CN107179652B - 正型感光性聚硅氧烷组成物及其应用 - Google Patents
正型感光性聚硅氧烷组成物及其应用 Download PDFInfo
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- CN107179652B CN107179652B CN201710122560.8A CN201710122560A CN107179652B CN 107179652 B CN107179652 B CN 107179652B CN 201710122560 A CN201710122560 A CN 201710122560A CN 107179652 B CN107179652 B CN 107179652B
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- carbon atoms
- positive photosensitive
- hydroxyphenyl
- hydroxy
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- -1 polysiloxane Polymers 0.000 title claims abstract description 180
- 229920001296 polysiloxane Polymers 0.000 title claims abstract description 85
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- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 claims abstract description 27
- 230000001681 protective effect Effects 0.000 claims abstract description 27
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- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 9
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- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 7
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- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
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- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- XKINWJBZPLWKCW-UHFFFAOYSA-N methoxy-[methoxy(dimethyl)silyl]oxy-dimethylsilane Chemical compound CO[Si](C)(C)O[Si](C)(C)OC XKINWJBZPLWKCW-UHFFFAOYSA-N 0.000 description 1
- FBNXYLDLGARYKQ-UHFFFAOYSA-N methoxy-dimethyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(C)CCCOCC1CO1 FBNXYLDLGARYKQ-UHFFFAOYSA-N 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- CLZGJKHEVKJLLS-UHFFFAOYSA-N n,n-diheptylheptan-1-amine Chemical compound CCCCCCCN(CCCCCCC)CCCCCCC CLZGJKHEVKJLLS-UHFFFAOYSA-N 0.000 description 1
- DIAIBWNEUYXDNL-UHFFFAOYSA-N n,n-dihexylhexan-1-amine Chemical compound CCCCCCN(CCCCCC)CCCCCC DIAIBWNEUYXDNL-UHFFFAOYSA-N 0.000 description 1
- XTAZYLNFDRKIHJ-UHFFFAOYSA-N n,n-dioctyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCCCC)CCCCCCCC XTAZYLNFDRKIHJ-UHFFFAOYSA-N 0.000 description 1
- OOHAUGDGCWURIT-UHFFFAOYSA-N n,n-dipentylpentan-1-amine Chemical compound CCCCCN(CCCCC)CCCCC OOHAUGDGCWURIT-UHFFFAOYSA-N 0.000 description 1
- BSCJIBOZTKGXQP-UHFFFAOYSA-N n-(2-hydroxyethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCCO BSCJIBOZTKGXQP-UHFFFAOYSA-N 0.000 description 1
- UUORTJUPDJJXST-UHFFFAOYSA-N n-(2-hydroxyethyl)prop-2-enamide Chemical compound OCCNC(=O)C=C UUORTJUPDJJXST-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- VWBWQOUWDOULQN-UHFFFAOYSA-N nmp n-methylpyrrolidone Chemical compound CN1CCCC1=O.CN1CCCC1=O VWBWQOUWDOULQN-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- GSGDTSDELPUTKU-UHFFFAOYSA-N nonoxybenzene Chemical compound CCCCCCCCCOC1=CC=CC=C1 GSGDTSDELPUTKU-UHFFFAOYSA-N 0.000 description 1
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- ZPIRTVJRHUMMOI-UHFFFAOYSA-N octoxybenzene Chemical compound CCCCCCCCOC1=CC=CC=C1 ZPIRTVJRHUMMOI-UHFFFAOYSA-N 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- WCVRQHFDJLLWFE-UHFFFAOYSA-N pentane-1,2-diol Chemical compound CCCC(O)CO WCVRQHFDJLLWFE-UHFFFAOYSA-N 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 229940030966 pyrrole Drugs 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- ATZHWSYYKQKSSY-UHFFFAOYSA-N tetradecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCOC(=O)C(C)=C ATZHWSYYKQKSSY-UHFFFAOYSA-N 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- BOVWGKNFLVZRDU-UHFFFAOYSA-N triethoxy(trifluoromethyl)silane Chemical compound CCO[Si](OCC)(OCC)C(F)(F)F BOVWGKNFLVZRDU-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- OSRJBXRUXTUMBY-UHFFFAOYSA-N triheptylphosphane Chemical compound CCCCCCCP(CCCCCCC)CCCCCCC OSRJBXRUXTUMBY-UHFFFAOYSA-N 0.000 description 1
- FPZZZGJWXOHLDJ-UHFFFAOYSA-N trihexylphosphane Chemical compound CCCCCCP(CCCCCC)CCCCCC FPZZZGJWXOHLDJ-UHFFFAOYSA-N 0.000 description 1
- DKRCHEKYYVCTAN-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC.CCC[Si](OC)(OC)OC DKRCHEKYYVCTAN-UHFFFAOYSA-N 0.000 description 1
- RMZAYIKUYWXQPB-UHFFFAOYSA-N trioctylphosphane Chemical compound CCCCCCCCP(CCCCCCCC)CCCCCCCC RMZAYIKUYWXQPB-UHFFFAOYSA-N 0.000 description 1
- IWPNEBZUNGZQQQ-UHFFFAOYSA-N tripentylphosphane Chemical compound CCCCCP(CCCCC)CCCCC IWPNEBZUNGZQQQ-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- KCTAHLRCZMOTKM-UHFFFAOYSA-N tripropylphosphane Chemical compound CCCP(CCC)CCC KCTAHLRCZMOTKM-UHFFFAOYSA-N 0.000 description 1
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Silicon Polymers (AREA)
Abstract
本发明是有关一种正型感光性聚硅氧烷组成物及由该感光性硅氧烷组成物所形成的保护膜,其用于形成TFT基板用平坦化膜、层间绝缘膜或光波导路的芯材或包覆材,所述保护膜具有耐热性佳的特性。该正型感光性硅氧烷组成物包含聚硅氧烷(A)、邻萘醌二叠氮磺酸酯(B)、溶剂(C)及膦类(phosphine)化合物(D)。
Description
技术领域
本发明是有关于一种适用于液晶显示元件、有机EL显示元件等的TFT基板用平坦化膜、层间绝缘膜或光波导路的芯材或包覆材的正型感光性硅氧烷组成物,及由其形成的保护膜、及具有该保护膜的元件。特别是提供一种耐热性佳的正型感光性聚硅氧烷组成物、其所形成的保护膜,以及具有保护膜的元件。
背景技术
近年来,在半导体工业、液晶显示器或有机电激发光显示器等领域中,随着尺寸的日益缩小化,对于微影工艺中所需的图案的微细化亦要求日高。为了达到微细化的图案,一般是通过具有高解析及高感度的正型感光性材料经曝光及显影而形成,其中,以聚硅氧烷聚合物为成分的正型感光性材料渐成为业界使用的主流。
在液晶显示器或有机电激发光显示器中,层状配线间通常会配置层间绝缘膜以作为绝缘。正型感光性材料由于获得图案形状的必要工序数较少,同时,所获得的绝缘膜平坦度佳,故被广泛使用于形成层间绝缘膜的材料。
例如,用于液晶显示器的层间绝缘膜,其形成微细配线的接触孔的图案是必要的。而实际上,负型感光性组成物形成的接触孔,达可使用水准的孔径十分困难,因此,业界广泛使用正型感光性组合物,以形成液晶显示元件的层间绝缘膜(如日本特开2001-354822号所示)。
一般作为形成层间绝缘膜的正型感光性组合物的主要成分为丙烯酸类树脂,但使用硅氧烷类材料的感光性组合物,其耐热性及透明性皆较使用丙烯酸类树脂材料的感光性组合物佳(如日本特开2000-1648号所示)。
然而,硅烷化合物或聚硅氧烷的聚硅氧烷类材料,因其本身易与同类或不同类化合物产生水解缩合反应。在制备正型感光性组合物时,这些副反应的发生会导致该正型感光性组合物的保存稳定性变差,其产品的寿命亦会缩短。
为抑制上述的缩合反应,业界已开发通过控制聚硅氧烷的分子量以及分枝结构以抑制缩合反应。日本特开2003-163209号公开了通过酸催化剂、金属螯合物和碱催化剂的作用可得到不同分子量的聚硅氧烷以控制该聚硅氧烷的结构。然而,上述公报虽然公开了聚硅氧烷的各种分子量,但其并未考虑到该聚硅氧烷的感光特性;除介电常数外,也未考虑到层间绝缘膜的各种特性。
在此情况下,日本特开2011-123450号公开了一种正型感光性聚硅氧烷组成物,其具有优异的感光性、保存稳定性及耐熔体流动性,然而,该正型感光性树脂组成物的耐热性不佳,故无法令业界所接受。
因此,如何同时达到目前业界对耐热性的要求,为本发明所属技术领域中努力研究的目标。
发明内容
本发明利用提供特殊聚硅氧烷聚合物、邻萘醌二叠氮磺酸酯及膦类化合物(phosphine)的成分,而得到耐热性佳的正型感光性聚硅氧烷组成物。
因此,本发明提供一种正型感光性聚硅氧烷组成物,其包含:
聚硅氧烷(A);
邻萘醌二叠氮磺酸酯(B);
溶剂(C);及
膦类化合物(D);
其中,所述膦类化合物(D)包括至少一选自由三烷基膦化合物、三芳基膦化合物及膦盐所组成的群组。
本发明亦提供一种于一基板上形成薄膜的方法,其包含使用前述的正型感光性聚硅氧烷组成物施予所述基板上。
本发明又提供一种基板上的薄膜,其是由前述的方法所制得。
本发明再提供一种装置,其包含前述的薄膜。
具体实施方式
本发明提供一种正型感光性聚硅氧烷组成物,其包含:
聚硅氧烷(A);
邻萘醌二叠氮磺酸酯(B);
溶剂(C);及
膦类化合物(D);
其中,所述膦类化合物(D)包括至少一选自由三烷基膦化合物、三芳基膦化合物及膦盐所组成的群组。
以下将详细说明用于本发明的正型感光性聚硅氧烷组成物的各个成分。
在此说明的是,以下是以(甲基)丙烯酸表示丙烯酸及/或甲基丙烯酸,并以(甲基)丙烯酸酯表示丙烯酸酯及/或甲基丙烯酸酯;同样地,以(甲基)丙烯酰基表示丙烯酰基及/或甲基丙烯酰基。
根据本发明的聚硅氧烷(A)的种类并没有特别限制,只要可达到本发明的目的即可。聚硅氧烷(A)可使用硅烷单体(silane monomer)进行聚缩合(即水解(hydrolysis)及部分缩合)来合成,或是使用硅烷单体及其他可聚合的化合物进行聚缩合来合成。
所述硅烷单体包括硅烷单体(a-1)及硅烷单体(a-2);其他可聚合的化合物包含硅氧烷预聚物(a-3)、二氧化硅粒子(a-4),或其组合。以下,进一步说明各个成分以及聚缩合的反应步骤与条件。
所述硅烷单体(a-1)为由式(I-1)表示的化合物:
Si(Ra)w(ORb)4-w 式(I-1)
式(I-1)中,Ra各自独立表示氢原子、碳数为1至10的烷基、碳数为2至10的烯基、碳数为6至15的芳香基、含有酸酐基的碳数为1至10的烷基、含有环氧基的碳数为1至10的烷基或含有环氧基的烷氧基,至少一个Ra表示含有酸酐基的碳数为1至10的烷基、含有环氧基的碳数为1至10的烷基或含有环氧基的烷氧基;
Rb各自独立表示氢原子、碳数为1至6的烷基、碳数为1至6的酰基或碳数为6至15的芳香基;及
w表示1至3的整数。
更详细而言,当式(I-1)中的Ra表示碳数为1至10的烷基时,具体而言,Ra例如是甲基、乙基、正丙基、异丙基、正丁基、第三丁基、正己基或正癸基。又,Ra也可以是烷基上具有其他取代基的烷基,具体而言,Ra例如是三氟甲基、3,3,3-三氟丙基、3-胺丙基、3-巯丙基或3-异氰酸丙基。
当式(I-1)中的Ra表示碳数为2至10的烯基时,具体而言,Ra例如是乙烯基。又,Ra也可以是烯基上具有其他取代基的烯基,具体而言,Ra例如是3-丙烯酰氧基丙基或3-甲基丙烯酰氧基丙基。
当式(I-1)中的Ra表示碳数为6至15的芳香基时,具体而言,Ra例如是苯基、甲苯基(tolyl)或萘基(naphthyl)。又,Ra也可以是芳香基上具有其他取代基的芳香基,具体而言,Ra例如是对-羟基苯基(o-hydroxyphenyl)、1-(对-羟基苯基)乙基(1-(o-hydroxyphenyl)ethyl)、2-(对-羟基苯基)乙基(2-(o-hydroxyphenyl)ethyl)或4-羟基-5-(对-羟基苯基羰氧基)戊基(4-hydroxy-5-(p-hydroxyphenylcarbonyloxy)pentyl)。
此外,式(I-1)中的Ra表示含有酸酐基的烷基,其中烷基较佳为碳数为1至10的烷基。具体而言,所述含有酸酐基的烷基例如是式(I-1-1)所示的乙基丁二酸酐、式(I-1-2)所示的丙基丁二酸酐或式(I-1-3)所示的丙基戊二酸酐。值得一提的是,酸酐基是由二羧酸(dicarboxylic acid)经分子内脱水(intramolecular dehydration)所形成的基团,其中二羧酸例如是丁二酸或戊二酸。
再者,式(I-1)中的Ra表示含有环氧基的烷基,其中烷基较佳为碳数为1至10的烷基。具体而言,所述含有环氧基的烷基例如是环氧丙烷基戊基(oxetanylpentyl)或2-(3,4-环氧环己基)乙基(2-(3,4-epoxycyclohexyl)ethyl)。值得一提的是,环氧基是由二元醇(diol)经分子内脱水所形成的基团,其中二元醇例如是丙二醇、丁二醇或戊二醇。
式(I-1)中的Ra表示含有环氧基的烷氧基,其中烷氧基较佳为碳数为1至10的烷氧基。具体而言,所述含有环氧基的烷氧基例如是环氧丙氧基丙基(glycidoxypropyl)或2-环氧丙烷基丁氧基(2-oxetanylbutoxy)。
另外,当式(I-1)的Rb表示碳数为1至6的烷基时,具体而言,Rb例如是甲基、乙基、正丙基、异丙基或正丁基。当式(I-1)中的Rb表示碳数为1至6的酰基时,具体而言,Rb例如是乙酰基。当式(I-1)中的Rb表示碳数为6至15的芳香基时,具体而言,Rb例如是苯基。
在式(I-1)中,w表示1至3的整数。当w表示2或3时,多个Ra可为相同或不同;当w表示1或2时,多个Rb可为相同或不同。
所述硅烷单体(a-1)的具体例包括:3-环氧丙氧基丙基三甲氧基硅烷(3-glycidoxypropyltrimethoxysilane,简称GPTMS)、3-环氧丙氧基丙基三乙氧基硅烷(3-glycidoxypropyltriethoxysilane)、2-(3,4-环氧环己基)乙基三甲氧基硅烷(2-(3,4-epoxycyclohexyl)ethyl trimethoxy silane)、2-环氧丙烷基丁氧基丙基三苯氧基硅烷(2-oxetanylbutoxypropyl triphenoxysilane)、由东亚合成所制造的市售品:2-环氧丙烷基丁氧基丙基三甲氧基硅烷(2-oxetanylbutoxypropyltrimethoxysilane,商品名TMSOX-D)、2-环氧丙烷基丁氧基丙基三乙氧基硅烷(2-oxetanylbutoxypropyltriethoxysilane,商品名TESOX-D)、3-(三苯氧基硅基)丙基丁二酸酐、由信越化学所制造的市售品:3-(三甲氧基硅基)丙基丁二酸酐(商品名X-12-967)、由WACKER公司所制造的市售品:3-(三乙氧基硅基)丙基丁二酸酐(商品名GF-20)、3-(三甲氧基硅基)丙基戊二酸酐(简称TMSG)、3-(三乙氧基硅基)丙基戊二酸酐、3-(三苯氧基硅基)丙基戊二酸酐、二异丙氧基-二(2-环氧丙烷基丁氧基丙基)硅烷(diisopropoxy-di(2-oxetanylbutoxy propyl)silane,简称DIDOS)、二(3-环氧丙烷基戊基)二甲氧基硅烷(di(3-oxetanylpentyl)dimethoxy silane)、(二正丁氧基硅基)二(丙基丁二酸酐)、(二甲氧基硅基)二(乙基丁二酸酐)、3-环氧丙氧基丙基二甲基甲氧基硅烷(3-glycidoxypropyldimethylmethoxysilane)、3-环氧丙氧基丙基二甲基乙氧基硅烷(3-glycidoxypropyl dimethylethoxysilane)、二(2-环氧丙烷基丁氧基戊基)-2-环氧丙烷基戊基乙氧基硅烷(di(2-oxetanylbutoxypentyl)-2-oxetanyl pentylethoxysilane)、三(2-环氧丙烷基戊基)甲氧基硅烷(tri(2-oxetanylpentyl)methoxy silane)、(苯氧基硅基)三(丙基丁二酸酐)、(甲基甲氧基硅基)二(乙基丁二酸酐),或上述化合物的组合。
前述硅烷单体(a-1)可单独使用或组合多种来使用。
所述硅烷单体(a-1)的具体例较佳为包括3-(三乙氧基硅基)丙基丁二酸酐、3-(三甲氧基硅基)丙基丁二酸酐、3-环氧丙氧基丙基三甲氧基硅烷、3-(三甲氧基硅基)丙基戊二酸酐、(二甲氧基硅基)二(乙基丁二酸酐)、2-环氧丙烷基丁氧基丙基三甲氧基硅烷、2-(3,4-环氧环己基)乙基三甲氧基硅烷、2-环氧丙烷基丁氧基丙基三乙氧基硅烷或上述化合物的组合。
于所述聚硅氧烷(A)的聚缩合反应时,若使用式(I-1)所示的硅烷单体(a-1),则可进一步改善该正型感光性聚硅氧烷组成物的耐热性。
所述硅烷单体(a-2)为由式(I-2)表示的化合物:
Si(Rc)u(ORd)4-u 式(I-2)
式(I-2)中,Rc各自独立表示氢原子、碳数为1至10的烷基、碳数为2至10的烯基或碳数为6至15的芳香基;Rd各自独立表示氢原子、碳数为1至6的烷基、碳数为1至6的酰基或碳数为6至15的芳香基;及
u表示0至3的整数。
更详细而言,当式(I-2)中的Rc表示碳数为1至10的烷基时,具体而言,Rc例如是甲基、乙基、正丙基、异丙基、正丁基、第三丁基、正己基或正癸基。又,Rc也可以是烷基上具有其他取代基的烷基,具体而言,Rc例如是三氟甲基、3,3,3-三氟丙基、3-胺丙基、3-巯丙基或3-异氰酸丙基。
当式(I-2)中的Rc表示碳数为2至10的烯基时,具体而言,Rc例如是乙烯基。又,Rc也可以是烯基上具有其他取代基的烯基,具体而言,Rc例如是3-丙烯酰氧基丙基或3-甲基丙烯酰氧基丙基。
当式(I-2)中的Rc表示碳数为6至15的芳香基时,具体而言,Rc例如是苯基、甲苯基(tolyl)或萘基(naphthyl)。又,Rc也可以是芳香基上具有其他取代基的芳香基,具体而言,Rc例如是对-羟基苯基(o-hydroxyphenyl)、1-(对-羟基苯基)乙基(1-(o-hydroxyphenyl)ethyl)、2-(对-羟基苯基)乙基(2-(o-hydroxyphenyl)ethyl)或4-羟基-5-(对-羟基苯基羰氧基)戊基(4-hydroxy-5-(p-hydroxyphenylcarbonyloxy)pentyl)。
另外,当式(I-2)的Rd表示碳数为1至6的烷基时,具体而言,Rd例如是甲基、乙基、正丙基、异丙基或正丁基。当式(I-2)中的Rd表示碳数为1至6的酰基时,具体而言,Rd例如是乙酰基。当式(I-2)中的Rd表示碳数为6至15的芳香基时,具体而言,Rd例如是苯基。
在式(I-2)中,u为0至3的整数。当u表示2或3时,多个Rc可为相同或不同;当u表示0、1或2时,多个Rd可为相同或不同。
在式(I-2)中,当u=0时,表示硅烷单体为四官能性硅烷单体(亦即具有四个可水解基团的硅烷单体);当u=1时,表示硅烷单体为三官能性硅烷单体(亦即具有三个可水解基团的硅烷单体);当u=2时,表示硅烷单体为二官能性硅烷单体(亦即具有二个可水解基团的硅烷单体);并且当u=3时,则表示硅烷单体为单官能性硅烷单体(亦即具有一个可水解基团的硅烷单体)。值得一提的是,所述可水解基团是指可以进行水解反应并且与硅键结的基团,举例来说,可水解基团例如是烷氧基、酰氧基(acyloxy group)或苯氧基(phenoxygroup)。
由式(I-2)表示的硅烷单体的具体例包括但不限于:
(1)四官能性硅烷单体:四甲氧基硅烷(tetramethoxysilane)、四乙氧基硅烷(tetraethoxysilane)、四乙酰氧基硅烷(tetraacetoxysilane)或四苯氧基硅烷等(tetraphenoxy silane);
(2)三官能性硅烷单体:甲基三甲氧基硅烷(methyltrimethoxysilane,简称MTMS)、甲基三乙氧基硅烷(methyltriethoxysilane)、甲基三异丙氧基硅烷(methyltriisopropoxysilane)、甲基三正丁氧基硅烷(methyltri-n-butoxysilane)、乙基三甲氧基硅烷(ethyltrimethoxysilane)、乙基三乙氧基硅烷(ethyltriethoxysilane)、乙基三异丙氧基硅烷(ethyltriisopropoxysilane)、乙基三正丁氧基硅烷(ethyltri-n-butoxysilane)、正丙基三甲氧基硅烷(n-propyltrimethoxysilane)、正丙基三乙氧基硅烷(n-propyltriethoxysilane)、正丁基三甲氧基硅烷(n-butyltrimethoxysilane)、正丁基三乙氧基硅烷(n-butyltriethoxysilane)、正己基三甲氧基硅烷(n-hexyltrimethoxysilane)、正己基三乙氧基硅烷(n-hexyltriethoxysilane)、癸基三甲氧基硅烷(decyltrimethoxysilane)、乙烯基三甲氧基硅烷(vinyltrimethoxysilane)、乙烯基三乙氧基硅烷(vinyltriethoxysilane)、苯基三甲氧基硅烷(phenyltrimethoxysilane,PTMS)、苯基三乙氧基硅烷(phenyltriethoxysilane,PTES)、对-羟基苯基三甲氧基硅烷(p-hydroxyphenyltrimethoxysilane)、1-(对-羟基苯基)乙基三甲氧基硅烷(1-(p-hydroxyphenyl)ethyltrimethoxysilane)、2-(对-羟基苯基)乙基三甲氧基硅烷(2-(p-hydroxyphenyl)ethyltrimethoxysilane)、4-羟基-5-(对-羟基苯基羰氧基)戊基三甲氧基硅烷(4-hydroxy-5-(p-hydroxyphenylcarbonyloxy)pentyltrimethoxysilane)、三氟甲基三甲氧基硅烷(trifluoromethyltrimethoxysilane)、三氟甲基三乙氧基硅烷(trifluoromethyltriethoxysilane)、3,3,3-三氟丙基三甲氧基硅烷(3,3,3-trifluoropropyltrimethoxysilane)、3-胺丙基三甲氧基硅烷(3-aminopropyltrimethoxysilane)、3-胺丙基三乙氧基硅烷(3-aminopropyltriethoxysilane)、3-巯丙基三甲氧基硅烷、3-丙烯酰氧基丙基三甲氧基硅烷、3-甲基丙烯酰氧基丙基三甲氧基硅烷或3-甲基丙烯酰氧基丙基三乙氧基硅烷;
(3)二官能性硅烷单体:二甲基二甲氧基硅烷(dimethyldimethoxysilane,简称DMDMS)、二甲基二乙氧基硅烷(dimethyldiethoxysilane)、二甲基二乙酰氧基硅烷(dimethyldiacetyloxysilane)、二正丁基二甲氧基硅烷(di-n-butyldimethoxysilane)或二苯基二甲氧基硅烷(diphenyldimethoxysilane);或
(4)单官能性硅烷单体:三甲基甲氧基硅烷(trimethylmethoxysilane)或三正丁基乙氧基硅烷(tri-n-butylethoxysilane)等。
所述的各种硅烷单体可单独使用或组合多种来使用。
所述硅氧烷预聚物(a-3)是由式(I-3)所示的化合物。
式(I-3)中,Re、Rf、Rg及Rh各自独立表示氢原子、碳数为1至10的烷基、碳数为2至6的烯基或碳数为6至15的芳香基,其中所述烷基、烯基及芳香基中任一者可选择地含有取代基;Ri与Rj各自独立表示氢原子、碳数为1至6的烷基、碳数为1至6的酰基或碳数为6至15的芳香基,其中所述烷基、酰基及芳香基中任一者可选择地含有取代基;及s表示1至1000的整数。
更详细而言,当式(I-3)中的Re、Rf、Rg及Rh各自独立表示碳数为1至10的烷基时,具体而言,Re、Rf、Rg及Rh例如各自独立为甲基、乙基或正丙基。当式(I-3)中的Re、Rf、Rg及Rh各自独立表示碳数为2至10的烯基时,具体而言,Re、Rf、Rg及Rh例如各自独立为乙烯基、丙烯酰氧基丙基或甲基丙烯酰氧基丙基。当式(I-3)中的Re、Rf、Rg及Rh各自独立表示碳数为6至15的芳香基时,具体而言,Re、Rf、Rg及Rh例如各自独立为苯基、甲苯基或萘基。又,所述烷基、烯基及芳香基中任一者可以具有其他取代基。
另外,当式(I-3)的Ri与Rj各自独立表示碳数为1至6的烷基时,具体而言,Ri与Rj例如各自独立为甲基、乙基、正丙基、异丙基或正丁基。当式(I-3)的Ri与Rj各自独立表示碳数为1至6的酰基时,具体而言,Ri与Rj例如是乙酰基。当式(I-3)中的Ri与Rj各自独立表示碳数为6至15的芳香基时,具体而言,Ri与Rj例如是苯基。其中,上述烷基、酰基及芳香基中任一者可选择地具有取代基。
式(I-3)中,s可为1至1000的整数,较佳为3至300的整数,更佳为5至200的整数。当s为2至1000的整数时,Re各自为相同或不同的基团,且Rf各自为相同或不同的基团。
所述硅氧烷预聚物(a-3)的具体例包括但不限于:1,1,3,3-四甲基-1,3-二甲氧基二硅氧烷、1,1,3,3-四甲基-1,3-二乙氧基二硅氧烷、1,1,3,3-四乙基-1,3-二乙氧基二硅氧烷或者由吉来斯特(Gelest)公司制造的末端为硅烷醇的聚硅氧烷(Silanol terminatedpolydimethylsiloxane)的市售品(商品名如DMS-S12(分子量400至700)、DMS-S15(分子量1500至2000)、DMS-S21(分子量4200)、DMS-S27(分子量18000)、DMS-S31(分子量26000)、DMS-S32(分子量36000)、DMS-S33(分子量43500)、DMS-S35(分子量49000)、DMS-S38(分子量58000)、DMS-S42(分子量77000)或PDS-9931(分子量1000至1400))。
所述硅氧烷预聚物(a-3)可单独使用或组合多种来使用。
所述二氧化硅粒子(a-4)的平均粒径并无特别的限制。平均粒径的范围为2nm至250nm,较佳为5nm至200nm,且更佳为10nm至100nm。
所述二氧化硅粒子(a-4)的具体例包括但不限于:由触媒化成公司所制造的市售品,商品名如OSCAR 1132(粒径12nm;分散剂为甲醇)、OSCAR 1332(粒径12nm;分散剂为正丙醇)、OSCAR 105(粒径60nm;分散剂为γ-丁内酯)、OSCAR 106(粒径120nm;分散剂为二丙酮醇)等、由扶桑化学公司所制造的市售品,商品名如Quartron PL-1-IPA(粒径13nm;分散剂为异丙酮)、Quartron PL-1-TOL(粒径13nm;分散剂为甲苯)、Quartron PL-2L-PGME(粒径18nm;分散剂为丙二醇单甲醚)或Quartron PL-2L-MEK(粒径18nm;分散剂为甲乙酮)等、或由日产化学公司所制造的市售品,商品名如IPA-ST(粒径12nm;分散剂为异丙醇)、EG-ST(粒径12nm;分散剂为乙二醇)、IPA-ST-L(粒径45nm;分散剂为异丙醇)或IPA-ST-ZL(粒径100nm;分散剂为异丙醇)。二氧化硅粒子可单独使用或组合多种来使用。
所述聚硅氧烷(A)可使用硅烷单体进行聚缩合来合成,或是使用硅烷单体及其他可聚合用的化合物进行聚缩合来合成。一般而言,上述聚缩合反应是以下列步骤来进行:在硅烷单体中添加溶剂、水,或可选择性地添加触媒(catalyst);以及于50℃至150℃下加热搅拌0.5小时至120小时,且可进一步通过蒸馏(distillation)除去副产物(醇类、水等)。
聚缩合反应所使用的溶剂并没有特别限制,且所述溶剂可与本发明的正型感光性聚硅氧烷组成物所包括的溶剂(C)相同或不同。基于硅烷单体的总量为100重量份,溶剂的使用量较佳为15重量份至1200重量份;更佳为20重量份至1100重量份;进而更佳为30重量份至1000重量份。
基于硅烷单体的可水解基团为1摩尔,聚缩合反应所使用的水(亦即用于水解的水)较佳为0.5摩尔至2摩尔。
聚缩合反应所使用的触媒没有特别的限制,且较佳为选自酸触媒或碱触媒。酸触媒的具体例包括但不限于盐酸、硝酸、硫酸、氢氟酸(hydrofluoric acid)、草酸、磷酸、醋酸、三氟醋酸、蚁酸、多元羧酸或其酸酐或离子交换树脂等。碱触媒的具体例包括但不限于二乙胺、三乙胺、三丙胺、三丁胺、三戊胺、三己胺、三庚胺、三辛胺、二乙醇胺、三乙醇胺、氢氧化钠、氢氧化钾、含有胺基的具有烷氧基的硅烷或离子交换树脂等。
基于硅烷单体的总量为100重量份,触媒的使用量较佳为0.005重量份至15重量份;更佳为0.01重量份至12重量份;进而更佳为0.05重量份至10重量份。
基于稳定性(stability)的观点,所述聚硅氧烷(A)较佳为不含副产物(如醇类或水)及触媒。因此,可选择性地将聚缩合反应后的反应混合物进行纯化(purification)来获得所述聚硅氧烷(A)。纯化的方法无特别限制,较佳为可使用疏水性溶剂(hydrophobicsolvent)稀释反应混合物。接着,将疏水性溶剂与反应混合物转移至分液漏斗(separationfunnel)。然后,以水洗涤有机层数回,再以旋转蒸发器(rotary evaporator)浓缩有机层,以除去醇类或水。另外,可使用离子交换树脂除去触媒。
所述聚硅氧烷(A)可并用其他碱可溶性树脂。所述其他碱可溶性树脂的种类并没有特别限制,可包括但不限于含羧酸基或羟基的树脂。其他碱可溶性树脂的具体例包括:丙烯酸系(Acrylic)系树脂、茀(fluorene)系树脂、胺基甲酸脂(urethane)系树脂或酚醛清漆(novolac)型树脂。
所述丙烯酸系树脂较佳由含一个或一个以上的不饱和羧酸或不饱和羧酸酐化合物及/或其他不饱和化合物在适当的聚合起始剂存在下于溶剂中所共聚合而得。
所述不饱和羧酸或不饱和羧酸酐化合物的具体例包括丙烯酸(AA)、甲基丙烯酸、丁烯酸、2-氯丙烯酸、乙基丙烯酸、肉桂酸、2-丙烯酰乙氧基丁二酸酯、2-甲基丙烯酰乙氧基丁二酸酯(HOMS)或2-异丁烯酰乙氧基丁二酸酯等的不饱和一元羧酸类;马来酸、马来酸酐、富马酸、衣康酸、衣康酸酐、柠康酸或柠康酸酐等、不饱和二元羧酸(酐)类、三价以上的不饱和多元羧酸(酐)类;较佳地,所述不饱和羧酸或不饱和羧酸酐化合物为丙烯酸、甲基丙烯酸、2-丙烯酰乙氧基丁二酸酯、2-甲基丙烯酰乙氧基丁二酸酯或2-异丁烯酰乙氧基丁二酸酯。上述含一个或一个以上不饱和羧酸或不饱和羧酸酐化合物可单独使用或组合多种来使用,以提高颜料分散性、增进显影速度并减少残渣发生。
所述其他不饱和化合物的具体例包括:苯乙烯(SM)、α-甲基苯乙烯、乙烯基甲苯、对氯苯乙烯、甲氧基苯乙烯等的芳香族乙烯基化合物;N-苯基马来酰亚胺、N-邻-羟基苯基马来酰亚胺、N-间-羟基苯基马来酰亚胺、N-对-羟基苯基马来酰亚胺、N-邻-甲基苯基马来酰亚胺、N-间-甲基苯基马来酰亚胺、N-对-甲基苯基马来酰亚胺、N-邻-甲氧基苯基马来酰亚胺、N-间-甲氧基苯基马来酰亚胺、N-对-甲氧基苯基马来酰亚胺、N-环己基马来酰亚胺等马来酰亚胺类;丙烯酸甲酯、甲基丙烯酸甲酯、丙烯酸乙酯、甲基丙烯酸乙酯、丙烯酸正丙酯、甲基丙烯酸正丙酯、丙烯酸异丙酯、甲基丙烯酸异丙酯、丙烯酸正丁酯、甲基丙烯酸正丁酯、丙烯酸异丁酯、甲基丙烯酸异丁酯、丙烯酸第二丁酯、甲基丙烯酸第二丁酯、丙烯酸第三丁酯、甲基丙烯酸第三丁酯、丙烯酸2-羟基乙酯、甲基丙烯酸2-羟基乙酯、丙烯酸2-羟基丙酯、甲基丙烯酸2-羟基丙酯、丙烯酸3-羟基丙酯、甲基丙烯酸3-羟基丙酯、丙烯酸2-羟基丁酯、甲基丙烯酸2-羟基丁酯、丙烯酸3-羟基丁酯、甲基丙烯酸3-羟基丁酯、丙烯酸4-羟基丁酯、甲基丙烯酸4-羟基丁酯、丙烯酸烯丙酯、甲基丙烯酸烯丙酯、丙烯酸苯甲酯、甲基丙烯酸苯甲酯(BzMA)、丙烯酸苯酯、甲基丙烯酸苯酯、丙烯酸三乙二醇甲氧酯、甲基丙烯酸三乙二醇甲氧酯、甲基丙烯酸十二烷基酯、甲基丙烯酸十四烷基酯、甲基丙烯酸十六烷基酯、甲基丙烯酸十八烷基酯、甲基丙烯酸二十烷基酯、甲基丙烯酸二十二烷基酯、丙烯酸双环戊烯基氧化乙酯(dicyclopentenyloxyethyl acrylate;DCPOA)等的不饱和羧酸酯类;丙烯酸N,N-二甲基胺基乙酯、甲基丙烯酸N,N-二甲基胺基乙酯、丙烯酸N,N-二乙基胺基丙酯、甲基丙烯酸N,N-二甲基胺基丙酯、丙烯酸N,N-二丁基胺基丙酯、甲基丙烯酸N,异-丁基胺基乙酯;丙烯酸环氧丙基酯、甲基丙烯酸环氧丙基酯(GMA)等不饱和羧酸环氧丙基酯类;乙酸乙烯酯、丙酸乙烯酯、丁酸乙烯酯等的羧酸乙烯酯类;乙烯基甲醚、乙烯基乙醚、烯丙基环氧丙基醚、甲代烯丙基环氧丙基醚等不饱和醚类;丙烯腈、甲基丙烯腈、2-氯丙烯腈、氰化亚乙烯等的氰化乙烯基化合物;丙烯酰胺、甲基丙烯酰胺、2-氯丙烯酰胺、N-羟乙基丙烯酰胺、N-羟乙基甲基丙烯酰胺等的不饱和酰胺;1,3-丁二烯、异戊烯、氯化丁二烯等的脂肪族共轭二烯类。
所述茀系树脂的具体例包括V259ME、V259MEGTS或V500MEGT(新日铁化学制),所述茀系树脂可单独使用或组合多种来使用。
所述胺基甲酸脂系树脂的具体例包括UN-904、UN-952、UN-333或UN1255(根上工业株式会社制),所述胺基甲酸脂系树脂可单独使用或组合多种来使用。
所述酚醛清漆型树脂的具体例包括EP4020G、EP4080G、TR40B45G或EP30B50(旭有机材工业株式会社制),所述酚醛清漆型树脂可单独使用或组合多种来使用。
所述聚硅氧烷(A)的重量平均分子量为3000至15000,较佳为3500至12000,更佳为4000至10000。
根据本发明的邻萘醌二叠氮磺酸酯(B)的种类没有特别的限制,可使用一般所使用的邻萘醌二叠氮磺酸酯,惟其可达到本发明所述的目的即可。所述邻萘醌二叠氮磺酸酯(B)可为完全酯化(completely esterify)或部分酯化(partially esterify)的酯类化合物(ester-based compound)。
所述邻萘醌二叠氮磺酸酯(B)较佳为由邻萘醌二叠氮磺酸(o-naphthoquinonediazidesulfonic acid)或其盐类与羟基化合物反应来制备。邻萘醌二叠氮磺酸酯(B)更佳为由邻萘醌二叠氮磺酸或其盐类与多元羟基化合物(polyhydroxycompound)反应来制备。
所述邻萘醌二叠氮磺酸(B)的具体例包括但不限于邻萘醌二叠氮-4-磺酸、邻萘醌二叠氮-5-磺酸或邻萘醌二叠氮-6-磺酸等。此外,邻萘醌二叠氮磺酸的盐类例如是邻萘醌二叠氮磺酰基卤化物(diazonaphthoquinone sulfonyl halide)。
所述羟基化合物的具体例包括但不限于羟基二苯甲酮类化合物、羟基芳基类化合物、(羟基苯基)烃类化合物、其他芳香族羟基类化合物,或上述化合物的组合。
所述羟基二苯甲酮类化合物(hydroxybenzophenone-based compound)的具体例包括但不限于2,3,4-三羟基二苯甲酮、2,4,4'-三羟基二苯甲酮、2,4,6-三羟基二苯甲酮、2,3,4,4'-四羟基二苯甲酮、2,4,2',4'-四羟基二苯甲酮、2,4,6,3',4'-五羟基二苯甲酮、2,3,4,2',4'-五羟基二苯甲酮、2,3,4,2',5'-五羟基二苯甲酮、2,4,5,3',5'-五羟基二苯甲酮或2,3,4,3',4',5'-六羟基二苯甲酮等。
所述羟基芳基类化合物(hydroxyaryl-based compound)的具体例包括但不限于由式(b-1)表示的羟基芳基类化合物。
式(b-1)中,B1及B2各自独立表示氢原子、卤素原子或碳数为1至6烷基;B3、B4及B7各自独立表示氢原子或碳数为1至6的烷基;B5、B6、B8、B9、B10及B11各自独立表示氢原子、卤素原子、碳数为1至6的烷基、碳数为1至6的烷氧基、碳数为1至6的烯基或环烷基(cycloalkyl);及h、i及j各自独立表示1至3的整数;k表示0或1。
具体而言,由式(b-1)表示的羟基芳基类化合物的具体例包括但不限于三(4-羟基苯基)甲烷、双(4-羟基-3,5-二甲基苯基)-4-羟基苯基甲烷、双(4-羟基-3,5-二甲基苯基)-3-羟基苯基甲烷、双(4-羟基-3,5-二甲基苯基)-2-羟基苯基甲烷、双(4-羟基-2,5-二甲基苯基)-4-羟基苯基甲烷、双(4-羟基-2,5-二甲基苯基)-3-羟基苯基甲烷、双(4-羟基-2,5-二甲基苯基)-2-羟基苯基甲烷、双(4-羟基-3,5-二甲基苯基)-3,4-二羟基苯基甲烷、双(4-羟基-2,5-二甲基苯基)-3,4-二羟基苯基甲烷、双(4-羟基-3,5-二甲基苯基)-2,4-二羟基苯基甲烷、双(4-羟基-2,5-二甲基苯基)-2,4-二羟基苯基甲烷、双(4-羟基苯基)-3-甲氧基-4-羟基苯基甲烷、双(3-环己基-4-羟基苯基)-3-羟基苯基甲烷、双(3-环己基-4-羟基苯基)-2-羟基苯基甲烷、双(3-环己基-4-羟基苯基)-4-羟基苯基甲烷、双(3-环己基-4-羟基-6-甲基苯基)-2-羟基苯基甲烷、双(3-环己基-4-羟基-6-甲基苯基)-3-羟基苯基甲烷、双(3-环己基-4-羟基-6-甲基苯基)-4-羟基苯基甲烷、双(3-环己基-4-羟基-6-甲基苯基)-3,4-二羟基苯基甲烷、双(3-环己基-6-羟基苯基)-3-羟基苯基甲烷、双(3-环己基-6-羟基苯基)-4-羟基苯基甲烷、双(3-环己基-6-羟基苯基)-2-羟基苯基甲烷、双(3-环己基-6-羟基-4-甲基苯基)-2-羟基苯基甲烷、双(3-环己基-6-羟基-4-甲基苯基)-4-羟基苯基甲烷、双(3-环己基-6-羟基-4-甲基苯基)-3,4-二羟基苯基甲烷、1-[1-(4-羟基苯基)异丙基]-4-[1,1-双(4-羟基苯基)乙基]苯、1-[1-(3-甲基-4-羟基苯基)异丙基]-4-[1,1-双(3-甲基-4-羟基苯基)乙基]苯,或上述化合物的组合。
所述(羟基苯基)烃类化合物((hydroxyphenyl)hydrocarbon compound)的具体例包括但不限于由式(b-2)表示的(羟基苯基)烃类化合物。
式(b-2)中,B12与B13各自独立表示氢原子或碳数为1至6的烷基;及m及n各自独立表示1至3的整数。
具体而言,由式(b-2)表示的(羟基苯基)烃类化合物的具体例包括但不限于2-(2,3,4-三羟基苯基)-2-(2',3',4'-三羟基苯基)丙烷、2-(2,4-二羟基苯基)-2-(2',4'-二羟基苯基)丙烷、2-(4-羟基苯基)-2-(4'-羟基苯基)丙烷、双(2,3,4-三羟基苯基)甲烷或双(2,4-二羟基苯基)甲烷等。
所述其他芳香族羟基类化合物的具体例包括但不限于苯酚(phenol)、对-甲氧基苯酚、二甲基苯酚、对苯二酚、双酚A、萘酚、邻苯二酚、1,2,3-苯三酚甲醚、1,2,3-苯三酚-1,3-二甲基醚、3,4,5-三羟基苯甲酸、4,4'-[1-[4[-1-(4-羟基苯基)-1-甲基乙基]苯基]亚乙基]双酚、或者部分酯化或部分醚化(etherify)的3,4,5-三羟基苯甲酸等。
所述羟基化合物较佳为1-[1-(4-羟基苯基)异丙基]-4-[1,1-双(4-羟基苯基)乙基]苯、2,3,4-三羟基二苯甲酮、2,3,4,4'-四羟基二苯甲酮或其组合。羟基化合物可单独使用或组合多种来使用。
所述邻萘醌二叠氮磺酸或其盐类与羟基化合物的反应通常在二氧杂环己烷(dioxane)、N-吡咯烷酮(N-pyrrolidone)或乙酰胺(acetamide)等有机溶剂中进行。此外,上述反应较佳为在三乙醇胺、碱金属碳酸盐或碱金属碳酸氢盐等碱性缩合剂(condensingagent)进行。
所述邻萘醌二叠氮磺酸酯(B)的酯化度(degree of esterification)较佳为50%以上,亦即基于羟基化合物中的羟基总量为100摩尔百分率(mol%),羟基化合物中有50mol%以上的羟基与邻萘醌二叠氮磺酸或其盐类进行酯化反应。邻萘醌二叠氮磺酸酯(B)的酯化度更佳为60%以上。
所述邻萘醌二叠氮磺酸酯(B)的具体例较佳为由4,4'-[1-[4[-1-(4-羟基苯基)-1-甲基乙基]苯基]亚乙基]双酚与邻萘醌二叠氮-5-磺酸所形成的邻萘醌二叠氮磺酸酯、2,3,4-三羟基二苯甲酮与邻萘醌二叠氮-5-磺酸所形成的邻萘醌二叠氮磺酸酯以及2-(2,3,4-三羟基苯基)-2-(2',3',4'-三羟基苯基)丙烷与邻萘醌二叠氮-5-磺酸所形成的邻萘醌二叠氮磺酸酯,但不以此为限。
基于所述聚硅氧烷(A)的使用量为100重量份,所述邻萘醌二叠氮磺酸酯(B)的使用量为5重量份至50重量份;较佳为8至45重量份;且更佳为10至40重量份。
根据本发明的溶剂(C)的种类没有特别的限制。所述溶剂(C)例如是含醇式羟基(alcoholic hydroxy)的化合物或含羰基(carbonyl group)的环状化合物等。
所述含醇式羟基的化合物的具体例包括但不限于丙酮醇(acetol)、3-羟基-3-甲基-2-丁酮(3-hydroxy-3-methyl-2-butanone)、4-羟基-3-甲基-2-丁酮(4-hydroxy-3-methyl-2-butanone)、5-羟基-2-戊酮(5-hydroxy-2-pentanone)、4-羟基-4-甲基-2-戊酮(4-hydroxy-4-methyl-2-pentanone)(亦称为二丙酮醇(diacetone alcohol,DAA))、乳酸乙酯(ethyl lactate)、乳酸丁酯(butyl lactate)、丙二醇单甲醚propylene glycolmonomethyl ether)、丙二醇单乙醚(propylene glycol monoethyl ether,PGEE)、丙二醇单甲醚醋酸酯(propylene glycol monomethyl ether acetate,PGMEA)、丙二醇单正丙醚(propylene glycol mono-n-propyl ether)、丙二醇单正丁醚(propylene glycol mono-n-butyl ether)、丙二醇单第三丁醚(propylene glycol mono-t-butyl ether)、3-甲氧基-1-丁醇(3-methoxy-1-butanol)、3-甲基-3-甲氧基-1-丁醇(3-methyl-3-methoxy-1-butanol)或其组合。值得注意的是,含醇式羟基的化合物较佳为二丙酮醇、乳酸乙酯、丙二醇单乙醚、丙二醇单甲醚醋酸酯或其组合。含醇式羟基的化合物可单独使用或组合多种来使用。
所述含羰基的环状化合物的具体例包括但不限于γ-丁内酯(γ-butyrolactone)、γ-戊内酯(γ-valerolactone)、δ-戊内酯(δ-valerolactone)、碳酸丙烯酯(propylene carbonate)、氮-甲基吡咯烷酮(N-methyl pyrrolidone)、环己酮(cyclohexanone)或环庚酮(cycloheptanone)等。值得注意的是,含羰基的环状化合物较佳为γ-丁内酯、氮-甲基吡咯烷酮、环己酮或其组合。含羰基的环状化合物可单独使用或组合多种来使用。
所述含醇式羟基的化合物可与含羰基的环状化合物组合使用,且其重量比率没有特别限制。含醇式羟基的化合物与含羰基的环状化合物的重量比值较佳为99/1至50/50;更佳为95/5至60/40。值得一提的是,当在溶剂(C)中,含醇式羟基的化合物与含羰基的环状化合物的重量比值为99/1至50/50时,聚硅氧烷(A)中未反应的硅烷醇(silanol,Si-OH)基不易产生缩合反应而降低贮藏稳定性(storage stability)。此外,由于含醇式羟基的化合物以及含羰基的环状化合物与邻萘醌二叠氮磺酸酯(B)的相容性佳,因此于涂布成膜时不易有白化的现象,可维持保护膜的透明性。
在不损及本发明的效果的范围内,所述溶剂(C)亦可以含有其他溶剂。所述其他溶剂例如是:(1)酯类:醋酸乙酯、醋酸正丙酯、醋酸异丙酯、醋酸正丁酯、醋酸异丁酯、丙二醇单甲醚醋酸酯、3-甲氧基-1-醋酸丁酯或3-甲基-3-甲氧基-1-醋酸丁酯等;(2)酮类:丙酮、甲基乙基酮、甲基丙基酮、甲基异丙基酮、甲基丁基酮、甲基异丁基酮、甲基正己基酮、二乙基酮、二异丙基酮、二异丁基酮、环戊酮、环己酮、环庚酮、甲基环己酮、乙酰丙酮、二丙酮醇或环己烯-1-酮等;或者(3)醚类:二乙醚、二异丙醚、二正丁醚或二苯醚等。
所述溶剂(C)可单独使用或组合多种来使用。
基于所述聚硅氧烷(A)的使用量为100重量份,所述溶剂(C)的使用量为100至600重量份;较佳为120至550重量份;且更佳为150至500重量份。
据本发明的膦类化合物(D)包括至少一选自由三烷基膦化合物、三芳基膦化合物及膦盐所组成的群组。
根据本发明的膦类化合物(D)的具体例包括三甲基膦、三乙基膦、三丙基膦、三丁基膦、三戊基膦、三己基膦、三庚基膦、三辛基膦、三环己基膦等三烷基膦化合物;三苯基膦、三甲苯基膦(tritolylphosphine)、三二甲苯基膦(trixylylphosphine)、三联苯基膦(tribiphenylphosphine)、三萘基膦(trinaphthylphosphine)、三蒽基膦(trianthrylphosphine)、三菲基膦(triphenanthrylphosphine)等三芳基膦化合物;乙基三苯基溴化膦(ethyl triphenylphosphonium bromide)、四苯基溴化膦(tetraphenylphosphonium bromide)及苄基三苯基氯化膦(benzyl triphenyl-phosphonium chloride)等膦盐。
基于所述聚硅氧烷(A)的使用量为100重量份,所述膦类化合物(D)的使用量为0.1重量份至3.0重量份;较佳为0.15至2.5重量份;且更佳为0.2至2.0重量份。当未使用所述膦类化合物(D)时,则会耐热性不佳的问题。
于本发明的较佳具体例中,该正型感光性聚硅氧烷组成物另包含一以第四族元素的氧化物为主成分的无机粒子(E)。根据本发明的所述以第四族元素的氧化物为主成分的无机粒子(E)的种类没有特别的限制,所述无机粒子(E)中的氧化物包括氧化钛、氧化锆、氧化铪、氧化鈩或由这些金属氧化物与氧化硅或氧化锡所形成的复合粒子。就所形成的保护膜的耐热性的观点而言,氧化物较佳为氧化钛或氧化锆,亦即,以第四族元素的氧化物为主成分的无机粒子(E)的第四族元素较佳为钛或锆。
氧化钛同时存在锐钛矿型(Anatase)和金红石型(Rutile)两种结晶形式,其中,因为金红石型具有高折射率与优异的耐光性而为较佳。
氧化钛可以使用市售氧化钛粒子,例如是NanoTek TiO2(分散剂为甲基异丁基酮,锐钛矿型,由日本C.I.Kasei制造)、批号:S111109(分散剂为乙氧基乙醇,金红石型,由韩国NanoCMS制造)、Red Lake系列(分散剂为甲醇,锐钛矿型,由日本日挥触媒化成制造)、TS系列(分散剂为甲基乙基酮,金红石型,由Tayca制造)。所述氧化锆可以使用市售氧化锆粒子,例如是HXU-120JC(分散剂为甲基乙基酮,由日本大阪水泥有限公司(Osaka Cement Co.)制造)。
以第四族元素的氧化物为主成分的无机粒子(E)可为粉末形式或是将氧化物颗粒分散于分散介质中的分散溶胶形式。所述分散介质例如是甲醇、甲基乙基酮、甲基异丁基酮、环己酮、N-甲基-2-吡咯烷酮、丙二醇单甲基醚或乙氧基乙醇等。
以第四族元素的氧化物为主成分的无机粒子(E)的粒径分布为1nm至75nm。当粒径小于1nm时,所形成的保护膜容易发生二次凝集,并可能产生白化;当粒径大于75nm时,则可能影响所形成的保护膜表面的均匀性。所述无机粒子(E)的粒径分布较佳为3nm至50nm;更佳为5nm至30nm。粒径的测量方法可为现有测量方法,例如通过动态光散射仪(photoncorrelation spectroscopy,PCS)量测。
基于所述聚硅氧烷(A)的使用量为100重量份,所述无机粒子(E)的使用量为30至300重量份;较佳为40重量份至280重量份;且更佳为50重量份至250重量份。当使用所述无机粒子(E)时,可进一步改善耐热性。
根据本发明的正型感光性聚硅氧烷组成物可选择性地进一步添加添加剂(F)。具体而言,所述添加剂(F)例如是增感剂(sensitizer)、密着助剂(adhesion auxiliaryagent)、界面活性剂(surfactant)、溶解促进剂(solubility promoter)、消泡剂(defoamer)或其组合。
所述增感剂的种类并无特别的限制。增感剂较佳为使用含有酚式羟基(phenolichydroxy)的化合物,其中含有酚式羟基的化合物的具体例包括但不限于三苯酚型化合物、双苯酚型化合物、多核分枝型化合物、缩合型苯酚化合物、多羟基二苯甲酮类或上述化合物的组合。
所述三苯酚型化合物(trisphenol type compound)的具体例包括但不限于三(4-羟基苯基)甲烷、双(4-羟基-3-甲基苯基)-2-羟基苯基甲烷、双(4-羟基-2,3,5-三甲基苯基)-2-羟基苯基甲烷、双(4-羟基-3,5-二甲基苯基)-4-羟基苯基甲烷、双(4-羟基-3,5-二甲基苯基)-3-羟基苯基甲烷、双(4-羟基-3,5-甲基苯基)-2-羟基苯基甲烷、双(4-羟基-2,5-二甲基苯基)-4-羟基苯基甲烷、双(4-羟基-2,5-二甲基苯基)-3-羟基苯基甲烷、双(4-羟基-2,5-二甲基苯基)-2-羟基苯基甲烷、双(4-羟基-3,5-二甲基苯基)-3,4-二羟基苯基甲烷、双(4-羟基-2,5-二甲基苯基)-3,4-二羟基苯基甲烷、双(4-羟基-2,5-二甲基苯基)-2,4-二羟基苯基甲烷、双(4-羟基苯基)-3-甲氧基-4-羟基苯基甲烷、双(5-环己基-4-羟基-2-甲基苯基)-4-羟基苯基甲烷、双(5-环己基-4-羟基-2-甲基苯基)-3-羟基苯基甲烷、双(5-环己基-4-羟基-2-甲基苯基)-2-羟基苯基甲烷或双(5-环己基-4-羟基-2-甲基苯基)-3,4-二羟基苯基甲烷。
所述双苯酚型化合物(bisphenol type compound)的具体例包括但不限于双(2,3,4-三羟基苯基)甲烷、双(2,4-二羟基苯基)甲烷、2,3,4-三羟基苯基-4'-羟基苯基甲烷、2-(2,3,4-三羟基苯基)-2-(2',3',4'-三羟基苯基)丙烷、2-(2,4-二羟基苯基)-2-(2',4'-二羟基苯基)丙烷、2-(4-羟基苯基)-2-(4'-羟基苯基)丙烷、2-(3-氟基-4-羟基苯基)-2-(3'-氟基-4'-羟基苯基)丙烷、2-(2,4-二羟基苯基)-2-(4'-羟基苯基)丙烷、2-(2,3,4-三羟基苯基)-2-(4'-羟基苯基)丙烷或2-(2,3,4-三羟基苯基)-2-(4'-羟基-3',5'-二甲基苯基)丙烷等。
所述多核分枝型化合物(polynuclear branched compound)的具体例包括但不限于1-[1-(4-羟基苯基)异丙基]-4-[1,1-双(4-羟基苯基)乙基]苯或1-[1-(3-甲基-4-羟基苯基)异丙基]-4-[1,1-双(3-甲基-4-羟基苯基)乙基]苯等。
所述缩合型苯酚化合物(condensation type phenol compound)的具体例包括但不限于1,1-双(4-羟基苯基)环己烷等。
所述多羟基二苯甲酮类(polyhydroxy benzophenone)的具体例包括但不限于2,3,4-三羟基二苯甲酮、2,4,4'-三羟基二苯甲酮、2,4,6-三羟基二苯甲酮、2,3,4-三羟基-2'-甲基二苯甲酮、2,3,4,4'-四羟基二苯甲酮、2,4,2',4'-四羟基二苯甲酮、2,4,6,3',4'-五羟基二苯甲酮、2,3,4,2',4'-五羟基二苯甲酮、2,3,4,2',5'-五羟基二苯甲酮、2,4,6,3',4',5'-六羟基二苯甲酮或2,3,4,3',4',5'-六羟基二苯甲酮等。
所述密着助剂的具体例包括三聚氰胺(melamine)化合物及硅烷系化合物等。密着助剂的作用在于增加由正型感光性聚硅氧烷组成物所形成的保护膜与被保护的元件之间的密着性。
所述三聚氰胺的市售品的具体例包括由三井化学制造的商品名为Cymel-300或Cymel-303等;或者由三和化学制造的商品名为MW-30MH、MW-30、MS-11、MS-001、MX-750或MX-706等。
所述硅烷系化合物的具体例包括乙烯基三甲氧基硅烷、乙烯基三乙氧基硅烷、3-丙烯酰氧基丙基三甲氧基硅烷、乙烯基三(2-甲氧基乙氧基)硅烷、氮-(2-胺基乙基)-3-胺基丙基甲基二甲氧基硅烷、氮-(2-胺基乙基)-3-胺基丙基三甲氧基硅烷、3-胺丙基三乙氧基硅烷、3-环氧丙氧基丙基三甲氧基硅烷、3-环氧丙氧基丙基二甲基甲氧基硅烷、2-(3,4-环氧环己基)乙基三甲氧基硅烷、3-氯丙基甲基二甲氧基硅烷、3-氯丙基三甲氧基硅烷、3-甲基丙烯氧基丙基三甲氧基硅烷、3-巯丙基三甲氧基硅烷或由信越化学公司制造的市售品(商品名如KBM403)等。
所述界面活性剂的具体例包括阴离子系界面活性剂、阳离子系界面活性剂、非离子系界面活性剂、两性界面活性剂、聚硅氧烷系界面活性剂、氟系界面活性剂或其组合。
所述界面活性剂的具体例包括但不限于(1)聚环氧乙烷烷基醚类(polyoxyethylene alkyl ethers):聚环氧乙烷十二烷基醚等;(2)聚环氧乙烷烷基苯基醚类(polyoxyethylene phenyl ethers):聚环氧乙烷辛基苯基醚、聚环氧乙烷壬基苯基醚等;(3)聚乙二醇二酯类(polyethylene glycol diesters):聚乙二醇二月桂酸酯、聚乙二醇二硬酸酯等;(4)山梨糖醇酐脂肪酸酯类(sorbitan fatty acid esters);(5)经脂肪酸改质的聚酯类(fatty acid modified poly esters);及(6)经三级胺改质的聚胺基甲酸酯类(tertiary amine modified polyurethanes)等。界面活性剂的市售商品的具体例包括KP(由信越化学工业制造)、SF-8427(由道康宁东丽聚硅氧股份有限公司(Dow CorningToray Silicone Co.,Ltd.)制造)、Polyflow(由共荣社油脂化学工业制造)、F-Top(由得克姆股份有限公司制造(Tochem Products Co.,Ltd.)制造)、Megaface(由大日本印墨化学工业(DIC)制造)、Fluorade(由住友3M股份有限公司(Sumitomo 3M Ltd.)制造)、Surflon(由旭硝子制造)、SINOPOL E8008(由中日合成化学制造)、F-475(由大日本印墨化学工业制造)或其组合。
所述消泡剂的具体例包括Surfynol MD-20、Surfynol MD-30、EnviroGem AD01、EnviroGem AE01、EnviroGem AE02、Surfynol DF110D、Surfynol 104E、Surfynol 420、Surfynol DF37、Surfynol DF58、Surfynol DF66、Surfynol DF70以及Surfynol DF210(由气体产品(Air products)制造)等。
所述溶解促进剂的具体例包括氮-羟基二羧基酰亚胺化合物(N-hydroxydicarboxylic imide)以及含酚式羟基的化合物。溶解促进剂例如是邻萘醌二叠氮磺酸酯(B)中所使用的含酚式羟基的化合物。
本发明的正型感光性聚硅氧烷组成物的制备方法例如:将聚硅氧烷(A)、邻萘醌二叠氮磺酸酯(B)、溶剂(C)、催化剂(D)以及视需要的无机粒子(E)放置于搅拌器中搅拌,使其均匀混合成溶液状态,必要时亦可添加添加剂(F),予以均匀混合后,便可获得溶液状态的正型感光性聚硅氧烷组成物。
本发明亦提供一种于一基板上形成薄膜的方法,其包含使用前述的正型感光性聚硅氧烷组成物施予所述基板上。
本发明又提供一种基板上的薄膜,其是由前述的方法所制得。
根据本发明的所述薄膜,其较佳是为液晶显示元件或有机电激发光显示器中TFT基板用的平坦化膜、层间绝缘膜或光波导路的芯材或包覆材的保护膜
本发明再提供一种装置,其包含前述的薄膜。
以下将详细描述保护膜的形成方法,其依序包括:使用正型感光性聚硅氧烷组成物来形成预烤涂膜、对预烤涂膜进行图案化曝光、通过碱显影移除曝光区域以形成图案;以及进行后烤处理以形成保护膜。
形成预烤涂膜:
通过回转涂布、流延涂布或辊式涂布等涂布方式,在被保护的元件(以下称为基材)上涂布溶液状态的正型感光性聚硅氧烷组成物,以形成涂膜。
基材可以是用于液晶显示装置的无碱玻璃、钠钙玻璃、硬质玻璃(派勒斯玻璃)、石英玻璃、附着有透明导电膜的此等玻璃者,或是用于光电变换装置(如固体摄影装置)的基材(如:硅基材)。
形成涂膜之后,以减压干燥方式去除正型感光性聚硅氧烷组成物的大部分有机溶剂,然后以预烤(pre-bake)方式将残余的有机溶剂完全去除,使其形成预烤涂膜。
上述减压干燥及预烤的操作条件可依各成分的种类、配合比率而异。一般而言,减压干燥乃在0托(torr)至200托的压力下进行1秒钟至60秒钟,并且预烤乃在70℃至110℃温度下进行1分钟至15分钟。
图案化曝光:
以具有特定图案的光罩对上述预烤涂膜进行曝光。在曝光过程中所使用的光线,以g线、h线或i线等紫外线为佳,并且用来提供紫外线的设备可为(超)高压水银灯或金属卤素灯。
显影:
将经曝光的预烤涂膜浸渍于温度介于23±2℃的显影液中,进行约15秒至5分钟的显影,以去除经曝光的预烤涂膜的不需要的部分,亦即经曝光的区域溶解于显影液中,未经曝光的区域则保留,由此可在基材上形成具有预定图案的保护膜的半成品。显影液的具体例包括但不限于氢氧化钠、氢氧化钾、碳酸钠、碳酸氢钠、碳酸钾、碳酸氢钾、硅酸钠、甲基硅酸钠(sodium methylsilicate)、氨水、乙胺、二乙胺、二甲基乙醇胺、氢氧化四甲铵(THAM)、氢氧化四乙铵、胆碱、吡咯、呱啶或1,8-二氮杂双环[5.4.0]-7-十一烯等碱性化合物。
值得一提的是,显影液的浓度太高会使得特定图案损毁或造成特定图案的解析度变差;浓度太低会造成显影不良,导致特定图案无法成型或者曝光部分的组成物残留。因此,浓度的多寡会影响后续正型感光性聚硅氧烷组成物经曝光后的特定图案的形成。显影液的浓度范围较佳为0.001wt%至10wt%;更佳为0.005wt%至5wt%;再更佳为0.01wt%至1wt%。本发明的实施例是使用2.38wt%的氢氧化四甲铵的显影液。值得一提的是,即使使用浓度更低的显影液,本发明正型感光性聚硅氧烷组成物也能形成良好的微细化图案。
后烤处理:
用水清洗基材(其中基材上有预定图案的保护膜的半成品),以清除上述经曝光的预烤涂膜的不需要的部分。然后,用压缩空气或压缩氮气干燥上述具有预定图案的保护膜的半成品。最后以加热板或烘箱等加热装置对上述具有预定图案的保护膜的半成品进行后烤(post-bake)处理。加热温度设定在100℃至250℃之间,使用加热板时的加热时间为1分钟至60分钟,使用烘箱时的加热时间则为5分钟至90分钟。由此,可使上述具有预定图案的保护膜的半成品的图案固定,以形成保护膜。
举例而言,保护膜例如是以下述步骤来形成。首先,将正型感光性聚硅氧烷组成物以旋转涂布方式于素玻璃基板(100×100×0.7mm)形成上约2μm的涂膜。随后以110℃预烤2分钟后,将涂膜至于曝光机下。接着,在曝光机与涂膜间置入正光阻用光罩,并以曝光机的紫外光照射预烤涂膜,其能量为100mJ/cm2。将经曝光后的预烤涂膜浸渍于23℃的2.38%的TMAH水溶液60秒,以除去曝光的部分。接着,以清水清洗后,再以曝光机直接照射显影后的涂膜,其能量为200mJ/cm2。最后,以230℃后烤60分钟,可获得上面形成保护膜的素玻璃基板。
通过以下列实例予以详细说明本发明,但并不意味本发明仅局限于此等实例所公开的内容。
聚硅氧烷(A)的制备:
制备例1
在容积为500毫升的三颈烧瓶中,加入0.02摩尔的3-(三甲氧基硅基)丙基戊二酸酐(以下简称TMSG)、0.01摩尔的2-环氧丙烷基丁氧基丙基三甲氧基硅(以下简称TMSOX-D)、0.20摩尔的甲基三甲氧基硅烷(以下简称MTMS)、0.50摩尔的二甲基二甲氧基硅烷(以下简称DMDMS)、0.27摩尔的苯基三乙氧基硅烷(以下简称PTES)以及200克的4-羟基-4-甲基-2-戊酮(以下简称DAA),并于室温下一边搅拌一边于30分钟内添加草酸水溶液(0.35克草酸/75克水)。接着,将烧瓶浸渍于30℃的油浴中并搅拌30分钟。然后,于30分钟内将油浴升温至120℃。待溶液的温度降到110℃(亦即反应温度)时,持续加热搅拌进行聚合5小时(亦即聚缩合时间)。再接着,利用蒸馏方式将溶剂移除,即可获得聚硅氧烷(A-1)。该聚硅氧烷(A-1)的成分种类及其使用量如表1所示。
制备例2至制备例6
制备例2至制备例6的聚硅氧烷(A)是以与制备例1相同的步骤来制备,并且其不同处在于:改变聚硅氧烷(A)的成分种类及其使用量、反应温度及聚缩合时间(如表1所示)。
PTMS 苯基三甲氧基硅烷
PTES 苯基三乙氧基硅烷
TMOS 四甲氧基硅烷
TEOS 四乙氧基硅烷
DMS-S27 硅烷醇末端聚硅氧烷(Gelest公司制)
PGEE 丙二醇单乙醚
DAA 4-羟基-4-甲基-2-戊酮
正型感光性聚硅氧烷组成物的制备:
实施例1
将100重量份制备例1的聚硅氧烷(A-1)、5重量份的4,4'-[1-[4[-1-(4-羟基苯基)-1-甲基乙基]苯基]亚乙基]双酚与邻萘醌二叠氮-5-磺酸所形成的邻萘醌二叠氮磺酸酯(B-1)、0.1重量份的三丁基膦(D-1)以及100重量份的无机粒子(E-1)加入100重量份的丙二醇甲醚醋酸酯(C-1)中,并且以摇动式搅拌器(shaking type stirrer)搅拌均匀后,即可制得实施例1的正型感光性聚硅氧烷组成物。将实施例1的正型感光性聚硅氧烷组成物以后述评价方式进行评价,其结果如表2所示。
实施例2至实施例12
实施例2至实施例12的正型感光性聚硅氧烷组成物是以与实施例1相同的步骤分别制备,并且其不同处在于:改变成分的种类及其使用量,如表2所示。将实施例2至12所制得的正型感光性聚硅氧烷组成物以后述评价方式进行评价,其结果如表2所示。
比较例1至比较例2
比较例1至比较例2的正型感光性聚硅氧烷组成物是以与实施例1相同的步骤分别制备,并且其不同处在于:改变成分的种类及其使用量,如表2所示。将比较例1至比较例2所制得的正型感光性聚硅氧烷组成物以后述评价方式进行评价,其结果如表2所示。
表2
B-1 4,4'-[1-[4[-1-(4-羟基苯基)-1-甲基乙基]苯基]亚乙基]双酚与邻萘醌二叠氮-5-磺酸所形成的邻萘醌二叠氮磺酸酯
B-2 2,3,4-三羟基二苯甲酮与邻萘醌二叠氮-5-磺酸所形成的邻萘醌二叠氮磺酸酯
B-3 2-(2,3,4-三羟基苯基)-2-(2',3',4'-三羟基苯基)丙烷与邻萘醌二叠氮-5-磺酸所形成的邻萘醌二叠氮磺酸酯
C-1 丙二醇单甲醚醋酸酯
C-2 二乙二醇二甲醚
C-3 3-乙氧基丙酸乙酯
D-1 三丁基膦
D-2 三苯基膦
D-3 三甲苯基膦
D-4 四苯基溴化膦
D-5 苄基三苯基氯化膦
E-1 TiO2,平均粒径24.23nm(日本C.I.Kasei制)
E-2 ZrO2,平均粒径17.46nm(日本Osaka Cement Co.,Ltd.制)
E-3 SiO2,平均粒径60nm(触媒化成制,OSCAR 105)
F-1 SF-8427(道康宁东丽聚硅氧股份有限公司制造,界面活性剂)
F-2 KBM403(信越化学制造,密着助剂)
评价方式:
耐热性:
以Tencorα-step触针式测定仪(由美国科磊股份有限公司制造)量测保护膜的膜厚α1。接着,将保护膜在230℃烘烤180分钟后,再以Tencorα-step触针式测定仪量测膜厚α2。将所获得的膜厚α1及膜厚α2以下式计算后,即可获得残膜率(residual film ratio)。
残膜率(%)=(α2/α1)×100
根据下示准则来评价保护膜的耐热性。残膜率越高代表保护膜的耐热性越佳。
◎:残膜率≥98%
○:98%>残膜率≥95%
△:95%>残膜率≥93%
X:残膜率<93%
上述实施例仅为说明本发明的原理及其功效,而非限制本发明。所属技术领域技术人员对上述实施例所作的修改及变化仍不违背本发明的精神。本发明的保护范围应如权利要求书范围所列。
Claims (10)
1.一种正型感光性聚硅氧烷组成物,其包含:
聚硅氧烷(A);
邻萘醌二叠氮磺酸酯(B);
溶剂(C);及
膦类化合物(D);
其中,所述膦类化合物(D)包括至少一选自由三烷基膦化合物、三芳基膦化合物及膦盐所组成的群组;基于所述聚硅氧烷(A)的使用量为100重量份,所述膦类化合物(D)的使用量为0.1至3重量份;所述聚硅氧烷(A)至少是由式(I-1)所示的硅烷单体(a-1)聚缩合而得:
Si(Ra)w(ORb)4-w 式(I-1)
其中:
Ra各自独立表示氢原子、碳数为1至10的烷基、碳数为2至10的烯基、碳数为6至15的芳香基、含有酸酐基的碳数为1至10的烷基、含有环氧基的碳数为1至10的烷基或含有环氧基的烷氧基,且至少一个Ra表示含有酸酐基的碳数为1至10的烷基、含有环氧基的碳数为1至10的烷基或含有环氧基的烷氧基;
Rb各自独立表示氢原子、碳数为1至6的烷基、碳数为1至6的酰基或碳数为6至15的芳香基;及
w表示1至3的整数。
2.根据权利要求1所述的正型感光性聚硅氧烷组成物,其中,该感光性聚硅氧烷组成物进一步包含一无机粒子(E),所述无机粒子(E)是以第四族元素的氧化物为主成分。
3.根据权利要求2所述的正型感光性聚硅氧烷组成物,其中,所述无机粒子(E)中的所述第四族元素为钛或锆。
4.根据权利要求2所述的正型感光性聚硅氧烷组成物,其中,所述无机粒子(E)的粒径大小为1 nm至60 nm。
5.根据权利要求2所述的正型感光性聚硅氧烷组成物,其中,基于所述聚硅氧烷(A)的使用量为100重量份,所述无机粒子(E)的使用量为30至300重量份。
6.根据权利要求1所述的正型感光性聚硅氧烷组成物,其中,基于所述聚硅氧烷(A)的使用量为100重量份,所述邻萘醌二叠氮磺酸酯(B)的使用量为5至50重量份;及所述溶剂(C)的使用量为100至600重量份。
7.一种于一基板上形成薄膜的方法,其包含使用根据权利要求1至6中任一项所述的正型感光性聚硅氧烷组成物施予所述基板上。
8.一种基板上的薄膜,其是由权利要求7所述的方法所制得。
9.根据权利要求8所述的薄膜,其是为液晶显示元件或有机电激发光显示器中TFT基板用的平坦化膜、层间绝缘膜或光波导路的芯材或包覆材的保护膜。
10.一种液晶显示元件、有机电激发光显示器或光波导路,其包含根据权利要求8或9所述的薄膜。
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6143467A (en) * | 1998-10-01 | 2000-11-07 | Arch Specialty Chemicals, Inc. | Photosensitive polybenzoxazole precursor compositions |
JP4559048B2 (ja) * | 2003-07-24 | 2010-10-06 | ダウ・コーニング・コーポレイション | 硬化性シリコーン組成物、及びこれを用いたパターン形成方法 |
CN103226291A (zh) * | 2012-01-27 | 2013-07-31 | 株式会社田村制作所 | 紫外线固化性透明树脂组合物 |
CN104937492A (zh) * | 2013-03-07 | 2015-09-23 | 日立化成株式会社 | 感光性树脂组合物、使用其的干膜、印刷配线板及印刷配线板的制造方法 |
CN104950580A (zh) * | 2014-03-28 | 2015-09-30 | 奇美实业股份有限公司 | 感光性聚硅氧烷组合物及其应用 |
TW201542694A (zh) * | 2014-01-27 | 2015-11-16 | Nissan Chemical Ind Ltd | 鹼溶解顯影性之高折射率膜形成組成物及圖型形成方法 |
-
2016
- 2016-03-11 TW TW105107663A patent/TWI655507B/zh active
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Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6143467A (en) * | 1998-10-01 | 2000-11-07 | Arch Specialty Chemicals, Inc. | Photosensitive polybenzoxazole precursor compositions |
JP4559048B2 (ja) * | 2003-07-24 | 2010-10-06 | ダウ・コーニング・コーポレイション | 硬化性シリコーン組成物、及びこれを用いたパターン形成方法 |
CN103226291A (zh) * | 2012-01-27 | 2013-07-31 | 株式会社田村制作所 | 紫外线固化性透明树脂组合物 |
CN104937492A (zh) * | 2013-03-07 | 2015-09-23 | 日立化成株式会社 | 感光性树脂组合物、使用其的干膜、印刷配线板及印刷配线板的制造方法 |
TW201542694A (zh) * | 2014-01-27 | 2015-11-16 | Nissan Chemical Ind Ltd | 鹼溶解顯影性之高折射率膜形成組成物及圖型形成方法 |
CN104950580A (zh) * | 2014-03-28 | 2015-09-30 | 奇美实业股份有限公司 | 感光性聚硅氧烷组合物及其应用 |
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