CN106028615A - Large-area low-temperature plasma generation device - Google Patents

Large-area low-temperature plasma generation device Download PDF

Info

Publication number
CN106028615A
CN106028615A CN201610627592.9A CN201610627592A CN106028615A CN 106028615 A CN106028615 A CN 106028615A CN 201610627592 A CN201610627592 A CN 201610627592A CN 106028615 A CN106028615 A CN 106028615A
Authority
CN
China
Prior art keywords
high pressure
electrode
power supply
temperature plasma
low temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201610627592.9A
Other languages
Chinese (zh)
Other versions
CN106028615B (en
Inventor
方志
张波
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nanjing Jinyou Health Management Co ltd
Original Assignee
Nanjing Tech University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanjing Tech University filed Critical Nanjing Tech University
Priority to CN201610627592.9A priority Critical patent/CN106028615B/en
Publication of CN106028615A publication Critical patent/CN106028615A/en
Application granted granted Critical
Publication of CN106028615B publication Critical patent/CN106028615B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes

Abstract

The invention discloses a large-area low-temperature plasma generation device. The device structurally comprises a control circuit, a high voltage power supply, an impedance matcher, an insulated handle, a high voltage female joint, a high voltage electrode and a to-be-treated object; wherein an output port negative pole of the high voltage power supply is grounded, and an output port positive pole of the high voltage power supply is connected with an input end of the impedance matcher; an output end of the impedance matcher is connected with one end of the high voltage female joint in the insulated handle by a high voltage wire; the other end of the high voltage female joint is connected with the high voltage electrode; the control circuit is arranged between the high voltage power supply and the Mains supply. The large-area low-temperature plasma generation device has the advantages that 1, the whole device structure is compact, the device cost is controllable, the fault rate is low, the working stability is high, and the operation is flexible and safe; 2, different treatment requirements can be met, and large-area plasma treatment is realized; 3 low-temperature plasma can be produced in an indoor open environment.

Description

A kind of large area low temperature plasma generating means
Technical field
The present invention relates to a kind of large area low temperature plasma generating means, belong to technical field of plasma.
Background technology
In discharge of plasma in low temperature space rich in electronics, ion, excited state particle and free radical be all the most active Chemical reactant, these active particles contribute to the chemical reaction realizing being difficult to occur under some normal conditions, the lowest Isothermal plasma has been widely used in sides such as material surface process, pollutant treatment, disinfection and medical science auxiliary treatments Face;But, during on the one hand gas discharge plasma works in strong electric field environment, in order to ensure that the safe operation of device must be joined Close complicated insulation and earthed system;On the other hand, it is limited to the principle of gas discharge and the life-span that spatial activity particle is shorter, Especially working in the low temperature plasma under atmospheric pressure environment, discharging gap is narrower, and the active particle life-span is shorter, the work of device Make the space critical constraints of space and processed material;Therefore, existing plasma producing apparatus mostly is fixed electrode structure, or puts In fixing container cavity, the limited flexibility of device, along with the expansion of low temperature plasma operation strategies, it is necessary to promote The motility of device, promotes that it is in industry and the utilization of scientific research field.
Low temperature plasma can be divided into arc discharge, corona discharge, glow discharge and dielectric impedance to put by mechanism of production Electricity, can be divided into electric field to be operated alone by driving factors and jointly drive two kinds with electric field flow field, how to produce under atmospheric pressure environment Raw large-area low temperature plasma is the direct driving force of various technological improvement.
Produce at present the main three kinds of methods of low temperature plasma the most in large area: first method be two panels metal electrode it Between add block media formed dielectric barrier discharge, the block media surface in capacitive can electric discharge time effectively gather electricity Lotus forms reversed electric field, the growth of suppression discharge current, thus forms large-area filament-like discharges in discharge air-gap space, just As described in patent CN 203015262 U, between discharge air-gap, it is passed through inducing gas can produce the low temperature of even dispersion Plasma, containing substantial amounts of metastable state nitrogen molecular, hydroxy and oxygen atom in the plasma of generation, can be used to carry out thing Material surface modification and disinfection, but fixing electrode structure and narrow discharge space treat the dimensional requirement of processed material Higher, the suitability is not strong and motility is the highest.Second method uses the method for compound electrode, can carry out according to different demands Combination and produce different area and difform low temperature plasma, as described in patent CN 102307425 A , adding the sparking electrode of varying number according to different demands so that discharge channel increases, discharge power and transmission electric charge are also Correspondingly improving, compared to first kind of way, the motility of combined electrode has promoted, but because of putting that discharge mechanism is brought Electricity narrow space problem does not still have been resolved, it is impossible to the material surface being applied to complex three-dimensional object processes.The third side In method, the flow field of air-flow is utilized to take the plasma that high voltage electric field produces out of discharge range, it is achieved operation interval and electric discharge sky Between separation, formed atmosphere pressure plasma jet flow;As described in patent CN 103945627 A, due to single jet Area is less, has research worker by many jet parallel connection superpositions, is combined into plasma jet array, improves discharge power and biography Transmission of electricity lotus, increases the processing area of plasma, it is often more important that plasma jet array is when processing complex three-dimensional object In hgher efficiency, motility is higher, but due to each jet units block media parameter, air flow method and Electric Field Distribution without Method keeps consistent, it is difficult to realize the uniform low temperature plasma of large area.
Summary of the invention
What the present invention proposed is a kind of large area low temperature plasma generating means, and its purpose aims to provide one can be Indoor open environment produces the generating means of the large area low temperature plasma adapting to pending thing.
The technical solution of the present invention: a kind of large area low temperature plasma generating means, its structure includes controlling electricity Road, high voltage power supply 1, impedance matching box 2, insulated handle 3, high pressure female joint 4, high-field electrode, pending thing 11;Wherein, high pressure The delivery outlet negative pole 1-a ground connection of power supply 1, the delivery outlet positive pole 1-b of high voltage power supply 1 and the input 2-a phase of impedance matching box 2 Even;The outfan 2-b of impedance matching box 2 is by one end phase of high-voltage conducting wires 3-a with the high pressure female joint 4 within insulated handle 3 Even;The other end of high pressure female joint 4 is connected with high-field electrode;It is connected to control circuit between high voltage power supply 1 and civil power;At high-tension electricity Produce low temperature plasma between pole and the pending thing 11 of ground connection and directly act on surface or the electrode of pending thing 11 And the object between pending thing 11.
Advantages of the present invention:
1, electrode and handle coordinate the motility enhancing device, facilitate operator to carry out hand-held process.
2, devise different high-field electrode structure, select different electrode structures can be flexibly met not according to practical situation Same process demand, it is achieved large-area Cement Composite Treated by Plasma;
3, regulation impedance matching box 2 within sequential circuit is capable of discharge power and the regulation of transmission electric charge, it is possible to according to Different processes material and processes the intensity requiring to change electric discharge.
4, multiple process situation can be tackled flexibly, process complicated metal surface material, electronic equipment screen and packaging The thin-film material of use, the material of SI semi-insulation gasket shape, can also process human body surface, at biology simultaneously safely Surface realizes disinfection and hemostasis blood coagulation.
5, design unified high-voltage electrical apparatus interface, and by electrode interface as handle inner, can facilitate Different electrodes it Between replacing, the safety of operator and the safety of device when can ensure that again work.
6, can directly produce close to room temperature low temperature plasma in indoor open environment, working gas can be empty Gas, need not be additionally provided working gas, it is possible to use rare gas, gaseous compound or their mixed gas are as work The inducing gas made or auxiliary gas, and then the demand of various production technology can be met.
7, single unit system compact conformation, it is not necessary to complicated excitation and control loop, installation cost is controlled, and fault rate is relatively low, Job stability is high.
Accompanying drawing explanation
Accompanying drawing 1 is a kind of large area low temperature plasma generating means function logic structural representation.
Accompanying drawing 2 is equipped with the large area low temperature plasma generating means structural representation of A class high-field electrode.
Accompanying drawing 3 is insulated handle structural representation.
Accompanying drawing 4 is high-field electrode A structural representation.
Accompanying drawing 5 is high-field electrode B structure schematic diagram.
Accompanying drawing 6 is high-field electrode C-structure schematic diagram.
Accompanying drawing 7 is control circuit structural representation.
In accompanying drawing 1 be high voltage power supply, 2 be impedance matching box, 1-a be high voltage power supply negative pole of output end, 1-b be high voltage power supply Output head anode, 2-a be the input of impedance matching box, 2-b be the outfan of impedance matching box, 2-c be controllable impedance regulation Knob, 2-d be tunable capacitor adjusting knob, 2-e be have a grade adjusting knob, 3 be that insulated handle, 3-a are high-voltage conducting wires, 4 are high Pressure female joint, 5 be high pressure male joint, 6 be A connection strap insulating coating, 7 be high voltage electrode insulation overcoat, 8 be high voltage electrode insulation Epoxy glue, 9 be high-field electrode block media, 10 be high pressure copper electrode, 11 be pending thing, 12 be copper gear rack, 13 be B connection strap Insulating coating, 14 be plugged zone, 15 be insulated dielectric tube, 16 be high pressure copper electrode, 17 be copper gear rack, 18 be C connection strap insulation Overcoat, 19 be Y type support, 20 be block media pipe, 21 be high pressure copper electrode, 22 be rectification module, 24 be contact switch, 23 be Guan Bi switch, 25 be A DC relay, 26 be B DC relay, 27 be total power switch, 28 be high-voltage conducting wires, 29 be support Groove milling.
Detailed description of the invention
Comparison accompanying drawing, a kind of large area low temperature plasma generating means, its structure include control circuit, high voltage power supply 1, Impedance matching box 2, insulated handle 3, high pressure female joint 4, high-field electrode, pending thing 11;Wherein, the delivery outlet of high voltage power supply 1 Negative pole 1-a ground connection, the delivery outlet positive pole 1-b of high voltage power supply 1 is connected with the input 2-a of impedance matching box 2;Impedance matching box 2 Outfan 2-b be connected with one end of the high pressure female joint 4 within insulated handle 3 by high-voltage conducting wires 3-a;High pressure female joint 4 The other end be connected with high-field electrode;It is connected to control circuit between high voltage power supply 1 and civil power;High-field electrode and ground connection wait locate Produce between reason thing 11 low temperature plasma and directly act on the surface of pending thing 11 or electrode and pending thing 11 it Between object;
Described control circuit includes that rectification module 22, contact switch 24, Guan Bi switch 23, A DC relay 25, B direct current continue Electrical equipment 26, total power switch 27;Wherein, total power switch 27 is connected on live wire;Latter one of total power switch 27 Guan Bi energising Dividing electric energy to be sent to rectifier power supply module, be changed into 12V direct voltage output, two loops of 12V direct voltage output, one is returned Road route Guan Bi switch 23 and A DC relay 25 tandem compounds form, and another circuit branch is continued by contact switch 24 and B direct current Electrical equipment 26 tandem compound forms, and two branch road co-controllings the break-make of high voltage power supply 1;Another part electric energy is through two series connection It is sent to high voltage power supply 1 after A DC relay 25 and B DC relay 26;
During use, first Guan Bi total power switch 27, is closed again switch 23, is then manually pressed by contact switch 24, now high-tension electricity Source 1 is energized, and adjusts impedance matching box 2 and produces low temperature plasma between high-field electrode and pending thing 11;Use this control Circuit can improve the work efficiency of high voltage power supply 1, it is to avoid the long no-load running of power supply, and can promptly enter operation shape State, in running, presses contact switch 24, high voltage power supply 1 power-off immediately, need not disconnect in the stopping process of short time Other switch, when device needs again to devote oneself to work, presses the contact switch 24 on lower handle again, obtains electric high voltage power supply 1 and stands I.e. devote oneself to work;Meanwhile, at the three of control circuit, switch is arranged in concatenating logic mode, when total power switch 27, Guan Bi switch 23, when contact switch 24 is closed at, high voltage power supply just works, and once device occurs unexpected, as long as disconnecting any one place switch Can cutoff high power supply.
Described impedance matching box 2 includes resistance, electric capacity and inductance element;Concatenate resistive resistance value at 0 M Ω-1M Ω, the resistance point choosing 10k Ω, 20k Ω, 50k Ω, 100k Ω and 500k Ω carries out impedance configuration;When working in different conditions, Impedance matching box 2 equivalence becomes different capacitive loads, and high voltage power supply 1 is to impedance matching box 2 active power of output and capacitive reactive power Power;Wherein, tunable capacitor range of accommodation 3pF ~ 50pF, controllable impedance range of accommodation 0.6uH ~ 3uH, at impedance matching box 2 Top has a 2-e to have grade adjusting knob for realizing the switching between different resistance value, the controllable impedance adjusting knob of side 2-c is used for regulating controllable impedance numerical values recited, and tunable capacitor adjusting knob 2-d is used for regulating adjustable electric capacitance size.
High-frequency and high-voltage waveform or high voltage pulse waveform is produced to impedance matching box 2 after described high voltage power supply 1 energising;Impedance Adapter 2 output voltage terminal is connected with high-field electrode, forms a High Pressure Difference relative to ground connection zero potential;It is in high-voltage potential Produce large area low temperature plasma between high-field electrode and the pending thing 11 of amplitude, directly act on pending thing surface.
Described insulated handle 3 includes handle casing, high pressure female joint 4 and high-voltage conducting wires 3-a;Its mesohigh female joint 4 Being fixed on handle casing 3 internal, high pressure female joint 4 head is away from insulated handle 3 exit 10mm-20mm, the tail of high pressure female joint 4 Portion is connected through the outfan of high-voltage conducting wires 3-a with impedance matching box 2, the head tapping 6mm-8mm of high pressure female joint 4, described Handle casing uses politef or Polyetherimide plastic processing to form, and handle casing thickness is 5mm-7mm.
Described high-field electrode is high-field electrode A, one in high-field electrode B, high-field electrode C.
Described high-field electrode A includes high pressure male joint 5, A connection strap insulating coating 6, high voltage electrode insulation overcoat 7, height Piezoelectricity pole insulating epoxy glue 8, high-field electrode block media 9, high pressure copper electrode 10;Wherein, insulating coating 7 wraps up high pressure copper electrode 10, A connection strap insulating coatings 6 wrap up high pressure male joint 5;High voltage electrode insulation epoxy glue 8 connects A connection strap insulating coating 6 He High pressure male joint 5, and it is fixed on the rear end of high pressure copper electrode 10, prevent electric arc from leaking electricity;The fixing height of the leading portion of high pressure copper electrode 10 Piezoelectricity pole block media 9;Described high voltage electrode insulation overcoat 7 material is politef or Polyetherimide, internal diameter 20mm- 23mm, external diameter 31mm to 36mm;Described high pressure copper electrode 10 outside dimension 20mm-23mm;Described high-field electrode block media 9 is Quartz glass plate, its thickness is 0.5mm-1.5mm, a diameter of 34mm;Described high pressure male joint 5 is copper gear rack, and it is a length of 20mm-25mm;A connection strap insulating coating 6 is wrapped in the middle of high pressure male joint 5, A connection strap insulating coating 6 a length of 15mm-18mm, A connection strap insulating coating 6 material is silicone rubber;
During use, by the inside of high-field electrode precession insulated handle 3, one end of high pressure male joint 5 is connected with high pressure copper electrode 10, The other end and the high pressure female joint 4 of high pressure male joint 5 are threaded connection, at high-field electrode block media 9 and pending thing 11 Between produce large area low temperature plasma, high-field electrode A produces 800mm2-1000mm2Low temperature plasma.
Described high-field electrode B includes copper gear rack 12, B connection strap insulating coating 13, insulated dielectric tube 15, high pressure copper electrode 16;Wherein, high pressure copper electrode 16 is fitted with insulated dielectric tube 15 inwall, and B connection strap insulating coating 13 wraps up copper gear rack 12 and reveals Copper gear rack 12 two ends, copper gear rack 12 connects high pressure copper electrode 16 afterbody;
During assembling, high pressure copper electrode 16 is filled in the bottom of insulated dielectric tube 15 so that high pressure copper electrode 16 and insulated dielectric tube 15 inwalls laminatings, and smear one layer of conductive glue between and drain the sky between high pressure copper electrode 16 and insulated dielectric tube 15 Gas, high pressure copper electrode 15 tail end face middle is attacked the nut of one diameter 6mm-8mm, be will be covered with connection strap insulating coating 13 Copper gear rack 12 be screwed into high pressure copper electrode 16 afterbody, and block with high-field electrode epoxy resin glue, form firm envelope Blocking layer 14, inserts the high-field electrode B assembled in the high pressure female joint 4 of insulated handle 3;During work, high-field electrode B produces 200mm2-400mm2Low temperature plasma;
Described insulated dielectric tube 15 material is earthenware, and earthenware thickness is 5mm-7mm;High pressure copper electrode 16 external diameter is 7mm- 8mm, in the shape of radian as insulated dielectric tube 15 bottom high pressure copper electrode 16.
Described high-field electrode C includes copper gear rack 17, C connection strap insulating coating 18, Y type support 19, block media pipe 20, height Pressure copper electrode 21, support groove milling 29, high-voltage conducting wires 28;Wherein, high pressure copper electrode 21 in block media pipe 20, Y type support 19 It is divided into upper and lower two parts, upper and lower two binding faces have support groove milling 29, high pressure copper electrode 21 and block media pipe 20 Two ends are connected with the top and the bottom of Y type support 19;High-voltage conducting wires 28 is arranged in support groove milling 29, high-voltage conducting wires 28 one end and copper Gear rack 17 connects, and the other end is connected with high pressure copper electrode 21;C connection strap insulating coating 18 wraps up copper gear rack 17 and exposes copper gear rack 17 two ends;
Described block media pipe 20 is the earthenware of a both ends open, and the pipe thickness of block media pipe 20 is 4mm, internal diameter 9mm-10mm, external diameter 17mm-18mm, long 16cm-18cm;A diameter of 7mm-9mm of high-field electrode 21, length 16cm-18cm;Institute Stating Y type support 19, material is politef or nylon;
During assembling, high pressure copper electrode 21 is put into block media pipe 20 internal, and be situated between in the outside of high pressure copper electrode 21 and stop The inner side of matter pipe 20 is smeared side conductive glue and is seen the air of residual with extrusion gap, installs high pressure on lower part Y type support Copper electrode 21 and block media pipe 20, and high-voltage conducting wires 28 of arranging in groove milling, then by high-voltage conducting wires 28 along support groove milling 29 rear ends being connected to Y type support 19, are connected with copper gear rack 17 and connection strap insulating coating 18, are finally closed by upper part Y type support On fix;During work, high-field electrode C produces 3500mm2-4000mm2The low temperature plasma of area.
A kind of large area low temperature plasma generating means the most according to claim 1, is characterized in that described low The temperature of isothermal plasma is 20C-50Between C.
Described low temperature plasma refers to that electron temperature is much larger than the non-equilibrium plasma of wherein heavy particle temperature, in room The low-temperature plasma temperature produced in interior open environment is 20C-50Between C.
The single unit system coordinating high-field electrode A can apply to the thin film deposition of certain area, the sterilization of large area yarn fabric Sterilization and the surface modification of small size insulating sheet material, can also to realize the plasma of organism surface direct for this device in addition Processing (now organism is as the pending thing 11 of ground connection), therefore, this device may be used for the process of human body epidermis tissue, outward Add high pressure by adjustable impedance matching box 2, the coupling gap of high-field electrode A and human body surface produces low-temperature plasma Body, comprises substantial amounts of excited state particle (such as the nitrogen molecular of excited state), active group (such as hydroxyl, oxygen atom) in plasma (human body will be as ground connection here can to directly act on human body surface with other active substance (including ozone, electronics, ultraviolet) Pending thing 11), be 800mm owing to high-field electrode A can produce plasma area2-1000mm2, it is suitable for the back of the hand dough-making powder Bu Saibangdeng epidermal tissue carries out effective sterilizing and cleaning processes.
The region of discharge higher pressure electrode A of high-field electrode B is little, and heating region area is 200mm2-400mm2, can essence Carefully process the complex biological surface of shape and the material surface of abnormity, can further be applied to biological tissue's wound The fixed point cleaning of sterilizing, hemostasis blood coagulation and biological epidermis, as interdigital space of hand and these in irregular shape, working places hard of hearing Less region all can use this electrode.
The plasma area that high-field electrode C produces is at 3500mm2-4000mm2Between, the most portable owing to being equipped with Handle, can apply to large-area thin film and processes (such as greenhouse film), large-area Surface Modification of Insulating Material (such as transformator The surface modification of built-in electrical insulation sheet material) and sterilizing (abdominal part, calf and the arm such as human body of large-area biological surface tissue Wing etc.).
Insulated handle 3 and the combination of different high-field electrodes had both facilitated the hand-held sweetly disposition of user of service, again can be square Just it is mechanically fixed, simultaneously by preferable for buried for high pressure female joint 4 insulating properties in the application process of experiment and engineering Handle casing 3 can improve the electrical security that device is overall, prevent exposed high-field electrode from leaking electricity.
Below in conjunction with embodiment, the invention will be further described.
Embodiment 1
High-field electrode A includes high pressure male joint 5, connection strap insulating coating 6, high voltage electrode insulation overcoat 7, high voltage electrode insulation ring Oxygen glue 8, high-field electrode block media 9, high pressure copper electrode 10;Wherein, high pressure copper electrode 10 is wrapped up by insulating coating 7, connection strap High pressure male joint 5 is wrapped up by insulating coating 6, with high voltage electrode insulation epoxy glue 8 by connection strap insulating coating 6 and high pressure male joint 5 rear ends being fixed on high pressure copper electrode 10, prevent electric arc from leaking electricity;The leading portion of high pressure copper electrode 10 is fixed with high-field electrode and stops Jie Matter 9;Described high voltage electrode insulation overcoat 7 material is politef or Polyetherimide, internal diameter 22mm, external diameter 36mm;Described High pressure copper electrode 10 outside dimension 22mm;Described high-field electrode block media 9 be thickness be the quartz glass of 0.5mm to 1.5mm Sheet;Described high pressure male joint 5 is the copper gear rack of a segment length 25mm;In the middle of high pressure male joint 5, the connection strap insulating coating 6 of parcel is long Degree is 15mm, and connection strap insulating coating 6 material is silicone rubber, adsorbs the outside in high pressure male joint 5 tightly, and copper is exposed at two ends Gear rack is used for fixing;
Insulated handle 3 includes handle casing and high pressure female joint 4;Described handle casing uses politef or Polyetherimide Plastic processing forms, and for ensureing the electrical security of device, handle casing thickness is 5mm to 7mm;High pressure female joint 4 is fixed on Handle casing 3 is internal, and high pressure female joint 4 head is led through high pressure away from insulated handle 3 exit 14mm, the afterbody of high pressure female joint 4 Line 3-a is connected with the outfan 2-b of impedance matching box 2, the head tapping 8mm of high pressure female joint 4.
Impedance matching box 2 includes resistance, electric capacity and inductance element;Impedance matching box becomes resistance sense or capacitance-resistance, concatenates resistive Lowest impedance be 0(metal connect), the Ω of high impedance 1M, between 0 to 1M Ω, choose 10k Ω, 20k Ω, 50k Ω, 100k The resistance point of Ω and 500k Ω carries out impedance configuration;Working in the reactor under different conditions equivalence can become different capacitives to bear Carrying, high voltage power supply needs to reactor active power of output and capacitive reactive power simultaneously, internal by regulation impedance matching box 2 Tunable capacitor and controllable impedance, thus it is possible to vary the electrical characteristic of load reactor, so improve power supply efficiency and use the longevity Life;Wherein tunable capacitor range of accommodation 3pF ~ 50pF, controllable impedance range of accommodation 0.6uH ~ 3uH.Top at impedance matching box 2 Having one to have grade adjusting knob 2-e can realize the switching between different resistance value, the adjusting knob 2-c of side can regulate can Adjusting inductance value size, adjusting knob 2-d can regulate adjustable electric capacitance size.
Control circuit includes rectification module 22, contact switch 24, Guan Bi switch 23, A DC relay 25, B direct current relay Device 26, total power switch 27;Before connecting civil power, live wire concatenates a total power switch 27;Total power switch 27 Guan Bi energising Rear portion electric energy is sent to rectifier power supply module, is changed into 12V direct voltage output, two controls of supply of 12V DC voltage Loop, a loop is formed by closing switch 23 and A DC relay 25 tandem compounds, and another loop is by contact switch 24 He B DC relay 26 tandem compound forms, and two branch road co-controllings the break-make of high voltage power supply 1;Another part electric energy is through two It is sent to high voltage power supply 1 after A the DC relay 25 and B DC relay 26 of individual series connection;During use, first close total power switch 27, it is closed again switch 23, the most manually pins contact switch 24 and do not put, now high voltage power supply 1 is energized, and adjusts impedance matching box 2 Low temperature plasma is produced between high-field electrode and pending thing 11;Use this control circuit can improve high voltage power supply greatly The work efficiency of 1, it is to avoid the long no-load running of power supply, and can promptly enter running status, in running, As long as finger unclamps contact switch 24, high voltage power supply 1 power-off immediately, the stopping process of short time need not disconnect other and open Close, when device needs again to devote oneself to work, it is only necessary to fix electrode position, be manually pressed by the contact switch on handle at this 24, again electric high voltage power supply 1 can be devoted oneself to work immediately, meanwhile, at the three of control circuit switch in concatenating logic mode Arranging, only when total power switch 27, Guan Bi switch 23, contact switch 24 are closed at, high voltage power supply could work, once Device occurs unexpected, as long as disconnecting any one place switch to get final product cutoff high power supply, therefore, applies this control circuit to improve The safety that device is overall.
In installation process, high pressure copper electrode 10 is rectified clamp-oning from the rear of insulating coating 7, falling until high-field electrode 10 Angle leading portion flushes with the leading portion of insulating coating 7, is inserted in high pressure male joint 5 by connection strap insulating coating 6 simultaneously, it is ensured that high pressure is public 5mm is respectively exposed at joint 5 two ends, by a rear end being fixed on high pressure copper electrode 10 of high pressure male joint 5, and uses high-tension electricity polar ring The rear end of epoxy resins glue 8 blocking high-pressure copper electrode 10, the high-field electrode epoxide-resin glue 8 simultaneously solidified may also operate as fixing height The effect of pressure male joint 5.One layer of 0.5mm thickness is smeared at high pressure copper electrode 10 leading portion chamfering and in the space of insulating coating 7 High-field electrode epoxide-resin glue 8, covers high-field electrode block media 9 above high-field electrode epoxide-resin glue 8, waits resin The condensation of glue 8;Subsequently by the inside of high-field electrode A precession insulated handle 3, one end of high pressure male joint 5 and high pressure copper electrode 10 Connecting, the other end and the high pressure female joint 4 of high pressure male joint 5 are threaded connection, Guan Bi total power switch 27 and switch 23, Guan Bi contact switch 24, regulation high voltage power supply 1 voltage to about 5kV, the impedance of regulation impedance matching box 2 has level to regulate button 2- E to 0 Ω shelves, the leading portion of high-field electrode A just treated processed material 11 by hand-held handle, and high-tension electricity potential energy is transferred to high pressure copper electrode 10 Place, produces large-area low temperature plasma between high-field electrode block media 9 and pending thing 11, regulates impedance matching box Adjusting knob 2-c and 2-e of 2 sides can regulate the intensity of electric discharge within the specific limits, improves the work efficiency of power supply.
Discharge process and plasma occurring principle illustrate and application: on the high pressure copper electrode 10 within high-field electrode A When applying high pressure, meeting generation highfield near high pressure copper electrode 10, high pressure copper electrode insulating coating 7 has higher Jie Electric intensity and specific insulation, can effectively reduce the wall electric field around insulating coating, and meanwhile, high pressure copper electrode 10 leading portion is relatively thin High-field electrode block media 9 can effectively pass through highfield, when the leading portion of high-field electrode A and is compared with the pending thing of low potential 11 just pair time, produce high voltage electric field in the region between leading portion and the pending thing 11 of high-field electrode block media 9, improve and apply Magnitude of voltage on high pressure copper electrode 10 can be effectively improved the electric field intensity in space, and electric field intensity is the highest, because of in this gap Electronics accelerates to obtain more kinetic energy in the electric field, and when electric field intensity is higher than certain value, electronic kinetic energy reaches certain threshold value, touches Hitting so that around heavy particle ionizes, form electron avalanche, electron avalanche develops rapidly into through whole discharge channel multiple abscess, high The high-field electrode block media 9 covered on pressure copper electrode 10 can limit the growth of discharge current, it is to avoid the generation of electric arc, helps In forming large-area plasma discharge, the advantage of this device is to produce large-area low temperature in the environment of air Plasma, the plasma area once produced is 800mm2To 1000mm2, temperature is about 20 DEG C to 50 DEG C, is equipped with handle, The conductive object of complicated shape and material that part relatively thin can be setup flexibly.
This high-field electrode A directly and during conductive metal effect, can produce large-area comprising the most efficiently Active substance high-temperature plasma, may be used for disinfecting of armarium and instrument in biologic medical field, such as performs the operation Cutter, operating scissors etc..There is operating flexibility and the high-field electrode A of electric discharge high efficiency, it is also possible to for killing of field of food food Bacterium is sterilized, and when processing the food containing certain moisture, high-field electrode A produces when can carry out charge-exchange with foodstuff surface and lives Property group (such as hydroxyl and oxygen atom) and active substance (such as ultraviolet and ozone), it is possible to do not producing any residuals Carry out effective SC inactivation under premise, improve the holding time of food.
Embodiment 2
High-field electrode B includes copper gear rack 12, connection strap insulating coating 13, plugged zone 14, insulated dielectric tube 15, high pressure copper electrode 16;Wherein, insulated dielectric tube 15 material is earthenware, and earthenware thickness is 5mm to 7mm;High pressure copper electrode 16 external diameter be 7mm extremely 8mm, in the shape of radian as insulated dielectric tube 15 bottom high pressure copper electrode 16;During assembling, high pressure copper electrode 16 is filled in The bottom of insulated dielectric tube 15 so that high pressure copper electrode 16 is fitted with insulated dielectric tube 15 inwall, and smears one between Layer conductive glue drains the air between high pressure copper electrode 16 and insulated dielectric tube 15, high pressure copper electrode 15 tail end face middle Attacking the nut of one diameter 6mm to 8mm, the copper gear rack 12 that will be covered with connection strap insulating coating 13 is screwed into high pressure copper electrode 15 tail Portion, and block with high-field electrode epoxy resin glue, form firm plugged zone 14, the high-field electrode B assembled is inserted Enter in the high pressure female joint 4 of insulated handle 3, can normally work.Use high-field electrode B can produce 200mm in theory2Extremely 400mm2Large area low temperature plasma.
Insulated handle 3 includes handle casing and high pressure female joint 4;Described handle casing uses politef or polyethers acyl Imines plastic processing forms, and for ensureing the electrical security of device, handle casing thickness is 5mm to 7mm;High pressure female joint 4 is solid Internal due to handle casing 3, high pressure female joint 4 head is away from insulated handle 3 exit 14mm, and the afterbody of high pressure female joint 4 is through height Pressure wire 3-a is connected with the outfan 2-b of impedance matching box 2, the head tapping 8mm of high pressure female joint 4.
Impedance matching box 2 includes resistance, electric capacity and inductance element;Impedance matching box becomes resistance sense or capacitance-resistance, concatenates resistive Lowest impedance be 0(metal connect), the Ω of high impedance 1M, between 0 to 1M Ω, choose 10k Ω, 20k Ω, 50k Ω, 100k The resistance point of Ω and 500k Ω carries out impedance configuration;Working in the reactor under different conditions equivalence can become different capacitives to bear Carrying, high voltage power supply needs to reactor active power of output and capacitive reactive power simultaneously, internal by regulation impedance matching box 2 Tunable capacitor and controllable impedance, thus it is possible to vary the electrical characteristic of load reactor, so improve power supply efficiency and use the longevity Life;Wherein tunable capacitor range of accommodation 3pF ~ 50pF, controllable impedance range of accommodation 0.6uH ~ 3uH.Top at impedance matching box 2 Having one to have grade adjusting knob 2-e can realize the switching between different resistance value, the adjusting knob 2-c of side can regulate can Adjusting inductance value size, adjusting knob 2-d can regulate adjustable electric capacitance size.
Control circuit includes rectification module 22, contact switch 24, Guan Bi switch 23, A DC relay 25, B direct current relay Device 26, total power switch 27;Before connecting civil power, live wire concatenates a total power switch 27;Total power switch 27 Guan Bi energising Rear portion electric energy is sent to rectifier power supply module, is changed into 12V direct voltage output, two controls of supply of 12V DC voltage Loop, a loop is formed by closing switch 23 and A DC relay 25 tandem compounds, and another loop is by contact switch 24 He B DC relay 26 tandem compound forms, and two branch road co-controllings the break-make of high voltage power supply 1;Another part electric energy is through two It is sent to high voltage power supply 1 after A the DC relay 25 and B DC relay 26 of individual series connection;During use, first close total power switch 27, it is closed again switch 23, the most manually pins contact switch 24 and do not put, now high voltage power supply 1 is energized, and adjusts impedance matching box 2 Low temperature plasma is produced between high-field electrode and pending thing 11;Use this control circuit can improve high voltage power supply greatly The work efficiency of 1, it is to avoid the long no-load running of power supply, and can promptly enter running status, in running, As long as finger unclamps contact switch 24, high voltage power supply 1 power-off immediately, the stopping process of short time need not disconnect other and open Close, when device needs again to devote oneself to work, it is only necessary to fix electrode position, be manually pressed by the contact switch on handle at this 24, again electric high voltage power supply 1 can be devoted oneself to work immediately.Meanwhile, switch in concatenating logic mode at the three of control circuit Arranging, only when total power switch 27, Guan Bi switch 23, contact switch 24 are closed at, high voltage power supply could work, once Device occurs unexpected, as long as disconnecting any one place switch to get final product cutoff high power supply, therefore, applies this control circuit to improve The safety that device is overall.
During use, first high-field electrode B is screwed in the high pressure female joint of handle 3, Guan Bi total power switch 27 and switch 23, Guan Bi contact switch 24, regulation high voltage power supply 1 voltage to about 5kV, the impedance of regulation impedance matching box 2 has level to regulate button 2- E to 500k Ω shelves, the leading portion of high-field electrode B just treated processed material 11 by hand-held handle, and high-tension electricity potential energy is transferred to high pressure copper electricity At pole 16, between the insulated dielectric tube 15 and pending thing 11 of high-field electrode B, produce large-area low temperature plasma, regulation Adjusting knob 2-c and 2-e of impedance matching box 2 side can regulate the intensity of electric discharge within the specific limits, improves the work of power supply Make efficiency.In theory, the plasma area of generation is at 200mm2To 400mm2Between, temperature is about 20C to 50C。
Discharge process and plasma occurring principle illustrate and application: on the high pressure copper electrode 16 within high-field electrode B When applying high pressure, meeting generation highfield near high pressure copper electrode B.High pressure copper electrode 16 is outside has high dielectric constant High-field electrode block media 15 can pass through highfield effectively, when the leading portion of high-field electrode B and one are in treating of low potential Processed material 11 just pair time, produce high voltage electric field in the region between leading portion and the pending thing 11 of high-field electrode block media 15, Raising puts on the magnitude of voltage on high pressure copper electrode 16 and can be effectively improved the electric field intensity in space, and electric field intensity is the highest, therefore Electronics in gap accelerates to obtain more kinetic energy in the electric field.When electric field intensity is higher than certain value, electronic kinetic energy reaches one Determining threshold value, collision makes heavy particle around ionize, and forms electron avalanche, and electron avalanche develops rapidly into and leads to through whole electric discharge Road multiple abscess.The high-field electrode block media 15 covered on high pressure copper electrode 16 can limit the growth of discharge current, it is to avoid electric arc Generation, contribute to forming large-area plasma discharge, the advantage of this device be can produce in the environment of air big The low temperature plasma of area, the plasma area once produced is 200mm2To 400mm2,, temperature is about 20C to 50C。 It is equipped with handle, the conductive object of complicated shape and material that part relatively thin can be setup flexibly, if additionally, by pending thing When changing the organism containing bigger dielectric constant into, (containing more moisture in organism, the dielectric constant of water is 81, and body fluid In containing substantial amounts of electrolyte), when discharge power is relatively low, can directly process human body surface.
Plasma temperature and particle activity that this high-field electrode B produces are moderate, react soft, and particle content is moderate;Suitable For the non-stimulated process soft for human body of plasma medical science and treatment, such as skin depth cleaning, speckle removing, acne removing, whitening Skin care etc..
Embodiment 3
High-field electrode C includes copper gear rack 17, connection strap insulating coating 18, Y type support 19, block media pipe 20, high pressure copper electrode 21, support groove milling 29 and high-voltage conducting wires 28;Wherein, high pressure copper electrode 21 is contained in block media pipe 20, and block media pipe 20 is The earthenware of one both ends open, the pipe thickness of block media pipe 20 is 4mm, and internal diameter 9mm to 10mm, external diameter 17mm is extremely 18mm, long 16cm to 18cm;A diameter of 7mm to 9mm of high-field electrode 21, length 16cm to 18cm;High pressure copper electrode 21 is put Enter block media pipe 20 internal, and smear side conductive glue in the inner side in the outside of high pressure copper electrode 21 and block media pipe 20 The air of residual is seen with extrusion gap;Described Y type support 19, material is politef or nylon, and Y type support 19 is divided into Lower two parts, have groove milling 29 on upper and lower two binding faces;During assembling, high pressure copper electricity is first installed on lower part Y type support Pole 21 and block media pipe 20, and high-voltage conducting wires 28 of arranging in groove milling, be then connected to Y type by high-voltage conducting wires 28 along groove milling and prop up The rear end of frame 19, is connected with copper gear rack 17 and connection strap insulating coating 18, is finally closed by upper part Y type support and fixes.If When using the high voltage power supply that high-field electrode C coordinates enough power, it is possible to produce 3500mm2To 4000mm2Large area low temperature etc. from Daughter.
Insulated handle 3 includes handle casing and high pressure female joint 4;Described handle casing uses politef or polyethers acyl Imines plastic processing forms, and for ensureing the electrical security of device, handle casing thickness is 5mm to 7mm;High pressure female joint 4 is solid Internal due to handle casing 3, high pressure female joint 4 head is away from insulated handle 3 exit 14mm, and the afterbody of high pressure female joint 4 is through height Pressure wire 3-a is connected with the outfan 2-b of impedance matching box 2, the head tapping 8mm of high pressure female joint 4.
Impedance matching box 2 includes resistance, electric capacity and inductance element;Impedance matching box becomes resistance sense or capacitance-resistance, concatenates resistive Lowest impedance be 0(metal connect), the Ω of high impedance 1M, between 0 to 1M Ω, choose 10k Ω, 20k Ω, 50k Ω, 100k The resistance point of Ω and 500k Ω carries out impedance configuration;Working in the reactor under different conditions equivalence can become different capacitives to bear Carrying, high voltage power supply needs to reactor active power of output and capacitive reactive power simultaneously, internal by regulation impedance matching box 2 Tunable capacitor and controllable impedance, thus it is possible to vary the electrical characteristic of load reactor, so improve power supply efficiency and use the longevity Life;Wherein tunable capacitor range of accommodation 3pF ~ 50pF, controllable impedance range of accommodation 0.6uH ~ 3uH.Top at impedance matching box 2 Having one to have grade adjusting knob 2-e can realize the switching between different resistance value, the adjusting knob 2-c of side can regulate can Adjusting inductance value size, adjusting knob 2-d can regulate adjustable electric capacitance size.
Control circuit includes rectification module 22, contact switch 24, Guan Bi switch 23, A DC relay 25, B direct current relay Device 26, total power switch 27;Before connecting civil power, live wire concatenates a total power switch 27;Total power switch 27 Guan Bi energising Rear portion electric energy is sent to rectifier power supply module, is changed into 12V direct voltage output, two controls of supply of 12V DC voltage Loop, a loop is formed by closing switch 23 and A DC relay 25 tandem compounds, and another loop is by contact switch 24 He B DC relay 26 tandem compound forms, and two branch road co-controllings the break-make of high voltage power supply 1;Another part electric energy is through two It is sent to high voltage power supply 1 after A the DC relay 25 and B DC relay 26 of individual series connection;During use, first close total power switch 27, it is closed again switch 23, the most manually pins contact switch 24 and do not put, now high voltage power supply 1 is energized, and adjusts impedance matching box 2 Low temperature plasma is produced between high-field electrode and pending thing 11;Use this control circuit can improve high voltage power supply greatly The work efficiency of 1, it is to avoid the long no-load running of power supply, and can promptly enter operation shape after of short duration shutdown State, in running, as long as finger unclamps contact switch 24, high voltage power supply 1 power-off immediately, in the stopping process of short time not Need to disconnect other switch, when device needs again to devote oneself to work, it is only necessary to fix electrode position, be manually pressed by handle at this On contact switch 24, again electric high voltage power supply 1 can be devoted oneself to work immediately.Meanwhile, at the three of control circuit switch with Concatenating logic mode is arranged, only when total power switch 27, Guan Bi switch 23, contact switch 24 are closed at, and high voltage power supply Could work, once device occurs unexpected, as long as disconnecting any one place switch to get final product cutoff high power supply, therefore, applies this control Circuit processed can improve the safety that device is overall.
Before using, by the inside of high-field electrode C precession insulated handle 3, one end of high pressure male joint 17 and high-voltage conducting wires 28 Connecting, the other end and high pressure female joint 4 are threaded connection.Guan Bi total power switch 27 and switch 23, close contact switch 24, Regulation high voltage power supply 1 voltage has level to regulate button 2-e to 0 Ω shelves, hand-held hands to about 5kV, the impedance of regulation impedance matching box 2 The leading portion of high-field electrode A is just being treated processed material 11 by handle, and high-tension electricity potential energy is transferred at high pressure copper electrode 21, hinders at high-field electrode Large-area low temperature plasma is produced, the regulation rotation of regulation impedance matching box 2 side between gear medium 20 and pending thing 11 Button 2-c and 2-e can regulate the intensity of electric discharge within the specific limits, improves the work efficiency of power supply.
Discharge process and plasma occurring principle illustrate and application: on the high pressure copper electrode 21 within high-field electrode C When applying high pressure, meeting generation highfield near high pressure copper electrode C.There is around high pressure copper electrode 21 higher dielectric constant High-field electrode block media 20 can effectively pass through highfield, when the leading portion of high-field electrode A and treating of a relatively low potential Processed material 11 just pair time, produce high voltage electric field in the region between leading portion and the pending thing 11 of high-field electrode block media 20, Raising puts on the magnitude of voltage on high pressure copper electrode 21 and can be effectively improved the electric field intensity in space, and electric field intensity is the highest, therefore Electronics in gap accelerates to obtain more kinetic energy in the electric field.When electric field intensity is higher than certain value, electronic kinetic energy reaches one Determining threshold value, collision makes heavy particle around ionization occur and form electron avalanche, and electron avalanche develops rapidly into through whole electric discharge Passage multiple abscess.The high-field electrode block media 20 covered on high pressure copper electrode 21 can limit the growth of discharge current, it is to avoid electricity The generation of arc, contributes to forming large-area plasma discharge.The advantage of this device is can to produce in the environment of air Large-area low temperature plasma, the plasma area once produced is 3500mm2To 4000mm2,, temperature is about 20C is extremely 50C, the handle of outfit can allow user that the conductive object of complicated shape and material that part relatively thin are setup flexibly.
This high-field electrode C has that machining area is big, high, the strength of discharge advantages of higher that processes motility, at thin-film material table Face process aspect has certain advantage: containing substantial amounts of oxygen-content active particle in the plasma produced in air, have enough Energy and material surface effect, open material surface chemical bond, introduces hydrophilic radical, and then improves material surface energy and material The hydrophilic on surface, therefore high-field electrode C may be used for the process of automotive interior jewelry surface, electronic product screen film, is combined The fields such as the interlayer process of sheet material, the process of greenhouse film surface.Flexible operation, discharge efficient high-field electrode C, it is also possible to is used for The sterilizing of field of food food, when processing the food containing certain moisture, high-field electrode C can be carried out with foodstuff surface Active group (such as hydroxyl and oxygen atom) and active substance (such as ultraviolet and ozone) is produced, it is possible to do not producing during charge-exchange Carry out effective SC inactivation on the premise of raw any residuals, extend the holding time of food.

Claims (10)

1. a large area low temperature plasma generating means, is characterized in that including control circuit, high voltage power supply, impedance matching Device, insulated handle, high pressure female joint, high-field electrode, pending thing;Wherein, the delivery outlet minus earth of high voltage power supply, high-tension electricity The delivery outlet positive pole in source is connected with the input of impedance matching box;The outfan of impedance matching box is by high-voltage conducting wires and insulation hands One end of high pressure female joint within handle is connected;The other end of high pressure female joint is connected with high-field electrode;High voltage power supply and civil power Between be connected to control circuit;Between high-field electrode and the pending thing of ground connection, produce low temperature plasma directly acting on treat Object between the surface of processed material or electrode and pending thing.
A kind of large area low temperature plasma generating means the most according to claim 1, is characterized in that described control electricity Road includes rectification module, contact switch, Guan Bi switch, A DC relay, B DC relay, total power switch;Wherein, always electric Source switch is connected on live wire;Total power switch Guan Bi energising rear portion electric energy is sent to rectifier power supply module, is changed into 12V Direct voltage output, two loops of 12V direct voltage output, a loop route Guan Bi switch and A DC relay series connection group Conjunction forms, and another circuit branch is formed by contact switch and B DC relay tandem compound, and two branch road co-controllings high pressure The break-make of power supply;Another part electric energy is sent to high voltage power supply after the A DC relay and B DC relay of two series connection;
During use, first close total power switch, be closed again switch, then press contact switch, now high voltage power supply energising, adjust Impedance matching box produces low temperature plasma between high-field electrode and pending thing;Use this control circuit can improve high-tension electricity The work efficiency in source, it is to avoid the long no-load running of power supply, and can promptly enter running status, in running, Press contact switch, high voltage power supply power-off immediately, the stopping process of short time need not disconnect other switch, device needs weight When newly devoting oneself to work, again press the contact switch on lower handle, obtain electric high voltage power supply and devote oneself to work immediately;Meanwhile, electricity is controlled At the three of road, switch is arranged in concatenating logic mode, when total power switch, Guan Bi switch, contact switch are closed at, and high pressure Power supply just works, and once device occurs unexpected, can cutoff high power supply as long as disconnecting any one place switch.
A kind of large area low temperature plasma generating means the most according to claim 1, is characterized in that described impedance Orchestration includes resistance, electric capacity and inductance element;Concatenate resistive resistance value at 0 M Ω-1M Ω, choose 10k Ω, 20k Ω, 50k The resistance point of Ω, 100k Ω and 500k Ω carries out impedance configuration;When working in different conditions, impedance matching box equivalence becomes difference Capacitive load, high voltage power supply is to impedance matching box active power of output and capacitive reactive power;Wherein, tunable capacitor regulation model Enclose 3pF ~ 50pF, controllable impedance range of accommodation 0.6uH ~ 3uH, have on the top of impedance matching box one have grade adjusting knob for Realizing the switching between different resistance value, the controllable impedance adjusting knob of side is used for regulating controllable impedance numerical values recited, adjustable Capacitance adjustment knob is used for regulating adjustable electric capacitance size.
A kind of large area low temperature plasma generating means the most according to claim 1, is characterized in that described high-tension electricity High-frequency and high-voltage waveform or high voltage pulse waveform be produced to impedance matching box after the energising of source;Impedance matching box output voltage terminal and high pressure Electrode is connected, and forms a High Pressure Difference relative to ground connection zero potential;It is in the high-field electrode of high-voltage potential amplitude with pending Produce large area low temperature plasma between thing, directly act on pending thing surface.
A kind of large area low temperature plasma generating means the most according to claim 1, is characterized in that described insulation hands Handle includes handle casing, high pressure female joint and high-voltage conducting wires;Its mesohigh female joint is fixed on inside handle casing, and high pressure mother connect Head portion is away from insulated handle exit 10mm-20mm, and the afterbody of high pressure female joint is through the output of high-voltage conducting wires Yu impedance matching box End is connected, the head tapping 6mm-8mm of high pressure female joint, and described handle casing uses politef or Polyetherimide to mould Material processes, and handle casing thickness is 5mm-7mm.
A kind of large area low temperature plasma generating means the most according to claim 1, is characterized in that described high-tension electricity One in extremely high-field electrode A, high-field electrode B, high-field electrode C.
One the most according to claim 6 large area low temperature plasma generating means flexibly, is characterized in that described High-field electrode A include high pressure male joint, A connection strap insulating coating, high voltage electrode insulation overcoat, high voltage electrode insulation epoxy glue, High-field electrode block media, high pressure copper electrode;Wherein, insulating coating parcel high pressure copper electrode, A connection strap insulating coating parcel height Pressure male joint;High voltage electrode insulation epoxy glue connects A connection strap insulating coating and high pressure male joint, and is fixed on high pressure copper electrode Rear end, prevent electric arc from leaking electricity;The leading portion of high pressure copper electrode fixes high-field electrode block media;Described high voltage electrode insulation overcoat Material is politef or Polyetherimide, internal diameter 20mm-23mm, external diameter 31mm-36mm;Described high pressure copper electrode outer diameter ruler Very little 20mm-23mm;Described high-field electrode block media is quartz glass plate, and its thickness is 0.5mm-1.5mm, a diameter of 34mm; Described high pressure male joint is copper gear rack, its a length of 20mm-25mm;A connection strap insulating coating is wrapped in the middle of high pressure male joint, A length of 15mm-18mm, the A connection strap insulating coating material of A connection strap insulating coating is silicone rubber;
During use, by the inside of high-field electrode precession insulated handle, one end of high pressure male joint is connected with high pressure copper electrode, high pressure The other end and the high pressure female joint of male joint are threaded connection, and produce big between high-field electrode block media and pending thing Area low temperature plasma, high-field electrode A produces 800mm2-1000mm2Low temperature plasma.
A kind of large area low temperature plasma generating means the most according to claim 6, is characterized in that described high-tension electricity Pole B includes copper gear rack, B connection strap insulating coating, insulated dielectric tube, high pressure copper electrode;Wherein, high pressure copper electrode and dielectric Inside pipe wall is fitted, and B connection strap insulating coating parcel copper gear rack also exposes copper gear rack two ends, and copper gear rack connects high pressure copper electrode tail Portion;
During assembling, high pressure copper electrode is filled in the bottom of insulated dielectric tube so that high pressure copper electrode pastes with dielectric inside pipe wall Close, and smear one layer of conductive glue between and drain the air between high pressure copper electrode and insulated dielectric tube, high pressure copper electricity The nut of one diameter 6mm-8mm is attacked in tail end face middle, pole, and the copper gear rack that will be covered with connection strap insulating coating is screwed into height Pressure copper electrode afterbody, and block with high-field electrode epoxy resin glue, form firm plugged zone, the high pressure that will assemble Electrode B is inserted in the high pressure female joint of insulated handle;During work, high-field electrode B produces 200mm2-400mm2Low temperature plasma;
Described insulated dielectric tube material is earthenware, and earthenware thickness is 5mm-7mm;High pressure copper electrode external diameter is 7mm-8mm, high Press the shape in radian as insulated dielectric tube bottom copper electrode.
A kind of large area low temperature plasma generating means the most according to claim 6, is characterized in that described high-field electrode C Including copper gear rack, C connection strap insulating coating, Y type support, block media pipe, high pressure copper electrode, support groove milling, high-voltage conducting wires;Its In, high pressure copper electrode is in block media pipe, and Y type support is divided into upper and lower two parts, has support on upper and lower two binding faces Groove milling, the two ends of high pressure copper electrode and block media pipe are connected with the top and the bottom of Y type support;High-voltage conducting wires is arranged in support milling In groove, high-voltage conducting wires one end is connected with copper gear rack, and the other end is connected with high pressure copper electrode;C connection strap insulating coating parcel copper tooth Bar also exposes copper gear rack two ends;
The earthenware of described Guan Weiyi both ends open of block media, the pipe thickness of block media pipe is 4mm, internal diameter 9mm- 10mm, external diameter 17mm-18mm, long 16cm-18cm;A diameter of 7mm-9mm of high-field electrode, length 16cm-18cm;Described Y type Support, material is politef or nylon;
During assembling, high pressure copper electrode is put into inside block media pipe, and at the outside of high pressure copper electrode and block media pipe Inner side is smeared side conductive glue and is seen the air of residual with extrusion gap, lower part Y type support is installed high pressure copper electrode and Block media pipe, and high-voltage conducting wires of arranging in groove milling, then by high-voltage conducting wires after support groove milling is connected to Y type support End, is connected with copper gear rack and connection strap insulating coating, is finally closed by upper part Y type support and fix;During work, high-field electrode C produces 3500mm2-4000mm2The low temperature plasma of area.
A kind of large area low temperature plasma generating means the most according to claim 1, it is characterized in that described low temperature etc. from The temperature of daughter is 20 DEG C-50 DEG C.
CN201610627592.9A 2016-08-03 2016-08-03 A kind of large area low temperature plasma generating means Active CN106028615B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610627592.9A CN106028615B (en) 2016-08-03 2016-08-03 A kind of large area low temperature plasma generating means

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610627592.9A CN106028615B (en) 2016-08-03 2016-08-03 A kind of large area low temperature plasma generating means

Publications (2)

Publication Number Publication Date
CN106028615A true CN106028615A (en) 2016-10-12
CN106028615B CN106028615B (en) 2018-03-30

Family

ID=57134194

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610627592.9A Active CN106028615B (en) 2016-08-03 2016-08-03 A kind of large area low temperature plasma generating means

Country Status (1)

Country Link
CN (1) CN106028615B (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107148139A (en) * 2017-05-22 2017-09-08 苏州屹润食品科技有限公司 A kind of cold sterilization excitation apparatus of high voltage electric field low temperature plasma
CN109121277A (en) * 2018-08-23 2019-01-01 国网天津市电力公司电力科学研究院 A kind of dielectric barrier discharge system and method improving rubber surface hydrophilicity
CN109498997A (en) * 2018-12-28 2019-03-22 清华大学深圳研究生院 A kind of device of plasma-induced regeneration
CN111228649A (en) * 2020-01-15 2020-06-05 合肥中科离子医学技术装备有限公司 Low-temperature plasma generating device with adjustable strength
CN111568530A (en) * 2020-05-19 2020-08-25 北京理工大学 Low-temperature plasma-based hemostasis and sterilization micro-system and method thereof
CN112169179A (en) * 2020-10-10 2021-01-05 罗璐 Excimer lamp and beauty instrument of cecum work

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012084396A (en) * 2010-10-12 2012-04-26 Fusion Techs Corp Pulse-power-type low-temperature plasma jet generating apparatus
CN103377869A (en) * 2012-04-16 2013-10-30 北京北方微电子基地设备工艺研究中心有限责任公司 Impedance matching method, impedance matching system, and plasma processing device
CN103418085A (en) * 2012-05-25 2013-12-04 王守国 Cold plasma discharger
CN103997840A (en) * 2014-05-30 2014-08-20 南京工业大学 Handheld portable generating device for sliding arc low-temperature plasma
CN104319221A (en) * 2005-08-29 2015-01-28 应用材料公司 Methods and apparatus for symmetrical and/or concentric radio frequency matching networks

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104319221A (en) * 2005-08-29 2015-01-28 应用材料公司 Methods and apparatus for symmetrical and/or concentric radio frequency matching networks
JP2012084396A (en) * 2010-10-12 2012-04-26 Fusion Techs Corp Pulse-power-type low-temperature plasma jet generating apparatus
CN103377869A (en) * 2012-04-16 2013-10-30 北京北方微电子基地设备工艺研究中心有限责任公司 Impedance matching method, impedance matching system, and plasma processing device
CN103418085A (en) * 2012-05-25 2013-12-04 王守国 Cold plasma discharger
CN103997840A (en) * 2014-05-30 2014-08-20 南京工业大学 Handheld portable generating device for sliding arc low-temperature plasma

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107148139A (en) * 2017-05-22 2017-09-08 苏州屹润食品科技有限公司 A kind of cold sterilization excitation apparatus of high voltage electric field low temperature plasma
CN109121277A (en) * 2018-08-23 2019-01-01 国网天津市电力公司电力科学研究院 A kind of dielectric barrier discharge system and method improving rubber surface hydrophilicity
CN109498997A (en) * 2018-12-28 2019-03-22 清华大学深圳研究生院 A kind of device of plasma-induced regeneration
CN109498997B (en) * 2018-12-28 2024-03-22 清华大学深圳研究生院 Plasma-induced tissue regeneration device
CN111228649A (en) * 2020-01-15 2020-06-05 合肥中科离子医学技术装备有限公司 Low-temperature plasma generating device with adjustable strength
CN111568530A (en) * 2020-05-19 2020-08-25 北京理工大学 Low-temperature plasma-based hemostasis and sterilization micro-system and method thereof
CN112169179A (en) * 2020-10-10 2021-01-05 罗璐 Excimer lamp and beauty instrument of cecum work

Also Published As

Publication number Publication date
CN106028615B (en) 2018-03-30

Similar Documents

Publication Publication Date Title
CN106028615A (en) Large-area low-temperature plasma generation device
US20160287892A1 (en) Assembly for the treatment of wounds
CN206295464U (en) A kind of plasma-activated water is used for the device of clinical sterilizing
KR101873689B1 (en) Sterilizer caninet using plasma
CN102343106B (en) Atmospheric-pressure low-temperature plasma sterilizing device and sterilizing method
CN105848399B (en) A kind of glow discharge jet plasma generating structure
JP2016531654A (en) Sterilization system using plasma
WO2007013160A1 (en) Radical sterilization apparatus
CN104735893B (en) A kind of low temperature plasma is used for the apparatus and method that slender pipeline sterilizes
CN102143718A (en) Method for treating a biological material comprising living cells
CN104918402A (en) Device for common voltage high voltage radio cooperation radio frequency glow jet discharge and discharge method
CN106658931A (en) Portable atmospheric pressure normal temperature plasma jet generating device
CN201020055Y (en) Parallel connection type low-temperature plasma disinfection device
CN113490322B (en) Portable large-area plasma jet device and system
CN101848595A (en) Method and device for generating monopole radio-frequency capacitance coupling low-temperature plasma under atmospheric pressure
CN103418086A (en) Wound treatment device utilizing high voltage to generate plasma
CN109384291A (en) Plasma and impulse electric field combination sterilizing unit and method
CN105670024B (en) A method of surface modification is carried out to pipe inside and outside wall using atmospheric pressure plasma
CN103052250A (en) Atmospheric pressure dispersion type cold plasma generation device
CN203807223U (en) Plasma discharge device
CN206714970U (en) Portable type atmosphere plasma sterilizing installation
MXPA04003262A (en) Titanium-group metal containing high-performance water, and its producing method and apparatus.
KR20180057809A (en) Low temperature and atmospheric pressure plasma generator
CN107320847B (en) Low-temperature plasma sterilization pen
CN102497719B (en) Syringe type atmospheric-pressure micro-plasma generator

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20191125

Address after: 210000 science and technology innovation of Intelligent Manufacturing Industrial Park (Zhongshan community), Jiangbei new district, Nanjing City, Jiangsu Province

Patentee after: JIANGSU RONGZHENG PHARMACEUTICAL TECHNOLOGY Co.,Ltd.

Address before: 210009 Zhongshan North Road, Jiangsu, No. 200,

Patentee before: Nanjing University of Technology

TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20240226

Address after: Room 2310, Jiangsu Commercial Building, No. 28 Zhongshan North Road, Gulou District, Nanjing City, Jiangsu Province, 210000

Patentee after: Nanjing Jinyou Health Management Co.,Ltd.

Country or region after: China

Address before: 210000 Jiangsu Province Nanjing Jiangbei New Area Intelligent Manufacturing Industrial Park (Zhongshan Community) Science and Technology Innovation

Patentee before: JIANGSU RONGZHENG PHARMACEUTICAL TECHNOLOGY Co.,Ltd.

Country or region before: China