CN106457168A - 为cvd或pvd覆层装置供给处理气体混合物的设备和方法 - Google Patents
为cvd或pvd覆层装置供给处理气体混合物的设备和方法 Download PDFInfo
- Publication number
- CN106457168A CN106457168A CN201580027176.9A CN201580027176A CN106457168A CN 106457168 A CN106457168 A CN 106457168A CN 201580027176 A CN201580027176 A CN 201580027176A CN 106457168 A CN106457168 A CN 106457168A
- Authority
- CN
- China
- Prior art keywords
- gas
- flow
- mixing chamber
- air
- inlet channel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/10—Mixing gases with gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/42—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
- B01F25/421—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions by moving the components in a convoluted or labyrinthine path
- B01F25/423—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions by moving the components in a convoluted or labyrinthine path by means of elements placed in the receptacle for moving or guiding the components
- B01F25/4231—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions by moving the components in a convoluted or labyrinthine path by means of elements placed in the receptacle for moving or guiding the components using baffles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/42—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
- B01F25/43—Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction
- B01F25/431—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor
- B01F25/4314—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor with helical baffles
- B01F25/43141—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor with helical baffles composed of consecutive sections of helical formed elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/50—Mixing receptacles
- B01F35/52—Receptacles with two or more compartments
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/71—Feed mechanisms
- B01F35/712—Feed mechanisms for feeding fluids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/71—Feed mechanisms
- B01F35/716—Feed mechanisms characterised by the relative arrangement of the containers for feeding or mixing the components
- B01F35/7163—Feed mechanisms characterised by the relative arrangement of the containers for feeding or mixing the components the containers being connected in a mouth-to-mouth, end-to-end disposition, i.e. the openings are juxtaposed before contacting the contents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45512—Premixing before introduction in the reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102014106523.9A DE102014106523A1 (de) | 2014-05-09 | 2014-05-09 | Vorrichtung und Verfahren zum Versorgen einer CVD- oder PVD-Beschichtungseinrichtung mit einem Prozessgasgemisch |
DE102014106523.9 | 2014-05-09 | ||
PCT/EP2015/060017 WO2015169882A1 (de) | 2014-05-09 | 2015-05-07 | Vorrichtung und verfahren zum versorgen einer cvd- oder pvd-beschichtungseinrichtung mit einem prozessgasgemisch |
Publications (1)
Publication Number | Publication Date |
---|---|
CN106457168A true CN106457168A (zh) | 2017-02-22 |
Family
ID=53199950
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201580027176.9A Pending CN106457168A (zh) | 2014-05-09 | 2015-05-07 | 为cvd或pvd覆层装置供给处理气体混合物的设备和方法 |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP6796491B2 (ko) |
KR (1) | KR102413577B1 (ko) |
CN (1) | CN106457168A (ko) |
DE (1) | DE102014106523A1 (ko) |
TW (1) | TWI694168B (ko) |
WO (1) | WO2015169882A1 (ko) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110237734A (zh) * | 2019-06-10 | 2019-09-17 | 中国石油大学(北京) | 气体混合器及废气处理装置 |
CN110917914A (zh) * | 2019-12-19 | 2020-03-27 | 北京北方华创微电子装备有限公司 | 气体混合装置及半导体加工设备 |
CN111744340A (zh) * | 2020-07-02 | 2020-10-09 | 天津市英格环保科技有限公司 | 一种在低温环境下脱硫脱硝的方法 |
CN112680717A (zh) * | 2019-10-18 | 2021-04-20 | 台湾积体电路制造股份有限公司 | 用于半导体制作的气体混合系统及混合气体的方法 |
CN112973483A (zh) * | 2021-03-29 | 2021-06-18 | 深圳市科曼医疗设备有限公司 | 一种气体混合装置 |
CN115066513A (zh) * | 2019-10-29 | 2022-09-16 | 艾克斯特朗欧洲公司 | 用于沉积有机层的方法和设备 |
WO2022262701A1 (zh) * | 2021-06-18 | 2022-12-22 | 北京北方华创微电子装备有限公司 | 半导体工艺设备及其混合进气装置 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020020532A (ja) * | 2018-08-01 | 2020-02-06 | 三菱電機株式会社 | 温度均一化装置、構造物およびパラボラアンテナ装置 |
CN110773061B (zh) * | 2019-11-05 | 2021-09-21 | 浙江工业职业技术学院 | 一种搅拌装置 |
DE102020112568A1 (de) | 2020-02-14 | 2021-08-19 | AIXTRON Ltd. | Gaseinlassorgan für einen CVD-Reaktor |
CN111804453B (zh) * | 2020-07-21 | 2021-10-12 | 宁波诺歌休闲用品有限公司 | 一种用于铝合金型材的表面喷涂机中的喷涂机构 |
CN113813858B (zh) * | 2021-11-10 | 2023-01-31 | 西安国际医学中心有限公司 | 一种治疗癌症疼痛膏药制作的混料装置 |
CN114768578B (zh) * | 2022-05-20 | 2023-08-18 | 北京北方华创微电子装备有限公司 | 混气装置及半导体工艺设备 |
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US4408893A (en) * | 1982-04-28 | 1983-10-11 | Luwa A.G. | Motionless mixing device |
JPS5949829A (ja) * | 1982-09-14 | 1984-03-22 | Matsushita Electric Ind Co Ltd | 流体混合器およびこれを用いた薄膜装置 |
US4850705A (en) * | 1987-11-18 | 1989-07-25 | Horner Terry A | Motionless mixers and baffles |
JPH11293465A (ja) * | 1998-04-15 | 1999-10-26 | Ebara Corp | Cvd装置 |
JP2003142473A (ja) * | 2001-10-31 | 2003-05-16 | Tokyo Electron Ltd | ガス供給装置及びガス供給方法、及び成膜装置及び成膜方法 |
US6601986B2 (en) * | 2001-08-29 | 2003-08-05 | Taiwan Semiconductor Manufacturing Co., Ltd | Fluid mixing apparatus |
US6758591B1 (en) * | 2002-03-22 | 2004-07-06 | Novellus Systems, Inc. | Mixing of materials in an integrated circuit manufacturing equipment |
JP3609329B2 (ja) * | 1992-09-07 | 2005-01-12 | 三菱電機株式会社 | 窒化膜形成方法 |
TW200628630A (en) * | 2005-01-28 | 2006-08-16 | Aixtron Ag | The gas-inlet mechanism of a CVD reactor |
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2014
- 2014-05-09 DE DE102014106523.9A patent/DE102014106523A1/de active Pending
-
2015
- 2015-05-07 KR KR1020167034147A patent/KR102413577B1/ko active IP Right Grant
- 2015-05-07 JP JP2016565413A patent/JP6796491B2/ja active Active
- 2015-05-07 CN CN201580027176.9A patent/CN106457168A/zh active Pending
- 2015-05-07 WO PCT/EP2015/060017 patent/WO2015169882A1/de active Application Filing
- 2015-05-08 TW TW104114708A patent/TWI694168B/zh active
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US4408893A (en) * | 1982-04-28 | 1983-10-11 | Luwa A.G. | Motionless mixing device |
JPS5949829A (ja) * | 1982-09-14 | 1984-03-22 | Matsushita Electric Ind Co Ltd | 流体混合器およびこれを用いた薄膜装置 |
US4850705A (en) * | 1987-11-18 | 1989-07-25 | Horner Terry A | Motionless mixers and baffles |
JP3609329B2 (ja) * | 1992-09-07 | 2005-01-12 | 三菱電機株式会社 | 窒化膜形成方法 |
JPH11293465A (ja) * | 1998-04-15 | 1999-10-26 | Ebara Corp | Cvd装置 |
US6601986B2 (en) * | 2001-08-29 | 2003-08-05 | Taiwan Semiconductor Manufacturing Co., Ltd | Fluid mixing apparatus |
JP2003142473A (ja) * | 2001-10-31 | 2003-05-16 | Tokyo Electron Ltd | ガス供給装置及びガス供給方法、及び成膜装置及び成膜方法 |
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TW200628630A (en) * | 2005-01-28 | 2006-08-16 | Aixtron Ag | The gas-inlet mechanism of a CVD reactor |
WO2007099288A2 (en) * | 2006-02-28 | 2007-09-07 | Peter Stein | Gas retention vessel |
CN201086001Y (zh) * | 2007-08-22 | 2008-07-16 | 张国栋 | 静态混合器及其螺旋式混合元件 |
CN101371975A (zh) * | 2008-09-26 | 2009-02-25 | 沈阳化工学院 | 多流道螺旋静态混合器 |
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CN102974257A (zh) * | 2012-12-03 | 2013-03-20 | 山西新华化工有限责任公司 | 动活性检测混合器 |
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Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110237734A (zh) * | 2019-06-10 | 2019-09-17 | 中国石油大学(北京) | 气体混合器及废气处理装置 |
CN112680717A (zh) * | 2019-10-18 | 2021-04-20 | 台湾积体电路制造股份有限公司 | 用于半导体制作的气体混合系统及混合气体的方法 |
US11772058B2 (en) | 2019-10-18 | 2023-10-03 | Taiwan Semiconductor Manufacturing Company Limited | Gas mixing system for semiconductor fabrication |
CN112680717B (zh) * | 2019-10-18 | 2023-11-17 | 台湾积体电路制造股份有限公司 | 用于半导体制作的气体混合系统及混合气体的方法 |
CN115066513A (zh) * | 2019-10-29 | 2022-09-16 | 艾克斯特朗欧洲公司 | 用于沉积有机层的方法和设备 |
CN110917914A (zh) * | 2019-12-19 | 2020-03-27 | 北京北方华创微电子装备有限公司 | 气体混合装置及半导体加工设备 |
CN110917914B (zh) * | 2019-12-19 | 2022-09-16 | 北京北方华创微电子装备有限公司 | 气体混合装置及半导体加工设备 |
CN111744340A (zh) * | 2020-07-02 | 2020-10-09 | 天津市英格环保科技有限公司 | 一种在低温环境下脱硫脱硝的方法 |
CN112973483A (zh) * | 2021-03-29 | 2021-06-18 | 深圳市科曼医疗设备有限公司 | 一种气体混合装置 |
WO2022262701A1 (zh) * | 2021-06-18 | 2022-12-22 | 北京北方华创微电子装备有限公司 | 半导体工艺设备及其混合进气装置 |
TWI817557B (zh) * | 2021-06-18 | 2023-10-01 | 大陸商北京北方華創微電子裝備有限公司 | 半導體製程設備及其混合進氣裝置 |
Also Published As
Publication number | Publication date |
---|---|
DE102014106523A1 (de) | 2015-11-12 |
KR20170003965A (ko) | 2017-01-10 |
WO2015169882A1 (de) | 2015-11-12 |
JP2017522447A (ja) | 2017-08-10 |
KR102413577B1 (ko) | 2022-06-24 |
TWI694168B (zh) | 2020-05-21 |
TW201602398A (zh) | 2016-01-16 |
JP6796491B2 (ja) | 2020-12-09 |
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