CN107942624A - A kind of high-precision clean development liquid for pcb board - Google Patents
A kind of high-precision clean development liquid for pcb board Download PDFInfo
- Publication number
- CN107942624A CN107942624A CN201810068257.9A CN201810068257A CN107942624A CN 107942624 A CN107942624 A CN 107942624A CN 201810068257 A CN201810068257 A CN 201810068257A CN 107942624 A CN107942624 A CN 107942624A
- Authority
- CN
- China
- Prior art keywords
- pcb board
- development liquid
- clean development
- precision clean
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Abstract
A kind of high-precision clean development liquid for pcb board, the present invention relates to pcb board dry film and solder mask developing technique field, for fine-lines such as HDI, FPC（L/S=1.5/1.5mil、2/2mil、3/3mil）Research and development coordinate the imaging processing procedure specialty chemicals after high-end devices exposure, are realized with reaching the final of circuit design graphic making.By adding surfactant and cosolvent, raising developer solution promotes chemical reaction to cause developing process to accelerate propulsion, adds dispersant and antioxidant stablizes tank liquor, reduction bubble and residue, hence it is evident that the defects of reduction after developing to the permeability and dissolubility of photoresist.The beneficial effects of the present invention are：With excellent resolution, line quality is improved；The residue of carboxylic acid sodium is not had in developing process, improves the quality of wiring board；The liquid service life is 3 10 times of inorganic developer solution, and waste liquid amount is few；Scum silica frost is few, and sweeping efficiency improves；Workability is good, and for water-soluble liquid, dissolving is fast, simple operation.
Description
Technical field
The present invention relates to pcb board dry film and solder mask developing technique field, and in particular to a kind of for the high-precision of pcb board
Spend clean development liquid.
Background technology
Printed circuit board, also known as printed circuit board (PCB), are the suppliers of electronic component electrical connection, its development has
The history of more than 100 years.Major advantage using circuit board is to greatly reduce the mistake of wiring and assembling, improves Automated water
Gentle productive labor rate, to the development of the national economy, national defense construction and social development with vital strategic position and not
Alternative effect.Dry film exposure imaging is an important step in pcb board manufacturing process, which utilizes exposed and developed
Geometric figure structure is portrayed on pcb board, continuous with critical size reduces, and pcb board manufactures the requirement to developing process
Higher and higher, development work liquid importance is increasingly paid attention to the progress of technique.
Dry film is a kind of carboxylic organic matter, can also contain some metal ions（Such as Ca2+And Mg2+）, traditional is to use
Carbonate removes effect carboxyl, organics removal, disadvantage however is that carbonate easily reacts generation precipitation（Such as calcium carbonate and carbonic acid
Magnesium）, adhere on plank, this block region being stained with is not come out in follow-up striping, is taken as circuit（This original block is not
It is circuit）, cause short circuit.
Therefore, plate face dry film remains after conventional developer solution has development, causes dry film to dissolve the problem of reactant remains,
Remained on surface particle pollution can cause circuitous pattern to fail, product defects, directly affect the yield of product.It is therefore it provides a kind of
The developer solution that can be solved the above problems is necessary.
The content of the invention
To improve the above problem, the present invention, can the perfect production application disadvantage for solving inorganic base using organic base as main component
Disease and quality defect, are particularly suitable for Semi-Additive flows.By adding surfactant and cosolvent, development is improved
Liquid promotes chemical reaction so that developing process quickening propulsion, adds dispersant and antioxygen to the permeability and dissolubility of photoresist
Agent stablizes tank liquor, reduces bubble and residue, hence it is evident that the defects of reduction after developing.
Technical solution provided by the invention is as follows：
A kind of high-precision clean development liquid for pcb board, the developer solution include：Organic base 60-120g/L, surface are lived
Agent 30-70g/L, cosolvent 30-80g/L, suspension dispersive agent 20-60g/L, antioxidant 80-100ppm.By above-mentioned various things
Matter, which is uniformly mixed, can be prepared by developer solution.
Preferably, the machine alkali stated is tetramethylammonium hydroxide, monoethanolamine, diethanol amine, triethanolamine and more ethene
One kind in polyamines.
Preferably, the cosolvent for ethylene glycol, propane diols, ethanol, pyridine, aminopyridine, quinoline woods, oxyquinoline,
One or more of diethylene glycol and polyethylene glycol.
Preferably, the suspension dispersive agent is sodium tripolyphosphate, sucrose ester, polyacrylamide, methyl anyl alcohol and fiber
One or more of plain derivative.
Preferably, the antioxidant is butylhydroxy anisole, dibutyl hydroxy toluene, tert-butyl hydroquinone
One or more of with tertbutyl methyl phenol.
Developer solution provided by the invention come the carboxyl of action dry film, has so both been dissolved dry using the hydroxyl in organic base
Film, turn avoid the generation of precipitation, employs organic base（-OH）Substitute traditional inorganic base（CO3 2-）, effectively avoid
CO3 2-With taking off the Ca in the mixture composition and industrial water that come on the additive in the unexposed dry film of pcb board, dry film2+、
Mg2+Plasma combines the fixed precipitation of generation, and as developing process continues in producing line, precipitation is more and more, and then forms block slag
It is counter to adhere on plate, line short circuit after causing subsequent etching processes complete.
The beneficial effects of the present invention are：Reduce bubble and residue, hence it is evident that the defects of reducing after developing, improve pcb board
Yield.
Embodiment
Embodiment 1
1）Developer composition for pcb board forms：
Tetramethylammonium hydroxide 50g/L, monoethanolamine 30g/L, phosphate alkanolamide 40g/L, propane diols 50g/L, methylpent
Alcohol 20g/L, butylhydroxy anisole 30ppm, tert-butyl hydroquinone 40ppm.
2）Pcb board development sample test
By automatic optics inspection, i.e. AOI, the pcb board after test development, upon automatic detection, machine is automatic by camera
PCB is scanned, gathers image, the data of test, by image procossing, check compared with the qualified parameter in database
The upper defects of PCB.
AOI tests fraction defective 10.2%, better than conventional developer solution（15%）.
Embodiment 2
1）Developer composition for pcb board forms：
Tetramethylammonium hydroxide 20g/L, triethanolamine 90g/L, aliphatic amine polyoxyethylene ether 50g/L, ethanol 50g/L, sucrose ester
20g/L, dibutyl hydroxy toluene 20ppm, tert-butyl hydroquinone 40ppm.
2）Pcb board development sample test
AOI tests fraction defective 9.0%, better than conventional developer solution（15%）.
Embodiment 3
1）Developer composition for pcb board forms：
Monoethanolamine 20g/L, diethanol amine 80g/L, aliphatic amine polyoxyethylene ether 50g/L, ethanol 50g/L, sucrose ester 20g/L,
Methyl anyl alcohol 20g/L, dibutyl hydroxy toluene 20ppm, butyl methyl phenol 40ppm.
2）Pcb board development sample test
AOI tests fraction defective 9.5%, better than conventional developer solution（15%）.
Claims (6)
1. a kind of high-precision clean development liquid for pcb board, it is characterised in that the developer solution includes：Organic base 60-
120g/L, surfactant 30-70g/L, cosolvent 30-80g/L, suspension dispersive agent 20-60g/L, antioxidant 80-
100ppm。
A kind of 2. high-precision clean development liquid for pcb board as claimed in claim 1, it is characterised in that the organic base
For one kind in tetramethylammonium hydroxide, monoethanolamine, diethanol amine, triethanolamine and polyethylene polyamine.
A kind of 3. high-precision clean development liquid for pcb board as claimed in claim 1, it is characterised in that the hydrotropy
Agent is one kind in ethylene glycol, propane diols, ethanol, pyridine, aminopyridine, quinoline woods, oxyquinoline, diethylene glycol and polyethylene glycol
More than.
A kind of 4. high-precision clean development liquid for pcb board as claimed in claim 1, it is characterised in that the suspension
Dispersant is one or more of sodium tripolyphosphate, sucrose ester, polyacrylamide, methyl anyl alcohol and cellulose derivative.
A kind of 5. high-precision clean development liquid for pcb board as claimed in claim 1, it is characterised in that the antioxygen
Agent is one kind in butylhydroxy anisole, dibutyl hydroxy toluene, tert-butyl hydroquinone and tertbutyl methyl phenol
More than.
A kind of 6. high-precision clean development liquid for pcb board as claimed in claim 1, it is characterised in that the surface
Activator is one in fatty alcohol polyoxyethylene ether, aliphatic amine polyoxyethylene ether, phosphate alkanolamide and castor oil phosphate ester
Kind is a variety of.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810068257.9A CN107942624A (en) | 2018-01-24 | 2018-01-24 | A kind of high-precision clean development liquid for pcb board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810068257.9A CN107942624A (en) | 2018-01-24 | 2018-01-24 | A kind of high-precision clean development liquid for pcb board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107942624A true CN107942624A (en) | 2018-04-20 |
Family
ID=61937773
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810068257.9A Pending CN107942624A (en) | 2018-01-24 | 2018-01-24 | A kind of high-precision clean development liquid for pcb board |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107942624A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109270808A (en) * | 2018-10-25 | 2019-01-25 | 健鼎（湖北）电子有限公司 | A method of removal dry film |
| CN110042018A (en) * | 2019-04-14 | 2019-07-23 | 广州恒荣电子科技有限公司 | A kind of clear slot agent of wiring board welding masking developing |
| CN115261879A (en) * | 2022-07-05 | 2022-11-01 | 南通群安电子材料有限公司 | Organic film removing liquid suitable for MSAP (multiple-site amplification process) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102096344A (en) * | 2010-12-17 | 2011-06-15 | 合肥茂丰电子科技有限公司 | Developing solution as well as preparation method and application thereof |
| CN105589304A (en) * | 2016-03-04 | 2016-05-18 | 苏州晶瑞化学股份有限公司 | Developing liquid for photoresist as well as preparation method and application thereof |
| WO2016208313A1 (en) * | 2015-06-23 | 2016-12-29 | 富士フイルム株式会社 | Development solution, pattern formation method, and electronic device production method |
| CN106483776A (en) * | 2015-08-31 | 2017-03-08 | 台湾积体电路制造股份有限公司 | New reagent for photoetching |
-
2018
- 2018-01-24 CN CN201810068257.9A patent/CN107942624A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102096344A (en) * | 2010-12-17 | 2011-06-15 | 合肥茂丰电子科技有限公司 | Developing solution as well as preparation method and application thereof |
| WO2016208313A1 (en) * | 2015-06-23 | 2016-12-29 | 富士フイルム株式会社 | Development solution, pattern formation method, and electronic device production method |
| CN106483776A (en) * | 2015-08-31 | 2017-03-08 | 台湾积体电路制造股份有限公司 | New reagent for photoetching |
| CN105589304A (en) * | 2016-03-04 | 2016-05-18 | 苏州晶瑞化学股份有限公司 | Developing liquid for photoresist as well as preparation method and application thereof |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109270808A (en) * | 2018-10-25 | 2019-01-25 | 健鼎（湖北）电子有限公司 | A method of removal dry film |
| CN110042018A (en) * | 2019-04-14 | 2019-07-23 | 广州恒荣电子科技有限公司 | A kind of clear slot agent of wiring board welding masking developing |
| CN115261879A (en) * | 2022-07-05 | 2022-11-01 | 南通群安电子材料有限公司 | Organic film removing liquid suitable for MSAP (multiple-site amplification process) |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20180420 |