CN107121898A - A kind of TFT LCD, which are shown, uses developer solution - Google Patents

A kind of TFT LCD, which are shown, uses developer solution Download PDF

Info

Publication number
CN107121898A
CN107121898A CN201710436615.2A CN201710436615A CN107121898A CN 107121898 A CN107121898 A CN 107121898A CN 201710436615 A CN201710436615 A CN 201710436615A CN 107121898 A CN107121898 A CN 107121898A
Authority
CN
China
Prior art keywords
developer solution
parts
tft
deionized water
amine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201710436615.2A
Other languages
Chinese (zh)
Inventor
白航空
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hefei Huike Precision Mould Co Ltd
Original Assignee
Hefei Huike Precision Mould Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hefei Huike Precision Mould Co Ltd filed Critical Hefei Huike Precision Mould Co Ltd
Priority to CN201710436615.2A priority Critical patent/CN107121898A/en
Publication of CN107121898A publication Critical patent/CN107121898A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • G03F7/322Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

Shown the invention discloses a kind of TFT LCD and use developer solution, the developer solution is made up of the component of following parts by weight:42 54 parts of 22 26 parts of alkali compounds, 7 14 parts of nonionic surfactant, 9 15 parts of bleeding agent and deionized water.The developer solution of the present invention overcomes existing developer solution when in use can not be while take into account developability, defoaming, dispersion stabilization and the narrow shortcoming of operating temperature range, the developer solution need not add defoamer, with developing performance it is good, without residue, operating temperature range it is wide, it is low in the pollution of the environment the features such as, in the development preparation technology of photoresist, with extremely important and be widely applied;The developer solution of the present invention has resulting visualization good simultaneously, it is to avoid residue is generated, there is hypotoxicity, do not have inflammability and management easily, liquid waste processing it is easy and with low cost.

Description

A kind of TFT-LCD, which is shown, uses developer solution
Technical field
The present invention relates to TFT-LCD technical field, and in particular to a kind of TFT-LCD, which is shown, uses developer solution.
Background technology
Typically in the preparation technologies such as liquid crystal display, printed circuit board (PCB) and integrated circuit, to obtain fine pattern, commonly use The radioactive ray such as photoresist sensitivity constituent forms film with coating method on base material, aobvious with alkaline-based developer after overexposure Picture, remove should not film part, to obtain good figure.
In these offset printing processes, by exposing the photoresist mask for being decorated with circuit pattern being transferred on chip On, the plane of exposure of above-mentioned photoresist is contacted with developer solution, for positivity, exposure is partially dissolved in developer solution, and right In negativity, unexposed area is dissolved in developer solution.
First purpose of developing process is that unexposed positive corrosion-resisting agent film should be minimum by developer extent of corrosion.It is actual Development always have corrosion to a certain degree to unexposed resist, but due to exposure region and unexposed area solubility not Together so that resist feasible process.In fact, the bigger developer of range of choice also takes longer to complete developed image. So, when selecting developer, different solubility and production capacity must just be considered.Its production capacity of a developer should be selected to meet will Ask and do not cause undue resist thinning.In addition, developer also should have enough contents so that technique can be in growing environment Maintain.
Carrying out development has three kinds of main methods:Immersion, spray and agitation development.
But according to the technology of known developer solution, photonasty resist is after film and pre-baked, exposure, though it can be shown with alkalescence Shadow liquid come dissolve remove it is unexposed and should not film part, but easily produce and do not develop position particle or undissolved in development It is relatively difficult to form fine image after the remaining of thing, therefore development, so that the demand in market can not be met.
The content of the invention
The present invention is intended to provide a kind of TFT-LCD shows and uses developer solution.
The present invention provides following technical scheme:
A kind of TFT-LCD, which is shown, uses developer solution, and the developer solution is made up of the component of following parts by weight:Alkali compounds 42-54 parts of 22-26 parts, 7-14 parts of nonionic surfactant, 9-15 parts of bleeding agent and deionized water.
The alkali compounds is inorganic alkaline compound or organic basic compound;Wherein, inorganic alkaline compound is: One or more in the hydroxide of alkali metal, bicarbonate, carbonate;Organic basic compound is:Monomethyl amine, diformazan Base amine, Trimethylamine, MEA, diethylamide, triethylamine, MEA, diethanol amine, triethanolamine, hydroxide four One or more in ammonium methyl, tetraethyl ammonium hydroxide, monoethanol dimethyl amine.
The nonionic surfactant is selected from coconut oil fatty acid monoethanolamide, coco-nut oil fatty acid diethanol acyl At least one of amine, castor oil polyoxyethylene ether and castor oil polyoxyethylene ether.
The bleeding agent is the polyethylene oxide and the condensation product or phosphoric acid of higher aliphatic in polyethenoxy ether class bleeding agent Ester.
The deionized water is the water filtered by ion exchange resin, and its resistance is at least 18M Ω.
In the deionized water, total concentration of metal ions is not more than 4000 nanograms/L, and preferably no greater than 500 nanograms/ L, more preferably no more than 50 nanograms/L.
Compared with prior art, the beneficial effects of the invention are as follows:The developer solution of the present invention, which overcomes existing developer solution, to be made Used time can not take into account developability, defoaming, dispersion stabilization and the narrow shortcoming of operating temperature range simultaneously, and the developer solution need not add Plus defoamer, with developing performance it is good, without residue, operating temperature range it is wide, it is low in the pollution of the environment the features such as, in photoresist In the preparation technology that develops, with extremely important and be widely applied;The developer solution of the present invention has resulting visualization good simultaneously, it is to avoid Residue is generated, and is had the advantages that hypotoxicity, do not have inflammability and is managed easy, liquid waste processing and be easy and with low cost.
Embodiment
Below in conjunction with the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described, Obviously, described embodiment is only a part of embodiment of the invention, rather than whole embodiments.Based in the present invention Embodiment, the every other embodiment that those of ordinary skill in the art are obtained under the premise of creative work is not made, all Belong to the scope of protection of the invention.
A kind of TFT-LCD of embodiment 1, which is shown, uses developer solution, and the developer solution is made up of the component of following parts by weight:Alkali Property 42 parts of 22 parts of compound, 7 parts of nonionic surfactant, 9 parts of bleeding agent and deionized water.
The alkali compounds is inorganic alkaline compound or organic basic compound;Wherein, inorganic alkaline compound is: One or more in the hydroxide of alkali metal, bicarbonate, carbonate;Organic basic compound is:Monomethyl amine, diformazan Base amine, Trimethylamine, MEA, diethylamide, triethylamine, MEA, diethanol amine, triethanolamine, hydroxide four One or more in ammonium methyl, tetraethyl ammonium hydroxide, monoethanol dimethyl amine.
The nonionic surfactant is selected from coconut oil fatty acid monoethanolamide, coco-nut oil fatty acid diethanol acyl At least one of amine, castor oil polyoxyethylene ether and castor oil polyoxyethylene ether.
The bleeding agent is the polyethylene oxide and the condensation product or phosphoric acid of higher aliphatic in polyethenoxy ether class bleeding agent Ester.
The deionized water is the water filtered by ion exchange resin, and its resistance is at least 18M Ω.
In the deionized water, total concentration of metal ions is not more than 4000 nanograms/L, preferably no greater than 500 nanograms/L, more Preferably no greater than 50 nanograms/L.
A kind of TFT-LCD of embodiment 2, which is shown, uses developer solution, and the developer solution is made up of the component of following parts by weight:Alkali Property 54 parts of 26 parts of compound, 14 parts of nonionic surfactant, 15 parts of bleeding agent and deionized water.
The alkali compounds is inorganic alkaline compound or organic basic compound;Wherein, inorganic alkaline compound is: One or more in the hydroxide of alkali metal, bicarbonate, carbonate;Organic basic compound is:Monomethyl amine, diformazan Base amine, Trimethylamine, MEA, diethylamide, triethylamine, MEA, diethanol amine, triethanolamine, hydroxide four One or more in ammonium methyl, tetraethyl ammonium hydroxide, monoethanol dimethyl amine.
The nonionic surfactant is selected from coconut oil fatty acid monoethanolamide, coco-nut oil fatty acid diethanol acyl At least one of amine, castor oil polyoxyethylene ether and castor oil polyoxyethylene ether.
The bleeding agent is the polyethylene oxide and the condensation product or phosphoric acid of higher aliphatic in polyethenoxy ether class bleeding agent Ester.
The deionized water is the water filtered by ion exchange resin, and its resistance is at least 18M Ω.
In the deionized water, total concentration of metal ions is not more than 4000 nanograms/L, preferably no greater than 500 nanograms/L, more Preferably no greater than 50 nanograms/L.
A kind of TFT-LCD of embodiment 3, which is shown, uses developer solution, and the developer solution is made up of the component of following parts by weight:Alkali Property 48 parts of 24 parts of compound, 11 parts of nonionic surfactant, 12 parts of bleeding agent and deionized water.
The alkali compounds is inorganic alkaline compound or organic basic compound;Wherein, inorganic alkaline compound is: One or more in the hydroxide of alkali metal, bicarbonate, carbonate;Organic basic compound is:Monomethyl amine, diformazan Base amine, Trimethylamine, MEA, diethylamide, triethylamine, MEA, diethanol amine, triethanolamine, hydroxide four One or more in ammonium methyl, tetraethyl ammonium hydroxide, monoethanol dimethyl amine.
The nonionic surfactant is selected from coconut oil fatty acid monoethanolamide, coco-nut oil fatty acid diethanol acyl At least one of amine, castor oil polyoxyethylene ether and castor oil polyoxyethylene ether.
The bleeding agent is the polyethylene oxide and the condensation product or phosphoric acid of higher aliphatic in polyethenoxy ether class bleeding agent Ester.
The deionized water is the water filtered by ion exchange resin, and its resistance is at least 18M Ω.
In the deionized water, total concentration of metal ions is not more than 4000 nanograms/L, preferably no greater than 500 nanograms/L, more Preferably no greater than 50 nanograms/L.
It is obvious to a person skilled in the art that the invention is not restricted to the details of the one exemplary embodiment, Er Qie In the case of without departing substantially from spirit or essential attributes of the invention, the present invention can be realized in other specific forms.Therefore, no matter From the point of view of which point, embodiment all should be regarded as exemplary, and be nonrestrictive, the scope of the present invention is by appended power Profit is required rather than the explanation is limited, it is intended that all in the implication and scope of the equivalency of claim by falling Change is included in the present invention.Although not each moreover, it will be appreciated that the present specification is described in terms of embodiments Embodiment is only comprising an independent technical scheme, and this narrating mode of specification is only this area for clarity Technical staff should be using specification as an entirety, and the technical solutions in the various embodiments may also be suitably combined, forms this Art personnel may be appreciated other embodiment.

Claims (6)

1. a kind of TFT-LCD, which is shown, uses developer solution, it is characterised in that the developer solution is made up of the component of following parts by weight: 42-54 parts of 22-26 parts of alkali compounds, 7-14 parts of nonionic surfactant, 9-15 parts of bleeding agent and deionized water.
2. a kind of TFT-LCD according to claim 1, which is shown, uses developer solution, it is characterised in that:The alkali compounds is Inorganic alkaline compound or organic basic compound;Wherein, inorganic alkaline compound is:Hydroxide, the bicarbonate of alkali metal One or more in salt, carbonate;Organic basic compound is:Monomethyl amine, dimethyl amine, Trimethylamine, MEA, Diethylamide, triethylamine, MEA, diethanol amine, triethanolamine, tetramethyl ammonium hydroxide, tetraethyl ammonium hydroxide, list One or more in dimethylamino ethanol base amine.
3. a kind of TFT-LCD according to claim 1, which is shown, uses developer solution, it is characterised in that:The non-ionic surface is lived Property agent be selected from coconut oil fatty acid monoethanolamide, cocoanut fatty acid diethanolamide, castor oil polyoxyethylene ether and castor-oil plant At least one of oily APEO.
4. a kind of TFT-LCD according to claim 1, which is shown, uses developer solution, it is characterised in that:The bleeding agent is polyoxy The condensation product or phosphate of polyethylene oxide and higher aliphatic in ethene ethers bleeding agent.
5. a kind of TFT-LCD according to claim 1, which is shown, uses developer solution, it is characterised in that:The deionized water be through The water of ion exchange resin filtering is crossed, its resistance is at least 18M Ω.
6. a kind of TFT-LCD according to claim 1, which is shown, uses developer solution, it is characterised in that:The deionized water In, total concentration of metal ions is not more than 4000 nanograms/L, preferably no greater than 500 nanograms/L, more preferably no more than 50 nanograms/L.
CN201710436615.2A 2017-06-12 2017-06-12 A kind of TFT LCD, which are shown, uses developer solution Pending CN107121898A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710436615.2A CN107121898A (en) 2017-06-12 2017-06-12 A kind of TFT LCD, which are shown, uses developer solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710436615.2A CN107121898A (en) 2017-06-12 2017-06-12 A kind of TFT LCD, which are shown, uses developer solution

Publications (1)

Publication Number Publication Date
CN107121898A true CN107121898A (en) 2017-09-01

Family

ID=59729287

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710436615.2A Pending CN107121898A (en) 2017-06-12 2017-06-12 A kind of TFT LCD, which are shown, uses developer solution

Country Status (1)

Country Link
CN (1) CN107121898A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109375482A (en) * 2018-11-01 2019-02-22 博罗县东明新材料研究所 PCB developer solution and preparation method thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102063024A (en) * 2010-12-24 2011-05-18 东莞市智高化学原料有限公司 Developing solution composition
CN102096344A (en) * 2010-12-17 2011-06-15 合肥茂丰电子科技有限公司 Developing solution as well as preparation method and application thereof

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102096344A (en) * 2010-12-17 2011-06-15 合肥茂丰电子科技有限公司 Developing solution as well as preparation method and application thereof
CN102063024A (en) * 2010-12-24 2011-05-18 东莞市智高化学原料有限公司 Developing solution composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109375482A (en) * 2018-11-01 2019-02-22 博罗县东明新材料研究所 PCB developer solution and preparation method thereof

Similar Documents

Publication Publication Date Title
JP4225909B2 (en) Thinner composition
CN101133366B (en) Developer composition, process for producing the same, and method of forming resist pattern
CN103119105A (en) Polymeric or monomeric compositions comprising at least one mono-amide and/or at least one diamide for removing substances from substrates and methods of using the same
CN106227003A (en) A kind of developer composition and preparation method thereof
KR20190051965A (en) Cleaning agent composition for peeling resin mask
CN106707702A (en) Dry film removing solution for copper alloy indium tin oxide plated conductive film and preparation method thereof
CN103443710B (en) Cleaning liquid for lithography and employ its pattern formation method
CN101585662B (en) Etching liquid for flat panel display
CN107121898A (en) A kind of TFT LCD, which are shown, uses developer solution
CN102063024B (en) Developing solution composition
JP4315919B2 (en) High concentration developer stock solution
US6503694B1 (en) Developer solution and edge bead remover composition
TW200415441A (en) Photoresist developer composition
KR101161051B1 (en) Developer composition
CN102289160B (en) Developing solution for photoinduced etching agent as well as preparation method and application thereof
CN101750910B (en) Developer solution component
CN105589303A (en) High-capacity developing solution composition for thick film photoresists
TWI355568B (en)
CN109143798A (en) A kind of good stability and easy cleaned developer solution
KR20030000359A (en) Thinner composition
JP3970740B2 (en) Developer composition
CN103728845B (en) Developer composition for flat panel display
JP2012211949A (en) Rinse liquid for lithography and pattern formation method
CN101738878A (en) Photoresist cleaning fluid composition and application thereof
KR102092026B1 (en) Photoresist Developer Composition

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20170901