CN1065656C - 具有用于阳极和阴极分别再生的反馈通道的湿法处理设备 - Google Patents

具有用于阳极和阴极分别再生的反馈通道的湿法处理设备 Download PDF

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Publication number
CN1065656C
CN1065656C CN95104078A CN95104078A CN1065656C CN 1065656 C CN1065656 C CN 1065656C CN 95104078 A CN95104078 A CN 95104078A CN 95104078 A CN95104078 A CN 95104078A CN 1065656 C CN1065656 C CN 1065656C
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CN
China
Prior art keywords
water
equipment according
holding tank
treatment trough
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN95104078A
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English (en)
Chinese (zh)
Other versions
CN1113034A (zh
Inventor
北岛洋
青木秀充
滨野春人
森田信
白水好美
中森雅治
濑尾祐史
清水裕司
井内真
佐佐木康
N·太田
K·渡边
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP6056108A external-priority patent/JP2743822B2/ja
Priority claimed from JP6056110A external-priority patent/JP2897637B2/ja
Application filed by NEC Corp filed Critical NEC Corp
Publication of CN1113034A publication Critical patent/CN1113034A/zh
Application granted granted Critical
Publication of CN1065656C publication Critical patent/CN1065656C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • H10P50/00
    • H10P72/0426
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/46Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104Devices therefor; Their operating or servicing
    • C02F1/4618Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00Apparatus for treatment of water, waste water or sewage
    • C02F2201/46Apparatus for electrochemical processes
    • C02F2201/461Electrolysis apparatus
    • C02F2201/46105Details relating to the electrolytic devices
    • C02F2201/46115Electrolytic cell with membranes or diaphragms
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00Apparatus for treatment of water, waste water or sewage
    • C02F2201/46Apparatus for electrochemical processes
    • C02F2201/461Electrolysis apparatus
    • C02F2201/46105Details relating to the electrolytic devices
    • C02F2201/4612Controlling or monitoring
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00Apparatus for treatment of water, waste water or sewage
    • C02F2201/46Apparatus for electrochemical processes
    • C02F2201/461Electrolysis apparatus
    • C02F2201/46105Details relating to the electrolytic devices
    • C02F2201/4618Supplying or removing reactants or electrolyte
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00Apparatus for treatment of water, waste water or sewage
    • C02F2201/46Apparatus for electrochemical processes
    • C02F2201/461Electrolysis apparatus
    • C02F2201/46105Details relating to the electrolytic devices
    • C02F2201/4618Supplying or removing reactants or electrolyte
    • C02F2201/46185Recycling the cathodic or anodic feed
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00Apparatus for treatment of water, waste water or sewage
    • C02F2201/46Apparatus for electrochemical processes
    • C02F2201/461Electrolysis apparatus
    • C02F2201/46105Details relating to the electrolytic devices
    • C02F2201/4619Supplying gas to the electrolyte
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/04Oxidation reduction potential [ORP]
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/06Controlling or monitoring parameters in water treatment pH
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/42Liquid level
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2301/00General aspects of water treatment
    • C02F2301/06Pressure conditions
    • C02F2301/066Overpressure, high pressure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Water Supply & Treatment (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Electrochemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
CN95104078A 1994-03-25 1995-03-25 具有用于阳极和阴极分别再生的反馈通道的湿法处理设备 Expired - Fee Related CN1065656C (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP56108/1994 1994-03-25
JP6056108A JP2743822B2 (ja) 1994-03-25 1994-03-25 電解活性水処理装置
JP6056110A JP2897637B2 (ja) 1994-03-25 1994-03-25 ウエット処理装置
JP56110/94 1994-03-25
JP56110/1994 1994-03-25
JP56108/94 1994-03-25

Publications (2)

Publication Number Publication Date
CN1113034A CN1113034A (zh) 1995-12-06
CN1065656C true CN1065656C (zh) 2001-05-09

Family

ID=26397038

Family Applications (1)

Application Number Title Priority Date Filing Date
CN95104078A Expired - Fee Related CN1065656C (zh) 1994-03-25 1995-03-25 具有用于阳极和阴极分别再生的反馈通道的湿法处理设备

Country Status (5)

Country Link
US (1) US5549798A (cg-RX-API-DMAC10.html)
KR (1) KR0174107B1 (cg-RX-API-DMAC10.html)
CN (1) CN1065656C (cg-RX-API-DMAC10.html)
DE (1) DE69533245D1 (cg-RX-API-DMAC10.html)
TW (1) TW281785B (cg-RX-API-DMAC10.html)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10261687A (ja) * 1997-03-18 1998-09-29 Furontetsuku:Kk 半導体等製造装置
DK1043033T3 (da) * 1997-12-26 2006-05-08 Morinaga Milk Industry Co Ltd Fremgangsmåde til sterilisering af artikler og fremgangsmåde til emballering af artikler
JP2000040679A (ja) * 1998-07-24 2000-02-08 Hitachi Ltd 半導体集積回路装置の製造方法
WO2002101808A1 (fr) * 2001-06-11 2002-12-19 Kabushikikaisha Tsukuba Semi Technology Dispositif de nettoyage/traitement pour element non traite et procede de nettoyage/traitement
JP4753596B2 (ja) * 2004-05-19 2011-08-24 大日本スクリーン製造株式会社 基板処理装置
JP4462146B2 (ja) * 2004-09-17 2010-05-12 栗田工業株式会社 硫酸リサイクル型洗浄システムおよび硫酸リサイクル型過硫酸供給装置
JP2010205782A (ja) * 2009-02-27 2010-09-16 Renesas Electronics Corp 半導体装置の製造方法
WO2019124321A1 (ja) * 2017-12-18 2019-06-27 積水化学工業株式会社 表面処理方法及び装置
GB201804881D0 (en) * 2018-03-27 2018-05-09 Lam Res Ag Method of producing rinsing liquid
CN109013589B (zh) * 2018-07-12 2021-07-30 芜湖慧宇商贸有限公司 一种家庭用水循环处理装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2237818A (en) * 1989-11-10 1991-05-15 Kolbe & Co Hans Apparatus for the electrolytic regeneration of etching solutions

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4834850A (en) * 1987-07-27 1989-05-30 Eltech Systems Corporation Efficient electrolytic precious metal recovery system
US4891103A (en) * 1988-08-23 1990-01-02 Texas Instruments Incorporated Anadization system with remote voltage sensing and active feedback control capabilities
DE58909438D1 (de) * 1988-11-24 1995-10-19 Gerhard Gramm Vorrichtung zum auf- und/oder abtragen von überzügen bei werkstücken.
DE69312636T2 (de) * 1992-11-09 1998-02-05 Canon Kk Anodisierungsapparat mit einer Trägervorrichtung für das zu behandelnde Substrat
JP2859081B2 (ja) * 1993-01-08 1999-02-17 日本電気株式会社 ウェット処理方法及び処理装置
JPH06240499A (ja) * 1993-02-12 1994-08-30 Yamaha Corp メッキ方法及びその装置
US5411652A (en) * 1993-12-15 1995-05-02 Allied-Signal Inc. Optimum conversion chamber

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2237818A (en) * 1989-11-10 1991-05-15 Kolbe & Co Hans Apparatus for the electrolytic regeneration of etching solutions

Also Published As

Publication number Publication date
KR950027973A (ko) 1995-10-18
TW281785B (cg-RX-API-DMAC10.html) 1996-07-21
US5549798A (en) 1996-08-27
KR0174107B1 (ko) 1999-04-01
DE69533245D1 (de) 2004-08-19
CN1113034A (zh) 1995-12-06

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