CN106042531A - 一种单面消影导电玻璃及其加工方法 - Google Patents

一种单面消影导电玻璃及其加工方法 Download PDF

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CN106042531A
CN106042531A CN201610583111.9A CN201610583111A CN106042531A CN 106042531 A CN106042531 A CN 106042531A CN 201610583111 A CN201610583111 A CN 201610583111A CN 106042531 A CN106042531 A CN 106042531A
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glass substrate
layer
ito film
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严爱平
余松霖
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DONGGUAN HUI HAI OPTO-ELECTRONIC TECHNOLOGY INDUSTRY Co Ltd
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Abstract

本发明公开了一种单面消影导电玻璃，包括有玻璃基板、锡面、干涉层、透明钝化层及ITO膜，玻璃基板上下表面设置有锡面，玻璃基板上表面的锡面上方设置有干涉层，干涉层上方设置有透明钝化层，透明钝化层上方设置有ITO模，玻璃基板下表面的锡面下方设置有ITO膜；本发明所述的一种单面消影导电玻璃的加工方法，步骤一：对玻璃基板清洗及加热处理，加热温度为40‑60℃；步骤二：对玻璃基板上表面的锡面上溅射上干涉层、透明钝化层及ITO膜；步骤三：对玻璃基板下表面的锡面上溅射上ITO膜；本发明具有结构简单，具有良好的电磁屏蔽、静电防护和消影作用，成本低的优点。

Description

一种单面消影导电玻璃及其加工方法
技术领域
本发明涉及导电玻璃技术领域，尤其涉及一种单面消影导电玻璃及其加工方法。
背景技术
目前，电容屏产品使用非常广泛，而电容屏中的双面镀导电玻璃是其主要器件，双面镀导电玻璃的导电薄膜在性能方面要求比较严，比如均匀性、耐热性能、耐酸碱性能、耐高温高湿性能等；在制作透明电路的时候，由于工艺难度增加，在制作电路时常采用酸刻电路。在制作过程中，容易蚀刻掉不应该刻蚀的部位，并且存在电路蚀刻的蚀痕影迹，影响其电磁屏蔽、静电保护功能，存在的蚀痕影迹会对观看图案产生影响。
发明内容
本发明的目的在于针对现有技术的不足而提供一种单面消影导电玻璃及其加工方法，该单面消影导电玻璃结构简单，具有良好的电磁屏蔽、静电防护和消影作用，成本低。
为达到上述目的，本发明通过以下技术方案来实现。
一种单面消影导电玻璃，包括有玻璃基板、锡面、干涉层、透明钝化层、透明钝化层二及ITO膜，玻璃基板上下表面设置有锡面，玻璃基板上表面的锡面上方设置有干涉层，干涉层上方设置有透明钝化层，透明钝化层上方设置有ITO模，玻璃基板下表面的锡面下方设置有ITO膜。
其中，所述干涉层为二氧化钛。
其中，所述透明钝化层为二氧化硅。
本发明还提供了一种单面消影导电玻璃的加工方法，包括有以下步骤：
步骤一：对玻璃基板清洗及加热处理，加热温度为40-60℃；
步骤二：对玻璃基板上表面的锡面上溅射上干涉层、透明钝化层及ITO膜；
A、对玻璃基板加热，其加热温度为290-310℃，在其上表面的锡面上溅射上干涉层、干涉层上方溅射上透明钝化层；
B、在透明钝化层上方溅射上ITO膜，进行热处理，其加热温度为400-450℃；
步骤三：对玻璃基板下表面的锡面上溅射上ITO膜；
A、对玻璃基板加热，其温度为290-310℃，在其上表面的锡面上溅射上ITO膜，进行热处理，其加热温度为400-450℃。
本发明的有益效果为：本发明所述的一种单面消影导电玻璃，包括有玻璃基板、锡面、干涉层、透明钝化层、透明钝化层二及ITO膜，玻璃基板上下表面设置有锡面，玻璃基板上表面的锡面上方设置有干涉层，干涉层上方设置有透明钝化层，透明钝化层上方设置有ITO模，玻璃基板下表面的锡面下方设置有透明钝化层二，透明钝化层二下方设置有ITO膜；本发明所述的一种单面消影导电玻璃的加工方法，步骤一：对玻璃基板清洗及加热处理，加热温度为40-60℃；步骤二：对玻璃基板上表面的锡面上溅射上干涉层、透明钝化层及ITO膜；步骤三：对玻璃基板下表面的锡面上溅射上ITO膜；本发明具有结构简单，具有良好的电磁屏蔽、静电防护和消影作用，成本低的优点。
附图说明
下面利用附图来对本发明进行进一步的说明，但是附图中的实施例不构成对本发明的任何限制。
图1为本发明的结构示意图。
在图1中包括有：
1——玻璃基板 2——锡面
3——干涉层 4——透明钝化层
5——ITO膜。
具体实施方式
下面结合具体的实施方式来对本发明进行说明。
如图1所示，一种单面消影导电玻璃，包括有玻璃基板1、锡面2、干涉层3、透明钝化层4及ITO膜5，玻璃基板1上下表面设置有锡面2，玻璃基板1上表面的锡面2上方设置有干涉层3，干涉层3上方设置有透明钝化层4，透明钝化层4上方设置有ITO模5，玻璃基板1下表面的锡面2下方设置有ITO膜5。
作为本实施例优选的，所述干涉层3为二氧化钛。
作为本实施例优选的，所述透明钝化层4为二氧化硅。
更进一步的，本实施例优选的，一种单面消影导电玻璃的加工方法，包括有以下步骤：
步骤一：对玻璃基板1清洗及加热处理，加热温度为40-60℃；
步骤二：对玻璃基板1上表面的锡面2上溅射上干涉层3、透明钝化层4及ITO膜5；
A、对玻璃基板1加热，其加热温度为290-310℃，在其上表面的锡面2上溅射上干涉层3、干涉层3上方溅射上透明钝化层4；
B、在透明钝化层4上方溅射上ITO膜5，进行热处理，其加热温度为400-450℃；
步骤三：对玻璃基板1下表面的锡面2上溅射上ITO膜5；
A、对玻璃基板1加热，其温度为290-310℃，在其上表面的锡面2上溅射上ITO膜5，进行热处理，其加热温度为400-450℃。
需更进一步的解释，本发明在生产过程中，先在玻璃基板1上表面的锡面2上镀一层二氧化钛和二氧化硅，然后在二氧化钛和二氧化硅镀上一层ITO膜5，通过控制这二氧化钛和二氧化硅膜层的厚度，经黄光刻蚀后在眼睛看的时候光穿过去发生了干涉与反射使之看起来没有线路，达到消影的目的；再在玻璃基板1下表面的锡面2上镀一层ITO膜5即可，故本发明具有结构简单，具有良好的电磁屏蔽、静电防护和消影作用，成本低的优点。
以上内容仅为本发明的较佳实施例，对于本领域的普通技术人员，依据本发明的思想，在具体实施方式及应用范围上均会有改变之处，本说明书内容不应理解为对本发明的限制。

Claims (4)

1.一种单面消影导电玻璃，其特征在于：包括有玻璃基板（1）、锡面（2）、干涉层（3）、透明钝化层（4）、ITO膜（5），玻璃基板（1）上下表面设置有锡面（2），玻璃基板（1）上表面的锡面（2）上方设置有干涉层（3），干涉层（3）上方设置有透明钝化层（4），透明钝化层（4）上方设置有ITO模（5），玻璃基板（1）下表面的锡面（2）下方设置有设置有ITO膜（5）。
2.根据权利要求1所述的一种单面消影导电玻璃，其特征在于：所述干涉层（3）为二氧化钛。
3.根据权利要求1所述的一种单面消影导电玻璃，其特征在于：所述透明钝化层（4）为二氧化硅。
4.一种单面消影导电玻璃的加工方法，其特征在于，包括有以下步骤：
步骤一：对玻璃基板（1）清洗及加热处理，加热温度为40-60℃；
步骤二：对玻璃基板（1）上表面的锡面（2）上溅射上干涉层（3）、透明钝化层（4）及ITO膜（5）；
A、对玻璃基板（1）加热，其加热温度为290-310℃，在其上表面的锡面（2）上溅射上干涉层（3）、干涉层（3）上方溅射上透明钝化层（4）；
B、在透明钝化层（4）上方溅射上ITO膜（5），进行热处理，其加热温度为400-450℃；
步骤三：对玻璃基板（1）下表面的锡面（2）上溅射上ITO膜（5）；
A、对玻璃基板（1）加热，其温度为290-310℃，在其上表面的锡面（2）上溅射上ITO膜（5），进行热处理，其加热温度为400-450℃。
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108901191A (zh) * 2018-07-17 2018-11-27 京东方科技集团股份有限公司 电磁屏蔽组件及显示装置

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