CN107257827A - 用于有机电子器件密封剂的组合物和使用该组合物形成的密封剂 - Google Patents
用于有机电子器件密封剂的组合物和使用该组合物形成的密封剂 Download PDFInfo
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- CN107257827A CN107257827A CN201680006255.6A CN201680006255A CN107257827A CN 107257827 A CN107257827 A CN 107257827A CN 201680006255 A CN201680006255 A CN 201680006255A CN 107257827 A CN107257827 A CN 107257827A
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- 239000000565 sealant Substances 0.000 title claims abstract description 77
- 239000000203 mixture Substances 0.000 title claims abstract description 73
- 230000015572 biosynthetic process Effects 0.000 title abstract description 4
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 33
- 239000003230 hygroscopic agent Substances 0.000 claims abstract description 31
- 229910052751 metal Inorganic materials 0.000 claims description 18
- 239000002184 metal Substances 0.000 claims description 18
- 239000000178 monomer Substances 0.000 claims description 15
- -1 acetal radical Chemical class 0.000 claims description 12
- 239000011347 resin Substances 0.000 claims description 10
- 229920005989 resin Polymers 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 6
- 229910044991 metal oxide Inorganic materials 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- 125000003342 alkenyl group Chemical group 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 239000011256 inorganic filler Substances 0.000 claims description 4
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 4
- 150000004706 metal oxides Chemical class 0.000 claims description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 4
- 229920002554 vinyl polymer Polymers 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 3
- 239000004593 Epoxy Substances 0.000 claims description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 2
- 229910021536 Zeolite Inorganic materials 0.000 claims description 2
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 claims description 2
- 229910021502 aluminium hydroxide Inorganic materials 0.000 claims description 2
- 125000003368 amide group Chemical group 0.000 claims description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 2
- 239000004927 clay Substances 0.000 claims description 2
- 229910052570 clay Inorganic materials 0.000 claims description 2
- 150000004292 cyclic ethers Chemical class 0.000 claims description 2
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 claims description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 2
- YWEUIGNSBFLMFL-UHFFFAOYSA-N diphosphonate Chemical compound O=P(=O)OP(=O)=O YWEUIGNSBFLMFL-UHFFFAOYSA-N 0.000 claims description 2
- 239000000428 dust Substances 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 2
- 125000000686 lactone group Chemical group 0.000 claims description 2
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 claims description 2
- 239000001095 magnesium carbonate Substances 0.000 claims description 2
- 229910000021 magnesium carbonate Inorganic materials 0.000 claims description 2
- 125000005397 methacrylic acid ester group Chemical group 0.000 claims description 2
- 229910052901 montmorillonite Inorganic materials 0.000 claims description 2
- 125000002524 organometallic group Chemical group 0.000 claims description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
- DLYUQMMRRRQYAE-UHFFFAOYSA-N phosphorus pentoxide Inorganic materials O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 claims description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 239000000454 talc Substances 0.000 claims description 2
- 235000012222 talc Nutrition 0.000 claims description 2
- 229910052623 talc Inorganic materials 0.000 claims description 2
- 239000004408 titanium dioxide Substances 0.000 claims description 2
- 150000003673 urethanes Chemical class 0.000 claims description 2
- 239000010457 zeolite Substances 0.000 claims description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- 239000005864 Sulphur Substances 0.000 claims 1
- XLJMAIOERFSOGZ-UHFFFAOYSA-N anhydrous cyanic acid Natural products OC#N XLJMAIOERFSOGZ-UHFFFAOYSA-N 0.000 claims 1
- 229910052788 barium Inorganic materials 0.000 claims 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims 1
- 125000000101 thioether group Chemical group 0.000 claims 1
- 238000000034 method Methods 0.000 description 23
- 238000007789 sealing Methods 0.000 description 18
- 239000000463 material Substances 0.000 description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- 239000001301 oxygen Substances 0.000 description 9
- 239000011521 glass Substances 0.000 description 8
- 239000010410 layer Substances 0.000 description 8
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- CERQOIWHTDAKMF-UHFFFAOYSA-N alpha-methacrylic acid Natural products CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 7
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 6
- 238000007711 solidification Methods 0.000 description 6
- 230000008023 solidification Effects 0.000 description 6
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 150000001336 alkenes Chemical class 0.000 description 4
- 229940106691 bisphenol a Drugs 0.000 description 4
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Chemical compound [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 4
- 239000000292 calcium oxide Substances 0.000 description 4
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 239000000945 filler Substances 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- 229920005573 silicon-containing polymer Polymers 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 3
- INHCSSUBVCNVSK-UHFFFAOYSA-L lithium sulfate Inorganic materials [Li+].[Li+].[O-]S([O-])(=O)=O INHCSSUBVCNVSK-UHFFFAOYSA-L 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000005416 organic matter Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- WVOVXOXRXQFTAS-UHFFFAOYSA-N 1-methyl-7-propan-2-ylphenanthrene-9,10-dione Chemical compound C1=CC=C2C3=CC=C(C(C)C)C=C3C(=O)C(=O)C2=C1C WVOVXOXRXQFTAS-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- OBOSXEWFRARQPU-UHFFFAOYSA-N 2-n,2-n-dimethylpyridine-2,5-diamine Chemical compound CN(C)C1=CC=C(N)C=N1 OBOSXEWFRARQPU-UHFFFAOYSA-N 0.000 description 2
- GISWNRNUVGGVOS-UHFFFAOYSA-N 3,4-dihydroxybutan-2-yl prop-2-enoate Chemical class OCC(O)C(C)OC(=O)C=C GISWNRNUVGGVOS-UHFFFAOYSA-N 0.000 description 2
- CXMYWOCYTPKBPP-UHFFFAOYSA-N 3-(3-hydroxypropylamino)propan-1-ol Chemical compound OCCCNCCCO CXMYWOCYTPKBPP-UHFFFAOYSA-N 0.000 description 2
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- CSSYLTMKCUORDA-UHFFFAOYSA-N barium(2+);oxygen(2-) Chemical compound [O-2].[Ba+2] CSSYLTMKCUORDA-UHFFFAOYSA-N 0.000 description 2
- LYQFWZFBNBDLEO-UHFFFAOYSA-M caesium bromide Chemical compound [Br-].[Cs+] LYQFWZFBNBDLEO-UHFFFAOYSA-M 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 238000003682 fluorination reaction Methods 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 2
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 2
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- CFVVSQSFKWLGAX-UHFFFAOYSA-N phenol;propane Chemical compound CCC.OC1=CC=CC=C1 CFVVSQSFKWLGAX-UHFFFAOYSA-N 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910001631 strontium chloride Inorganic materials 0.000 description 2
- AHBGXTDRMVNFER-UHFFFAOYSA-L strontium dichloride Chemical compound [Cl-].[Cl-].[Sr+2] AHBGXTDRMVNFER-UHFFFAOYSA-L 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 230000009974 thixotropic effect Effects 0.000 description 2
- GONNZDVAFLXPCZ-UHFFFAOYSA-N 1,2,3,4-tetrahydrobenzo[a]anthracene Chemical compound C1=CC2=CC3=CC=CC=C3C=C2C2=C1CCCC2 GONNZDVAFLXPCZ-UHFFFAOYSA-N 0.000 description 1
- ZENYUPUKNXGVDY-UHFFFAOYSA-N 1,4-bis(prop-1-en-2-yl)benzene Chemical class CC(=C)C1=CC=C(C(C)=C)C=C1 ZENYUPUKNXGVDY-UHFFFAOYSA-N 0.000 description 1
- DVFAVJDEPNXAME-UHFFFAOYSA-N 1,4-dimethylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C(C)=CC=C2C DVFAVJDEPNXAME-UHFFFAOYSA-N 0.000 description 1
- 150000000191 1,4-naphthoquinones Chemical class 0.000 description 1
- ALQSHHUCVQOPAS-UHFFFAOYSA-N 1,5-Pentadiol Natural products OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical class C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- KIJPZYXCIHZVGP-UHFFFAOYSA-N 2,3-dimethylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=C(C)C(C)=C2 KIJPZYXCIHZVGP-UHFFFAOYSA-N 0.000 description 1
- LZWVPGJPVCYAOC-UHFFFAOYSA-N 2,3-diphenylanthracene-9,10-dione Chemical compound C=1C=CC=CC=1C=1C=C2C(=O)C3=CC=CC=C3C(=O)C2=CC=1C1=CC=CC=C1 LZWVPGJPVCYAOC-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 1
- NTZCFGZBDDCNHI-UHFFFAOYSA-N 2-phenylanthracene-9,10-dione Chemical compound C=1C=C2C(=O)C3=CC=CC=C3C(=O)C2=CC=1C1=CC=CC=C1 NTZCFGZBDDCNHI-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- YYPNJNDODFVZLE-UHFFFAOYSA-N 3-methylbut-2-enoic acid Chemical compound CC(C)=CC(O)=O YYPNJNDODFVZLE-UHFFFAOYSA-N 0.000 description 1
- 125000003542 3-methylbutan-2-yl group Chemical group [H]C([H])([H])C([H])(*)C([H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000004058 9,10-anthraquinones Chemical class 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- ZMQCCGFOPMBILL-UHFFFAOYSA-N C(C(=C)C)(=O)O.C(C(=C)C)(=O)O.C(C(=C)C)(=O)O.C(CC)C(C(CO)(CO)CO)C Chemical compound C(C(=C)C)(=O)O.C(C(=C)C)(=O)O.C(C(=C)C)(=O)O.C(CC)C(C(CO)(CO)CO)C ZMQCCGFOPMBILL-UHFFFAOYSA-N 0.000 description 1
- UXOWBWDCWITSBY-UHFFFAOYSA-N C1=C2C=CC=3CC22C=CC=CC2=CC1=3 Chemical compound C1=C2C=CC=3CC22C=CC=CC2=CC1=3 UXOWBWDCWITSBY-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- MPCRDALPQLDDFX-UHFFFAOYSA-L Magnesium perchlorate Chemical compound [Mg+2].[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O MPCRDALPQLDDFX-UHFFFAOYSA-L 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 239000007832 Na2SO4 Substances 0.000 description 1
- 229910019787 NbF5 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 229910004546 TaF5 Inorganic materials 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical class CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229910052925 anhydrite Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- SGUXGJPBTNFBAD-UHFFFAOYSA-L barium iodide Chemical compound [I-].[I-].[Ba+2] SGUXGJPBTNFBAD-UHFFFAOYSA-L 0.000 description 1
- OOULUYZFLXDWDQ-UHFFFAOYSA-L barium perchlorate Chemical compound [Ba+2].[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O OOULUYZFLXDWDQ-UHFFFAOYSA-L 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 125000005605 benzo group Chemical group 0.000 description 1
- 229940049706 benzodiazepine Drugs 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- ZPOLOEWJWXZUSP-AATRIKPKSA-N bis(prop-2-enyl) (e)-but-2-enedioate Chemical compound C=CCOC(=O)\C=C\C(=O)OCC=C ZPOLOEWJWXZUSP-AATRIKPKSA-N 0.000 description 1
- 230000031709 bromination Effects 0.000 description 1
- 238000005893 bromination reaction Methods 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N but-2-ene Chemical group CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- ZNGLSUBXYVTWFH-UHFFFAOYSA-N butane-1,2,4-triol;2-methylprop-2-enoic acid Chemical class CC(=C)C(O)=O.OCCC(O)CO ZNGLSUBXYVTWFH-UHFFFAOYSA-N 0.000 description 1
- XXEMQRODPVLAGP-UHFFFAOYSA-N butane-1,4-diol;2-methylprop-2-enoic acid Chemical class CC(=C)C(O)=O.OCCCCO XXEMQRODPVLAGP-UHFFFAOYSA-N 0.000 description 1
- GZSSFSARCMSPPW-UHFFFAOYSA-N butane-2,2-diol Chemical class CCC(C)(O)O GZSSFSARCMSPPW-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- WGEFECGEFUFIQW-UHFFFAOYSA-L calcium dibromide Chemical compound [Ca+2].[Br-].[Br-] WGEFECGEFUFIQW-UHFFFAOYSA-L 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910001914 chlorine tetroxide Inorganic materials 0.000 description 1
- 230000021615 conjugation Effects 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- VKONPUDBRVKQLM-UHFFFAOYSA-N cyclohexane-1,4-diol Chemical class OC1CCC(O)CC1 VKONPUDBRVKQLM-UHFFFAOYSA-N 0.000 description 1
- INSRQEMEVAMETL-UHFFFAOYSA-N decane-1,1-diol Chemical compound CCCCCCCCCC(O)O INSRQEMEVAMETL-UHFFFAOYSA-N 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000005594 diketone group Chemical group 0.000 description 1
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N dimethylmethane Natural products CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- SBDRYJMIQMDXRH-UHFFFAOYSA-N gallium;sulfuric acid Chemical compound [Ga].OS(O)(=O)=O SBDRYJMIQMDXRH-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000005400 gorilla glass Substances 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 1
- 229910001947 lithium oxide Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- OTCKOJUMXQWKQG-UHFFFAOYSA-L magnesium bromide Chemical compound [Mg+2].[Br-].[Br-] OTCKOJUMXQWKQG-UHFFFAOYSA-L 0.000 description 1
- BLQJIBCZHWBKSL-UHFFFAOYSA-L magnesium iodide Chemical compound [Mg+2].[I-].[I-] BLQJIBCZHWBKSL-UHFFFAOYSA-L 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Chemical compound O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- AOLPZAHRYHXPLR-UHFFFAOYSA-I pentafluoroniobium Chemical compound F[Nb](F)(F)(F)F AOLPZAHRYHXPLR-UHFFFAOYSA-I 0.000 description 1
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical class OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035807 sensation Effects 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- PANBYUAFMMOFOV-UHFFFAOYSA-N sodium;sulfuric acid Chemical compound [Na].OS(O)(=O)=O PANBYUAFMMOFOV-UHFFFAOYSA-N 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- YRGLXIVYESZPLQ-UHFFFAOYSA-I tantalum pentafluoride Chemical compound F[Ta](F)(F)(F)F YRGLXIVYESZPLQ-UHFFFAOYSA-I 0.000 description 1
- RBTVSNLYYIMMKS-UHFFFAOYSA-N tert-butyl 3-aminoazetidine-1-carboxylate;hydrochloride Chemical compound Cl.CC(C)(C)OC(=O)N1CC(N)C1 RBTVSNLYYIMMKS-UHFFFAOYSA-N 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- HDUMBHAAKGUHAR-UHFFFAOYSA-J titanium(4+);disulfate Chemical compound [Ti+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O HDUMBHAAKGUHAR-UHFFFAOYSA-J 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
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- H10K50/844—Encapsulations
-
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
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- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
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- H01L23/293—Organic, e.g. plastic
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Abstract
本申请涉及一种用于密封剂的组合物和使用该组合物形成的密封剂。根据本发明的一个实施方式的用于密封剂的组合物包含:1)硅树脂;2)一种或多种吸湿剂;和3)一种或多种光引发剂。
Description
技术领域
本申请要求享有于2015年1月29日向韩国知识产权局提交的韩国专利申请第10-2015-0014573号的优先权和权益,其全部内容通过引用并入本文。
本申请涉及一种用于有机电子器件密封剂的组合物和使用该组合物形成的密封剂。
背景技术
通常,有机电子器件是当将电荷注入到设置在阳极和阴极之间的有机层时发生诸如发光或电流的现象的器件,并且可以根据所选择的有机材料制造具有各种功能的器件。
作为代表性的例子,有机发光二极管(OLED)由于其薄、轻且具有优异色感的特性而被视为下一代平板显示器,并且其可以在现有的玻璃基板、含硅的无机物基板、金属基板和柔性基板(如塑料基板或金属箔)上制造。这样的有机电子器件非常容易受到湿气和氧气的影响,并且当暴露于大气时或者当从外部将湿气带入面板时具有显著降低发光效率和寿命的缺点。
鉴于这样的问题,已经尝试通过使用玻璃盖或金属盖、利用层压法使用密封膜、或者沉积无机物质,阻挡湿气和氧气从外部流入。此外,还有通过在有机层或金属层表面上施加固化膜或固化材料之后进行固化过程来获得粘合和密封的方法。
然而,玻璃盖由于机械断裂等而在制造大面积的器件中存在问题,而金属盖在由与基板的热膨胀系数的差异引起的工艺方面存在问题。此外,使用层压法的粘合膜具有通过膜粘附表面的界面的湿气和氧气的流入的问题,并且在真空下沉积有机物和在真空下溅射无机物的现有方法具有生产率低的问题,这是因为它们需要在真空下使用溅射法将无机物沉积在多层中以防止湿气和氧气通过溅射顶部的界面流入,并且由于有机物和无机物需要在真空下在多层中形成也具有生产率降低的问题并在大规模生产上有问题。
此外,液体密封方法的缺点在于,在固化过程中产生的副产物、固化引发剂的未反应残余物等保留在密封结构内部,抑制有机电子器件的驱动或缩短寿命。
此外,在密封有机电子器件时在面板内安装吸湿剂的金属盖方法中,在金属盖结构中形成突出到一定高度的延伸以使用吸湿剂并且金属盖最后使用粘合剂与基板密封,或者当通过玻璃加工形成玻璃盖来密封有机发光二极管时,使用通过使用诸如喷砂或蚀刻的方法在一定凹槽内安装吸湿剂而与基板密封的方法。在这样的现有方法中,当由于密封的内部空间增加而面板尺寸变大时,金属盖加工变得困难,并且玻璃盖可能引起容易被外部压力破坏的问题。
发明内容
技术问题
本申请旨在提供一种组合物以及使用该组合物的密封剂,所述组合物可以制备能够增强有机电子器件的寿命并有效阻挡从外部流入的氧气、湿气等的密封剂。
技术方式
本申请的一个实施方式提供了一种用于密封剂的组合物,其包含:
1)硅树脂;
2)一种或多种吸湿剂;和
3)一种或多种光引发剂。
本申请的另一个实施方式提供了一种使用所述用于密封剂的组合物的密封剂。
本申请的再一个实施方式提供了一种包括所述密封剂的有机电子器件。
有益效果
根据本申请的一个实施方式的用于密封剂的组合物可以制备能够增强有机电子器件的寿命并有效阻挡从外部流入的氧气、湿气等的密封剂。此外,已经用作现有密封剂的一般组合物的缺点是:在密封到有机电子器件之后,因与其它材料混合而失去其性能;或者由于在密封时施加的不均匀压力而不保持密封表面之间的间隙。然而,通过使用固化型组合物,因为固化材料具有强度,所以即使在施加压力时,在根据本申请的一个实施方式的用于密封剂的组合物中,间隙亦不容易发生变化,因此在将组合物密封到有机电子装置之后,间隙可以保持良好。
具体实施方式
以下,将对本申请进行详细说明。
有机EL器件是多晶半导体器件,用于液晶的背光等,以获得低电压下的高流明的发光,并且预期为平板显示器件。然而,有机EL器件对于湿气极弱,金属电场和有机EL层之间的界面由于湿气的影响而被分离,金属被氧化而增加电阻,有机物本身由于湿气而劣化,结果发光不发生,导致亮度降低的问题。
鉴于上述,已经开发了用固化型组合物密封有机EL器件的方法。作为现有的密封方法,已经提出了使用丙烯酸树脂成型有机EL器件的方法,向有机EL器件的密封树脂添加吸湿剂以使有机EL器件防潮的方法等。
其中,将密封树脂和吸湿剂混合的方法已经被最广泛地使用,然而,在进行后处理时,不是固化型的密封剂具有生产率降低的缺点,这是因为密封剂在高温高压下难以容忍工艺阈值。
本申请旨在提供一种固化型密封剂组合物以及使用该组合物的密封剂,所述组合物可以制备能够增强有机电子器件的寿命并有效地阻挡从外部流入的氧气、湿气等的密封剂,并且除此之外还能够当通过引入固化型系统进行后处理时具有工艺稳定性。
根据本申请的一个实施方式的用于密封剂的组合物包含:1)硅树脂;2)一种或多种吸湿剂;和3)一种或多种光引发剂。
在根据本申请的一个实施方式的用于密封剂的组合物中,硅树脂的具体实例可以包括基于有机聚硅酮的树脂等,但不限于此。此外,下面更详细地描述基于有机聚硅酮的树脂的实例。
在基于有机聚硅酮的树脂中,选自烷基、芳基和烯基的一种或多种官能团可以与硅主链键合。
所述烷基的具体实例可以包括甲基、乙基、丙基、1-甲基乙基、丁基、1-甲基丙基、2-甲基丙基、1,1-二甲基乙基、戊基、1-甲基丁基、1-乙基丙基、2-甲基丁基、3-甲基丁基、1,2-二甲基丙基、2,2-二甲基丙基、己基、庚基、辛基、壬基、癸基、环烷基等,但不限于此。
所述芳基的具体实例可以包括苯基;萘基;烷基芳基,如甲苯基和二甲苯基;芳基烷基,如苄基和苯乙基等,但不限于此。
所述烯基通常具有2~10个碳原子,其具体实例可以包括乙烯基、烯丙基、甲基丙烯酸酯基、甲基丙烯酸甲酯基、丙烯酸酯基等,但不限于此。
基于有机聚硅酮的树脂优选为选自由以下化学式1表示的化合物的一种或多种。
[化学式1]
在化学式1中,
R1至R6彼此相同或不同,并且可以各自独立地选自氢、烷基、烯基、芳基、缩水甘油基、异氰酸酯基、羟基、羧基、乙烯基、丙烯酸酯基、甲基丙烯酸酯基、环氧基、环醚基、硫醚基、缩醛基、内酯基和酰胺基;以及
a、b、c和d各自独立地为0~1的实数,且(a+b+c+d)为1。
基于有机聚硅酮的树脂的重均分子量可以为100~1,000,000,并且可为1,000~50,000,但该分子量不限于此。
基于用于密封剂的组合物的总重量,所述硅树脂的含量可为1重量%~80重量%,但不限于此。当硅树脂的含量在1重量%至80重量%的范围内时,可以混合能够保持足够的吸湿能力同时与吸湿剂保持优异的混溶性的吸湿剂用量。当硅树脂的含量小于1重量%时,与吸湿剂混合是不可能的,而当含量大于80重量%时,无法实现与能够获得足够的吸湿能力以保护器件的吸湿剂的混合。
在根据本申请的一个实施方式的用于密封剂的组合物中,所述吸湿剂可以发挥向用于密封剂的组合物提供吸湿性能并控制触变性的作用。所述吸湿剂的具体实例可以包括金属粉末(例如氧化铝)、金属氧化物、有机金属氧化物、金属盐或五氧化二磷(P2O5)中的一种,或其两种或更多种的混合物,但不限于此。
所述金属氧化物的具体实例可以包括氧化锂(Li2O)、氧化钠(Na2O)、氧化钡(BaO)、氧化钙(CaO)、氧化镁(MgO)等,所述金属盐的实例可以包括硫酸盐,如硫酸锂(Li2SO4)、硫酸钠(Na2SO4)、硫酸钙(CaSO4)、硫酸镁(MgSO4)、硫酸钴(CoSO4)、硫酸镓(Ga2(SO4)3)、硫酸钛(Ti(SO4)2)或硫酸镍(NiSO4),金属卤化物,如氯化钙(CaCl2)、氯化镁(MgCl2)、氯化锶(SrCl2)、氯化钇(YCl3)、氯化铜(CuCl2)、氟化铯(CsF)、氟化钽(TaF5)、氟化铌(NbF5)、溴化锂(LiBr)、溴化钙(CaBr2)、溴化铯(CeBr3)、溴化硒(SeBr4)、溴化钒(VBr3)、溴化镁(MgBr2)、碘化钡(BaI2)或碘化镁(MgI2);或金属氯酸盐,如高氯酸钡(Ba(ClO4)2)或高氯酸镁(Mg(ClO4)2)等,但不限于此。
所述金属氧化物可以在适当加工吸湿剂的状态下混合到组合物中。例如,根据使用密封剂的有机电子器件的种类,密封剂可以是具有30μm以下的厚度的薄膜,在这种情况下,可能需要研磨吸湿剂的工序。对于吸湿剂研磨,可以使用诸如3辊磨机、珠磨机或球磨机的方法。
基于用于密封剂的组合物的总重量,所述吸湿剂的含量可为10重量%~90重量%,但不限于此。当基于用于密封剂的组合物的总重量,所述吸湿剂含量小于10重量%时,难以获得足够的吸湿能力以保护器件,而当含量大于90重量%时,粘度过度增加,使得在该工艺中不可能使用该密封剂。
在根据本申请的一个实施方式的用于密封剂的组合物中,光引发剂当暴露于光化射线时产生自由基,尽管它是热不活泼的。光引发剂的实例包括取代或未取代的多核醌,一种在共轭碳环系统中具有两个环的碳原子的化合物,例如2-苄基-2-(二甲基氨基)-1-(4-吗啉代苯基)-1-丁酮、2,2-二甲氧基-2-苯基苯乙酮、9,10-蒽醌、2-甲基蒽醌、2-乙基蒽醌、2-叔丁基蒽醌、八甲基蒽醌、1,4-萘醌、9,10-菲醌、苯并(苯并)蒽-7,12二酮、2,3-萘并萘-5,12-二酮、2-甲基-1,4-萘醌、1,4-二甲基蒽醌、2,3-二甲基蒽醌、2-苯基蒽醌、2,3-二苯基蒽醌、惹烯醌(retenequinone)、7,8,9,10-四氢化萘-5,12-二酮(tetrahydronaphthracene-5,12-dione)和1,2,3,4-四氢苯并(四氢苯并)-蒽-7,12-二酮,但是光引发剂不限于此。
基于用于密封剂的组合物的总重量,所述光引发剂的含量可为0.1重量%~10重量%,但不限于此。当基于用于密封剂的组合物的总重量,所述光引发剂含量小于0.1重量%时,促进固化的活性基团的数量少,导致即使在照射强紫外光时固化也不进行的问题,而当含量大于10重量%时,在固化后在低于100℃的温度条件下产生排出气体,从而引起有机发光器件的寿命缩短的担忧。
根据本申请的一个实施方式的用于密封剂的组合物还可以包含无机填料。所述填料使渗透到密封结构中的水或湿气的移动路径更长,从而抑制渗透,并且能够通过与树脂的基质结构、吸湿剂等的相互作用而使阻挡水和湿气的性能最大化。在本申请的一个实施方式中,粘土、滑石、二氧化硅、硫酸钡、氢氧化铝、碳酸钾、碳酸镁、沸石、氧化锆、二氧化钛、蒙脱土等中的一种,或其两种或更多种的混合物可以用作上述填料,然而填料不限于此。
此外,为了提高填料和树脂的结合效率,可以使用表面用有机材料处理过的产品作为填料,或者可以向其中额外添加偶联剂以备使用。
基于用于密封剂的组合物的总重量,所述无机填料的含量可以大于0重量%且小于或等于20重量%,但不限于此。当基于用于密封剂的组合物的总重量,所述无机填料含量大于20重量%时,与吸湿剂以95重量%以上混合时相似,触变性过度增加,获得具有难以在工艺中使用的水平的粘度。
根据本申请的一个实施方式的用于密封剂的组合物可以进一步包含本领域已知的单体以控制硅树脂材料的固化速率。所述单体的具体实例可以包括基于丙烯酸酯的单体,基于甲基丙烯酸酯的单体,基于硅氧烷的单体等,但不限于此。
作为单体,可以包括三羟乙基丙烷乙氧基三丙烯酸酯、(甲基)丙烯酸叔丁酯、二(甲基)丙烯酸1,5-戊二醇酯、(甲基)丙烯酸N,N-二乙基氨基乙酯、二(甲基)丙烯酸乙二醇酯、二(甲基)丙烯酸1,4-丁二醇酯、二乙二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、1,3-丙二醇二(甲基)丙烯酸酯、癸二醇二(甲基)丙烯酸酯、1,4-环己二醇二(甲基)丙烯酸酯、2,2-二羟甲基丙烷二(甲基)丙烯酸酯、二(甲基)丙烯酸甘油酯、二(甲基)丙烯酸三丙二醇酯、三(甲基)丙烯酸甘油酯、三羟甲基丙烷三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、聚氧乙烯化三羟甲基丙烷三(甲基)丙烯酸酯、2,2-二(对羟基苯基)丙烷二丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、2,2-二(对羟基苯基)丙烷二甲基丙烯酸酯、三乙二醇二丙烯酸酯、聚氧乙基-2,2-二(对羟基苯基)丙烷二甲基丙烯酸酯、双酚A的二(3-甲基丙烯酰氧基-2-羟基丙基)醚、双酚A的二(2-甲基丙烯酰氧基乙基)醚、双酚A的二(3-丙烯酰氧基-2-羟基丙基)醚、双酚A的二(2-丙烯酰氧基乙基)醚、1,4-丁二醇的二(3-甲基丙烯酰氧基-2-羟基丙基)醚、三乙二醇二甲基丙烯酸酯、聚氧丙基三羟甲基丙烷三丙烯酸酯、二(甲基)丙烯酸丁二醇酯、三(甲基)丙烯酸1,2,4-丁三醇酯、二(甲基)丙烯酸2,2,4-三甲基-1,3-戊二醇酯、1-苯基亚乙基-1,2-二甲基丙烯酸酯、富马酸二烯丙酯、苯乙烯、1,4-苯二酚二甲基丙烯酸酯、1,4-二异丙烯基苯、1,3,5-三异丙烯基苯、基于硅酮的单体、基于硅酮丙烯酸酯的单体、基于硅酮氨基甲酸酯的单体等,但是,单体不限于此。
此外,根据应用,根据本申请的一个实施方式的用于密封剂的组合物可以包括一种或多种添加剂,例如固化催化剂、粘度控制剂、固化剂、分散剂、稳定剂或固化促进剂。这些添加剂可以单独使用,也可以两种以上混合使用。
此外,根据本申请的一个实施方式的密封剂使用所述用于密封剂的组合物。更具体地,根据本申请的一个实施方式的密封剂可以包括1)硅树脂;2)一种或多种吸湿剂;和3)一种或多种光引发剂。
在根据本申请的一个实施方式的密封剂中,所述硅树脂、所述吸湿剂、所述光引发剂等与上述相同,因此不再重复具体的说明。
根据本申请的一个实施方式的密封剂可以使用本领域已知的方法形成,不同之处在于使用上述用于密封剂的组合物。更具体地说,可以使用诸如在基板上施加、涂布或印刷所述用于密封剂的组合物的方法来形成密封剂,然而,该方法不限于此。
根据本申请的一个实施方式的用于密封剂的组合物制备能够增强有机电子器件的寿命并有效阻挡从外部流入的氧气、湿气等的密封剂。此外,已经用作现有密封剂的普通吸气剂具有以下缺点:在密封到有机电子器件之后,因与其它材料混合而失去其性能;或者由于在密封时施加的不均匀压力而不保持密封表面之间的间隙。然而,通过使用固化型组合物,因为固化材料具有强度,所以即使在施加压力的情况下,在根据本申请的一个实施方式的用于密封剂的组合物中,间隙亦不容易发生变化,因此在将组合物密封到有机电子装置之后,间隙可以保持良好。
根据本申请的一个实施方式的密封剂可用于密封并由此保护各种物体。特别地,所述密封剂可以有效地保护物体,包括对诸如水或湿气的外部成分敏感的器件。可以在其中使用所述密封剂的物体的实例可以包括有机电子器件,例如光伏器件、整流器、发射器或有机发光二极管(OLED);太阳能电池;二次电池等,但不限于此。
所述密封剂可以有效地固定和支撑上基板和下基板,同时在有机电子器件中显示出优异的湿气阻挡和光学性质。此外,通过制备纳米尺寸的吸湿剂并将吸湿剂均匀地分散到用于密封剂的组合物中,密封剂显示出优异的透明性,并且不管有机电子器件的类型(如顶部发射或底部发射),都可以形成稳定的密封剂。
可以使用本领域中已知的常规构造提供有机电子器件,不同之处在于使用上述材料形成密封剂。例如,作为下基板和/或上基板,可以使用本领域中常用的玻璃、金属、聚合物膜等。此外,有机电子器件可以包括,例如,一对电极和形成在该对电极之间的有机材料层。这里,可以将一对电极中的任一个形成为透明电极。此外,有机材料层的实例可以包括空穴转移层、发光层、电子转移层等。
在下文中,将参考实施例更详细地描述本说明书。然而,以下实施例仅用于说明目的,并且本说明书不限于此。
<实施例>
<实施例1>
首先使用糊混合器将51g硅树脂(1)(甲基丙烯酸酯聚二甲基硅氧烷,Aldrich)、45g吸湿剂(CaO,Yoshizawa)和4g由BASF公司制造的光引发剂(Irgacure 369)混合。将混合的组合物置于3辊磨机中并进行三次研磨处理以制备用于吸气剂的粘合剂组合物。用该混合物填充100cc注射器,并在用离心机充分除去气泡后,将所得物在无水氮气氛下室温下储存在手套箱中。
<实施例2>
除了将实施例1的硅树脂(1)改为41g甲基丙烯酸酯聚二甲基硅氧烷(Aldrich)并且加入10g乙烯基聚乙烯基二甲基硅氧烷(Aldrich)作为硅树脂(2)以外,以与实施例1相同的方式制备组合物。
<比较例1>
除了将实施例1的硅树脂(1)改为55g并且将吸湿剂(CaO,Yoshizawa)改为45g以外,以与实施例1相同的方式制备组合物。
<比较例2>
除了将实施例1的硅树脂(1)改为51g由Miwon Commercial Co.,Ltd.制造的基于丙烯酸的树脂以外,以与实施例1相同的方式制备组合物。
<比较例3>
除了将实施例1的硅树脂(1)改为1g甲基丙烯酸酯聚二甲基硅氧烷(Aldrich)并且将吸湿剂(CaO,Yoshizawa)改为95g以外,以与实施例1相同的方式制备组合物。
<比较例4>
除了将实施例1的硅树脂(1)改为91g甲基丙烯酸酯聚二甲基硅氧烷(Aldrich)并且将吸湿剂(CaO,Yoshizawa)改为5g以外,以与实施例1相同的方式制备组合物。
[表1]
评估上述制备的实施例1和2以及比较例1至4的组合物的性能,结果示于下表2中。
[表2]
对于触变指数(T.I),使用流变仪分析各剪切的粘度。在这些值中,由在3I/s下的粘度值除以在30I/s下的粘度值获得T.I。
对于固化能量,使用光学流变仪(omni cure)照射UV-A波长范围的UV并确定曝光期间粘度的增加,并且将随时间过去粘度没有增加的部分确定为固化能量。
对于保存期限,每个样品位于40℃条件下,定期检查根据时间的粘度,然后确定粘度增加超过50%的时间。
对于排放性能,通过使用具有70cc注射器的20G尺寸的喷嘴以250Kpa的压力排出10秒获得排放量,并且当排放量可以被控制在0.001g和0.05g之间时排放性能被确定为有利。
对于真空密封加工性,在厚度为0.5mm的大猩猩玻璃上使用样品进行线分配,然后使用相同的玻璃进行密封,使其间隔为100μm,并将所得物在真空室中无人值守放置1周。当分配线宽度没有变化时,确定真空密封可加工性是有利的。
对于吸湿量,将3g各样品在陪替氏培养皿中进行薄层轧制,在100%RH条件下无人值守放置7天,并通过鉴定样品重量的变化量获得对于3g样品的吸湿量。
从结果可以看出,根据本申请的一个实施方式的用于密封剂的组合物制备能够增强有机电子器件的寿命并且有效地阻挡从外部流入氧气、湿气等的密封剂。此外,已经用作现有密封剂的一般组合物的缺点是:在密封到有机电子器件之后,因与其它材料混合而失去其性能;或者由于在密封时施加的不均匀压力而不保持密封表面之间的间隙。然而,通过使用固化型组合物,因为固化材料具有强度,所以即使在施加压力的情况下,在根据本申请的一个实施方式的用于密封剂的组合物中,间隙亦不容易发生变化,因此在将组合物密封到有机电子装置之后,间隙可以保持良好。
Claims (11)
1.一种用于密封剂的组合物,其包含:
1)硅树脂;
2)一种或多种吸湿剂;和
3)一种或多种光引发剂。
2.权利要求1所述的用于密封剂的组合物,其中,所述硅树脂为基于有机聚硅酮的树脂。
3.权利要求2所述的用于密封剂的组合物,其中,所述基于有机聚硅酮的树脂为选自由下列化学式1表示的化合物的一种或多种:
[化学式1]
其中,在化学式1中,
R1至R6彼此相同或不同,并且各自独立地选自氢、烷基、烯基、芳基、缩水甘油基、异氰酸酯基、羟基、羧基、乙烯基、丙烯酸酯基、甲基丙烯酸酯基、环氧基、环醚基、硫醚基、缩醛基、内酯基和酰胺基;以及
a、b、c和d各自独立地为0~1的实数,且(a+b+c+d)为1。
4.权利要求1所述的用于密封剂的组合物,其中,基于所述用于密封剂的组合物的总重量,所述硅树脂的含量为1重量%~80重量%。
5.权利要求1所述的用于密封剂的组合物,其中,所述吸湿剂包括选自金属粉末、金属氧化物、有机金属氧化物、金属盐或五氧化二磷(P2O5)的一种或多种。
6.权利要求1所述的用于密封剂的组合物,其中,基于所述用于密封剂的组合物的总重量,所述吸湿剂的含量为10重量%~90重量%。
7.权利要求1所述的用于密封剂的组合物,其进一步包含选自粘土、滑石、二氧化硅、硫酸钡、氢氧化铝、碳酸钾、碳酸镁、沸石、氧化锆、二氧化钛和蒙脱土的一种或多种无机填料。
8.权利要求1所述的用于密封剂的组合物,其中,基于所述用于密封剂的组合物的总重量,所述光引发剂的含量为0.1重量%~10重量%。
9.权利要求1所述的用于密封剂的组合物,其进一步包含选自基于丙烯酸酯的单体、基于甲基丙烯酸酯的单体、基于硅氧烷的单体、基于硅酮的单体、基于硅酮丙烯酸酯的单体和基于硅酮氨基甲酸酯的单体的一种或多种。
10.一种密封剂,其使用权利要求1~9中任一项所述的用于密封剂的组合物形成。
11.一种有机电子器件,其包括权利要求10所述的密封剂。
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PCT/KR2016/000943 WO2016122230A1 (ko) | 2015-01-29 | 2016-01-28 | 유기 전자 소자 봉지재용 조성물 및 이를 이용하여 형성된 봉지재 |
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KR20170127267A (ko) * | 2016-05-11 | 2017-11-21 | 모멘티브퍼포먼스머티리얼스코리아 주식회사 | 유기 전자 소자 봉지재용 조성물 및 이를 이용하여 형성된 봉지재 |
KR20170127263A (ko) * | 2016-05-11 | 2017-11-21 | 모멘티브퍼포먼스머티리얼스코리아 주식회사 | 유기 전자 소자 봉지재용 조성물 및 이를 이용하여 형성된 봉지재 |
KR20180034937A (ko) * | 2016-09-28 | 2018-04-05 | 모멘티브퍼포먼스머티리얼스코리아 주식회사 | 유기 전자 소자 봉지재용 조성물 및 이를 이용하여 형성된 봉지재 |
JP6649243B2 (ja) * | 2016-12-27 | 2020-02-19 | 双葉電子工業株式会社 | 乾燥剤組成物、封止構造、及び有機el素子 |
JP6924834B2 (ja) * | 2016-12-27 | 2021-08-25 | モメンティブ・パフォーマンス・マテリアルズ・コリア・カンパニー・リミテッドMomentive Performance Materials Korea Co.,Ltd | 有機電子素子封止材用組成物及びこれを用いて形成された封止材 |
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EP3252107A4 (en) | 2018-12-05 |
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WO2016122230A1 (ko) | 2016-08-04 |
EP3252107A1 (en) | 2017-12-06 |
AU2016212871A1 (en) | 2017-08-10 |
JP2018511157A (ja) | 2018-04-19 |
KR20160093560A (ko) | 2016-08-08 |
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