CN106597588B - Transmission grating - Google Patents
Transmission grating Download PDFInfo
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- CN106597588B CN106597588B CN201611184567.4A CN201611184567A CN106597588B CN 106597588 B CN106597588 B CN 106597588B CN 201611184567 A CN201611184567 A CN 201611184567A CN 106597588 B CN106597588 B CN 106597588B
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- 230000005540 biological transmission Effects 0.000 title claims abstract description 30
- 239000000463 material Substances 0.000 claims description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 3
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 4
- 238000002834 transmittance Methods 0.000 abstract description 3
- 102100027340 Slit homolog 2 protein Human genes 0.000 description 14
- 101710133576 Slit homolog 2 protein Proteins 0.000 description 14
- 238000001228 spectrum Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 2
- 238000009795 derivation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
The present invention provides a transmission grating, comprising: a light-tight film and N light-transmitting slits; the N light-transmitting slits are periodically distributed on the light-proof film, and the size of each light-transmitting slit and the distribution period of each slit have a preset proportion; the slit is zigzag along the y-axis direction of the grating; therefore, the N light-transmitting slits are periodically distributed on the light-proof film, so that background noise is completely inhibited, and the signal-to-noise ratio is improved; the value of the grating period and the size of the zigzag light-transmitting slit is taken according to a preset proportion, so that the grating completely inhibits 2-order, 3-order and 4-order diffraction, thereby eliminating harmonic pollution, improving the resolution, further ensuring the accuracy of an analysis result and improving the spectrograph precision; moreover, the grating has a simple structure, and is easier to process than the existing single-stage diffraction grating; the absolute diffraction efficiency is improved due to the high light transmittance of the light-transmitting slits.
Description
Technical Field
The invention belongs to the technical field of optics, and particularly relates to a transmission grating.
Background
It is known that almost all materials, even air, can absorb extreme ultraviolet light (extreme ultraviolet light) of 10 nm to 121 nm, and thus in this wavelength band, it is impossible to control the beam using a general lens optical system, and beam control of extreme ultraviolet light is achieved using a diffraction grating and a mirror.
At present, an extreme ultraviolet light splitting system mainly adopts a diffraction grating for light splitting. The traditional binary grating comprises multi-level diffraction, light splitting only needs 1-level diffraction under the normal condition, but under the condition of a wide spectrum, the high-level diffraction and the 1-level diffraction are overlapped, the analysis result is disturbed, errors which are not easy to eliminate are brought, the spectrum shooting precision is limited, and the performance of an optical system is reduced. Although sinusoidal amplitude gratings with diffraction orders of only 0 and +/-1 order have good diffraction efficiency, it is almost impossible to fabricate sinusoidal gratings in the extreme ultraviolet range using known materials and existing processing techniques. In addition, although the reduction of the grating period can suppress high-order diffraction, for example, when the period D of the grating is larger than the wavelength λ of light and smaller than 2 λ, only 0-order and +/-1-order diffraction exist, but it is very difficult to fabricate a structure with a characteristic dimension equivalent to the wavelength of extreme ultraviolet light by using the existing processing technology; and the effective wavelength range of the grating is limited between (D, D/2), so the grating is not suitable for a wide-spectrum light splitting system. Therefore, new euv gratings with only 0 and +/-1 order diffraction have been developed. The x-ray single-order diffraction grating reported at present mainly adopts a complex grating shape or randomly shifts the positions of grating strips to obtain single-order diffraction. A grating having a complicated shape can suppress higher order diffraction, but its structure is difficult to fabricate, and therefore, it is not realistic. The position of the moving grid bars can suppress high order diffraction, but noise is introduced and disturbs the analysis result.
Disclosure of Invention
Aiming at the problems in the prior art, the embodiment of the invention provides a transmission grating which is used for solving the technical problems in the prior art that when an extreme far ultraviolet light splitting system carries out light splitting, high-level diffraction and 1-level diffraction are overlapped to bring errors, so that the analysis result is inaccurate, and the spectrum shooting precision is reduced.
The present invention provides a transmission grating, comprising: a light-tight film and N light-transmitting slits; wherein,
the N light-transmitting slits are periodically distributed on the light-proof film, and the size of each light-transmitting slit and the distribution period of each slit have a preset proportion; the slit is zigzag along the y-axis direction of the grating.
In the above scheme, the distribution period of the slits along the x-axis direction is PxThe distribution period of the slits along the y-axis direction is Py。
In the above schemeThe width a of the slit parallel to the x-axis and the PxThe proportional relation between a and Px/2。
In the above solution, the projection b of the vertex of two adjacent turning angles of the zigzag shape of the slit on the x-axis is equal to the PxThe proportional relation between b and Px/6。
In the above scheme, the distribution period P of the slits along the y-axis directionyIs 0.1Px≤Py≤100Px。
In the above scheme, the relative diffraction efficiency i (m) of the transmission grating in the ξ direction is according to the formula i (m) ═ sinc (ma/P)x)·sinc(mπ(a-b)/Px)]2Calculating to obtain; wherein m is a diffraction order.
In the above scheme, the opaque film is made of materials including: gold, silver, aluminum, chromium, silicon nitride, or silicon carbide.
In the scheme, the thickness of the light-tight film is 50-5000 nm.
In the scheme, the thickness of the light-tight film is 70-150 nm.
The present invention provides a transmission grating, comprising: a light-tight film and N light-transmitting slits; the N light-transmitting slits are periodically distributed on the light-proof film, and the size of each light-transmitting slit and the distribution period of each slit have a preset proportion; the slit is zigzag along the y-axis direction of the grating. Therefore, the N light-transmitting slits are periodically distributed on the light-proof film, so that background noise is completely inhibited, and the signal-to-noise ratio is improved; the value of the grating period and the size of the zigzag light-transmitting slit is taken according to a preset proportion, so that the grating completely inhibits 2-order, 3-order and 4-order diffraction, thereby eliminating harmonic pollution, improving the resolution, further ensuring the accuracy of an analysis result and improving the spectrograph precision; moreover, the grating has a simple structure, and is easier to process than the existing single-stage diffraction grating; the absolute diffraction efficiency is improved due to the high light transmittance of the light-transmitting slits.
Drawings
Fig. 1 is a schematic partial structure diagram of a zigzag transmission grating according to an embodiment of the present invention;
fig. 2 is a far-field diffraction characteristic diagram of a zigzag transmission grating according to a second embodiment of the present invention;
fig. 3 is a diffraction characteristic diagram of a zigzag transmission grating ξ direction according to the second embodiment of the present invention;
fig. 4 is a graph of diffraction characteristics of the zigzag transmission grating provided in the second embodiment of the present invention, in ξ direction, expressed as logarithm.
Detailed Description
When an extreme far ultraviolet light splitting system performs light splitting, in order to inhibit high-level diffraction, reduce errors and improve spectrum shooting precision, the invention provides a transmission grating, which comprises: the N light-transmitting slits are periodically distributed on the light-proof film, and the size of each light-transmitting slit and the distribution period of each slit have a preset proportion; the slit is zigzag along the y-axis direction of the grating.
The technical solution of the present invention is further described in detail by the accompanying drawings and the specific embodiments.
Example one
The present embodiment provides a transmission grating, as shown in fig. 1, including: a light-tight film 1 and N light-transmitting slits 2; the N light-transmitting slits 2 are periodically distributed on the opaque film 1, and the size of the light-transmitting slits 2 and the distribution period of the slits 2 have a preset ratio. The slit can be zigzag and linear along the y-axis direction of the grating; in this embodiment, the slit is zigzag along the y-axis of the grating.
Here, the period of the grating in the x-axis direction is PxThe period of the slit 2 along the x-axis direction is also PxI.e. the distance between the centers of adjacent zigzag slits 2 in the x-axis direction is Px(ii) a The period of the grating along the y-axis direction is PyThe period of the slit 2 along the y-axis direction is also PyI.e. along the y-axis direction between the centers of adjacent zigzags on the slit 2Is specifically Py。
The value of N can be hundreds to tens of thousands, and is generally determined according to the size of the opaque film and the distribution period P of the zigzag light-transmitting slitsx、PyIs determined by the size of the opaque film of 10 μm x 10 μm and Px＝100nm，PyFor 100nm, the value of N is 100.
Further, in order to eliminate harmonic pollution and improve resolution, the width a of the slit parallel to the x-axis and the period P of the slit along the x-axis directionxThe proportional relationship between them can be determined according to equation (1):
a＝Px/2 (1)
the projection b of the vertex of two turning angles adjacent to the zigzag shape of the slit on the x axis and the period P of the slit 2 along the y axis directionxThe proportional relationship between them can be determined according to equation (2):
b＝Px/6 (2)
thus, a proportional relationship between the size of the zigzag slit 2 and the slit period is determined.
Here, the material of the opaque film specifically includes: gold, silver, aluminum, chromium, silicon nitride, silicon carbide or other materials capable of absorbing extreme ultraviolet light; the thickness of the light-tight film is 50-5000 nm; the preferable thickness is 70 to 150 nm.
After the zigzag transmission grating is manufactured, in practical application, derivation can be performed according to the theory of fraunhofer diffraction to obtain the relative diffraction efficiency i (m) of the transmission grating, which can be specifically obtained by the formula (3);
I(m)＝[sinc(ma/Px)·sinc(mπ(a-b)/Px)]2＝[sinc(m/2)·sinc(m/3)]2 (3)
wherein, in formula (3), m is a diffraction order.
In the zigzag transmission grating provided by the embodiment, the N zigzag slits 2 are periodically distributed on the opaque film, so that background noise is completely suppressed, and the signal-to-noise ratio is improved; the value of the grating period and the size of the zigzag slit is taken according to a preset proportion, so that the grating completely inhibits 2-order, 3-order and 4-order diffraction, thereby eliminating harmonic pollution, improving the resolution, further ensuring the accuracy of an analysis result and improving the spectrum shooting precision; in addition, the grating has simple structure, the characteristic dimension is half of the period, the processing is easier than the existing single-stage diffraction grating, and the absolute diffraction efficiency is improved because the slits are zigzag and have high light transmittance.
Example two
Corresponding to the first embodiment, this embodiment further provides a transmission grating, referring to fig. 1, including: a light-tight film 1 and N light-transmitting slits 2; the N light-transmitting slits 2 are periodically distributed on the opaque film 1, and the size of each light-transmitting slit 2 and the distribution period of the slits 2 have a preset proportion. The slit 2 can be zigzag and linear along the y-axis direction of the grating; in this embodiment, the slit 2 is zigzag-shaped along the y-axis direction of the grating.
Here, the period of the grating in the x-axis direction is PxThe period of the slit 2 along the x-axis direction is also PxI.e. the distance between the centers of adjacent zigzag slits 2 in the x-axis direction is Px(ii) a The period of the grating along the y-axis direction is PyThe period of the slit 2 along the y-axis direction is also PyI.e. the distance between the centers of adjacent zigzags on the slit 2 along the y-axis is Py。
The opaque film in this embodiment has a dimension of 3mm × 3mm, Px＝600nm，Py600nm, so the N value is 5000.
Further, in order to eliminate harmonic pollution and improve resolution, the width a of the slit parallel to the x-axis and the period P of the slit 2 along the x-axis arexThe proportional relationship between them can be determined according to equation (1):
a＝Px/2 (1)
the projection b of the vertex of two turning angles adjacent to the zigzag shape of the slit 2 on the x axis and the period P of the slit 2 along the y axis directionxThe proportional relationship between them can be determined according to equation (2):
b＝Px/6 (2)
thus, a proportional relationship between the size of the zigzag slit 2 and the slit period is determined.
Here, the material of the opaque film specifically includes: gold; the thickness of the light-tight film is 100 nm.
In practical application, when the zigzag transmission grating in the present embodiment is irradiated with extreme ultraviolet light having a wavelength of 13.5nm, referring to fig. 2, it can be seen that the far-field diffraction characteristic of the grating is shown, and as is apparent from the figure, there are significant 0 order and +1/-1 order diffraction in the ξ direction, and the zigzag transmission grating can effectively suppress the high order diffraction compared with the multi-order diffraction of a common grating.
Further, the relative diffraction efficiency of the zigzag transmission grating can be calculated according to equation (3):
I(m)＝[sinc(ma/Px)·sinc(mπ(a-b)/Px)]2＝[sinc(m/2)·sinc(m/3)]2 (3)
wherein, in formula (3), m is a diffraction order. In this embodiment, the diffraction efficiency of the grating 1-order relative to 0-order is 27.72%, which is greater than 25% of the 1-order relative diffraction efficiency of the sinusoidal grating. The 2-, 3-and 4-order diffraction efficiencies are zero (see fig. 3 and 4). The even order diffraction of the grating is zero. The diffraction efficiencies of the 5 th order and the 7 th order with respect to the 0 th order are 0.044349% and 0.011544%, respectively, and the diffraction efficiencies with respect to the 1 st order are 0.16% and 0.041647%, respectively.
In the zigzag transmission grating provided by the embodiment, the plurality of zigzag light-transmitting slits 2 are periodically distributed on the opaque film, so that background noise is completely suppressed, and the signal-to-noise ratio is improved; the value of the period of the grating and the size of the zigzag light-transmitting slit is taken according to a preset proportion, so that the zigzag transmission grating completely inhibits 2-order, 3-order and 4-order diffraction, thereby eliminating harmonic pollution, improving the resolution, further ensuring the accuracy of an analysis result and improving the spectrum shooting precision; and, because the zigzag grating has simple structure and the characteristic dimension is half of the period, the grating is easier to process than the existing single-stage diffraction grating.
The above description is only exemplary of the present invention and should not be taken as limiting the scope of the present invention, and any modifications, equivalents, improvements, etc. that are within the spirit and principle of the present invention should be included in the present invention.
Claims (6)
1. A transmission grating, comprising: a light-tight film and N light-transmitting slits; wherein,
the N light-transmitting slits are periodically distributed on the light-proof film, and the size of each light-transmitting slit and the distribution period of each slit have a preset proportion; the slit is zigzag along the y-axis direction of the grating;
the distribution period of the slits along the x-axis direction is PxThe distribution period of the slits along the y-axis direction is Py(ii) a The width a of the slit parallel to the x-axis and the PxThe proportional relation between a and Px2; the projection b of the vertex of two turning angles adjacent to the zigzag shape of the slit on the x axis is equal to the PxThe proportional relation between b and Px/6。
2. The transmission grating of claim 1 wherein the slits have a period P along the y-axisyIs 0.1Px≤Py≤100Px。
3. A transmission grating as claimed in claim 1 wherein the relative diffraction efficiency i (m) of the transmission grating in the ξ direction is in accordance with the formula i (m) ═ sinc (ma/P)x)-sinc(m(a-b)/Px)]2Calculating to obtain; wherein m is a diffraction order.
4. The transmission grating of claim 1 wherein the opaque film is made of materials comprising: gold, silver, aluminum, chromium, silicon nitride, or silicon carbide.
5. The transmission grating of claim 4 wherein the opaque film has a thickness of 50 to 5000 nm.
6. The transmission grating of claim 4 wherein the opaque film has a thickness of 70 to 150 nm.
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| CN201611184567.4A CN106597588B (en) | 2016-12-20 | 2016-12-20 | Transmission grating |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3872537A1 (en) * | 2020-02-25 | 2021-09-01 | Honeywell International Inc. | Device for emission of arbitrary optical beam profiles from a chip to free space |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106959482B (en) * | 2017-05-23 | 2019-08-06 | 中国科学院微电子研究所 | Two-dimensional single-stage diffraction grating for extreme ultraviolet |
| CN108827471B (en) * | 2018-04-24 | 2023-07-07 | 苏州大学 | Diffraction element, high-resolution spectrometer and spectrum detection method |
| CN109212641B (en) * | 2018-09-29 | 2021-07-13 | 中国科学院微电子研究所 | Phase type diffraction grating |
| CN112497951B (en) * | 2021-01-29 | 2021-04-27 | 成都工业学院 | Anti-counterfeiting printed matter |
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| KR20160131669A (en) * | 2015-05-08 | 2016-11-16 | 신응선 | grating |
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| EP3872537A1 (en) * | 2020-02-25 | 2021-09-01 | Honeywell International Inc. | Device for emission of arbitrary optical beam profiles from a chip to free space |
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