CN105981230A - 固定接点 - Google Patents

固定接点 Download PDF

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Publication number
CN105981230A
CN105981230A CN201580007716.7A CN201580007716A CN105981230A CN 105981230 A CN105981230 A CN 105981230A CN 201580007716 A CN201580007716 A CN 201580007716A CN 105981230 A CN105981230 A CN 105981230A
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base material
fixed contact
coating
contact
resistivity
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伊藤义贵
近藤贵哉
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Yazaki Corp
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Yazaki Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R13/00Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
    • H01R13/02Contact members
    • H01R13/03Contact members characterised by the material, e.g. plating, or coating materials
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/54Contact plating, i.e. electroless electrochemical plating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/30Electroplating: Baths therefor from solutions of tin
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00Contacts
    • H01H1/02Contacts characterised by the material thereof
    • H01H1/04Co-operating contacts of different material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00Contacts
    • H01H1/12Contacts characterised by the manner in which co-operating contacts engage
    • H01H1/36Contacts characterised by the manner in which co-operating contacts engage by sliding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H11/00Apparatus or processes specially adapted for the manufacture of electric switches
    • H01H11/04Apparatus or processes specially adapted for the manufacture of electric switches of switch contacts
    • H01H11/041Apparatus or processes specially adapted for the manufacture of electric switches of switch contacts by bonding of a contact marking face to a contact body portion
    • H01H2011/046Apparatus or processes specially adapted for the manufacture of electric switches of switch contacts by bonding of a contact marking face to a contact body portion by plating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R4/00Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
    • H01R4/28Clamped connections, spring connections
    • H01R4/48Clamped connections, spring connections utilising a spring, clip, or other resilient member

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Contacts (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

一种移动接点(9)在其上滑动的固定接点(1),包括基材(3)和覆盖基材(3)的镀层(5)(例如,锡等)。基材(3)包括具有比镀层(5)高的电阻率的铜或铝合金或不锈钢等的板材。

Description

固定接点
技术领域
本发明涉及一种移动接点在其上滑动的固定接点。
背景技术
在移动接点或移动接点在其上滑动的固定接点中,其表面通常覆盖有镀层。具体地,已知:为了减小两个接点之间的摩擦阻力以使得移动接点能够相对于固定接点平顺地滑动,利用锡(Sn)来电镀固定接点的表面。同时,为了减小移动接点与固定接点之间的电阻,通常使用具有比锡(Sn)低的电阻率的银(Ag)来电镀(参见专利文献1)。
引用列表
专利文献
专利文献1:JP 2013-189680A
发明内容
然而,使用作为贵金属的银的电镀不利地引起了高的材料成本。因此,为了避免这样的高的材料成本,如果试图通过增加移动接点与固定接点之间的接触区域而减小电阻,则该尝试将使这些接点或包括这些接点的连接器的尺寸增大。
因此,在以上情况下,本发明的目的是提供一种固定接点,能够使该固定接点与移动接点的电阻保持得小,而不导致成本和尺寸的增加。
为了实现以上目的,根据本发明的第一方面,一种移动接点在其上滑动的固定接点,包括基材和构造成覆盖基材的被覆层。基材由具有比被覆层高的电阻率的材料制成。
由于基材的电阻率比被覆层高,所以与基材的内部相比,在固定接点中流动的电流在被覆层内的宽范围中扩散。从而,即使基材不覆盖有使用了展现出低电阻率的贵金属的被覆层,而是覆盖有使用了非贵金属的被覆层,在该被覆层内流动的电流也在宽范围中扩散,从而使得电流能够同样在基材内在宽范围中流动。
因此,尽管移动接点与固定接点的接触区域不增大,但是增大了基材的使得电流能够流动的区域,同时将固定接点的电阻率保持得低,从而使得能够将与移动接点的电阻(接触阻抗)保持得低,而不导致尺寸和成本的增加。
被覆层可以包括彼此层叠的不同材料的多层。在这种情况下,期望多层中的靠近所述基材的一层由具有比靠近所述被覆层的表面的另一层高的电阻率的材料制成。
利用这样的构造,虽然不将电阻率大幅度下降的材料用于各层,但是使得电流能够在各层中流动的区域逐渐增大,以扩大了基材的使得电流能够极大地流动的区域,从而使得能够将电阻率保持得低。
所述被覆层可以由锡(Sn)制成。
利用根据本发明的方面的固定接点,能够保持其与移动接点的电阻(接触阻抗)低,而不导致尺寸和成本的增加。
附图说明
图1是图示出根据第一实施例的固定接点的说明图。
图2是图示出与固定接点的接触区域增大的第一比较例的移动接点的说明图。
图3是图示出镀层的电阻率比基材的电阻率高的第二比较例的移动接点的说明图。
图4是图示出根据第二实施例的固定接点的说明图。
具体实施方式
下面将参考附图描述根据实施例的固定接点。在实施例中,以电动车辆(EV)或混合动力车辆(HEV,使用发动机和电动发电机二者的车辆)的大电流在固定接点与移动接点之间流动的实例进行说明。
如图1所示,根据第一实施例的固定接点1通过利用镀层(被覆层)5覆盖基材3的表面而构成,并且容纳在阳连接器壳体(未示出)中。
镀层5的表面5a覆盖有抗氧化膜7。抗氧化膜7构成固定接点1的滑动面1a,在阳连接器与阴连接器配合时,容纳在阴连接器壳体(未示出)中并且具有弓形截面的移动接点9在滑动面1a上滑动。
当镀层5的电阻率(体积电阻率)由“ρ”表示,固定接点1与移动接点9之间的接触半径由“a”表示,抗氧化膜7的电阻率(体积电阻率)由“ρf”表示,并且抗氧化膜7的厚度由“d”表示时,则镀层5与移动接点9之间的接触阻抗(电阻)“R”能够通过下面的等式表示:R=(ρ/2a)+ρf d/πa^2。
在根据第一实施例的固定接点1中,基材3包括由例如铜(Cu)、铝(Al)合金或不锈钢制成的板材,同时电镀在基材3的表面上的镀层5由具有比该基材3低的电阻率的材料例如锡(Sn)制成。
由于在如此构成的固定接点1中,基材3的电阻率比镀层5的电阻率高,所以与基材3中的范围相比,在固定接点1中流动的电流在镀层5中以宽范围扩散,如图1中的虚线箭头代表性地(typically)所示。从而,即使不采用诸如银(Ag)这样的展现出低电阻率的贵金属,而是采用作为非贵金属的锡(Sn)用于镀层5,电流也在镀层5中以宽范围扩散,从而使得与移动接点9在基材3上直接滑动的配置相比,电流能够在基材3中的宽范围内流动。
因此,利用图1所示的根据第一实施例的固定接点1,尽管移动接点9A并未如在图2所示的第一比较例中一样构造成增大其与固定接点1A的接触区域,但是与如在图3所示的第二比较例中的包括具有比基材3高的电阻率的镀层5A的固定接点1B相比,基材3的使得电流能够流动的区域增大,同时将固定接点1的电阻率保持得低。从而,能够将与移动接点9的电阻保持得低,而不导致尺寸和成本的增加。
注意,在第一实施例中,由于镀层5形成在基材3的表面上,所以固定接点1形成有被覆层。然而,对于固定接点1上的被覆层的形成,存在除了电镀之外的其它可用方法,例如,气相沉积法、溅射法等。可选择地,由于固定接点包括通过将基材与具有比基材低的电阻率的薄板粘合在一起而得到的覆层材料,所以可以设置被覆层。
如在图4所示的根据第二实施例的固定接点1C中,图1的根据第一实施例的固定接点1中的镀层(被覆层)5可以由包括第一层5b和第二层5c的层叠体(被覆层)5d替换,能够通过利用第一层5b覆盖基材3的表面并且随后利用第二层5c覆盖第一层5b的表面而得到该层叠体(被覆层)5d。
然后,对于第一层5b,采用了电阻率(体积电阻率)比基材3低的材料。另外,对于第二层5c,采用电阻率(体积电阻率)比第一层5b低的材料。
从而,尽管基材3的表面未由具有比基材3的电阻率低很多的电阻率的单一材料覆盖,但是使得电流能够流动的区域在第一层5b和第二层5c中逐渐增大,如图4中的虚线箭头代表性地所示,从而使得基材3的容许电流流动的区域扩大到宽范围,同时将固定接点1C的电阻率保持得低。
注意,第一层5b或第二层5c的层叠可以通过除了电镀之外的气相沉淀或溅射来实现。可选择地,包括通过将第一层5b与第二层5c互相粘合而得到的覆层材料的层叠体5d可以层叠在基材3的表面上。
另外,与第一实施例和第二实施例一样,虽然当阳连接器与阴连接器配合时,阴连接器壳体的移动接点9适于在容纳于阳连接器壳体中的固定接点1、1C的滑动面1a上滑动,但是本发明不仅限于此,并且因此,本发明能够广泛地应用于具有移动接点在其上滑动的滑动面的固定接点。
工业实用性
通过将本发明应用于具有移动接点在其上滑动的滑动面的固定接点,本发明将是极其有用的。

Claims (3)

1.一种移动接点在其上滑动的固定接点,包括:
基材;和
被覆层,该被覆层构造成覆盖所述基材,其中
所述基材由具有比所述被覆层高的电阻率的材料制成。
2.根据权利要求1所述的固定接点,其中
所述被覆层包括彼此层叠的不同材料的多层,并且
所述多层中的靠近所述基材的一层由具有比靠近所述被覆层的表面的另一层高的电阻率的材料制成。
3.根据权利要求1或2所述的固定接点,其中
所述被覆层由锡制成。
CN201580007716.7A 2014-02-07 2015-01-28 固定接点 Pending CN105981230A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014022144A JP2015149218A (ja) 2014-02-07 2014-02-07 固定接点
JP2014-022144 2014-02-07
PCT/JP2015/052318 WO2015119010A1 (ja) 2014-02-07 2015-01-28 固定接点

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CN105981230A true CN105981230A (zh) 2016-09-28

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US (1) US20160344126A1 (zh)
JP (1) JP2015149218A (zh)
CN (1) CN105981230A (zh)
DE (1) DE112015000681T5 (zh)
WO (1) WO2015119010A1 (zh)

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DE112015000681T5 (de) 2016-12-29
JP2015149218A (ja) 2015-08-20
WO2015119010A1 (ja) 2015-08-13
US20160344126A1 (en) 2016-11-24

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