CN107557733A - A kind of silver-plated method of electrical contact - Google Patents
A kind of silver-plated method of electrical contact Download PDFInfo
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- CN107557733A CN107557733A CN201710764200.8A CN201710764200A CN107557733A CN 107557733 A CN107557733 A CN 107557733A CN 201710764200 A CN201710764200 A CN 201710764200A CN 107557733 A CN107557733 A CN 107557733A
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- 238000000034 method Methods 0.000 title claims abstract description 30
- 238000007747 plating Methods 0.000 claims abstract description 48
- 238000004140 cleaning Methods 0.000 claims abstract description 38
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000000463 material Substances 0.000 claims abstract description 31
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910052709 silver Inorganic materials 0.000 claims abstract description 23
- 239000004332 silver Substances 0.000 claims abstract description 23
- 238000007733 ion plating Methods 0.000 claims abstract description 18
- 239000007789 gas Substances 0.000 claims abstract description 17
- 229910052786 argon Inorganic materials 0.000 claims abstract description 16
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000010891 electric arc Methods 0.000 claims abstract description 11
- 238000005238 degreasing Methods 0.000 claims abstract description 8
- 238000005498 polishing Methods 0.000 claims description 12
- 239000013527 degreasing agent Substances 0.000 claims description 4
- 230000007935 neutral effect Effects 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 239000004411 aluminium Substances 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 2
- 210000001367 artery Anatomy 0.000 claims description 2
- 210000003462 vein Anatomy 0.000 claims description 2
- 238000005253 cladding Methods 0.000 abstract description 5
- 230000007613 environmental effect Effects 0.000 abstract description 2
- 150000002500 ions Chemical class 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000010849 ion bombardment Methods 0.000 description 5
- 230000003746 surface roughness Effects 0.000 description 5
- -1 wherein Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 231100000004 severe toxicity Toxicity 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Abstract
The invention discloses a kind of method that electrical contact is silver-plated, comprise the following steps:(1) electrical contact is subjected to surface degreasing, processing of rust removing, and be cleaned and dried;(2) electrical contact is put into plating room, then plating room vacuum is evacuated to 10‑5Pa~10‑4Pa, argon gas is then passed to, keep vacuum < 2Pa;(3) unbalanced pulse Ag target power supplies and negative bias pulsed power carry out icon bombardment cleaning to electrical contact;(4) the gas-discharge current density for adjusting negative electrode is in micro-arc discharge, with current density>0.1A/cm2And<1A/cm2Differential of the arc ion plating method carry out it is silver-plated, the silver-plated time be 1 2h, obtain plating silver electric contact;(5) cool, cool down, be cooled to stove after room temperature and take out the plating silver electric contact.Silver-plated process is carried out to electrical contact using differential of the arc ion plating method, has the advantages that environmental protection, binding force of cladding material are more preferable, more efficient.
Description
Technical field
The invention belongs to electrical contact manufacturing technology field, and in particular to a kind of silver-plated method of electrical contact.
Background technology
Primary cut-out and disconnecting switch are most important components in power system, and electrical contact is breaker, disconnecting switch
Deng the indispensable electrical contact device of high-voltage switch gear, it has high reliability particularly important.In order to reduce contact resistance, will lead
The contact site of electrical contact plates one layer of silver by the way of plating, to prevent contact from aoxidizing, improves electrical conductivity.Due to switchgear
Contact operationally there is " self-cleaning " function, i.e., need to carry out self-cleaning surface by rubbing when contact closes, be
Prevent silver coating from being peeled off in friction process, cause contact to fail, ensure that binding force of cladding material is particularly important.
Silver coating is a kind of precious metal plating, and it lubricates as functional coating, reduces friction, anti-bonding, strengthens and lead
Effect is electrically waited, is widely used in every field, silvering is easy to polish, and has very strong reflecting power to be led with good
Heat, conductive, welding performance.Silvering is applied to decoration earliest.In electronics industry, communication apparatus and instrument industry,
It is widely used silver-plated to reduce the contact resistance on metal parts surface, improve the Weldability of metal.In addition, searchlight and other
Metal reflective mirror in reflector also needs silver-plated.Easily spread due to silver atoms and slid along material surface, in moist atmosphere
It is also easy to produce " silver whiskers " and causes short circuit, therefore silvering should not use in the printed circuit boards, the silver plating liquid used is mainly cyanide
Plating solution.
The most common silver plating process of electrical contact is electrosilvering at present, by the way of cyanide bath rack plating, following ask be present
Topic:(1) rack plating is suitable to Single unit job lot production, low production efficiency;(2) limited by technique and treatment before plating, binding force of cladding material is not
Reliably, coating is caused to come off in friction process;(3) process of electrosilvering is carried out in the electroplate liquid of cyanide, cyaniding
Thing has severe toxicity, and easily the person is damaged and environment is polluted.
The content of the invention
For above technical problem, the present invention proposes a kind of electricity more environmentally friendly, binding force of cladding material is more preferable, more efficient
The silver-plated method of contact.
The technical scheme is that:A kind of silver-plated method of electrical contact, comprises the following steps:
(1) electrical contact is subjected to surface degreasing, processing of rust removing, and be cleaned and dried;
(2) electrical contact is put into plating room, then plating room vacuum is evacuated to 10-5Pa~10-4Pa, then pass to argon
Gas, keep vacuum < 2Pa;
(3) unbalanced pulse Ag target power supplies and negative bias pulsed power carry out icon bombardment cleaning to electrical contact;
(4) the gas-discharge current density for adjusting negative electrode is in micro-arc discharge, with current density>0.1A/cm2 and<1A/
Cm2 differential of the arc ion plating method progress is silver-plated, and the silver-plated time is 1-2h, obtains plating silver electric contact;
(5) cool, cool down, be cooled to stove after room temperature and take out the plating silver electric contact.
Further, the material of the electrical contact can be that aluminium, fine copper material, CuCr1 materials, CuCr1Zr materials or CuW are closed
Any one in golden material.
Further, the electrical contact is shaped as revolving body or sheet material.
Further, the surface of the electrical contact is carried out sanding and polishing processing by step (1), and electrical contact is put into neutrality and removed
In oily rust remover, electrical contact sample 10-20min is cleaned with 20KHZ~50KHZ frequencies using supersonic wave cleaning machine, then will cleaning
Electrical contact afterwards, which is put into vacuum drier, dries 1-5min.
Further, the argon gas flow velocity described in step (2) is 30-250CCM.
Further, the icon bombardment cleaning parameter of step (3) is:Pulse Ag target voltages are 400V~1000V, and pulse is wide
Spend for 0.5 μ s~5 μ s, pulse frequency 12KHz~20KHz;Pulsed negative bias are -150V~-500V, and pulse is 0.5 μ s
~2 μ s, pulse frequency 25KHz~100KHz;Ion Cleaning time 20min~40min.
Further, the technological parameter of differential of the arc ion plating method is in step (4):Holding vacuum is 0.8~1.3Pa, arteries and veins
It is 350V~650V to rush Ag target voltages, and pulse width is the μ s of 2.5 μ s~20, gradient pulse frequency total size be 10KHz~
100KHz;Pulsed negative bias are -50V~-150V, and pulse is 0.2 μ s~4.5 μ s, pulse frequency 120KHz~180KHz,
The silver-plated time is 1-2h.
Further, the gradient pulse frequency in step (2) includes first gradient:Pulse frequency be 10KHz~
30KHz, pulse width are the μ s of 80 μ s~280;Second gradient:Pulse frequency is 60KHz~70KHz, pulse width be 300 μ s~
800μs;3rd gradient:Pulse frequency is 70KHz~100KHz, and pulse width is the μ s of 1000 μ s~2000.
Compared with prior art, beneficial effects of the present invention are:The present invention is close by adjusting the gas-discharge current of negative electrode
Degree is in micro-arc discharge area, current density>0.1A/cm2(glow discharge) and<1A/cm2(arc discharge), gas discharge is controlled
Between glow discharge to arc discharge transformation critical range in, make the source of plating material and meanwhile have concurrently magnetron sputtering " cascade is touched
Hit " and multi-arc ion coating " heat emission " two kinds of mechanism, formed differential of the arc ion plating method, electrical contact is entered using differential of the arc ion plating method
Row silver-plated process, have the advantages that sedimentation rate is fast, good around plating property, obtained thickness of coating is evenly distributed, compactness is high, combines
Power is good, wear-resisting and coefficient of friction is low.Compared to plating silver process, the simpler and more direct stabilization of preparation method, process is few, and yield is high, energy
Meet the requirement of industrialized production.In a word, the silver-plated method of electrical contact of the invention has that environmental protection, binding force of cladding material be more preferable, effect
Rate it is higher the advantages that.
Embodiment
For ease of the understanding of the present invention, explanation is further explained with reference to specific embodiment.
Embodiment 1
A kind of silver-plated method of electrical contact, comprises the following steps:
(1) electrical contact is subjected to surface degreasing, processing of rust removing, and be cleaned and dried;Wherein, the material of electrical contact is fine copper
Material, revolving body is shaped as, the surface of electrical contact is subjected to sanding and polishing processing using grinder for polishing, is then put into electrical contact
In neutral degreaser rust remover, electrical contact sample 10min is cleaned with 20KHZ frequencies using supersonic wave cleaning machine, then by after cleaning
Electrical contact, which is put into vacuum drier, dries 1min.
(2) electrical contact is put into plating room, then plating room vacuum is evacuated to 10-5Pa, then pass to argon gas, wherein, argon gas
Flow velocity is 30CCM, and holding vacuum is 0.5Pa;
(3) unbalanced pulse Ag target power supplies and negative bias pulsed power carry out icon bombardment cleaning to electrical contact, wherein, ion
Bombardment and cleaning parameter is:Pulse Ag target voltages are 400V, and pulse width is 0.5 μ s, pulse frequency 12KHz;Pulsed negative bias for-
150V, pulse are 0.5 μ s, pulse frequency 25KHz;Ion Cleaning time 20min.
(4) the gas-discharge current density for adjusting negative electrode is in micro-arc discharge, with current density>0.1A/cm2 and<1A/
Cm2 differential of the arc ion plating method progress is silver-plated, and the silver-plated time is 1h, obtains plating silver electric contact;Wherein, the technique of differential of the arc ion plating method
Parameter is:Holding vacuum is 0.8Pa, and pulse Ag target voltages are 350V, and pulse width is 2.5 μ s, and gradient pulse frequency includes
First gradient:Pulse frequency is 10KHz, and pulse width is 80 μ s;Second gradient:Pulse frequency is 60KHz, and pulse width is
300μs;3rd gradient:Pulse frequency is 70KHz, and pulse width is 1000 μ s;Pulsed negative bias are -50VV, and pulse is
0.2 μ s, pulse frequency 120KHz, silver-plated time are 1h.
(5) cool, cool down, be cooled to stove after room temperature and take out plating silver electric contact.
Test result:Thickness is 25 μm, and surface roughness is 1.1 μm, hardness HV130, and porosity is 28/cm2, plating
Layer resistivity is 18 μ Ω.
Embodiment 2
A kind of silver-plated method of electrical contact, comprises the following steps:
(1) electrical contact is subjected to surface degreasing, processing of rust removing, and be cleaned and dried;The material of electrical contact is CuCr1 materials,
Revolving body is shaped as, the surface of electrical contact is subjected to sanding and polishing processing using grinder for polishing, during then electrical contact is put into
Property oil-removing rust-removing agent in, electrical contact sample 15min is cleaned with 30KHZ frequencies using supersonic wave cleaning machine, then by the electricity after cleaning
Contact, which is put into vacuum drier, dries 3min.
(2) electrical contact is put into plating room, then plating room vacuum is evacuated to 10-5Pa, then pass to argon gas, wherein, argon gas
Flow velocity is 140CCM, and holding vacuum is 1Pa.
(3) unbalanced pulse Ag target power supplies and negative bias pulsed power carry out icon bombardment cleaning to electrical contact;Wherein, ion
Bombardment and cleaning parameter is:Pulse Ag target voltages are 700V, and pulse width is 2.5 μ s, pulse frequency 16KHz;Pulsed negative bias for-
320V, pulse are 1.2 μ s, pulse frequency 60KHz;Ion Cleaning time 30min.
(4) the gas-discharge current density for adjusting negative electrode is in micro-arc discharge, with current density>0.1A/cm2 and<1A/
Cm2 differential of the arc ion plating method progress is silver-plated, and the silver-plated time is 1.5h, obtains plating silver electric contact;Wherein, the work of differential of the arc ion plating method
Skill parameter is:Holding vacuum is 1Pa, and pulse Ag target voltages are 500V, and pulse width is 12 μ s, and gradient pulse frequency includes the
One gradient:Pulse frequency is 20KHz, and pulse width is 180 μ s;Second gradient:Pulse frequency is 65KHz, pulse width 650
μs;3rd gradient:Pulse frequency is 85KHz, and pulse width is 1500 μ s;Pulsed negative bias are -100V, and pulse is 2 μ s,
Pulse frequency 150KHz, silver-plated time are 1.5h.
(5) cool, cool down, be cooled to stove after room temperature and take out plating silver electric contact.
Test result:Thickness is 35 μm, and surface roughness is 0.9 μm, hardness HV145, and porosity is 20/cm2, plating
Layer resistivity is 17 μ Ω.
Embodiment 3
(1) electrical contact is subjected to surface degreasing, processing of rust removing, and be cleaned and dried;The material of electrical contact is CuCr1Zr materials
Material, is shaped as sheet material, the surface of electrical contact is carried out into sanding and polishing processing using grinder for polishing, during then electrical contact is put into
Property oil-removing rust-removing agent in, electrical contact sample 20min is cleaned with 50KHZ frequencies using supersonic wave cleaning machine, then by the electricity after cleaning
Contact, which is put into vacuum drier, dries 5min.
(2) electrical contact is put into plating room, then plating room vacuum is evacuated to 10-4Pa, then pass to argon gas, wherein, argon gas
Flow velocity is 250CCM, and holding vacuum is 1.5Pa;
(3) unbalanced pulse Ag target power supplies and negative bias pulsed power carry out icon bombardment cleaning to electrical contact;Wherein, ion
Bombardment and cleaning parameter is:Pulse Ag target voltages are 1000V, and pulse width is 5 μ s, pulse frequency 20KHz;Pulsed negative bias for-
500V, pulse are 2 μ s, pulse frequency 100KHz;Ion Cleaning time 40min.
(4) the gas-discharge current density for adjusting negative electrode is in micro-arc discharge, with current density>0.1A/cm2 and<1A/
Cm2 differential of the arc ion plating method progress is silver-plated, and the silver-plated time is 2h, obtains plating silver electric contact;Wherein, the technique of differential of the arc ion plating method
Parameter is:Holding vacuum is 1.3Pa, and pulse Ag target voltages are 650V, and pulse width is 20 μ s, and gradient pulse frequency includes the
One gradient:Pulse frequency is 30KHz, and pulse width is 280 μ s;Second gradient:Pulse frequency is 70KHz, pulse width 800
μs;3rd gradient:Pulse frequency is 100KHz, and pulse width is 2000 μ s;Pulsed negative bias are -150V, pulse 4.5
μ s, pulse frequency 180KHz, silver-plated time are 2h.
(5) cool, cool down, be cooled to stove after room temperature and take out plating silver electric contact.
Test result:Thickness is 45 μm, and surface roughness is 0.8 μm, hardness HV150, and porosity is 22/cm2, plating
Layer resistivity is 18 μ Ω.
Embodiment 4
A kind of silver-plated method of electrical contact, comprises the following steps:
(1) electrical contact is subjected to surface degreasing, processing of rust removing, and be cleaned and dried;The material of electrical contact is aluminium, is shaped as
Sheet material, the surface of electrical contact is subjected to sanding and polishing processing using grinder for polishing, electrical contact is then put into neutral degreaser and removed
Become rusty in agent, electrical contact sample 12min is cleaned with 25KHZ frequencies using supersonic wave cleaning machine, then the electrical contact after cleaning is put into
4min is dried in vacuum drier.
(2) electrical contact is put into plating room, then plating room vacuum is evacuated to 10-4Pa, then pass to argon gas, wherein, argon gas
Flow velocity is 160CCM, and holding vacuum is 1.2Pa.
(3) unbalanced pulse Ag target power supplies and negative bias pulsed power carry out icon bombardment cleaning to electrical contact;Wherein, ion
Bombardment and cleaning parameter is:Pulse Ag target voltages are 680V, and pulse width is 2.0 μ s, pulse frequency 15KHz;Pulsed negative bias for-
280V, pulse are 1.2 μ s, pulse frequency 60KHz;Ion Cleaning time 30min.
(4) the gas-discharge current density for adjusting negative electrode is in micro-arc discharge, with current density>0.1A/cm2 and<1A/
Cm2 differential of the arc ion plating method progress is silver-plated, and the silver-plated time is 1.5h, obtains plating silver electric contact;Wherein, the work of differential of the arc ion plating method
Skill parameter is:Holding vacuum is 1Pa, and pulse Ag target voltages are 450V, and pulse width is 15 μ s, and gradient pulse frequency includes the
One gradient:Pulse frequency is 22KHz, and pulse width is 200 μ s;Second gradient:Pulse frequency is 62KHz, pulse width 600
μs;3rd gradient:Pulse frequency is 80KHz, and pulse width is 1300 μ s;Pulsed negative bias are -85V, and pulse is 2.3 μ
S, pulse frequency 155KHz, silver-plated time are 1.5h.
(5) cool, cool down, be cooled to stove after room temperature and take out plating silver electric contact.
Test result:Thickness is 30 μm, and surface roughness is 1.0 μm, hardness HV135, and porosity is 24/cm2, plating
Layer resistivity is 19 μ Ω.
Embodiment 5
A kind of silver-plated method of electrical contact, comprises the following steps:
(1) electrical contact is subjected to surface degreasing, processing of rust removing, and be cleaned and dried;The material of electrical contact is CuW alloy materials
Material, is shaped as revolving body, and the surface of electrical contact is carried out into sanding and polishing processing using grinder for polishing, is then put into electrical contact
In neutral degreaser rust remover, electrical contact sample 15min is cleaned with 30KHZ frequencies using supersonic wave cleaning machine, then by after cleaning
Electrical contact, which is put into vacuum drier, dries 3min.
(2) electrical contact is put into plating room, then plating room vacuum is evacuated to 10-5Pa, then pass to argon gas, wherein, argon gas
Flow velocity is 140CCM, and holding vacuum is 1Pa.
(3) unbalanced pulse Ag target power supplies and negative bias pulsed power carry out icon bombardment cleaning to electrical contact;Wherein, ion
Bombardment and cleaning parameter is:Pulse Ag target voltages are 700V, and pulse width is 2.5 μ s, pulse frequency 16KHz;Pulsed negative bias for-
320V, pulse are 1.2 μ s, pulse frequency 60KHz;Ion Cleaning time 30min.
(4) the gas-discharge current density for adjusting negative electrode is in micro-arc discharge, with current density>0.1A/cm2 and<1A/
Cm2 differential of the arc ion plating method progress is silver-plated, and the silver-plated time is 1.5h, obtains plating silver electric contact;Wherein, the work of differential of the arc ion plating method
Skill parameter is:Holding vacuum is 1Pa, and pulse Ag target voltages are 500V, and pulse width is 12 μ s, and gradient pulse frequency includes the
One gradient:Pulse frequency is 20KHz, and pulse width is 180 μ s;Second gradient:Pulse frequency is 65KHz, pulse width 650
μs;3rd gradient:Pulse frequency is 85KHz, and pulse width is 1500 μ s;Pulsed negative bias are -100V, and pulse is 2 μ s,
Pulse frequency 150KHz, silver-plated time are 1.5h.
(5) cool, cool down, be cooled to stove after room temperature and take out plating silver electric contact.
Test result:Thickness is 36 μm, and surface roughness is 0.9 μm, hardness HV160, and porosity is 18/cm2, plating
Layer resistivity is 16 μ Ω.
Although the present invention is described and illustrated with reference to its specific embodiment, it will be appreciated by those skilled in the art that
It can be variously modified without departing from the spirit and scope of the present invention, changed and substituted.Therefore, it is of the invention
It is intended to only be limited by the scope of following claims and these claims should be explained as broadly as possible in rational degree.
Claims (8)
1. a kind of silver-plated method of electrical contact, it is characterised in that comprise the following steps:
(1) electrical contact is subjected to surface degreasing, processing of rust removing, and be cleaned and dried;
(2) electrical contact is put into plating room, then plating room vacuum is evacuated to 10-5Pa~10-4Pa, argon gas is then passed to, protected
Hold vacuum < 2Pa;
(3) unbalanced pulse Ag target power supplies and negative bias pulsed power carry out icon bombardment cleaning to electrical contact;
(4) the gas-discharge current density for adjusting negative electrode is in micro-arc discharge, with current density>0.1A/cm2And<1A/cm2It is micro-
The progress of arc ion plating method is silver-plated, and the silver-plated time is 1-2h, obtains plating silver electric contact;
(5) cool, cool down, be cooled to stove after room temperature and take out the plating silver electric contact.
2. the silver-plated method of a kind of electrical contact as claimed in claim 1, it is characterised in that the material of the electrical contact can be aluminium
Any one in material, fine copper material, CuCr1 materials, CuCr1Zr materials or CuW alloy materials.
3. the silver-plated method of a kind of electrical contact as claimed in claim 1, it is characterised in that the electrical contact is shaped as turning round
Body or sheet material.
4. a kind of silver-plated method of electrical contact as claimed in claim 1, it is characterised in that step (1) is by the electrical contact
Surface carries out sanding and polishing processing, and electrical contact is put into neutral degreaser rust remover, using supersonic wave cleaning machine with 20KHZ and
50KHZ frequencies clean electrical contact sample 10-20min, then the electrical contact after cleaning is put into vacuum drier and dries 1-5min.
A kind of 5. silver-plated method of electrical contact as claimed in claim 1, it is characterised in that the argon gas flow velocity described in step (2)
For 30-250CCM.
A kind of 6. silver-plated method of electrical contact as claimed in claim 5, it is characterised in that the argon gas flow velocity described in step (2)
For 30-260CCM.
A kind of 7. silver-plated method of electrical contact as claimed in claim 1, it is characterised in that the icon bombardment cleaning of step (3)
Parameter is:Pulse Ag target voltages are 400V~1000V, and pulse width is 0.5 μ s~5 μ s, pulse frequency 12KHz~20KHz;Arteries and veins
It is -150V~-500V to rush back bias voltage, and pulse is 0.5 μ s~2 μ s, pulse frequency 25KHz~100KHz;During Ion Cleaning
Between 20min~40min.
A kind of 8. silver-plated method of electrical contact as claimed in claim 1, it is characterised in that differential of the arc ion plating method in step (4)
Technological parameter be:Holding vacuum is 0.8~1.3Pa, and pulse Ag target voltages are 350V~650V, and pulse width is 2.5 μ s
~20 μ s, gradient pulse frequency total size are 10KHz~100KHz;Pulsed negative bias are -50V~-150V, and pulse is
The μ s of 0.2 μ s~4.5, pulse frequency 120KHz~180KHz, the silver-plated time is 1-2h.
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Cited By (2)
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CN108468030A (en) * | 2018-03-20 | 2018-08-31 | 西安福莱电工合金有限公司 | A kind of magnetically controlled sputter method that copper contact surfaces are silver-plated |
WO2022099854A1 (en) * | 2020-11-11 | 2022-05-19 | 浙江福达合金材料科技有限公司 | Preparation method for silver metal oxide sheet-like electrical contact |
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CN108468030A (en) * | 2018-03-20 | 2018-08-31 | 西安福莱电工合金有限公司 | A kind of magnetically controlled sputter method that copper contact surfaces are silver-plated |
WO2022099854A1 (en) * | 2020-11-11 | 2022-05-19 | 浙江福达合金材料科技有限公司 | Preparation method for silver metal oxide sheet-like electrical contact |
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