TWI795078B - Film removing liquid, preparation method thereof, and application method thereof - Google Patents
Film removing liquid, preparation method thereof, and application method thereof Download PDFInfo
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Abstract
Description
本發明涉及一種去膜液、其配置方法及其使用方法,特別是涉及用於電路板的一種去膜液、其配置方法及其使用方法。 The invention relates to a film-removing liquid, its configuration method and its use method, in particular to a film-removing liquid used for circuit boards, its configuration method and its use method.
現有的電路板的線路設計已越趨密集與複雜,並且若要提高以高密度互連技術(High Density Interconnect,HDI)製成的電路板的線路精細度,則通常會選擇減少電路板的導線寬度。然,傳統的無機去膜液在線寬/間距(L/S)為80毫米/80毫米的條件以下時,其對電路板的去膜效果差且速率低。此外,傳統的無機去膜液於去膜完成後所產生的廢液也相當多。 The circuit design of existing circuit boards has become denser and more complex, and to improve the circuit fineness of circuit boards made of high-density interconnect technology (High Density Interconnect, HDI), it is usually chosen to reduce the number of wires on the circuit board. width. However, when the line width/space (L/S) of the traditional inorganic film removal solution is below 80 mm/80 mm, its film removal effect on the circuit board is poor and the rate is low. In addition, the traditional inorganic film removal solution also produces a lot of waste liquid after the film removal is completed.
故,如何通過去膜液的配方改良,來克服上述的缺陷,已成為該項事業所欲解決的重要課題之一。 Therefore, how to overcome the above-mentioned defects by improving the formula of the film-removing solution has become one of the important issues to be solved by this business.
本發明實施例針對現有技術的不足提供一種去膜液,其能有效地改善傳統的無機去膜液所可能產生的缺陷。 The embodiment of the present invention provides a film-removing solution for the deficiencies of the prior art, which can effectively improve the possible defects of the traditional inorganic film-removing solution.
本發明實施例公開一種去膜液,其包括重量百分比濃度介於35%~45%之間的氫氧化鈉、重量百分比濃度為2%的聚乙二醇以及重量百分比濃度介於53%~63%之間的水。 The embodiment of the present invention discloses a film removal solution, which includes sodium hydroxide with a concentration of 35% to 45% by weight, polyethylene glycol with a concentration of 2% by weight, and a concentration of 53% to 63% by weight. % of water between.
本發明實施例公開一種去膜液的配置方法,其包括:秤取步驟:秤取重量百分比濃度介於35%~45%之間的氫氧化鈉、重量百分比濃度為2%的聚乙二醇以及重量百分比濃度介於53%~63%之間的水;以及混合步驟:將所述氫氧化鈉以及所述聚乙二醇依序倒入所述水中並攪拌。 The embodiment of the present invention discloses a method for configuring a film removal solution, which includes: weighing step: weighing sodium hydroxide with a concentration of 35% to 45% by weight, polyethylene glycol with a concentration of 2% by weight and water with a concentration of 53% to 63% by weight; and a mixing step: pouring the sodium hydroxide and the polyethylene glycol into the water in sequence and stirring.
本發明實施例公開一種去膜液的使用方法,其包括:稀釋步驟:將一去膜液加水稀釋至其原重量百分比濃度的5%~25%;其中,所述去膜液包括重量百分比濃度介於35%~45%之間的氫氧化鈉、重量百分比濃度為2%的聚乙二醇以及重量百分比濃度介於53%~63%之間的水;以及去膜步驟:以稀釋後的所述去膜液對一電路板進行去膜。 The embodiment of the present invention discloses a method for using a film-removing liquid, which includes: a dilution step: diluting a film-removing liquid with water to 5% to 25% of its original weight percent concentration; wherein, the film-removing liquid includes a weight percent concentration Sodium hydroxide between 35%~45%, polyethylene glycol with a concentration of 2% by weight and water between 53%~63% by weight; The film-removing solution removes the film of a circuit board.
本發明的其中一有益效果在於,本發明所提供的所述去膜液、其配置方法及其使用方法,其能通過“所述去膜液包括重量百分比濃度介於35%~45%之間的所述氫氧化鈉、重量百分比濃度為2%的所述聚乙二醇以及重量百分比濃度介於53%~63%之間的所述水”的技術方案,以提高電路板之精細線路乾膜的去除效率,並減少去膜完成後所產生的廢液。 One of the beneficial effects of the present invention is that the film removal liquid, its configuration method and its use method provided by the present invention can pass through "the film removal liquid includes a weight percentage concentration between 35% and 45% The sodium hydroxide, the polyethylene glycol with a concentration of 2% by weight and the water with a concentration of 53% to 63% by weight” are used to improve the fine line dryness of the circuit board. Improve the removal efficiency of the membrane and reduce the waste liquid generated after the membrane removal is completed.
為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與圖式,然而所提供的圖式僅用於提供參考與說明,並非用來對本發明加以限制。 In order to further understand the features and technical content of the present invention, please refer to the following detailed description and drawings related to the present invention. However, the provided drawings are only for reference and description, and are not intended to limit the present invention.
S100:去膜液的配置方法 S100: Configuration method of film removal solution
S101:秤取步驟 S101: weighing step
S103:混合步驟 S103: mixing step
S200:去膜液的使用方法 S200: How to use the film removal solution
S201:稀釋步驟 S201: Dilution step
S203:去膜步驟 S203: film removal step
圖1為本發明第二實施例的去膜液的配置方法的步驟流程圖。 FIG. 1 is a flow chart of the steps of the method for configuring the film removal solution according to the second embodiment of the present invention.
圖2為本發明第三實施例的去膜液的使用方法的步驟流程圖。 FIG. 2 is a flow chart of the steps of the method for using the film removal solution according to the third embodiment of the present invention.
以下是通過特定的具體實施例來說明本發明所公開有關“去膜 液、其配置方法及其使用方法”的實施方式,本領域技術人員可由本說明書所公開的內容瞭解本發明的優點與效果。本發明可通過其他不同的具體實施例加以施行或應用,本說明書中的各項細節也可基於不同觀點與應用,在不背離本發明的構思下進行各種修改與變更。另外,本發明的附圖僅為簡單示意說明,並非依實際尺寸的描繪,事先聲明。此外,以下如有指出請參閱特定圖式或是如特定圖式所示,其僅是用以強調於後續說明中,所述及的相關內容大部份出現於該特定圖式中,但不限制該後續說明中僅可參考所述特定圖式。以下的實施方式將進一步詳細說明本發明的相關技術內容,但所公開的內容並非用以限制本發明的保護範圍。 The following is to illustrate the relevant "removing film" disclosed by the present invention through specific specific examples. Liquid, its configuration method and its use method”, those skilled in the art can understand the advantages and effects of the present invention from the content disclosed in this specification. The present invention can be implemented or applied through other different specific embodiments. This specification Various details in the present invention can also be based on different viewpoints and applications, and various modifications and changes can be made without departing from the concept of the present invention. In addition, the accompanying drawings of the present invention are only simple schematic illustrations, not drawn according to actual dimensions, and are stated in advance. In addition, if it is pointed out below that please refer to the specific drawing or as shown in the specific drawing, it is only used to emphasize the follow-up description. Most of the relevant content mentioned appears in the specific drawing, but not Only the specific drawings can be referred to in the subsequent description. The following embodiments will further describe the relevant technical content of the present invention in detail, but the disclosed content is not intended to limit the protection scope of the present invention.
應當可以理解的是,雖然本文中可能會使用到“第一”、“第二”、“第三”等術語來描述各種元件或者信號,但這些元件或者信號不應受這些術語的限制。這些術語主要是用以區分一元件與另一元件,或者一信號與另一信號。另外,本文中所使用的術語“或”,應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。 It should be understood that although terms such as "first", "second", and "third" may be used herein to describe various elements or signals, these elements or signals should not be limited by these terms. These terms are mainly used to distinguish one element from another element, or one signal from another signal. In addition, the term "or" used herein may include any one or a combination of more of the associated listed items depending on the actual situation.
本發明第一實施例提供一種去膜液,其包括重量百分比濃度介於35%~45%之間的氫氧化鈉、重量百分比濃度為2%的聚乙二醇以及重量百分比濃度介於53%~63%之間的水。其中,所述氫氧化鈉的重量百分比濃度較佳介於38%~42%之間,並且所述水選自於自來水、蒸餾水、去離子水及軟化水所構成之群組,而所述水的重量百分比濃度較佳介於56%~60%之間。 The first embodiment of the present invention provides a film removal solution, which includes sodium hydroxide with a concentration of 35% to 45% by weight, polyethylene glycol with a concentration of 2% by weight, and a concentration of 53% by weight. ~63% water. Wherein, the weight percentage concentration of described sodium hydroxide is preferably between 38%~42%, and described water is selected from the group that tap water, distilled water, deionized water and demineralized water form, and described water The weight percent concentration is preferably between 56% and 60%.
承上所述,藉由上述氫氧化鈉、上述聚乙二醇以及上述水的比例配置,所述去膜液能用來去除電路板上的精細線路乾膜,並且所述去膜液能有效去除電路板上的電鍍夾膜。此外,經過所述去膜液進行去膜作業而與電路板分離的乾膜,其膜碎細小且呈均勻顆粒狀,而其膜渣大小適中且容易 過濾,亦不容易堵塞噴嘴。 As mentioned above, by the proportion configuration of the above-mentioned sodium hydroxide, the above-mentioned polyethylene glycol and the above-mentioned water, the film-removing liquid can be used to remove the fine circuit dry film on the circuit board, and the film-removing liquid can effectively Remove the plating film from the circuit board. In addition, the dry film separated from the circuit board through the film removal operation by the film removal liquid has a fine and uniform particle shape, and the film residue is moderate in size and easy to remove. Filtration is not easy to clog the nozzle.
請參閱圖1所示,其為本發明的第二實施例,需先說明的是,本實施例所對應到的附圖及其所提及的相關數量與外形,僅用來具體地說明本發明的實施方式,以便於了解本發明的內容,而非用來侷限本發明的保護範圍。 Please refer to Fig. 1, which is the second embodiment of the present invention. It should be noted that the drawings corresponding to this embodiment and the relevant numbers and shapes mentioned are only used to specifically illustrate this embodiment. The embodiments of the invention are used to facilitate the understanding of the content of the present invention, but not to limit the protection scope of the present invention.
如圖1所示,本發明第二實施例提供一種去膜液的配置方法S100,其包括一秤取步驟S101以及一混合步驟S103,並且於所述秤取步驟S101中,重量百分比濃度介於35%~45%之間的氫氧化鈉、重量百分比濃度為2%的聚乙二醇以及重量百分比濃度介於53%~63%之間的水被秤取,而於所述混合步驟S103中,上述氫氧化鈉以及上述聚乙二醇被依序倒入所述水中並攪拌。 As shown in FIG. 1 , the second embodiment of the present invention provides a configuration method S100 of a film-removing solution, which includes a weighing step S101 and a mixing step S103, and in the weighing step S101, the weight percentage concentration is between Sodium hydroxide between 35%~45%, polyethylene glycol with a concentration of 2% by weight and water with a concentration of 53%~63% by weight are weighed, and in the mixing step S103 , the above-mentioned sodium hydroxide and the above-mentioned polyethylene glycol were sequentially poured into the water and stirred.
需要說明的是,於所述秤取步驟S101中,所述氫氧化鈉的重量百分比濃度較佳介於38%~42%之間,並且所述水選自於自來水、蒸餾水、去離子水及軟化水所構成之群組,而所述水的重量百分比濃度較佳介於56%~60%之間。 It should be noted that, in the weighing step S101, the weight percent concentration of the sodium hydroxide is preferably between 38% and 42%, and the water is selected from tap water, distilled water, deionized water and demineralized water. A group formed by water, and the weight percent concentration of the water is preferably between 56% and 60%.
請參閱圖2所示,其為本發明的第三實施例,需先說明的是,本實施例所對應到的附圖及其所提及的相關數量與外形,僅用來具體地說明本發明的實施方式,以便於了解本發明的內容,而非用來侷限本發明的保護範圍。 Please refer to Figure 2, which is the third embodiment of the present invention. It should be noted that the drawings corresponding to this embodiment and the relevant numbers and shapes mentioned are only used to specifically illustrate this embodiment. The embodiments of the invention are used to facilitate the understanding of the content of the present invention, but not to limit the protection scope of the present invention.
如圖2所示,本發明第三實施例提供一種去膜液的使用方法S200,其包括一稀釋步驟S201以及一去膜步驟S203,並且於所述稀釋步驟S201中,一去膜液被加水稀釋至其原重量百分比濃度的5%~25%。其中,所述去膜液包括重量百分比濃度介於35%~45%之間的氫氧化鈉、重量百分比濃度為 2%的聚乙二醇以及重量百分比濃度介於53%~63%之間的水。 As shown in Figure 2, the third embodiment of the present invention provides a method for using a film removal solution S200, which includes a dilution step S201 and a film removal step S203, and in the dilution step S201, a film removal solution is added with water Dilute to 5%~25% of its original weight percentage concentration. Wherein, the film-removing solution includes sodium hydroxide with a weight percent concentration between 35% and 45%, and a weight percent concentration of 2% polyethylene glycol and water with a concentration of 53% to 63% by weight.
需要說明的是,於本實施例中,上述氫氧化鈉的重量百分比濃度較佳介於38%~42%之間,並且上述水選自於自來水、蒸餾水、去離子水及軟化水所構成之群組,而上述水的重量百分比濃度介於56%~60%之間。 It should be noted that, in this embodiment, the weight percent concentration of the above-mentioned sodium hydroxide is preferably between 38% and 42%, and the above-mentioned water is selected from the group consisting of tap water, distilled water, deionized water and demineralized water Group, and the weight percentage concentration of above-mentioned water is between 56%~60%.
需要說明的是,於所述去膜步驟S203中,稀釋後的所述去膜液被用來對一電路板(圖未繪)進行去膜,並且當稀釋後的所述去膜液進行去膜時,其溫度保持在攝氏溫度50度~60度之間。 It should be noted that, in the film removal step S203, the diluted film removal solution is used to remove the film from a circuit board (not shown in the figure), and when the diluted film removal solution is removed When filming, its temperature is kept between 50°C and 60°C.
需要說明的是,如下表1及表2所示,表1為本發明的去膜液配合黑油電路板進行燒杯測試的實驗結果。其中,稀釋後的所述去膜液為實驗組1,而液鹼(氫氧化鈉)為對照組1;表2為本發明的去膜液配合綠油電路板進行燒杯測試的實驗結果。其中,稀釋後的所述去膜液為實驗組2,而液鹼為對照組2。 It should be noted that, as shown in Table 1 and Table 2 below, Table 1 shows the experimental results of the beaker test of the film remover of the present invention combined with a black oil circuit board. Wherein, the film-removing liquid after dilution is the experimental group 1, and the liquid caustic soda (sodium hydroxide) is the control group 1; Table 2 shows the experimental results of the beaker test of the film-removing liquid of the present invention with the green oil circuit board. Wherein, the diluted film-removing liquid is the experimental group 2, and the caustic soda is the control group 2.
如上表1及表2所示,於表1的燒杯測試中,相較於所述黑油電路板浸泡於所述液鹼的時間,所述黑油電路板浸泡於所述去膜液的時間縮短了約11%;於表2的燒杯測試中,相較於所述綠油電路板浸泡於所述液鹼的時間,所述綠油電路板浸泡於所述去膜液的時間縮短了約20%。顯見本發明的所述去 膜液能有效提升所述電路板的去膜效率。 As shown in Table 1 and Table 2 above, in the beaker test of Table 1, compared with the time for the black oil circuit board to be soaked in the liquid alkali, the time for the black oil circuit board to be soaked in the film-removing solution Shorten about 11%; In the beaker test of table 2, compared with the time that described green oil circuit board is soaked in described liquid caustic soda, the time that described green oil circuit board is soaked in described film-removing liquid has shortened about 20%. It is obvious that the present invention goes The film liquid can effectively improve the film removal efficiency of the circuit board.
本發明的其中一有益效果在於,本發明所提供的所述去膜液、其配置方法S100及其使用方法S200,其能通過“所述去膜液包括重量百分比濃度介於35%~45%之間的所述氫氧化鈉、重量百分比濃度為2%的所述聚乙二醇以及重量百分比濃度介於53%~63%之間的所述水”的技術方案,以提高電路板之精細線路乾膜的去除效率,並減少去膜完成後所產生的廢液。 One of the beneficial effects of the present invention is that the film removal liquid, its configuration method S100 and its use method S200 provided by the present invention can pass "the film removal liquid includes a concentration of 35% to 45% by weight." The sodium hydroxide between, the polyethylene glycol with a concentration of 2% by weight and the water with a concentration of 53% to 63% by weight” are technical solutions to improve the fineness of the circuit board. Improve the removal efficiency of the line dry film and reduce the waste liquid generated after the film removal is completed.
以上所公開的內容僅為本發明的優選可行實施例,並非因此侷限本發明的申請專利範圍,所以凡是運用本發明說明書及圖式內容所做的等效技術變化,均包含於本發明的申請專利範圍內。 The content disclosed above is only a preferred feasible embodiment of the present invention, and does not therefore limit the scope of the patent application of the present invention. Therefore, all equivalent technical changes made by using the description and drawings of the present invention are included in the application of the present invention. within the scope of the patent.
S100:去膜液的配置方法 S100: Configuration method of film removal solution
S101:秤取步驟 S101: weighing steps
S103:混合步驟 S103: mixing step
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CN103906380A (en) * | 2014-04-03 | 2014-07-02 | 复旦大学 | Method for adding and manufacturing multilayer printed circuit board on PI substrate |
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CN103906380A (en) * | 2014-04-03 | 2014-07-02 | 复旦大学 | Method for adding and manufacturing multilayer printed circuit board on PI substrate |
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