CN106505114A - 一种铜锡硫光吸收层薄膜材料的制备方法 - Google Patents
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- 239000010949 copper Substances 0.000 title claims abstract description 16
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 13
- 239000000463 material Substances 0.000 title claims abstract description 12
- 238000002360 preparation method Methods 0.000 title claims abstract description 12
- AFNRRBXCCXDRPS-UHFFFAOYSA-N tin(ii) sulfide Chemical compound [Sn]=S AFNRRBXCCXDRPS-UHFFFAOYSA-N 0.000 title claims abstract description 11
- 239000002243 precursor Substances 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims abstract description 12
- 238000004528 spin coating Methods 0.000 claims abstract description 12
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000011521 glass Substances 0.000 claims abstract description 9
- 238000003756 stirring Methods 0.000 claims abstract description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 7
- 239000011593 sulfur Substances 0.000 claims abstract description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims abstract description 6
- 206010013786 Dry skin Diseases 0.000 claims abstract description 6
- 238000001035 drying Methods 0.000 claims abstract description 6
- 238000010438 heat treatment Methods 0.000 claims abstract description 6
- 239000003960 organic solvent Substances 0.000 claims abstract description 6
- 230000001681 protective effect Effects 0.000 claims abstract description 6
- 239000000758 substrate Substances 0.000 claims abstract description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 6
- 150000001875 compounds Chemical class 0.000 claims abstract description 5
- 239000002184 metal Substances 0.000 claims abstract description 5
- 229910052751 metal Inorganic materials 0.000 claims abstract description 5
- 150000003839 salts Chemical class 0.000 claims abstract description 5
- 238000000137 annealing Methods 0.000 claims abstract description 4
- 150000001879 copper Chemical class 0.000 claims abstract description 3
- 229960000935 dehydrated alcohol Drugs 0.000 claims abstract description 3
- 239000008367 deionised water Substances 0.000 claims abstract description 3
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 3
- 150000002739 metals Chemical class 0.000 claims abstract description 3
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 6
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims description 4
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 claims description 4
- 239000005864 Sulphur Substances 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical class [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 claims description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 2
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 claims description 2
- 229910002651 NO3 Inorganic materials 0.000 claims description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 2
- 229960004756 ethanol Drugs 0.000 claims description 2
- 239000000843 powder Substances 0.000 claims description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims 1
- 150000001412 amines Chemical class 0.000 claims 1
- 150000003462 sulfoxides Chemical class 0.000 claims 1
- 235000011149 sulphuric acid Nutrition 0.000 claims 1
- 239000001117 sulphuric acid Substances 0.000 claims 1
- 239000000470 constituent Substances 0.000 abstract description 2
- 238000000151 deposition Methods 0.000 abstract description 2
- 230000008021 deposition Effects 0.000 abstract description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005352 clarification Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 235000021384 green leafy vegetables Nutrition 0.000 description 3
- 235000011150 stannous chloride Nutrition 0.000 description 3
- 238000013036 cure process Methods 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
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- 238000003556 assay Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
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- 239000010408 film Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- YUKQRDCYNOVPGJ-UHFFFAOYSA-N thioacetamide Chemical compound CC(N)=S YUKQRDCYNOVPGJ-UHFFFAOYSA-N 0.000 description 1
- DLFVBJFMPXGRIB-UHFFFAOYSA-N thioacetamide Natural products CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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Abstract
本发明公开了一种铜锡硫光吸收层薄膜材料的制备方法,具体步骤为:1)将0.2~1.0mol/L金属铜盐加入有机溶剂中,搅拌至完全溶解后,加入0.11~0.56mol/L金属锡盐继续搅拌至溶解,最后加入1.6~8.0mol/L的含硫化合物搅拌至完全溶解形成稳定的CTS前驱体溶液;2)将玻璃依次在丙酮、无水乙醇和去离子水中超声清洗干净;3)将前驱体溶液旋涂到玻璃基底上,然后在250℃~400℃干燥1~10分钟,反复旋涂沉积;4)待旋涂完毕后将样品置于400℃~600℃退火5分钟~2小时,升温速率为10~50℃/min,自然降温,在退火过程中,持续通保护气体N2,流量为10~35 mL/min,即可得到CTS薄膜。本发明采用一步溶液法制备铜锡硫薄膜,所得铜锡硫薄膜材料致密平整无孔洞,相成分单一。
Description
技术领域
本发明涉及一种铜锡硫光吸收层薄膜材料的制备方法,属于薄膜太阳能电池领域。
背景技术
近年来,P型半导体Cu2SnS3(CTS)由于具有较高的光吸收系数、较适合的光学带隙(0.92-1.35eV)以及元素地壳含量丰富受到了国内外极大的关注。作为薄膜太阳能电池光吸收层材料,其理论转换效率可达30%,展现出了极大的商业应用潜力。目前,制备CTS薄膜的方法大致可分为真空法和溶液法。M.Nakashima等人通过连续蒸发Na/Cu/Sn金属前驱体层,然后在含有硫和锡的气氛中570 ℃退火制备了转换效率为4.64%的CTS薄膜太阳能电池。当然,采用真空方法沉积CTS薄膜对设备的要求比较高,生产成本同样也很高。相比之下,非真空方法对设备的要求较低,成本不高,也广泛应用于CTS薄膜制备。M. P.Suryawanshi等人通过旋涂含有Cu和Sn元素的水基前驱体溶液形成前驱体薄膜,尔后硫化的方法制备CTS薄膜太阳能电池,转换效率为1.8%。后硫化过程工艺比较复杂且会导致原材料浪费及环境污染等问题。因此,开发一种不涉及后硫化制备高质量CTS薄膜的溶液方法对其在太阳能电池领域的实际应用具有重大意义。
发明内容
本发明的目的在于提供一种铜锡硫光吸收层薄膜材料的制备方法。
本发明采用一步溶液法制备铜锡硫薄膜,所得铜锡硫薄膜材料致密平整无孔洞,相成分单一。
一种铜锡硫光吸收层薄膜材料的制备方法,其特征在于具体步骤为:
1)将0.2~1.0 mol/L金属铜盐加入有机溶剂中,搅拌至完全溶解后,加入0.11~0.56mol/L金属锡盐继续搅拌至溶解,最后加入1.6~8.0 mol/L的含硫化合物搅拌至完全溶解形成稳定的CTS前驱体溶液;
2)将玻璃依次在丙酮、无水乙醇和去离子水中超声清洗干净;
3)将前驱体溶液旋涂到玻璃基底上,然后在250 ℃~400 ℃干燥1~10分钟,反复旋涂沉积;
4)待旋涂完毕后将样品置于400 ℃~600 ℃退火5分钟~2小时,升温速率为10 ~50 ℃/min,自然降温,在退火过程中,持续通保护气体N2,流量为10~35 mL/min,即可得到CTS薄膜。
所述CTS薄膜的厚度为1.0~2.0 μm。
所述铜盐、锡盐为铜和锡的硝酸盐、硫酸盐、醋酸盐或氯化盐。
所述含硫化合物为硫粉、硫脲、硫代乙酰胺或硫醇。
所述有机溶剂为乙醇、乙二醇甲醚、二甲基亚砜、乙醇胺、乙二醇或水。
本发明与现有技术相比具有的优点:本发明不经过后硫化过程,无需真空设备,制备周期短,生产成本低,易于控制、操作简便、便于工业化生产;所用有机溶剂绿色环保,对制作环境的要求低;实验可重复性和稳定性也比较好,在太阳能电池方面有较好的应用价值。
附图说明
图1是CTS薄膜的典型表面及截面形貌图。
图2是CTS薄膜的带隙随硫含量变化关系图,图中S/M为前驱体溶液中硫源与金属的比例。
具体实施方式
实施例1
将0.8 mol/L醋酸铜和0.44 mol/L无水氯化亚锡加入至10 mL二甲基亚砜中,搅拌至完全溶解,然后加入2.48 mol/L硫脲形成透明澄清的CTS前驱体溶液;(2) 利用匀胶机将CTS溶胶前驱体旋涂到清洗干净的玻璃基底上,然后在加热板上300 ℃干燥5分钟,反复旋涂7次;(4)待旋涂完毕后将样品置于管式炉中580 ℃退火10分钟,升温速率为10 ℃/min,在退火过程中,持续通保护气体N2,流量为15 mL/min,即可得到厚度约为1 μm的CTS薄膜。带隙为1.09 eV,如附图2所示。
实施例2
将0.8 mol/L醋酸铜和0.44 mol/L无水氯化亚锡加入至10 mL二甲基亚砜中,搅拌至完全溶解,然后加入4.96 mol/L硫脲形成透明澄清的CTS前驱体溶液;(2) 利用匀胶机将CTS溶胶前驱体旋涂到清洗干净的玻璃基底上,然后在加热板上300 ℃干燥5分钟,反复旋涂7次;(4)待旋涂完毕后将样品置于管式炉中580 ℃退火10分钟,升温速率为10 ℃/min,在退火过程中,持续通保护气体N2,流量为15 mL/min,即可得到厚度约为1 μm、晶粒较大的CTS薄膜。带隙为1.05 eV,如附图2所示。
实施例3
将0.8 mol/L醋酸铜和0.44 mol/L无水氯化亚锡加入至10 mL二甲基亚砜中,搅拌至完全溶解,然后加入7.44 mol/L硫脲形成透明澄清的CTS前驱体溶液;(2) 利用匀胶机将CTS溶胶前驱体旋涂到清洗干净的玻璃基底上,然后在加热板上300 ℃干燥5分钟,反复旋涂7次;(4)待旋涂完毕后将样品置于管式炉中580 ℃退火10分钟,升温速率为10 ℃/min,在退火过程中,持续通保护气体N2,流量为15 mL/min,即可得到厚度约为1 μm、表面平整且相成分单一的CTS薄膜,如附图1所示。带隙为1.02 eV,如附图2所示。
Claims (5)
1.一种铜锡硫光吸收层薄膜材料的制备方法,其特征在于具体步骤为:
1)将0.2~1.0 mol/L金属铜盐加入有机溶剂中,搅拌至完全溶解后,加入0.11~0.56mol/L金属锡盐继续搅拌至溶解,最后加入1.6~8.0 mol/L的含硫化合物搅拌至完全溶解形成稳定的CTS前驱体溶液;
2)将玻璃依次在丙酮、无水乙醇和去离子水中超声清洗干净;
3)将前驱体溶液旋涂到玻璃基底上,然后在250 ℃~400 ℃干燥1~10分钟,反复旋涂沉积;
4)待旋涂完毕后将样品置于400 ℃~600 ℃退火5分钟~2小时,升温速率为10 ~50 ℃/min,自然降温,在退火过程中,持续通保护气体N2,流量为10~35 mL/min,即可得到CTS薄膜。
2.如权利要求 1所述的制备方法,其特征在于所述CTS薄膜的厚度为1.0~2.0 μm。
3.如权利要求 1所述的制备方法,其特征在于所述铜盐、锡盐为铜和锡的硝酸盐、硫酸盐、醋酸盐或氯化盐。
4.如权利要求 1所述的制备方法,其特征在于所述含硫化合物为硫粉、硫脲、硫代乙酰胺或硫醇。
5.如权利要求 1所述的制备方法,其特征在于所述有机溶剂为乙醇、乙二醇甲醚、二甲基亚砜、乙醇胺、乙二醇或水。
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CN109830571A (zh) * | 2019-02-27 | 2019-05-31 | 湘潭大学 | 一种电沉积铜后退火制备铜锡硫太阳能电池薄膜材料的方法 |
CN110112059A (zh) * | 2019-05-13 | 2019-08-09 | 广东工业大学 | 一种三元化合物半导体薄膜的制备方法 |
CN111762808A (zh) * | 2019-03-28 | 2020-10-13 | 东泰高科装备科技有限公司 | 太阳能电池铜锡硫薄膜吸收层、其制备方法及太阳能电池 |
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CN109830571A (zh) * | 2019-02-27 | 2019-05-31 | 湘潭大学 | 一种电沉积铜后退火制备铜锡硫太阳能电池薄膜材料的方法 |
CN111762808A (zh) * | 2019-03-28 | 2020-10-13 | 东泰高科装备科技有限公司 | 太阳能电池铜锡硫薄膜吸收层、其制备方法及太阳能电池 |
CN110112059A (zh) * | 2019-05-13 | 2019-08-09 | 广东工业大学 | 一种三元化合物半导体薄膜的制备方法 |
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