CN107045156A - A kind of senior suppression diffraction grating of extreme ultraviolet - Google Patents
A kind of senior suppression diffraction grating of extreme ultraviolet Download PDFInfo
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- CN107045156A CN107045156A CN201710157606.XA CN201710157606A CN107045156A CN 107045156 A CN107045156 A CN 107045156A CN 201710157606 A CN201710157606 A CN 201710157606A CN 107045156 A CN107045156 A CN 107045156A
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- extreme ultraviolet
- senior
- printing opacity
- suppression
- diffraction grating
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
Abstract
This application discloses a kind of senior suppression diffraction grating of extreme ultraviolet, by opening up multiple shapes and area identical polygon printing opacity through hole on impermeable optical thin film, and polygon printing opacity through hole is set to be in quasi- triarray random distribution on the impermeable optical thin film.So that grating can effectively suppress Advanced Diffraction in visible ray, extreme ultraviolet, infrared light each wave band, including 2n, 3n, 4n, 5n grades of diffraction (n is nonzero integer), harmonic carcellation pollutes, it completely inhibit ambient noise, it is simultaneously maximized to reduce the influence of noise, resolution ratio and sensitivity are improved, simplifies technology difficulty, effective suppression for extreme ultraviolet waveband provides technology guarantee and technique is supported.
Description
This application claims submit Patent Office of the People's Republic of China, Application No. 201710154237.9, invention name on March 15th, 2017
This is hereby incorporated by reference in a kind of referred to as priority of the domestic applications of " senior suppression diffraction grating of extreme ultraviolet ", entire contents
In application.
Technical field
The present invention relates to extreme ultraviolet optical technical field, and in particular to a kind of senior suppression diffraction grating of extreme ultraviolet.
Background technology
The metal of traditional a series of parallel groove and lines composition is generally currently used for the diffraction grating of spectrometer
Film black-white grating, for measuring X-ray spectrum.It can be seen from grating equation d (sin α+sin β)=n lambda definition, diffraction spectra with
Wavelength is not one-to-one relation, the problem of there is multiorder diffractive.But in the universal diffraction analysis of diffraction grating, take the photograph spectrum
In the application such as analysis, Advanced Diffraction can be produced in the spectral region of first-order diffraction and overlapped in many cases, result in a complexity
Broadening result, upset the result of analysis, bring the error for being not easy to eliminate, restrict it and take the photograph spectrum precision, reduce whole system
Can, it is that extreme ultraviolet optics systematic research brings many difficulties.
Therefore, need badly it is a kind of can suppress the grating of Advanced Diffraction, to solve the above problems.
The content of the invention
In view of this, the present invention provides a kind of senior suppression diffraction grating of extreme ultraviolet, and to solve, prior art is middle-and-high-ranking to spread out
Penetrate to produce with first-order diffraction and overlap, bring error, cause analysis result inaccurate, take the photograph the problem of spectrum precision is reduced.
To achieve the above object, the present invention provides following technical scheme：
A kind of senior suppression diffraction grating of extreme ultraviolet, including：
Light-transmissive substrates；
Multiple shapes and area phase are offered on impermeable optical thin film in the light-transmissive substrates, the impermeable optical thin film
Same polygon printing opacity through hole；
Wherein, the polygon printing opacity through hole is in quasi- triarray random distribution on the impermeable optical thin film；
The quasi- triarray include multiple quasi- triangles, the multiple quasi- triangle be in periodic arrangement, it is described not
Light transmission film institute planar, in the first direction on, cycle of the multiple quasi- triangle is Px, in a second direction on, it is described
The cycle of multiple quasi- triangles is Py, the first direction is vertical with the second direction.
Preferably, the polygon printing opacity through hole is symmetrical hexagon printing opacity through hole.
Preferably, first direction described in the two relative edges of the symmetrical hexagon printing opacity through hole is set, and described right
The center of hexagon printing opacity through hole is called basic point using the quasi- vertex of a triangle, is f along the first direction offset distance；Its
In, f satisfactions-Px/10≤f≤Px/10。
Preferably, the length of side of the symmetrical hexagon printing opacity through hole along the first direction is a1Meet a1=Px/12；
The length of side on other four sides of the symmetrical hexagon is equal, and projected length in said first direction is a
Meet a=5Px/12。
Preferably, the material of the impermeable optical thin film includes gold, silver, aluminium, chromium, silicon, silicon nitride or carborundum.
Preferably, the thickness range of the impermeable optical thin film is 100nm-300nm, including endpoint value.
Preferably, the light-transmissive substrates are vitreous silica, glass or lucite.
Understood via above-mentioned technical scheme, the senior suppression diffraction grating of extreme ultraviolet that the present invention is provided, by impermeable
Multiple shapes and area identical polygon printing opacity through hole are opened up on optical thin film, and make polygon printing opacity through hole described light tight
It is in quasi- triarray random distribution on film.So that grating in visible ray, extreme ultraviolet, infrared light each wave band all
Advanced Diffraction can effectively be suppressed, include 2n, 3n, 4n, 5n grades of diffraction (n is nonzero integer), completely harmonic carcellation pollution, suppression
Ambient noise has been made, while maximized reduce the influence of noise, resolution ratio and sensitivity has been improved, simplifies technology difficulty,
Effective suppression for extreme ultraviolet waveband provides technology guarantee and technique is supported.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
There is the accompanying drawing used required in technology description to be briefly described, it should be apparent that, drawings in the following description are only this
The embodiment of invention, for those of ordinary skill in the art, on the premise of not paying creative work, can also basis
The accompanying drawing of offer obtains other accompanying drawings.
Fig. 1 is a kind of senior local structural graph for suppressing diffraction grating of the extreme ultraviolet of the invention provided；
Fig. 2 is the senior far-field diffraction pattern for suppressing diffraction grating of extreme ultraviolet shown in Fig. 1；
Fig. 3 is the senior diffraction characteristic figure for suppressing diffraction grating of the extreme ultraviolet of the invention provided；
Fig. 4 is the senior far field construction performance plot for suppressing diffraction grating x-axis direction of the extreme ultraviolet of the invention provided；
Fig. 5 suppresses diffraction grating preparation method flow chart for the extreme ultraviolet of the invention provided is senior.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation is described, it is clear that described embodiment is only a part of embodiment of the invention, rather than whole embodiments.It is based on
Embodiment in the present invention, it is every other that those of ordinary skill in the art are obtained under the premise of creative work is not made
Embodiment, belongs to the scope of protection of the invention.
In order to suppress the spectra overlapping that Advanced Diffraction is brought, the concept of binaryzation sinusoidal grating is proposed in the prior art,
And Tonghua numerical simulation and Experimental Characterization confirm that it can suppress the characteristic of Advanced Diffraction, then quantum dot array have devised again
Grating, drills at random on impermeable isotropic disk, and controls unit area drill hole density it is met sinusoidal change in the one-dimensional space
Change；Also further develop in the prior art and grating grizzly bar is divided into some fritters and moved along the x-axis, its transmissivity is met just
The single diffraction order grating of string change, the above eliminates Advanced Diffraction.But need the transmissivity for ensureing grating to meet in the prior art
Sinusoidal variations, have larger difficulty in technique making.
Based on this, the present invention provides a kind of senior suppression diffraction grating of extreme ultraviolet, including：
Light-transmissive substrates；
Multiple shapes and area phase are offered on impermeable optical thin film in the light-transmissive substrates, the impermeable optical thin film
Same polygon printing opacity through hole；
Wherein, the polygon printing opacity through hole is in quasi- triarray random distribution on the impermeable optical thin film；
The quasi- triarray include multiple quasi- triangles, the multiple quasi- triangle be in periodic arrangement, it is described not
Light transmission film institute planar, in the first direction on, cycle of the multiple quasi- triangle is Px, in a second direction on, it is described
The cycle of multiple quasi- triangles is Py, the first direction is vertical with the second direction.
The embodiment of the present invention provides a kind of senior suppression diffraction grating of extreme ultraviolet, by opening up multiple on impermeable optical thin film
Shape and area identical polygon printing opacity through hole, and make polygon printing opacity through hole on the impermeable optical thin film in quasi- triangle battle array
Row random distribution.So that grating can effectively suppress senior in visible ray, extreme ultraviolet, infrared light each wave band
Diffraction, includes 2n, 3n, 4n, 5n grades of diffraction (n is nonzero integer), and harmonic carcellation pollution completely inhibit ambient noise, together
When it is maximized reduce the influence of noise, improve resolution ratio and sensitivity, simplify technology difficulty, be having for extreme ultraviolet waveband
Effect suppresses to provide technology guarantee and technique is supported.
The senior concrete structure for suppressing diffraction grating of extreme ultraviolet that illustratively present invention is provided below in conjunction with the accompanying drawings.
The present invention provides a kind of senior suppression diffraction grating of extreme ultraviolet, including：Light-transmissive substrates；In the light-transmissive substrates
Impermeable optical thin film, offer multiple shapes and area identical polygon printing opacity through hole on the impermeable optical thin film；Wherein, institute
It is in quasi- triarray random distribution on the impermeable optical thin film to state polygon printing opacity through hole；The quasi- triarray includes multiple
Quasi- triangle, the multiple quasi- triangle is in periodic arrangement, where the impermeable optical thin film in plane, in the first direction
On, the cycle of the multiple quasi- triangle is Px, in a second direction on, cycle of the multiple quasi- triangle is Py, described first
Direction is vertical with the second direction.
It should be noted that the embodiment of the present invention does not limit the concrete structure of the polygon printing opacity through hole, can be just
Polygon or non-regular polygon, refer to Fig. 1, the senior suppression diffraction light of a kind of extreme ultraviolet that Fig. 1 provides for the present invention
Grid, wherein black region are impermeable optical thin film, and white portion is symmetrical hexagon printing opacity through hole.Wherein, in the present embodiment accompanying drawing
Light-transmissive substrates are not showed that.The material of light-transmissive substrates is not limited in the present embodiment, vitreous silica, glass is chosen as or has
Machine glass.
Impermeable optical thin film described in the present embodiment has the effect for absorbing extreme ultraviolet, preferably absorbs ultraviolet as long as having
The opaque film of light, therefore, to the specific material of impermeable optical thin film without limiting in the present embodiment, its material can be with
Including gold, silver, aluminium, chromium, silicon, silicon nitride or carborundum, likewise, also not limited the thickness of impermeable optical thin film in the present embodiment
Fixed, optionally, the thickness range of the impermeable optical thin film is 100nm-300nm, including endpoint value.Optionally, it is extremely purple shown in Fig. 1
The thickness of the impermeable optical thin film of outer single diffraction order grating is 100nm, and material is crome metal.
Specifically, as shown in figure 1, the symmetrical hexagon printing opacity through hole is arranged in quasi- triangle random distribution mode, formed
Symmetrical hexagon printing opacity via-hole array, wherein each side of symmetrical hexagon printing opacity through hole primitive is put down with the axis direction of two dimension
OK, on the y directions perpendicular to grating, the cycle is Py, and meet all pitchs of holes and be consistent as d=Py- 2b, parallel to
On the x directions of grating, all symmetrical hexagon printing opacity through holes are using triangle summit as basic point, and lateral shift distance is f, simultaneously full
Foot-Px/10≤f≤Px/ 10, wherein PxFor the cycle on x directions, the scope is to derive extremely purple according to theory of Fraunhofer diffraction
Outer senior middle calculate of the relative diffraction I (m) for suppressing diffraction grating in ξ directions obtains, when lateral shift distance meets above-mentioned
During condition, the senior diffraction grating that suppresses of extreme ultraviolet that the present invention is provided can suppress 5 order diffractions.Symmetrical hexagon printing opacity through hole base
First length of side meets a1=Px/ 12, a=5Px/12.Here, the impermeable optical thin film selection chromium, film thickness is 300nm, can be with complete
Hypersorption extreme ultraviolet, light transmission film is simple glass.
Because symmetrical hexagon printing opacity through hole has a, a1With tri- design freedoms of f, symmetrical hexagon printing opacity can be caused
Through hole is relative to other polygon printing opacity through holes, and for such as grating of square printing opacity through hole, symmetrical hexagon printing opacity through hole has
More design freedoms, therefore, the polygon printing opacity through hole is logical for symmetrical hexagon printing opacity in the present embodiment alternatively
Hole.
It can be derived in actual applications according to the theory of Fraunhofer diffraction, because of the described senior suppression of extreme ultraviolet
All symmetrical hexagon printing opacity through holes are all cycle quasi- triangle random fashion arrangements on diffraction grating, form symmetrical hexagon saturating
Light via-hole array, therefore array factor is：
Wherein, N1And N2It is the number along the symmetrical hexagon printing opacity through hole in x-axis and y-axis respectively, because quasi- triangle divides at random
Cloth can suppress 5 order diffractions, need to meet p=5 λ/Px。
Therefore, relative diffraction I (m) of the diffraction grating in ξ directions is suppressed when the extreme ultraviolet is senior, according to husband's thinkling sound's standing grain
Fraunhofer-diffraction theory deduction can be obtained：
Wherein, the m is diffraction time.It is not difficult to find out, I (m) and PxIt is unrelated with b, i.e., it is unrelated with d, therefore the present invention carries
The senior pitch of holes d for suppressing diffraction grating in y directions of extreme ultraviolet of confession is had no effect in ξ directions inhibition, can be according to reality
The technological level on border and application are adjusted, greatly the difficulty in the manufacture of reduction technique, while being conducive to further size
Reduce.
Alternatively, the light tight film dimensions in the present embodiment are 30um × 30um, Px=240nm, Py=240nm, a1=
20nm, a=100nm, d=40nm, N1=4000, N2=3500.
It is illustrated in figure 2 the senior diffraction characteristic for suppressing diffraction grating under extreme ultraviolet irradiation of extreme ultraviolet that the present invention is provided
ξ represents the diffraction plane direction parallel with the x-axis of thin film planar in figure, figure, and η represents diffraction plane and the y-axis of thin film planar is put down
Capable direction；Incidence is normal incidence, and incident wavelength is 13.5nm；It can intuitively see that the embodiment of the present invention is carried from figure
The senior single diffraction order for suppressing diffraction grating to extreme ultraviolet of extreme ultraviolet of confession, it is as a result consistent with desired, only deposited in x-axis
In 0 grade and ± 1 order diffraction, relative to the multiorder diffractive of common grating, using the symmetrical hexagon printing opacity through hole height of this structure
Level, which suppresses diffraction grating, can suppress 2n, 3n, 4n, 5n (n is nonzero integer) order diffraction.Therefore, it is provided in an embodiment of the present invention
Extreme ultraviolet single diffraction order grating can be used as the beam splitter of monochromator or spectrometer, so as to avoid harmonic pollution
The problem of.
The senior diffraction grating that suppresses of the extreme ultraviolet of the invention provided is illustrated in figure 3 in the extreme ultraviolet that wavelength is 13.5nm
The diffraction characteristic figure in the lower ξ directions of irradiation.Wherein, transverse axis represents diffraction time, and the longitudinal axis represents relative diffraction, it can be seen that this
The senior diffraction grating that suppresses of extreme ultraviolet that inventive embodiments are provided is same to have suppression Advanced Diffraction as Sinusoidal grating
Property, on the ξ axles parallel to optical grating diffraction, obvious 0 grade and ± 1 order diffraction are only existed, while relative 0 grade of 1 grade
Diffraction efficiency is 24.4%.
As shown in figure 4, the extreme ultraviolet for being 13.5nm in wavelength for the senior suppression diffraction grating of extreme ultraviolet that the present invention is provided
The diffraction characteristic figure in ξ directions under light irradiation.Wherein, transverse axis represents diffraction time, and the longitudinal axis represents the logarithm of relative diffraction, from
It can be seen from the figure that, the senior diffraction grating that suppresses of extreme ultraviolet that the present invention is provided can effectively suppress 2n, 3n, 4n, and (n is non-to 5n
Zero integer) order diffraction.
In addition, it is necessary to explanation, extreme ultraviolet provided in an embodiment of the present invention is senior to suppress the letter of diffraction grating preparation method
Single, a kind of senior preparation method for suppressing diffraction grating of extreme ultraviolet disclosed in the present embodiment is, it is necessary to illustrate, preparation method is
Techniques well known, however it is not limited to following methods.And the material of following light-transmissive substrates, the material of impermeable optical thin film and impermeable
The merely illustrative explanation of the thickness of optical thin film, is not limited the present invention.
Shown in Figure 5, the preparation method includes：
Step S101：Design the senior domain for suppressing diffraction grating of the extreme ultraviolet；
Step S102：According to the senior domain for suppressing diffraction grating of the extreme ultraviolet, making obtains optical lithography mask plate；
Step S103：Light-transmissive substrates are provided；
Step S104：Layer of metal film is deposited in the light-transmissive substrates；
Step S105：Photoresist is coated in the light-transmissive substrates, optical lithography is carried out with the optical lithography mask plate,
After developing fixing, the metallic film being exposed after photoetching is removed using the method for wet etching or dry etching, produced
To the senior suppression diffraction grating of symmetrical hexagon printing opacity through hole.
The making that can be seen that the senior suppression diffraction grating of extreme ultraviolet that the present invention is provided from above-mentioned manufacturing process is used
Technique of the prior art, preparation method is simple, and can reach nanoscale, therefore reduces the senior suppression diffraction light of extreme ultraviolet
The cost of manufacture of grid, relative to Sinusoidal grating, is more prone to make, and does not use expensive making apparatus, compared to
The cost of manufacture of Sinusoidal grating can decrease.
Further, since only existing printing opacity and light tight two kinds on the senior optical grating construction for suppressing diffraction grating of the extreme ultraviolet
Region, the structure of this binaryzation is easy to process, simultaneously because the senior diffraction grating that suppresses of extreme ultraviolet that the present invention is provided is in y side
To pitch of holes d it is not restrictive, the senior making work for suppressing diffraction grating of the extreme ultraviolet that provides of the present invention is provided
The difficulty of skill, to realize that the optical diffraction of extreme ultraviolet provides great convenience condition.
It should be noted that each embodiment in this specification is described by the way of progressive, each embodiment weight
Point explanation be all between difference with other embodiment, each embodiment identical similar part mutually referring to.
The foregoing description of the disclosed embodiments, enables professional and technical personnel in the field to realize or using the present invention.
A variety of modifications to these embodiments will be apparent for those skilled in the art, as defined herein
General Principle can be realized in other embodiments without departing from the spirit or scope of the present invention.Therefore, it is of the invention
The embodiments shown herein is not intended to be limited to, and is to fit to and principles disclosed herein and features of novelty phase one
The most wide scope caused.
Claims (7)
1. a kind of senior suppression diffraction grating of extreme ultraviolet, it is characterised in that including：
Light-transmissive substrates；
Multiple shapes and area identical are offered on impermeable optical thin film in the light-transmissive substrates, the impermeable optical thin film
Polygon printing opacity through hole；
Wherein, the polygon printing opacity through hole is in quasi- triarray random distribution on the impermeable optical thin film；
The quasi- triarray includes multiple quasi- triangles, and the multiple quasi- triangle is in periodic arrangement, described light tight
Film institute planar, in the first direction on, cycle of the multiple quasi- triangle is Px, in a second direction on, it is the multiple
The cycle of quasi- triangle is Py, the first direction is vertical with the second direction.
2. the senior suppression diffraction grating of extreme ultraviolet according to claim 1, it is characterised in that the polygon printing opacity through hole
For symmetrical hexagon printing opacity through hole.
3. the senior suppression diffraction grating of extreme ultraviolet according to claim 2, it is characterised in that the symmetrical hexagon printing opacity
Described in the two relative edges of through hole first direction set, and the symmetrical hexagon printing opacity through hole center with the quasi- triangle
The summit of shape is basic point, is f along the first direction offset distance；Wherein, f satisfactions-Px/10≤f≤Px/10。
4. the senior suppression diffraction grating of extreme ultraviolet according to claim 3, it is characterised in that the symmetrical hexagon printing opacity
The length of side of the through hole along the first direction is a1Meet a1=Px/12；
The length of side on other four sides of the symmetrical hexagon is equal, and projected length in said first direction meets a for a
=5Px/12。
5. the senior suppression diffraction grating of extreme ultraviolet according to claim 1-4 any one, it is characterised in that described impermeable
The material of optical thin film includes gold, silver, aluminium, chromium, silicon, silicon nitride or carborundum.
6. the senior suppression diffraction grating of extreme ultraviolet according to claim 1-4 any one, it is characterised in that described impermeable
The thickness range of optical thin film is 100nm-300nm, including endpoint value.
7. the senior suppression diffraction grating of extreme ultraviolet according to claim 1-4 any one, it is characterised in that the printing opacity
Substrate is vitreous silica, glass or lucite.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
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| CN201710154237 | 2017-03-15 | ||
| CN2017101542379 | 2017-03-15 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108761607A (en) * | 2018-06-01 | 2018-11-06 | 中国工程物理研究院激光聚变研究中心 | A kind of Advanced Diffraction inhibition grating of quasi- random structure |
| CN108761605A (en) * | 2018-05-29 | 2018-11-06 | 北京理工大学 | A kind of mixing diffraction grating based on global random coded rule |
| CN108761608A (en) * | 2018-06-04 | 2018-11-06 | 中国工程物理研究院激光聚变研究中心 | A kind of Advanced Diffraction inhibition grating of big process tolerance |
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| CN103901519A (en) * | 2014-04-22 | 2014-07-02 | 中国工程物理研究院激光聚变研究中心 | Rectangular-hole single-stage diffraction grating |
| CN106094087A (en) * | 2016-08-02 | 2016-11-09 | 中国科学院微电子研究所 | A kind of single diffraction order grating |
| CN106094086A (en) * | 2016-08-02 | 2016-11-09 | 中国科学院微电子研究所 | A kind of transmission grating |
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| SU1725178A1 (en) * | 1989-10-25 | 1992-04-07 | Омский политехнический институт | Projection raster |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108761608B (en) * | 2018-06-04 | 2021-02-26 | 中国工程物理研究院激光聚变研究中心 | High-grade diffraction suppression grating with large process tolerance |
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Application publication date: 20170815 |