CN107779843A - 一种化学气相沉积炉 - Google Patents
一种化学气相沉积炉 Download PDFInfo
- Publication number
- CN107779843A CN107779843A CN201711309537.6A CN201711309537A CN107779843A CN 107779843 A CN107779843 A CN 107779843A CN 201711309537 A CN201711309537 A CN 201711309537A CN 107779843 A CN107779843 A CN 107779843A
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- Prior art keywords
- steam separator
- heater
- chemical vapor
- vapor deposition
- furnace chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45561—Gas plumbing upstream of the reaction chamber
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201711309537.6A CN107779843B (zh) | 2017-12-11 | 2017-12-11 | 一种化学气相沉积炉 |
Applications Claiming Priority (1)
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CN201711309537.6A CN107779843B (zh) | 2017-12-11 | 2017-12-11 | 一种化学气相沉积炉 |
Publications (2)
Publication Number | Publication Date |
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CN107779843A true CN107779843A (zh) | 2018-03-09 |
CN107779843B CN107779843B (zh) | 2019-10-08 |
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CN201711309537.6A Active CN107779843B (zh) | 2017-12-11 | 2017-12-11 | 一种化学气相沉积炉 |
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CN (1) | CN107779843B (zh) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109487235A (zh) * | 2018-11-15 | 2019-03-19 | 苏州宏久航空防热材料科技有限公司 | 一种垂直式双炉体化学气相沉积设备 |
CN110307731A (zh) * | 2019-02-22 | 2019-10-08 | 湖南省鑫源新材料股份有限公司 | 一种用于高温设备的旋转料台 |
CN111455352A (zh) * | 2020-05-15 | 2020-07-28 | 深圳市纳设智能装备有限公司 | 一种可加热的蜂窝式多通道进气结构 |
CN112695301A (zh) * | 2020-12-22 | 2021-04-23 | 湖南顶立科技有限公司 | 一种气流旋转均匀的气相沉积装置 |
CN114293173A (zh) * | 2021-12-17 | 2022-04-08 | 厦门钨业股份有限公司 | 一种碳掺杂化学气相沉积钨涂层的装置 |
CN114737168A (zh) * | 2022-03-18 | 2022-07-12 | 山东伟基炭科技有限公司 | 一种高纯热解炭涂层的化学气相沉积设备 |
CN114990521A (zh) * | 2022-06-22 | 2022-09-02 | 湖南九华碳素高科有限公司 | 一种卧式装炉沉积炉 |
CN115094402A (zh) * | 2022-06-24 | 2022-09-23 | 清华大学 | 一种立式双温区-双通道化学气相沉积设备 |
CN116356288A (zh) * | 2023-05-19 | 2023-06-30 | 无锡松煜科技有限公司 | 一种延长lpcvd进气管使用寿命的方法及镀膜炉设备 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20050062994A (ko) * | 2003-12-19 | 2005-06-28 | 주식회사 실트론 | 웨이퍼의 기상 화학 증착장치 |
CN1650042A (zh) * | 2002-05-06 | 2005-08-03 | 马塞尔-布加蒂股份有限公司 | 气体预热器 |
CN102947484A (zh) * | 2010-04-16 | 2013-02-27 | 艾克斯特朗欧洲公司 | 用于在多个工艺室内同时沉积多个半导体层的设备和方法 |
CN104357806A (zh) * | 2014-10-20 | 2015-02-18 | 西安航空制动科技有限公司 | 一种化学气相沉积炉预热装置 |
CN105624646A (zh) * | 2014-11-26 | 2016-06-01 | 朗姆研究公司 | 借助可再入流路径的阀歧管盲管消除 |
-
2017
- 2017-12-11 CN CN201711309537.6A patent/CN107779843B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1650042A (zh) * | 2002-05-06 | 2005-08-03 | 马塞尔-布加蒂股份有限公司 | 气体预热器 |
KR20050062994A (ko) * | 2003-12-19 | 2005-06-28 | 주식회사 실트론 | 웨이퍼의 기상 화학 증착장치 |
CN102947484A (zh) * | 2010-04-16 | 2013-02-27 | 艾克斯特朗欧洲公司 | 用于在多个工艺室内同时沉积多个半导体层的设备和方法 |
CN104357806A (zh) * | 2014-10-20 | 2015-02-18 | 西安航空制动科技有限公司 | 一种化学气相沉积炉预热装置 |
CN105624646A (zh) * | 2014-11-26 | 2016-06-01 | 朗姆研究公司 | 借助可再入流路径的阀歧管盲管消除 |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109487235A (zh) * | 2018-11-15 | 2019-03-19 | 苏州宏久航空防热材料科技有限公司 | 一种垂直式双炉体化学气相沉积设备 |
CN110307731A (zh) * | 2019-02-22 | 2019-10-08 | 湖南省鑫源新材料股份有限公司 | 一种用于高温设备的旋转料台 |
CN110307731B (zh) * | 2019-02-22 | 2021-02-09 | 湖南省鑫源新材料股份有限公司 | 一种用于高温设备的旋转料台 |
CN111455352A (zh) * | 2020-05-15 | 2020-07-28 | 深圳市纳设智能装备有限公司 | 一种可加热的蜂窝式多通道进气结构 |
WO2021227132A1 (zh) * | 2020-05-15 | 2021-11-18 | 深圳市纳设智能装备有限公司 | 一种可加热的蜂窝式多通道进气结构 |
CN112695301A (zh) * | 2020-12-22 | 2021-04-23 | 湖南顶立科技有限公司 | 一种气流旋转均匀的气相沉积装置 |
CN114293173A (zh) * | 2021-12-17 | 2022-04-08 | 厦门钨业股份有限公司 | 一种碳掺杂化学气相沉积钨涂层的装置 |
CN114293173B (zh) * | 2021-12-17 | 2024-02-09 | 厦门钨业股份有限公司 | 一种碳掺杂化学气相沉积钨涂层的装置 |
CN114737168A (zh) * | 2022-03-18 | 2022-07-12 | 山东伟基炭科技有限公司 | 一种高纯热解炭涂层的化学气相沉积设备 |
CN114990521A (zh) * | 2022-06-22 | 2022-09-02 | 湖南九华碳素高科有限公司 | 一种卧式装炉沉积炉 |
CN115094402A (zh) * | 2022-06-24 | 2022-09-23 | 清华大学 | 一种立式双温区-双通道化学气相沉积设备 |
CN115094402B (zh) * | 2022-06-24 | 2023-04-11 | 清华大学 | 一种立式双温区-双通道化学气相沉积设备 |
CN116356288A (zh) * | 2023-05-19 | 2023-06-30 | 无锡松煜科技有限公司 | 一种延长lpcvd进气管使用寿命的方法及镀膜炉设备 |
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CN107779843B (zh) | 2019-10-08 |
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Address after: 410118 Hunan Dingli Technology Co., Ltd., east of Lantian North Road, north of liangtang East Road and west of Shuangtang Road, Xingsha industrial base, Changsha Economic and Technological Development Zone, Changsha City, Hunan Province Patentee after: ADVANCED CORPORATION FOR MATERIALS & EQUIPMENTS Co.,Ltd. Address before: 410118 Dingli science and Technology Park, Muyun Economic Development Zone, Tianxin District, Changsha City, Hunan Province Patentee before: ADVANCED CORPORATION FOR MATERIALS & EQUIPMENTS Co.,Ltd. |
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Address after: 410199 No. 1271, liangtang East Road, Xingsha industrial base (Changlong Street), Changsha area, China (Hunan) pilot Free Trade Zone, Changsha, Hunan Province Patentee after: ADVANCED CORPORATION FOR MATERIALS & EQUIPMENTS Co.,Ltd. Address before: 410118 Hunan Dingli Technology Co., Ltd., east of Lantian North Road, north of liangtang East Road and west of Shuangtang Road, Xingsha industrial base, Changsha Economic and Technological Development Zone, Changsha City, Hunan Province Patentee before: ADVANCED CORPORATION FOR MATERIALS & EQUIPMENTS Co.,Ltd. |
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CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: 410199 No. 1271, liangtang East Road, Xingsha industrial base (Changlong Street), Changsha area, China (Hunan) pilot Free Trade Zone, Changsha, Hunan Province Patentee after: Hunan Dingli Technology Co.,Ltd. Address before: 410199 No. 1271, liangtang East Road, Xingsha industrial base (Changlong Street), Changsha area, China (Hunan) pilot Free Trade Zone, Changsha, Hunan Province Patentee before: ADVANCED CORPORATION FOR MATERIALS & EQUIPMENTS Co.,Ltd. |