2018-08-03 京东方科技集团股份有限公司 Mask plate and preparation method thereof, evaporation coating method
CN110541144A (en) * 2019-09-29 2019-12-06 昆山国显光电有限公司 Mask frame, mask plate and mask structure
WO2021098336A1 (en) * 2019-11-21 2021-05-27 昆山国显光电有限公司 Mask plate and evaporation system
CN112725728A (en) * 2020-12-17 2021-04-30 合肥维信诺科技有限公司 Mask plate

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