CN204825028U - Mask plate and display substrates coating by vaporization system - Google Patents
Mask plate and display substrates coating by vaporization system Download PDFInfo
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- CN204825028U CN204825028U CN201520586510.1U CN201520586510U CN204825028U CN 204825028 U CN204825028 U CN 204825028U CN 201520586510 U CN201520586510 U CN 201520586510U CN 204825028 U CN204825028 U CN 204825028U
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Abstract
The utility model belongs to the technical field of show, concretely relates to mask plate and display substrates coating by vaporization system. This mask plate is including the figure mask layer that has the parallel figure mask piece of arranging in a plurality of intervals, figure mask piece includes a plurality of pixels district that takes shape, and this mask plate is still including supplementary mask layer, and supplementary mask layer includes first supporting part, first supporting part include at least one with the long limit vertical arrangement of the figure mask piece of figure mask layer and position and the corresponding article one column structure in clearance that the neighbor is shaping between distinguishing, first supporting part is used for supporting the figure mask layer. Supplementary mask layer in this mask plate makes and respectively separates whole of figure mask lump formation in the figure mask layer to can control the sag of chain that respectively separates figure mask piece in the figure mask layer, thereby long, the thin easy flagging widely different difficult problem of shade that leads to the fact of structure because of figure mask piece is solved to the sag of chain of control figure mask layer, improve the position accuracy of figure on the mask plate.
Description
Technical field
The utility model belongs to technique of display field, is specifically related to a kind of mask plate and display base plate deposition system.
Background technology
In OLED (OrganicLightEmissionDisplay, organic electroluminescent LED) manufacturing technology, the mask plate of vacuum evaporation is vital parts, and the quality of mask plate directly affects manufacturing cost and quality product.In the mask plate of OLED evaporate process, (FineMetalMask is called for short: FMM) be one of equipment of wherein most critical fine metal mask plate.FMM is used for evaporation emitting layer material, and backboard forms pixel graphics, and therefore, the quality of FMM quality is directly connected to the display effect of screen.Because FMM is very high to the requirement of precision, current FMM has become the bottleneck of restriction OLED display screen increase resolution, and becomes the major cause causing and produce the bad problem such as colour mixture, brightness disproportionation.
Along with screen is more and more to high-resolution future development, the figure of FMM presents thin, long, many trend day by day, and quantity is extremely many, and monolithic width is less than 30 μm usually, forms opening size minimum, be very easy to deform mutually.Therefore, FMM, in the process of assembling with mask plate frame welding, even if only apply very little drawing force, also can cause FMM to produce larger sag of chain.In addition, FMM in organic vacuum evaporation chamber by magnet adsorption after, the Flatness difference mobility of mask plate is large, organic materials position on evaporation is departed from, and the shade of figure (shadow) is uneven to differ greatly, and then screen is caused to produce the serious problems such as colour mixture, brightness disproportionation.
Utility model content
The utility model is in order to solve the large technical problem of FMM sag of chain shade difference that is large and figure, a kind of mask plate is provided, auxiliary mask layer wherein can control the sag of chain of the graphic mask block in figure mask layer, thus the sag of chain of figure mask layer can be controlled, solve the difficult problem that shade difference is large; The positional precision of figure on mask plate can also be improved, solve the problems such as screen colour mixture, brightness disproportionation, significant to raising product yield.Graphic mask layer mentioned here is equivalent to FMM of the prior art.
The technical scheme that solution the technology of the present invention problem adopts is to provide a kind of mask plate, this mask plate comprises the graphic mask layer of the graphic mask block with multiple intervals parallel arranged, described graphic mask block comprises multiple pixel shaping district, this mask plate also comprises auxiliary mask layer, described auxiliary mask layer comprises the first support portion, described first support portion comprises at least one and first list structure that gap of position and adjacent described pixel shaping district between corresponding arranged vertically with the long limit of the described graphic mask block of described graphic mask floor, described first support portion is for supporting described graphic mask layer.
Preferably, the quantity of described first list structure in described first support portion is less than the quantity in described pixel shaping district included in graphic mask block described in each.
Preferably, the width of described first list structure in described first support portion is less than or equal to the width in the gap in same described graphic mask block between adjacent described pixel shaping district.
Preferably, described auxiliary mask layer also comprises second support portion vertically disposed with described first support portion, described second support portion comprises at least one and is arranged at the second list structure with the corresponding zone, gap of adjacent described graphic mask block, and described second support portion is for supporting described graphic mask layer and can reinforcing described first support portion.
Preferably, the quantity that the quantity of described second list structure in described second support portion is less than the described graphic mask block in described graphic mask layer adds 1.
Preferably, the width of described second list structure in described second support portion is less than or equal to the width in the gap between adjacent two the described pixel shaping districts in adjacent two described graphic mask blocks.
Preferably, this mask plate also comprises mask plate framework, and described first list structure in the described list structure in described graphic mask layer and described auxiliary mask layer and described second list structure are arranged at the inside of described mask plate framework respectively.
Preferably, in described auxiliary mask layer, described first support portion and described second support portion are arranged with layer.
Preferably, after described first list structure in described auxiliary mask layer and described second list structure drawn process, be welded on described mask plate framework.
Preferably, described auxiliary mask layer adopts Invar alloy material to make, and described auxiliary mask layer adopts wet etching method to be formed.
A kind of display base plate deposition system, comprise evaporator, backboard, described backboard is arranged with multiple display screen district in matrix form, and this display base plate deposition system also comprises above-mentioned mask plate, and the described pixel shaping district in described mask plate can form pixel graphics in described display screen district.
The beneficial effects of the utility model: this mask plate, by graphic mask layer and auxiliary mask layer being combinationally used, supports graphic mask layer by auxiliary mask layer, makes each separated graphics mask block in graphic mask layer form an entirety; By the auxiliary mask layer after stretch processing, the sag of chain of figure mask layer can be controlled, solve the difficult problem that shade difference is large; The positional precision of figure on mask plate can also be improved, solve the problems such as screen colour mixture, brightness disproportionation, significant to raising display base plate product yield.
Accompanying drawing explanation
Fig. 1 is the structural representation of the graphic mask layer in the utility model embodiment 1;
Fig. 2 is the structural representation of the auxiliary mask layer in the utility model embodiment 1;
Fig. 3 is the auxiliary mask layer in the utility model embodiment 1 and the structural representation after mask plate frame assembled;
Fig. 4 is the structural representation after auxiliary mask layer in the utility model embodiment 1 and mask plate frame assembled cut;
Fig. 5 is the structural representation that the mask plate in the utility model embodiment 1 is complete;
Fig. 6 is the structural representation of the backboard in the utility model embodiment 2.
Wherein, Reference numeral is:
1-first list structure; 2-second list structure; The hollow grid regions of 3-; 4-mask plate framework; 5-graphic mask block; 51-pixel shaping district; 6-display screen district.
Embodiment
For making those skilled in the art understand the technical solution of the utility model better, below in conjunction with the drawings and specific embodiments, the mask plate in the utility model and display base plate deposition system are described in further detail.
Embodiment 1:
The present embodiment provides a kind of mask plate, and this mask plate is by combinationally using graphic mask layer and auxiliary mask layer, and improve the positional precision of figure on mask plate, the display base plate screen color of formation is good, brightness uniformity.
This mask plate comprises the graphic mask layer of the graphic mask block with multiple intervals parallel arranged, and this graphic mask block comprises multiple pixel shaping district, and this mask plate also comprises auxiliary mask layer, and auxiliary mask layer comprises the first support portion.As shown in fig. 1, graphic mask layer is the structure arranged by multiple graphic mask block 5 parallel interval, each graphic mask block 5 comprises multiple cancellated pixel shaping district 51, can be used for evaporation emitting layer material, backboard forms pixel graphics;
As shown in Figure 2, first support portion comprises at least one and first list structure 1 that gap of position and neighbor shaping district between corresponding arranged vertically with the long limit of the graphic mask block of graphic mask floor, and this first support portion 1 is for supporting graphic mask layer.
In order to make the first support portion better to the support effect of graphic mask layer, preferably this auxiliary mask layer also comprises for supporting graphic mask layer and can reinforcing the second support portion of the first support portion.With reference to figure 2, this second support portion is vertical with the first support portion to be arranged, and comprises at least one second list structure 2 corresponding with the gap of adjacent pattern mask block.
Graphic mask layer and auxiliary mask layer are all welded on the inside of mask plate framework, make graphic mask layer, auxiliary mask layer and mask plate frame combination formation mask plate in aggregates.According to the structure of above-mentioned auxiliary mask layer, the internal structure of the mask plate herein formed can be comprise graphic mask layer and first supporting structure that arrange corresponding to graphic mask layer, also can for comprising graphic mask layer and have the structure of the first support portion and the second support portion simultaneously.
Be illustrated in figure 2 a kind of reticulated structure of auxiliary mask layer, the first list structure 1 in the first support portion and the second list structure 2 square crossing in the second support portion arrange within the same layer, and form multiple hollow grid regions 3 at middle part.Wherein, the width of the first list structure 1 in the first support portion is less than or equal to the width in the gap in same graphic mask block 5 between neighbor shaping district 51, forms pixel graphics to avoid the first excessive pixel shaping district 51 that affects of list structure 1 width.
The quantity of the first list structure 1 in the first support portion is less than the quantity in pixel shaping district 51 included in each graphic mask block 5.When the quantity in the pixel shaping district 51 in number ratio graphic mask block 5 of the first list structure 1 lacks 1, gap between adjacent Liang Ge pixel shaping district 51 in each graphic mask block 5 is corresponding first list structure 1 just, the first support portion can be made best to the support effect of graphic mask block 5, and without waste of material.When the quantity in the pixel shaping district 51 in number ratio graphic mask block 5 of the first list structure 1 lacks 1 incessantly, first multiple pixel shaping district 51, list structure 1 interval can be arranged in the below of graphic mask block 5 in graphic mask floor, thus make the support effect of graphic mask block 5 in the first list structure 1 pair of graphic mask layer more even.
The position that the second list structure 2 in second support portion arranges correspond to the gap between graphic mask block 5; The width of the second list structure 2 is preferably less than or equal to the width in the gap between the adjacent Liang Ge pixel shaping district 51 in adjacent two graphic mask blocks 5 and is greater than 3mm.
The quantity that the quantity of the second list structure 2 is less than or equal to the graphic mask block 5 in graphic mask layer adds 1.The quantity of the graphic mask block 5 in the number ratio graphic mask layer of the second list structure 2 just many 1 time, just often adjacent two the second list structures 2 for supporting a graphic mask block 5, the second support portion can be made best to the support effect of graphic mask block 5, and do not waste material, meanwhile, the second list structure 2 also can play the effect of reinforcing first support portion; When the quantity of the graphic mask block 5 that the quantity of the second list structure 2 is less than in graphic mask layer adds 1, the second multiple graphic mask block 5 in list structure 2 interval can be made to arrange, thus make the support effect of graphic mask block 5 in the second list structure 2 pairs of graphic mask layers more even.
It is easily understood that, the structure of this auxiliary mask layer, spacing distance between the quantity of list structure wherein, width and adjacent list structure can be determined according to the arrangement mode in the multiple display screen districts arranged in backboard, shape and size, such as also the pattern etch in auxiliary mask layer can be formed other shape, can arrange flexibly according to design factor and processing condition in application process, not limit here.
Below to have the mask structure being of the first support portion and the second support portion simultaneously, and illustrate shape and the structure of this mask plate in conjunction with the making method of this mask plate:
First graphic mask layer is formed.The structure of the graphic mask layer in this mask plate can be identical with the structure of FMM in prior art, i.e. the structure arranged by multiple graphic mask block 5 parallel interval as shown in Figure 1, and graphic mask block 5 here preferably adopts precision metallic material to make.
Secondly auxiliary mask layer is formed.This auxiliary mask layer adopts wet etching method to make by one whole Invar alloy material, and wherein, the first support portion and the second support portion are formed within the same layer simultaneously.In the assembling process of this mask plate, hollow grid regions 3 will correspond to the pixel shaping district 51 in graphic mask floor; In the use procedure of this mask plate, hollow grid regions 3 by the display screen district that correspond on backboard to form pixel graphics.
Then auxiliary mask layer is carried out stretching to fix.The first list structures 1 all in above-mentioned auxiliary mask layer and the second list structure 2 are stretched on screen-tensioning machine simultaneously.Screen-tensioning machine is advisable to make auxiliary mask layer not produce sag of chain in evaporate process to the mechanical tensile forces on the first list structure 1 and the second list structure 2.Such as, the thermal expansivity of the evaporation temperature be suitable for according to mask plate and the formation material of auxiliary mask layer, calculate the dependent variable of auxiliary mask layer in evaporation environment, be back-calculated to obtain according to this dependent variable and on screen-tensioning machine, certain mechanical tensile forces implemented to the first list structure 1 and the second list structure 2 and carry out stretch processing, make the first list structure 1 and the second list structure 2 keep tensioned state in evaporate process.
Here stretch processing is carried out to the first list structure 1 and the second list structure 2, and then change the thickness that namely the first list structure 1 and the second list structure 2 cross-sectional dimension size change auxiliary mask layer, effect due to auxiliary mask layer is to support graphic mask layer, the drawing force of auxiliary mask layer and variation in thickness will directly affect the sag of chain of figure mask layer, so, the size of figure mask layer sag of chain is controlled by the size adjusting the first list structure 1 and the second list structure 2 cross-sectional dimension.The sag of chain that the size of drawing force allows according to image masks layer decides, and does not do concrete restriction here.
Then as shown in Figure 3, the auxiliary mask layer after stretching is placed on mask plate framework 4, and by laser welding, auxiliary mask layer is welded on mask plate framework 4, make auxiliary mask layer and mask plate framework 4 be combined into an one-piece construction.
Continue to cut auxiliary mask layer.As shown in Figure 4, the redundance of the first list structure 1 and the second list structure 2 that exceed frame peripheral that are welded on mask plate framework 4 is cut down, make the length of the first list structure 1 and the second list structure 2 all be less than or equal to the side length of corresponding mask plate framework 4, and ensure that the first list structure 1 and the second list structure 2 can be connected on mask plate framework 4 simultaneously.Like this, the one-piece construction of mask plate can be made easy to use, and can material be saved.
Finally graphic mask layer is fixed.As shown in Figure 5, graphic mask layer is welded in the one-piece construction that auxiliary mask layer and mask plate framework 4 be combined into by conventional method, and graphic mask layer is positioned at the top of auxiliary mask layer.Simultaneously, note making the pixel shaping district 51 on graphic mask block 5 and hollow grid regions 3 one_to_one corresponding in auxiliary mask floor, gap one_to_one corresponding on first list structure 1 and same graphic mask block 5 between neighbor shaping district 51, the gap one_to_one corresponding between the second list structure 2 and adjacent pattern mask block 5.
In the present embodiment, auxiliary mask layer can play good supporting role to graphic mask layer, makes each separated graphics mask block in graphic mask layer form an entirety, thus controls the sag of chain of graphic mask block in figure mask layer; And, the intensity of the auxiliary mask layer after drawn process is larger, greatly can reduce the sag of chain of graphic mask layer, thus the graph position deviation that causes because graphic mask layer is sagging and shadow wavy difference can be reduced when carrying out evaporation, improve pixel aperture ratio, and then improve division between screen color, ensure uniform brightness.
Embodiment 2:
The present embodiment provides a kind of display base plate deposition system, and this system comprises the mask plate in evaporator, backboard and embodiment 1.
In order to save technique and enhance productivity, in evaporate process, be typically employed in the multiple small displays one piece of large backboard being formed there is same structure, and then form multiple independently small display by cutting technique.As shown in Figure 6, backboard is arranged with multiple display screen district 6 in matrix form, utilizes above-mentioned mask plate can form small display in display screen district 6.
This mask plate is specially adapted to organic materials evaporation process in OLED, effectively can solve the problem such as screen colour mixture, brightness disproportionation of the display base plate adopting mask plate to make.
Will be understood by those skilled in the art that, display base plate deposition system in the present embodiment is the improvement made based on the deposition system of this area maturation, other structures except mask plate, other component devices in native system can adopt the equipment identical with corresponding technique in prior art deposition system, here repeats no more.
Adopt this display base plate deposition system can effectively reduce position deviation and the shadow wavy difference of evaporation figure, improve pixel aperture ratio, improve screen intensity; The pixel graphics of evaporation can also be avoided to produce larger shadow wavy difference, pixel confining layers (PixelDefineLayer can be reduced, be called for short PDL) gap (Gap) design load, improves pixel aperture ratio, improves the division between screen color, ensures uniform brightness.
Be understandable that, the illustrative embodiments that above embodiment is only used to principle of the present utility model is described and adopts, but the utility model is not limited thereto.For those skilled in the art, when not departing from spirit of the present utility model and essence, can make various modification and improvement, these modification and improvement are also considered as protection domain of the present utility model.
Claims (11)
1. a mask plate, comprise the graphic mask layer of the graphic mask block with multiple intervals parallel arranged, described graphic mask block comprises multiple pixel shaping district, it is characterized in that, also comprise auxiliary mask layer, described auxiliary mask layer comprises the first support portion, described first support portion comprises at least one and first list structure that gap of position and adjacent described pixel shaping district between corresponding arranged vertically with the long limit of the described graphic mask block of described graphic mask floor, and described first support portion is for supporting described graphic mask layer.
2. mask plate according to claim 1, is characterized in that, the quantity of described first list structure in described first support portion is less than the quantity in described pixel shaping district included in graphic mask block described in each.
3. mask plate according to claim 1, is characterized in that, the width of described first list structure in described first support portion is less than or equal to the width in the gap in described graphic mask block between adjacent described pixel shaping district.
4. mask plate according to claim 1, it is characterized in that, described auxiliary mask layer also comprises second support portion vertically disposed with described first support portion, described second support portion comprises at least one and is arranged at the second list structure with the corresponding zone, gap of adjacent described graphic mask block, and described second support portion is for supporting described graphic mask layer and can reinforcing described first support portion.
5. mask plate according to claim 4, is characterized in that, the quantity that the quantity of described second list structure in described second support portion is less than or equal to the described graphic mask block in described graphic mask layer adds 1.
6. mask plate according to claim 4, is characterized in that, the width of described second list structure in described second support portion is less than or equal to the width in the gap between adjacent two the described pixel shaping districts in adjacent two described graphic mask blocks.
7. mask plate according to claim 4, it is characterized in that, also comprise mask plate framework, described first list structure in the described list structure in described graphic mask layer and described auxiliary mask layer and described second list structure are arranged at the inside of described mask plate framework respectively.
8. mask plate according to claim 4, is characterized in that, in described auxiliary mask layer, described first support portion and described second support portion are arranged with layer.
9. according to the mask plate that claim 5 is stated, it is characterized in that, after described first list structure in described auxiliary mask layer and described second list structure drawn process, be welded on described mask plate framework.
10. according to the arbitrary described mask plate of claim 1 to 9, it is characterized in that, described auxiliary mask layer adopts Invar alloy material to make, and described auxiliary mask layer adopts wet etching method to be formed.
11. 1 kinds of display base plate deposition systems, comprise evaporator, backboard, described backboard is arranged with multiple display screen district in matrix form, it is characterized in that, also comprise the arbitrary described mask plate of claim 1 to 10, the described pixel shaping district in described mask plate can form pixel graphics in described display screen district.
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| CN201520586510.1U CN204825028U (en) | 2015-08-06 | 2015-08-06 | Mask plate and display substrates coating by vaporization system |
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| CN201520586510.1U CN204825028U (en) | 2015-08-06 | 2015-08-06 | Mask plate and display substrates coating by vaporization system |
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| CN105568217A (en) * | 2016-01-06 | 2016-05-11 | 京东方科技集团股份有限公司 | Metal mask plate and production method thereof |
| CN106086782A (en) * | 2016-06-28 | 2016-11-09 | 京东方科技集团股份有限公司 | A kind of mask plate assembly and installation method, evaporation coating device |
| CN107245693A (en) * | 2017-06-09 | 2017-10-13 | 京东方科技集团股份有限公司 | Mask assembly, vacuum coater and its application method |
| CN107768551A (en) * | 2017-10-31 | 2018-03-06 | 京东方科技集团股份有限公司 | Mask plate and mask assembly |
| CN107815642A (en) * | 2017-12-13 | 2018-03-20 | 唐军 | High-accuracy mask plate |
| CN107841710A (en) * | 2017-12-08 | 2018-03-27 | 唐军 | High-accuracy support mask plate |
| CN108531862A (en) * | 2017-03-03 | 2018-09-14 | 上海和辉光电有限公司 | A kind of metal mask plate and preparation method thereof |
| CN110343999A (en) * | 2018-04-02 | 2019-10-18 | 京东方科技集团股份有限公司 | Mask set and its manufacturing method, evaporation coating method |
| CN111945109A (en) * | 2019-05-14 | 2020-11-17 | 皮姆思株式会社 | Composite frame element for mask assembly for thin film vapor deposition and method for manufacturing same |
| CN112011757A (en) * | 2020-08-26 | 2020-12-01 | 昆山国显光电有限公司 | Mask and evaporation device |
| CN112899614A (en) * | 2021-01-25 | 2021-06-04 | 维信诺科技股份有限公司 | Mask plate and evaporation device |
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| CN105568217A (en) * | 2016-01-06 | 2016-05-11 | 京东方科技集团股份有限公司 | Metal mask plate and production method thereof |
| CN106086782A (en) * | 2016-06-28 | 2016-11-09 | 京东方科技集团股份有限公司 | A kind of mask plate assembly and installation method, evaporation coating device |
| CN106086782B (en) * | 2016-06-28 | 2018-10-23 | 京东方科技集团股份有限公司 | A kind of mask plate component and its installation method, evaporation coating device |
| CN108531862A (en) * | 2017-03-03 | 2018-09-14 | 上海和辉光电有限公司 | A kind of metal mask plate and preparation method thereof |
| CN108531862B (en) * | 2017-03-03 | 2020-12-08 | 上海和辉光电股份有限公司 | Metal mask plate and preparation method thereof |
| CN107245693A (en) * | 2017-06-09 | 2017-10-13 | 京东方科技集团股份有限公司 | Mask assembly, vacuum coater and its application method |
| CN107768551A (en) * | 2017-10-31 | 2018-03-06 | 京东方科技集团股份有限公司 | Mask plate and mask assembly |
| CN107768551B (en) * | 2017-10-31 | 2019-06-25 | 京东方科技集团股份有限公司 | Mask plate and mask assembly |
| CN107841710A (en) * | 2017-12-08 | 2018-03-27 | 唐军 | High-accuracy support mask plate |
| CN107815642A (en) * | 2017-12-13 | 2018-03-20 | 唐军 | High-accuracy mask plate |
| CN110343999A (en) * | 2018-04-02 | 2019-10-18 | 京东方科技集团股份有限公司 | Mask set and its manufacturing method, evaporation coating method |
| CN110343999B (en) * | 2018-04-02 | 2021-10-12 | 京东方科技集团股份有限公司 | Mask device, method for manufacturing the same, and vapor deposition method |
| CN111945109A (en) * | 2019-05-14 | 2020-11-17 | 皮姆思株式会社 | Composite frame element for mask assembly for thin film vapor deposition and method for manufacturing same |
| CN111945109B (en) * | 2019-05-14 | 2022-09-20 | 皮姆思株式会社 | Composite frame element for mask assembly for thin film vapor deposition and method for manufacturing same |
| CN112011757A (en) * | 2020-08-26 | 2020-12-01 | 昆山国显光电有限公司 | Mask and evaporation device |
| CN112899614A (en) * | 2021-01-25 | 2021-06-04 | 维信诺科技股份有限公司 | Mask plate and evaporation device |
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