CN108761607A - A kind of Advanced Diffraction inhibition grating of quasi- random structure - Google Patents
A kind of Advanced Diffraction inhibition grating of quasi- random structure Download PDFInfo
- Publication number
- CN108761607A CN108761607A CN201810557606.3A CN201810557606A CN108761607A CN 108761607 A CN108761607 A CN 108761607A CN 201810557606 A CN201810557606 A CN 201810557606A CN 108761607 A CN108761607 A CN 108761607A
- Authority
- CN
- China
- Prior art keywords
- grating
- primitive
- quasi
- diffraction
- advanced
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
Abstract
The present invention discloses a kind of Advanced Diffraction inhibition grating of quasi- random structure, including opaque substrate；Offer that multiple shapes are identical with area and mutually disjoint polygon primitive in the opaque substrate, it is additionally provided with multiple trapezoid areas in the opaque substrate, the multiple trapezoid area is d in the period of square lattice periodic arrangement and square lattice, one and only one described polygon primitive in each trapezoid area, polygon primitive center random distribution in the trapezoid area.Compared with existing Advanced Diffraction inhibits grating, technology difficulty is effectively reduced, solves the problems, such as that primitive mismachining tolerance is reintroduced back to Advanced Diffraction；2n, 3n grades of Advanced Diffractions (n is nonzero integer) can be effectively inhibited to provide technology to improve spectral measurement precision and monochromatization spectral purity and ensure to support with technique in each wave band such as infrared, visible light, extreme ultraviolet, grenz ray.
Description
Technical field
The present invention relates to diffraction optics fields, and in particular to a kind of Advanced Diffraction inhibition grating of quasi- random structure.
Background technology
It is a kind of novel grating that can effectively reduce Advanced Diffraction intensity that Advanced Diffraction, which inhibits grating,.It is pressed using various
The primitive of certain rule arrangement substitutes the structures such as ditch, slot, seam in traditional raster, is expected to fundamentally solve the light of wide spectrum light source
Higher hamonic wave pollution problem during spectrometry and monochromatization.In view of the particularity of its domain structure, electronics is mainly used
The method of beam photoetching is processed, but the machining accuracy problem of primitive is always an important factor for influencing its performance.
The representative design of one kind being known as quantum dot array grating (Wang C, Kuang L, et
Al.Rev.Sci.Instrum, 2007,78 (5):053503；Kuang L, Wang C, et al.Rev.Sci.Instrum,
2010,81 (7):073508).Grating is substituted using a large amount of nano-pore for obeying SIN function Density Distribution within each period
Structure of grid, macroscopically the integral transmittance function in each period be SIN function, the purpose of single diffraction order may be implemented.But
The minimum cell sizes of this structure actually increase micro Process much smaller than periodic dimensions (generally the 1/50 of period scale)
Difficulty, there is the fragile micro-structures of a large amount of connections, can not complete to process in high linear density.
In order to solve the problems, such as that quantum dot array grating elements are undersized, it is necessary to close with screen periods (d) using size
Big primitive carry out jointing grating.Cao Leifeng propositions use round nano-pore or the length of side of a diameter of d/2 for d/2 nano square pore bases
Member reduces difficulty of processing, these nano-pores are not spilt in respective rectangular cells (length of side is equal to d) interior random distribution, often
Integrated transmission/the reflectivity in a period is approximately SIN function, therefore theoretically can effectively inhibit Advanced Diffraction.It is this
Scheme is known as spectroscopy photon screen (Gao Y, et al.Laser&Particle Beams, 2012,30 (2):313-317；Li H,
Et al.Appl.Phys.Lett, 2017,110:041104.) it, is obtained on grenz ray/extreme ultraviolet monochromator at present
Using experiment shows：Its second-order diffraction is in background level (ChenY, et al.Chin.Phys.B, 2018,27 (2):
024101)；Three order diffraction relative intensities (three order diffractions and first-order diffraction intensity ratio) are related with primitive machining accuracy, about
0.5%~1%.
The Advanced Diffraction of another kind of big primitive structure inhibits grating to use periodic structure, and 2015, Cao Leifeng, Liu Yuwei were carried
Rectangular opening single diffraction order grating (patent of invention, ZL201410160786.3) is gone out, square arranging by the period, tilting 45 degree
Shape nano-pore realizes the inhibition to the Advanced Diffraction of specific direction, 2n can be completely inhibited in this structural theory, 3n grades are spread out
It penetrates (n=1,2,3 ...).But the machining accuracy of practical nanoporous size is influenced very by electron beam approach effect and etching technics
Greatly, the second-order diffraction of synchrotron radiation X-ray test reflection sample and three order diffraction relative intensities reach 1.5% (LiuY, et
Al.Sci.Rep, 2015,5 (5):16502), this shows the nanoporous size error of sample ± 10% or so.According to international half
The key size deviation of the gate circuit of the planning of conductor technology development blueprint (ITRS, 2013 editions), DRAM and flash chip controls
Target is ± 10%, so cell sizes machining accuracy problem is also by the long-term performance for restricting rectangular opening single diffraction order grating.
In order to overcome the problems, such as that existing Advanced Diffraction inhibits grating performance to be limited by primitive machining accuracy, the present invention is directed to carry
It can effectively inhibit Advanced Diffraction for one kind and accurately control the shape of primitive itself, dimensional parameters, have big technique wide
The grating of content.
Invention content
In view of the above shortcomings of the prior art, the present invention provides a kind of Advanced Diffractions of quasi- random structure to inhibit grating,
Advanced Diffraction can effectively be inhibited and accurately control the shape of primitive itself, dimensional parameters, with big process tolerance
Feature.
To achieve the above object, the present invention provides the following technical solutions：
A kind of Advanced Diffraction inhibition grating of quasi- random structure, including opaque substrate；It is opened up in the opaque substrate
There are multiple shapes identical with area and mutually disjoint polygon primitive, multiple step sectors are additionally provided in the opaque substrate
Domain, the multiple trapezoid area are d, each trapezoid area in the period of square lattice periodic arrangement and square lattice
One and only one interior described polygon primitive, polygon primitive center random distribution in the trapezoid area.
Further, the upper bottom length of the trapezoid area is d/6, and bottom length is 5d/6, the high h of the trapezoid area
No more than d.
Further, the polygon primitive is rectangle primitive.
Further, the long side of the rectangle primitive is parallel with the short transverse of the trapezoid area, length d-h；
The short side of the rectangle primitive is parallel with the upper bottom direction of the trapezoid area, length d/6.
Further, the grating is transmission grating, and the rectangle primitive is the light transmission through-hole in opaque substrate.
Further, the grating is reflecting grating, and the rectangle primitive is the reflective base of protrusion in opaque substrate
Member.
Further, the material of the opaque substrate is gold or silver or aluminium or chromium or silicon or silicon nitride or silicon carbide.
Compared with prior art, the invention has the advantages that：
(1) compared with existing common grating, the present invention is in each wave band such as infrared, visible light, extreme ultraviolet, grenz ray
It can effectively inhibit 2n, 3n grades of Advanced Diffractions (n is nonzero integer), to improve spectral measurement precision and monochromatization spectral purity
Technology is provided to ensure to support with technique.
(2) compared with existing Advanced Diffraction inhibits grating, the maximum advantage of this grating is：
A. to 2n, the processing essence of the rejection ability and cell sizes of 3n grades of Advanced Diffractions (n is nonzero integer)
Spend it is unrelated, greatly improve grating processing process tolerance, be conducive to mass processing；
B. there is only Pyatyi, the Advanced Diffractions levels such as seven grades, wherein five order diffraction relative intensity (five order diffractions
Intensity and first-order diffraction intensity ratio) it is less than 1E-4, spectral measurement and light source monochromatization process can be effectively improved
In higher hamonic wave pollution problem.
Description of the drawings
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is the required attached drawing used in technology description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only the present invention
Embodiment for those of ordinary skill in the art without creative efforts, can also be according to offer
Attached drawing obtain other attached drawings.
Fig. 1 is that the Advanced Diffraction of quasi- random structure of the present invention inhibits the structural schematic diagram of grating；
Fig. 2 is that the Advanced Diffraction of quasi- random structure of the present invention inhibits the primitive and its dimension scale schematic diagram of grating；
Fig. 3 is that the Advanced Diffraction of quasi- random structure of the present invention inhibits grating diffration characteristic computer artificial result
Fig. 4 is that the Advanced Diffraction of quasi- random structure provided by the invention inhibits the Diffraction intensity distribution figure of grating x-axis direction；
Fig. 5 be quasi- random structure of the present invention Advanced Diffraction inhibit grating elements scale error be respectively+15% and-
In the case of 15%, the Diffraction intensity distribution figure of x-axis direction；
Fig. 6 is that the Advanced Diffraction of quasi- random structure of the present invention inhibits the processing and fabricating flow diagram of grating.
Wherein, reference numeral is corresponding entitled：
The opaque bases 1-, 2- polygon primitives, 3- trapezoid areas.
Specific implementation mode
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation describes, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
The embodiment that the present invention plants is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
Embodiment
The present embodiment provides a kind of Advanced Diffractions of quasi- random structure to inhibit grating, with reference to figure 1 and Fig. 2.Including：It is opaque
Substrate 1；Offer that multiple shapes are identical with area and mutually disjoint polygon primitive 2 in opaque substrate 1, opaque substrate
Multiple trapezoid areas 3 are additionally provided on 1, multiple trapezoid areas 3 are in the period of square lattice periodic arrangement and square lattice
D, one and only one the interior polygon primitive 2 of each trapezoid area 3,2 center of polygon primitive is divided at random in trapezoid area 3
Cloth.
It should be noted that the embodiment of the present invention does not limit the concrete structure of the polygon primitive, can be just polygon
Shape can also be non-regular polygon, can also be circle；The embodiment of the present invention does not limit the specific height of the trapezoid area,
See Fig. 2.In the present embodiment optionally, the polygon primitive is rectangle light transmission through-hole, and the upper bottom length of trapezoid area is d/6,
Bottom length is 5d/6, and the high setting of the trapezoid area is d/3.Fig. 1 is a kind of height of quasi- random structure provided by the invention
Order diffraction inhibits grating, wherein gray area is opaque substrate, and white area is rectangle light transmission through-hole, black dotted lines region
The trapezoid area that may be distributed for the rectangle light transmission through-hole center.When grating is reflecting grating, the rectangle primitive is not
The reflective primitive of protrusion in light-transparent substrate.The material of the opaque substrate can be gold or silver or aluminium or chromium or silicon or silicon nitride
Or silicon carbide.
One and only one described rectangle light transmission through-hole in each trapezoid area；The rectangle light transmission through-hole center exists
Random distribution in the trapezoid area.The trapezoid area shape and ratio are to be calculated according to Fraunhofer diffraction theory deduction
Arrive, when rectangle light transmission through-hole random distribution region meets above-mentioned condition, quasi- random structure provided by the invention it is advanced
Diffraction inhibits grating that can inhibit 2n, 3n grades of Advanced Diffractions (n is nonzero integer).Optionally, the length of the rectangle light transmission through-hole
Side is parallel with the short transverse of the trapezoid area, length 2d/3；The short side of the rectangle light transmission through-hole and the step sector
The upper bottom direction in domain is parallel, length d/6.
Can be derived in practical applications according to the theory of Fraunhofer diffraction, the big process tolerance it is advanced
Diffraction inhibit grating be in the mathematic expectaion of the Diffraction intensity distribution in the directions x：
Wherein, K and L is the number of the rectangle light transmission through-hole in x-axis and y-axis respectively, and λ is incident wavelength, z be grating away from
With a distance from recording surface.The statistics of rectangle light transmission through-hole random distribution in the trapezoid area described in sinc function stands is imitated
Fruit, this is unrelated with the specific parameter of rectangle light transmission through-hole；The m is diffraction time, I0(m, 0) is the single rectangle light transmission
Diffraction intensity distribution of the through-hole in the directions x.As can be seen that no matter I0How is the specific value of (m, 0), works as m=2n, and (n is when 3n
Nonzero integer), the maximum of diffracted intensity does not occur；I.e. this grating can effectively inhibit 2n, 3n grades of Advanced Diffractions, and
It is unrelated with the specific parameter of rectangle light transmission through-hole.
Optionally, the opaque size of foundation base in the present embodiment is 100 μm of (length) × 100 μm (width) × 300nm (height), material
Matter is gold, and d=500nm, K=200, L=200, incidence are normal incidence, incident wavelength 3nm；300nm gold is enough to inhale completely
The grenz ray of wavelength 3nm is received, therefore it is transmission-type amplitude light that the Advanced Diffraction of quasi- random structure described in the present embodiment, which inhibits grating,
Grid.
Fig. 3 is that the Advanced Diffraction of quasi- random structure provided by the invention inhibits grating diffration characteristic Computer Simulation knot
Fruit, x represents the diffraction plane direction parallel with the ξ axis of grating planar in figure, and y represents diffraction plane and the η axis of grating planar is flat
Capable direction；It can intuitively find out that the Advanced Diffraction of big process tolerance provided in an embodiment of the present invention inhibits grating from figure
It is consistent with desired to the diffracting effect of grenz ray, apparent 0 grade, ± 1 order diffraction are only existed in x-axis, relative to common
The multiorder diffractive of grating inhibits grating that can effectively inhibit 2n using the Advanced Diffraction of this structure, and (n is for 3n grades of Advanced Diffractions
Nonzero integer).Therefore quasi- random structure provided in an embodiment of the present invention Advanced Diffraction inhibit grating can be used as monochromator or
The beam splitter of person's spectrometer uses, so as to avoid the problem that higher hamonic wave pollutes.
Fig. 4 is that the Advanced Diffraction of quasi- random structure provided by the invention inhibits grating under the grenz ray irradiation of 3nm wavelength
The Diffraction intensity distribution figure in the directions x.Wherein, horizontal axis represents diffraction time, and the longitudinal axis is the normalization diffracted intensity under logarithmic coordinates,
It can be seen from the figure that the Advanced Diffraction of quasi- random structure provided by the invention inhibits grating that can effectively inhibit 2n, it is 3n grades high
Order diffraction (n is nonzero integer), 5 order diffraction relative intensities are less than 1E-4.
Fig. 5 (a) and (b) are respectively that the Advanced Diffraction of quasi- random structure provided by the invention inhibits the rectangle in grating saturating
In the case of light clear size of opening error is+15% and -15%, the diffracted intensity point in the directions x under the grenz ray irradiation of 3nm wavelength
Butut.Wherein, horizontal axis represents diffraction time, and the longitudinal axis is the normalization diffracted intensity under logarithmic coordinates, it can be seen from the figure that this
The Advanced Diffraction for inventing the big process tolerance provided inhibits grating to have higher tolerance to cell sizes error, in primitive ruler
It in the case that very little error reaches ± 15%, remains able to effectively inhibit 2n, 3n grades of Advanced Diffractions (n is nonzero integer), 5 order diffractions
Relative intensity is still less than 1E-4.
In addition, it is necessary to explanation, the Advanced Diffraction of quasi- random structure provided in an embodiment of the present invention inhibits grating processing
Simple for process, the Advanced Diffraction that the present embodiment discloses a kind of quasi- random structure inhibits grating processing method, needs to illustrate
It is that production method is known in the art technology, however it is not limited to following methods.And the parameters such as following substrate materials, thickness are only to show
Example explanation, does not limit the present invention.
As shown in fig. 6, being as follows：
A) it according to actual application demand, determines the cycle parameter etc. of grating, the L-Edit of grating is generated using computer
Format graphics file；
B) one layer of golden film is plated on the silicon chip of (100) crystal face of twin polishing, a layer photoresist is then coated with, to silicon chip base
Bottom trepanning forms the self-supporting gold thin film of one piece of hollow out
C) numerical control is utilized to focus electron beam lithography apparatus, it, will be such as Fig. 1 institutes by the LEDIT document controls generated in step b)
The grating domain structure shown carries out electron beam exposure on the film that step c is generated, and is then carried out using developer solution and fixing solution
Development, obtains zone plate photoetching offset plate figure；
D) chemical attack for being carried out proper time to the golden film of developing regional using etching solution, is formed logical in development zone
Hole；
E) removal photoresist inhibits grating to get to the Advanced Diffraction of the quasi- random structure of specific period；
Fig. 6 is processing and fabricating flow chart, corresponding with step b, step c, step d, step e.
The Advanced Diffraction that above-mentioned manufacturing process can be seen that quasi- random structure provided by the invention inhibits the making of grating equal
Using prior art processes, production method is simple, can reach nano-scale dimension.Therefore grenz ray, pole be can be widely applied to
Multiple wave bands such as ultraviolet, visible light, infrared.
The foregoing description of the disclosed embodiments enables those skilled in the art to implement or use the present invention.
Various modifications to these embodiments will be apparent to those skilled in the art, defined in the present invention
General Principle can in other embodiments be realized in the case where not departing from the design philosophy of the present invention.Therefore the present invention will
It will not be restricted to embodiment described above, but to accord with principles of this disclosure and features of novelty is consistent
Widest range.
Claims (7)
1. a kind of Advanced Diffraction of quasi- random structure inhibits grating, it is characterised in that：Including opaque substrate (1)；It is described impermeable
Offer that multiple shapes are identical with area and mutually disjoint polygon primitive (2) in light substrate, in the opaque substrate also
Multiple trapezoid areas (3) are provided with, the multiple trapezoid area is in the period of square lattice periodic arrangement and square lattice
D, one and only one interior described polygon primitive of each trapezoid area, polygon primitive center is in the step sector
Random distribution in domain.
2. a kind of Advanced Diffraction of quasi- random structure according to claim 1 inhibits grating, which is characterized in that described trapezoidal
The upper bottom length in region is d/6, and bottom length is 5d/6, and the high h of the trapezoid area is not more than d.
3. a kind of Advanced Diffraction of quasi- random structure according to claim 2 inhibits grating, which is characterized in that described polygon
Shape primitive is rectangle primitive.
4. a kind of Advanced Diffraction of quasi- random structure according to claim 3 inhibits grating, it is characterised in that：The rectangle
The long side of primitive is parallel with the short transverse of the trapezoid area, length d-h；The short side of the rectangle primitive with it is described trapezoidal
The upper bottom direction in region is parallel, length d/6.
5. a kind of Advanced Diffraction of quasi- random structure inhibits grating, feature to exist according to any one of claims 1-4
In：The grating is transmission grating, and the rectangle primitive is the light transmission through-hole in opaque substrate.
6. a kind of Advanced Diffraction of quasi- random structure inhibits grating, feature to exist according to any one of claims 1-4
In：The grating is reflecting grating, and the rectangle primitive is the reflective primitive of protrusion in opaque substrate.
7. a kind of Advanced Diffraction of quasi- random structure inhibits grating, feature to exist according to any one of claims 1-4
In：The material of the opaque substrate is gold or silver or aluminium or chromium or silicon or silicon nitride or silicon carbide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810557606.3A CN108761607B (en) | 2018-06-01 | 2018-06-01 | Advanced diffraction suppression grating with quasi-random structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810557606.3A CN108761607B (en) | 2018-06-01 | 2018-06-01 | Advanced diffraction suppression grating with quasi-random structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108761607A true CN108761607A (en) | 2018-11-06 |
| CN108761607B CN108761607B (en) | 2020-11-20 |
Family
ID=64001975
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810557606.3A Active CN108761607B (en) | 2018-06-01 | 2018-06-01 | Advanced diffraction suppression grating with quasi-random structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108761607B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114815229A (en) * | 2022-05-17 | 2022-07-29 | 北方夜视技术股份有限公司 | Broadband light-splitting micro-nano diffraction grating design method |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1645168A (en) * | 2004-12-16 | 2005-07-27 | 中国工程物理研究院激光聚变研究中心 | Quantum lattice diffracting rasters |
| CN103901519A (en) * | 2014-04-22 | 2014-07-02 | 中国工程物理研究院激光聚变研究中心 | Rectangular-hole single-stage diffraction grating |
| CN104777540A (en) * | 2015-04-23 | 2015-07-15 | 中国工程物理研究院激光聚变研究中心 | Transmission type self-focusing single-stage diffraction grating |
| CN106094087A (en) * | 2016-08-02 | 2016-11-09 | 中国科学院微电子研究所 | A kind of single diffraction order grating |
| CN106094086A (en) * | 2016-08-02 | 2016-11-09 | 中国科学院微电子研究所 | A kind of transmission grating |
| CN106646710A (en) * | 2017-03-15 | 2017-05-10 | 中国科学院微电子研究所 | Extreme ultraviolet single-grade diffraction grating |
| CN106772732A (en) * | 2016-12-20 | 2017-05-31 | 中国科学院微电子研究所 | A kind of diffraction grating |
| CN107045156A (en) * | 2017-03-15 | 2017-08-15 | 中国科学院微电子研究所 | A kind of senior suppression diffraction grating of extreme ultraviolet |
-
2018
- 2018-06-01 CN CN201810557606.3A patent/CN108761607B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1645168A (en) * | 2004-12-16 | 2005-07-27 | 中国工程物理研究院激光聚变研究中心 | Quantum lattice diffracting rasters |
| CN103901519A (en) * | 2014-04-22 | 2014-07-02 | 中国工程物理研究院激光聚变研究中心 | Rectangular-hole single-stage diffraction grating |
| CN104777540A (en) * | 2015-04-23 | 2015-07-15 | 中国工程物理研究院激光聚变研究中心 | Transmission type self-focusing single-stage diffraction grating |
| CN106094087A (en) * | 2016-08-02 | 2016-11-09 | 中国科学院微电子研究所 | A kind of single diffraction order grating |
| CN106094086A (en) * | 2016-08-02 | 2016-11-09 | 中国科学院微电子研究所 | A kind of transmission grating |
| CN106772732A (en) * | 2016-12-20 | 2017-05-31 | 中国科学院微电子研究所 | A kind of diffraction grating |
| CN106646710A (en) * | 2017-03-15 | 2017-05-10 | 中国科学院微电子研究所 | Extreme ultraviolet single-grade diffraction grating |
| CN107045156A (en) * | 2017-03-15 | 2017-08-15 | 中国科学院微电子研究所 | A kind of senior suppression diffraction grating of extreme ultraviolet |
Non-Patent Citations (1)
| Title |
|---|
| 刘钰薇 等: "准随机矩形孔阵列透射光栅", 《物理学报》 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114815229A (en) * | 2022-05-17 | 2022-07-29 | 北方夜视技术股份有限公司 | Broadband light-splitting micro-nano diffraction grating design method |
| CN114815229B (en) * | 2022-05-17 | 2023-08-04 | 北方夜视技术股份有限公司 | Design method of wide-band light splitting micro-nano diffraction grating |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108761607B (en) | 2020-11-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103901519B (en) | Rectangular-hole single-stage diffraction grating | |
| KR100693024B1 (en) | Method for manufacturing a microstructure, exposure device, and electronic apparatus | |
| Wolf et al. | Origination of nano-and microstructures on large areas by interference lithography | |
| CN104765086B (en) | A kind of trapezoidal primitive grating with single diffraction order characteristic | |
| CN104698520A (en) | X-ray layered multi-layer film blazed grating structure and manufacturing method thereof | |
| CN106646710B (en) | A kind of extreme ultraviolet single diffraction order grating | |
| David et al. | Wavelength tunable diffractive transmission lens for hard x rays | |
| Bläsi et al. | Photon management structures originated by interference lithography | |
| CN104777540A (en) | Transmission type self-focusing single-stage diffraction grating | |
| Lider | Zone plates for X-ray focusing | |
| CN101614961B (en) | Partial zonal photon sieve and manufacturing method thereof | |
| CN108761607A (en) | A kind of Advanced Diffraction inhibition grating of quasi- random structure | |
| JP2001042114A (en) | Production of optical element | |
| CN102466980A (en) | Method for producing multilayer film blazed grating based on electron beam lithography and X-ray exposure | |
| David et al. | High-efficiency Bragg–Fresnel lenses with 100 nm outermost zone width | |
| CN110244395A (en) | A kind of production method of the double angle balzed grating,s of plane | |
| CN108761608A (en) | A kind of Advanced Diffraction inhibition grating of big process tolerance | |
| CN1645258A (en) | Photoetching imaging polarized controller with high value aperture | |
| JP2007515689A (en) | Two-dimensional grating network with alternating multi-layer stacks, its production and spectroscope equipped with these networks | |
| CN107045156A (en) | A kind of senior suppression diffraction grating of extreme ultraviolet | |
| US20050094271A1 (en) | Hybrid optical component for x ray applications and method associated therewith | |
| JP2011075850A (en) | Multilayer film laminar diffraction grating and spectrometer | |
| US20050233228A1 (en) | Grayscale lithography methods and devices | |
| JP2889062B2 (en) | X-ray mask and manufacturing method thereof | |
| André et al. | Multilayer gratings for the soft x‐ray region |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |