CN106449913A - 石墨烯/银量子点/氮化镓双向发光二极管及其制备方法 - Google Patents

石墨烯/银量子点/氮化镓双向发光二极管及其制备方法 Download PDF

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CN106449913A
CN106449913A CN201610914870.9A CN201610914870A CN106449913A CN 106449913 A CN106449913 A CN 106449913A CN 201610914870 A CN201610914870 A CN 201610914870A CN 106449913 A CN106449913 A CN 106449913A
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graphene
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林时胜
吴志乾
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Zhejiang University ZJU
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/04Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26Materials of the light emitting region
    • H01L33/30Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
    • H01L33/32Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table containing nitrogen
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/40Materials therefor

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Abstract

本发明公开了一种石墨烯/银量子点/氮化镓双向发光二极管及其制备方法,该发光二极管是自下而上依次有蓝宝石衬底层或硅衬底层、p型的氮化镓层、银量子点层、石墨烯层,在氮化镓层上还设有侧面电极,在石墨烯层上设有正面电极,所述的氮化镓层为p型多晶材料,厚度为2~10μm;本发明的石墨烯/银量子点/氮化镓双向发光二极管利用银量子点表面等离子体增强发光,同时结合石墨烯材料的高透光性、高导电性和氮化镓优异的发光性能,正反偏压下均可发光且波段多样,亮度高,制备工艺简单,成本低。

Description

石墨烯/银量子点/氮化镓双向发光二极管及其制备方法
技术领域
本发明涉及一种发光二极管及其制造方法,尤其涉及一种石墨烯/银量子点/氮化镓双向发光二极管及其制造方法,属于发光二极管领域。
背景技术
发光二极管以其寿命长、重量轻、体积小和污染低的优点,有望取代日光灯成为第三代照明器件,现在已经被广泛应用到照明,显示等方面。氮化镓作为宽禁带直接带隙半导体,有较大的禁带宽度(3.5eV)十分适合制作短波长发光器件。石墨烯的电子迁移率是硅的100倍,高的电子迁移率有利于提高发光二极管的发光效率;银量子点的表面等离子体增强可大幅提高器件的发光强度。在此基础上,本发明提出了石墨烯/银量子点/氮化镓结构,并利用简单工艺实现了所述发光二极管的制备。且该发光二极管正反偏压下均可工作,石墨烯接正电压时发出黄绿光,石墨烯接负电压时发蓝光。
发明内容
本发明的目的在于提供一种亮度高,工艺简单的石墨烯/银量子点/氮化镓双向发光二极管及其制备方法,该发光二极管正反偏压下均可工作,石墨烯接正电压时发出黄绿光,石墨烯接负电压时发蓝光。
本发明的石墨烯/银量子点/氮化镓双向发光二极管,其特征在于,自下而上依次有蓝宝石衬底层或硅衬底层、p型的氮化镓层、银量子点层、石墨烯层,在氮化镓层上还设有侧面电极,在石墨烯层上设有正面电极,所述的氮化镓层为p型多晶材料,厚度为2~10μm。
上述技术方案中,所述的银量子点的直径为5~100nm。
所述的正面电极为金、钯、银、钛、铬、镍的一种或者几种的复合电极。
所述的侧面电极为镍金电极。
所述的石墨烯的厚度为1-5层。
制备上述的石墨烯/银量子点/氮化镓双向发光二极管的方法,包括如下步骤:
1)在蓝宝石或硅衬底上用金属化学气相沉积法生长P型氮化镓外延层;
2)在步骤1)所得氮化镓片上用电子束蒸发镀膜方法沉积侧面电极,并预留面积;
3)将步骤2)所得氮化镓片进行表面清洗并干燥表面;
4)将银量子点旋涂至步骤3)处理后的氮化镓片的预留面积处;
5)将石墨烯转移至步骤4)制备的银量子点层上;
6)在石墨烯上制作正面电极。
与现有技术相比,本发明具有的有益效果是:本发明的发光二极管通过独特的结构设计,使得其可以实现双向发光,单个器件可发出多种波长的光,即在正反偏压下均可工作,石墨烯接正电压时发出黄绿光,石墨烯接负电压时发蓝光,且该发光二极管亮度高;工艺简单,成本低。
附图说明
图1为石墨烯/银量子点/氮化镓双向发光二极管截面图;
图2为石墨烯/银量子点/氮化镓双向发光二极管俯视图;
图3为石墨烯/银量子点/氮化镓双向发光二极管的IV曲线图;
图4为石墨烯/银量子点/氮化镓双向发光二极管在石墨烯接正偏压时的发光谱;
图5为石墨烯/银量子点/氮化镓双向发光二极管在石墨烯接负偏压时的发光谱。
具体实施方式
下面结合附图进一步说明本发明。
参照图1、2,本发明的石墨烯/银量子点/氮化镓双向发光二极管自下而上依次有蓝宝石衬底层或硅衬底层1、p型的氮化镓层2、银量子点层4、石墨烯层5,在氮化镓层2上还设有侧面电极3,在石墨烯层5上设有正面电极6,所述的氮化镓层为p型多晶材料,厚度为2~10μm。图3、4、5分别为本发明制得的发光二极管的IV曲线图、石墨烯接正偏压时的发光谱及石墨烯接负偏压时的发光谱,可以看出该发光二极管可以实现双向发光,单个器件可发出多种波长的光,即在正反偏压下均可工作,石墨烯接正电压时发出黄绿光,石墨烯接负电压时发蓝光。
实施例1
1)在蓝宝石衬底上用金属化学气相沉积法生长P型多晶氮化镓外延层,厚度2μm;
2)在氮化镓外延片一侧利用电子束蒸发法沉积镍金电极;
3)将得到的样品依次浸入去离子水,丙酮和异丙醇中进行表面清洗;
4)将直径100nm银量子点匀涂至清洗干净的氮化镓单晶片上;
5)将单层石墨烯转移至银量子点上;
6)在石墨烯上利用热蒸发工艺沉积银电极得到石墨烯/银量子点/氮化镓双向发光二极管。
实施例2
1)在硅衬底上用金属化学气相沉积法生长P型多晶氮化镓外延层,厚度4μm;
2)在氮化镓外延片一侧利用电子束蒸发法沉积镍金电极;
3)将得到的样品依次浸入去离子水,丙酮和异丙醇中进行表面清洗;
4)将50nm直径银量子点匀涂至清洗干净的氮化镓单晶片上;
5)将双层石墨烯转移至银量子点上;
6)在石墨烯上利用热蒸发工艺沉积金电极得到石墨烯/银量子点/氮化镓双向发光二极管。
实施例3
1)在硅衬底上用金属化学气相沉积法生长P型多晶氮化镓外延层,厚度8μm;
2)在氮化镓外延片一侧利用电子束蒸发法沉积镍金电极;
3)将得到的样品依次浸入去离子水,丙酮和异丙醇中进行表面清洗;
4)将10nm直径银量子点匀涂至清洗干净的氮化镓单晶片上;
5)将三层石墨烯转移至银量子点上;
6)在石墨烯上利用热蒸发工艺沉积钛电极得到石墨烯/银量子点/氮化镓双向发光二极管。
实施例4
1)在硅衬底上用金属化学气相沉积法生长P型多晶氮化镓外延层,厚度10μm;
2)在氮化镓外延片一侧利用电子束蒸发法沉积镍金电极;
3)将得到的样品依次浸入去离子水,丙酮和异丙醇中进行表面清洗;
4)将5nm直径银量子点匀涂至清洗干净的氮化镓单晶片上;
5)将五层石墨烯转移至银量子点上;
6)在石墨烯上利用热蒸发工艺沉积银电极得到石墨烯/银量子点/氮化镓双向发光二极管。

Claims (6)

1.一种石墨烯/银量子点/氮化镓双向发光二极管,其特征在于,自下而上依次有蓝宝石衬底层或硅衬底层(1)、p型的氮化镓层(2)、银量子点层(4)、石墨烯层(5),在氮化镓层(2)上还设有侧面电极(3),在石墨烯层(5)上设有正面电极(6),所述的氮化镓层为p型多晶材料,厚度为2~10μm。
2.根据权利要求1所述的石墨烯/银量子点/氮化镓双向发光二极管,其特征在于,所述的银量子点的直径为5~100nm。
3.根据权利要求1所述的石墨烯/银量子点/氮化镓双向发光二极管,其特征在于,所述的正面电极为金、钯、银、钛、铬、镍的一种或者几种的复合电极。
4.根据权利要求1所述的石墨烯/银量子点/氮化镓双向发光二极管,其特征在于,所述的侧面电极为镍金电极。
5.根据权利要求1所述的石墨烯/银量子点/氮化镓双向发光二极管,其特征在于,所述的石墨烯的厚度为1-5层。
6.制备如权利要求1-5任一项所述的石墨烯/银量子点/氮化镓双向发光二极管的方法,其特征在于,该方法包括如下步骤:
1)在蓝宝石或硅衬底上用金属化学气相沉积法生长P型氮化镓外延层;
2)在步骤1)所得氮化镓片上用电子束蒸发镀膜方法沉积侧面电极,并预留面积;
3)将步骤2)所得氮化镓片进行表面清洗并干燥表面;
4)将银量子点旋涂至步骤3)处理后的氮化镓片的预留面积处;
5)将石墨烯转移至步骤4)制备的银量子点层上;
6)在石墨烯上制作正面电极。
CN201610914870.9A 2016-10-20 2016-10-20 石墨烯/银量子点/氮化镓双向发光二极管及其制备方法 Pending CN106449913A (zh)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020215441A1 (zh) * 2019-04-25 2020-10-29 东南大学 一种基于N-ZnO/N-GaN/N-ZnO异质结的双向紫外发光二极管及制备方法
CN113614933A (zh) * 2020-03-03 2021-11-05 东莞市中麒光电技术有限公司 发光二极管及其制备方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104409580A (zh) * 2014-11-12 2015-03-11 无锡格菲电子薄膜科技有限公司 一种GaN基LED外延片及其制备方法
CN104868028A (zh) * 2014-02-25 2015-08-26 璨圆光电股份有限公司 发光二极管芯片

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104868028A (zh) * 2014-02-25 2015-08-26 璨圆光电股份有限公司 发光二极管芯片
CN104409580A (zh) * 2014-11-12 2015-03-11 无锡格菲电子薄膜科技有限公司 一种GaN基LED外延片及其制备方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
ZHIQIAN WU ET AL.: ""Surface plasmon enhanced graphene/p-GaN heterostructure light-emitting-diode by Ag nano-particles"", 《NANO ENERGY》 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020215441A1 (zh) * 2019-04-25 2020-10-29 东南大学 一种基于N-ZnO/N-GaN/N-ZnO异质结的双向紫外发光二极管及制备方法
US11575066B2 (en) 2019-04-25 2023-02-07 Southeast University N-ZnO/N-GaN/N-ZnO heterojunction-based bidirectional ultraviolet light-emitting diode and preparation method therefor
CN113614933A (zh) * 2020-03-03 2021-11-05 东莞市中麒光电技术有限公司 发光二极管及其制备方法

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Application publication date: 20170222