CN107567652A - 基板污染物分析装置及基板污染物分析方法 - Google Patents
基板污染物分析装置及基板污染物分析方法 Download PDFInfo
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- CN107567652A CN107567652A CN201680015283.4A CN201680015283A CN107567652A CN 107567652 A CN107567652 A CN 107567652A CN 201680015283 A CN201680015283 A CN 201680015283A CN 107567652 A CN107567652 A CN 107567652A
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/14—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring distance or clearance between spaced objects or spaced apertures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01V—GEOPHYSICS; GRAVITATIONAL MEASUREMENTS; DETECTING MASSES OR OBJECTS; TAGS
- G01V8/00—Prospecting or detecting by optical means
- G01V8/10—Detecting, e.g. by using light barriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geophysics (AREA)
- Sampling And Sample Adjustment (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210114028.2A CN114464546A (zh) | 2015-03-12 | 2016-03-10 | 基板污染物分析装置及基板污染物分析方法 |
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2015-0034647 | 2015-03-12 | ||
| KR10-2015-0034644 | 2015-03-12 | ||
| KR1020150034644A KR101548632B1 (ko) | 2015-03-12 | 2015-03-12 | 기판 오염물 분석 장치 및 기판 오염물 분석 방법 |
| KR1020150034647A KR101581303B1 (ko) | 2015-03-12 | 2015-03-12 | 기판 오염물 분석 장치 및 기판 오염물 분석 방법 |
| KR10-2015-0085305 | 2015-06-16 | ||
| KR1020150085305A KR102357431B1 (ko) | 2015-03-12 | 2015-06-16 | 기판 오염물 분석 장치 및 기판 오염물 분석 방법 |
| PCT/KR2016/002376 WO2016144107A1 (fr) | 2015-03-12 | 2016-03-10 | Dispositif d'analyse de contaminant de substrat et procédé d'analyse de contaminant de substrat |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210114028.2A Division CN114464546A (zh) | 2015-03-12 | 2016-03-10 | 基板污染物分析装置及基板污染物分析方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107567652A true CN107567652A (zh) | 2018-01-09 |
Family
ID=56879220
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210114028.2A Pending CN114464546A (zh) | 2015-03-12 | 2016-03-10 | 基板污染物分析装置及基板污染物分析方法 |
| CN201680015283.4A Pending CN107567652A (zh) | 2015-03-12 | 2016-03-10 | 基板污染物分析装置及基板污染物分析方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210114028.2A Pending CN114464546A (zh) | 2015-03-12 | 2016-03-10 | 基板污染物分析装置及基板污染物分析方法 |
Country Status (2)
| Country | Link |
|---|---|
| CN (2) | CN114464546A (fr) |
| WO (1) | WO2016144107A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023015766A1 (fr) * | 2021-08-10 | 2023-02-16 | 江苏鲁汶仪器有限公司 | Appareil de balayage de bord et dispositif de mesure de contamination métallique |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107845585B (zh) * | 2016-09-20 | 2021-07-16 | 非视觉污染分析科学技术有限公司 | 在线污染监测系统及方法 |
| US10989677B2 (en) * | 2017-03-07 | 2021-04-27 | Rigaku Corporation | Sample collecting device, sample collecting method, and fluorescent x-ray analysis apparatus using the same |
| JP7228600B2 (ja) * | 2018-05-04 | 2023-02-24 | アプライド マテリアルズ インコーポレイテッド | 処理チャンバのためのナノ粒子測定 |
| CN110987584B (zh) * | 2019-11-25 | 2022-07-01 | 湖南省计量检测研究院 | 溶液的稀释方法和系统 |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0370462A2 (fr) * | 1988-11-21 | 1990-05-30 | Kabushiki Kaisha Toshiba | Dispositif de traitement de semi-conducteurs |
| CN1211730A (zh) * | 1997-09-03 | 1999-03-24 | 日本电气株式会社 | 半导体衬底表面分析的预处理方法和装置 |
| US5960129A (en) * | 1997-12-22 | 1999-09-28 | Bayer Corporation | Method and apparatus for detecting liquid and gas segment flow through a tube |
| CN1879014A (zh) * | 2004-01-29 | 2006-12-13 | 有限会社Nas技研 | 基板检查装置和基板检查方法及回收工具 |
| CN102157410A (zh) * | 2009-12-18 | 2011-08-17 | 埃耶士株式会社 | 衬底分析装置及衬底分析方法 |
| KR101210295B1 (ko) * | 2012-08-31 | 2013-01-14 | 글로벌게이트 주식회사 | 기판 오염물 분석 장치 및 이를 이용한 오염물 분석 방법 |
| CN103443911A (zh) * | 2011-03-21 | 2013-12-11 | Lg矽得荣株式会社 | 测量晶片上杂质的装置和测量晶片上杂质的方法 |
| WO2014193155A1 (fr) * | 2013-05-28 | 2014-12-04 | 엔비스아나(주) | Dispositif de prélèvement d'un échantillon, procédé de prélèvement d'un échantillon et système d'analyse du prélèvement d'un échantillon |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20060071490A (ko) * | 2004-12-22 | 2006-06-27 | 엘지.필립스 엘시디 주식회사 | 카세트 세정장치 |
| JP5144977B2 (ja) * | 2007-07-03 | 2013-02-13 | 東京応化工業株式会社 | 洗浄装置、洗浄方法、予備吐出装置、塗布装置及び予備吐出方法 |
| KR100860269B1 (ko) * | 2008-02-29 | 2008-09-25 | 주식회사 위드텍 | 단일 웨이퍼 공정에서의 웨이퍼 세정액 온라인 모니터링방법, 웨이퍼 세정액 온라인 모니터링 장치 및 상기 장치에사용되는 시약 용기 |
| KR101368485B1 (ko) * | 2012-09-28 | 2014-03-03 | 주식회사 위드텍 | 초순수용액 온라인 모니터링 시스템 |
-
2016
- 2016-03-10 WO PCT/KR2016/002376 patent/WO2016144107A1/fr active Application Filing
- 2016-03-10 CN CN202210114028.2A patent/CN114464546A/zh active Pending
- 2016-03-10 CN CN201680015283.4A patent/CN107567652A/zh active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0370462A2 (fr) * | 1988-11-21 | 1990-05-30 | Kabushiki Kaisha Toshiba | Dispositif de traitement de semi-conducteurs |
| CN1211730A (zh) * | 1997-09-03 | 1999-03-24 | 日本电气株式会社 | 半导体衬底表面分析的预处理方法和装置 |
| US5960129A (en) * | 1997-12-22 | 1999-09-28 | Bayer Corporation | Method and apparatus for detecting liquid and gas segment flow through a tube |
| CN1879014A (zh) * | 2004-01-29 | 2006-12-13 | 有限会社Nas技研 | 基板检查装置和基板检查方法及回收工具 |
| CN102157410A (zh) * | 2009-12-18 | 2011-08-17 | 埃耶士株式会社 | 衬底分析装置及衬底分析方法 |
| CN103443911A (zh) * | 2011-03-21 | 2013-12-11 | Lg矽得荣株式会社 | 测量晶片上杂质的装置和测量晶片上杂质的方法 |
| KR101210295B1 (ko) * | 2012-08-31 | 2013-01-14 | 글로벌게이트 주식회사 | 기판 오염물 분석 장치 및 이를 이용한 오염물 분석 방법 |
| WO2014193155A1 (fr) * | 2013-05-28 | 2014-12-04 | 엔비스아나(주) | Dispositif de prélèvement d'un échantillon, procédé de prélèvement d'un échantillon et système d'analyse du prélèvement d'un échantillon |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023015766A1 (fr) * | 2021-08-10 | 2023-02-16 | 江苏鲁汶仪器有限公司 | Appareil de balayage de bord et dispositif de mesure de contamination métallique |
Also Published As
| Publication number | Publication date |
|---|---|
| CN114464546A (zh) | 2022-05-10 |
| WO2016144107A1 (fr) | 2016-09-15 |
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Effective date of registration: 20180530 Address after: South Korea Gyeonggi Do Yongin Applicant after: Non visual pollution analysis science and Technology Co., Ltd. Applicant after: Tian Biquan Address before: South Korea Gyeonggi Do Yongin Applicant before: Non visual pollution analysis science and Technology Co., Ltd. Applicant before: Tian Biquan Applicant before: Qiu Dahuan |
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Effective date of registration: 20200401 Address after: South Korea Gyeonggi Do Yongin Applicant after: NVISANA Co.,Ltd. Address before: South Korea Gyeonggi Do Yongin Applicant before: NVISANA Co.,Ltd. Applicant before: Tian Biquan |
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