CN106597588A - Transmission grating - Google Patents
Transmission grating Download PDFInfo
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- CN106597588A CN106597588A CN201611184567.4A CN201611184567A CN106597588A CN 106597588 A CN106597588 A CN 106597588A CN 201611184567 A CN201611184567 A CN 201611184567A CN 106597588 A CN106597588 A CN 106597588A
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- transmission grating
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- 230000005540 biological transmission Effects 0.000 title claims abstract description 41
- 230000003287 optical effect Effects 0.000 claims description 32
- 239000010409 thin film Substances 0.000 claims description 25
- 239000000463 material Substances 0.000 claims description 7
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 2
- 230000000694 effects Effects 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 4
- 238000002834 transmittance Methods 0.000 abstract description 2
- 102100027340 Slit homolog 2 protein Human genes 0.000 description 23
- 101710133576 Slit homolog 2 protein Proteins 0.000 description 23
- 238000001228 spectrum Methods 0.000 description 8
- 238000010276 construction Methods 0.000 description 5
- 241000216843 Ursus arctos horribilis Species 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000003763 carbonization Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
The present invention provides a transmission grating, comprising: a light-tight film and N light-transmitting slits; the N light-transmitting slits are periodically distributed on the light-proof film, and the size of each light-transmitting slit and the distribution period of each slit have a preset proportion; the slit is zigzag along the y-axis direction of the grating; therefore, the N light-transmitting slits are periodically distributed on the light-proof film, so that background noise is completely inhibited, and the signal-to-noise ratio is improved; the value of the grating period and the size of the zigzag light-transmitting slit is taken according to a preset proportion, so that the grating completely inhibits 2-order, 3-order and 4-order diffraction, thereby eliminating harmonic pollution, improving the resolution, further ensuring the accuracy of an analysis result and improving the spectrograph precision; moreover, the grating has a simple structure, and is easier to process than the existing single-stage diffraction grating; the absolute diffraction efficiency is improved due to the high light transmittance of the light-transmitting slits.
Description
Technical field
The invention belongs to optical technical field, more particularly to a kind of transmission grating.
Background technology
It is well known that almost all of material even air can absorb 10 nanometers to 121 nanometers of extreme UV
Light (extreme ultraviolet), therefore in this wave band, it is impossible to using general lens optical system control light beam, but adopt diffraction light
Grid and reflecting mirror are realizing the Beam Control of extreme ultraviolet.
At present, extreme ultraviolet beam splitting system mainly carries out light splitting using diffraction grating.Traditional binary raster spreads out comprising multistage
Penetrate, light splitting under normal circumstances only needs to 1 order diffraction, but in the case of wide spectrum, Advanced Diffraction and 1 order diffraction produced and overlapped,
Analysis result is upset, is brought the error for being not easy to eliminate, restriction to take the photograph spectrum precision, is reduced the performance of optical system.Although sine shakes
Amplitude grating only has 0 grade and +/- 1 order diffraction, with preferable diffraction efficiency, but utilizes known materials and existing processing work
Skill, the sinusoidal grating for making extreme ultraviolet waveband are hardly possible.In addition, though reducing screen periods can suppress Advanced Diffraction,
For example when the cycle D of grating is more than light wavelength lambda and is less than 2 λ, only 0 grade and +/- 1 order diffraction, but utilize existing processing work
Skill, makes the characteristic size structure suitable with extreme ultraviolet wavelength, very difficult；And the effective wave-length coverage of such grating is limited
System is between (D, D/2), therefore is not particularly suited for the beam splitting system of wide spectrum.Therefore, people are only being developed always with 0 grade
With the new extreme ultraviolet grid of +/- 1 order diffraction.At present it has been reported that x-ray single diffraction order grating, it is main using complicated light
The position of grid shape or random movement grizzly bar is obtaining single diffraction order.Although the grating of complicated shape can suppress Advanced Diffraction,
It is but its structure is difficult to make therefore and unrealistic.Although the position of mobile grizzly bar can suppress Advanced Diffraction, it is the introduction of
Noise, noise upset analysis result.
The content of the invention
For the problem that prior art is present, a kind of transmission grating is embodiments provided, for solving existing skill
In art, when extreme UV beam splitting system carries out light splitting, Advanced Diffraction and 1 order diffraction produce overlapping, bring error, cause point
Analysis result is inaccurate, takes the photograph the technical problem that spectrum precision is reduced.
The present invention provides a kind of transmission grating, and the transmission grating includes：Impermeable optical thin film and N number of transmissive slit；Wherein,
N number of transmissive slit is in period profile on the impermeable optical thin film, and size and the institute of the transmissive slit
Stating default ratio of have between the distribution period of slit；The slit is along the y-axis direction of the grating in a zigzag.
In such scheme, slit distribution period along the x-axis direction is Px, slit distribution week along the y-axis direction
Phase is Py。
In such scheme, width a and the P of the slit parallel to x-axisxBetween proportionate relationship be a=Px/2。
In such scheme, projection b and the P of the slit in x-axisxBetween proportionate relationship be b=Px/6。
In such scheme, slit distribution period P along the y-axis directionyFor 0.1Px≤Py≤100Px。
In such scheme, the transmission grating ξ directions relative diffraction I (m) according to formula I (m)=[sinc
(ma/Px)·sinc(mπ(a-b)/Px)]2Calculate；Wherein, the m is diffraction time.
In such scheme, the material of the impermeable optical thin film is specifically included：Gold, silver, aluminum, chromium, silicon, silicon nitride or carbonization
Silicon.
In such scheme, the thickness of the impermeable optical thin film is 50～5000nm.
In such scheme, the thickness of the impermeable optical thin film is 70～150nm.
The invention provides a kind of transmission grating, the transmission grating includes：Impermeable optical thin film and N number of transmissive slit；Its
In, N number of transmissive slit is in period profile on the impermeable optical thin film, and the size of the transmissive slit and the slit
Distribution period between have default ratio；The slit is along the y-axis direction of the grating in a zigzag.Thus, because N number of
Optical slits is in period profile on the impermeable optical thin film, completely inhibit background noise, improves signal to noise ratio；And the grating
According to default ratio value between the size of cycle and the zigzag transmissive slit so that the grating completely inhibit 2
Level, 3 grades, 4 order diffractions, so as to eliminate harmonic pollution, improve resolution, and then guarantee precision of analysis, improve
Take the photograph spectrum precision；Also, it is due to the optical grating construction simply, easy to process than existing single diffraction order grating；It is saturating because of transmissive slit
Light rate is high, improves absolute diffraction efficiency.
Description of the drawings
Fig. 1 is the partial structural diagram of the zigzag transmission grating that the embodiment of the present invention one is provided；
Fig. 2 is the far field construction performance plot of the zigzag transmission grating that the embodiment of the present invention two is provided；
Fig. 3 is the diffraction characteristic figure in the zigzag transmission grating ξ directions that the embodiment of the present invention two is provided；
Diffraction characteristic figures of the Fig. 4 for the zigzag transmission grating of the offer of the embodiment of the present invention two ξ directions expressed in logarithmic.
Specific embodiment
When extreme UV beam splitting system carries out light splitting, in order to suppress Advanced Diffraction, reduce error, spectrum essence is taken the photograph in raising
Degree, the invention provides a kind of transmission grating, the invention provides a kind of transmission grating, the transmission grating includes：It is described N number of
Transmissive slit is in period profile on the impermeable optical thin film, and the distribution period of the size of the transmissive slit and the slit
Between have default ratio；The slit is along the y-axis direction of the grating in a zigzag.
Technical scheme is described in further detail below by drawings and the specific embodiments.
Embodiment one
The present embodiment provides a kind of transmission grating, as shown in figure 1, the transmission grating includes：Impermeable optical thin film 1 and N number of
Transmissive slit 2；Wherein, N number of transmissive slit 2 is in period profile on the impermeable optical thin film 1, and the transmissive slit 2
Size and the distribution period of the slit 2 between have default ratio.The slit can be with along the y-axis direction of the grating
In zigzag, linear type；Slit described in the present embodiment is along the y-axis direction of the grating in a zigzag.
Here, the grating cycle along the x-axis direction is Px, the cycle along the x-axis direction of the slit 2 is also Px, i.e., it is adjacent
The center of zigzag slit 2 is specially the distance between along the x-axis direction Px；The grating cycle along the y-axis direction is Py, it is described
The cycle along the y-axis direction of slit 2 is also Py, i.e., on described slit 2 between adjacent flexuose center along the y-axis direction between away from
From specially Py。
The N values from hundreds of to tens of thousands of, can be typically based on the size and zigzag transmissive slit of impermeable optical thin film
Distribution period Px、PySize determining, with 10 μ m, 10 μm of impermeable optical thin films and Px=100nm, PyIt is for=100nm, described
N values are 100.
Further, in order to pollute with harmonic carcellation, resolution, width a and institute of the slit parallel to x-axis are improved
State slit cycle P along the x-axis directionxBetween proportionate relationship can be determined according to formula (1)：
A=Px/2 (1)
Projection b cycle P with the slit 2 along the y-axis direction of the slit in x-axisxBetween proportionate relationship can be with root
Determine according to formula (2)：
B=Px/6 (2)
So, the proportionate relationship between the size of zigzag slit 2 and slit cycle has been determined that.
Here, the material of the impermeable optical thin film is specifically included：Gold, silver, aluminum, chromium, silicon, silicon nitride or carborundum etc. can be with
Absorb the material of extreme ultraviolet；The thickness of the impermeable optical thin film is 50～5000nm；Preferred thickness is 70～150nm.
After zigzag transmission grating is made, in actual applications, can be entered according to the theory of Fraunhofer diffraction
Row is derived, and is drawn relative diffraction I (m) of transmission grating, specifically can be drawn by formula (3)；
I (m)=[sinc (ma/Px)·sinc(mπ(a-b)/Px)]2=[sinc (m/2) sinc (m/3)]2 (3)
Wherein, in formula (3), the m is diffraction time.
The zigzag transmission grating that the present embodiment is provided, because N number of zigzag slit 2 is in the cycle on the impermeable optical thin film
Distribution, completely inhibit background noise, improves signal to noise ratio；And between the size of the screen periods and the zigzag slit
According to default ratio value so that the grating completely inhibit 2 grades, 3 grades, 4 order diffractions, so as to eliminate harmonic pollution,
Resolution is improve, and then guarantees precision of analysis, improve and take the photograph spectrum precision；Also, the optical grating construction is simple, feature
Size is the half in cycle, more easy to process than existing single diffraction order grating, and as slit is in a zigzag, light transmittance is high, improves
Absolute diffraction efficiency.
Embodiment two
Corresponding to embodiment one, the present embodiment also provides a kind of transmission grating, and referring to Fig. 1, the transmission grating includes：No
Light transmission film 1 and N number of transmissive slit 2；Wherein, N number of transmissive slit 2 is in period profile on the impermeable optical thin film 1, and
There is between the distribution period of 2 sizes and the slit 2 of the transmissive slit default ratio.The slit 2 is along the light
The y-axis direction of grid can be in zigzag, linear type；The word that slit 2 described in the present embodiment along the y-axis direction of the grating is in
Shape.
Here, the grating cycle along the x-axis direction is Px, the cycle along the x-axis direction of the slit 2 is also Px, i.e., it is adjacent
The center of zigzag slit 2 is specially the distance between along the x-axis direction Px；The grating cycle along the y-axis direction is Py, it is described
The cycle along the y-axis direction of slit 2 is also Py, i.e., on described slit 2 between adjacent flexuose center along the y-axis direction between away from
From specially Py。
Light tight film dimensions in the present embodiment are 3mm × 3mm, Px=600nm, Py=600nm, therefore the N values are
5000。
Further, in order to pollute with harmonic carcellation, resolution, width a and institute of the slit parallel to x-axis are improved
State the cycle P along the x-axis direction of slit 2xBetween proportionate relationship can be determined according to formula (1)：
A=Px/2 (1)
Projection b cycle P with the slit 2 along the y-axis direction of the slit 2 in x-axisxBetween proportionate relationship can be with root
Determine according to formula (2)：
B=Px/6 (2)
So, the proportionate relationship between the size of zigzag slit 2 and slit cycle has been determined that.
Here, the material of the impermeable optical thin film is specifically included：Gold；The thickness of the impermeable optical thin film is 100nm.
In practical application, the zigzag transmission grating in the present embodiment is carried out using extreme ultraviolet of the wavelength for 13.5nm
During irradiation, referring to Fig. 2, it can be seen that the far field construction characteristic of the grating, from the graph, it is apparent that existing in ξ directions bright
0 grade aobvious and+1/-1 order diffractions, relative to the multiorder diffractive of common grating, the zigzag transmission grating can effectively suppress high
Order diffraction.
It is possible to further the relative diffraction of zigzag transmission grating is calculated according to formula (3)：
I (m)=[sinc (ma/Px)·sinc(mπ(a-b)/Px)]2=[sinc (m/2) sinc (m/3)]2 (3)
Wherein, in formula (3), the m is diffraction time.In the present embodiment, the relative 0 grade diffraction of 1 grade of the grating is imitated
Rate is 27.72%, more than 1 grade of relative diffraction of sinusoidal grating 25%.2 grades, 3 grades and 4 order diffraction efficiency are zero (referring to figure
3 and Fig. 4).The grating even level is diffracted to zero.5 grades and 7 grades of relative 0 grade diffraction efficiency is respectively 0.044349% He
0.011544%, the diffraction efficiency with respect to 1 grade is respectively 0.16% and 0.041647%.
The zigzag transmission grating that the present embodiment is provided, because multiple zigzag transmissive slits 2 are on the impermeable optical thin film
In period profile, background noise is completely inhibit, improve signal to noise ratio；And the cycle of the grating is narrow with the zigzag printing opacity
According to default ratio value between the size of seam so that the zigzag transmission grating completely inhibit 2 grades, 3 grades, 4 grades and spread out
Penetrate, so as to eliminate harmonic pollution, improve resolution, and then guarantee precision of analysis, improve and take the photograph spectrum precision；And
And, as the zigzag optical grating construction is simple, characteristic size is the half in cycle, more easy to process than existing single diffraction order grating.
The above, only presently preferred embodiments of the present invention is not intended to limit protection scope of the present invention, it is all
Any modification, equivalent and improvement for being made within the spirit and principles in the present invention etc., should be included in the protection of the present invention
Within the scope of.
Claims (9)
1. a kind of transmission grating, it is characterised in that the transmission grating includes：Impermeable optical thin film and N number of transmissive slit；Wherein,
N number of transmissive slit is in period profile on the impermeable optical thin film, and the size of the transmissive slit is narrow with described
There is between the distribution period of seam default ratio；The slit is along the y-axis direction of the grating in a zigzag.
2. transmission grating as claimed in claim 1, it is characterised in that slit distribution period along the x-axis direction is Px, institute
Slit distribution period along the y-axis direction is stated for Py。
3. transmission grating as claimed in claim 2, it is characterised in that width a and the P of the slit parallel to x-axisxIt
Between proportionate relationship be a=Px/2。
4. transmission grating as claimed in claim 2, it is characterised in that projection b and the P of the slit in x-axisxBetween
Proportionate relationship is b=Px/6。
5. transmission grating as claimed in claim 2, it is characterised in that slit distribution period P along the y-axis directionyFor
0.1Px≤Py≤100Px。
6. transmission grating as claimed in claim 2, it is characterised in that relative diffraction effect of the transmission grating in ξ directions
Rate I (m) is according to formula I (m)=[sinc (ma/Px)·sinc(mπ(a-b)/Px)]2Calculate；Wherein, the m is diffraction
Level time.
7. transmission grating as claimed in claim 1, it is characterised in that the material of the impermeable optical thin film is specifically included：Gold,
Silver, aluminum, chromium, silicon, silicon nitride or carborundum.
8. transmission grating as claimed in claim 7, it is characterised in that the thickness of the impermeable optical thin film is 50～5000nm.
9. transmission grating as claimed in claim 7, it is characterised in that the thickness of the impermeable optical thin film is 70～150nm.
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| CN201611184567.4A CN106597588B (en) | 2016-12-20 | 2016-12-20 | Transmission grating |
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| CN201611184567.4A CN106597588B (en) | 2016-12-20 | 2016-12-20 | Transmission grating |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106959482A (en) * | 2017-05-23 | 2017-07-18 | 中国科学院微电子研究所 | Two-dimensional single-stage diffraction grating for extreme ultraviolet |
| CN108827471A (en) * | 2018-04-24 | 2018-11-16 | 苏州大学 | A kind of diffraction element, high resolution spectrometer and spectral method of detection |
| CN109212641A (en) * | 2018-09-29 | 2019-01-15 | 中国科学院微电子研究所 | Phase type diffraction grating |
| CN112497951A (en) * | 2021-01-29 | 2021-03-16 | 成都工业学院 | Anti-counterfeiting printed matter |
| US11215760B2 (en) | 2020-02-25 | 2022-01-04 | Honeywell International Inc. | Device for emission of arbitrary optical beam profiles from a chip to free space |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106959482A (en) * | 2017-05-23 | 2017-07-18 | 中国科学院微电子研究所 | Two-dimensional single-stage diffraction grating for extreme ultraviolet |
| CN106959482B (en) * | 2017-05-23 | 2019-08-06 | 中国科学院微电子研究所 | Two-dimensional single-stage diffraction grating for extreme ultraviolet |
| CN108827471A (en) * | 2018-04-24 | 2018-11-16 | 苏州大学 | A kind of diffraction element, high resolution spectrometer and spectral method of detection |
| CN108827471B (en) * | 2018-04-24 | 2023-07-07 | 苏州大学 | Diffraction element, high-resolution spectrometer and spectrum detection method |
| CN109212641A (en) * | 2018-09-29 | 2019-01-15 | 中国科学院微电子研究所 | Phase type diffraction grating |
| CN109212641B (en) * | 2018-09-29 | 2021-07-13 | 中国科学院微电子研究所 | Phase type diffraction grating |
| US11215760B2 (en) | 2020-02-25 | 2022-01-04 | Honeywell International Inc. | Device for emission of arbitrary optical beam profiles from a chip to free space |
| CN112497951A (en) * | 2021-01-29 | 2021-03-16 | 成都工业学院 | Anti-counterfeiting printed matter |
| CN112497951B (en) * | 2021-01-29 | 2021-04-27 | 成都工业学院 | Anti-counterfeiting printed matter |
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| Publication number | Publication date |
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| CN106597588B (en) | 2019-10-18 |
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