CN104111488A - Design of reflective wave strip sheet with single-stage diffraction characteristic and manufacturing method thereof - Google Patents
Design of reflective wave strip sheet with single-stage diffraction characteristic and manufacturing method thereof Download PDFInfo
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- CN104111488A CN104111488A CN201310495797.2A CN201310495797A CN104111488A CN 104111488 A CN104111488 A CN 104111488A CN 201310495797 A CN201310495797 A CN 201310495797A CN 104111488 A CN104111488 A CN 104111488A
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Abstract
The invention discloses a design of a reflective wave strip sheet with a single-stage diffraction characteristic and a manufacturing method thereof. The reflective wave strip sheet comprises a transparent substrate; and multiple high-reflectivity circular elements which are formed on the aforementioned transparent substrate. The aforementioned circular elements are randomly distributed in elliptical rings of the reflective wave strip sheet and are not intersected. Radiuses of the circular elements change along with size of width of the elliptical rings. The range of the radiuses of the elements arranged between the (n-1)th and nth (n is an integer greater than 1) rings is [rnmax, rnmin], wherein rnmax=(an-an-1)/2, rnmin=(bn-bn-1)/2, an in the formula is the long axis of the nth ring line, and bn is the short axis of the nth ring line. The reflective wave strip sheet only has zero-order and positive and negative one-order diffraction so that high-order diffraction can be effectively inhibited and harmonic pollution can be eliminated. Meanwhile, the reflective wave strip sheet has a binary structure characteristic so that the reflective wave strip sheet is easy to manufacture and realize. The reflective wave strip sheet with the single-stage diffraction characteristic has characteristics of integrating dispersion, focusing and higher harmonic inhibition so that the reflective wave strip sheet can act as an optical element for leading edge science, such as soft X-ray light source focusing, monochromatization and spectral analysis.
Description
Technical field
The present invention relates to reflective zone plate technology, in particular, relate to a kind of reflective zone plate design and manufacture method with single diffraction order characteristic.
Background technology
1871, Rayleigh has invented Fresnel zone plate and (has been called for short FZP, Fresnel Zone Plate) (Optics, Addison-Wesley, E.Hecht andA.Zajac), light path based on adjacent ring is that the Fresnel transmission-type zone plate of λ/2 is optical elements of a kind of classics, the characteristic of this element and the focusing of lens, imaging function is similar, yet its character is better than again the character of lens, it is low that it has cost, easily make, area is large, lightweight, the characteristic such as collapsible, in long-range optical communication, extremely important effect is being brought into play in the field such as ligh-ranging and aerospace flight technology.Particularly, its two features are that traditional lens are incomparable: the one,, focal length and wavelength are contrary relation, and lens are to be positive relationship; The 2nd,, it is also effective to short wavelength's light (extreme ultraviolet/grenz ray), and lens can not, this is that essence by their chromatic dispersion principle determines, lens are to realize and focusing on according to the refractive properties of material, for extreme ultraviolet/grenz ray, its refractive index is almost 1, and refractive material is very strong to the absorption of light wave, utilize the refractive properties of general material cannot realize focusing, and for zone plate, its ultimate principle is diffraction and interference theory, be not to be limited to material refractive properties.Although fresnel's zone plate has plurality of advantages, its focused light source size is also less, yet the focusing power of this zone plate is limited to the width of outer shroud, but ought outer shroud less, even be less than 10nm, its resolution no longer changes even poorer, and this is because this zone plate structure determines---body diffraction effect.Along with the development of micro-processing technology, process technology can break through the restriction of traditional fresnel's zone plate 10nm.
1997, T.Wilhein has proposed a kind of reflective zone plate and (has been called for short RZP, reflection zone plate), this reflective zone plate consists of a series of ellipses, it provides good selection for acquisition spatial resolution is less than 10nm, 2005, A.G. Michette obtained the spatial resolution of several nin on theoretical modeling.Reflective zone plate oval structure need to meet the condition of fresnel's zone plate, be that light source need meet λ/2 to the ring of focus point and the optical path difference of adjacent ring, its phase shift is π, zone plate can be regarded the superposition of meridian and sagitta of arc direction grating as, this both direction all needs to meet in grating equation expression formula: d (sin α-sin β)=n λ formula, d is grating constant (cycle of zone plate), comprise meridian and sagitta of arc direction, α, β is respectively incident angle and angle of diffraction, and n is diffraction progression (for integer).Along the meridian direction intercepting zone plate of zone plate, from certain part of axle, can effectively remove 0 grade of light and disturb, 0 order diffraction light does not completely separately interfere with each other with the focus point of the diffraction imaging of+1 grade.RZP is identical with the diffraction principle of Fresnel zone chip architecture, incident wavelength for design can be imaged onto the focal spot position of desirable imaging, there is the incident light of the wavelength of certain deviation can focus on some positions at the two ends of ideal focusing position, the incident light of different wave length will focus on the diverse location of optical axis, therefore this RZP also has dispersion function, i.e. " rainbow " effect.RZP can regard the superposition of meridian and sagitta of arc direction grating as, and therefore this zone plate has the focus characteristics of two meridians and sagitta of arc direction, and the meridian direction of RZP has determined spectrum resolution characteristic, and sagitta of arc direction determines space-focusing ability.Meanwhile, this single optical element is owing to having good focusing, the characteristic that easy to operate and light source utilization factor is high, and therefore this technology can be widely used in soft X-ray laboratory diagnosis aspect.
RZP designs based on diffraction grating principle, yet diffraction grating is a kind of multistage diffraction element, the grating equation of being derived by Fraunhofer, can be learnt by this equation, and integer/mono-'s that wavelength is λ all components (higher hamonic wave) will be diffracted into same direction.Inevitably there is higher hamonic wave component in the light source monochromatization technology that the diffraction grating of take is core parts.The existence of higher hamonic wave component has seriously restricted data confidence level and the precise treatment degree of spectral analysis technique.Adopting various technological means inhibition or Eliminate highter harmonic is the matter of utmost importance that the conventional light source monochromatization technology based on diffraction grating need to be considered.For the higher hamonic wave pollution problem for solution FZP, people have searched out a kind of theoretic solution---Gabor zone plate, its transmitance is strict cosine distribution, until 1992, the people such as Beynon and KirK has proposed the concept of binaryzation Gabor zone plate, this zone plate allows transmittance function in latitude direction and radially exists and change simultaneously, but will radially be cosine distribution on the whole.For diffraction grating, after 2002, the spectroscopy photon screen that Cao Lei peak, laser fusion center, China Physics Institute etc. has proposed accurate random array binaryzation fresnel's zone plate and has been applied to grating binaryzation.
The present invention is that the binaryzation sinusoidal grating based on above-mentioned is theoretical, high order diffraction for RZP, proposed a kind of according to reflective zone plate structural design and the manufacture method with single diffraction order characteristic of endless belt wide variety, the reflective zone plate that the present invention has single diffraction order characteristic is a kind of unique texture that has, and integrates the novel soft x-ray optics element of the excellent characteristic of dispersion, focusing, 0 grade of light interference of elimination and inhibition higher hamonic wave.
Summary of the invention
The technical problem to be solved in the present invention mainly comprises two, and one is to provide a kind of reflective zone plate with single diffraction order characteristic, and two are to provide a kind of reflective zone plate manufacture method with single diffraction order characteristic.A kind of single-stage focus wave strap of the present invention is easy to manufacture, and precision is higher, can according to application band (as Terahertz, infrared, visible ray and ultraviolet and X-ray) each may application band, Design and manufacture has the reflective zone plate of single diffraction order characteristic accordingly, and all can suppress efficiently higher hamonic wave diffraction.
A kind of reflective zone plate with single diffraction order characteristic of the present invention, comprising:
1) transparent substrates, for a kind of transparent material of making in silicon dioxide, silit, silicon nitride or polyimide is made;
2) in described transparent substrates, form a plurality of high reflectance primitives, be shaped as circle.
Described high reflectance elementary material is can to grenz ray, realize the material of high reflection under glancing incidence condition, and as gold, aluminium, copper, nickel, niobium, tantalum, chromium etc., film thickness is generally 300 to 800 nanometers;
The circular primitive of described a plurality of high reflections is positioned at the elliptical ring stochastic distribution of reflective zone plate and non-intersect, simultaneously, the radius of circular primitive changes along with elliptical ring wide variety, for the primitive being positioned between n-1 and n (integer of n > 1) ring, its radius is [r
nmax, r
nmin], r wherein
nmax=(a
n-a
n-1)/2, r
nmin=(b
n-b
n-1)/2, a in formula
nbe the major axis of n loop wire, b
nit is the minor axis of n loop wire;
A kind of manufacture method with the reflective zone plate of single diffraction order characteristic of the present invention, comprising:
1) provide transparent substrates, a kind of transparent material in silicon dioxide, silit, silicon nitride or polyimide
Make;
2) in transparent substrates, apply highly reflective material (as gold, aluminium, copper, nickel, niobium, tantalum, chromium etc.), by
The methods such as photoetching form a plurality of high reflectance primitives in transparent substrates
Step 2) the circular primitives of the described a plurality of high reflectances described in are positioned at the elliptical ring stochastic distribution of reflective zone plate and non-intersect, simultaneously, the radius of circular primitive changes along with elliptical ring wide variety, for the primitive being positioned between n-1 and n (integer of n > 1) ring, its radius is [r
nmax, r
nmin], r wherein
nmax=(a
n-a
n-1)/2, r
nmin=(b
n-b
n-1)/2, a in formula
nbe the major axis of n loop wire, b
nit is the minor axis of n loop wire;
Compared with prior art, the reflective zone plate with single diffraction order characteristic of the present invention has the following advantages:
1) reflective zone plate of the present invention, design by its special construction makes this zone plate have single-focusing focus characteristics, only have 0 grade and positive and negative 1 order diffraction, there is not high-order focus, reflective zone plate of the present invention is like this kind of novel soft x-ray optics element that integrates dispersion, focusing, 0 grade of light interference of elimination and suppress higher hamonic wave excellent characteristic, therefore while using as the beam splitter of monochromator or spectrometer, the higher hamonic wave composition that filtering efficiently brings because of senior diffraction, the monochromatic performance of raising emergent light.
2) only there are printing opacity and light tight two kinds of regions in reflective zone plate structure of the present invention, is a kind of knot of binaryzation
Structure, just can adopt the semiconductor technology of standard to make, in addition, and the primitive shape of high reflectance of the present invention
For circle, do not have sharp-pointed angle, so its making precision is more easily controlled.
Accompanying drawing explanation
Fig. 1 is the local structural graph of the reflective zone plate with single diffraction order characteristic of the embodiment of the present invention;
Fig. 2 is the project organization schematic diagram of the reflective zone plate with single diffraction order characteristic of the embodiment of the present invention;
Fig. 3 is that the reflective zone plate with single diffraction order characteristic of the embodiment of the present invention is along the comparison of the monocyclic reflectivity function of normalization of reflective zone plate meridian direction and the reflectivity function of sinusoidal reflective zone plate;
Fig. 4 is the reflective zone plate design concept schematic diagram with single diffraction order characteristic of the embodiment of the present invention;
Fig. 5 is the diffraction characteristic of the black and white conventional reflective zone plate corresponding with the reflective zone plate with single diffraction order characteristic of example of the present invention, and the diffraction characteristic of higher hamonic wave (5 frequency multiplication);
Fig. 6 is the diffraction characteristic of the reflective zone plate with single diffraction order characteristic of the embodiment of the present invention;
Fig. 7 is the diffraction characteristic of 3 frequency multiplication higher hamonic wave compositions of the reflective zone plate with single diffraction order characteristic of the embodiment of the present invention;
Fig. 8 is the diffraction characteristic of 5 frequency multiplication higher hamonic wave compositions of the reflective zone plate with single diffraction order characteristic of the embodiment of the present invention;
Fig. 9 is the processing and fabricating schematic flow sheet of the reflective zone plate with single diffraction order characteristic of the embodiment of the present invention.
Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in detail.
A lot of details have been set forth in the following description so that fully understand the present invention, but the present invention can also adopt other to be different from alternate manner described here and implement, those skilled in the art can do similar popularization without prejudice to intension of the present invention in the situation that, so the present invention is not subject to the restriction of following public specific embodiment.
Secondly, the present invention is described in detail in conjunction with schematic diagram, and schematic diagram is only used as example, and it should not limit the scope of protection of the invention at this.The three-dimensional space that should comprise in addition, corresponding length, width and the degree of depth in actual fabrication.
Just as described in the background section, the multistage diffraction of traditional reflective zone plate of black and white, exists higher hamonic wave Diffraction Problems, and it has seriously limited X ray spectroscopic diagnostics and light source monochromatization aspect technology, and example of the present invention is analyzed this problem.
Embodiment
For this reason, the present embodiment discloses a kind of reflective strap with single diffraction order characteristic that is applicable to Soft X-Ray Region, shown in figure 1 and Fig. 2, comprising:
1) transparent silicon carbide substrates;
2) in transparent substrates, form a plurality of circular high reflectance primitive array with Two dimensional Distribution.Figure 1 shows that the reflective zone plate 60 ring local structural graphs with single diffraction order characteristic of the present invention, the circular primitive of the change radius that in figure, white is filled is high reflectance primitive.Black region is transparent film.Fig. 2 is structural design schematic diagram of the present invention, circular configuration in figure is primitive of the present invention, loop wire is the oval loop wire of zone plate, primitive between loop wire stochastic distribution, do not mutually disjoint and be no more than loop wire, the radius of circular primitive changes along with elliptical ring wide variety.For the primitive being positioned between n-1 and n (integer of n > 1) ring, its radius is [r
nmax, r
nmin], wherein
rnmax=(a
n-a
n-1)/2, r
nmin=(b
n-b
n-1)/2, a in formula
nbe the major axis of n loop wire, b
nit is the minor axis of n loop wire; Described elliptical ring is determined by following formula:
In formula,
r
1, R
2, f, θ, λ is respectively the grazing angle of object distance, image distance, focal length, incident light and the reflective zone plate wavelength of design, and reflective zone plate basic principle schematic is as shown in Figure 4.
The reflective zone plate with single diffraction order characteristic of the present invention is a kind of unique texture that has, the novel soft x-ray optics element that integrates the excellent characteristic of dispersion, focusing, 0 grade of light interference of elimination and inhibition higher hamonic wave, single element just can be realized a plurality of functions, effectively raise the utilization ratio of light, simplified light path system, had the advantages that ease-to-operate, dirigibility and cost are low.The reflective zone plate with single diffraction order characteristic of the present invention all has extremely important effect in the radiodiagnosis of ultrafast process (100fs) and the monochromatization process of X ray wave band.The primitive that the reflective zone plate with single diffraction order characteristic of the present invention adopts is for circular, and this binaryzation architectural feature can adopt the semiconductor technology of standard to make, and does not have sharp-pointed especially angle, is therefore more prone to control it and makes precision.In order to verify the correctness with the reflective zone plate design of single diffraction order characteristic of the present invention, Fig. 3 has compared single cycle reflectivity and the cosine function with the reflective zone plate of single diffraction order characteristic of the present invention.
This example has only provided the diffraction characteristic example of X ray wave band, the reflective zone plate with single diffraction order characteristic of the present invention is still applicable to other wave band, as wave bands such as ultraviolet light, visible ray and infrared lights, only need under this example, revise relevant parameter.
Above the reflective zone plate structure with single diffraction order characteristic of the present invention is described in detail, single-stage focusing effect for a better understanding of the present invention, below has carried out focus characteristics theoretical modeling to the reflective zone plate of traditional black and white formula and the reflective zone plate with single diffraction order characteristic of the present invention respectively.In the theoretical modeling process of the reflective zone plate of tradition black and white formula and the reflective zone plate with single diffraction order characteristic of the present invention, as shown in Figure 4, the parameter of employing is the light path of employing: R
1=750mm, R
2=1500mm, θ=0.0698rad, pointolite λ=2.478nm, from a part for axle intercepting zone plate: meridian direction, is taken to i.e. 1000 rings altogether of the 2000th ring from the 1000th ring.Meridian direction length is 6.5mm; Sagitta of arc direction is only got 0.52mm.Zone plate is 15.8 μ m to 11.1 μ m along " grating " cycle variation range of meridian direction, and the mean wave strap cycle is 13 μ m.
The analog result of the reflective zone plate that Fig. 5 has provided traditional black and white formula under above-mentioned parameter, wherein Fig. 5 (a) is respectively the light distribution that incident wavelength is the diffraction of 2.478nm and 2.478/5nm, Fig. 5 (b) is respectively at focal spot maximal value place the one dimension distribution of differentiating respectively direction and spatial discrimination direction along spectrum, can find out that thus wavelength is that the incident light that 2.478nm and wavelength are 2.478/5nm focuses on same point, and light intensity difference is less, illustrate that traditional RZP exists higher hamonic wave Diffraction Problems.
Fig. 6 has provided the diffraction focus characteristics of the reflective zone plate with single diffraction order characteristic of the present invention when lambda1-wavelength is 2.478nm, (a) figure and (b) one dimension that figure is respectively two-dimentional light distribution and differentiates direction and spatial discrimination direction along spectrum respectively at focal spot maximal value place distribute.By comparison diagram 5 (b) and Fig. 6 (b), can find out the focal dimension of the reflective zone plate with single diffraction order characteristic of the present invention and traditional black and white formula RZP very: spatial discrimination direction is 6.4 μ m, and spectrum is differentiated direction and is respectively 7 μ m and 7.4tm.
Fig. 7 and Fig. 8 have provided respectively the reflective zone plate with single diffraction order characteristic of the present invention when lambda1-wavelength is 2.478/3nm and 2.478/5nm, light distribution on test surface, as seen from the figure, for 3 frequencys multiplication, resulting light distribution is differentiated direction in spectrum certain focusing phenomenon, but there is very large difference with the RZP of traditional black and white, the centre wavelength 2.478nm focus strength that its focus strength designs for RZP～1/400, to 3 frequency multiplication compositions suppressed～400 times.Equally, for 5 frequencys multiplication, in spectrum, differentiating direction also has certain focusing phenomenon, but has very large difference with the RZP of traditional black and white, the centre wavelength 2.478nm focus strength that its focus strength designs for RZP～1/1000, to 5 frequency multiplication compositions suppressed～1000 times.Fully verified that the reflective zone plate with single diffraction order characteristic of the present invention can effectively suppress higher hamonic wave pollution problem.
Above reflective zone plate structure and the focus characteristics with single diffraction order characteristic of the present invention is described in detail, scheme for a better understanding of the present invention and effect, below the manufacture method to the specific embodiment of the invention is described in detail, as shown in Figure 9, concrete steps are as follows.
First, provide carborundum films substrate.
Secondly, sputter one deck Gr film on described carborundum films substrate.
Then, spin coating electron sensitive resist on film on described substrate, after thermal treatment, carry out directly writing and the operation such as development of electron beam, thereby the mask layer that obtains the electron sensitive resist of patterning (here for becoming the circular pattern of radius size), the part of overlay electronic bundle resist is the pattern of high reflection primitive.
Then, the method by etching etches away Gr on the Gr film of overlay electronic bundle resist not.
Then, remove electron sensitive resist, thereby in silit transparent substrates, formed the circular primitive of the high reflectance of certain distribution, described primitive radius changes with endless belt wide variety, and it is stochastic distribution and non-intersect in endless belt.
Be understandable that in this embodiment, only have two kinds of regions of printing opacity and high reflected light, the region of printing opacity can be controlled by the mask pattern of patterning, and manufacturing process is simple, can be compatible with semiconductor fabrication.
So far completed the reflective zone plate with single diffraction order characteristic of this embodiment, it will be understood by those skilled in the art that, the method that forms primitive is various, can also adopt the mask layer that first forms patterning on substrate, then form metallic diaphragm, then remove electron sensitive resist and form high reflectance primitive, or can also adopt other suitable method to form, these are only example, the present invention to how forming the method for high reflectance primitive does not herein limit.
The above, be only preferred embodiment of the present invention, not the present invention done to any pro forma restriction.
Although the present invention discloses as above with preferred embodiment, yet not in order to limit the present invention.Any those of ordinary skill in the art, do not departing from technical solution of the present invention scope situation, all can utilize method and the technology contents of above-mentioned announcement to make many possible changes and modification to technical solution of the present invention, or be revised as the equivalent embodiment of equivalent variations.Therefore, every content that does not depart from technical solution of the present invention,, all still belongs in the scope of technical solution of the present invention protection any simple modification made for any of the above embodiments, equivalent variations and modification according to technical spirit of the present invention.
Claims (9)
1. a single-stage focus wave strap, its feature comprises:
The first pattern:
Transparent substrates;
In above-mentioned transparent substrates, form the film of one deck high reflectance, material is generally gold, aluminium, copper, nickel, niobium, tantalum, chromium etc.;
On above-mentioned high reflective film, form a plurality of transparent primitive with Two dimensional Distribution, primitive be shaped as circle.
The second pattern:
Transparent substrates;
In above-mentioned transparent substrates, form a plurality of high reflectance primitives with Two dimensional Distribution, primitive be shaped as circle.
The ensuing content of the present invention is all analyzed and is discussed according to the second pattern.
2. the reflective zone plate with single diffraction order characteristic according to claim 1, it is characterized in that: described high reflectance elementary material is for can realize the material of high reflection to grenz ray under glancing incidence condition, as gold, aluminium, copper, nickel, niobium, tantalum, chromium etc.
3. the reflective zone plate with single diffraction order characteristic according to claim 1, is characterized in that: described high reflectance primitive thickness is generally 300 to 800 nanometers.
4. the reflective zone plate with single diffraction order characteristic according to claim 1, it is characterized in that: described a plurality of circular primitives are positioned at the elliptical ring stochastic distribution of reflective zone plate and non-intersect, simultaneously, the radius of circular primitive changes along with elliptical ring wide variety, for the primitive being positioned between n-1 and n (integer of n > 1) ring, its radius is [r
nmax, r
nmin], r wherein
nmaz=(a
n-a
n-1)/2, r
nmin=(b
n-b
n-1)/2, a in formula
nbe the major axis of n loop wire, b
nit is the minor axis of n loop wire.
5. according to the reflective zone plate with single diffraction order characteristic described in claim 1, it is characterized in that: described transparent substrates is the transparent material that silicon dioxide, silit, silicon nitride or polyimide are made.
6. the reflective zone plate with single diffraction order characteristic according to claim 1, is characterized in that: in transparent substrates, by applying high reflecting material, by methods such as photoetching, obtain high reflectance primitive.
7. a method for making with the reflective zone plate of single diffraction order characteristic, is characterized in that:
A, provide transparent substrates;
B, on described substrate, form the circular primitive of a plurality of high reflections.
8. the preparation method with the reflective zone plate of single diffraction order characteristic according to claim 7, it is characterized in that: being distributed as along even stochastic distribution and non-intersect in elliptical ring of a plurality of high reflection primitive described in step B, described elliptical ring is determined by following formula:
In formula,
r
1, R
2, f, θ, λ is respectively the grazing angle of object distance, image distance, focal length, incident light and the reflective zone plate wavelength of design.
9. the preparation method with the reflective zone plate of single diffraction order characteristic according to claim 7, is characterized in that: described transparent substrates is that a kind of transparent material in silicon dioxide, silit, silicon nitride or polyimide is made.
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