CN103728845B - Developer composition for flat panel display - Google Patents
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- CN103728845B CN103728845B CN201310744140.5A CN201310744140A CN103728845B CN 103728845 B CN103728845 B CN 103728845B CN 201310744140 A CN201310744140 A CN 201310744140A CN 103728845 B CN103728845 B CN 103728845B
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Abstract
The invention discloses a kind of developer composition for flat panel display.Said composition includes following each component: nonionic surfactant, organic solvent and water shown in organic amine compound shown in Formulas I, Formula II.This developer solution also has low foam and chromatic photoresist has good dispersion stabilization while having the developing performance of excellence, effectively reduce formation and the non-metallic ion residual of film slag, developing performance is good, without residue, operating temperature range width, the feature such as low in the pollution of the environment, in the development preparation technology of photoresist, it is widely applied.
Description
Technical field
The invention belongs to flat display field, relate to a kind of developer composition for flat panel display.
Background technology
In the technique of flat pannel display, for obtaining required wiring pattern, it is necessary to utilize photoresist to be coated on substrate to be formed and block with light shield after thin film and be exposed, then develop with alkaline-based developer, remove unexposed part, thus obtaining required wiring pattern.
Conventional photoresist is alkali soluble resin, such as phenolic resin, acryl resin and poly(4-hydroxystyrene) etc., ultraviolet light is generally utilized after being irradiated, to change the molecular structure of macromolecule resin and the dissolubility in alkaloids thereof such that it is able to be dissolved in alkaline-based developer.
Along with people's improving constantly for display effect, for reaching better color representation and higher fineness, current technique adopts COA(ColorFilterOnArray more) processing procedure, namely on the same substrate chromatic filter layer is combined on membrane transistor pipe.Developer solution general on the market at present has not enough:
1, foam.In spray (SPRAY) developing process of current main flow, the photoresistance after developer solution being fully ejected into exposure by shower nozzle developing, developer solution is easy to bubble；Additionally during photoresistance development, micro-bubble can be produced when air enters, form foam.The residual of foam can stop contacting of developer solution and photoresistance, causes unexposed photoresistance to be gone out insufficient, and development effect is poor, thus affecting integrity and the fineness (Japanese Unexamined Patent Publication 10-010749 publication) of wiring.For the side effect suppressing foam to bring, adding defoamer in developer solution is common approach, but some defoamer in use constantly dissolve or dispersion resist along with developer solution, and defoaming effect is difficult to persistently (Japanese Unexamined Patent Publication 10-293964 publication).
2, metal ion remains.If the alkali compounds used in alkaline-based developer comprises metal ion, if having a little residual in follow-up cleaning link, will counter plate encapsulation after photoelectric characteristic produce harmful effect, tradition use with the inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium phosphate, sodium dihydrogen phosphate, sodium acetate be aqueous solution developer solution all there is problem above (Japanese Unexamined Patent Publication 11-249322 publication).So, using the aqueous solution of the organic basic compounds such as Tetramethylammonium hydroxide, tetraethyl ammonium hydroxide, TPAOH or alkyl alcoholamine as developer solution.
3, film slag.Along with the development of exposure technique and etching precision, the requirement of novel developer solution is also more and more higher.Because finding in the process of development, when photoresist is after film, preliminary drying and exposure, the unexposed part of its film contains acidic functionality, and these acidic functionalities, in alkaline-based developer, form, with alkali reaction, the watersoluble organic polymer salt that can be dissolved in water.When these organic polymer salt dissolved constantly accumulate in developing process, along with being continuously increased of concentration, the speed of development starts continuous reduction, and the insoluble Organic substance in developing trough starts appearance, eventually forms the film slag of insoluble in water.Film slag can constantly be piled up and adhere to, and directly affects development effect, is difficult to obtain accurate wiring pattern (Japanese Unexamined Patent Publication 02-166452 publication) after causing development.Scheme is had to propose to add the method (US Patent No. 7150960) of common nonionic surfactant.The appearance of these methods, largely solves the phenomenon of residue in developing process, has the effect improving display image quality.But owing to surfactant dissolubility in aqueous slkali especially inorganic alkali solution exists a definite limitation, alkaline-based developer is in transport and storage process, because the change of temperature produces nebulousurine and lamination, causing that the stability of developer solution reduces, impact is normal to be used.
Summary of the invention
It is an object of the invention to provide a kind of developer composition for flat panel display.
A kind of developer composition provided by the invention, including following each component:
Nonionic surfactant, organic solvent and water shown in organic amine compound shown in Formulas I, Formula II；
In described Formulas I, R1、R2And R3Be selected from-H ,-OH and-R-OH any one；And R1、R2And R3In at least one be-R-OH；
In described-R-OH, R is selected from-CH2-、-C2H4-and-C3H6-in any one
In described Formula II, R4And R5It is selected from-CH2-、-C2H4-and-C3H6-in any one；
R6Selected from hydrogen ,-CH3、-C2H5With-C3H7In any one；
M is the integer of 5～18.
Above-mentioned developer composition also can be only made up of said components.
Shown in described Formulas I, compound is specifically selected from least one of ethanolamine, diethanolamine, methyl diethanolamine, diisopropylamine and triethanolamine；At least one in preferred alcohol amine and diethanolamine.
In described Formula II, R4And R5It is selected from-CH2-、-C2H4-and-C3H6-in any one；
M is the integer of 5-15, is specially the integer of 5-10, more specifically 5,7,9 or the integer of the integer of 5-9 or the integer of 5-7 or 7-9.When the integer that m is 5-15, organic amine alkali compounds good dispersion in water shown in nonionic surfactant shown in Formula II and Formulas I, good stability, because of the change of temperature, the phenomenon such as cloud point, layering will not occur, development persistent is stable, without film slag.
Concrete, nonionic surfactant shown in described Formula II is B1251(namely methoxy poly (ethylene glycol) butanimide acetas (5 moles of addition products of oxirane)), B1291(namely methoxy poly (ethylene glycol) butanimide acetas (9 moles of addition products of oxirane)), B1272(namely methoxy poly (ethylene glycol) succinimidyl propionate (7 moles of addition products of oxirane)), B0251(namely hydroxyl Polyethylene Glycol butanimide acetas (5 moles of addition products of oxirane)), B0273(namely hydroxyl Polyethylene Glycol succinimidyl butanoate (7 moles of addition products of oxirane)) or B3251(namely propyl group Polyethylene Glycol butanimide acetas (5 moles of addition products of oxirane)) shown in compound；
The described organic solvent any one or any two kinds in dimethyl sulfoxide (DMSO), N-Methyl pyrrolidone, propylene glycol monomethyl ether (PM), propylene-glycol ethyl ether (PE), diethylene glycol monomethyl ether (DM), diethylene glycol dimethyl ether (DEDM) and butyl (DB).The use of organic solvent can bring better development effect, strengthens the developer composition dissolubility to organic polymer salt, substantially increases persistency when developer solution uses.
Described water is deionized water, and the total concentration of metal ions in described water is not more than 500 and receives g/l, is specially and is not more than 50 and receives g/l.With water for disperseing the developer solution of matchmaker to have hypotoxicity, without feature flammable, that liquid waste processing is easy and with low cost.
Described developer composition is be made up of the component of following each weight/mass percentage composition:
Organic amine compound shown in Formulas I: 0.1-3%；
Nonionic surfactant shown in Formula II: 0.1-10%；
Organic solvent: 1-20%；
Surplus is water.
Concrete, described developer composition is be made up of the component of following each weight/mass percentage composition:
Organic amine compound shown in Formulas I: 0.5-1.5%；
Nonionic surfactant shown in Formula II: 0.5-5%；
Organic solvent: 2-10%；
Surplus is water.
Wherein, the weight/mass percentage composition of organic amine compound shown in Formulas I can be more specifically 0.5,1,1.5,0.5-1 or 1-1.5%；
The weight/mass percentage composition of nonionic surfactant shown in Formula II can be more specifically 0.5,1,1.5,5,0.5-1.5,1-1.5,1-5 or 1.5-5%；
The weight/mass percentage composition of described organic solvent concretely 5,7,5-7%.
The method preparing described developer composition provided by the invention, comprises the steps: to mix aforementioned each component, obtains described developer composition.
Additionally, the application that the developer composition of the invention described above offer is in the developing method of photoresist, fall within protection scope of the present invention.Wherein, any one in thermoplastic phenolic resin, acrylic resin, the resinous polymer of maleic anhydride, the resinous polymer of maleic anhydride half ester (described half ester is the resin of only one of which carboxyl generation esterification in dianhydride) and polycarboxylated styrene of described photoresist；Preferred acrylic resins, more preferably any one in following copolymer a-copolymer f:
Described copolymer a is methyl methacrylate and hydroxy benzenes, styrene and methacrylic acid copolymer and the copolymer that obtains, described copolymer b is the copolymer that methyl methacrylate obtains with styrene and acrylic acid copolymer, described copolymer c is the copolymer that methyl methacrylate obtains with styrene and methacrylic acid copolymer, described copolymer d is the copolymer that methyl methacrylate obtains with benzyl methacrylate and methacrylic acid copolymer, described copolymer e is the copolymer that benzyl methacrylate obtains with methacrylic acid copolymer, described copolymer f is the copolymer that methacrylic acid obtains with benzyl methacrylate and 2-hydroxyethyl methyl ester copolymerization；The weight average molecular weight of described copolymer a-copolymer f is 5000～200000, it is preferable that 8000～60000.
Described developing method is the developing method of colored filter photo-induced etching agent, is specially the method combined on membrane transistor pipe by chromatic filter layer on the same substrate, i.e. COA(ColorFilterOnArray) on processing procedure.
This is bright overcome prior art developer solution can not take into account in use simultaneously defoaming, developability, dispersion stabilization, without the narrow shortcoming of film slag and operating temperature range, provide a kind of without add defoamer can improve simultaneously defoaming, dispersion stabilization, without film slag and operating temperature range width, the developing agent for flat-panel display of development effect excellence.This developer solution also has low foam and chromatic photoresist has good dispersion stabilization while having the developing performance of excellence, effectively reduce the formation of film slag, developing performance is good, without features such as residue, operating temperature range width, in the development preparation technology of photoresist, it is widely applied.
Detailed description of the invention
Below in conjunction with specific embodiment, the invention will be further described, but the present invention is not limited to following example.In following embodiment if no special instructions, method therefor is conventional method.Described in following embodiment, percentage ratio is if no special instructions, is all weight percentage.
By the following method the development effect of developer solution provided by the invention, development residue, fixing efficiency and operating temperature range are evaluated:
Keep in 40% application chamber once in humidity, the TFT glass substrate forming thin film transistor (TFT) and pixel electrode is turned round coating positive light sensitivity composition, 130 DEG C dry, form the base material of positive type light sensitive film, by aforementioned substrates after light shield exposes, by in aforementioned basic dipping and following developer composition about 90 seconds, then toast 1 hour with 200 DEG C again, chromatic filter layer can be formed on aforesaid base plate.
One, development effect:
After being disposed with 50 power microscopes observe the pattern edge on substrates after development whether smooth:
◎: be expressed as pattern edge clean, smooth without burr；
×: it is expressed as pattern edge clean, out-of-flatness and have burr.
Two, development residue:
Observe whether the figure position after aforesaid substrate has developed has residue with 250 power microscopes:
◎: be expressed as without residue,
×: level of residue is many.
Three, fixing efficiency:
Method described in development effect is developed, and to put into beginning timing in developer solution after uv-exposure, to developing, complete taking-up terminates timing, and the gained time is developing time, according to following standard, developing time and fixing efficiency is evaluated:
Less than ◎: 30 minutes, fixing efficiency was high；
Zero: 30～90 minutes, fixing efficiency was general；
×: more than 90 minutes, fixing efficiency was poor.
Four, antifoam performance:
Contain 20mL with 100mL graduated cylinder after above-mentioned developer composition is diluted 20 times, sway under appropriate frequency 10 minutes with rectilinear vibrating machine, after standing 10 minutes, measure its foam height, and according to following benchmark evaluation:
◎: foam height is less than 0.5cm
Zero: foam height is between 0.5～2cm
×: foam height is more than 2cm
Five, stability:
Developer composition is respectively placed in the refrigerator-freezer 10 hours of the calorstat of 60 DEG C and-10 DEG C, stands after taking out to room temperature, observe and according to following benchmark evaluation:
◎: be not changed in
×: layering or emulsifying
Embodiment 1, prepare developer solution S1
Organic amine ethanolamine shown in the Formulas I of 0.5%, the B1251 nonionic surfactant of 0.5%, the dimethyl sulfoxide of 7% are joined in the water of 92%, stir at normal temperatures, namely obtain developer solution S1 provided by the invention.Wherein, water used is deionized water, and the total concentration of metal ions in deionized water is not more than 50 and receives g/l.
Embodiment 2-18, prepare developer solution S2-S18
It is prepared according to the identical method of embodiment 1, only nonionic surfactant shown in organic amine shown in Formulas I, Formula II, the kind of organic solvent and percentage by weight are replaced described in table 1, and be principle according to the percentage by weight of alkali compounds used, the percentage by weight of nonionic surfactant, the percentage by weight of organic solvent and the percentage by weight sum 100% of water, determine the parts by weight of deionized water used in each embodiment, respectively obtain each developer solution S2-S7 listed by table 1.
Comparative example 1-6, preparation comparison developer solution D1-D6
It is prepared according to the identical method of embodiment 1, only the kind of organic amine shown in Formulas I and organic solvent and percentage by weight are replaced according to table 2, nonionic surfactant shown in Formula II replaces with 2 surfactants of table, respectively obtains the listed contrast developer solution D1-D5 of table 2.
Table 1, table 2 are ingredient names and the consumption list of developer solution S1-S7 and D1-D6, and wherein, the consumption of described organic amine amount, dosage of surfactant, consumption of organic solvent and water is all weight percentage.
Table 1, developer solution S1-S7 composition and consumption list
Table 2, developer solution D1-D6 composition and consumption list
AEO-9: aliphatic alcohol polyethenoxy base (9) ether is purchased from Beijing hundred million Longxin Trade Co., Ltd.；
SE-10: stearic acid polyoxyethylene (10) ester is purchased from Jiangsu Hai'an Petrochemical Plant；
OP-6: octyl phenol polyoxyethylene (6) ether is purchased from Jiangsu Hai'an Petrochemical Plant；
PEG-600: Polyethylene Glycol-600 (mean molecule quantity 570-630) is purchased from traditional Chinese medicines group chemical reagent Beijing company limited；
AES-7: polyoxyethylene lauryl ether (7) sulfuric ester sodium salt is purchased from Jiangsu Hai'an Petrochemical Plant；
Organic amine and Conventional solvents are all purchased from traditional Chinese medicines group chemical reagent Beijing company limited；
Nonionic surfactant shown in Formula II is all purchased from Xiamen Sainuo Bangge Biotechnology Co., Ltd.；
Comparative Example D 1-D4 with the addition of several frequently seen nonionic surfactant；D5 with the addition of a kind of common anion surfactant；D6 does not add surfactant.
According to preceding method, above-mentioned developer solution S1-S7 and D1-D6 being evaluated, acquired results is listed in table 3.
The evaluation list of table 3, each embodiment and comparative example developer solution S1-S78 and D1-D6
| Development effect | Residue | Fixing efficiency | Defoaming effect | Stability | |
| S1 | ◎ | ◎ | ◎ | ◎ | ◎ |
| S2 | ◎ | ◎ | ◎ | ◎ | ◎ |
| S3 | ◎ | ◎ | ◎ | ◎ | ◎ |
| S4 | ◎ | ◎ | ◎ | ◎ | ◎ |
| S5 | ◎ | ◎ | ◎ | ◎ | ◎ |
| S6 | ◎ | ◎ | ◎ | ◎ | ◎ |
| S7 | ◎ | ◎ | ◎ | ◎ | ◎ |
| D1 | ◎ | × | ○ | ○ | × |
| D2 | ◎ | × | × | ○ | × |
| D3 | × | × | × | × | × |
| D4 | ◎ | × | × | ○ | × |
| D5 | × | × | ○ | × | ◎ |
| D6 | × | × | ○ | ◎ | ◎ |
By the result of table 3 it can be seen that developer solution provided by the invention can obtain extraordinary developability without adding defoamer, and image is without residue, and above-mentioned properties is superior in comparative example corresponding properties.
The foregoing is only the several preferably possible embodiments of the present invention, all be familiar with technique personage, according to the change that scope is made, all ought to be included in this case right.
Claims (15)
1. a developer composition, including following each component:
Nonionic surfactant, organic solvent and water shown in organic amine compound shown in Formulas I, Formula II；
In described Formulas I, R1、R2And R3Be selected from-H ,-OH and-R-OH any one；And R1、R2And R3In at least one be-R-OH；
In described-R-OH, R is selected from-CH2-、-C2H4-and-C3H6-in any one；
In described Formula II, R4And R5It is selected from-CH2-、-C2H4-and-C3H6-in any one；
R6Selected from hydrogen ,-CH3、-C2H5With-C3H7In any one；
M is the integer of 5～18.
2. compositions according to claim 1, it is characterised in that: described developer composition nonionic surfactant, organic solvent and water shown in organic amine compound, Formula II shown in described Formulas I form.
3. compositions according to claim 1, it is characterised in that: compound shown in described Formulas I is selected from least one of ethanolamine, diethanolamine, methyl diethanolamine, diisopropylamine and triethanolamine；
In described Formula II, R4And R5It is selected from-CH2-、-C2H4-and-C3H6-in any one；
R6Selected from hydrogen ,-CH3、-C2H5With-C3H7In any one；
M is the integer of 5-15.
4. compositions according to claim 3, it is characterised in that: at least one in ethanolamine and diethanolamine of the compound shown in described Formulas I；
In described Formula II, m is the integer of 5-10；
Nonionic surfactant shown in described Formula II is compound shown in following B1251, B1291, B1272, B0251, B0273 or B3251；
5. compositions according to claim 1, it is characterised in that: the described organic solvent any one or any two kinds in dimethyl sulfoxide, N-Methyl pyrrolidone, propylene glycol monomethyl ether, propylene-glycol ethyl ether, diethylene glycol monomethyl ether, diethylene glycol dimethyl ether and butyl.
6. compositions according to claim 1, it is characterised in that: described water is deionized water, and the total concentration of metal ions in described water is not more than 500 and receives g/l.
7. compositions according to claim 6, it is characterised in that: the total concentration of metal ions in described water is not more than 50 and receives g/l.
8. according to the arbitrary described compositions of claim 1-7, it is characterised in that: described developer composition is be made up of the component of following each weight/mass percentage composition:
Organic amine compound shown in Formulas I: 0.1-3%；
Nonionic surfactant shown in Formula II: 0.1-10%；
Organic solvent: 1-20%；
Surplus is water.
9. compositions according to claim 8, it is characterised in that: described developer composition is be made up of the component of following each weight/mass percentage composition:
Organic amine compound shown in Formulas I: 0.5-1.5%；
Nonionic surfactant shown in Formula II: 0.5-5%；
Organic solvent: 2-10%；
Surplus is water.
10. the method preparing the arbitrary described developer composition of claim 1-9, comprises the steps: arbitrary for claim 1-7 described each component in 20-30 DEG C of mixing, obtains described developer composition.
11. the application that the arbitrary described developer composition of claim 1-9 is in the developing method of photoresist.
12. application according to claim 11, it is characterised in that: any one in thermoplastic phenolic resin, acrylic resin, the resinous polymer of maleic anhydride, the resinous polymer of maleic anhydride half ester and polycarboxylated styrene of described photoresist.
13. application according to claim 12, it is characterised in that: described photoresist acrylic resin.
14. application according to claim 13, it is characterised in that: described photoresist is any one in following copolymer a-copolymer f:
Described copolymer a is methyl methacrylate and hydroxy benzenes, styrene and methacrylic acid copolymer and the copolymer that obtains, described copolymer b is the copolymer that methyl methacrylate obtains with styrene and acrylic acid copolymer, described copolymer c is the copolymer that methyl methacrylate obtains with styrene and methacrylic acid copolymer, described copolymer d is the copolymer that methyl methacrylate obtains with benzyl methacrylate and methacrylic acid copolymer, described copolymer e is the copolymer that benzyl methacrylate obtains with methacrylic acid copolymer, described copolymer f is the copolymer that methacrylic acid obtains with benzyl methacrylate and 2-hydroxyethyl methyl ester copolymerization；The weight average molecular weight of described copolymer a-copolymer f is 5000～200000.
15. application according to claim 14, it is characterised in that: the weight average molecular weight of described copolymer a-copolymer f is 8000～60000.
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011069928A (en) * | 2009-09-24 | 2011-04-07 | Fujifilm Corp | Method of preparing lithographic printing plate |
| CN102053508A (en) * | 2010-11-09 | 2011-05-11 | 泰兴市东方实业公司 | Developer for positive thermosensitive CTP (Computer to Plate) |
| KR20120021787A (en) * | 2010-08-17 | 2012-03-09 | 동우 화인켐 주식회사 | Developer for negative colored photosensitive resin composition |
| CN103293881A (en) * | 2013-05-24 | 2013-09-11 | 京东方科技集团股份有限公司 | Developing solution component |
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2013
- 2013-12-30 CN CN201310744140.5A patent/CN103728845B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011069928A (en) * | 2009-09-24 | 2011-04-07 | Fujifilm Corp | Method of preparing lithographic printing plate |
| KR20120021787A (en) * | 2010-08-17 | 2012-03-09 | 동우 화인켐 주식회사 | Developer for negative colored photosensitive resin composition |
| CN102053508A (en) * | 2010-11-09 | 2011-05-11 | 泰兴市东方实业公司 | Developer for positive thermosensitive CTP (Computer to Plate) |
| CN103293881A (en) * | 2013-05-24 | 2013-09-11 | 京东方科技集团股份有限公司 | Developing solution component |
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