CN102965626A - Nickel plating method of powder metallurgy porous material - Google Patents
Nickel plating method of powder metallurgy porous material Download PDFInfo
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Abstract
The invention provides a nickel plating method of a powder metallurgy porous material. The method comprises the following steps: A, utilizing a volatile organic solvent as a washing solvent to carry out ultrasonic washing on the powder metallurgy porous material; B, placing the powder metallurgy porous material into inert gas and applying an electric field to ionize the inert gas into inert gas ions; bombarding the surface of the powder metallurgy porous material by the inert gas ions; and C, adopting an electric arc ion plating method to plate nickel on the surface of the powder metallurgy porous material. According to the nickel plating method disclosed by the invention, the problems that the powder metallurgy porous material is contacted with corrosive liquid in the nickel plating process and the inner part is corroded due to that the liquid remains in pores of a base material are basically solved; and the problem that the inner part of the powder metallurgy porous material is corroded by that a washing solvent remains is further solved, the combining force of a plated nickel layer is good and the quality of a film layer is good.
Description
Technical field
The present invention relates to the PVD technical field of surface, in particular to a kind of nickel plating process of powder metallurgy porous material.
Background technology
The powder metallurgy porous material part is applied to the fields such as aviation, shipbuilding, machinofacture, wettability requirement when satisfying weld parts, and phase mutual friction between the reduction part, reduce the part tolerance clearance to improve the requirement such as damping performance, need to be at powder metallurgy porous material piece surface plating nickel dam.
Adopt traditional electrochemical plating plating nickel dam, because the surface porosity factor of powder metallurgy porous material part high (generally all more than 15%), internal structure is not fine and close, has following shortcoming:
(1) bath solution of electronickelling use mostly is caustic soln, enter easily powder metallurgy porous material piece surface hole during plating, residual caustic soln is enclosed in the powder metallurgy porous material part base solid after the nickel layer, be difficult to remove by modes such as cleanings, use for a long time or deposit to cause the corrosion of powder metallurgy porous material inside parts, bring serious potential safety hazard;
When (2) cleaning before the powder metallurgy porous material part nickel layer, the general ortho-water agent solution that adopts, residual solution is difficult to the oven dry removal in the hole of powder metallurgy porous material part, solution is closed in the hole after the nickel layer, uses for a long time or deposit the corrosion that can cause the powder metallurgy porous material part;
(3) powder metallurgy porous material piece surface porosity is high, and structure is not fine and close, has had a strong impact on the bonding force of nickel dam and the powder metallurgy porous material part base solid of plating.
At present, the powder metallurgy porous material part adopts after traditional electrochemical plating nickel plating, inside parts burn into nickel dam surface easily occurs the phenomenons such as rust staining occur, even cause scrapping by the gross of part, therefore is the bottleneck problem of being badly in need of solution in producing.
Summary of the invention
The invention provides a kind of nickel plating process of powder metallurgy porous material, after solving the nickel plating of powder metallurgy porous material part, the poor technical problem of inside parts burn into nickel dam and basal body binding force occurs easily.
According to an aspect of the present invention, provide a kind of nickel plating process of powder metallurgy porous material, may further comprise the steps: A, employing volatile organic solvent carry out ultrasonic cleaning as cleaning solvent to powder metallurgy porous material; B, powder metallurgy porous material is placed rare gas element, and applying electric field, to make ionized inert gas be inert gas ion, inert gas ion bombardment powder metallurgy porous material surface; C, employing arc ion plating are at the powder metallurgy porous material plating nickel on surface.
Further, the arc current of arc ion plating nickel plating is 70～100A, and voltage is 50～1000V, and the pressure of rare gas element is 0.1～0.6Pa.
Further, the process of arc ion plating nickel plating comprises: voltage is set as 800～1000V, and rare gas element pressure is controlled at 0.1～0.2Pa, at powder metallurgy porous material plating nickel on surface bottom; Voltage is set as 50～800V, and rare gas element pressure is controlled at 0.2～0.6Pa, continues nickel plating to desired thickness at the nickel bottom.
Further, step B comprises: it is the rare gas element of 1～3Pa that powder metallurgy porous material is placed pressure, and making ionized inert gas under the electric field of 900～1100V bias voltage is inert gas ion, inert gas ion bombardment powder metallurgy porous material surface.
Further, rare gas element is argon gas.
Further, volatile organic solvent is dehydrated alcohol.
Further, the ultrasonic power that ultrasonic cleaning adopts is 1.5～2.0kW, and ultrasonic frequency is 10～20kHz.
Further, between steps A and the step B, also comprise the step that powder metallurgy porous material is dried.
Use the nickel plating process of the powder metallurgy porous material of technical scheme of the present invention, owing to adopt arc ion plating (aip), there is not the liquid contact in the Ni-Speed, contact with corrosive liquid thereby fundamentally solved in the powder metallurgy porous material Ni-Speed, liquid residue is in the body material hole and cause the problem of internal corrosion after the nickel plating, and the nickel dam bonding force of institute's plating is good, and film quality is high; Adopt volatile organic solvent as the cleaning solvent before the nickel plating, cooperate the ultrasonic cleaning mode to clean powder metallurgy porous material, solved the problem of the residual initiation powder metallurgy porous material of cleaning solvent internal corrosion; Before the plating nickel dam, applying electric field, to make ionized inert gas be inert gas ion, utilize inert gas ion under electric field action, to bombard the powder metallurgy porous material surface, remove material surface oxide film and impurity, further increase the cleanliness factor of material surface, thereby improved bonding force and the film quality of plating nickel dam.
Description of drawings
The Figure of description that consists of the application's a part is used to provide a further understanding of the present invention, and illustrative examples of the present invention and explanation thereof are used for explaining the present invention, do not consist of improper restriction of the present invention.In the accompanying drawings:
Fig. 1 shows the structure photo of the nickel dam that the powder metallurgy porous material nickel plating process of the embodiment of the invention obtains.
Embodiment
Below in conjunction with the embodiment of the invention, technical scheme of the present invention is described in detail, but following embodiment understands the present invention, and can not limit the present invention, embodiment and the feature among the embodiment among the present invention can make up mutually, and the multitude of different ways that the present invention can be defined by the claims and cover is implemented.
In a kind of typical embodiment of the present invention, the nickel plating process of powder metallurgy porous material may further comprise the steps: A, employing volatile organic solvent carry out ultrasonic cleaning as cleaning solvent to powder metallurgy porous material; B, powder metallurgy porous material is placed rare gas element, and applying electric field, to make ionized inert gas be inert gas ion, inert gas ion bombardment powder metallurgy porous material surface; C, employing arc ion plating are at the powder metallurgy porous material plating nickel on surface.Adopt such nickel plating technology flow process to have the following advantages:
(1) because arc ion plating (aip) belongs to physical gas phase deposition technology, there is not the liquid contact in the Ni-Speed, contact with corrosive liquid thereby fundamentally solved in the powder metallurgy porous material Ni-Speed, liquid residue is in the body material hole and cause the maximum difficult point of internal corrosion after the nickel plating, and it is good that the nickel dam of institute's plating has bonding force, the advantage that film quality is high.
(2) adopt volatile organic solvent as the cleaning solvent before the nickel plating, cooperate the ultrasonic cleaning mode to clean powder metallurgy porous material, not only reached the before requirement of surface cleanliness of nickel plating, and because volatile organic solvent can vapor away fast, solved the problem of the residual initiation powder metallurgy porous material of cleaning solvent internal corrosion after finishing cleaning.
(3) before the plating nickel dam, applying electric field, to make ionized inert gas be inert gas ion, utilize inert gas ion under electric field action, to bombard the powder metallurgy porous material surface, remove material surface oxide film and impurity, further increase the cleanliness factor of material surface, thereby improved bonding force and the film quality of plating nickel dam.
In the preferred embodiment of the present invention, the main technologic parameters of arc ion plating nickel plating is selected as follows: arc current is 70～100A, and electric field bias is 50～1000V, and rare gas element pressure is 0.1～0.6Pa.In a specific embodiment of the present invention, first voltage is set as 800～1000V, rare gas element pressure is controlled at 0.1～0.2Pa, at powder metallurgy porous material plating nickel on surface bottom; Again voltage is set as 50～800V, rare gas element pressure is controlled at 0.2～0.6Pa, continues nickel plating to desired thickness at the nickel bottom.Wherein, " desired thickness " of final nickel plating can according to the applied environment of powder metallurgy porous material and condition, be determined by those skilled in the art according to actual needs.The processing parameter setting of above-mentioned arc ion plating nickel plating is that the contriver is preferred, by adjusting processing parameter and the change procedures thereof such as arc current, voltage, rare gas element pressure, the processing parameter of finding above-mentioned setting can be so that the performances such as the bonding force of plated nickel layer and film quality be better, thereby determined the processing parameter with better technique effect of technical solution of the present invention.
In the preferred embodiment of the present invention, to place through the powder metallurgy porous material of ultrasonic cleaning pressure is the rare gas element of 1～3Pa, making ionized inert gas under the electric field of 900～1100V bias voltage is inert gas ion, inert gas ion bombardment powder metallurgy porous material surface.The inert gas ion bombardment powder metallurgy porous material surface of adopting rare gas element under high bias electric field, to be ionized into, when reaching the effect of Ion Cleaning, can the follow-up nickel plating of residual impurity composition influence.
Preferably, rare gas element of the present invention is helium.Helium gas molecules and helium ion have suitable size of particles, and the cost of helium is lower, and raw material is easy to get.
In the concrete embodiment of the present invention, the employed volatile organic solvent of ultrasonic cleaning can be dehydrated alcohol, acetone and other organic solvent, as long as can reach cleaning performance, and the noresidue of can volatilizing fast after cleaning gets final product.Preferably, adopt dehydrated alcohol as the cleaning solvent of ultrasonic cleaning.
In the concrete embodiment of the present invention, the ultrasonic power that ultrasonic cleaning adopts is 1.5～2.0kW, and ultrasonic frequency is 10～20kHz.Adopt the aforesaid operations parameter, can reach preferably ultrasonic cleaning effect.
In the preferred embodiment of the present invention, between steps A and the step B, also comprise the step that powder metallurgy porous material is dried.By drying operation, can guarantee that the used organic solvent of ultrasonic cleaning volatilizees totally fully, noresidue, thereby give security for follow-up nickel plating technology.
Further specify beneficial effect of the present invention below in conjunction with embodiment.
Embodiment 1
Select the powder metallurgy porous material part as part to be plated.
Adopt dehydrated alcohol as cleaning solvent, part to be plated is carried out ultrasonic cleaning, ultrasonic power is 1.5kW, and ultrasonic frequency is 10kHz.Dry after ultrasonic cleaning is complete.
Part to be plated is packed in the stove, vacuumize in stove, be filled with argon gas and make the pressure of argon gas reach 2Pa, the electric field that applies the 1000V bias voltage makes argon gas ionization be argon ion, and Ion Cleaning is carried out on the surface of argon ion bombardment part to be plated.
Adopt arc ion plating in piece surface nickel plating to be plated, the arc current of employing is 80A, first voltage is set as 800～1000V, and rare gas element pressure is controlled at 0.1～0.2Pa in the stove, at powder metallurgy porous material plating nickel on surface bottom; Again voltage is set as 50～800V, rare gas element pressure is controlled at 0.2～0.6Pa in the stove, continues nickel plating to 6～9 μ m at the nickel bottom, obtains the part of plating nickel dam.
Embodiment 2
Select the powder metallurgy porous material part as part to be plated.
Adopt dehydrated alcohol as cleaning solvent, part to be plated is carried out ultrasonic cleaning, ultrasonic power is 2.0kW, and ultrasonic frequency is 10kHz.Dry after ultrasonic cleaning is complete.
Part to be plated is packed in the stove, vacuumize in stove, be filled with argon gas and make the pressure of argon gas reach 1Pa, the electric field that applies the 900V bias voltage makes argon gas ionization be argon ion, and Ion Cleaning is carried out on the surface of argon ion bombardment part to be plated.
Adopt arc ion plating in piece surface nickel plating to be plated, arc current is set as 70A, first voltage is set as 800～1000V, and rare gas element pressure is controlled at 0.1～0.2Pa in the stove, at powder metallurgy porous material plating nickel on surface bottom; Again voltage is set as 50～800V, rare gas element pressure is controlled at 0.2～0.6Pa in the stove, continues nickel plating to 6～9 μ m at the nickel bottom, obtains the part of plating nickel dam.
Embodiment 3
Select the powder metallurgy porous material part as part to be plated.
Adopt dehydrated alcohol as cleaning solvent, part to be plated is carried out ultrasonic cleaning, ultrasonic power is 1.8kW, and ultrasonic frequency is 15kHz.
Part to be plated is packed in the stove, vacuumize in stove, be filled with argon gas and make the pressure of argon gas reach 3Pa, the electric field that applies the 1100V bias voltage makes argon gas ionization be argon ion, and Ion Cleaning is carried out on the surface of argon ion bombardment part to be plated.
Adopt arc ion plating in piece surface nickel plating to be plated, the arc current of employing is 100A, first voltage is set as 800～1000V, and rare gas element pressure is controlled at 0.1～0.2Pa in the stove, at powder metallurgy porous material plating nickel on surface bottom; Again voltage is set as 50～800V, rare gas element pressure is controlled at 0.2～0.6Pa in the stove, continues nickel plating to 6～9 μ m at the nickel bottom, obtains the part of plating nickel dam.
Embodiment 4
Select the powder metallurgy porous material part as part to be plated.
Adopt acetone as cleaning solvent, part to be plated is carried out ultrasonic cleaning, ultrasonic power is 2.0kW, and ultrasonic frequency is 15kHz.Dry after ultrasonic cleaning is complete.
Part to be plated is packed in the stove, vacuumize in stove, be filled with argon gas and make the pressure of argon gas reach 2Pa, the electric field that applies the 1000V bias voltage makes argon gas ionization be argon ion, and Ion Cleaning is carried out on the surface of argon ion bombardment part to be plated.
Adopt arc ion plating in piece surface nickel plating to be plated, the arc current of employing is 90A, first voltage is set as 800～1000V, and rare gas element pressure is controlled at 0.1～0.2Pa in the stove, at powder metallurgy porous material plating nickel on surface bottom; Again voltage is set as 50～800V, rare gas element pressure is controlled at 0.2～0.6Pa in the stove, continues nickel plating to 6～9 μ m at the nickel bottom, obtains the part of plating nickel dam.
Embodiment 5
Select the powder metallurgy porous material part as part to be plated.
Adopt dehydrated alcohol as cleaning solvent, part to be plated is carried out ultrasonic cleaning, ultrasonic power is 2.0kW, and ultrasonic frequency is 20kHz.Dry after ultrasonic cleaning is complete.
Part to be plated is packed in the stove, vacuumize in stove, be filled with helium and make the pressure of helium reach 2Pa, the electric field that applies the 1000V bias voltage makes helium ionization be the helium ion, and Ion Cleaning is carried out on the surface of helium ion bombardment part to be plated.
Adopt arc ion plating in piece surface nickel plating to be plated, the arc current of employing is 80A, first voltage is set as 800～1000V, and rare gas element pressure is controlled at 0.1～0.2Pa in the stove, at powder metallurgy porous material plating nickel on surface bottom; Again voltage is set as 50～800V, rare gas element pressure is controlled at 0.2～0.6Pa in the stove, continues nickel plating to 6～9 μ m at the nickel bottom, obtains the part of plating nickel dam.
Comparative Examples
Select the powder metallurgy porous material part as part to be plated.
With the aqueous cleaning part to be plated that contains 5wt% neutral metal clean-out system.Adopt electro-plating method, working current density is 2～5A/dm
2, at piece surface plating nickel dam to 6 to be plated～12 μ m, obtain the part of plating nickel dam.
The part of the plating nickel dam that embodiment 1 is obtained carries out metallographic and detects, for more clearly showing nickel dam, copper electroplating layer on nickel dam, the structure photo that test obtains as shown in Figure 1, middle black layer is nickel dam (behind the corrosion that is corroded), can see that the nickel dam of institute's plating is complete, peel off without peeling, film quality is good.
The part of the plating nickel dam that embodiment 1～5 and Comparative Examples are obtained adopts metallographic method to carry out thickness measuring; Adopt scratch method, the bending method test bonding force of GB5270; Deposit after one month and to observe Parts Surface Coating whether rust spot is arranged, and dissect rear detection matrix cross section whether corrosion is arranged, determine whether to have in the matrix solution residual.Test result is as shown in table 1:
Table 1
From above test result as seen, the nickel plating process of the embodiment of the invention is compared to Comparative Examples, resulting plating nickel dam bonding force is stronger, film quality is more stable, and the inside parts corrosion effectively having avoided causing owing to corrosive liquid is residual of the nickel plating process of the embodiment of the invention, thereby has good prospects for commercial application.
The above is the preferred embodiments of the present invention only, is not limited to the present invention, and for a person skilled in the art, the present invention can have various modifications and variations.Within the spirit and principles in the present invention all, any modification of doing, be equal to replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (8)
1. the nickel plating process of a powder metallurgy porous material is characterized in that, may further comprise the steps:
A, employing volatile organic solvent carry out ultrasonic cleaning as cleaning solvent to described powder metallurgy porous material;
B, described powder metallurgy porous material is placed rare gas element, and applying electric field, to make described ionized inert gas be inert gas ion, described inert gas ion bombards described powder metallurgy porous material surface;
C, employing arc ion plating are at described powder metallurgy porous material plating nickel on surface.
2. nickel plating process according to claim 1 is characterized in that, the arc current of described arc ion plating nickel plating is 70～100A, and voltage is 50～1000V, and the pressure of described rare gas element is 0.1～0.6Pa.
3. nickel plating process according to claim 2 is characterized in that, the process of described arc ion plating nickel plating comprises:
Described voltage is set as 800～1000V, and described rare gas element pressure is controlled at 0.1～0.2Pa, at described powder metallurgy porous material plating nickel on surface bottom;
Described voltage is set as 50～800V, and described rare gas element pressure is controlled at 0.2～0.6Pa, continues nickel plating to desired thickness at described nickel bottom.
4. nickel plating process according to claim 1 is characterized in that, described step B comprises:
It is the rare gas element of 1～3Pa that described powder metallurgy porous material is placed pressure, and making described ionized inert gas under the electric field of 900～1100V bias voltage is inert gas ion, and described inert gas ion bombards described powder metallurgy porous material surface.
5. each described nickel plating process in 4 according to claim 1 is characterized in that described rare gas element is argon gas.
6. nickel plating process according to claim 1 is characterized in that, described volatile organic solvent is dehydrated alcohol.
7. nickel plating process according to claim 1 is characterized in that, the ultrasonic power that described ultrasonic cleaning adopts is 1.5～2.0kW, and ultrasonic frequency is 10～20kHz.
8. nickel plating process according to claim 1 is characterized in that, between described steps A and the described step B, also comprises the step that described powder metallurgy porous material is dried.
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| CN104894514A (en) * | 2015-03-31 | 2015-09-09 | 嘉兴中科奥度新材料有限公司 | Porous metal foil product with metal nanoparticle coating and preparation method thereof |
| CN110125421A (en) * | 2019-04-22 | 2019-08-16 | 西安斯瑞先进铜合金科技有限公司 | A kind of preparation method of sheet CuFe alloy powder |
| CN111074310A (en) * | 2019-12-25 | 2020-04-28 | 深圳市富优驰科技有限公司 | Process for improving wear resistance and corrosion resistance of iron-based powder metallurgy part |
| CN114535219A (en) * | 2022-01-19 | 2022-05-27 | 昆山丘钛微电子科技股份有限公司 | Anti-corrosion method and system for welding part of camera module |
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| CN101294270A (en) * | 2008-06-06 | 2008-10-29 | 东北大学 | Equipment and method for producing nichrome composite plate with vacuum arc ion plating |
| CN102350364A (en) * | 2011-09-07 | 2012-02-15 | 北京联合大学 | Preparation method of nitrogen-doped titanium dioxide photochemical catalyst loaded with foam metal carrier |
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| WO2006004297A1 (en) * | 2004-04-26 | 2006-01-12 | Korea Institute Of Machinery And Materials | Osseoinductive metal implants for a living body and producing method thereof |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104894514A (en) * | 2015-03-31 | 2015-09-09 | 嘉兴中科奥度新材料有限公司 | Porous metal foil product with metal nanoparticle coating and preparation method thereof |
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| CN111074310A (en) * | 2019-12-25 | 2020-04-28 | 深圳市富优驰科技有限公司 | Process for improving wear resistance and corrosion resistance of iron-based powder metallurgy part |
| CN111074310B (en) * | 2019-12-25 | 2022-05-03 | 东莞华晶粉末冶金有限公司 | Process for improving wear resistance and corrosion resistance of iron-based powder metallurgy part |
| CN114535219A (en) * | 2022-01-19 | 2022-05-27 | 昆山丘钛微电子科技股份有限公司 | Anti-corrosion method and system for welding part of camera module |
| CN114535219B (en) * | 2022-01-19 | 2024-04-05 | 昆山丘钛微电子科技股份有限公司 | Corrosion prevention method and system for welding part of camera module |
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