CN106681073B - 液晶显示面板 - Google Patents

液晶显示面板 Download PDF

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Publication number
CN106681073B
CN106681073B CN201710081895.XA CN201710081895A CN106681073B CN 106681073 B CN106681073 B CN 106681073B CN 201710081895 A CN201710081895 A CN 201710081895A CN 106681073 B CN106681073 B CN 106681073B
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China
Prior art keywords
array substrate
layer
membrane substrates
color membrane
liquid crystal
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CN201710081895.XA
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CN106681073A (zh
Inventor
孟小龙
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to CN201710081895.XA priority Critical patent/CN106681073B/zh
Priority to PCT/CN2017/075343 priority patent/WO2018148991A1/zh
Priority to US15/518,697 priority patent/US10578908B2/en
Publication of CN106681073A publication Critical patent/CN106681073A/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
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    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
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    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
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    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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    • G02F1/1341—Filling or closing of cells
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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    • G02F1/1345—Conductors connecting electrodes to cell terminals
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    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
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    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
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    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
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    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133504—Diffusing, scattering, diffracting elements
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    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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    • G02F2202/00—Materials and properties
    • G02F2202/02—Materials and properties organic material
    • G02F2202/022—Materials and properties organic material polymeric
    • G02F2202/023—Materials and properties organic material polymeric curable

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

本发明公开了一种液晶显示面板，其包括彩膜基板、阵列基板以及设置在彩膜基板和阵列基板之间的液晶层。其中，阵列基板的面向彩膜基板的表面被划分为显示区域和非显示区域。非显示区域包括设置有阵列基板的金属走线的第一区域和未设置有金属走线的第二区域。阵列基板的面向彩膜基板的表面在第二区域内非平坦。本发明有利于增加彩膜基板与阵列基板的粘合强度，同时避免了对液晶显示面板的液晶层造成污染。

Description

液晶显示面板
技术领域
本发明涉及液晶显示技术领域，尤其涉及一种液晶显示面板。
背景技术
目前，液晶显示技术已经被广泛地应用于各类电子产品中。窄边框技术也已经成为液晶显示领域的常规技术手段。由于边框变窄，液晶显示面板显示出来的画面会更加完整，显示屏幕的利用率也会提高。用户在使用电视、手机、平板电脑等带有液晶显示面板的电子产品时，视野会更加开阔，视觉体验得到了显著提升。
然而，窄边框设计会使封框胶的涂布区域更窄。这里，封框胶涂布区域包括彩膜基板的非显示区域以及阵列基板的非显示区域。封框胶涂布区域越窄，封框胶在液晶显示面板的彩膜基板(CF)基板和阵列基板(TFT基板)上的附着力就越小，从而导致液晶盒密封不严，进而气体更易进入液晶盒，或者液晶更易从液晶盒中泄漏。为解决上述问题，现有技术通常在液晶成盒步骤中还将封框胶涂布在彩膜基板的黑色矩阵的面向阵列基板一侧的表面上。同时，封框胶中掺杂有间隙子，以起到维持液晶盒厚的作用。
由于黑色矩阵会对固化封框胶的紫外线(UV光)具有90％以上的遮挡效应，所以业内通常会选择从阵列基板侧照射紫外线。然而，由于阵列基板的非显示区域还设置有用于传输信号的金属走线，而从阵列基板侧照射的紫外线会受到这些金属走线的遮挡，而无法照射到涂布在彩膜基板上的位于这些金属走线的投影区域内的封框胶。这样，在对封框胶进行固化时，紫外线直接照射位于上述投影区域外的封框胶，从而这部分封框胶会被完全固化。然而，紫外线无法照射到位于上述投影区域内的封框胶，从而这部分封框胶不能被完全固化。未完全固化的封框胶一方面易对液晶显示面板的液晶层造成污染，另一方面降低了彩膜基板与阵列基板的粘合强度。
发明内容
本发明所要解决的技术问题是：现有技术中在对封框胶进行固化时，紫外线会受到设置在阵列基板的非显示区域的金属走线的遮挡，而无法照射到涂布在彩膜基板上的、且在这些金属走线的投影区域内的封框胶，从而使得这部分封框胶不能被完全固化。未完全固化的封框胶一方面易对液晶显示面板的液晶层造成污染，另一方面降低了彩膜基板与阵列基板的粘合强度。
为了解决上述问题，本发明提供了一种液晶显示面板，包括彩膜基板、阵列基板以及设置在所述彩膜基板和所述阵列基板之间的液晶层；
其中，所述阵列基板的面向所述彩膜基板的表面被划分为显示区域和非显示区域，所述非显示区域包括设置有所述阵列基板的金属走线的第一区域和未设置有所述金属走线的第二区域；
所述阵列基板的面向所述彩膜基板的表面在所述第二区域内非平坦。
优选地是，所述阵列基板包括多层透光层；
在所述多层透光层中，至少一层选定透光层在所述第二区域内设置有凹槽和/或突起，以使所述阵列基板的面向所述彩膜基板的表面在所述第二区域内非平坦。
优选地是，所述至少一层选定透光层包括平坦层、隔离层和透明电极层中的一种或多种。
优选地是，所述阵列基板包括形成于所述金属走线所在的金属层上的透光折射层；
所述透光折射层的面向所述彩膜基板的表面在所述第二区域内非平坦。
优选地是，所述透光折射层的面向所述彩膜基板的表面在第二区域内设置有凹槽和/或突起。
优选地是，所述透光折射层为形成于所述金属走线所在的金属层上的一层绝缘层，所述绝缘层的面向所述彩膜基板的表面在第二区域内设置有凹槽和/或突起。
优选地是，所述绝缘层由氮化硅或氧化硅材料制成。
优选地是，所述透光折射层包括形成于所述金属走线所在的金属层上的多层绝缘层，所述凹槽和/或突起由所述多层绝缘层叠加而成。
优选地是，所述绝缘层由氮化硅或氧化硅材料制成。
优选地是，所述彩膜基板和所述阵列基板通过封框胶粘合；
所述封框胶涂布在所述阵列基板的面向所述彩膜基板的表面的非显示区域内、所述彩膜基板的面向所述阵列基板的表面的非显示区域内、以及所述彩膜基板的黑色矩阵的面向所述阵列基板的表面上；
涂布在所述黑色矩阵的面向所述阵列基板的表面上的封框胶掺杂有间隙子。
与现有技术相比，上述方案中的一个或多个实施例可以具有如下优点或有益效果：
本发明实施例提供的液晶显示面板，用于解决紫外线受到设置在阵列基板的非显示区域的金属走线的遮挡，而无法照射到涂布在彩膜基板上、且位于这些金属走线的投影区域内的封框胶，从而导致这部分封框胶不能被完全固化的问题。应用本发明实施例提供的液晶显示面板，由于阵列基板的面向彩膜基板的表面在非显示区域的第二区域内非平坦，因此照射到非平坦表面的紫外线会发生折射。折射光线会照射到位于上述金属走线的投影区域内的封框胶上。这样，这部分封框胶就会被完全固化。因此，本发明能够避免现有技术中由未完全固化的封框胶导致的液晶层污染以及彩膜基板与阵列基板之间粘合度不强的现象。也就是说，本发明能够有效提高液晶显示面板内液晶层的纯度，同时增加彩膜基板与阵列基板之间的粘合强度。
本发明的其它特征和优点将在随后的说明书中阐述，并且部分地从说明书中变得显而易见，或者通过实施本发明而了解。本发明的目的和其他优点可通过在说明书、权利要求书以及附图中所特别指出的结构来实现和获得。
附图说明
附图用来提供对本发明的进一步理解，并且构成说明书的一部分，与本发明的实施例共同用于解释本发明，并不构成对本发明的限制。在附图中：
图1示出了现有技术中液晶显示面板在显示区域的剖面示意图；
图2示出了现有技术中液晶显示面板的阵列基板的结构示意图；
图3示出了现有技术中液晶显示面板在非显示区域的剖面示意图；
图4示出了本发明实施例液晶显示面板的阵列基板的结构示意图；
图5示出了本发明实施例液晶显示面板在非显示区域的第一种剖面示意图；
图6示出了本发明实施例液晶显示面板在非显示区域的第二种剖面示意图；
图7示出了本发明实施例液晶显示面板在非显示区域的第三种剖面示意图；
图8示出了本发明实施例液晶显示面板在非显示区域的第四种剖面示意图；
图9示出了本发明实施例液晶显示面板在非显示区域的第五种剖面示意图；
图10示出了本发明实施例液晶显示面板在非显示区域的第六种剖面示意图；
图11示出了本发明实施例液晶显示面板在非显示区域的第七种剖面示意图；
图12示出了本发明实施例液晶显示面板在非显示区域的第八种剖面示意图；
图13示出了本发明实施例液晶显示面板在非显示区域的第九种剖面示意图；
图14示出了本发明实施例液晶显示面板在非显示区域的第十种剖面示意图；
图15示出了本发明实施例液晶显示面板在显示区域的剖面示意图。
具体实施方式
以下将结合附图及实施例来详细说明本发明的实施方式，借此对本发明如何应用技术手段来解决技术问题，并达成技术效果的实现过程能充分理解并据以实施。需要说明的是，只要不构成冲突，本发明中的各个实施例以及各实施例中的各个特征可以相互结合，所形成的技术方案均在本发明的保护范围之内。
图1示出了现有技术中液晶显示面板在显示区域的剖面示意图。如图1所示，现有技术中的液晶显示面板包括彩膜基板1、阵列基板3以及设置在彩膜基板1和阵列基板3之间的液晶层2。彩膜基板1包括黑色矩阵14。
图2示出了现有技术中液晶显示面板的阵列基板3的结构示意图。如图2所示，阵列基板3的面向彩膜基板1的表面被划分为显示区域4和非显示区域5。非显示区域5内布设有向位于显示区域4的元器件传输信号的金属走线6。
图3示出了现有技术中液晶显示面板在非显示区域5的剖面示意图。如图3所示，非显示区域5被划分成第一区域9和第二区域8。其中，阵列基板3的外围金属走线6设置在第一区域9内。第二区域8内未设置上述金属走线6。需要注意的是，第一区域9和第二区域8都是不连续的区域。
在现有技术中，在对位于阵列基板3和彩膜基板1之间的封框胶7进行固化时，由从阵列基板3侧入射的紫外线(如图3中箭头所示)会受到设置在阵列基板3的第一区域9内的金属走线6的遮挡，而无法照射到这些金属走线6的投影区域内的封框胶7，从而使得这部分封框胶7不能被完全固化。未完全固化的封框胶7一方面易对液晶显示面板的液晶层2造成污染，另一方面降低了彩膜基板1与阵列基板3的粘合强度。
实施例一
为解决现有技术中存在的上述技术问题，本发明实施例提供了一种液晶显示面板。
图4示出了本发明实施例液晶显示面板的阵列基板的结构示意图。图5示出了本发明实施例液晶显示面板在非显示区域的第一种剖面示意图。
参照图4和图5，本实施例液晶显示面板包括彩膜基板1、阵列基板3以及设置在彩膜基板1和阵列基板3之间液晶层。阵列基板3的面向彩膜基板1的表面被划分为显示区域4和非显示区域5。非显示区域5内布设有向位于显示区域4的元器件传输信号的金属走线6。另外，非显示区域5被划分成第一区域9和第二区域8。其中，金属走线6设置在第一区域9内。第二区域8内未设置金属走线6。特别地，阵列基板3的面向彩膜基板1的表面在第二区域8内非平坦。
应用本实施例，由于阵列基板3的面向彩膜基板1的表面在第二区域8内非平坦，因此从阵列基板3侧入射的紫外线照射到第二区域8内的非平坦表面10后会发生折射。经折射后的紫外线会照射到涂布在彩膜基板1上的，且在这些金属走线6的投影区域内的封框胶7，以使这部分封框胶7得以完全固化。
基于上述分析，本实施例通过非平坦表面10对紫外线的折射来使上述投影区域内的封框胶7得以完全固化。从而，本实施例能够避免现有技术中未完全固化的封框胶7导致的液晶层3污染以及彩膜基板1与阵列基板3之间的粘合度不强的现象。也就是说，本实施例能够有效提高液晶显示面板内液晶层3的纯度，同时增加了彩膜基板1与阵列基板3的粘合强度。
以下实施例二和实施例三为形成上述非平坦表面10的优选实施例。
实施例二
图6示出了本发明实施例液晶显示面板在非显示区域的第二种剖面示意图。参照图6，阵列基板3包括多层透光层。多层透光层包括至少一层选定透光层。这里，选定透光层可以是阵列基板3具有的任意透光层，只要对其处理后能够形成实施例一中的非平坦表面1即可，本实施例对此并不做限定。特别地，选定透光层优选为阵列基板3的平坦层、隔离层或者透明电极层。
至少一层选定透光层在第二区域8内设置有凹槽11。这里，凹槽11可以由一层选定透光层形成，也可以由多层选定透光层叠加形成。本实施例并不局限凹槽11的数量。本实施例的凹槽11使得阵列基板3的面向彩膜基板1的表面在第二区域8内非平坦，从而形成上述非平坦表面10。
图7示出了本发明实施例液晶显示面板在非显示区域的第三种剖面示意图。参照图7，阵列基板3包括多层透光层。多层透光层包括至少一层选定透光层。这里，选定透光层可以是阵列基板3具有的任意透光层，只要对其处理后能够形成实施例一中的非平坦表面1即可，本实施例对此并不做限定。特别地，选定透光层优选为阵列基板3的平坦层、隔离层或者透明电极层。
至少一层选定透光层在第二区域8内设置有突起12。这里，突起12可以由一层选定透光层形成，也可以由多层选定透光层叠加形成。本实施例并不局限突起12的数量。本实施例的突起12使得阵列基板3的面向彩膜基板1的表面在第二区域8内非平坦，从而形成上述非平坦表面10。
图8示出了本发明实施例液晶显示面板在非显示区域的第四种剖面示意图。参照图8，阵列基板3包括多层透光层。多层透光层包括至少一层选定透光层。这里，选定透光层可以是阵列基板3具有的任意透光层，只要对其处理后能够形成实施例一中的非平坦表面1即可，本实施例对此并不做限定。特别地，选定透光层优选为阵列基板3的平坦层、隔离层或者透明电极层。
至少一层选定透光层在第二区域8内设置有凹槽11和突起12。这里，凹槽11和突起12可以由一层选定透光层形成，也可以由多层选定透光层叠加形成。本实施例并不局限凹槽11和突起12的数量。本实施例的凹槽11和突起12使得阵列基板3的面向彩膜基板1的表面在第二区域8内非平坦，从而形成上述非平坦表面10。
应用本实施例，利用阵列基板3的固有结构(即阵列基板3具有的多层透光层)即可形成实施例一中的非平坦表面10。可见，本实施例未引入新的膜层，只需对现有的制作工艺稍加调整即可形成上述凹槽11和/或突起12，从而形成非平坦表面10。本实施例未增加液晶盒厚，从而有利于液晶显示产品的扁平化、小巧化，符合液晶显示产品的发展趋势。
实施例三
在本实施例中，实施例一中的非平坦表面10由额外设置在阵列基板上的透光折射层形成。具体地，阵列基板包括形成于金属走线所在的金属层上的透光折射层。该透光折射层的面向彩膜基板的表面在第二区域内非平坦。特别地，该透光折射层的面向彩膜基板的表面在第二区域内设置有凹槽和/或突起。这里，透光折射层可以是一层绝缘层，也可以由多层绝缘层依次叠加而成。
具体地，图9示出了本发明实施例液晶显示面板在非显示区域的第五种剖面示意图。参照图9，阵列基板3包括形成于金属走线6所在的金属层上的一层绝缘层13(即上述透光折射层)。特别地，该层绝缘层13由氮化硅、氧化硅、氮氧化硅及氧化铝等绝缘材料中的一种制成，本实施例并不局限于此。上述材料的透光率高，有利于提高阵列基板的开口率。
该层绝缘层13的面向彩膜基板1的表面在第二区域8内设置有凹槽11。这里，本实施例并不限制凹槽11的数量。本实施例设置的凹槽11使得阵列基板3的面向彩膜基板1的表面(即透光折射层的表面)在第二区域8内非平坦，从而形成上述非平坦表面10。
图10示出了本发明实施例液晶显示面板在非显示区域的第六种剖面示意图。参照图10，阵列基板3包括形成于金属走线6所在的金属层上的一层绝缘层13(即上述透光折射层)。特别地，该层绝缘层13由氮化硅、氧化硅、氮氧化硅及氧化铝等绝缘材料中的一种制成，本实施例并不局限于此。上述材料的透光率高，有利于提高阵列基板的开口率。
该层绝缘层13的面向彩膜基板1的表面在第二区域8内设置有突起12。这里，本实施例并不限制突起12的数量。本实施例设置的突起12使得阵列基板3的面向彩膜基板1的表面(即透光折射层的表面)在第二区域8内非平坦，从而形成上述非平坦表面10。
图11示出了本发明实施例液晶显示面板在非显示区域的第七种剖面示意图。参照图11，阵列基板3包括形成于金属走线6所在的金属层上的一层绝缘层13(即上述透光折射层)。特别地，该层绝缘层13由氮化硅、氧化硅、氮氧化硅及氧化铝等绝缘材料中的一种制成，本实施例并不局限于此。上述材料的透光率高，有利于提高阵列基板的开口率。
该层绝缘层13的面向彩膜基板1的表面在第二区域8内设置有凹槽11和突起12。这里，本实施例并不限制凹槽11和突起12的数量。本实施例设置的凹槽11和突起12使得阵列基板3的面向彩膜基板1的表面(即透光折射层的表面)在第二区域8内非平坦，从而形成上述非平坦表面10。
图12示出了本发明实施例液晶显示面板在非显示区域的第八种剖面示意图。参照图12，上述透光折射层包括形成于金属走线6所在的金属层上的多层绝缘层13。由该多层绝缘层13构成了上述透光折射层。特别地，各层绝缘层13由氮化硅、氧化硅、氮氧化硅及氧化铝等绝缘材料中的一种制成，本实施例并不局限于此。上述材料的透光率高，有利于提高阵列基板的开口率。
构成上述透光折射层的各层绝缘层13依次叠加，由此形成了该透光折射层面向彩膜基板1的表面在第二区域8内设置的凹槽11。即，该凹槽11由构成透光折射层的多层绝缘层13叠加而成。这里，本实施例并不限制凹槽11的数量。本实施例设置的凹槽11使得阵列基板3的面向彩膜基板1的表面(即透光折射层的表面)在第二区域8内非平坦，从而形成上述非平坦表面10。
图13示出了本发明实施例液晶显示面板在非显示区域的第九种剖面示意图。参照图13，上述透光折射层包括形成于金属走线6所在的金属层上的多层绝缘层13。由该多层绝缘层13构成了上述透光折射层。特别地，各层绝缘层13由氮化硅、氧化硅、氮氧化硅及氧化铝等绝缘材料中的一种制成，本实施例并不局限于此。上述材料的透光率高，有利于提高阵列基板的开口率。
构成上述透光折射层的各层绝缘层13依次叠加，由此形成了该透光折射层面向彩膜基板1的表面在第二区域8内设置的突起12。即，该突起12由构成透光折射层的多层绝缘层13叠加而成。这里，本实施例并不限制突起12的数量。本实施例设置的突起12使得阵列基板3的面向彩膜基板1的表面(即透光折射层的表面)在第二区域8内非平坦，从而形成上述非平坦表面10。
图14示出了本发明实施例液晶显示面板在非显示区域的第十种剖面示意图。参照图14，上述透光折射层包括形成于金属走线6所在的金属层上的多层绝缘层13。由该多层绝缘层13构成了上述透光折射层。特别地，各层绝缘层13由氮化硅、氧化硅、氮氧化硅及氧化铝等绝缘材料中的一种制成，本实施例并不局限于此。上述材料的透光率高，有利于提高阵列基板的开口率。
构成上述透光折射层的各层绝缘层13依次叠加，由此形成了该透光折射层面向彩膜基板1的表面在第二区域8内设置的凹槽11和突起12。即，该凹槽11和突起12由构成透光折射层的多层绝缘层13叠加而成。这里，本实施例并不限制凹槽11和突起12的数量。本实施例设置的凹槽11和突起12使得阵列基板3的面向彩膜基板1的表面(即透光折射层的表面)在第二区域8内非平坦，从而形成上述非平坦表面10。
需要说明的是，本实施例采用的透光折射层不可与金属走线6重叠，以防止导电不良。
应用本实施例，无需调整阵列基板3的固有结构，只需增加绝缘层13的制作工艺，即可形成实施例一中的非平坦表面10。可见，本实施例不会对阵列基板的固有结构及制作过程中使用的掩膜版的图案造成影响，只需增加少许制作工艺即可形成具有非平坦表面10的透光折射层，从而提高了液晶显示产品的制作效率。
实施例四
本实施例对液晶显示面板在显示区域的结构进行了优化。
在实施例中，彩膜基板和阵列基板通过封框胶粘合。封框胶涂布在阵列基板的面向彩膜基板的表面的非显示区域内和彩膜基板的面向阵列基板的表面的非显示区域内。
图15示出了本发明实施例液晶显示面板在显示区域的剖面示意图。如图15所示，封框胶(图15中未示出)还涂布在彩膜基板1的黑色矩阵14的面向阵列基板3的表面上。特别地，涂布在黑色矩阵14的面向阵列基板3的表面上的封框胶掺杂有间隙子15。
这里，间隙子1不仅能够起到维持液晶盒厚的作用，还能避免阵列基板3与彩膜基板1在对盒过程中出现的对位偏差，从而避免了由于对位偏差导致的串扰(V-Crosstalk)现象以及漏光现象，有利于提高液晶显示产品的显示效率。
虽然本发明所公开的实施方式如上，但所述的内容只是为了便于理解本发明而采用的实施方式，并非用以限定本发明。任何本发明所属技术领域内的技术人员，在不脱离本发明所公开的精神和范围的前提下，可以在实施的形式上及细节上作任何的修改与变化，但本发明的保护范围，仍须以所附的权利要求书所界定的范围为准。

Claims (4)

1.一种液晶显示面板，其特征在于，包括彩膜基板、阵列基板以及设置在所述彩膜基板和所述阵列基板之间的液晶层；
其中，所述阵列基板的面向所述彩膜基板的表面被划分为显示区域和非显示区域，所述非显示区域包括设置有所述阵列基板的金属走线的第一区域和未设置有所述金属走线的第二区域；
其中，所述阵列基板包括形成于所述金属走线所在的金属层上的透光折射层；
所述透光折射层为形成于所述金属走线所在的金属层上的一层绝缘层，所述绝缘层的面向所述彩膜基板的表面在第二区域内设置有凹槽和/或突起，以使所述阵列基板的面向所述彩膜基板的表面在所述第二区域内非平坦。
2.一种液晶显示面板，其特征在于，包括彩膜基板、阵列基板以及设置在所述彩膜基板和所述阵列基板之间的液晶层；
其中，所述阵列基板的面向所述彩膜基板的表面被划分为显示区域和非显示区域，所述非显示区域包括设置有所述阵列基板的金属走线的第一区域和未设置有所述金属走线的第二区域；
其中，所述阵列基板包括形成于所述金属走线所在的金属层上的透光折射层；
所述透光折射层包括形成于所述金属走线所在的金属层上的多层绝缘层，所述透光折射层的面向所述彩膜基板的表面在第二区域内设置有凹槽和/或突起，以使所述阵列基板的面向所述彩膜基板的表面在所述第二区域内非平坦；
其中，所述凹槽和/或突起由所述多层绝缘层叠加而成。
3.根据权利要求1或2所述的液晶显示面板，其特征在于，所述绝缘层由氮化硅或氧化硅材料制成。
4.根据权利要求1或2所述的液晶显示面板，其特征在于，所述彩膜基板和所述阵列基板通过封框胶粘合；
所述封框胶涂布在所述阵列基板的面向所述彩膜基板的表面的非显示区域内、所述彩膜基板的面向所述阵列基板的表面的非显示区域内、以及所述彩膜基板的黑色矩阵的面向所述阵列基板的表面上；
涂布在所述黑色矩阵的面向所述阵列基板的表面上的封框胶掺杂有间隙子。
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