CN106028615B - A kind of large area low temperature plasma generating means - Google Patents
A kind of large area low temperature plasma generating means Download PDFInfo
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- CN106028615B CN106028615B CN201610627592.9A CN201610627592A CN106028615B CN 106028615 B CN106028615 B CN 106028615B CN 201610627592 A CN201610627592 A CN 201610627592A CN 106028615 B CN106028615 B CN 106028615B
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- 238000000034 method Methods 0.000 claims abstract description 25
- 230000008569 process Effects 0.000 claims abstract description 18
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 121
- 229910052802 copper Inorganic materials 0.000 claims description 121
- 239000010949 copper Substances 0.000 claims description 121
- 238000000576 coating method Methods 0.000 claims description 41
- 239000011248 coating agent Substances 0.000 claims description 37
- 239000000463 material Substances 0.000 claims description 37
- 230000005611 electricity Effects 0.000 claims description 22
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 22
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 22
- 238000009413 insulation Methods 0.000 claims description 21
- 238000003801 milling Methods 0.000 claims description 15
- 230000033228 biological regulation Effects 0.000 claims description 14
- 239000003292 glue Substances 0.000 claims description 14
- -1 polytetrafluoroethylene Polymers 0.000 claims description 14
- 150000001875 compounds Chemical class 0.000 claims description 12
- 239000003990 capacitor Substances 0.000 claims description 10
- 229910052571 earthenware Inorganic materials 0.000 claims description 6
- 238000010891 electric arc Methods 0.000 claims description 6
- 229920006335 epoxy glue Polymers 0.000 claims description 6
- 239000003822 epoxy resin Substances 0.000 claims description 6
- 229920000647 polyepoxide Polymers 0.000 claims description 6
- 230000001276 controlling effect Effects 0.000 claims description 5
- 230000002035 prolonged effect Effects 0.000 claims description 5
- 238000010079 rubber tapping Methods 0.000 claims description 5
- 239000004677 Nylon Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 3
- 229920001778 nylon Polymers 0.000 claims description 3
- 229920002379 silicone rubber Polymers 0.000 claims description 3
- 239000004593 Epoxy Substances 0.000 claims 1
- 238000003780 insertion Methods 0.000 claims 1
- 230000037431 insertion Effects 0.000 claims 1
- 230000008901 benefit Effects 0.000 abstract description 7
- 238000003851 corona treatment Methods 0.000 abstract description 2
- 238000009434 installation Methods 0.000 abstract description 2
- 230000005684 electric field Effects 0.000 description 22
- 238000012545 processing Methods 0.000 description 17
- 239000002245 particle Substances 0.000 description 12
- 239000007789 gas Substances 0.000 description 10
- 235000013305 food Nutrition 0.000 description 8
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 230000001954 sterilising effect Effects 0.000 description 6
- 238000004659 sterilization and disinfection Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000011149 active material Substances 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 125000004430 oxygen atom Chemical group O* 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004070 electrodeposition Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920000570 polyether Polymers 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 210000001519 tissue Anatomy 0.000 description 3
- 240000002853 Nelumbo nucifera Species 0.000 description 2
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 2
- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000023555 blood coagulation Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 210000002615 epidermis Anatomy 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 230000005281 excited state Effects 0.000 description 2
- 230000023597 hemostasis Effects 0.000 description 2
- 230000002779 inactivation Effects 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 210000003491 skin Anatomy 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 208000002874 Acne Vulgaris Diseases 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- 206010048865 Hypoacusis Diseases 0.000 description 1
- 210000001015 abdomen Anatomy 0.000 description 1
- 206010000496 acne Diseases 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 210000001124 body fluid Anatomy 0.000 description 1
- 239000010839 body fluid Substances 0.000 description 1
- 244000309466 calf Species 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000249 desinfective effect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000011900 installation process Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000013486 operation strategy Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 230000010148 water-pollination Effects 0.000 description 1
- 230000002087 whitening effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
Abstract
The present invention is a kind of large area low temperature plasma generating means, and its structure includes control circuit, high voltage power supply, impedance matching box, insulated handle, high pressure female joint, high-field electrode, pending thing；Wherein, the delivery outlet negative pole ground connection of high voltage power supply, the delivery outlet positive pole of high voltage power supply are connected with the input of impedance matching box；The output end of impedance matching box is connected by high-voltage conducting wires with one end of the high pressure female joint inside insulated handle；The other end of high pressure female joint is connected with high-field electrode；Control circuit is connected between high voltage power supply and civil power.Advantage：1st, single unit system is compact-sized, and installation cost is controllable, and fault rate is relatively low, and job stability is high, and operation is flexible, safety；2nd, different process demands can be met, realize the corona treatment of large area；3rd, can caused low temperature plasma in open environment indoors.
Description
Technical field
The present invention relates to a kind of large area low temperature plasma generating means, belong to technical field of plasma.
Background technology
Electronics, ion, excited state particle and the free radical being rich in discharge of plasma in low temperature space are all extremely active
Chemical reactant, these active particles help to realize the chemical reaction for being difficult to occur under some normal conditions, therefore low
Isothermal plasma has been widely used in the side such as material surface processing, pollutant treatment, disinfection and medical science auxiliary treatment
Face；However, one side gas discharge plasma is worked in strong electric field environment, in order to ensure that the safe operation of device must match somebody with somebody
Close complicated insulation and earthed system；On the other hand, the principle of gas discharge and the life-span that spatial activity particle is shorter are limited to,
The low temperature plasma being especially operate under atmospheric pressure environment, discharging gap is narrower, and the active particle life-span is shorter, the work of device
Make the space critical constraints of space and processed material；Therefore, existing plasma producing apparatus is mostly fixed electrode structure, or is put
In fixed container cavity, the limited flexibility of device, with the expansion of low temperature plasma operation strategies, it is necessary to lifted
The flexibility of device, promote it in industry and the utilization of scientific research field.
Low temperature plasma can be divided into arc discharge, corona discharge, glow discharge and dielectric impedance by mechanism of production and put
Electricity, by driving factors can be divided into electric field be operated alone with electric field flow field jointly driving two kinds, how to be produced under atmospheric pressure environment
The low temperature plasma of raw large area is the direct driving force of various technological improvements.
Produce the main three kinds of methods of low temperature plasma in large area at present：First method be two panels metal electrode it
Between add block media formed dielectric barrier discharge, in capacitive block media surface can electric discharge when effectively gather electricity
Lotus forms reversed electric field, suppresses the growth of discharge current, so as to form the filament-like discharges of large area in discharge air-gap space, just
As described in the U of patent CN 203015262, inducing gas is passed through between discharge air-gap can produce the low temperature of even dispersion
Plasma, contain substantial amounts of metastable state nitrogen molecular, hydroxy and oxygen atom in caused plasma, can be used for carrying out thing
The modification of material surface and disinfection, but fixed electrode structure and narrow discharge space treat the size requirement of processed material
Higher, applicability is not strong and flexibility is not high.The method that second method uses compound electrode, it can be carried out according to different demands
Low temperature plasma combining and produce different area and of different shapes, as described in the A of patent CN 102307425
, according to the sparking electrode of different demand addition varying numbers so that discharge channel increase, discharge power and transmission electric charge
Correspondingly improve, compared to first way, the flexibility of combined electrode has been lifted, but because being put caused by discharge mechanism
Electric narrow space problem is not resolved still, and the material surface that can not be applied to complex three-dimensional object is handled.The third side
In method, plasma caused by high voltage electric field is taken out of discharge range using the flow field of air-flow, realizes that operation interval and electric discharge are empty
Between separation, formed atmosphere pressure plasma jet flow；As described in the A of patent CN 103945627, due to single jet
Area is smaller, has researcher to be superimposed more jets parallel connections, is combined into plasma jet array, improves discharge power and biography
Transmission of electricity lotus, increase the processing area of plasma, it is often more important that plasma jet array is when handling complex three-dimensional object
More efficient, flexibility is stronger, but due to each jet units block media parameter, air flow method and Electric Field Distribution without
Method is consistent, it is difficult to realizes the uniform low temperature plasma of large area.
The content of the invention
Proposed by the present invention is a kind of large area low temperature plasma generating means, and its purpose aims to provide one kind can be
The generating means for the large area low temperature plasma for adapting to pending thing is produced in indoor open environment.
The technical solution of the present invention：A kind of large area low temperature plasma generating means, its structure include control electricity
Road, high voltage power supply 1, impedance matching box 2, insulated handle 3, high pressure female joint 4, high-field electrode, pending thing 11；Wherein, high pressure
The delivery outlet negative pole 1-a ground connection of power supply 1, the delivery outlet positive pole 1-b of high voltage power supply 1 and the input 2-a phases of impedance matching box 2
Even；The output end 2-b of impedance matching box 2 passes through high-voltage conducting wires 3-a and one end phase of the high pressure female joint 4 inside insulated handle 3
Even；The other end of high pressure female joint 4 is connected with high-field electrode；Control circuit is connected between high voltage power supply 1 and civil power；In high-tension electricity
Low temperature plasma is produced between pole and the pending thing 11 of ground connection and directly acts on surface or the electrode of pending thing 11
With the object between pending thing 11.
Advantages of the present invention：
1st, electrode and handle coordinate the flexibility for enhancing device, facilitate operating personnel to carry out hand-held processing.
2nd, different high-field electrode structures are devised, can be flexibly met not from different electrode structures according to actual conditions
Same process demand, realize the corona treatment of large area；
3rd, discharge power can be realized and transmit the regulation of electric charge by adjusting the impedance matching box 2 inside sequential circuit, can
Change the intensity of electric discharge according to different processing materials and processing requirement.
4th, a variety of process situations can be flexibly tackled, handle metal surface material, electronic equipment screen and the packaging of complexity
Thin-film material, the material of SI semi-insulation gasket shape used, while safely human body surface can also be handled, in biology
Realize disinfection and hemostasis blood coagulation in surface.
5th, design unified high-voltage electrical apparatus interface, and by electrode interface as handle inner, can facilitate Different electrodes it
Between replacing, the security of operating personnel and the security of device during work can be ensured again.
6th, directly can produce indoors close to room temperature low temperature plasma in open environment, working gas can be empty
Gas, without working gas is additionally provided, rare gas, gaseous compound or their mixed gas can also be used as work
The inducing gas or auxiliary gas of work, and then can meet the needs of various production technologies.
7th, single unit system is compact-sized, and excitation and control loop without complexity, installation cost is controllable, and fault rate is relatively low,
Job stability is high.
Brief description of the drawings
Accompanying drawing 1 is a kind of large area low temperature plasma generating means function logic structural representation.
Accompanying drawing 2 is equipped with the large area low temperature plasma generating means structural representation of A class high-field electrodes.
Accompanying drawing 3 is insulated handle structural representation.
Accompanying drawing 4 is high-field electrode A structural representations.
Accompanying drawing 5 is high-field electrode B structure schematic diagram.
Accompanying drawing 6 is high-field electrode C-structure schematic diagram.
Accompanying drawing 7 is control circuit structural representation.
1 it is high voltage power supply in accompanying drawing, 2 is that impedance matching box, 1-a are that high voltage power supply negative pole of output end, 1-b are high voltage power supplies
Output head anode, 2-a are that the input of impedance matching box, 2-b are that the output end of impedance matching box, 2-c are controllable impedance regulations
Knob, 2-d are that tunable capacitor adjusting knob, 2-e are that to have a grade adjusting knob, 3 be that insulated handle, 3-a are high-voltage conducting wires, 4 are high
Pressure female joint, 5 be high pressure pin end, 6 be A connection straps insulating coating, 7 be high voltage electrode insulation overcoat, 8 be high voltage electrode insulation
Epoxy glue, 9 be high-field electrode block media, 10 be high pressure copper electrode, 11 be pending thing, 12 be copper gear rack, 13 be B connection straps
Insulating coating, 14 be plugged zone, 15 be insulated dielectric tube, 16 be high pressure copper electrode, 17 be copper gear rack, 18 be C connection bar insulations
Overcoat, 19 be Y types support, 20 be block media pipe, 21 be high pressure copper electrode, 22 be rectification module, 24 be contact switch, 23 be
Closure switch, 25 be A DC relays, 26 be B DC relays, 27 be total power switch, 28 be high-voltage conducting wires, 29 be support
Groove milling.
Embodiment
Compare accompanying drawing, a kind of large area low temperature plasma generating means, its structure include control circuit, high voltage power supply 1,
Impedance matching box 2, insulated handle 3, high pressure female joint 4, high-field electrode, pending thing 11；Wherein, the delivery outlet of high voltage power supply 1
Negative pole 1-a is grounded, and the delivery outlet positive pole 1-b of high voltage power supply 1 is connected with the input 2-a of impedance matching box 2；Impedance matching box 2
Output end 2-b be connected by high-voltage conducting wires 3-a with one end of the high pressure female joint 4 inside insulated handle 3；High pressure female joint 4
The other end be connected with high-field electrode；Control circuit is connected between high voltage power supply 1 and civil power；Wait to locate with what is be grounded in high-field electrode
Produced between reason thing 11 low temperature plasma and directly act on pending thing 11 surface or electrode and pending thing 11 it
Between object；
It is straight that described control circuit includes rectification module 22, contact switch 24, closure switch 23, A DC relays 25, B
Current relay 26, total power switch 27；Wherein, total power switch 27 is connected on live wire；After the closure of total power switch 27 is powered
A part of electric energy is sent to rectifier power supply module, is changed into 12V DC voltage output, two loops of 12V DC voltage output, and one
Bar loop route closure switch 23 and the tandem compound of A DC relays 25 forms, and another circuit branch is straight by contact switch 24 and B
The tandem compound of current relay 26 forms, and two branch road co- controllings the break-make of high voltage power supply 1；Another part electric energy is through two strings
High voltage power supply 1 is sent to after the A DC relays 25 and B DC relays 26 of connection；
In use, first closing total power switch 27, switch 23 is closed again, is then manually pressed by contact switch 24, it is now high
Voltage source 1 is powered, and adjustment impedance matching box 2 produces low temperature plasma between high-field electrode and pending thing 11；Use this
Control circuit can improve the operating efficiency of high voltage power supply 1, avoid the prolonged no-load running of power supply, and can promptly enter fortune
Row state, in the process of running, contact switch 24 is pressed, high voltage power supply 1 powers off immediately, need not in the stopping process of short time
Other switches are disconnected, when device needs to devote oneself to work again, again by the contact switch 24 on lower handle, obtain electric high voltage power supply
1 devotes oneself to work immediately；Meanwhile switch is arranged in a manner of concatenating logic at the three of control circuit, when total power switch 27, closure are opened
When pass 23, contact switch 24 are closed at, high voltage power supply just works, once surprisingly, opening as long as disconnecting any one place occurs in device
Pass can cutoff high power supply.
Described impedance matching box 2 includes resistance, electric capacity and inductance element；Resistive impedance value is concatenated in 0 M Ω -1M
Ω, the resistance point for choosing 10k Ω, 20k Ω, 50k Ω, 100k Ω and 500k Ω carry out impedance configuration；When working in different conditions,
Impedance matching box 2 is equivalent into different capacitive loads, and high voltage power supply 1 is to the active power of output of impedance matching box 2 and capacitive reactive power
Power；Wherein, tunable capacitor adjustable range 3pF ~ 50pF, controllable impedance adjustable range 0.6uH ~ 3uH, in impedance matching box 2
Top has a 2-e to have grade adjusting knob to be used for realizing the switching between different impedance values, the controllable impedance adjusting knob of side
2-c is used for adjusting controllable impedance numerical values recited, and tunable capacitor adjusting knob 2-d is used for adjusting adjustable electric capacitance size.
Described high voltage power supply 1 produces high-frequency and high-voltage waveform or high voltage pulse waveform to impedance matching box 2 after being powered；Impedance
The output voltage terminal of adaptation 2 is connected with high-field electrode, forms a High Pressure Difference relative to ground connection zero potential；In high-voltage potential
Large area low temperature plasma is produced between the high-field electrode of amplitude and pending thing 11, directly acts on pending thing surface.
Described insulated handle 3 includes handle casing, high pressure female joint 4 and high-voltage conducting wires 3-a；Its mesohigh female joint 4
It is fixed on inside handle casing 3, the head of high pressure female joint 4 is away from the exit 10mm-20mm of insulated handle 3, the tail of high pressure female joint 4
Portion is connected through high-voltage conducting wires 3-a with the output end of impedance matching box 2, the head tapping 6mm-8mm of high pressure female joint 4, described
Handle casing is formed using polytetrafluoroethylene (PTFE) or PEI plastic processing, and handle casing thickness is 5mm-7mm.
Described high-field electrode is one kind in high-field electrode A, high-field electrode B, high-field electrode C.
Described high-field electrode A includes high pressure pin end 5, A connection straps insulating coating 6, high voltage electrode insulation overcoat 7, height
Piezoelectricity pole insulating epoxy glue 8, high-field electrode block media 9, high pressure copper electrode 10；Wherein, insulating coating 7 wraps up high pressure copper electrode
10, A connection strap insulating coatings 6 parcel high pressure pin end 5;High voltage electrode insulation epoxy glue 8 connects the He of A connection straps insulating coating 6
High pressure pin end 5, and the rear end of high pressure copper electrode 10 is fixed on, prevent electric arc from leaking electricity；The leading portion of high pressure copper electrode 10 is fixed high
Piezoelectricity pole block media 9；The material of high voltage electrode insulation overcoat 7 is polytetrafluoroethylene (PTFE) or PEI, internal diameter 20mm-
23mm, external diameter 31mm to 36mm；The outside dimension 20mm-23mm of high pressure copper electrode 10；The high-field electrode block media 9 is
Quartz glass plate, its thickness are 0.5mm-1.5mm, a diameter of 34mm；The high pressure pin end 5 is copper gear rack, and its length is
20mm-25mm；A connection straps insulating coating 6 is wrapped among high pressure pin end 5, and the length of A connection straps insulating coating 6 is
The material of 15mm-18mm, A connection strap insulating coating 6 is silicon rubber；
In use, by the inside of high-field electrode precession insulated handle 3, one end of high pressure pin end 5 and high pressure copper electrode 10
Connection, the other end of high pressure pin end 5 and high pressure female joint 4 be connected through a screw thread, in high-field electrode block media 9 and pending
Large area low temperature plasma is produced between thing 11, high-field electrode A produces 800mm2-1000mm2Low temperature plasma.
Described high-field electrode B includes copper gear rack 12, B connection straps insulating coating 13, insulated dielectric tube 15, high pressure copper electrode
16；Wherein, high pressure copper electrode 16 is bonded with the inwall of insulated dielectric tube 15, and B connection straps insulating coating 13 wraps up copper gear rack 12 and revealed
The both ends of copper gear rack 12, copper gear rack 12 connect the afterbody of high pressure copper electrode 16;
During assembling, high pressure copper electrode 16 is filled in the bottom of insulated dielectric tube 15 so that high pressure copper electrode 16 is situated between with insulation
The inwall of matter pipe 15 is bonded, and is smeared one layer of conductive glue therebetween and drained between high pressure copper electrode 16 and insulated dielectric tube 15
Air, the tail end face middle of high pressure copper electrode 15 attacks one of diameter 6mm-8mm nut, will be covered with connecting outside bar insulation
The copper gear rack 12 of set 13 is screwed into the afterbody of high pressure copper electrode 16, and is blocked with high-field electrode epoxy resin glue, is formed firm
Plugged zone 14, by the high-field electrode B assembled insert insulated handle 3 high pressure female joint 4 in；During work, high-field electrode B productions
Raw 200mm2-400mm2Low temperature plasma；
The material of insulated dielectric tube 15 is earthenware, and ceramic tube thickness is 5mm-7mm；The external diameter of high pressure copper electrode 16 is
7mm-8mm, the bottom of high pressure copper electrode 16 is in the shape with 15 same radian of insulated dielectric tube.
The high-field electrode C includes copper gear rack 17, C connection straps insulating coating 18, Y types support 19, block media pipe 20, height
Press copper electrode 21, support groove milling 29, high-voltage conducting wires 28；Wherein, high pressure copper electrode 21 is in block media pipe 20, Y types support 19
It is divided into two parts up and down, there is support groove milling 29 on upper and lower two binding faces, high pressure copper electrode 21 and block media pipe 20
Both ends are connected with the top and the bottom of Y types support 19；High-voltage conducting wires 28 are arranged in support groove milling 29, the one end of high-voltage conducting wires 28 and copper
Gear rack 17 is connected, and the other end is connected with high pressure copper electrode 21；C connection straps insulating coating 18 wraps up copper gear rack 17 and exposes copper gear rack
17 both ends；
The block media pipe 20 is the earthenware of a both ends open, and the pipe thickness of block media pipe 20 is 4mm, interior
Footpath 9mm-10mm, external diameter 17mm-18mm, long 16cm-18cm；A diameter of 7mm-9mm of high-field electrode 21, length 16cm-18cm；
The Y types support 19, material are polytetrafluoroethylene (PTFE) or nylon；
During assembling, high pressure copper electrode 21 is put into inside block media pipe 20, and in the outside of high pressure copper electrode 21 and resistance
Side conductive glue is smeared to extrude the air that residual is seen in gap in the inner side for keeping off medium tube 20, is installed on lower part Y type supports
High pressure copper electrode 21 and block media pipe 20, and high-voltage conducting wires 28 of being arranged in groove milling, then by high-voltage conducting wires 28 along support
Groove milling 29 is connected to the rear end of Y types support 19, is connected with copper gear rack 17 and connection strap insulating coating 18, finally by upper part Y type branch
Frame, which closes, to be fixed；During work, high-field electrode C produces 3500mm2-4000mm2The low temperature plasma of area.
A kind of 10. large area low temperature plasma generating means according to claim 1, it is characterized in that described low
The temperature of isothermal plasma is 20。C-50。Between C.
The low temperature plasma refers to non-equilibrium plasma of the electron temperature much larger than wherein heavy particle temperature, in room
Caused low-temperature plasma temperature is 20 in interior open environment。C-50。Between C.
High-field electrode A single unit system is coordinated to can apply to the thin film deposition of certain area, the sterilization of large area yarn fabric
The surface of sterilization and small size insulating sheet material is modified, and the device can also realize that the plasma of organism surface is direct in addition
Processing（Now pending thing 11 of the organism as ground connection）, therefore, the present apparatus can be used for the processing of human body epidermis tissue, outside
Add high pressure by adjustable impedance matching box 2, low-temperature plasma is produced in the coupling gap of high-field electrode A and human body surface
Body, substantial amounts of excited state particle is included in plasma（Such as the nitrogen molecular of excitation state）, active group（Such as hydroxyl, oxygen atom）
With other active materials（Including ozone, electronics, ultraviolet）Human body surface can be directly acted on（Here human body will be used as ground connection
Pending thing 11）, it is 800mm because high-field electrode A can produce plasma area2-1000mm2, it is adapted to the back of the hand and face
Bu Saibangdeng epidermal tissues carry out effective sterilizing and cleaning treatment.
High-field electrode B region of discharge higher pressure electrode A is small, and heating region area is 200mm2-400mm2, can essence
The material surface of the complex biological surface of shape and abnormity carefully is handled, can be further applied to biological tissue's wound
The fixed point cleaning of sterilizing, hemostasis blood coagulation and biological epidermis, as interdigital space of hand and these hard of hearing in irregular shape, operating spaces
The electrode can be used in less region.
Plasma area is in 3500mm caused by high-field electrode C2-4000mm2Between, it is flexibly portable due to being equipped with
Handle, it can apply to the film processing of large area（Such as greenhouse film）, large area Surface Modification of Insulating Material（Such as transformer
The surface of built-in electrical insulation sheet material is modified）With the sterilizing of the biological surface tissue of large area（Such as the belly, calf and arm of human body
Wing etc.）.
The hand-held that insulated handle 3 and different high-field electrodes combine both convenient use personnel is flexibly handled, again can be square
Just it is mechanically fixed in the application process with engineering is tested, at the same 4 buried insulating properties of high pressure female joint are preferable
The overall electrical security of device can be improved in handle casing 3, prevents exposed high-field electrode from leaking electricity.
With reference to embodiment, the invention will be further described.
Embodiment 1
It is exhausted that high-field electrode A includes high pressure pin end 5, connection strap insulating coating 6, high voltage electrode insulation overcoat 7, high-field electrode
Edge epoxy glue 8, high-field electrode block media 9, high pressure copper electrode 10；Wherein, insulating coating 7 wraps up high pressure copper electrode 10, even
Narrow bars insulating coating 6 wraps up high pressure pin end 5, with high voltage electrode insulation epoxy glue 8 that connection strap insulating coating 6 and high pressure is public
Joint 5 is fixed on the rear end of high pressure copper electrode 10, prevents electric arc from leaking electricity；The leading portion of high pressure copper electrode 10 is fixed with high-field electrode resistance
Keep off medium 9；The material of high voltage electrode insulation overcoat 7 is polytetrafluoroethylene (PTFE) or PEI, internal diameter 22mm, external diameter 36mm；
The outside dimension 22mm of high pressure copper electrode 10；The high-field electrode block media 9 is the quartz that thickness is 0.5mm to 1.5mm
Sheet glass；The high pressure pin end 5 is one section of long 25mm copper gear rack；Among high pressure pin end 5 outside the connection bar insulation of parcel
It is 15mm to cover 6 length, and the material of connection strap insulating coating 6 is silicon rubber, is tightly adsorbed at the outside of high pressure pin end 5, both ends
Expose copper gear rack to be used to fix；
Insulated handle 3 includes handle casing and high pressure female joint 4；The handle casing uses polytetrafluoroethylene (PTFE) or polyethers acyl
Imines plastic processing forms, and to ensure the electrical security of device, handle casing thickness is 5mm to 7mm；High pressure female joint 4 is solid
Inside handle casing 3, the head of high pressure female joint 4 is away from the exit 14mm of insulated handle 3, and the afterbody of high pressure female joint 4 is through height
Pressure wire 3-a is connected with the output end 2-b of impedance matching box 2, the head tapping 8mm of high pressure female joint 4.
Impedance matching box 2 includes resistance, electric capacity and inductance element；Impedance matching box is resistive into resistance sense or capacitance-resistance, concatenation
Lowest impedance be 0（Metal connects）, highest impedance 1M Ω, 0 to selection 10k Ω, 20k Ω, 50k Ω, 100k between 1M Ω
Ω and 500k Ω resistance point carries out impedance configuration；The reactor worked under different conditions can be born with equivalent into different capacitives
Carry, high voltage power supply is needed to reactor while active power of output and capacitive reactive power, by adjusting inside impedance matching box 2
Tunable capacitor and controllable impedance, thus it is possible to vary the electrical characteristic of load reactor, so improve power supply efficiency and use the longevity
Life；Wherein tunable capacitor adjustable range 3pF ~ 50pF, controllable impedance adjustable range 0.6uH ~ 3uH.On the top of impedance matching box 2
There is one to there is grade adjusting knob 2-e to realize the switching between different impedance values, the adjusting knob 2-c of side can be adjusted can
Inductance value size is adjusted, adjusting knob 2-d can adjust adjustable electric capacitance size.
Control circuit includes rectification module 22, contact switch 24, closure switch 23, A DC relays 25, B direct current relays
Device 26, total power switch 27；Before connecting civil power, a total power switch 27 is concatenated on live wire；The closure of total power switch 27 is powered
Rear portion electric energy is sent to rectifier power supply module, is changed into 12V DC voltage output, and 12V DC voltage supplies two controls
Loop, a loop are formed by closure switch 23 and the tandem compound of A DC relays 25, and another loop is by the He of contact switch 24
The tandem compound of B DC relays 26 forms, and two branch road co- controllings the break-make of high voltage power supply 1；Another part electric energy is through two
High voltage power supply 1 is sent to after the A DC relays 25 and B DC relays 26 of individual series connection；In use, first close total power switch
27, switch 23 is closed again, contact switch 24 is then pinned manually and does not put, now high voltage power supply 1 is powered, and adjusts impedance matching box 2
Low temperature plasma is produced between high-field electrode and pending thing 11；High voltage power supply can be greatly improved using the control circuit
1 operating efficiency, the prolonged no-load running of power supply is avoided, and can promptly enter running status, in the process of running,
As long as finger unclamps contact switch 24, high voltage power supply 1 is powered off immediately, and other open need not be disconnected in the stopping process of short time
Close, when device needs to devote oneself to work again, it is only necessary to fix electrode position, the contact switch being manually pressed by herein on handle
24, again electric high voltage power supply 1 can devote oneself to work immediately, meanwhile, control circuit three at switch in a manner of concatenating logic
Arrangement, only when total power switch 27, closure switch 23, contact switch 24 are closed at, high voltage power supply could work, once
Device occur it is unexpected, as long as disconnect any one place's switch can cutoff high power supply, therefore, can be improved using the control circuit
The overall security of device.
In installation process, high pressure copper electrode 10 is squeezed into from the rear end face of insulating coating 7, until falling for high-field electrode 10
Angle leading portion is flushed with the leading portion of insulating coating 7, while connection strap insulating coating 6 is inserted on high pressure pin end 5, ensures that high pressure is public
5mm is respectively exposed at the both ends of joint 5, is fixed on the rear end of high pressure copper electrode 10 by one of high pressure pin end 5, and with high-tension electricity polar ring
The rear end of the blocking high-pressure copper electrode 10 of oxygen resin glue 8, while the high-field electrode epoxide-resin glue 8 solidified can also play fixed height
Press the effect of pin end 5.One layer of 0.5mm thickness of smearing at the leading portion chamfering of high pressure copper electrode 10 and in the space of insulating coating 7
High-field electrode epoxide-resin glue 8, high-field electrode block media 9 is covered in the top of high-field electrode epoxide-resin glue 8, waits resin
The condensation of glue 8；Then by the inside of high-field electrode A precessions insulated handle 3, one end and the high pressure copper electrode 10 of high pressure pin end 5
Connection, the other end of high pressure pin end 5 and high pressure female joint 4 are connected through a screw thread, closure total power switch 27 and switch 23,
Contact switch 24, the regulation voltage of high voltage power supply 1 to 5kV or so are closed, the impedance of regulation impedance matching box 2 has a grade regulation button 2-
The pending thing 11 of high-field electrode A leading portion face, high-voltage potential can be transferred to high pressure copper electrode 10 to 0 Ω shelves, hand-held handle by e
Place, the low temperature plasma of large area is produced between high-field electrode block media 9 and pending thing 11, adjust impedance matching box
The adjusting knob 2-c and 2-e of 2 sides can adjust the intensity of electric discharge within the specific limits, improve the operating efficiency of power supply.
Discharge process and plasma occurring principle explanation and application：On high pressure copper electrode 10 inside high-field electrode A
When applying high pressure, highfield can be produced near high pressure copper electrode 10, high pressure copper electrode insulating coating 7 has higher Jie
Electric strength and specific insulation, the wall electric field around insulating coating can be effectively reduced, meanwhile, the leading portion of high pressure copper electrode 10 is relatively thin
High-field electrode block media 9 can effectively pass through highfield, when high-field electrode A leading portion and the pending thing of a low potential
During 11 face, high voltage electric field is produced in the region between the leading portion of high-field electrode block media 9 and pending thing 11, improves and applies
The electric-field intensity in space can be effectively improved in the magnitude of voltage on high pressure copper electrode 10, electric-field intensity is higher, therefore in gap
Electronics accelerates to obtain more kinetic energy in the electric field, and when electric-field intensity is higher than certain value, electronic kinetic energy reaches certain threshold value, touches
Hit so that surrounding heavy particle ionizes, formation electron avalanche, electron avalanche is developed rapidly into through whole discharge channel streamer, high
The high-field electrode block media 9 covered on pressure copper electrode 10 can limit the growth of discharge current, avoid the generation of electric arc, help
It is the low temperature that large area can be produced in the environment of air in the advantages of plasma discharge for forming large area, the present apparatus
Plasma, once caused plasma area is 800mm2To 1000mm2, temperature is about 20 DEG C to 50 DEG C, is equipped with handle,
The conductive object of complicated shape and the material that part is relatively thin can be setup flexibly.
When this high-field electrode A directly acts on conductive metal, including for large area can be efficiently produced in atmosphere
It active material high-temperature plasma, can be used for disinfecting for Medical Devices and instrument in biologic medical field, for example perform the operation
Knife, operating scissors etc..High-field electrode A with operating flexibility and electric discharge high efficiency, can be also used for killing for field of food food
Bacterium sterilizes, and when processing contains the food of certain moisture, high-field electrode A can carry out producing work during charge-exchange with foodstuff surface
Property group（Such as hydroxyl and oxygen atom）And active material（Such as ultraviolet and ozone）, any residuals can not produced
Under the premise of carry out effective surface colony inactivation, improve the holding time of food.
Embodiment 2
High-field electrode B includes copper gear rack 12, connection strap insulating coating 13, plugged zone 14, insulated dielectric tube 15, high pressure copper electricity
Pole 16；Wherein, the material of insulated dielectric tube 15 is earthenware, and ceramic tube thickness is 5mm to 7mm；The external diameter of high pressure copper electrode 16 is 7mm
To 8mm, the bottom of high pressure copper electrode 16 is in the shape with 15 same radian of insulated dielectric tube；During assembling, high pressure copper electrode 16 is filled in
Enter the bottom of insulated dielectric tube 15 so that high pressure copper electrode 16 is bonded with the inwall of insulated dielectric tube 15, and is smeared therebetween
One layer of conductive glue drains the air between high pressure copper electrode 16 and insulated dielectric tube 15, the tail end face of high pressure copper electrode 15 center
Between attack one of diameter 6mm to 8mm nut, the copper gear rack 12 that will be covered with connection strap insulating coating 13 is screwed into high pressure copper electrode 15
Afterbody, and blocked with high-field electrode epoxy resin glue, firm plugged zone 14 is formed, the high-field electrode B that will be assembled
Insert in the high pressure female joint 4 of insulated handle 3, you can normal work.200mm can be produced in theory using high-field electrode B2Extremely
400mm2Large area low temperature plasma.
Insulated handle 3 includes handle casing and high pressure female joint 4；The handle casing uses polytetrafluoroethylene (PTFE) or polyethers acyl
Imines plastic processing forms, and to ensure the electrical security of device, handle casing thickness is 5mm to 7mm；High pressure female joint 4 is solid
Inside handle casing 3, the head of high pressure female joint 4 is away from the exit 14mm of insulated handle 3, and the afterbody of high pressure female joint 4 is through height
Pressure wire 3-a is connected with the output end 2-b of impedance matching box 2, the head tapping 8mm of high pressure female joint 4.
Impedance matching box 2 includes resistance, electric capacity and inductance element；Impedance matching box is resistive into resistance sense or capacitance-resistance, concatenation
Lowest impedance be 0（Metal connects）, highest impedance 1M Ω, 0 to selection 10k Ω, 20k Ω, 50k Ω, 100k between 1M Ω
Ω and 500k Ω resistance point carries out impedance configuration；The reactor worked under different conditions can be born with equivalent into different capacitives
Carry, high voltage power supply is needed to reactor while active power of output and capacitive reactive power, by adjusting inside impedance matching box 2
Tunable capacitor and controllable impedance, thus it is possible to vary the electrical characteristic of load reactor, so improve power supply efficiency and use the longevity
Life；Wherein tunable capacitor adjustable range 3pF ~ 50pF, controllable impedance adjustable range 0.6uH ~ 3uH.On the top of impedance matching box 2
There is one to there is grade adjusting knob 2-e to realize the switching between different impedance values, the adjusting knob 2-c of side can be adjusted can
Inductance value size is adjusted, adjusting knob 2-d can adjust adjustable electric capacitance size.
Control circuit includes rectification module 22, contact switch 24, closure switch 23, A DC relays 25, B direct current relays
Device 26, total power switch 27；Before connecting civil power, a total power switch 27 is concatenated on live wire；The closure of total power switch 27 is powered
Rear portion electric energy is sent to rectifier power supply module, is changed into 12V DC voltage output, and 12V DC voltage supplies two controls
Loop, a loop are formed by closure switch 23 and the tandem compound of A DC relays 25, and another loop is by the He of contact switch 24
The tandem compound of B DC relays 26 forms, and two branch road co- controllings the break-make of high voltage power supply 1；Another part electric energy is through two
High voltage power supply 1 is sent to after the A DC relays 25 and B DC relays 26 of individual series connection；In use, first close total power switch
27, switch 23 is closed again, contact switch 24 is then pinned manually and does not put, now high voltage power supply 1 is powered, and adjusts impedance matching box 2
Low temperature plasma is produced between high-field electrode and pending thing 11；High voltage power supply can be greatly improved using the control circuit
1 operating efficiency, the prolonged no-load running of power supply is avoided, and can promptly enter running status, in the process of running,
As long as finger unclamps contact switch 24, high voltage power supply 1 is powered off immediately, and other open need not be disconnected in the stopping process of short time
Close, when device needs to devote oneself to work again, it is only necessary to fix electrode position, the contact switch being manually pressed by herein on handle
24, again electric high voltage power supply 1 can devote oneself to work immediately.Meanwhile switched at the three of control circuit in a manner of concatenating logic
Arrangement, only when total power switch 27, closure switch 23, contact switch 24 are closed at, high voltage power supply could work, once
Device occur it is unexpected, as long as disconnect any one place's switch can cutoff high power supply, therefore, can be improved using the control circuit
The overall security of device.
In use, first screw in high-field electrode B in the high pressure female joint of handle 3, closure total power switch 27 and switch 23,
Contact switch 24, the regulation voltage of high voltage power supply 1 to 5kV or so are closed, the impedance of regulation impedance matching box 2 has a grade regulation button 2-
E to 500k Ω shelves, for hand-held handle by the pending thing 11 of high-field electrode B leading portion face, high-voltage potential can be transferred to high pressure copper electricity
At pole 16, the low temperature plasma of large area, regulation are produced between high-field electrode B insulated dielectric tube 15 and pending thing 11
The adjusting knob 2-c and 2-e of the side of impedance matching box 2 can adjust the intensity of electric discharge within the specific limits, improve the work of power supply
Make efficiency.In theory, caused plasma area is in 200mm2To 400mm2Between, temperature is about 20。C to 50。C。
Discharge process and plasma occurring principle explanation and application：On high pressure copper electrode 16 inside high-field electrode B
When applying high pressure, highfield can be produced near high pressure copper electrode B.The outside of high pressure copper electrode 16 has high dielectric constant
High-field electrode block media 15 can effectively pass through highfield, when high-field electrode B leading portion is treated with one in low potential
During 11 face of processed material, high voltage electric field is produced in the region between the leading portion of high-field electrode block media 15 and pending thing 11,
The electric-field intensity in space can be effectively improved by improving the magnitude of voltage put on high pressure copper electrode 16, and electric-field intensity is higher, therefore
Electronics in gap accelerates to obtain more kinetic energy in the electric field.When electric-field intensity is higher than certain value, electronic kinetic energy reaches one
Determine threshold value, collision causes surrounding heavy particle to ionize, and forms electron avalanche, and electron avalanche develops rapidly into logical through whole electric discharge
Road streamer.The high-field electrode block media 15 covered on high pressure copper electrode 16 can limit the growth of discharge current, avoid electric arc
Generation, help to be formed the plasma discharge of large area, be the advantages of the present apparatus can be produced in the environment of air it is big
The low temperature plasma of area, once caused plasma area is 200mm2To 400mm2,, temperature is about 20。C to 50。C。
Handle is equipped with, the conductive object of complicated shape and the material that part is relatively thin can be setup flexibly, if in addition, by pending thing
When changing the organism containing larger dielectric constant into（Contain more moisture in organism, the dielectric constant of water is 81, and body fluid
In contain substantial amounts of electrolyte）, when discharge power is relatively low, can directly handle human body surface.
Plasma temperature caused by this high-field electrode B and particle activity are moderate, and reaction is soft, and particle content is moderate；It is suitable
For plasma medical science for human body soft non-stimulated processing and treatment, such as skin depth cleaning, speckle removing, acne removing, whitening
Tender skin etc..
Embodiment 3
High-field electrode C includes copper gear rack 17, connection strap insulating coating 18, Y types support 19, block media pipe 20, high pressure copper
Electrode 21, support groove milling 29 and high-voltage conducting wires 28；Wherein, high pressure copper electrode 21 is in block media pipe 20, block media pipe
20 be the earthenware of a both ends open, and the pipe thickness of block media pipe 20 is 4mm, and internal diameter 9mm to 10mm, external diameter 17mm is extremely
18mm, long 16cm to 18cm；A diameter of 7mm to 9mm of high-field electrode 21, length 16cm to 18cm；High pressure copper electrode 21 is put
Enter inside block media pipe 20, and side conductive glue is smeared in the outside of high pressure copper electrode 21 and the inner side of block media pipe 20
To extrude the air that residual is seen in gap；The Y types support 19, material are polytetrafluoroethylene (PTFE) or nylon, and Y types support 19 divides to be upper
Lower two parts, there is groove milling 29 on upper and lower two binding faces；During assembling, high pressure copper electricity is first installed on lower part Y type supports
Then high-voltage conducting wires 28 are connected to Y type branch by pole 21 and block media pipe 20, and high-voltage conducting wires 28 of being arranged in groove milling along groove milling
The rear end of frame 19, it is connected with copper gear rack 17 and connection strap insulating coating 18, finally upper part Y type supports is closed and fixed.If
When coordinating the high voltage power supply of enough power using high-field electrode C, 3500mm can be produced2To 4000mm2Large area low temperature etc. from
Daughter.
Insulated handle 3 includes handle casing and high pressure female joint 4；The handle casing uses polytetrafluoroethylene (PTFE) or polyethers acyl
Imines plastic processing forms, and to ensure the electrical security of device, handle casing thickness is 5mm to 7mm；High pressure female joint 4 is solid
Inside handle casing 3, the head of high pressure female joint 4 is away from the exit 14mm of insulated handle 3, and the afterbody of high pressure female joint 4 is through height
Pressure wire 3-a is connected with the output end 2-b of impedance matching box 2, the head tapping 8mm of high pressure female joint 4.
Impedance matching box 2 includes resistance, electric capacity and inductance element；Impedance matching box is resistive into resistance sense or capacitance-resistance, concatenation
Lowest impedance be 0（Metal connects）, highest impedance 1M Ω, 0 to selection 10k Ω, 20k Ω, 50k Ω, 100k between 1M Ω
Ω and 500k Ω resistance point carries out impedance configuration；The reactor worked under different conditions can be born with equivalent into different capacitives
Carry, high voltage power supply is needed to reactor while active power of output and capacitive reactive power, by adjusting inside impedance matching box 2
Tunable capacitor and controllable impedance, thus it is possible to vary the electrical characteristic of load reactor, so improve power supply efficiency and use the longevity
Life；Wherein tunable capacitor adjustable range 3pF ~ 50pF, controllable impedance adjustable range 0.6uH ~ 3uH.On the top of impedance matching box 2
There is one to there is grade adjusting knob 2-e to realize the switching between different impedance values, the adjusting knob 2-c of side can be adjusted can
Inductance value size is adjusted, adjusting knob 2-d can adjust adjustable electric capacitance size.
Control circuit includes rectification module 22, contact switch 24, closure switch 23, A DC relays 25, B direct current relays
Device 26, total power switch 27；Before connecting civil power, a total power switch 27 is concatenated on live wire；The closure of total power switch 27 is powered
Rear portion electric energy is sent to rectifier power supply module, is changed into 12V DC voltage output, and 12V DC voltage supplies two controls
Loop, a loop are formed by closure switch 23 and the tandem compound of A DC relays 25, and another loop is by the He of contact switch 24
The tandem compound of B DC relays 26 forms, and two branch road co- controllings the break-make of high voltage power supply 1；Another part electric energy is through two
High voltage power supply 1 is sent to after the A DC relays 25 and B DC relays 26 of individual series connection；In use, first close total power switch
27, switch 23 is closed again, contact switch 24 is then pinned manually and does not put, now high voltage power supply 1 is powered, and adjusts impedance matching box 2
Low temperature plasma is produced between high-field electrode and pending thing 11；High voltage power supply can be greatly improved using the control circuit
1 operating efficiency, the prolonged no-load running of power supply is avoided, and can promptly enter operation shape after of short duration shutdown
State, in the process of running, as long as finger unclamps contact switch 24, high voltage power supply 1 powers off immediately, in the stopping process of short time not
Need to disconnect other switches, when device needs to devote oneself to work again, it is only necessary to fix electrode position, be manually pressed by handle herein
On contact switch 24, again electric high voltage power supply 1 can devote oneself to work immediately.Meanwhile at the three of control circuit switch with
Concatenating logic mode is arranged, only when total power switch 27, closure switch 23, contact switch 24 are closed at, high voltage power supply
Could work, once device occur it is unexpected, as long as disconnect any one place's switch can cutoff high power supply, therefore, using the control
Circuit processed can improve the overall security of device.
Before use, by the inside of high-field electrode C precessions insulated handle 3, one end of high pressure pin end 17 and high-voltage conducting wires 28
Connection, the other end and high pressure female joint 4 are connected through a screw thread.Total power switch 27 and switch 23 are closed, closes contact switch 24,
The voltage of high voltage power supply 1 is adjusted to 5kV or so, the impedance of regulation impedance matching box 2 has grade regulation button 2-e to 0 Ω shelves, holds hand
The pending thing 11 of high-field electrode A leading portion face, high-voltage potential can be transferred at high pressure copper electrode 21 by handle, be hindered in high-field electrode
Keep off between medium 20 and pending thing 11 and produce the low temperature plasma of large area, the regulation rotation of regulation impedance matching box 2 side
Button 2-c and 2-e can adjust the intensity of electric discharge within the specific limits, improve the operating efficiency of power supply.
Discharge process and plasma occurring principle explanation and application：On high pressure copper electrode 21 inside high-field electrode C
When applying high pressure, highfield can be produced near high pressure copper electrode C.There is higher dielectric constant around high pressure copper electrode 21
High-field electrode block media 20 can effectively pass through highfield, when high-field electrode A leading portion and treating for low potential
During 11 face of processed material, high voltage electric field is produced in the region between the leading portion of high-field electrode block media 20 and pending thing 11,
The electric-field intensity in space can be effectively improved by improving the magnitude of voltage put on high pressure copper electrode 21, and electric-field intensity is higher, therefore
Electronics in gap accelerates to obtain more kinetic energy in the electric field.When electric-field intensity is higher than certain value, electronic kinetic energy reaches one
Determine threshold value, collision causes surrounding heavy particle to occur to ionize and formed electron avalanche, and electron avalanche is developed rapidly into through whole electric discharge
Passage streamer.The high-field electrode block media 20 covered on high pressure copper electrode 21 can limit the growth of discharge current, avoid electricity
The generation of arc, help to form the plasma discharge of large area.The advantages of present apparatus is can be produced in the environment of air
The low temperature plasma of large area, once caused plasma area is 3500mm2To 4000mm2,, temperature is about 20。C is extremely
50。C, the handle of outfit can allow user that the conductive object of complicated shape and the material that part is relatively thin is setup flexibly.
This high-field electrode C has the advantages that machining area is big, processing flexibility is high, strength of discharge is high, in thin-film material table
There is certain advantage in terms of the processing of face：Contain substantial amounts of oxygen-content active particle in air in caused plasma, have enough
Energy acts on material surface, opens material surface chemical bond, introduces hydrophilic radical, and then improve material surface energy and material
The hydrophily on surface, therefore high-field electrode C can be used for automotive interior jewelry surface treatment, electronic product screen film, compound
The fields such as the interlayer of sheet material is handled, greenhouse film surface treatment.Operation is flexibly, discharge efficient high-field electrode C, can be also used for
The sterilizing of field of food food, when processing contains the food of certain moisture, high-field electrode C can be carried out with foodstuff surface
Active group is produced during charge-exchange（Such as hydroxyl and oxygen atom）And active material（Such as ultraviolet and ozone）, can not produce
Effective surface colony inactivation is carried out on the premise of raw any residuals, extends the holding time of food.
Claims (6)
- A kind of 1. large area low temperature plasma generating means, it is characterized in that including control circuit, high voltage power supply, impedance matching Device, insulated handle, high pressure female joint, high-field electrode, pending thing；Wherein, the delivery outlet negative pole ground connection of high voltage power supply, high-tension electricity The delivery outlet positive pole in source is connected with the input of impedance matching box；The output end of impedance matching box passes through high-voltage conducting wires and insulation hand One end of high pressure female joint inside handle is connected；The other end of high pressure female joint is connected with high-field electrode；High voltage power supply and civil power Between be connected to control circuit；Low temperature plasma is produced between high-field electrode and the pending thing of ground connection and is directly acted on and is treated Object between the surface of processed material or electrode and pending thing；Described high-field electrode is one kind in high-field electrode A, high-field electrode B, high-field electrode C；It is exhausted that described high-field electrode A includes high pressure pin end, A connection straps insulating coating, high voltage electrode insulation overcoat, high-field electrode Edge epoxy glue, high-field electrode block media, high pressure copper electrode；Wherein, insulating coating parcel high pressure copper electrode, A connection bar insulations Outer sheath covers high pressure pin end；High voltage electrode insulation epoxy gemel connection A connection straps insulating coating and high pressure pin end, and be fixed on The rear end of high pressure copper electrode, prevents electric arc from leaking electricity；The leading portion of high pressure copper electrode fixes high-field electrode block media；The high-tension electricity Pole insulating coating material is polytetrafluoroethylene (PTFE) or PEI, internal diameter 20mm-23mm, external diameter 31mm-36mm；The high pressure copper Electrode outside dimension 20mm-23mm；The high-field electrode block media is quartz glass plate, and its thickness is 0.5mm-1.5mm, directly Footpath is 34mm；The high pressure pin end is copper gear rack, and its length is 20mm-25mm；A connection strap insulating coatings are wrapped in high pressure public affairs Among joint, the length of A connection strap insulating coatings is 15mm-18mm, and A connection strap insulating coatings material is silicon rubber；In use, by the inside of high-field electrode precession insulated handle, one end of high pressure pin end is connected with high pressure copper electrode, high pressure The other end of pin end and high pressure female joint are connected through a screw thread, and are produced between high-field electrode block media and pending thing big Area low temperature plasma, high-field electrode A produce 800mm2-1000mm2Low temperature plasma；Described high-field electrode B includes copper gear rack, B connection straps insulating coating, insulated dielectric tube, high pressure copper electrode；Wherein, high pressure Copper electrode is bonded with dielectric inside pipe wall, and B connection straps insulating coating parcel copper gear rack simultaneously exposes copper gear rack both ends, and copper gear rack connects Connect high pressure copper electrode afterbody；During assembling, high pressure copper electrode is filled in the bottom of insulated dielectric tube so that high pressure copper electrode pastes with dielectric inside pipe wall Close, and one layer of conductive glue of smearing drains the air between high pressure copper electrode and insulated dielectric tube, high pressure copper electricity therebetween One of diameter 6mm-8mm nut is attacked in pole tail end face middle, and the copper gear rack that will be covered with connection strap insulating coating is screwed into height Copper electrode afterbody is pressed, and is blocked with high-field electrode epoxy resin glue, forms firm plugged zone, the high pressure that will be assembled In the high pressure female joint of electrode B insertion insulated handle；During work, high-field electrode B produces 200mm2-400mm2Low temperature plasma；The insulated dielectric tube material is earthenware, and ceramic tube thickness is 5mm-7mm；High pressure copper electrode external diameter is 7mm-8mm, high Press the shape that copper electrode bottom is in radian same with insulated dielectric tube；The high-field electrode C includes copper gear rack, C connection straps insulating coating, Y types support, block media pipe, high pressure copper electrode, branch Frame groove milling, high-voltage conducting wires；Wherein, high pressure copper electrode is in block media pipe, and Y type supports are divided into two parts up and down, upper and lower There is support groove milling on two binding faces, the both ends of high pressure copper electrode and block media pipe are connected with the top and the bottom of Y type supports；It is high Pressure wire is arranged in support groove milling, and high-voltage conducting wires one end is connected with copper gear rack, and the other end is connected with high pressure copper electrode；C connections Bar insulation outer sheath covers copper gear rack simultaneously exposes copper gear rack both ends；The earthenware of described Guan Weiyi both ends open of block media, the pipe thickness of block media pipe is 4mm, internal diameter 9mm- 10mm, external diameter 17mm-18mm, long 16cm-18cm；A diameter of 7mm-9mm of high-field electrode, length 16cm-18cm；The Y types Support, material are polytetrafluoroethylene (PTFE) or nylon；During assembling, high pressure copper electrode is put into inside block media pipe, and in the outside of high pressure copper electrode and block media pipe Inner side smear side conductive glue to extrude the air that residual is seen in gap, on lower part Y type supports install high pressure copper electrode and Block media pipe, and high-voltage conducting wires of being arranged in groove milling, then by high-voltage conducting wires after support groove milling is connected to Y type supports End, is connected with copper gear rack and connection strap insulating coating, finally closes upper part Y type supports and fix；During work, high-field electrode C produces 3500mm2-4000mm2The low temperature plasma of area.
- A kind of 2. large area low temperature plasma generating means according to claim 1, it is characterized in that described control electricity Road includes rectification module, contact switch, closure switch, A DC relays, B DC relays, total power switch；Wherein, total electricity Source switch is connected on live wire；Total power switch closure energization rear portion electric energy is sent to rectifier power supply module, is changed into 12V Direct voltage output, two loops of 12V DC voltage output, a loop route closure switch and A DC relay series connection groups Conjunction is formed, and another circuit branch is formed by contact switch and B DC relay tandem compounds, and two branch road co- controllings high pressure The break-make of power supply；Another part electric energy is sent to high voltage power supply after the A DC relays and B DC relays of two series connection；In use, first closing total power switch, switch is closed again, then presses contact switch, now high voltage power supply is powered, adjustment Impedance matching box produces low temperature plasma between high-field electrode and pending thing；High-tension electricity can be improved using the control circuit The operating efficiency in source, the prolonged no-load running of power supply is avoided, and can promptly enter running status, in the process of running, Contact switch is pressed, high voltage power supply is powered off immediately, and other switches need not be disconnected in the stopping process of short time, and device needs weight When newly devoting oneself to work, again by the contact switch on lower handle, obtain electric high voltage power supply and devote oneself to work immediately；Meanwhile control electricity Switch is arranged in a manner of concatenating logic at the three of road, when total power switch, closure switch, contact switch are closed at, high pressure Power supply just works, can cutoff high power supply as long as disconnecting any one place's switch once device occurs surprisingly.
- A kind of 3. large area low temperature plasma generating means according to claim 1, it is characterized in that described impedance Orchestration includes resistance, electric capacity and inductance element；Resistive impedance value is concatenated in 0 M Ω -1M Ω, selection 10k Ω, 20k Ω, 50k Ω, 100k Ω and 500k Ω resistance point carry out impedance configuration；When working in different conditions, impedance matching box is equivalent into difference Capacitive load, high voltage power supply is to impedance matching box active power of output and capacitive reactive power；Wherein, tunable capacitor regulation model 3pF ~ 50pF, controllable impedance adjustable range 0.6uH ~ 3uH are enclosed, has one to have a grade adjusting knob to be used on the top of impedance matching box The switching between different impedance values is realized, the controllable impedance adjusting knob of side is used for adjusting controllable impedance numerical values recited, adjustable Capacitance adjustment knob is used for adjusting adjustable electric capacitance size.
- A kind of 4. large area low temperature plasma generating means according to claim 1, it is characterized in that described high-tension electricity Source produces high-frequency and high-voltage waveform or high voltage pulse waveform to impedance matching box after being powered；Impedance matching box output voltage terminal and high pressure Electrode is connected, and forms a High Pressure Difference relative to ground connection zero potential；High-field electrode in high-voltage potential amplitude with it is pending Large area low temperature plasma is produced between thing, directly acts on pending thing surface.
- A kind of 5. large area low temperature plasma generating means according to claim 1, it is characterized in that described insulation hand Handle includes handle casing, high pressure female joint and high-voltage conducting wires；Its mesohigh female joint is fixed on inside handle casing, and high pressure mother connects Head portion is away from insulated handle exit 10mm-20mm, output of the afterbody through high-voltage conducting wires and impedance matching box of high pressure female joint End is connected, the head tapping 6mm-8mm of high pressure female joint, and the handle casing is moulded using polytetrafluoroethylene (PTFE) or PEI Material is process, and handle casing thickness is 5mm-7mm.
- 6. a kind of large area low temperature plasma generating means according to claim 1, it is characterized in that described low temperature etc. from The temperature of daughter is 20 DEG C -50 DEG C.
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| CN107148139A (en) * | 2017-05-22 | 2017-09-08 | 苏州屹润食品科技有限公司 | A kind of cold sterilization excitation apparatus of high voltage electric field low temperature plasma |
| CN109121277A (en) * | 2018-08-23 | 2019-01-01 | 国网天津市电力公司电力科学研究院 | A kind of dielectric barrier discharge system and method improving rubber surface hydrophilicity |
| CN109498997B (en) * | 2018-12-28 | 2024-03-22 | 清华大学深圳研究生院 | Plasma-induced tissue regeneration device |
| CN111228649B (en) * | 2020-01-15 | 2023-07-11 | 合肥中科离子医学技术装备有限公司 | Low-temperature plasma generating device with adjustable strength |
| CN111568530B (en) * | 2020-05-19 | 2021-04-13 | 北京理工大学 | Low-temperature plasma-based hemostasis and sterilization micro-system and method thereof |
| CN112169179A (en) * | 2020-10-10 | 2021-01-05 | 罗璐 | Excimer lamp and beauty instrument of cecum work |
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