CN108073037A - 著色感光性树脂组合物及由其制备的遮光间隔区 - Google Patents
著色感光性树脂组合物及由其制备的遮光间隔区 Download PDFInfo
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- CN108073037A CN108073037A CN201711078655.0A CN201711078655A CN108073037A CN 108073037 A CN108073037 A CN 108073037A CN 201711078655 A CN201711078655 A CN 201711078655A CN 108073037 A CN108073037 A CN 108073037A
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- stains
- photosensitive polymer
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- methyl
- colorant
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Abstract
本发明涉及一种著色感光性树脂组合物,且涉及一种由其制备的遮光间隔区。所述著色感光性树脂组合物包括肟酯芴基化合物作为少量的光聚合引发剂,所述著色感光性树脂组合物能够形成在例如敏感度、弹性恢复率、分辨率、化学抗性、抗渗出性、电压保持率及其类似属性的属性方面极佳的固化膜。因此,由所述著色感光性树脂组合物制备的遮光间隔区可有利地用于液晶显示器、有机EL显示器及其类似物。
Description
技术领域
本发明涉及一种感光性树脂组合物,所述感光性树脂组合物能够形成在电压保持率、抗渗出性、显影容限及弹性恢复率方面极佳的固化膜,且涉及一种由感光性树脂组合物制备且用于液晶显示器、有机EL显示器及其类似物的遮光间隔区。
背景技术
最近,使用由感光性树脂组合物制备的间隔区以便维持液晶显示器(LCD)的液晶单元中上部透明衬底与下部透明衬底之间的恒定距离。在是一种通过向注入到两个透明衬底之间的恒定间隙中的液晶材料施加电压来驱动的电光装置的LCD中,非常关键的是维持两个衬底之间的间隙恒定。如果透明衬底之间的间隙不恒定,那么向其施加的电压以及穿透这一区域的光的透射率可能变化,从而引起空间不均匀亮度的缺陷。根据最近对大型LCD面板的需求,甚至更关键的是维持LCD中两个透明衬底之间的恒定间隙。
此类间隔区可以通过以下步骤来制备:在衬底上涂布感光性树脂组合物且使用掩模使经涂布的衬底暴露于紫外光等等,接着使其显影。最近,已经致力于对间隔区使用遮光材料;因此,已有效地研发各种著色感光性树脂组合物。
最近,已提出黑色柱状间隔区(BCS)(即,遮光间隔区)(其中使用著色感光性树脂组合物来将柱状间隔区及黑色矩阵集成到单一模块中)来简化程序步骤。要求此遮光间隔区具有高敏感度及极佳显影容限特性。然而,常规遮光间隔区具有如下缺陷:在上部显示板与下部显示板装配之后可影响对液晶的驱动的电压保持率(VHR)较低;或发生可致使电信号发生较差传输的褪色,借此妨碍产品的可靠性。
确切地说,由著色感光性树脂组合物制备的遮光间隔区(其本质上含有颜料)具有电压保持率相对低的问题。
现有技术文件
专利文件
(专利文件1)韩国公开专利公开案第2013-0124215号
发明内容
技术问题
因此,本发明旨在提供一种著色感光性树脂组合物,所述著色感光性树脂组合物包括呈比常规肟酯类光聚合引发剂的量小的量形式的肟酯芴基光聚合引发剂,所述著色感光性树脂组合物能够形成在例如敏感度、弹性恢复率、分辨率、化学抗性、抗渗出性、电压保持率及其类似属性的属性方面极佳的固化膜,且提供一种由著色感光性树脂组合物制备的遮光间隔区。
问题解决方案
为了实现以上目标,本发明提供一种著色感光性树脂组合物,其包括:(A)共聚物;(B)环氧树脂或由其衍生的化合物;(C)光可聚合化合物;(D)光聚合引发剂;及(E)著色剂,其中所述光聚合引发剂(D)包括具有以下化学式1的肟酯芴基引发剂:
[化学式1]
在以上化学式1中,R1各自独立地是C1-20烷基,
R2及R3各自独立地是C1-20烷基、C6-20芳基或C3-20环烷基,
A是硝基或氰基,且
X是单键或羰基。
为了实现另一目标,本发明提供一种由所述著色感光性树脂组合物制备的遮光间隔区。
发明有利效果
本发明的著色感光性树脂组合物包括肟酯芴基化合物作为少量的光聚合引发剂,所述著色感光性树脂组合物能够形成在例如敏感度、弹性恢复率、分辨率、化学抗性、抗渗出性、电压保持率及其类似属性的属性方面极佳的固化膜。因此,由所述著色感光性树脂组合物制备的遮光间隔区可有利地用于液晶显示器、有机EL显示器及其类似物。
附图说明
图1是遮光间隔区(或黑色柱状间隔区)的横截面的实施例的示意图。
图2及3是在厚度方向上截取以用于评估由实例的组合物及比较实例的组合物制备的遮光间隔区的阶差存在或不存在的遮光间隔区的照片。
具体实施方式
本发明的著色感光性树脂组合物包括:(A)共聚物;(B)环氧树脂或由其衍生的化合物;(C)光可聚合化合物;(D)光聚合引发剂;及(E)著色剂,且在需要时可进一步包括(F)表面活性剂及/或(G)溶剂。
在本发明中,“(甲基)丙烯基”意味着“丙烯基”及/或“甲基丙烯基”,且“(甲基)丙烯酸酯”意味着“丙烯酸酯”及/或“甲基丙烯酸酯”。
在下文中,将详细地解释著色感光性树脂组合物的每种组分。
(A)共聚物
本发明中所使用的共聚物可包括(A-1)衍生自烯系不饱和羧酸、烯系不饱和羧酸酐或其组合的结构单元,及(A-2)衍生自含有芳环的烯系不饱和化合物的结构单元,且可进一步包括(A-3)与(A-1)及(A-2)不同的衍生自烯系不饱和化合物的结构单元。
共聚物是碱溶性树脂,其用于在显影步骤中具有显影性并且也可以发挥用于在涂布时形成薄膜的基底及用于形成最终图案的结构的作用。
(A-1)衍生自烯系不饱和羧酸、烯系不饱和羧酸酐或其组合的结构单元
在本发明中,结构单元(A-1)衍生自烯系不饱和羧酸、烯系不饱和羧酸酐或其组合。烯系不饱和羧酸或烯系不饱和羧酸酐是可聚合不饱和单体,其在分子中含有至少一个羧基。其特定实例可包含不饱和单羧酸,例如(甲基)丙烯酸、丁烯酸、α-氯丙烯酸及肉桂酸;不饱和二羧酸和其酸酐,例如顺丁烯二酸、顺丁烯二酸酐、反丁烯二酸、衣康酸(itaconicacid)、衣康酸酐、甲基顺丁烯二酸(citraconic acid)、柠康酸酐及甲基反丁烯二酸(mesaconic acid);三价或更高价的不饱和聚羧酸及其酸酐;以及二价或更高价的聚羧酸的单[(甲基)丙烯酰氧基烷基]酯,例如单[2-(甲基)丙烯酰氧基乙基]丁二酸酯、单[2-(甲基)丙烯酰氧基乙基]邻苯二甲酸酯及其类似物。衍生自以上示范性化合物的结构单元可单独或以两种或更多种的组合形式包括在共聚物中。
以构成共聚物的结构单元的总摩尔数计,结构单元(A-1)的量可以是5到65摩尔%,优选地是10到50摩尔%。在这一范围内,显影性可更易于维持。
(A-2)衍生自含有芳环的烯系不饱和化合物的结构单元
结构单元(A-2)衍生自含有芳环的烯系不饱和化合物。含有芳环的烯系不饱和化合物的特定实例可包含(甲基)丙烯酸苯酯、(甲基)丙烯酸苯甲酯、(甲基)丙烯酸2-苯氧基乙酯、(甲基)丙烯酸苯氧基二乙二醇酯、(甲基)丙烯酸对壬基苯氧基聚乙二醇酯、(甲基)丙烯酸对壬基苯氧基聚丙二醇酯、(甲基)丙烯酸三溴苯酯;苯乙烯;含有烷基取代基的苯乙烯,例如甲基苯乙烯、二甲基苯乙烯、三甲基苯乙烯、乙基苯乙烯、二乙基苯乙烯、三乙基苯乙烯、丙基苯乙烯、丁基苯乙烯、己基苯乙烯、庚基苯乙烯及辛基苯乙烯;含有卤素的苯乙烯,例如氟苯乙烯、氯苯乙烯、溴苯乙烯及碘苯乙烯;含有烷氧基取代基的苯乙烯,例如甲氧基苯乙烯、乙氧基苯乙烯及丙氧基苯乙烯;4-羟基苯乙烯、对羟基-α-甲基苯乙烯、乙酰基苯乙烯;乙烯基甲苯、二乙烯基苯、乙烯基苯酚、邻乙烯基苯甲基甲基醚、间乙烯基苯甲基甲基醚、对乙烯基苯甲基甲基醚、邻乙烯基苯甲基缩水甘油醚、间乙烯基苯甲基缩水甘油醚、对乙烯基苯甲基缩水甘油醚及其类似物。
衍生自以上示范性化合物的结构单元可单独或以两种或更多种的组合形式包括在共聚物中。
优选地,以上化合物当中的苯乙烯类化合物可考虑聚合性。
以构成共聚物的结构单元的总摩尔数计,结构单元(A-2)的量可以是2到70摩尔%,优选地是5到60摩尔%。在这一范围内,化学抗性可为更有利的。
(A-3)与(A-1)及(A-2)不同的衍生自烯系不饱和化合物的结构单元
除了(A-1)及(A-2)以外,本发明中所使用的共聚物还可进一步包括与(A-1)及(A-2)不同的衍生自烯系不饱和化合物的结构单元。
与(A-1)及(A-2)不同的衍生自烯系不饱和化合物的结构单元的特定实例可包含不饱和羧酸酯,例如(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸二甲基氨基乙酯、(甲基)丙烯酸异丁酯、(甲基)丙烯酸叔丁酯、(甲基)丙烯酸环己酯、(甲基)丙烯酸乙基己酯、(甲基)丙烯酸四氢呋喃甲酯、(甲基)丙烯酸羟基乙酯、(甲基)丙烯酸2-羟基丙酯、(甲基)丙烯酸2-羟基-3-氯丙酯、(甲基)丙烯酸4-羟基丁酯、(甲基)丙烯酸丙三醇酯、α-羟基甲基丙烯酸甲酯、α-羟基甲基丙烯酸乙酯、α-羟基甲基丙烯酸丙酯、α-羟基甲基丙烯酸丁酯、(甲基)丙烯酸2-甲氧基乙酯、(甲基)丙烯酸3-甲氧基丁酯、(甲基)丙烯酸乙氧基二乙二醇酯、(甲基)丙烯酸甲氧基三乙二醇酯、(甲基)丙烯酸甲氧基三丙二醇酯、聚(乙二醇)甲基醚(甲基)丙烯酸酯、(甲基)丙烯酸四氟丙酯、(甲基)丙烯酸1,1,1,3,3,3-六氟异丙酯、(甲基)丙烯酸八氟戊酯、(甲基)丙烯酸十七氟癸酯、(甲基)丙烯酸异冰片酯、(甲基)丙烯酸二环戊酯、(甲基)丙烯酸二环戊烯酯、(甲基)丙烯酸二环戊氧基乙酯及(甲基)丙烯酸环戊烯氧基乙酯等;含有N-乙烯基的叔胺,例如N-乙烯基吡咯烷酮、N-乙烯基咔唑及N-乙烯基吗啉;不饱和醚,例如乙烯基甲基醚及乙烯基乙基醚;含有环氧基的烯系不饱和化合物,例如(甲基)丙烯酸缩水甘油酯、(甲基)丙烯酸3,4-环氧基丁酯、(甲基)丙烯酸4,5-环氧基戊酯、(甲基)丙烯酸5,6-环氧基己酯、(甲基)丙烯酸6,7-环氧基庚酯、(甲基)丙烯酸2,3-环氧环戊酯、(甲基)丙烯酸3,4-环氧环己酯、丙烯酸α-乙基缩水甘油酯、丙烯酸α-正丙基缩水甘油酯、丙烯酸α-正丁基缩水甘油酯、N-(4-(2,3-环氧基丙氧基)-3,5-二甲基苯甲基)丙烯酰胺、N-(4-(2,3-环氧基丙氧基)-3,5-二甲基苯基丙基)丙烯酰胺、(甲基)丙烯酸4-羟基丁酯缩水甘油醚、烯丙基缩水甘油醚及2-甲基烯丙基缩水甘油醚等;以及不饱和酰亚胺,例如N-苯基顺丁烯二酰亚胺、N-(4-氯苯基)顺丁烯二酰亚胺、N-(4-羟基苯基)顺丁烯二酰亚胺、N-环己基顺丁烯二酰亚胺及其类似物。
衍生自以上示范性化合物的结构单元可单独或以两种或更多种的组合形式包括在共聚物中。
其中,鉴于绝缘膜强度的可共聚合性及改进,衍生自含有环氧基及/或不饱和酰亚胺的烯系不饱和化合物的结构单元(确切地说,(甲基)丙烯酸缩水甘油酯、(甲基)丙烯酸4-羟基丁酯缩水甘油醚及/或N-取代的顺丁烯二酰亚胺)可为较优选的。
以构成共聚物的结构单元的总摩尔数计,结构单元(A-3)的量可以是10到80摩尔%,优选地是20到75摩尔%。在这一范围内,可维持著色感光性树脂组合物的存储稳定性,且可更有利地改进薄膜保留率。
具有结构单元(A-1)到(A-3)的共聚物的实例可包含以下共聚物:(甲基)丙烯酸/苯乙烯的共聚物;(甲基)丙烯酸/(甲基)丙烯酸苯甲酯的共聚物;(甲基)丙烯酸/苯乙烯/(甲基)丙烯酸甲酯的共聚物;(甲基)丙烯酸/苯乙烯/(甲基)丙烯酸甲酯/(甲基)丙烯酸缩水甘油酯的共聚物;(甲基)丙烯酸/苯乙烯/(甲基)丙烯酸甲酯/(甲基)丙烯酸缩水甘油酯/N-苯基顺丁烯二酰亚胺的共聚物;(甲基)丙烯酸/苯乙烯/(甲基)丙烯酸甲酯/(甲基)丙烯酸缩水甘油酯/N-环己基顺丁烯二酰亚胺的共聚物;(甲基)丙烯酸/苯乙烯/(甲基)丙烯酸正丁酯/(甲基)丙烯酸缩水甘油酯/N-苯基顺丁烯二酰亚胺的共聚物;(甲基)丙烯酸/苯乙烯/(甲基)丙烯酸缩水甘油酯/N-苯基顺丁烯二酰亚胺的共聚物;(甲基)丙烯酸/苯乙烯/(甲基)丙烯酸4-羟基丁酯缩水甘油醚/N-苯基顺丁烯二酰亚胺的共聚物及其类似物。
著色感光性树脂组合物中可包括一种、两种或更多种所述共聚物。
当通过参考聚苯乙烯的凝胶渗透色谱法(溶离剂:四氢呋喃)进行确定时,共聚物的重均分子量(Mw)可介于10,000到20,000的范围内,优选地是15,000到18,000。在这一范围内,可有利地改进下部图案的阶差,且在显影之后的图案概况可为有利的。
以著色感光性树脂组合物的固体含量的总重量(即,排除溶剂的重量)计,可使用呈5到40wt%,优选地是10到30wt%的量的共聚物。在这一范围内,在显影之后的图案概况可为有利的,且可改进例如薄膜保留率及化学抗性的属性。
可通过以下步骤来制备共聚物:向反应器填充分子量改性剂、自由基聚合引发剂、溶剂及结构单元(A-1)到(A-3)以及到其的氮气,接着缓慢地搅拌混合物以发生聚合反应。
分子量改性剂可以是例如丁硫醇、辛硫醇或其类似物的硫醇化合物,或α-甲基苯乙烯二聚体,但不受其特别限制。
自由基聚合引发剂可以是偶氮化合物,例如(但不限于)2,2'-偶氮二异丁腈、2,2'-偶氮双(2,4-二甲基戊腈)以及2,2'-偶氮双(4-甲氧基-2,4-二甲基戊腈);或过氧化苯甲酰、过氧化十二烷基、过氧化特戊酸叔丁酯、1,1-双(叔丁基过氧基)环己烷或其类似物。自由基聚合引发剂可单独或以两种或更多种的组合形式使用。
此外,溶剂可以是通常用于制备共聚物的任何常规溶剂且可包含例如丙二醇单甲基醚乙酸酯(PGMEA)。
(B)环氧树脂或由其衍生的化合物
本发明的著色感光性树脂组合物包括环氧树脂或由其衍生的化合物。
优选地,环氧树脂或由其衍生的化合物可具有卡哆主链结构。
作为优选实例,环氧树脂可以是具有卡哆主链结构的环氧树脂化合物,如由以下化学式2表示。
[化学式2]
在以上化学式2中,X各自独立地是 L1各自独立地是C1-10亚烷基、C3-20亚环烷基或C1-10亚烷氧基;R1到R7各自独立地是H、C1-10烷基、C1-10烷氧基、C2-10烯基或C6-14芳基;R8是H、甲基、乙基、CH3CHCl-、CH3CHOH-、CH2=CHCH2-或苯基;且n是0到10的整数。
C1-10亚烷基的特定实例可包含亚甲基、亚乙基、亚丙基、亚异丙基、亚丁基、亚异丁基、亚仲丁基、亚叔丁基、亚戊基、亚异戊基、亚叔戊基、亚己基、亚庚基、亚辛基、亚异辛基、亚叔辛基、2-乙基亚己基、亚壬基、亚异壬基、亚癸基、亚异癸基及其类似基团。C3-20亚环烷基的特定实例可包含亚环丙基、亚环丁基、亚环戊基、亚环己基、亚环庚基、亚十氢萘基、亚金刚烷基及其类似基团。C1-10亚烷基氧基的特定实例可包含亚甲基氧基、亚乙基氧基、亚丙基氧基、亚丁基氧基、亚仲丁基氧基、亚叔丁基氧基、亚戊基氧基、亚己基氧基、亚庚基氧基、亚辛基氧基、2-乙基-亚己基氧基及其类似基团。C1-10烷基的特定实例可包含甲基、乙基、丙基、异丙基、丁基、异丁基、仲丁基、叔丁基、戊基、异戊基、叔戊基、己基、庚基、辛基、异辛基、叔辛基、2-乙基己基、壬基、异壬基、癸基、异癸基及其类似基团。C1-10烷氧基的特定实例可包含甲氧基、乙氧基、丙氧基、丁氧基、仲丁基、叔丁基、戊氧基、己氧基、庚氧基、辛氧基、2-乙基-己氧基及其类似基团。C2-10烯基的特定实例可包含乙烯基、烯丙基、丁烯基、丙烯基及其类似基团。C6-14芳基的特定实例可包含苯基、甲苯基、二甲苯基、萘基及其类似基团。
举例来说,可通过以下合成途径制备具有卡哆主链结构的环氧树脂:
[反应方案1]
在以上反应方案1中,Hal是卤基;且X、R1、R2及L1与在以上化学式2中所定义的相同。
可通过以下反应获得由具有卡哆主链结构的环氧树脂衍生的化合物:使具有卡哆主链结构的环氧树脂与不饱和碱性酸反应以产生环氧树脂加合物,且接着使因此获得的环氧树脂加合物与多元酸酐反应,或通过进一步使因此获得的产物与单官能或多官能环氧化合物反应。可使用所属领域中已知的任何不饱和碱性酸,例如,丙烯酸、甲基丙烯酸、丁烯酸、肉桂酸、山梨酸及其类似酸。可使用所属领域中已知的任何多元酸酐,例如,丁二酸酐、顺丁烯二酸酐、偏苯三酸酐、苯均四酸酐、1,2,4,5-环己烷四甲酸二酐、六氢邻苯二甲酸酐及其类似酸酐。可使用所属领域中已知的任何单官能或多官能环氧化合物,例如,甲基丙烯酸缩水甘油酯、甲基缩水甘油醚、乙基缩水甘油醚、丙基缩水甘油醚、异丙基缩水甘油醚、丁基缩水甘油醚、异丁基缩水甘油醚、双酚Z缩水甘油醚及其类似环氧化合物。
举例来说,可通过以下合成途径制备由具有卡哆主链结构的环氧树脂衍生的化合物:
[反应方案2]
在以上反应方案2中,R9各自独立地是H、C1-10烷基、C1-10烷氧基、C2-10烯基或C6-14芳基;R10及R11各自独立地是饱和或不饱和C6芳环或脂环;n是1到10的整数;且X、R1、R2及L1与化学式3中所定义的相同。
当使用具有卡哆主链结构的环氧树脂或由环氧树脂衍生的化合物时,卡哆主链结构可改进固化材料与衬底之间的粘着性、耐碱性、可加工性、强度及其类似属性。此外,一旦在显影后去除未固化部分,图案中就可形成具有精细分辨率的图像。
当通过参考聚苯乙烯的凝胶渗透色谱法(溶离剂:四氢呋喃)进行确定时,环氧树脂或由其衍生的化合物的重均分子量(Mw)可介于3,000到18,000的范围内,优选地是5,000到10,000。在这一范围内,可有利地改进下部图案的阶差,且在显影之后的图案概况可为有利的。
以著色感光性树脂组合物的固体含量的总重量(即,排除溶剂的重量)计,环氧树脂或由其衍生的化合物的量可以是5到30wt%,优选地是10到25wt%。在这一范围内,在显影之后的图案概况可为有利的,且可改进例如化学抗性及弹性复原力的属性。
(C)光可聚合化合物
本发明中所使用的光可聚合化合物可以是可通过聚合引发剂作用而聚合的任何化合物,且可以是通常用于制备著色感光性树脂组合物的多官能单体、低聚物或聚合物。
更确切地说,光可聚合化合物可包含具有至少一个烯系不饱和双键的单官能或多官能酯化合物,且考虑化学抗性,优选地可以是具有至少两个官能团的多官能化合物。
可聚合化合物可选自(但不限于)由以下组成的组:乙二醇二(甲基)丙烯酸酯、丙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、丙三醇三(甲基)丙烯酸酯、三(甲基)丙烯酸三羟甲基丙烷酯、三(甲基)丙烯酸季戊四醇酯、三(甲基)丙烯酸季戊四醇酯与丁二酸的单酯、四(甲基)丙烯酸季戊四醇酯、五(甲基)丙烯酸二季戊四醇酯、六(甲基)丙烯酸二季戊四醇酯、五(甲基)丙烯酸二季戊四醇酯与丁二酸的单酯、己内酯改性的六(甲基)丙烯酸二季戊四醇酯、季戊四醇三丙烯酸酯-六亚甲基二异氰酸酯(季戊四醇三丙烯酸酯与六亚甲基二异氰酸酯的反应产物)、七(甲基)丙烯酸三季戊四醇酯、八(甲基)丙烯酸三季戊四醇酯、双酚A环氧基丙烯酸酯、乙二醇单甲醚丙烯酸酯及其混合物。
市售可聚合化合物的实例可包含(i)单官能(甲基)丙烯酸酯,例如由ToagoseiCo.,Ltd.制造的Aronix M-101、M-111及M-114;由Nippon Kayaku Co.,Ltd.制造的KAYARADT4-110S及T4-120S;以及由Osaka Yuki Kayaku Kogyo Co.,Ltd.制造的V-158及V-2311;(ii)双官能(甲基)丙烯酸酯,例如由Toagosei Co.,Ltd.制造的Aronix M-210、M-240及M-6200;由Nippon Kayaku Co.,Ltd.制造的KAYARAD HDDA、HX-220及R-604;以及由OsakaYuki Kayaku Kogyo Co.,Ltd.制造的V-260、V-312及V-335HP;以及(iii)三官能性和更多官能性(甲基)丙烯酸酯,例如由Toagosei Co.,Ltd.制造的Aronix M-309、M-400、M-403、M-405、M-450、M-7100、M-8030、M-8060及TO-1382;由Nippon Kayaku Co.,Ltd.制造的KAYARADTMPTA、DPHA、DPHA-40H、DPCA-20、DPCA-30、DPCA-60及DPCA-120;以及由Osaka Yuki KayakuKogyo Co.,Ltd.制造的V-295、V-300、V-360、V-GPT、V-3PA、V-400及V-802。
以著色感光性树脂组合物的固体含量(即,排除溶剂的重量)的总重量计,光可聚合化合物的量是10到40wt%,优选地是15到25wt%。在这一范围内,在显影之后的图案概况可为有利的,且可改进例如化学抗性及弹性复原力的属性。如果量小于10wt%,那么显影时间可延长,此可影响程序及残基。如果以超过40wt%的量使用光可聚合化合物,那么此可造成图案分辨率增大且表面皱折增加的问题。
(D)光聚合引发剂
本发明的著色感光性树脂组合物包括如光聚合引发剂的以下化学式1的肟酯芴基引发剂:
[化学式1]
在以上化学式1中,R1各自独立地是C1-20烷基,
R2及R3各自独立地是C1-20烷基、C6-20芳基或C3-20环烷基,
A是硝基或氰基,且
X是单键或羰基。
优选地,R1各自独立地是甲基、乙基、正丙基、异丙基、正丁基、异丁基、叔丁基、正戊基、异戊基、正己基或异己基,且
R2及R3各自独立地是甲基、乙基、正丙基、异丙基、正丁基、异丁基、叔丁基、正戊基、异戊基、正己基、异己基、苯基、萘基、联苯基、三联苯基、蒽基、茚基或菲基。
可根据常规方法合成肟酯芴基光聚合引发剂或可商业购买。
化学式1的肟酯芴基光聚合引发剂充当著色感光性树脂组合物的交联剂,同时肟酯芴基光聚合引发剂甚至在少量使用时也能够提供足够高的敏感度特性,且能够改进弹性恢复率、分辨率、化学抗性、抗渗出性及电压保持率。尤其,因为著色感光性树脂组合物本质上使用著色剂,所以使驱动(或对准)液晶所需要的足够电压维持率固定是困难的。但肟酯芴基光聚合引发剂使得有可能提供高电压保持率。
本发明的著色感光性树脂组合物可进一步包括可以是任何已知光聚合引发剂的其它光聚合引发剂。
另外光聚合引发剂可选自由以下组成的组:苯乙酮化合物、非咪唑化合物、鎓盐化合物、安息香化合物、苯甲酮化合物、二酮化合物、α-二酮化合物、多核醌化合物、噻吨酮化合物、重氮化合物、酰亚胺磺酸酯化合物、咔唑化合物、硼酸锍化合物及其混合物。
以著色感光性树脂组合物的固体含量的总重量(即,排除溶剂的重量)计,可以0.05到5wt%、0.1到5wt%、0.05到3wt%、0.05到1wt%、0.05到0.5wt%、0.05到0.2wt%的量使用光聚合引发剂。在这一范围内,可获得具有高敏感度以及极佳电压保持率及抗渗出性的涂布薄膜。
(E)著色剂
本发明的著色感光性树脂组合物包括著色剂以赋予其遮光性。组合物包括如上文所描述的肟酯芴基光聚合引发剂,借此归因于使用著色剂,会防止以其它方式发生的褪色,继而改进抗渗出性。
本发明中所使用的著色剂可以是两种或更多种无机或有机著色剂的混合物。其优选地具有高产色性及高抗热性。
尤其,如果一起使用两种或更多种有机著色剂,那么防止黑色矩阵漏光及使能够进行掩模对准的透射率固定可为较有利的。
此外,著色剂可包括黑色著色剂及蓝色著色剂,其中黑色著色剂可以是黑色无机著色剂及/或黑色有机著色剂。
根据一实例,著色感光性树脂组合物可包括黑色有机著色剂作为著色剂;且任选地可进一步包括黑色无机著色剂及蓝色著色剂。
著色剂可以是选自由黑色无机著色剂、黑色有机著色剂及蓝色著色剂组成的组的至少一种著色剂。举例来说,可使用在颜色指数(由染料和颜料学会(The Society ofDyers and Colourists)发布)中归类为颜料的任何化合物及所属领域中已知的任何染料。
黑色无机著色剂的特定实例可包含碳黑、钛黑、例如Cu-Fe-Mn类氧化物的金属氧化物及合成铁黑以及其类似物。其中针对所要图案特性及化学抗性,优选的是碳黑。
此外,黑色有机著色剂的特定实例可包含苯胺黑、内酰胺黑、苝黑及其类似著色剂。其中针对所要光密度(OD)、介电性及其类似属性,优选的是内酰胺黑(例如来自BASF的Black 582)。
蓝色著色剂的特定实例可包含C.I.颜料蓝15:6、C.I.颜料蓝15:4、C.I.颜料蓝60、C.I.颜料蓝16及其类似颜料蓝。其中针对防止漏光,优选的是C.I.颜料蓝15:6。
以著色感光性树脂组合物的固体含量的总重量(即,排除溶剂的重量)计,黑色无机著色剂的量可以是0到20wt%,优选地是大于0到20wt%,更优选地是大于0到6wt%。
以著色感光性树脂组合物的固体含量的总重量(即,排除溶剂的重量)计,黑色有机著色剂的量可以是10到40wt%。
以著色感光性树脂组合物的固体含量的总重量(即,排除溶剂的重量)计,蓝色著色剂的量可以是0到15wt%,优选地是1到15wt%。
以著色感光性树脂组合物的固体含量的总重量(即,排除溶剂的重量)计,著色剂的总量可以是10到75wt%,优选地是20到60wt%。在这一范围内,在显影之后的图案概况可为有利的,且可改进例如化学抗性及弹性复原力的属性。如果量小于20wt%或超过60wt%,那么可能不会达成所要光密度及透射率。
同时,可使用分散剂来使著色剂在本发明的著色感光性树脂组合物中分散。分散剂的实例可包含针对著色剂的任何已知分散剂。分散剂的特定实例可包含阳离子表面活性剂、阴离子表面活性剂、非离子表面活性剂、两性离子表面活性剂、硅表面活性剂、氟表面活性剂及其类似分散剂。市售分散剂可包含来自BYK Co.的Disperbyk-182、Disperbyk-183、Disperbyk-184、Disperbyk-185、Disperbyk-2000、Disperbyk-2150、Disperbyk-2155、Disperbyk-2163及Disperbyk-2164。这些化合物可单独或与以两种或更多种的组合形式使用。可通过对著色剂与分散剂进行表面处理而预先将分散剂添加到著色剂或可在制备著色感光性树脂组合物时将分散剂与著色剂添加在一起。
此外,可将著色剂与粘合剂混合,接着可将其用于产生著色感光性树脂组合物。本文中所使用的粘合剂可以是本发明中所描述的共聚物(A)、已知共聚物或其混合物。
因此,可以如与分散剂、粘合剂、溶剂或其类似物混合的漆浆的形式将本发明中所使用的著色剂添加到著色感光性树脂组合物。
(F)表面活性剂
本发明的著色感光性树脂组合物可进一步包括表面活性剂以便改进可涂布性且防止产生缺陷。
尽管表面活性剂的种类不受特别限制,但可使用例如基于氟的表面活性剂或基于硅的表面活性剂。
市售基于硅的表面活性剂可包含来自Dow Corning Toray Silicon的DC3PA、DC7PA、SH11PA、SH21PA及SH8400;来自GE Toshiba Silicone的TSF-4440、TSF-4300、TSF-4445、TSF-4446、TSF-4460及TSF-4452;来自BYK的BYK 333、BYK 307、BYK3560、BYK UV3535、BYK 361N、BYK 354及BYK 399以及其类似物。表面活性剂可单独使用或以两种或更多种的组合形式使用。
市售基于氟的表面活性剂可包含来自Dainippon Ink Kagaku Kogyo Co.(DIC)的Megaface F-470、F-471、F-475、F-482、F-489及F-563。在可涂布性方面,其中优选的表面活性剂可以是来自BYK的BYK 333及BYK 307以及来自DIC的F-563。
以著色感光性树脂组合物的固体含量的总重量(即,排除溶剂的重量)计,表面活性剂的量可以是0.01到3wt%,优选地是0.1到1wt%。在这一范围内,可对著色感光性树脂组合物进行光滑涂布。
(G)溶剂
优选地,可将本发明的著色感光性树脂组合物制备为液体组合物,其中将以上组分及溶剂混合。所属领域中已知的任何溶剂可用于制备著色感光性树脂组合物,所述溶剂与著色感光性树脂组合物中的组分相容而不与其反应。
溶剂的实例可包含:例如乙二醇单乙醚的乙二醇醚;例如乙基乙二醇乙酸乙醚的乙二醇烷基醚乙酸酯;例如乙基2-羟基丙酸酯的酯;例如二乙二醇单甲基醚的二乙二醇;例如丙二醇单甲基醚乙酸酯及丙二醇丙基醚乙酸酯的丙二醇烷基醚乙酸酯;及例如3-甲氧基丁基乙酸酯的烷氧基烷基乙酸酯。溶剂可单独使用或以两种或更多种的组合形式使用。
以著色感光性树脂组合物的总重量计,溶剂的量可以是50到90wt%,优选地是70到85wt%。在这一范围内,可对组合物进行光滑涂布,且可改进可在程序期间以其它方式发生的任何延迟容限。
另外,本发明的著色感光性树脂组合物可包括例如硅烷偶合剂、抗氧化剂及稳定剂的其它添加剂,只要著色感光性树脂组合物的物理属性不受不利影响即可。
因此,如上文所描述的著色感光性树脂组合物包括肟酯芴基化合物作为少量的光聚合引发剂,所述著色感光性树脂组合物能够形成在例如敏感度、弹性恢复率、分辨率、化学抗性、抗渗出性、电压保持率及其类似属性的属性方面极佳的固化膜。因此,由所述著色感光性树脂组合物制备的遮光间隔区可有利地用于液晶显示器、有机EL显示器及其类似物。
可通过例如以下方法的常见方法制备包括上文所描述的组分的本发明的著色感光性树脂组合物。
首先,预先使用珠磨机将著色剂与溶剂混合且使著色剂分散在溶剂中,直到著色剂的平均粒径达到所要值为止。此时,可使用表面活性剂,或可掺合共聚物的部分或整体。将以下各物添加到因此获得的分散液:共聚物及表面活性剂、环氧树脂或由环氧树脂衍生的化合物、光可聚合化合物及光聚合引发剂的剩余部分。若需要,可进一步在某一浓度上添加例如硅烷偶合剂或额外溶剂的添加剂,接着充分搅拌所述添加剂以获得所要著色感光性树脂组合物。
本发明还提供一种通过使著色感光性树脂组合物固化而制造的遮光间隔区。优选地,本发明提供由著色感光性树脂组合物制备的黑色柱状间隔区(BCS),其中将柱状间隔区及黑色矩阵集成到一个模块中。
遮光间隔区的电压保持率可以是85%或大于85%、光密度可以是0.5到1.5/μm,且弹性恢复率可以是90%或大于90%。
可通过涂层形成步骤、曝光步骤、显影步骤及热处理步骤来制造遮光间隔区。
在涂层形成步骤中,通过旋涂法、狭缝涂布法、滚涂法、网版印刷法、涂覆器法及其类似方法以例如1到25μm的所要厚度在预处理的衬底上涂布根据本发明的著色感光性树脂组合物,接着通过去除其中的溶剂而在70到100℃的温度下使所述著色感光性树脂组合物预固化1到10分钟以形成涂层。
为了在经涂布薄膜上形成图案,将具有预定形状的掩模放置在薄膜上,且用200到500nm的激活射线辐照其上具有掩模的经涂布薄膜。此处,为了制造集成型黑色柱状间隔区,可使用具有不同透射率的具有图案的掩模来同时形成柱状间隔区及黑色矩阵。可将低压水银灯、高压水银灯、超高压水银灯、金属卤化物灯、氩气激光器及其类似物用作用于辐照的光源;且在需要时,还可使用X射线、电子射线及其类似物。曝光量可取决于组合物的组分的种类及组成比率以及经干燥涂层的厚度而变化。如果使用高压水银灯,那么曝光量可以是500mJ/cm2或小于500mJ/cm2(在365nm的波长下)。
在曝光步骤之后,执行将例如碳酸钠、氢氧化钠、氢氧化钾、氢氧化四甲基铵及其类似物的碱性水溶液用作显影溶剂的显影步骤以溶解及去除不必要的部分,藉以仅保留暴露部分以形成图案。将通过显影获得的图像图案冷却到室温,且在180到250℃的温度下在热气循环型干燥锅炉中将所述图像图案后烘焙10到60分钟,借此获得最终图案。
由于因此产生的遮光间隔区的极佳属性,可将所述遮光间隔区用于制造LCD、OLED显示器及其类似物的电子部分。因此,本发明提供一种包括遮光间隔区的电子部件。
LCD、OLED显示器及其类似物可包括所属领域的技术人员已知的其它组件,其例外之处在于所述装置具备本发明的遮光间隔区。也就是说,可应用本发明的遮光间隔区的LCD、OLED显示器及其类似物可属于本发明的范围。
在下文中,将参考以下实例更详细地描述本发明。然而,这些实例是为了说明本发明而阐述,且本发明的范围并不限于此。
在以下实例中,通过使用聚苯乙烯标准物的凝胶渗透色谱法(GPC)来确定重均分子量。
合成实例1:制备共聚物(A)
将以下各物填充到配备有回流冷凝器的500ml圆底烧瓶及搅拌器:由51摩尔%的N-苯基顺丁烯二酰亚胺、4摩尔%的苯乙烯、10摩尔%的丙烯酸4-羟基丁酯缩水甘油醚及35摩尔%的甲基丙烯酸组成的100g混合物,以及作为溶剂的300g的丙二醇单甲基醚乙酸酯(PGMEA)及作为自由基聚合引发剂的2g的2,2'-偶氮双(2,4-二甲基戊腈)。接着将混合物加热到70℃且搅拌5小时以获得固体含量是31wt%的共聚物。因此制备的共聚物具有100mgKOH/g的酸值,以及通过凝胶渗透色谱法测量的20,000的聚苯乙烯参考重均分子量(Mw)。
[表1]
合成实例2:制备由环氧树脂(B)衍生的化合物
步骤(1):合成9,9-双[4-(缩水甘油基氧基)苯基]芴
将200g的甲苯、125.4g的4,4'-(9-亚芴基)二苯酚及78.6g的表氯醇填充到3,000ml的三颈圆底烧瓶,且将所述物质加热到40℃,其中进行搅拌以获得溶液。在分离容器中混合0.1386g的叔丁基溴化铵及50%的NaOH水溶液(3当量),且缓慢地将所述混合物添加到烧瓶中,在烧瓶中,正搅拌溶液。
将因此获得的反应混合物加热到90℃达1小时以完全消耗4,4'-(9-亚芴基)二苯酚(通过HPLC或TLC进行确认)。将反应混合物冷却到30℃,且将400ml的二氯甲烷及300ml的1N HCl添加到反应混合物,其中进行搅拌以使有机层分离。用300ml的蒸馏水洗涤因此获得的有机层两次或三次、经硫酸镁干燥,且在减压下进行蒸馏以去除二氯甲烷。使用二氯甲烷与甲醇的混合物而使所得物再结晶,借此获得标题化合物—环氧树脂化合物。
步骤(2):合成(((9H-芴-9,9-二基)双(4,1-伸苯基))双(伸氧基))双(2-羟基丙-
3,1-二基)二丙烯酸酯(CAS第143182-97-2号)
将在步骤(1)中获得的115g的化合物、50mg的氯化四甲铵、50mg的2,6-双(1,1-二甲基乙基)-4-甲苯酚及35g的丙烯酸填充到1,000ml的三颈烧瓶。将混合物加热到90到100℃,同时在25ml/min的流动速率下吹动空气,且进一步将混合物加热到120℃以获得溶液。连续地搅拌反应混合物达12小时,直到其酸值降到小于1.0mg KOH/g为止,且接着冷却到室温。将300ml的二氯甲烷及300ml的蒸馏水添加到反应混合物,其中进行搅拌以使有机层分离。用300ml的蒸馏水洗涤因此获得的有机层两次或三次、经硫酸镁干燥,且在减压下进行蒸馏以去除二氯甲烷,借此获得标题化合物。
步骤(3):制备由环氧树脂衍生且具有卡哆主链结构的化合物
在1,000ml的三颈烧瓶中将在步骤(2)中获得的化合物溶解在PGMEA中,且接着溶解在1,2,4,5-苯四羧酸二酐(0.75当量)中。将1,2,3,6-四氢邻苯二甲酸酐(0.5当量)及三苯膦(0.01当量)添加到所得物。将反应混合物加热到120到130℃,搅拌2小时,且接着冷却到80到90℃,接着在加热下搅拌6小时。接着将反应混合物冷却到室温,借此获得酸值是107mg KOH/g(以固体含量计)且重均分子量(Mw)是6,000的聚合物的溶液(固体含量是49wt%)。
合成实例3:制备著色分散液(E)
从Tokushiki Co.,Ltd.供应著色分散液(E),已如下制备所述分散液。
使用油漆振荡器在25℃下使以下各物分散达6小时:8g的丙烯酸共聚物溶液(其重均分子量是12,000到20,000g/mol且酸值是80到150mg KOH/g)(Tokushiki Co.,Ltd.);8g的丙烯酸聚合物分散剂(其胺值是100到140mg KOH/g)(Tokushiki Co.,Ltd.);18g的碳黑;作为有机黑的65g的内酰胺黑(BASF的Black 582);及作为溶剂的384g的PGMEA。用0.3mm的氧化锆珠粒执行此分散步骤。在完成分散步骤后,就使用过滤器从分散液去除珠粒,借此获得固体含量是23wt%的著色分散液。
实例及比较实例:制备感光性树脂组合物
使用在以上制备实例中制备的化合物来制备以下实例及比较实例中的感光性树脂组合物。
在实例及比较实例中,使用以下额外组分。
[表2]
实例1:制备著色感光性树脂组合物
以固体含量的重量计,将以下各物添加到作为溶剂的(G)PGMEA中:(A)在合成实例1中制备为共聚物的3.0g的化合物;(B)在合成实例2中制备为由环氧树脂衍生的化合物的3.0g的化合物;(C)作为光可聚合化合物的1.8g的DPHA;(D)作为光聚合引发剂的0.03g的SPI-2;(E)在合成实例3中制备为著色剂的9.80g的著色分散液;及(F)作为表面活性剂的0.06g的BYK-307,借此获得30g的混合物。接着均质地混合所述混合物达1,借此获得著色感光性树脂组合物。
实例2到4及比较实例1到7:制备著色感光性树脂组合物
以与实例1相同的方式制备著色感光性树脂组合物,其例外之处在于如以下表3中所展示来改变光聚合引发剂(D)的类型及/或量。
以下表3中给出的数目是基于100wt%的树脂组合物。
[表3]
制备黑色柱状间隔区(遮光间隔区)
使用旋涂器在玻璃衬底上各自涂布在实例及比较实例中获得的著色感光性树脂组合物,且在90℃下干燥(或预烘焙)2.5分钟以形成经涂布薄膜。在经涂布薄膜上涂覆由100%全色调柱状间隔区(CS)图案及30%半色调黑色矩阵图案组成的图案掩模,接着用波长是365nm的光以曝光量是30到80mJ/cm2的形式辐照所述图案掩模。接着在23℃下用0.04wt%的氢氧化钾水溶液进行显影2分钟,接着用纯水洗涤1分钟,借此形成图案。在烘炉中在230℃下使具有因此形成的图案的间隔区固化(或后烘焙)达30分钟,以获得具有最终图案的BCS。
测试实例1:测量显影容限
以与上文所描述的方式相同的方式制备厚度是3.5μm且具有厚度是2μm的遮光薄膜的BCS。使因此制备的BCS显影,显影时间是10到20秒,且观测遮光薄膜的厚度改变(或偏离)以测量显影容限。当测量值是或小于时,评估遮光薄膜的显影容限是极佳的。
测试实例2:测量弹性
以与如上文所描述的方式相同的方式制备厚度是3.5μm且图案宽度是35μm的遮光间隔区。使用FISCHERSCOPE(HM2000,德国)通过负荷/卸荷方法来测量遮光间隔区的弹性恢复率,其中用柱塞(50μm的平面柱塞)将500mN的力施加在遮光间隔区上。
测试实例3:测量电压保持率(VHR)
在衬底(其上已沈积有铟氧化锡合金(ITO)电极)上以与如上文所描述的方式相同的方式涂布著色感光性树脂组合物,其中树脂组合物形成形状与供制造电池的电极的形状相同的厚度是3.5μm的图案。通过使用用于测量电压保持率的装置(Toyo-6254,东洋)在60℃下施加1V/60Hz的频率而测量电池的电压保持率。
测试实例4:测量抗渗出性
以与如上文所描述的方式相同的方式制备厚度是3.5μm、宽度是5cm且长度是5cm的衬底。将因此制备的衬底浸没在3g的100%N-甲基吡咯啶酮(NMP)溶液中,接着在节温器槽中在100℃下对所述衬底加热30分钟。一旦去除衬底,NMP溶液就经受液相层析(HPLC)以确定NMP中的杂质的含量以作为抗渗出性。当杂质总量是30%或小于30%时,评估抗渗出性是极佳的。
测试实例5:测量敏感度
当暴露量在预烘焙后就分裂成以与如上文所描述的方式相同的方式制备的经涂布薄膜时,测量在获得BCS的遮光层图案时的暴露量,且在以下表4中展示结果。当形成遮光层所需要的暴露量较小时,评估敏感度(mJ/cm2)是较快的。
测试实例6:测量光密度
以与如上文所描述的方式相同的方式制备厚度是3.5μm的BCS。使用光密度计量(由Xlite制造的361T)来在550nm下测量因此制备的BCS的透射率,且确定以1μm的厚度计的光密度。
测试实例7:评估是否形成阶差
用光学显微镜(STM6,奥林巴斯)在厚度方向上观测测试实例1的BCS,以查看黑色矩阵与间隔区是否在视觉上被区分。结果在图2及3中作为照片展示。
[表4]
如图2及3以及表5中所展示,由实例的组合物制备的固化薄膜(例如,遮光间隔区或黑色柱状间隔区)(属于本发明的范围)在敏感度、弹性恢复率、抗渗出性、电压保持率、显影容限及光密度方面整体极佳。此外,清楚地观测到阶差。
与此对比,由根据比较实例的组合物制备的固化薄膜(不属于本发明的范围)在大多数属性方面展示不利结果。此外,未清楚地观测到阶差或阶级差不可测量。
[图式的参考编号]
A:柱状间隔区部分的厚度
B:黑色矩阵部分的厚度
C:柱状间隔区部分的临界尺寸(CD)
Claims (10)
1.一种著色感光性树脂组合物,包括:
(A)共聚物;
(B)环氧树脂或由其衍生的化合物;
(C)光可聚合化合物;
(D)光聚合引发剂;及
(E)著色剂,
其中所述光聚合引发剂(D)包括具有以下化学式1的肟酯芴基引发剂:
[化学式1]
其中,在以上化学式1中,R1各自独立地是C1-20烷基,
R2及R3各自独立地是C1-20烷基、C6-20芳基或C3-20环烷基,
A是硝基或氰基,且
X是单键或羰基。
2.根据权利要求1所述的著色感光性树脂组合物,其中R1各自独立地是甲基、乙基、正丙基、异丙基、正丁基、异丁基、叔丁基、正戊基、异戊基、正己基或异己基,
R2及R3各自独立地是甲基、乙基、正丙基、异丙基、正丁基、异丁基、叔丁基、正戊基、异戊基、正己基、异己基、苯基、萘基、联苯基、三联苯基、蒽基、茚基或菲基。
3.根据权利要求1所述的著色感光性树脂组合物,其中所述环氧树脂或由其衍生的所述化合物(B)具有卡哆主链结构。
4.根据权利要求1所述的著色感光性树脂组合物,其包括以所述著色感光性树脂组合物的固体含量的总重量计呈0.1到5wt%的量的所述光聚合引发剂(D)。
5.根据权利要求1所述的著色感光性树脂组合物,其中所述著色剂是选自由黑色无机著色剂、黑色有机著色剂及蓝色著色剂组成的组的至少一种著色剂。
6.根据权利要求1所述的著色感光性树脂组合物,其中所述著色剂包括以所述著色感光性树脂组合物的固体含量的总重量计呈0到20wt%的量的所述黑色无机著色剂、呈10到40wt%的量的所述黑色有机著色剂及呈0到15wt%的量的所述蓝色著色剂。
7.一种遮光间隔区,其由根据权利要求1到6中任一项所述的著色感光性树脂组合物制成。
8.根据权利要求7所述的遮光间隔区,其电压保持率是85%或大于85%。
9.根据权利要求7所述的遮光间隔区,其光密度是0.5到1.5/μm。
10.根据权利要求7所述的遮光间隔区,其弹性恢复率是90%或大于90%。
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014137466A (ja) * | 2013-01-16 | 2014-07-28 | Jsr Corp | 感放射線性着色組成物、着色硬化膜及び表示素子 |
KR20150134989A (ko) * | 2014-05-23 | 2015-12-02 | 롬엔드하스전자재료코리아유한회사 | 컬럼 스페이서 및 블랙 매트릭스를 동시에 구현할 수 있는 착색 감광성 수지 조성물 |
WO2016010036A1 (ja) * | 2014-07-15 | 2016-01-21 | 東京応化工業株式会社 | 感光性組成物及び化合物 |
WO2016076652A1 (ko) * | 2014-11-12 | 2016-05-19 | 주식회사 삼양사 | 액정디스플레이 패널용 블랙매트릭스 포토레지스트 조성물 |
CN105916837A (zh) * | 2014-01-17 | 2016-08-31 | 三养社 | 新型β-肟酯芴化合物、包含其的光聚合引发剂和光致抗蚀剂组合物 |
Family Cites Families (10)
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JP5096814B2 (ja) | 2007-07-04 | 2012-12-12 | 東京応化工業株式会社 | 着色感光性組成物 |
CN110262189A (zh) * | 2011-10-25 | 2019-09-20 | 三菱化学株式会社 | 着色感光性组合物、着色间隔物、滤色片及液晶显示装置 |
JP6127130B2 (ja) * | 2012-05-03 | 2017-05-10 | コリア リサーチ インスティテュート オブ ケミカル テクノロジー | 新規のオキシムエステルフルオレン化合物、およびこれを含む光重合開始剤、並びにフォトレジスト組成物 |
KR20140083620A (ko) | 2012-12-26 | 2014-07-04 | 제일모직주식회사 | 차광층용 감광성 수지 조성물 및 이를 이용한 차광층 |
JP6252039B2 (ja) * | 2013-08-27 | 2017-12-27 | 凸版印刷株式会社 | カラーフィルタ及び液晶表示装置 |
CN104238269A (zh) | 2014-09-19 | 2014-12-24 | 江苏博砚电子科技有限公司 | 一种感光性树脂组合物及其应用 |
KR101808818B1 (ko) * | 2014-11-12 | 2017-12-13 | 주식회사 삼양사 | 액정디스플레이 패널용 블랙매트릭스 포토레지스트 조성물 |
JP6195584B2 (ja) * | 2015-02-04 | 2017-09-13 | 東京応化工業株式会社 | 着色剤分散液、それを含む感光性樹脂組成物、及び分散助剤 |
JP6533556B2 (ja) * | 2016-05-24 | 2019-06-19 | 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. | 感光性樹脂組成物及びそれから製造される光硬化パターン |
WO2018052024A1 (ja) * | 2016-09-16 | 2018-03-22 | 三菱ケミカル株式会社 | 感光性樹脂組成物、硬化物及び画像表示装置 |
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014137466A (ja) * | 2013-01-16 | 2014-07-28 | Jsr Corp | 感放射線性着色組成物、着色硬化膜及び表示素子 |
CN105916837A (zh) * | 2014-01-17 | 2016-08-31 | 三养社 | 新型β-肟酯芴化合物、包含其的光聚合引发剂和光致抗蚀剂组合物 |
KR20150134989A (ko) * | 2014-05-23 | 2015-12-02 | 롬엔드하스전자재료코리아유한회사 | 컬럼 스페이서 및 블랙 매트릭스를 동시에 구현할 수 있는 착색 감광성 수지 조성물 |
WO2016010036A1 (ja) * | 2014-07-15 | 2016-01-21 | 東京応化工業株式会社 | 感光性組成物及び化合物 |
WO2016076652A1 (ko) * | 2014-11-12 | 2016-05-19 | 주식회사 삼양사 | 액정디스플레이 패널용 블랙매트릭스 포토레지스트 조성물 |
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