CN1067117C - 基质镀膜装置用的蒸发舟 - Google Patents

基质镀膜装置用的蒸发舟 Download PDF

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CN1067117C
CN1067117C CN97102542A CN97102542A CN1067117C CN 1067117 C CN1067117 C CN 1067117C CN 97102542 A CN97102542 A CN 97102542A CN 97102542 A CN97102542 A CN 97102542A CN 1067117 C CN1067117 C CN 1067117C
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evaporation
evaporation boat
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boat
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CN1162655A (zh
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W·阿赫特纳
G·克莱姆
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Applied Materials GmbH and Co KG
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Balzers und Leybold Deutschland Holding AG
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/26Vacuum evaporation by resistance or inductive heating of the source

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
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  • Physical Vapour Deposition (AREA)

Abstract

在一个真空镀膜室中的基质镀膜装置用的蒸发舟,由一种直接通电而加热的导电材料制的扁平的、细长的槽形部件(8)构成,为此,在槽形部件(8)的两个相互径相对的端部上分别设定了长方形的、垂直延伸的接触表面(9,10),它们形成用于槽形部件(8)的支撑和电流通过相互平行的紧固部位,在这种情况下,在槽形部件(8)上设有一个或多个成排列布置的区域(11,11′…)以容纳待蒸发的材料,其中,槽形部件(8)在每个区域(11,11′…)的前面和后面都设有开口(7,12,12′…)或孔。

Description

基质镀膜装置用的蒸发舟
本发明涉及一种在真空镀膜室中基质镀膜装置用的蒸发舟,它是由一种直接通电流而加热的导电材料制的扁平的、槽形部件所构成。
具有尤其适用于串联蒸发器的长方形底面的通电槽形蒸发舟人所共知的,在其两个垂直的窄面或正面附有紧固面,靠它支撑于蒸发舟支座上。
在一种较老的用于在真空镀膜室内带状基质连续镀膜的装置中(P4027034),具有许多组成蒸发器工作台的、平行的和沿带运行方向彼此约相等间距设置的、大小与形状相同的蒸发舟,其中,蒸发舟全部由导电陶瓷组成并可通过直接通电流加热,并且具有一种用于将待蒸发的金属线连续引入蒸发舟的装置,各个蒸发舟总是相互交错排列的,在此所有蒸发舟共同盖住一个狭窄的与带运行方向成横向的镀膜区。
通过上述的交错排列解决了减少单个源的相互作用并因而改进了成镀层的均匀性。各个蒸发舟本身具有一个长方形断面,而容纳熔化物料的槽也都有一个长方形底面。
在另一种已公开的用于环状物连续蒸镀的具有多个在一排中前后布置直接加热的蒸发器的装置(DE970246)中,人们已试图克服具有槽的长方形底面的传统蒸发器类型的缺点,这一缺点的产生原因是,蒸发的物料作为电流的优良导体使蒸发器局部产生短路,致使仅仅在蒸发器的各个槽之间存在的部分用作热发生器,因而造成镀膜不匀。按照这一提前公开的文献,上述缺点应如此得到克服,即在各个槽之间,蒸发器具有蒸发器断面的减小,以致蒸发器的电阻大约是恒定的并与真空镀膜室内的蒸发物料的填料量无关。
在一份早先的专利申请(P4016225.7)中,说明了一种真空蒸镀设备尤其带式蒸发设备用的串联蒸发器,它由多个、分别在功率上可控制的、通电可加热的、位于支撑式电气引线上的蒸发器组成,其中支撑状引线被一个在串联蒸发器整个长度上延伸的导电载体保持,一个极性的引线与载体导电地连接,并且另一个极性的引线是绝缘地导引通过基体并与绝缘安置的导线相连接,在此,蒸发器最好经由作为圆筒段成型的支撑件支撑在引线的上端或凸起部,为此,支撑件是由一种导电的材料如陶瓷构成的。
这种较老的串联蒸发器解决了蒸发过程中在电气引线之间蒸发器成双夹紧固或良好电接触的问题。然而,在这种蒸发器的成双布置中,一个最佳均匀的镀膜问题也尚未完全解决。
最后,德国专利(DE4139792 A1)公开过一种用于在真空镀膜室中基质镀膜装置的蒸发舟,它是由一个导电材料制的扁平的槽形部件组成,其中,蒸发舟是通过直接通电来加热,并且具有一个大体是菱形的或长菱形的底面,同时,槽的构型大致与蒸发舟的相符并且蒸发舟的两个相互径向相对的角分别设有一个大约矩形的垂直的扁圆部分,它们共同形成蒸发舟的相互平行的紧固面。
现在,本发明的任务是避免已知的蒸发器或蒸发器装置的缺点并使所形成的蒸发器能达到最佳镀膜。
为此,本发明提供一种在一个真空镀膜室将基质镀膜装置用的蒸发舟,由一个直接通电而可加热的导电材料制的扁平的、细长的槽形部件构成,为此,在槽形部件的两个径向相对的端部上各设置了长方形的、垂直延伸的接触表面,它们形成用于槽形部件的支撑和电流通过的相互平行的紧固部位,其特征为:在槽形部件上设有一个或多个前后布置的用于容纳待蒸发的材料的熔化区,其中,在每个区的前面和后面的槽形部件都设有开口或孔。
根据本发明的进一步结构,在槽形部件的上面沿其纵向延伸的一个浅的凹槽或凹陷处内设定了一个或多个蒸发区。
根据本发明的进一步结构,开口分另由一组并排和相互平行布置的垂直孔形成。
根据本发明的进一步结构,槽形部件具有一个大约平行六面体的构型并且部件的厚度与位于其上面的凹槽的深度的比例约为5。
按照本发明,槽形部件按纵向在被熔化材料湿润部分的前面和/或后面设有开口,例如垂直延伸的孔。
在一个具有多个成排前后排列的用于熔化待蒸发的物料的区域的蒸发舟中,在各个部分之间和在最后部分的前后,槽形部件可适当地设有开口。
本发明允许有不同的实施可能性,其中有两种在附图作了进一步的说明,其中:
附图1,2表示一个具有一个唯一的蒸发区的蒸发舟的俯视图和横截面图,其中,在径向相互相对的紧固面范围内设有一组孔,以及
图3表示一个按本发明的蒸发舟的俯视图,装有多个成排前后排列的用于熔化物料和蒸发的区域。
在蒸发舟支座的紧固钳冷却时,在传统的蒸发舟中随着蒸发舟中心的最热区而产生温度下降。按本发明,经过此总长约2~3厘米的区(空穴总长为9厘米时),每单位表面所蒸发的铝相当于空穴表面剩余部分(凹槽表面)上的两倍。
为了现在获得无喷雾滴的蒸发及无“针孔”的镀膜,不得超过预定的(最大)温度。该温度通过高温区的温度来确定。为此,人们获得一个整个空穴表面的平均的蒸发率。按本发明,温度梯度应予减少,以使较大区能提高到此(最大)温度,因此就可得到一个较大的平均的和无喷雾滴的蒸发率。
在蒸发舟的预先设定的端面紧固时,用紧固钳15,16就可不需大的花费地通过使开口或孔7,7′…或12,12′…布置在槽形部件3,8内达到上述目的。
蒸发舟或其槽形部件3或8仅仅在端面4,5或9,10的2/3处紧固是适当的,以便减少端部的冷却。由于断面减小,蒸发舟在靠近紧固位置的范围内达到较高的加热。在蒸发舟的中部,熔化和蒸发待蒸发的物料而无熔滴。
在长形蒸发舟的情况下,每个金属线的输送与相邻的金属线是通过热区分开的,用此方式所达到的无喷雾滴的蒸发率可比至今获得的高得多。在长形蒸发舟的情况下,由于蒸发舟整个长度上不同的温度和湿润产生的蒸发率不均匀性产生的至今人们皆知的缺点被排除了。
在蒸发舟上热区对冷区的比例可通过横断面减少来调节,以便对每个所要求的蒸发率保证金属线的均匀熔化而无熔滴。
图3中表明的长形蒸发舟具有一个特别长的槽形部件8,并且总共设置了5个熔化区11,11′…,即,待熔化的或待蒸发的材料以5个金属线段的形式被导入此5个区11,11′…,材料在那里总是形成小的“熔化湖”,材料即从“熔化湖”蒸发。
各个熔化湖或区在附图中以椭圆的形状表明。
在各个区11,11′…之间,各安排了一组3个孔,12,12′,12″…,这些孔按其直径减少了槽形部件8的断面。
孔12,12′,12″在此适当地与槽面垂直,然而,也可很容易地规定这些孔与槽平面成横向和平行。
                    部件标号3             槽形部件4             端面,接触表面5             端面,接触表面6             熔化湖,区7,7′…       开口,孔8             槽形部件9             端面,接触表面10            端面,接触表面11,11′…     熔化湖,区12,12′…     开口,孔13            空穴,凹槽14            空穴,凹槽15            紧固钳嘴16            紧固钳嘴

Claims (4)

1.一种在一个真空镀膜室中基质镀膜装置用的蒸发舟,由一个直接通电而可加热的导电材料制的扁平的、细长的槽形部件(3,8)构成,为此,在槽形部件(3,8)的两个径向相对的端部上各设置了长方形的、垂直延伸的接触表面(4,5,9,10),它们形成用于槽形部件(3,8)的支撑和电流通过的相互平行的紧固部位,其特征为:在槽形部件(3,8)上设有一个或多个前后布置的用于容纳待蒸发的材料的熔化区(6,11,11′),其中,在每个区(6,11,11′)的前面和后面的槽形部件(3,8)都设有开口(7,7′,12,12′)或孔。
2.按照权利要求1所述的蒸发舟,其特征为:在槽形部件(3,8)的上面沿其纵向延伸的一个浅的凹槽或凹陷处(13,14)内设定了一个或多个蒸发区(6,11,11′)。
3.按照权利要求1或2所述的蒸发舟,其特征为:开口分别由一组并排和相互平行布置的垂直孔(7,7′,12,12′)形成。
4.按照权利要求1所述的蒸发舟,其特征为:槽形部件(3,8)具有一个大约平行六面体的构型并且部件(3,8)的厚度(D)与位于其上面的凹槽(13,14)的深度(T)的比例约为5。
CN97102542A 1996-02-28 1997-02-26 基质镀膜装置用的蒸发舟 Expired - Fee Related CN1067117C (zh)

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DE19607400A DE19607400C2 (de) 1996-02-28 1996-02-28 Verdampferschiffchen für eine Vorrichtung zur Beschichtung von Substraten
DE19607400.2 1996-02-28

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US (1) US5788769A (zh)
EP (1) EP0792946A1 (zh)
JP (1) JPH09235665A (zh)
KR (1) KR100247302B1 (zh)
CN (1) CN1067117C (zh)
DE (1) DE19607400C2 (zh)

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DE10200909A1 (de) * 2002-01-12 2003-07-24 Applied Films Gmbh & Co Kg Verdampferschiffchen für eine Vorrichtung zur Beschichtung von Substraten
EP1408135A1 (en) * 2002-10-08 2004-04-14 Galileo Vacuum Systems S.R.L. Apparatus for physical vapour deposition
US20050000447A1 (en) * 2003-07-04 2005-01-06 Jan Koninckx Crucible for evaporation of raw materials
US20060013966A1 (en) * 2003-09-08 2006-01-19 Jan Koninckx Crucible for evaporation of raw materials
DE102007045289A1 (de) 2007-09-21 2009-04-02 Esk Ceramics Gmbh & Co. Kg Verdampferschiffchen, Verfahren zu deren Herstellung sowie deren Verwendung
US20090217876A1 (en) * 2008-02-28 2009-09-03 Ceramic Technologies, Inc. Coating System For A Ceramic Evaporator Boat
CN102212784A (zh) * 2010-04-12 2011-10-12 无锡尚德太阳能电力有限公司 沉积蒸发源
CN102214730A (zh) * 2010-04-12 2011-10-12 无锡尚德太阳能电力有限公司 沉积蒸发源
CN103290365A (zh) * 2013-06-21 2013-09-11 苏州方昇光电装备技术有限公司 一种线性蒸发源
US10801101B2 (en) 2017-08-17 2020-10-13 Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. Vapor evaporation source
CN107400859B (zh) * 2017-08-17 2019-08-13 武汉华星光电半导体显示技术有限公司 一种蒸发源
CN110629168B (zh) * 2019-10-30 2021-11-02 东北大学 一种真空镀膜机的蒸发装置
CN110747434B (zh) * 2019-12-05 2021-10-08 山东国晶新材料有限公司 一种分体式导电陶瓷舟

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DE19607400A1 (de) 1997-09-04
CN1162655A (zh) 1997-10-22
KR100247302B1 (ko) 2000-04-01
DE19607400C2 (de) 1999-09-09
JPH09235665A (ja) 1997-09-09
US5788769A (en) 1998-08-04
EP0792946A1 (de) 1997-09-03
KR970062062A (ko) 1997-09-12

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