CN106094086B - A kind of transmission grating - Google Patents
A kind of transmission grating Download PDFInfo
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- CN106094086B CN106094086B CN201610624132.0A CN201610624132A CN106094086B CN 106094086 B CN106094086 B CN 106094086B CN 201610624132 A CN201610624132 A CN 201610624132A CN 106094086 B CN106094086 B CN 106094086B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B2005/1804—Transmission gratings
Abstract
The present invention provides a kind of transmission gratings, comprising: impermeable optical thin film and N number of light transmission symmetric polygonal hole；Wherein, N number of light transmission symmetric polygonal hole is distributed on impermeable optical thin film in rectangle grid, and has preset ratio between the period of rectangle grid and the size in symmetric polygonal hole；In this way, completely inhibiting ambient noise because N number of light transmission symmetric polygonal hole is distributed on impermeable optical thin film in rectangle grid, improving signal-to-noise ratio；And according to preset ratio value between the period of rectangle grid and the size in the symmetric polygonal hole, so that the grating completely inhibit 2 grades, 3 grades, 4 grades of diffraction to eliminate harmonic pollution improve resolution ratio, and then ensure precision of analysis, it improves and takes the photograph spectrum precision；Also, the grating can be realized self-supporting, therefore can eliminate the loss of substrate bring；In addition, due to only existing light transmission and opaque two kinds of regions on the optical grating construction, the structure of this binaryzation is easy to process.
Description
Technical field
The invention belongs to optical technical field more particularly to a kind of transmission gratings.
Background technique
It is well known that almost all of material even air can absorb 10 nanometers to 121 nanometers of extreme UV
Light, abbreviation extreme ultraviolet, therefore in this wave band, light beam can not be controlled using general lens optical system, but is used and spread out
Grating and reflecting mirror are penetrated to realize the Beam Control of extreme ultraviolet.
Currently, extreme ultraviolet beam splitting system mainly uses diffraction grating to be divided.Traditional binary raster spreads out comprising multistage
It penetrates, light splitting only needs 1 grade of diffraction under normal conditions, but in wide spectrum, Advanced Diffraction and 1 grade of diffraction are generated and overlapped,
Analysis is upset as a result, bringing the error for being not easy to eliminate, restriction takes the photograph spectrum precision, reduces the performance of optical system.Although sine vibration
Amplitude grating only has 0 grade and +/- 1 grade of diffraction, has preferable diffraction efficiency, but utilizes known materials and existing processing work
Skill, the sinusoidal grating for making extreme ultraviolet waveband are almost impossible.In addition, though reducing screen periods is able to suppress Advanced Diffraction,
Such as the period D of grating is greater than light wavelength lambda and when less than 2 λ, only 0 grade and +/- 1 grade of diffraction, but utilize existing processing work
Skill, production characteristic size and the comparable structure of extreme ultraviolet wavelength are very difficult；And such effective wave-length coverage of grating is limited
System is not particularly suited for the beam splitting system of wide spectrum between (D, D/2).
Based on this, a kind of extreme ultraviolet transmission grating for being able to suppress Advanced Diffraction is needed at present, is asked with solving above-mentioned technology
Topic.
Summary of the invention
In view of the problems of the existing technology, the embodiment of the invention provides a kind of transmission gratings, for solving existing skill
In art, when extreme UV beam splitting system is divided, Advanced Diffraction and 1 grade of diffraction generate overlapping, bring error, cause point
Result inaccuracy is analysed, the technical issues of spectrum precision reduces is taken the photograph.
The present invention provides a kind of transmission grating, the transmission grating includes: that impermeable optical thin film and N number of light transmission are symmetrically polygon
Shape hole；Wherein,
N number of light transmission symmetric polygonal hole is distributed on the impermeable optical thin film in rectangle grid, and the rectangle lattice
There is preset ratio between the period of son and the size in the symmetric polygonal hole.
In above scheme, the period of the rectangle grid along the x-axis direction is Px, the week of the rectangle grid along the y-axis direction
Phase is Py。
In above scheme, the symmetric polygonal hole is specifically included: symmetrical quadrilateral hole, symmetrical pentagon hole or symmetrical six
Side shape hole.
In above scheme, when the symmetric polygonal hole is symmetrical hexagonal hole, the symmetrical hexagonal hole is parallel to x
The catercorner length 2a and the P of axisxBetween proportionate relationship be 2a=5Px/6。
In above scheme, the symmetrical hexagonal hole is parallel to the side length 2a of x-axis1With the PxBetween proportionate relationship be
2a1=Px/6。
In above scheme, the symmetrical hexagonal hole is parallel to the symmetrical shaft length 2b and the P of y-axisyBetween relationship
For 2b≤Py。
In above scheme, the transmission grating the direction ξ relative diffraction I (m) according to formulaIt is calculated；Wherein, the m is diffraction time.
In above scheme, the material of the impermeable optical thin film is specifically included: gold, silver, aluminium, chromium, silicon, silicon nitride or carbonization
Silicon.
In above scheme, the impermeable optical thin film with a thickness of 50~300nm.
In above scheme, the preferred thickness of the impermeable optical thin film is 70~150nm.
The present invention provides a kind of transmission grating, the transmission grating includes: that impermeable optical thin film and N number of light transmission are symmetrically polygon
Shape hole；Wherein, N number of light transmission symmetric polygonal hole is distributed on the impermeable optical thin film in rectangle grid, and the rectangle
There is preset ratio between the period of grid and the size in the symmetric polygonal hole；In this way, because of N number of light transmission symmetric polygonal
Hole is distributed on the impermeable optical thin film in rectangle grid, is completely inhibited ambient noise, is improved signal-to-noise ratio；And the rectangle
According to preset ratio value between the period of grid and the size in the symmetric polygonal hole, so that the grating completely inhibits
2 grades, 3 grades, 4 grades of diffraction to eliminate harmonic pollution improve resolution ratio, and then ensure precision of analysis, mention
It is high to take the photograph spectrum precision；Also, the grating can be realized self-supporting, therefore can eliminate the loss of substrate bring；In addition, due to this
Light transmission and opaque two kinds of regions are only existed on optical grating construction, the structure of this binaryzation is easy to process.
Detailed description of the invention
Fig. 1 is the partial structural diagram for the transmission grating that the embodiment of the present invention one provides；
Fig. 2 is the far field construction performance plot of transmission grating provided by Embodiment 2 of the present invention；
Fig. 3 is the diffraction characteristic figure in the direction transmission grating ξ provided by Embodiment 2 of the present invention；
Fig. 4 is the diffraction characteristic figure in the transmission grating provided by Embodiment 2 of the present invention direction ξ expressed in logarithmic；
Fig. 5 is the far field construction performance plot for the transmission grating that the embodiment of the present invention three provides；
Fig. 6 is the diffraction characteristic figure in the direction transmission grating ξ that the embodiment of the present invention three provides；
Fig. 7 is the far field construction performance plot for the transmission grating that the embodiment of the present invention four provides；
Fig. 8 is the diffraction characteristic figure in the direction transmission grating ξ that the embodiment of the present invention four provides.
Specific embodiment
When extreme UV beam splitting system is divided, in order to inhibit Advanced Diffraction, reduce error, spectrum essence is taken the photograph in raising
Degree, the present invention provides a kind of transmission grating, the transmission grating includes: impermeable optical thin film and N number of light transmission symmetric polygonal hole；
Wherein, N number of light transmission symmetric polygonal hole is distributed on the impermeable optical thin film in rectangle grid, and the rectangle grid
There is preset ratio between period and the size in the symmetric polygonal hole.
Technical solution of the present invention is described in further detail below by drawings and the specific embodiments.
Embodiment one
The present embodiment provides a kind of transmission grating, as shown in Figure 1, the transmission grating includes: impermeable optical thin film and N number of
Light symmetric polygonal hole；Wherein, N number of light transmission symmetric polygonal hole is distributed on the impermeable optical thin film in rectangle grid,
And there is preset ratio between the period of the rectangle grid and the size in the symmetric polygonal hole.Wherein, the rectangle
Grid specifically includes: square lattice, rectangular grid, triangular lattice, intentionally rectangular grid and common rectangle grid.The present embodiment
In, it is therefore preferable to rectangular grid.
Specifically, the rectangular grid distribution specifically: the symmetrical centre in any one symmetric polygonal hole is adjacent thereto
The symmetrical centre of three symmetric polygonals is connected to a rectangle.The period of the rectangular grid along the x-axis direction is Px, i.e. phase
Adjacency pair claims the symmetrical centre of polygonal hole the distance between to be along the x-axis direction specially Px；The week of the rectangular grid along the y-axis direction
Phase is Py, i.e., the distance between along the y-axis direction it is specially P between the symmetrical centre of adjacent symmetric polygonal holey。
The N value can be from several hundred to tens of thousands of, generally according to the distribution period of the size of impermeable optical thin film and loophole
Px、PySize determine, with 10 μ m, 10 μm of impermeable optical thin films and Px=100nm, PyFor=100nm, the N value is
10000.Here, the symmetric polygonal hole can specifically include: symmetrical quadrilateral hole, symmetrical pentagon hole or symmetrical hexagon
Hole etc., in the present embodiment, it is therefore preferable to symmetrical hexagonal hole.
Further, it when the symmetric polygonal is symmetrical hexagonal hole, in order to be polluted with harmonic carcellation, improves and divides
Degree of distinguishing, the symmetrical hexagonal hole are parallel to the catercorner length 2a and the P of x-axisxBetween relationship can be according to formula (1)
It determines:
2a=5Px/6 (1)
The symmetrical hexagonal hole is parallel to the side length 2a of x-axis1With the PxBetween relationship can be true according to formula (2)
It makes:
2a1=Px/6 (2)
The symmetrical hexagonal hole is parallel to symmetrical shaft length (height of the hexagon) 2b and the P of y-axisyBetween pass
System can determine according to formula (3):
2b≤Py (3)
In this way, having determined that the proportionate relationship between the size of symmetrical hexagonal hole and rectangular lattice period.
Here, the material of the impermeable optical thin film specifically includes: gold, silver, aluminium, chromium, silicon, silicon nitride or silicon carbide etc. can be with
Absorb the material of extreme ultraviolet；The impermeable optical thin film with a thickness of 50~300nm；Preferred thickness is 70~150nm.
After transmission grating is made, in practical applications, it can be derived according to the theory of Fraunhofer diffraction,
It obtains the relative diffraction I (m) of transmission grating, can specifically be obtained by formula (4)；
Wherein, in formula (4), the m is diffraction time.
Transmission grating provided in this embodiment, because N number of light transmission symmetric polygonal hole is in rectangular on the impermeable optical thin film
Grid distribution, completely inhibits ambient noise, improves signal-to-noise ratio；And the period of the rectangular grid and the symmetric polygonal
According to preset ratio value between the size in hole, so that the grating completely inhibits 2 grades, 3 grades, 4 grades of diffraction, to eliminate
Harmonic pollution, improves resolution ratio, and then ensure precision of analysis, improves and take the photograph spectrum precision；Also, the grating energy
It enough realizes self-supporting, therefore the loss of substrate bring can be eliminated；In addition, due to only existing light transmission and impermeable on the optical grating construction
Two kinds of regions of light, the structure of this binaryzation are easy to process.
Embodiment two
Relative to embodiment one, the present embodiment also provides a kind of transmission grating, and the transmission grating includes: impermeable optical thin film
And N number of light transmission symmetric polygonal hole；Wherein, N number of light transmission symmetric polygonal hole is in rectangle lattice on the impermeable optical thin film
Son distribution, and there is preset ratio between the period of the rectangle grid and the size in the symmetric polygonal hole.Wherein, institute
It states rectangle grid to specifically include: square lattice, rectangular grid, triangular lattice, intentionally rectangular grid and common rectangle grid.This
In embodiment, it is therefore preferable to rectangular grid.
Specifically, the rectangular grid distribution specifically: the symmetrical centre in any one symmetric polygonal hole is adjacent thereto
The symmetrical centre of three symmetric polygonals is connected to a rectangle.The period of the rectangular grid along the x-axis direction is Px, i.e. phase
Adjacency pair claims the symmetrical centre of polygonal hole the distance between to be along the x-axis direction specially Px；The week of the rectangular grid along the y-axis direction
Phase is Py, i.e., between the symmetrical centre of adjacent symmetric polygonal hole along the y-axis direction between be specially Py。
Opaque film dimensions in the present embodiment are 30 μm of 30 μ m, Px=600nm, Py=600nm, therefore the N value
It is 2500.And the symmetric polygonal hole in the present embodiment is symmetrical hexagonal hole.
Further, it when the symmetric polygonal is symmetrical hexagonal hole, in order to be polluted with harmonic carcellation, improves and divides
Degree of distinguishing, the symmetrical hexagonal hole are parallel to the catercorner length 2a and the P of x-axisxBetween relationship can be according to formula (1)
It determines:
2a=5Px/6 (1)
Wherein, in the present embodiment, the period of the rectangular grid along the x-axis direction is PxIt is therefore, described symmetrical for 600nm
The catercorner length that hexagonal hole is parallel to x-axis is calculated according to formula (1) as 500nm.
The symmetrical hexagonal hole is parallel to the side length 2a of x-axis1With the PxBetween relationship can be true according to formula (2)
It makes:
2a1=Px/6 (2)
Wherein, the side length that the symmetrical hexagonal hole is parallel to x-axis is calculated according to formula (2) as 100nm.
The symmetrical hexagonal hole is parallel to symmetrical shaft length (height of the hexagon) 2b and the P of y-axisyBetween pass
System can determine according to formula (3):
2b≤Py (3)
Wherein, the period of the rectangular grid along the y-axis direction is PyFor 600nm, the present embodiment is determined according to formula (3)
The symmetrical shaft length that symmetrical hexagonal hole is parallel to y-axis is 600nm.
In this way, having determined that the proportionate relationship between the size of symmetrical hexagonal hole and rectangular lattice period.
Here, the material of the impermeable optical thin film specifically includes chromium；The impermeable optical thin film with a thickness of 100nm.
In practical application, the transmission grating in the present embodiment is irradiated using the extreme ultraviolet that wavelength is 13.5nm
When, referring to fig. 2, it can be seen that the far field construction characteristic of the grating, from the graph, it is apparent that there are apparent 0 in the direction ξ
Grade and+1/-1 grades of diffraction, relative to the multiorder diffractive of common grating, which, which is able to suppress, effectively inhibits Advanced Diffraction.
It is possible to further calculate the relative diffraction of transmission grating according to formula (4):
Wherein, in formula (4), the m is diffraction time.In the present embodiment, 1 grade of the grating opposite 0 grade of diffraction is imitated
Rate is 27.72%, greater than 1 grade of relative diffraction of sinusoidal grating 25%.2 grades, 3 grades and 4 grades diffraction efficiencies are zero (referring to figure
3 and Fig. 4).The grating even number level is diffracted to zero.5 grades and 7 grades of opposite 0 grade of diffraction efficiency is respectively 0.044349% He
0.011544%, opposite 1 grade of diffraction efficiency is respectively 0.16% and 0.041647%.
Transmission grating provided in this embodiment, because multiple light transmission symmetric polygonals hole is in rectangular on the impermeable optical thin film
Grid distribution, completely inhibits ambient noise, improves signal-to-noise ratio；And the period of the rectangular grid and the symmetric polygonal
According to preset ratio value between the size in hole, so that the grating completely inhibits 2 grades, 3 grades, 4 grades of diffraction, to eliminate
Harmonic pollution, improves resolution ratio, and then ensure precision of analysis, improves and take the photograph spectrum precision；Also, the grating energy
It enough realizes self-supporting, therefore the loss of substrate bring can be eliminated；In addition, due to only existing light transmission and impermeable on the optical grating construction
Two kinds of regions of light, the structure of this binaryzation are easy to process.
Embodiment three
Relative to embodiment two, the present embodiment also provides a kind of transmission grating, and the transmission grating includes: impermeable optical thin film
And N number of light transmission symmetric polygonal hole；Wherein, N number of light transmission symmetric polygonal hole is in rectangle lattice on the impermeable optical thin film
Son distribution, and there is preset ratio between the period of the rectangle grid and the size in the symmetric polygonal hole.Wherein, institute
It states rectangle grid to specifically include: square lattice, rectangular grid, triangular lattice, intentionally rectangular grid and common rectangle grid.This
In embodiment, it is therefore preferable to rectangular grid.
Specifically, the rectangular grid distribution specifically: the symmetrical centre in any one symmetric polygonal hole is adjacent thereto
The symmetrical centre of three symmetric polygonals is connected to a rectangle.The period of the rectangular grid along the x-axis direction is Px, i.e. phase
Adjacency pair claims the symmetrical centre of polygonal hole the distance between to be along the x-axis direction specially Px；The week of the rectangular grid along the y-axis direction
Phase is Py, i.e., between the symmetrical centre of adjacent symmetric polygonal hole along the y-axis direction between be specially Py。
Opaque film dimensions in the present embodiment are 30 μm of 30 μ m, Px=300nm, Py=300nm, therefore the N value
It is 10000.And the symmetric polygonal hole in the present embodiment is symmetrical hexagonal hole.
Further, it when the symmetric polygonal is symmetrical hexagonal hole, in order to be polluted with harmonic carcellation, improves and divides
Degree of distinguishing, the symmetrical hexagonal hole are parallel to the catercorner length 2a and the P of x-axisxBetween relationship can be according to formula (1)
It determines:
2a=5Px/6 (1)
Wherein, in the present embodiment, the period of the rectangular grid along the x-axis direction is PxIt is therefore, described symmetrical for 300nm
The catercorner length that hexagonal hole is parallel to x-axis is calculated according to formula (1) as 250nm.
The symmetrical hexagonal hole is parallel to the side length 2a of x-axis1With the PxBetween relationship can be true according to formula (2)
It makes:
2a1=Px/6 (2)
Wherein, the side length that the symmetrical hexagonal hole is parallel to x-axis is calculated according to formula (2) as 50nm.
The symmetrical hexagonal hole is parallel to symmetrical shaft length (height of the hexagon) 2b and the P of y-axisyBetween pass
System can determine according to formula (3):
2b≤Py (3)
Wherein, the period of the rectangular grid along the y-axis direction is PyFor 300nm, the present embodiment is determined according to formula (3)
The symmetrical shaft length that symmetrical hexagonal hole is parallel to y-axis is 200nm.
In this way, having determined that the proportionate relationship between the size of symmetrical hexagonal hole and rectangular lattice period.
Here, the material of the impermeable optical thin film specifically includes metallic silicon；The impermeable optical thin film with a thickness of 150nm.
In practical application, the transmission grating in the present embodiment is irradiated using the extreme ultraviolet that wavelength is 13.5nm
When, referring to Fig. 5, it can be seen that the far field construction characteristic of the grating, from the graph, it is apparent that there are apparent 0 in the direction ξ
Grade and+1/-1 grades of diffraction, relative to the multiorder diffractive of common grating, which, which is able to suppress, effectively inhibits Advanced Diffraction.
It is possible to further calculate the relative diffraction of transmission grating according to formula (4):
Wherein, in formula (4), the m is diffraction time.In the present embodiment, 1 grade of the grating opposite 0 grade of diffraction is imitated
Rate is 27.72%, greater than 1 grade of relative diffraction of sinusoidal grating 25%.2 grades, 3 grades and 4 grades diffraction efficiencies are zero (referring to figure
6).The grating even number level is diffracted to zero.5 grades and 7 grades of 0 grade opposite, opposite 1 grade of diffraction is very small.
Transmission grating provided in this embodiment, because multiple light transmission symmetric polygonals hole is in rectangular on the impermeable optical thin film
Grid distribution, completely inhibits ambient noise, improves signal-to-noise ratio；And the period of the rectangular grid and the symmetric polygonal
According to preset ratio value between the size in hole, so that the grating completely inhibits 2 grades, 3 grades, 4 grades of diffraction, to eliminate
Harmonic pollution, improves resolution ratio, and then ensure precision of analysis, improves and take the photograph spectrum precision；Also, the grating energy
It enough realizes self-supporting, therefore the loss of substrate bring can be eliminated；In addition, due to only existing light transmission and impermeable on the optical grating construction
Two kinds of regions of light, the structure of this binaryzation are easy to process.
Example IV
Relative to embodiment two, the present embodiment also provides a kind of transmission grating, and the transmission grating includes: impermeable optical thin film
And N number of light transmission symmetric polygonal hole；Wherein, N number of light transmission symmetric polygonal hole is in rectangle lattice on the impermeable optical thin film
Son distribution, and there is preset ratio between the period of the rectangle grid and the size in the symmetric polygonal hole.Wherein, institute
It states rectangle grid to specifically include: square lattice, rectangular grid, triangular lattice, intentionally rectangular grid and common rectangle grid.This
In embodiment, it is therefore preferable to rectangular grid.
Specifically, the rectangular grid distribution specifically: the symmetrical centre in any one symmetric polygonal hole is adjacent thereto
The symmetrical centre of three symmetric polygonals is connected to a rectangle.The period of the rectangular grid along the x-axis direction is Px, i.e. phase
Adjacency pair claims the symmetrical centre of polygonal hole the distance between to be along the x-axis direction specially Px；The week of the rectangular grid along the y-axis direction
Phase is Py, i.e., between the symmetrical centre of adjacent symmetric polygonal hole along the y-axis direction between be specially Py。
Opaque film dimensions in the present embodiment are 180 μm of 180 μ m, Px=1200nm, Py=1200nm, therefore institute
Stating N value is 22500.
Further, it when the symmetric polygonal is symmetrical hexagonal hole, in order to be polluted with harmonic carcellation, improves and divides
Degree of distinguishing, the symmetrical hexagonal hole are parallel to the catercorner length 2a and the P of x-axisxBetween relationship can be according to formula (1)
It determines:
2a=5Px/6 (1)
Wherein, in the present embodiment, the period of the rectangular grid along the x-axis direction is PxIt is therefore, described symmetrical for 1200nm
The catercorner length that hexagonal hole is parallel to x-axis is calculated according to formula (1) as 1000nm.
The symmetrical hexagonal hole is parallel to the side length 2a of x-axis1With the PxBetween relationship can be true according to formula (2)
It makes:
2a1=Px/6 (2)
Wherein, the side length that the symmetrical hexagonal hole is parallel to x-axis is calculated according to formula (2) as 200nm.
The symmetrical hexagonal hole is parallel to symmetrical shaft length (height of the hexagon) 2b and the P of y-axisyBetween pass
System can determine according to formula (3):
2b≤Py (3)
Wherein, the period of the rectangular grid along the y-axis direction is PyFor 1200nm, the present embodiment is determined according to formula (3)
It is 1000nm that symmetrical hexagonal hole, which is parallel to the symmetrical shaft length of y-axis, out.
In this way, having determined that the proportionate relationship between the size of symmetrical hexagonal hole and rectangular lattice period.
Here, the material of the impermeable optical thin film specifically includes metallic silver；The impermeable optical thin film with a thickness of 210nm.
In practical application, the transmission grating in the present embodiment is irradiated using the extreme ultraviolet that wavelength is 13.5nm
When, referring to Fig. 7, it can be seen that the far field construction characteristic of the grating, from the graph, it is apparent that there are apparent 0 in the direction ξ
Grade and+1/-1 grades of diffraction, relative to the multiorder diffractive of common grating, which, which is able to suppress, effectively inhibits Advanced Diffraction.
It is possible to further calculate the relative diffraction of transmission grating according to formula (4):
Wherein, in formula (4), the m is diffraction time.In the present embodiment, 1 grade of the grating opposite 0 grade of diffraction is imitated
Rate is 27.72%, greater than 1 grade of relative diffraction of sinusoidal grating 25%.2 grades, 3 grades and 4 grades diffraction efficiencies are zero (referring to figure
8).The grating even number level is diffracted to zero.5 grades and 7 grades of 0 grade opposite, opposite 1 grade of diffraction is very small.
Transmission grating provided in this embodiment, because multiple light transmission symmetric polygonals hole is in rectangular on the impermeable optical thin film
Grid distribution, completely inhibits ambient noise, improves signal-to-noise ratio；And the period of the rectangular grid and the symmetric polygonal
According to preset ratio value between the size in hole, so that the grating completely inhibits 2 grades, 3 grades, 4 grades of diffraction, to eliminate
Harmonic pollution, improves resolution ratio, and then ensure precision of analysis, improves and take the photograph spectrum precision；Also, the grating energy
It enough realizes self-supporting, therefore the loss of substrate bring can be eliminated；In addition, due to only existing light transmission and impermeable on the optical grating construction
Two kinds of regions of light, the structure of this binaryzation are easy to process.
The foregoing is only a preferred embodiment of the present invention, is not intended to limit the scope of the present invention, it is all
Made any modifications, equivalent replacements, and improvements etc. within the spirit and principles in the present invention, should be included in protection of the invention
Within the scope of.
Claims (3)
1. a kind of transmission grating, which is characterized in that the transmission grating does not include substrate, comprising: the impermeable optical thin film of self-supporting
And it is distributed in N number of light transmission symmetric polygonal hole on film, the symmetry axis in the symmetric polygonal hole is parallel to y-axis, described right
Claim polygonal hole include: symmetrical hexagonal hole, the material of the impermeable optical thin film of the self-supporting specifically includes: gold, silver, aluminium, silicon,
Silicon nitride or silicon carbide；Wherein,
N number of light transmission symmetric polygonal hole is distributed on the impermeable optical thin film in rectangle grid, and the rectangle grid
There is preset ratio, the period of the rectangle grid along the x-axis direction is between period and the size in the symmetric polygonal hole
Px, the period of the rectangle grid along the y-axis direction is Py, the symmetrical hexagonal hole is parallel to symmetrical shaft length 2b and the institute of y-axis
State PyBetween relationship be 2b≤Py；
When the symmetric polygonal hole is symmetrical hexagonal hole, relative diffraction I (m) of the transmission grating in the direction ξ
According to formulaIt is calculated；Wherein, the m is diffraction
Level；When the symmetric polygonal hole is symmetrical hexagonal hole, the symmetrical hexagonal hole is parallel to the catercorner length of x-axis
The 2a and PxBetween proportionate relationship be 2a=5Px/6；The symmetrical hexagonal hole is parallel to the side length 2a of x-axis1With the Px
Between proportionate relationship be 2a1=Px/ 6, the formula
It is derived from according to the theory of Fraunhofer diffraction.
2. transmission grating as described in claim 1, which is characterized in that the impermeable optical thin film with a thickness of 50~300nm.
3. transmission grating as claimed in claim 2, which is characterized in that the impermeable optical thin film with a thickness of 70~150nm.
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| CN106597588B (en) * | 2016-12-20 | 2019-10-18 | 中国科学院微电子研究所 | A kind of transmission grating |
| CN106646710B (en) * | 2017-03-15 | 2019-05-21 | 中国科学院微电子研究所 | A kind of extreme ultraviolet single diffraction order grating |
| CN107045156A (en) * | 2017-03-15 | 2017-08-15 | 中国科学院微电子研究所 | A kind of senior suppression diffraction grating of extreme ultraviolet |
| CN108802879B (en) * | 2017-04-27 | 2020-08-11 | 清华大学 | Preparation method of pine-tree-shaped metal nano grating |
| CN108761607B (en) * | 2018-06-01 | 2020-11-20 | 中国工程物理研究院激光聚变研究中心 | Advanced diffraction suppression grating with quasi-random structure |
| CN108761608B (en) * | 2018-06-04 | 2021-02-26 | 中国工程物理研究院激光聚变研究中心 | High-grade diffraction suppression grating with large process tolerance |
| CN109212641B (en) * | 2018-09-29 | 2021-07-13 | 中国科学院微电子研究所 | Phase type diffraction grating |
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