CN106435261A - 一种有超细晶组织的长寿命铜锰基合金靶材及其加工方法 - Google Patents
一种有超细晶组织的长寿命铜锰基合金靶材及其加工方法 Download PDFInfo
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- CN106435261A CN106435261A CN201611063443.0A CN201611063443A CN106435261A CN 106435261 A CN106435261 A CN 106435261A CN 201611063443 A CN201611063443 A CN 201611063443A CN 106435261 A CN106435261 A CN 106435261A
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- Prior art keywords
- ultrafine
- manganese
- copper
- powder
- life
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Classifications
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/06—Alloys based on copper with nickel or cobalt as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/0425—Copper-based alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/08—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Forging (AREA)
- Powder Metallurgy (AREA)
Abstract
Description
实施例1 | 实施例2 | 实施例3 | 实施例4 | 实施例5 | 实施例6 | 对比例 | |
补缩情况 | 好 | 好 | 好 | 好 | 好 | 好 | 差 |
平均晶粒尺寸(μm) | 5 | 1 | 2 | 3 | 4 | 2 | 7 |
使用寿命(kwh) | 3000 | 3310 | 3157 | 3240 | 3216 | 3259 | 2670 |
Claims (10)
Priority Applications (1)
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CN201611063443.0A CN106435261B (zh) | 2016-11-28 | 2016-11-28 | 一种有超细晶组织的长寿命铜锰基合金靶材及其加工方法 |
Applications Claiming Priority (1)
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CN201611063443.0A CN106435261B (zh) | 2016-11-28 | 2016-11-28 | 一种有超细晶组织的长寿命铜锰基合金靶材及其加工方法 |
Publications (2)
Publication Number | Publication Date |
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CN106435261A true CN106435261A (zh) | 2017-02-22 |
CN106435261B CN106435261B (zh) | 2018-01-12 |
Family
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CN201611063443.0A Active CN106435261B (zh) | 2016-11-28 | 2016-11-28 | 一种有超细晶组织的长寿命铜锰基合金靶材及其加工方法 |
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CN (1) | CN106435261B (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109338314A (zh) * | 2018-12-04 | 2019-02-15 | 有研亿金新材料有限公司 | 一种超细晶铜锰合金靶材的加工方法 |
US10760156B2 (en) * | 2017-10-13 | 2020-09-01 | Honeywell International Inc. | Copper manganese sputtering target |
US11035036B2 (en) | 2018-02-01 | 2021-06-15 | Honeywell International Inc. | Method of forming copper alloy sputtering targets with refined shape and microstructure |
CN114310159A (zh) * | 2021-12-02 | 2022-04-12 | 上海交通大学 | 一种调控原位自生颗粒增强铝基复合材料轧制织构的方法 |
CN115369365A (zh) * | 2022-10-24 | 2022-11-22 | 有研亿金新材料有限公司 | 一种长寿命溅射靶材及其制备方法 |
Citations (6)
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JP2002294437A (ja) * | 2001-04-02 | 2002-10-09 | Mitsubishi Materials Corp | 銅合金スパッタリングターゲット |
JP2009097085A (ja) * | 2007-09-25 | 2009-05-07 | Hitachi Metals Ltd | 配線膜用Cu合金膜および配線膜形成用スパッタリングターゲット材 |
CN101473059A (zh) * | 2006-10-03 | 2009-07-01 | 日矿金属株式会社 | Cu-Mn合金溅射靶及半导体布线 |
CN103050136A (zh) * | 2011-10-17 | 2013-04-17 | 索尼公司 | 用于光学信息记录媒体的记录层和光学信息记录媒体 |
CN104471102A (zh) * | 2012-08-03 | 2015-03-25 | 株式会社钢臂功科研 | Cu合金薄膜形成用溅射靶及其制造方法 |
WO2016132847A1 (ja) * | 2015-02-19 | 2016-08-25 | 株式会社神戸製鋼所 | Cu合金膜およびCu積層膜 |
-
2016
- 2016-11-28 CN CN201611063443.0A patent/CN106435261B/zh active Active
Patent Citations (6)
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JP2002294437A (ja) * | 2001-04-02 | 2002-10-09 | Mitsubishi Materials Corp | 銅合金スパッタリングターゲット |
CN101473059A (zh) * | 2006-10-03 | 2009-07-01 | 日矿金属株式会社 | Cu-Mn合金溅射靶及半导体布线 |
JP2009097085A (ja) * | 2007-09-25 | 2009-05-07 | Hitachi Metals Ltd | 配線膜用Cu合金膜および配線膜形成用スパッタリングターゲット材 |
CN103050136A (zh) * | 2011-10-17 | 2013-04-17 | 索尼公司 | 用于光学信息记录媒体的记录层和光学信息记录媒体 |
CN104471102A (zh) * | 2012-08-03 | 2015-03-25 | 株式会社钢臂功科研 | Cu合金薄膜形成用溅射靶及其制造方法 |
WO2016132847A1 (ja) * | 2015-02-19 | 2016-08-25 | 株式会社神戸製鋼所 | Cu合金膜およびCu積層膜 |
Non-Patent Citations (1)
Title |
---|
黄春平等: "搅拌摩擦加工研究进展及前景展望", 《稀有金属材料与工程》 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10760156B2 (en) * | 2017-10-13 | 2020-09-01 | Honeywell International Inc. | Copper manganese sputtering target |
US11035036B2 (en) | 2018-02-01 | 2021-06-15 | Honeywell International Inc. | Method of forming copper alloy sputtering targets with refined shape and microstructure |
CN109338314A (zh) * | 2018-12-04 | 2019-02-15 | 有研亿金新材料有限公司 | 一种超细晶铜锰合金靶材的加工方法 |
CN114310159A (zh) * | 2021-12-02 | 2022-04-12 | 上海交通大学 | 一种调控原位自生颗粒增强铝基复合材料轧制织构的方法 |
CN115369365A (zh) * | 2022-10-24 | 2022-11-22 | 有研亿金新材料有限公司 | 一种长寿命溅射靶材及其制备方法 |
WO2024088252A1 (zh) * | 2022-10-24 | 2024-05-02 | 有研亿金新材料有限公司 | 一种长寿命溅射靶材及其制备方法 |
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Inventor after: Jiang Hai Inventor after: Zhao Liang Inventor after: Li Ke Inventor before: Li Fenglang Inventor before: Li Shuxin |
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Effective date of registration: 20171211 Address after: Taoyuan office in Zhuozhou City, Hebei province 071000 Tan Village Road North West of the city of Baoding Applicant after: Hebei macro target Technology Co.,Ltd. Address before: 844000 office building of the administrative committee of the Qilu Industrial Park, South Xinlu Industrial Park, 1 Taishan Road, Shule County, Kashi, the Xinjiang Uygur Autonomous Region Applicant before: Kashi Ninghua Financial Consulting Co.,Ltd. Effective date of registration: 20171211 Address after: 844000 office building of the administrative committee of the Qilu Industrial Park, South Xinlu Industrial Park, 1 Taishan Road, Shule County, Kashi, the Xinjiang Uygur Autonomous Region Applicant after: Kashi Ninghua Financial Consulting Co.,Ltd. Address before: 523000 Guangdong province Dongguan City Songshan Lake high tech Industrial Zone Building 406 industrial development productivity Applicant before: Dongguan Lianzhou Intellectual Property Operation Management Co.,Ltd. |
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