CN106883565B - 一种高阻隔复合薄膜 - Google Patents
一种高阻隔复合薄膜 Download PDFInfo
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Abstract
本发明提出了一种高阻隔复合薄膜,包括外层、阻隔层和内层三个复合结构层,所述涂层包括以下百分含量的组分制成:PA 75‑80%、纳米硅溶胶20‑25%,所述阻隔层包括以下百分含量的组分制成:PET 30‑60%、PEN 8‑18%、纳米改性蒙脱土30‑60%,所述内层包括以下百分含量的组分制成:PE 30‑60%、PP 30‑55%、成核剂2‑4%、相容剂5‑15%,通过对阻隔层进行共混、插层双改性,大大提高了薄膜对气体、水分的阻隔效果,显著延长了包装商品的保质期,同时外层的硅溶胶在提高PA性能的同时也提高了防水抗污的效果,进一步保证了优异的阻隔效果。
Description
技术领域
本发明涉及复合薄膜技术领域,具体涉及一种高阻隔复合薄膜。
背景技术
PET薄膜具有很好的透明性、较好的气密性和中等的防潮性;同时它在较宽的温度范围内具有优良的物理机械性能,长期使用温度可达120℃,电绝缘性优良;还具有很好的抗蠕变性、耐疲劳性和尺寸稳定性,是一种性能优异的包装薄膜,被广泛应用于各行各业。但目前现有薄膜对水分、空气的阻隔性能偏低,使得产品的保质期偏低,达不到预期的保质效果,所以,为了满足市场需求,增强薄膜对水分、空气的高阻隔性能,继续研制出一种高阻隔的复合薄膜。
发明内容
针对上述存在的问题,本发明提出了一种高阻隔复合薄膜,通过对阻隔层进行共混、插层双改性,大大提高了薄膜对气体、水分的阻隔效果,显著延长了包装商品的保质期,同时外层的硅溶胶在提高PA性能的同时也提高了防水抗污的效果,进一步保证了优异的阻隔效果。
为了实现上述的目的,本发明采用以下的技术方案:
一种高阻隔复合薄膜,其特征在于,包括外层、阻隔层和内层三个复合结构层,所述涂层包括以下百分含量的组分制成:PA75-80%、纳米硅溶胶20-25%,所述阻隔层包括以下百分含量的组分制成:PET30-60%、PEN 8-18%、纳米改性蒙脱土30-60%,所述内层包括以下百分含量的组分制成:PE 30-60%、PP 30-55%、成核剂2-4%、相容剂5-15%。
优选的,高阻隔复合薄膜,包括外层、阻隔层和内层三个复合结构层,所述涂层包括以下百分含量的组分制成:PA78-80%、纳米硅溶胶20-22%,所述阻隔层包括以下百分含量的组分制成:PET 40-60%、PEN 8-15%、纳米改性蒙脱土30-50%,所述内层包括以下百分含量的组分制成:PE 35-50%、PP 30-50%、成核剂3-4%、相容剂8-10%。
优选的,所述纳米改性蒙脱土的制备原料为钠基蒙脱土、醋丙乳液、去离子水、对氨基苯甲酸盐。
优选的,所述纳米改性蒙脱土制备方法如下:1)将钠基蒙脱土与适量去离子水配置成悬浮液,先在室温下高速搅拌30-40min,然后升温至60℃高速搅拌分散至钠基蒙脱土完全溶胀;2)再向其中加入对氨基苯甲酸盐,升温至90-95℃,恒温搅拌1-1.2h,然后经冷却、抽滤、真空干燥、研磨得纳米蒙脱土;3)将纳米蒙脱土与适量去离子水配置成悬浮液,具体为先在室温下高速搅拌30-40min,然后升温至50℃进行一次超声处理10-15min,然后将醋丙乳液滴加入其中,调节温度为35℃搅拌分散1.5-2h,再进行二次超声处理10-15min,然后经冷却、抽滤、真空干燥、研磨即得纳米改性蒙脱土。
优选的,所述成核剂为质量比1:3:6的氧化铈、滑石粉和聚乙二醇的组合物。
优选的,所述相容剂为质量比PE-g-MAH、PP-g-MAH的组合物。
优选的,高阻隔复合薄膜的制备方法,步骤如下:
1)将PA切片与纳米硅溶胶放入混料机中共混,在100-120℃条件下保持3-4h,得外层料;将PET切片、PEN切片与纳米改性蒙脱土放入混料机中共混,在100-120℃条件下保持3-6h,得阻隔层料;将PP切片、PE切片、相容剂、成核剂放入混料机中共混,在100-120℃条件下保持3-6h,得内层料;
2)将外层料、阻隔层料、内层料采用多层共挤工艺挤出成型,然后经拉伸成膜。
优选的,成型过程中挤出量为1300Kg/h,激冷辊转速为50m/min。
优选的,拉伸后制得的高阻隔薄膜为25μm复合薄膜。
由于采用上述的技术方案,本发明的有益效果是:本发明通过对阻隔层进行共混、插层双改性,大大提高了薄膜对气体、水分的阻隔效果,显著延长了包装商品的保质期,同时外层的硅溶胶在提高PA性能的同时也提高了防水抗污的效果,进一步保证了优异的阻隔效果。制得的复合薄膜美观平整,具有优异的抗水、防渗、抗老化、耐高温等特性,且粘结性强,增强了复合薄膜的使用效能,制得的高阻隔复合薄膜氧气透过率小于0.0046/(cm3·cm/m2·24h·bar),二氧化碳透过率小于0.0097/(cm3·cm/m2·24h·bar),水蒸气透过率小于0.0114/(g·cm/m2·24h·bar)(测试温度为25℃,以上数据为本发明实施例产品性能测试的平均值)。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚,下面将结合本发明实施例,对本发明实施例中的技术方案进行清楚、完整地描述。基于本发明的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
实施例1:
一种高阻隔复合薄膜,其特征在于,包括外层、阻隔层和内层三个复合结构层,所述涂层包括以下百分含量的组分制成:PA 75%、纳米硅溶胶25%,所述阻隔层包括以下百分含量的组分制成:PET40%、PEN 10%、纳米改性蒙脱土50%,所述内层包括以下百分含量的组分制成:PE 40%、PP 50%、成核剂3%、相容剂7%。
所述纳米改性蒙脱土制备方法如下:1)将钠基蒙脱土与适量去离子水配置成悬浮液,先在室温下高速搅拌35min,然后升温至60℃高速搅拌分散至钠基蒙脱土完全溶胀;2)再向其中加入对氨基苯甲酸盐,升温至90℃,恒温搅拌1.1h,然后经冷却、抽滤、真空干燥、研磨得纳米蒙脱土;3)将纳米蒙脱土与适量去离子水配置成悬浮液,具体为先在室温下高速搅拌35min,然后升温至50℃进行一次超声处理12min,然后将醋丙乳液滴加入其中,调节温度为35℃搅拌分散1.5h,再进行二次超声处理10min,然后经冷却、抽滤、真空干燥、研磨即得纳米改性蒙脱土。
所述的高阻隔复合薄膜的制备方法,步骤如下:
将PA切片与纳米硅溶胶放入混料机中共混,在115℃条件下保持3.5h,得外层料;将PET切片、PEN切片与纳米改性蒙脱土放入混料机中共混,在100℃条件下保持4h,得阻隔层料;将PP切片、PE切片、相容剂、成核剂放入混料机中共混,在110℃条件下保持4h,得内层料;将外层料、阻隔层料、内层料采用多层共挤工艺挤出成型,然后经拉伸成膜。
实施例2:
一种高阻隔复合薄膜,其特征在于,包括外层、阻隔层和内层三个复合结构层,所述涂层包括以下百分含量的组分制成:PA 80%、纳米硅溶胶20%,所述阻隔层包括以下百分含量的组分制成:PET45%、PEN 15%、纳米改性蒙脱土40%,所述内层包括以下百分含量的组分制成:PE 60%、PP 30%、成核剂4%、相容剂6%。
所述纳米改性蒙脱土制备方法如下:1)将钠基蒙脱土与适量去离子水配置成悬浮液,先在室温下高速搅拌40min,然后升温至60℃高速搅拌分散至钠基蒙脱土完全溶胀;2)再向其中加入对氨基苯甲酸盐,升温至92℃,恒温搅拌1.2h,然后经冷却、抽滤、真空干燥、研磨得纳米蒙脱土;3)将纳米蒙脱土与适量去离子水配置成悬浮液,具体为先在室温下高速搅拌35min,然后升温至50℃进行一次超声处理15min,然后将醋丙乳液滴加入其中,调节温度为35℃搅拌分散1.8h,再进行二次超声处理15min,然后经冷却、抽滤、真空干燥、研磨即得纳米改性蒙脱土。
所述的高阻隔复合薄膜的制备方法,步骤如下:
将PA切片与纳米硅溶胶放入混料机中共混,在110℃条件下保持4h,得外层料;将PET切片、PEN切片与纳米改性蒙脱土放入混料机中共混,在120℃条件下保持5h,得阻隔层料;将PP切片、PE切片、相容剂、成核剂放入混料机中共混,在120℃条件下保持5h,得内层料;将外层料、阻隔层料、内层料采用多层共挤工艺挤出成型,然后经拉伸成膜。
实施例3:
一种高阻隔复合薄膜,其特征在于,包括外层、阻隔层和内层三个复合结构层,所述涂层包括以下百分含量的组分制成:PA 79%、纳米硅溶胶21%,所述阻隔层包括以下百分含量的组分制成:PET55%、PEN 8%、纳米改性蒙脱土37%,所述内层包括以下百分含量的组分制成:PE 50%、PP 35%、成核剂3%、相容剂12%。
所述纳米改性蒙脱土制备方法如下:1)将钠基蒙脱土与适量去离子水配置成悬浮液,先在室温下高速搅拌40min,然后升温至60℃高速搅拌分散至钠基蒙脱土完全溶胀;2)再向其中加入对氨基苯甲酸盐,升温至95℃,恒温搅拌1.1h,然后经冷却、抽滤、真空干燥、研磨得纳米蒙脱土;3)将纳米蒙脱土与适量去离子水配置成悬浮液,具体为先在室温下高速搅拌40min,然后升温至50℃进行一次超声处理15min,然后将醋丙乳液滴加入其中,调节温度为35℃搅拌分散2h,再进行二次超声处理15min,然后经冷却、抽滤、真空干燥、研磨即得纳米改性蒙脱土。
所述的高阻隔复合薄膜的制备方法,步骤如下:
将PA切片与纳米硅溶胶放入混料机中共混,在110℃条件下保持4h,得外层料;将PET切片、PEN切片与纳米改性蒙脱土放入混料机中共混,在120℃条件下保持6h,得阻隔层料;将PP切片、PE切片、相容剂、成核剂放入混料机中共混,在100℃条件下保持5h,得内层料;将外层料、阻隔层料、内层料采用多层共挤工艺挤出成型,然后经拉伸成膜。
实施例4:
一种高阻隔复合薄膜,其特征在于,包括外层、阻隔层和内层三个复合结构层,所述涂层包括以下百分含量的组分制成:PA 79%、纳米硅溶胶21%,所述阻隔层包括以下百分含量的组分制成:PET52%、PEN 18%、纳米改性蒙脱土30%,所述内层包括以下百分含量的组分制成:PE 53%、PP40%、成核剂2%、相容剂5%。
所述纳米改性蒙脱土制备方法如下:1)将钠基蒙脱土与适量去离子水配置成悬浮液,先在室温下高速搅拌35min,然后升温至60℃高速搅拌分散至钠基蒙脱土完全溶胀;2)再向其中加入对氨基苯甲酸盐,升温至95℃,恒温搅拌1h,然后经冷却、抽滤、真空干燥、研磨得纳米蒙脱土;3)将纳米蒙脱土与适量去离子水配置成悬浮液,具体为先在室温下高速搅拌30min,然后升温至50℃进行一次超声处理10min,然后将醋丙乳液滴加入其中,调节温度为35℃搅拌分散2h,再进行二次超声处理15min,然后经冷却、抽滤、真空干燥、研磨即得纳米改性蒙脱土。
所述的高阻隔复合薄膜的制备方法,步骤如下:
将PA切片与纳米硅溶胶放入混料机中共混,在100℃条件下保持3h,得外层料;将PET切片、PEN切片与纳米改性蒙脱土放入混料机中共混,在110℃条件下保持6h,得阻隔层料;将PP切片、PE切片、相容剂、成核剂放入混料机中共混,在100℃条件下保持3h,得内层料;将外层料、阻隔层料、内层料采用多层共挤工艺挤出成型,然后经拉伸成膜。
实施例5:
一种高阻隔复合薄膜,其特征在于,包括外层、阻隔层和内层三个复合结构层,所述涂层包括以下百分含量的组分制成:PA 80%、纳米硅溶胶20%,所述阻隔层包括以下百分含量的组分制成:PET30%、PEN 10%、纳米改性蒙脱土60%,所述内层包括以下百分含量的组分制成:PE 30%、PP 55%、成核剂3%、相容剂12%。
所述纳米改性蒙脱土制备方法如下:1)将钠基蒙脱土与适量去离子水配置成悬浮液,先在室温下高速搅拌30min,然后升温至60℃高速搅拌分散至钠基蒙脱土完全溶胀;2)再向其中加入对氨基苯甲酸盐,升温至90℃,恒温搅拌1h,然后经冷却、抽滤、真空干燥、研磨得纳米蒙脱土;3)将纳米蒙脱土与适量去离子水配置成悬浮液,具体为先在室温下高速搅拌30min,然后升温至50℃进行一次超声处理10min,然后将醋丙乳液滴加入其中,调节温度为35℃搅拌分散1.5h,再进行二次超声处理10min,然后经冷却、抽滤、真空干燥、研磨即得纳米改性蒙脱土。
所述的高阻隔复合薄膜的制备方法,步骤如下:
将PA切片与纳米硅溶胶放入混料机中共混,在120℃条件下保持3h,得外层料;将PET切片、PEN切片与纳米改性蒙脱土放入混料机中共混,在120℃条件下保持5.5h,得阻隔层料;将PP切片、PE切片、相容剂、成核剂放入混料机中共混,在110℃条件下保持4.5h,得内层料;将外层料、阻隔层料、内层料采用多层共挤工艺挤出成型,然后经拉伸成膜。
实施例6:
一种高阻隔复合薄膜,其特征在于,包括外层、阻隔层和内层三个复合结构层,所述涂层包括以下百分含量的组分制成:PA 78%、纳米硅溶胶22%,所述阻隔层包括以下百分含量的组分制成:PET60%、PEN 8%、纳米改性蒙脱土32%,所述内层包括以下百分含量的组分制成:PE 36%、PP45%、成核剂4%、相容剂15%。
所述纳米改性蒙脱土制备方法如下:1)将钠基蒙脱土与适量去离子水配置成悬浮液,先在室温下高速搅拌40min,然后升温至60℃高速搅拌分散至钠基蒙脱土完全溶胀;2)再向其中加入对氨基苯甲酸盐,升温至90℃,恒温搅拌1.2h,然后经冷却、抽滤、真空干燥、研磨得纳米蒙脱土;3)将纳米蒙脱土与适量去离子水配置成悬浮液,具体为先在室温下高速搅拌40min,然后升温至50℃进行一次超声处理15min,然后将醋丙乳液滴加入其中,调节温度为35℃搅拌分散1.5h,再进行二次超声处理10min,然后经冷却、抽滤、真空干燥、研磨即得纳米改性蒙脱土。
所述的高阻隔复合薄膜的制备方法,步骤如下:
将PA切片与纳米硅溶胶放入混料机中共混,在105℃条件下保持4h,得外层料;将PET切片、PEN切片与纳米改性蒙脱土放入混料机中共混,在110℃条件下保持4.5h,得阻隔层料;将PP切片、PE切片、相容剂、成核剂放入混料机中共混,在120℃条件下保持6h,得内层料;将外层料、阻隔层料、内层料采用多层共挤工艺挤出成型,然后经拉伸成膜。
以上实施例仅用以说明本发明的技术方案,而非对其限制;尽管参照前述实施例对本发明进行了详细的说明,本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本发明各实施例技术方案的精神和范围。
Claims (7)
1.一种高阻隔复合薄膜,其特征在于,包括外层、阻隔层和内层三个复合结构层,所述外层包括以下百分含量的组分制成:PA 75-80%、纳米硅溶胶20-25%,所述阻隔层包括以下百分含量的组分制成:PET 30-60%、PEN 8-18%、纳米改性蒙脱土30-60%,所述内层包括以下百分含量的组分制成:PE 30-60%、PP 30-55%、成核剂2-4%、相容剂5-15%;
所述纳米改性蒙脱土的制备原料为钠基蒙脱土、醋丙乳液、去离子水、对氨基苯甲酸盐;所述纳米改性蒙脱土制备方法如下:1)将钠基蒙脱土与适量去离子水配置成悬浮液,先在室温下高速搅拌30-40min,然后升温至60℃高速搅拌分散至钠基蒙脱土完全溶胀;2)再向其中加入对氨基苯甲酸盐,升温至90-95℃,恒温搅拌1-1.2h,然后经冷却、抽滤、真空干燥、研磨得纳米蒙脱土;3)将纳米蒙脱土与适量去离子水配置成悬浮液,具体为先在室温下高速搅拌30-40min,然后升温至50℃进行一次超声处理10-15min,然后将醋丙乳液滴加入其中,调节温度为35℃搅拌分散1.5-2h,再进行二次超声处理10-15min,然后经冷却、抽滤、真空干燥、研磨即得纳米改性蒙脱土。
2.根据权利要求1所述的一种高阻隔复合薄膜,其特征在于,包括外层、阻隔层和内层三个复合结构层,所述外层包括以下百分含量的组分制成:PA78-80%、纳米硅溶胶20-22%,所述阻隔层包括以下百分含量的组分制成:PET 40-60%、PEN 8-15%、纳米改性蒙脱土30-50%,所述内层包括以下百分含量的组分制成:PE 35-50%、PP 30-50%、成核剂3-4%、相容剂8-10%。
3.根据权利要求1或2所述的高阻隔复合薄膜,其特征在于:所述成核剂为质量比1:3:6的氧化铈、滑石粉和聚乙二醇的组合物。
4.根据权利要求1或2所述的高阻隔复合薄膜,其特征在于:所述相容剂为PE-g-MAH、PP-g-MAH的组合物。
5.根据权利要求1或2所述的高阻隔复合薄膜的制备方法,其特征在于,步骤如下:
1)将PA切片与纳米硅溶胶放入混料机中共混,在100-120℃条件下保持3-4h,得外层料;将PET切片、PEN切片与纳米改性蒙脱土放入混料机中共混,在100-120℃条件下保持3-6h,得阻隔层料;将PP切片、PE切片、相容剂、成核剂放入混料机中共混,在100-120℃条件下保持3-6h,得内层料;
2)将外层料、阻隔层料、内层料采用多层共挤工艺挤出成型,然后经拉伸成膜。
6.根据权利要求5所述的高阻隔复合薄膜的制备方法,其特征在于:成型过程中挤出量为1300kg/h,激冷辊转速为50m/min。
7.根据权利要求5所述的高阻隔复合薄膜的制备方法,其特征在于:拉伸后制得的高阻隔薄膜为25μm复合薄膜。
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