CN108931829B - Monopole vortex grating - Google Patents
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- CN108931829B CN108931829B CN201710392818.6A CN201710392818A CN108931829B CN 108931829 B CN108931829 B CN 108931829B CN 201710392818 A CN201710392818 A CN 201710392818A CN 108931829 B CN108931829 B CN 108931829B
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- G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
Abstract
The embodiment of the invention discloses a single-pole vortex grating, which comprises a substrate film and a plurality of light-transmitting through hole rows penetrating through the substrate film, wherein the light-transmitting through hole rows form a grating, and each light-transmitting through hole row is formed by a plurality of light-transmitting through holes; the center position of the light-transmitting through hole array is the balance position after the holographic interference image binaryzation obtained after the vortex phase distribution diagram is loaded on the plane wave, the position of each light-transmitting through hole in the light-transmitting through hole array is the position after the balance position of the light-transmitting through hole array is randomly disturbed, so that the single-pole output of the quasi-sinusoidal grating is realized by utilizing a space phase adjusting mechanism, the multi-level output of higher harmonics is inhibited, the effect similar to the hologram is achieved, the signal to noise ratio is improved, the high harmonic pollution is eliminated, and the resolution ratio is improved.
Description
Technical Field
The invention relates to the technical field of vortex light fields, in particular to a single-pole vortex grating.
Background
Vortex optical fields have been widely studied due to their many superior properties and have been commercially applied in fields such as ion manipulation, optical communication, holographic lithography, and super-resolution (SPED) display. Although a Spiral Phase Plate (SPP) device is considered as an important and effective method for generating a vortex light field, in extreme ultraviolet and even x-ray bands, the light field characteristics of the SPP depend on the height and the number of steps, and when the number of steps of the SPP is small, the characteristics of the output vortex light field cannot be guaranteed; when the number of steps of the SPP is large, the processing difficulty is large. Furthermore, the problem of multi-stage vortex stacking occurs with broad spectrum operation using ordinary grating technology to generate vortex pairs.
Disclosure of Invention
In order to solve the technical problem, the embodiment of the invention provides a single-pole vortex grating, so that the processing difficulty of a vortex light field output device is reduced while the single-pole output characteristic of a vortex light field is ensured.
In order to solve the above problems, the embodiments of the present invention provide the following technical solutions:
a unipolar vortex grating for generating a pair of vortex light fields to inhibit generation of a multi-stage vortex pair, the unipolar vortex grating comprising: the light-transmitting device comprises a substrate film and a plurality of light-transmitting through hole columns penetrating through the substrate film;
the central position of the light-transmitting through hole array is an equilibrium position after the holographic interference image is binarized, wherein the holographic interference image is formed by interference of plane waves and vortex phase distribution of a vortex light field to be generated, and the position of each light-transmitting through hole in the light-transmitting through hole array is a position after random disturbance is applied to the equilibrium position.
Optionally, the random distribution corresponding to the random disturbance is sinusoidal distribution, normal distribution, gaussian distribution, or t distribution.
Optionally, the light-transmitting through holes in the light-transmitting through hole row are distributed continuously or discretely.
Optionally, the monopole vortex grating is an amplitude element, and the substrate film is an absorption substrate film.
Optionally, the substrate film is made of gold, silver, aluminum, chromium, silicon nitride or silicon carbide.
Optionally, the thickness of the substrate film is 100 nm.
Optionally, the unipolar vortex grating may be a phase element, the substrate film is a light-transmitting film, and incident light emitted to the unipolar vortex grating has a phase difference with incident light emitted from the substrate film through the light-transmitting through hole.
Optionally, N times of the transverse length of the light-transmitting through hole is equal to the transverse period of the equilibrium position of the unipolar vortex grating, where N is an integer greater than 1; the transverse period of the balance position is the distance between the central lines of two adjacent light-transmitting through hole rows, and the transverse direction is perpendicular to the extending direction of the light-transmitting through hole rows.
Optionally, when each light-transmitting through hole in the light-transmitting through hole row is a square hole, the transverse length of the light-transmitting through hole is 0.5 times the transverse period of the equilibrium position of the unipolar vortex grating; when each light-transmitting through hole in the light-transmitting through hole row is a circular hole distributed discretely, the transverse length of the light-transmitting through hole is (1.22/2) times or (1.3/2) times of the transverse period of the balance position of the unipolar vortex grating.
Optionally, the lateral period at the equilibrium position after the binarization of the holographic interference pattern satisfies:
Λ＝λ/sin(arctan(Δ/(2·d)))；
Λ is the transverse period of the balance position after the holographic interference image is binarized, d is the output distance of the unipolar vortex grating, delta is the distance between the emergent vortex pairs, and lambda is the central wavelength of incident light.
Optionally, the design freedom of the light-transmitting through hole has five degrees.
Compared with the prior art, the technical scheme has the following advantages:
the single-pole vortex grating provided by the embodiment of the invention comprises a substrate film and a plurality of light-transmitting through hole rows penetrating through the substrate film, wherein the light-transmitting through hole rows form the grating, and each light-transmitting through hole row is formed by a plurality of light-transmitting through holes; the center position of the light-transmitting through hole array is the balance position after the holographic interference image binaryzation obtained after the vortex phase distribution diagram is loaded on the plane wave, the position of each light-transmitting through hole in the light-transmitting through hole array is the position after the balance position of the light-transmitting through hole array is randomly disturbed, so that the single-pole output of the quasi-sinusoidal grating is realized by utilizing a space phase adjusting mechanism, the multi-level output of higher harmonics is inhibited, the effect similar to the hologram is achieved, the signal to noise ratio is improved, the high harmonic pollution is eliminated, and the resolution ratio is improved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a partial schematic view of a single-pole vortex grating having a plurality of light-transmissive through holes arranged in a continuous manner according to an embodiment of the present invention;
FIG. 2 is a partial schematic view of a single-pole vortex grating according to an embodiment of the present invention, in which the light-transmissive through holes are continuously distributed in a more detailed manner;
FIG. 3 is a partial schematic diagram illustrating a discrete separation of light-transmissive through-holes in a unipolar vortex grating according to an embodiment of the present invention;
fig. 4 is a simulation diagram of zero-free output of pure vortex generated by computer simulation under the irradiation of extreme ultraviolet light by the unipolar vortex grating provided in the embodiment of the present invention when the light-transmitting through hole is a phase or amplitude type light-transmitting through hole;
fig. 5 is a simulation diagram of zero-order and vortex pair output generated by computer simulation of the unipolar vortex grating provided in the embodiment of the present invention under the irradiation of extreme ultraviolet light when the light-transmitting through hole is an amplitude-type light-transmitting through hole;
fig. 6 is a simulation diagram of the relative diffraction efficiency in the x-axis direction under the irradiation of extreme ultraviolet light when the unipolar vortex grating provided by the embodiment of the present invention is a binary amplitude element.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention, but the present invention may be practiced in other ways than those specifically described and will be readily apparent to those of ordinary skill in the art without departing from the spirit of the present invention, and therefore the present invention is not limited to the specific embodiments disclosed below.
An embodiment of the present invention provides a unipolar vortex grating, configured to generate a pair of vortex optical fields and suppress generation of a multi-stage vortex pair, as shown in fig. 1, the unipolar vortex grating includes: the vortex phase distribution interference device comprises a substrate film 10 and a plurality of light-transmitting through hole rows penetrating through the substrate film 10, wherein the central position of each light-transmitting through hole row is an equilibrium position after holographic interference patterns formed by plane waves and vortex phase distribution interference of a vortex light field to be generated are binarized, and the position of each light-transmitting through hole 20 in each light-transmitting through hole row is a position after random disturbance is applied to the equilibrium position. Specifically, the method for acquiring the center position of the light-transmitting through hole row includes: obtaining a holographic interference pattern by utilizing the vortex phase distribution interference of the plane wave and a vortex optical field to be generated; and carrying out binarization on the holographic interference pattern to obtain a balance position, wherein the balance position is the central position of the light-transmitting through hole array.
In the random disturbance applied to the position of each light-transmitting through hole in the through hole array, optionally, the maximum value of the amplitude of the disturbance is not greater than half of the lateral period of the equilibrium position of the unipolar vortex grating and not less than one fourth of the lateral period, so as to avoid that the amplitude of the random disturbance is too large and exceeds the lateral period to destroy the diffraction pattern. Too much or too little disturbance can result in the inability to guarantee the vortex optical field characteristics of the output of the unipolar vortex grating.
It should be noted that, in the embodiment of the present invention, the substrate film may modulate the amplitude and/or the phase of the incident light directed thereto to change the amplitude and/or the phase of the incident light directed thereto.
On the basis of the above embodiments, in an embodiment of the present invention, the unipolar vortex grating is an amplitude-type element, and the generation of the vortex optical field is achieved by modulating the amplitude of the incident light, and in an embodiment of the present invention, the substrate film is an absorbing substrate film, preferably a substrate film, for absorbing a specific light ray (e.g., ultraviolet light) in the incident light; in another embodiment of the present invention, the unipolar vortex grating is a phase-type element, and the generation of the vortex optical field is realized by modulating the phase of incident light, in the embodiment of the present invention, the substrate film may be a transparent film, optionally, a phase difference exists between incident light that is emitted to the unipolar vortex grating and light that is emitted from the transparent through hole after being emitted from the substrate film, and a specific value of the phase difference is determined according to an application requirement of the unipolar vortex grating, which is not limited in the present invention.
It should be noted that, when the unipolar vortex grating is a phase element, a phase difference between an incident light emitted from the unipolar vortex grating through the substrate film and a light emitted from the unipolar vortex grating through the light-transmitting through hole satisfies a +2k pi, where a is (0, pi), including a right-end value, and k is an integer. The closer the value of a is to pi, the better the effect of the vortex light field generated by the unipolar vortex grating is. When the monopole vortex grating is an amplitude type element, the efficiency of a vortex light field generated by the monopole vortex grating depends on the attenuation difference of the substrate film and the light-transmitting through hole to the amplitude of incident light.
On the basis of any one of the above embodiments, in an embodiment of the present invention, when the unipolar vortex grating is an amplitude type element, the substrate film is made of gold, silver, aluminum, chromium, silicon nitride, or silicon carbide. Optionally, the thickness of the substrate film is 100 nm. However, the present invention is not limited thereto, as the case may be.
The single-pole vortex grating provided by the embodiment of the invention only comprises the substrate film and the light-transmitting through hole positioned on the substrate film, does not need an additional substrate, can exist independently, and realizes self-support, thereby eliminating the loss brought by the substrate.
On the basis of any of the above embodiments, in an embodiment of the present invention, the light-transmitting through holes in each light-transmitting through hole row are continuously distributed, as shown in fig. 1 and fig. 2; in another embodiment of the present invention, the light-transmitting through holes in each light-transmitting through hole row are discretely distributed, as shown in fig. 3, so that the equilibrium positions of the adjacent light-transmitting through holes form a lattice-like distribution (e.g., a tetragonal lattice or a hexagonal lattice, etc.) to increase the distance between the adjacent light-transmitting through holes and reduce the process difficulty, but the present invention does not limit this, depending on the situation.
On the basis of any of the above embodiments, in an embodiment of the present invention, the position of the light-transmitting through hole is obtained by applying modulation of sinusoidal random disturbance to a balance position after binarization of the holographic interference pattern, that is, random distribution corresponding to the random disturbance, so that unipolar output of a quasi-sinusoidal grating can be realized by using a spatial phase or amplitude adjustment mechanism, and advanced diffraction output of a vortex light field formed by using a common grating technology is suppressed.
As shown in fig. 4 and 5, fig. 4 and 5 are computer simulation generated vortex pairs of the unipolar vortex grating under extreme ultraviolet light irradiation, where fig. 4 is a simulation diagram of zero-order output of pure vortex pairs generated by computer simulation of the unipolar vortex grating provided by the embodiment of the present invention under extreme ultraviolet light irradiation when the light-transmitting through hole is a phase or amplitude type light-transmitting through hole; fig. 5 is a simulation diagram of zero-order and vortex pair output generated by computer simulation of the unipolar vortex grating provided by the embodiment of the present invention under extreme ultraviolet light irradiation when the light-transmitting through hole is an amplitude-type light-transmitting through hole. As can be seen from fig. 4 and 5, the unipolar vortex grating provided by the embodiment of the present invention can generate a pair of vortex pairs under extreme ultraviolet light irradiation, and suppress generation of other high-order vortex pairs, thereby generating a vortex light field.
It should be noted that, in the embodiment of the present invention, a transverse length of the light-transmitting through hole is related to a transverse period at an equilibrium position after binarization of the holographic interference image, where the transverse period is a distance between similar geometric structures that are adjacent in a transverse direction in the image after binarization of the holographic interference image, that is, a distance between center lines of two adjacent light-transmitting through hole rows, and the transverse direction is perpendicular to an extending direction of the light-transmitting through hole rows. Specifically, in an embodiment of the present invention, N times of a lateral length of the light-transmitting through hole is equal to a lateral period of a balance position corresponding to the light-transmitting through hole, where N is an integer greater than 1.
In the embodiment of the present invention, the lateral length of the light-transmitting through hole is limited by the minimum line width of the micro-machining, and the position accuracy thereof is limited by the maximum resolution of the machining position accuracy. Therefore, on the basis of the above embodiment, in an embodiment of the present invention, when each light-transmitting through hole in the light-transmitting through hole row is a square hole, the transverse length of the light-transmitting through hole is 0.5 times or a little larger than the transverse period of the equilibrium position of the unipolar vortex grating; when each light-transmitting through hole in the light-transmitting through hole row is a circular hole which is discretely distributed (namely, the unipolar vortex grating is similar to a photon sieve), the transverse length of the light-transmitting through hole is (1.22/2) times or (1.3/2) times of the transverse period of the equilibrium position of the unipolar vortex grating, so as to reduce the processing pressure of the unipolar vortex grating and improve the processing efficiency of the unipolar vortex grating, but the invention is not limited thereto, and is determined as the case may be.
It should be further noted that, in the embodiment of the present invention, the length (i.e. longitudinal length) of the light-transmitting through hole in the direction parallel to the extending direction of the light-transmitting through hole row is related to the purity of the unipolar characteristic to be realized by the unipolar vortex grating and the process capability of the unipolar vortex grating, and the shorter the longitudinal length of the light-transmitting through hole is, the higher the purity of the unipolar characteristic of the unipolar vortex grating is, the better the suppression of the multipolar extension is, and even the same as the hologram. The shorter the longitudinal length of the light-transmitting through-hole, the better, if process capabilities allow.
Specifically, on the basis of the above embodiment, in an embodiment of the present invention, the lateral period at the equilibrium position after the binarization of the holographic interference pattern satisfies:
Λ＝λ/sin(arctan(Δ/(2·d)))；
Λ is the transverse period of the holographic interference image at the balance position after binarization, and optionally Λ is the transverse period of the holographic interference image at the balance position far away from the center after binarization, namely the transverse period of the holographic interference image at the balance position at the boundary after binarization, d is the output distance of the vortex grating, delta is the distance of the emergent vortex pair, and lambda is the central wavelength of incident light.
It should be noted that, in other embodiments of the present invention, the shape of the light-transmitting through hole may also be other shapes such as a parallelogram, a rounded square, or a hexagon, and the complicated shape of the light-transmitting through hole may improve efficiency and obtain a high suppression ratio.
Specifically, in an embodiment of the present invention, the light-transmitting through hole has five design degrees of freedom, specifically: the light-transmitting through hole is a changing unit which applies phase or amplitude change to incident light simply or applies phase and amplitude simultaneously; secondly, random disturbance is applied to the positions of the light-transmitting through holes in the direction of the transverse period, and the disturbance can be not only in sine distribution but also in cosine distribution, normal distribution, Gaussian distribution or t distribution; thirdly, the positions of the light-transmitting through holes can also be continuously distributed or discretely distributed in the longitudinal direction (the direction perpendicular to the transverse period); fourthly, the shape of the light-transmitting through hole; and fifthly, forming a crystal lattice of the adjacent light-transmitting through holes. However, the present invention is not limited thereto, and the design freedom of the light-transmitting through hole only includes at least one of the above-mentioned degrees of freedom, which depends on the application requirements of the monopole vortex grating.
Specifically, in one embodiment of the present invention, the number of the light-transmitting through-hole rows in the unipolar vortex grating and the light-transmitting through-holes in the light-transmitting through-hole rows is obtained by the following formula:
(Ni＝Li/Λi(i＝x，y))；
wherein Nx is the number of the light-transmitting through hole arrays in the unipolar vortex grating, Ny is the number of the light-transmitting through holes in the light-transmitting through hole arrays, Lx is the length of the unipolar vortex grating, Ly is the width of the unipolar vortex grating, ΛxIs the transverse of the unipolar vortex gratingCycle to cycle, ΛyIs the longitudinal period of the unipolar vortex grating, i.e. the lattice information of the stable position.
Specifically, in an embodiment of the present invention, the method for determining the position of each light-transmitting through hole in the unipolar vortex grating includes: calculating a geometrical curve of the interference hologram of the vortex and the equilibrium position of the hologram; selecting the shape and random distribution of the light-transmitting through holes based on the diffraction efficiency, signal-to-noise ratio and process requirements to be realized by the unipolar vortex grating; arranging the light-transmitting through holes at the equilibrium positions of the hologram and applying random perturbation displacement. In other embodiments of the present invention, the positions of the light-transmitting through holes in the unipolar vortex grating may be obtained by calculating a boundary after binarizing the interference hologram, and disturbing a single quadrangle after dividing the boundary into a plurality of quadrangles by means of boundary discretization.
As shown in fig. 6, fig. 6 is a simulation diagram of the relative diffraction efficiency in the x-axis direction under the irradiation of extreme ultraviolet light when the unipolar vortex grating provided by the embodiment of the present invention is a binary amplitude element. As can be seen from FIG. 6, the vortex optical field generated by the unipolar vortex grating provided by the embodiment of the present invention only has significant 0-order and + -1-order diffraction, and the relative diffraction efficiency at other positions is extremely low and can be ignored.
Therefore, the unipolar vortex grating provided by the embodiment of the invention comprises a substrate film and a plurality of light-transmitting through hole columns which are positioned in the substrate film and penetrate through the substrate film, wherein the light-transmitting through hole columns form a grating-like structure, and each light-transmitting through hole column is formed by a plurality of light-transmitting through holes; the center position of the light-transmitting through hole array is a balance position after the holographic interference image obtained after the vortex phase distribution diagram is loaded on the plane wave is binarized, the position of each light-transmitting through hole in the light-transmitting through hole array is a position after random disturbance is applied to the balance position of the light-transmitting through hole array, the center position of the light-transmitting through hole array is a balance position after the holographic interference image obtained after the vortex phase distribution diagram is loaded on the plane wave is binarized and is used for generating a vortex pair, and the position of each light-transmitting through hole in the light-transmitting through hole array is a position after random disturbance is applied to the balance position of the light-transmitting through hole array and is used for inhibiting high-level diffraction, so that the unipolar vortex grating provided by the embodiment of the invention realizes unipolar output of a quasi-sine grating by utilizing a space phase or amplitude regulating mechanism, inhibits higher harmonic pollution and achieves the effect similar to the hologram, the signal to noise ratio is improved, high harmonic pollution is eliminated, and the resolution ratio is improved. The vortex pair generated by the unipolar vortex grating provided by the embodiment of the invention can be verified by plane wave re-interference, and the internal phase of the vortex pair accords with the characteristic of a spiral phase field of a vortex light field.
It should be noted that, although in the embodiment of the present invention, the position of the light-transmitting through hole and the substrate form a binary transmission contrast, and the output is zero-order and ± 1-order vortex output (that is, the topological charge of the vortex optical field is 1), the present invention is not limited to this, and in other embodiments of the present invention, the unipolar vortex grating may be used to design vortex pair output with higher topological charge, that is, the topological charge of the vortex optical field generated by the unipolar vortex grating may also be greater than 1, as the case may be. It should also be noted that, in the embodiment of the present invention, the specific topological charge depends on the topological charge of the hologram at the equilibrium position, and the number of topological charges of the hologram depends on the helicity and the helical direction of the vortex phase field of the vortex optical field.
Correspondingly, the embodiment of the invention also provides a forming method of the unipolar vortex grating, which comprises the following steps:
sputtering a layer of metal film on the polished substrate, wherein optionally, the substrate is a quartz substrate, the metal film is a chromium film, and the thickness of the metal film is 100 nm;
performing heat treatment immediately after a layer of positive electron beam photoresist is spin-coated on the metal film, and then manufacturing a designed photoresist pattern which is periodically arranged by utilizing electron beam exposure;
etching the exposed metal film by using the photoresist pattern as a mask through a dry etching process to form a circular light-transmitting pattern region;
and removing the electron beam photoresist to form the unipolar vortex grating.
In summary, the unipolar vortex grating and the manufacturing method thereof provided by the embodiments of the present invention only include the substrate film and the transparent through hole located on the substrate film, and are two-phase elements, which only need a second-order phase or amplitude, and do not have a spatial three-dimensional structure. Moreover, the unipolar vortex grating provided by the embodiment of the invention can realize quasi-holographic output only through two gray levels (such as light transmission and light non-transmission), thereby greatly reducing the manufacturing difficulty and cost of multi-gradient gray levels, providing a new way for generating vortex light fields in extreme ultraviolet and X-ray, and being capable of working in a wider waveband of visible light and infrared light. Optionally, the extreme ultraviolet band is 13.5 ± 0.2 nm.
In addition, in the unipolar vortex grating and the manufacturing method thereof provided by the embodiment of the invention, the light-transmitting through hole is obtained by applying random disturbance modulation at the equilibrium position after the binarization of the holographic interference pattern, so that a spatial phase adjustment mechanism can be utilized to realize the unipolar output of the similar grating, the high-level diffraction problem is inhibited, and the light-transmitting through hole has the potential to be applied to a Stimulated emission loss microscope (STED) microscopy and optical communication.
In the description, each part is described in a progressive manner, each part is emphasized to be different from other parts, and the same and similar parts among the parts are referred to each other.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (11)
1. A unipolar vortex grating for generating a pair of vortex light fields to inhibit generation of a multi-stage vortex pair, the unipolar vortex grating comprising: the light-transmitting device comprises a substrate film and a plurality of light-transmitting through hole columns penetrating through the substrate film;
the central position of the light-transmitting through hole array is an equilibrium position after the holographic interference image is binarized, wherein the holographic interference image is formed by interference of plane waves and vortex phase distribution of a vortex light field to be generated, and the position of each light-transmitting through hole in the light-transmitting through hole array is a position after random disturbance is applied to the equilibrium position.
2. The unipolar vortex grating of claim 1 wherein the random perturbations correspond to a random distribution that is a sinusoidal distribution, a normal distribution, a gaussian distribution, or a t-distribution.
3. The unipolar vortex grating of claim 1 wherein each of the light-transmissive through-holes in the row of light-transmissive through-holes is one of continuously or discretely distributed.
4. The unipolar vortex grating of claim 1 wherein the unipolar vortex grating is an amplitude-type element and the substrate film is an absorbing substrate film.
5. The unipolar vortex grating of claim 4 wherein the substrate film is gold, silver, aluminum, chromium, silicon nitride or silicon carbide.
6. The unipolar vortex grating of claim 4 wherein the substrate film has a thickness of 100 nm.
7. The unipolar vortex grating of claim 1, wherein the unipolar vortex grating is optionally a phase-type element, the substrate film is a light-transmissive film, and incident light directed at the unipolar vortex grating is out of phase with incident light directed through the substrate film.
8. The unipolar vortex grating of claim 1 wherein N times the lateral length of the light-transmissive through-hole is equal to the lateral period of the equilibrium position of the unipolar vortex grating, wherein N is an integer greater than 1; the transverse period of the balance position is the distance between the central lines of two adjacent light-transmitting through hole rows, and the transverse direction is perpendicular to the extending direction of the light-transmitting through hole rows.
9. The unipolar vortex grating of claim 8 wherein when each light-transmissive via in the row of light-transmissive vias is a square via, a lateral length of the light-transmissive via is 0.5 times a lateral period of an equilibrium position of the unipolar vortex grating; when each light-transmitting through hole in the light-transmitting through hole row is a circular hole distributed discretely, the transverse length of the light-transmitting through hole is (1.22/2) times or (1.3/2) times of the transverse period of the balance position of the unipolar vortex grating.
10. The unipolar vortex grating of claim 8 wherein the lateral period at the equilibrium location after the holographic interferogram is binarized satisfies:
Λ＝λ/sin(arctan(Δ/(2·d)))；
Λ is the transverse period of the balance position after the holographic interference image is binarized, d is the output distance of the unipolar vortex grating, delta is the distance between the emergent vortex pairs, and lambda is the central wavelength of incident light.
11. The unipolar vortex grating of claim 1 wherein there are five design degrees of freedom for the light-transmissive through-hole.
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| 利用计算全息光栅产生的涡旋光测量物体变形;史凯 等;《山东科学》;20170430;第30卷(第2期);第61-66页 * |
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