CN105938212A - Transmission type color filter and preparation method thereof - Google Patents

Transmission type color filter and preparation method thereof Download PDF

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Publication number
CN105938212A
CN105938212A CN201610478993.2A CN201610478993A CN105938212A CN 105938212 A CN105938212 A CN 105938212A CN 201610478993 A CN201610478993 A CN 201610478993A CN 105938212 A CN105938212 A CN 105938212A
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layer
dielectric layer
thickness
transmission
sputter
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CN105938212B (en
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王平
吕志平
张玉春
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Zhangjiagang Kangdexin Optronics Material Co Ltd
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Zhangjiagang Kangdexin Optronics Material Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • G02B5/286—Interference filters comprising deposited thin solid films having four or fewer layers, e.g. for achieving a colour effect
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C23C14/0652—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Laminated Bodies (AREA)

Abstract

The present invention provides a transmission type color filter and a preparation method thereof. The transmission type color filter comprises a base material layer (1); a first metal layer (2), a dielectric layer (3) and a second metal layer (4) are sequentially arranged on the base material layer (1); the thickness of the dielectric layer (3) is T; the refractive index of the dielectric layer (3) is N; and N and T satisfy a relational expression that N*T>=4*lambda/4, wherein lambda is the wavelength of visible light and ranges from 400 to 700nm. The peak transmittance of the transmission type color filter ranges from 60% to 100% at three peaks of RGB, and the transmittance of the transmission type color filter is smaller than 30% at wavelengths of 490nm and 590nm. The three-peak filtering function of the RGB can be realized through a simple three-layer film stack; and the R2R large-scale production of the transmission type color filter can be made possible based on sputtering and coating processes, and the transmission type color filter and the preparation method thereof have broad application prospects.

Description

Transmission-type colored filter and preparation method thereof
Technical field
The present invention relates to optical element technology field, be specifically related to a kind of transmission-type colored filter.
Technical background
Being mainly absorption-type colored filter in existing market upper filter, the shortcoming of the optical filter of the type exists Can decline in the ability filtered in time, and have the light loss of more than 60%, cause the fall of actual transmitance Low, reason is that absorptive-type optical filter outside non-rgb light, also can absorb quite a few in addition to absorbing Rgb light.The Chinese patent CN105137518A of Zhejiang University proposes one and uses medium/metal/metal knot The optical filter of structure, carrys out the unimodal optical filtering merit in 400～700nm all-wave length by controlling the thickness of middle dielectric layer Can, realized by reflection rather than absorption, the problem not having decline, there is higher transmitance；But The defect existed is that such optical filter can be only formed unimodal perspective, as RGB multimodal to be realized is had an X-rayed, then needs Want three kinds of optical filters of different-thickness, thus cause the display element thickness applying this optical filter increased, Cost also can uprise.The present invention is that the single optical filter of the one proposed on its basis can realize RGB multimodal The technical scheme of transmission.
Invention particular content:
One object of the present invention provides a kind of transmission-type coloured silk being combined preparation by coating process and sputtering process Colo(u)r filter structure, is carried out the accurate control of thickness of dielectric layers, thus realizes utilizing individual by sputtering process Optical filter can carry out the purpose of RGB multimodal transmission.
Another object of the present invention, it is provided that the preparation method of above-mentioned transmission-type colored filter.
For achieving the above object, the technical scheme that the present invention is concrete is:
A kind of transmission-type colored filter, it is characterised in that including: include substrate layer, on described substrate layer Being sequentially provided with the first metal layer, dielectric layer and the second metal level, the thickness of described dielectric layer is T, and refractive index is N, N*T >=4* λ/4, λ is the wavelength of visible ray, and scope is 400～700nm.
Preferably, described dielectric layer includes that stacking arranges coating dielectric layer and sputter dielectric layer, and described coating is situated between Matter layer is arranged on described the first metal layer upper surface.
Preferably, the thickness of described coating dielectric layer is 300～1500nm, and refractive index is 1.4～5.
Preferably, the refractive index of described sputter dielectric layer is identical with the refractive index of described coating dielectric layer, described The material of sputter dielectric layer is selected from SiOx or SiNy, wherein 0 ＜ x≤2,0 ＜ y≤2.
The refractive index of described sputter dielectric layer is identical with the refractive index of described coating dielectric layer is whole in order to unify The refractive index of dielectric layer, the primary position being used for accurately controlling transmission crest.
Coating dielectric layer is coated with one layer of thicker dielectric layer, the main component of coating fluid by wet coating technique For acrylics hardening bath.Sputter dielectric layer plates the dielectric layer of layer by sputtering process, such as SiOx Or SiNx, can accurately control thickness of dielectric layers by sputtering process, thus control the quantity of crest transmission And position.
Thickness of dielectric layers illustrates with the principle of transmission crest number:
As shown in Figure 2:
The wavelength of reference visible ray is 550nm,
N0 is air layer refractive index, refractive index=1,；
N1 is coating refractive index, and refractive index assumes=1.52；
N2 is substrate layer refractive index, and refractive index assumes=1.66；
When thickness of coating T meets following condition, the light that upper and lower two interfaces reflect can produce cancellation Interfere, form reflection a Valley, i.e. transmission Peak, on the wave band near reference wavelength 550nm scope Owing to being unsatisfactory for destructive interference condition, transmitance declines.
During 2*N1*T=(m+1/2) λ, m=0,1,2 ... integer；
N1*T is referred to as optical thickness；
When thickness about 90nm, N1*T are referred to as 1 QWOT (Quarter-Wave Optical Thickness), The optical thickness of 1/4th wavelength, 1QWOT=550/4nm=137.5nm, when dielectric layer is at 90nm Left and right, refractive index when 1.52, product=1QWOT, 1 transmission peaks occurs；
When thickness increases, when optical thickness is close to 4 QWOT thickness, there will be about 2 in visible region Individual transmission peaks；
When thickness increases, when optical thickness is close to 7 QWOT thickness, there will be about 3 in visible region Individual transmission peaks；
When thickness continues to increase, it may appear that more transmission peaks.
When being applied to metal/dielectric/metal film layer result of the present invention, principle is identical.
Preferably, the thickness of described substrate layer is 50～200 μm, and refractive index is 1.4～1.7.
Preferably, the material of described substrate layer is selected from PET or the glass scribbling hardened layer, described hardened layer Thickness is 1～3 μm.
Preferably, the material of described the first metal layer and the second metal level is selected from Au, Ag, Cu, Al or Cr In one or more, the thickness of described the first metal layer is 12～30nm, the thickness of described second metal level It is 12～30nm.
The most above-mentioned four layers of the primary structure of described transmission-type colored filter, other auxiliary function layer (such as tables Face antireflective film, substrate surface Obstruct membrane, surface steam or Scratch-prevention film) can additionally add.
The preparation method of transmission-type colored filter as above, it is characterised in that comprise the steps:
1) selection PET or glass are as substrate layer, sputter the first metal layer on described substrate layer；
2) arranging dielectric layer on described the first metal layer, described dielectric layer completes in two steps: the first step uses Coating process is coated with the coating dielectric layer that a layer thickness is 300～1500nm on described the first metal layer；Second step One layer of sputter dielectric layer of sputter on described coating dielectric layer, sputter material is selected from SiOx or SiNy, wherein 0 ＜ x≤2,0 ＜ y≤2.
The thickness of dielectric layer is made to meet N*T >=4* λ/4, wherein, T by controlling the thickness of sputter dielectric layer For the thickness of dielectric layer, N is the refractive index of dielectric layer, and λ is the wavelength of visible ray, and scope is 400～700nm；
3) sputter the second metal level on described sputter dielectric layer.
Preferably, described PET scribbles hardened layer, and described thin hardened layer is 1～3 μm.
Preferably, the material of described the first metal layer and the second metal level is selected from Au, Ag, Cu, Al or Cr In one or more, the thickness of described the first metal layer is 12～30nm, the thickness of described second metal level It is 12～30nm.
Beneficial effect:
The film layer structure of a kind of transmission-type colored filter sputtering and being coated with hybrid technique that the present invention provides, First use sputtering method one layer of thin metal layer of plating, then realize thicker dielectric layer plated film by wet coating technique, Then carry out the accurate control of thickness of dielectric layers by sputtering technology, and sputter uppermost metal level.Overall The peak transmittance at RGB tri-peak of film system is between 60%～100%, at 490nm and 590nm wavelength Place's transmitance, less than 30%, just realizes the three peak filtering functions of RGB by simple trilamellar membrane system, utilizes sputtering With coating hybrid technique, make the R2R scale of mass production of the type be possibly realized, have broad application prospects.
Accompanying drawing illustrates:
Below in conjunction with structural representation and embodiment, the present invention is further described.
Fig. 1 is the structural representation of transmission-type colored filter of the present invention；
Fig. 2 is interface light interference schematic diagram；
Fig. 3 be the optical thickness of dielectric layer be transmitted spectrum figure during 1 QWOT；
Fig. 4 be the optical thickness of dielectric layer be transmitted spectrum figure during 1.5 QWOT；
Fig. 5 be the optical thickness of dielectric layer be transmitted spectrum figure during 4 QWOT；
Fig. 6 be the optical thickness of dielectric layer be transmitted spectrum figure during 10.7 QWOT；
Wherein, 1, substrate layer, 2, the first metal layer, 3, dielectric layer, the 4, second metal level, 31, be coated with
Cloth dielectric layer, 32, sputter dielectric layer.
Detailed description of the invention:
In order to make the purpose of the present invention, technical scheme and advantage clearer, below in conjunction with accompanying drawing and reality Execute example, invention is further elaborated.Only should be appreciated that specific embodiment described herein In order to explain the present invention, it is not intended to limit the present invention.
Embodiment
As shown in Figure 1: a kind of transmission-type colored filter, including: include substrate layer 1, described substrate layer 1 On be sequentially provided with the first metal layer 2, dielectric layer 3 and the second metal level 4, the thickness of described dielectric layer 3 is T, Refractive index is N, N*T >=4* λ/4, and λ is the wavelength of visible ray, and scope is 400～700nm.
Preferably, described dielectric layer 3 includes that stacking arranges coating dielectric layer 31 and sputter dielectric layer 32, described Coating dielectric layer 31 is arranged on described the first metal layer 2 upper surface.
Preferably, the thickness of described coating dielectric layer 31 is 900nm, and refractive index is 1.52.
Preferably, the refractive index of described sputter dielectric layer 32 is identical with the refractive index of described coating dielectric layer 31, The material of described sputter dielectric layer 32 is selected from SiO2Or SiN2。
The refractive index of described sputter dielectric layer 32 is identical with the refractive index of described coating dielectric layer 31 is to unite The refractive index of one whole dielectric layer 3, the primary position being used for accurately controlling transmission crest.
Coating dielectric layer is coated with one layer of thicker dielectric layer, the main component of coating fluid by wet coating technique For acrylics hardening bath.Sputter dielectric layer plates the dielectric layer of layer by sputtering process, such as SiO2 Or SiN2, can accurately control thickness of dielectric layers by sputtering process, thus control the quantity of crest transmission And position.
Preferably, the thickness of described substrate layer 1 is 120 μm, and refractive index is 1.53.
Preferably, the material of described substrate layer 1 is selected from PET or the glass scribbling hardened layer, described hardened layer Thickness be 0.96 μm.
Preferably, the material of described the first metal layer 2 and the second metal level 4 is selected from Au, Ag, Cu, Al Or one or more in Cr, the thickness of described the first metal layer 2 is 16nm, described second metal level 4 Thickness be 14nm.
The most above-mentioned four layers of the primary structure of described transmission-type colored filter, other auxiliary function layer (such as tables Face antireflective film, substrate surface Obstruct membrane, surface steam or Scratch-prevention film) can additionally add.
The preparation method of transmission-type colored filter as above, it is characterised in that comprise the steps:
1) select PET or glass as substrate layer 1, sputter the first metal layer 2 on described substrate layer 1；
2) arranging dielectric layer 3 on described the first metal layer 2, described dielectric layer 3 completes in two steps: first Step uses coating process to be coated with the coating dielectric layer that a layer thickness is 300～1500nm on described the first metal layer 2 31；Second step is one layer of sputter dielectric layer 32 of sputter on described coating dielectric layer 31, and sputter material is selected from SiO2 Or SiN2。
The thickness of dielectric layer 3 is made to meet N*T >=4* λ/4 by controlling the thickness of sputter dielectric layer 32, its In, T is the thickness of dielectric layer 3, and N is the refractive index of dielectric layer 3, and λ is the wavelength of visible ray, and scope is 400～700nm；
3) sputter the second metal level 4 on described sputter dielectric layer 32.
Embodiment transmission peaks position measurement result:
In present example, structure is the first metal layer 2/ dielectric layer 3/ second metal level 4, if dielectric layer 3 Thickness is T, refractive index N, is 550nm with reference to visible wavelength λ；
As shown in Figure 3: when optical thickness N*T=1 QWOT (λ/4), at 450nm wavelength (green glow) Neighbouring there is 1 transmission peaks；
As shown in Figure 4: along with N*T increases, as reached 1.5 QWOT, this transmission peaks is moved toward long wave Dynamic, the transmission peaks of 615nm (HONGGUANG) occurs；
As shown in Figure 5: when N*T reaches 4 QWOT, two transmission peaks occur in visible region, It is respectively 434nm (blue light) and 659nm (HONGGUANG)；
Along with N*T continues to increase, two transmission peaks move toward long wave together, and between peak, wavelength interval shortens；
As shown in Figure 6: when N*T is more than 7 QWOT, during as reached 10.7 QWOT, can Seeing that three transmission peaks occurs in light region, respectively 450nm (blue light), 524nm (green glow) and 627nm are (red Light), RGB multimodal transmission can be realized；
Along with N*T continues to increase, three transmission peaks move toward long wave together, and between peak, wavelength interval shortens； Until the 4th transmission peaks；
When thickness continues to increase, it may appear that more transmission peaks.
By above-mentioned experimental result it can be seen that transmission-type colored filter of the present invention only need to control centre The thickness of dielectric layer 3 is obtained with dichroic filter or three-colour filter, and the position of transmission crest Also can continuous moving as required.The thickness controlling dielectric layer 3 is then by coating process and to spatter The method that depositing process combines realizes, and i.e. realizes thicker dielectric layer plated film, then by wet coating technique The accurate control of thickness of dielectric layers is carried out by sputtering technology.
The foregoing is only the preferred embodiment of invention, be not limiting as the present invention, all spirit in the present invention and Amendment, equivalent and the improvement etc. made within principle, should be included within the scope of the present invention. Attempt according to this present invention is made any restriction in form, therefore all have made under identical spirit Any modification of the relevant present invention or change, all must be included in the category that the invention is intended to protection.

Claims (10)

1. a transmission-type colored filter, it is characterised in that including: substrate layer (1), described base material It is sequentially provided with the first metal layer (2), dielectric layer (3) and the second metal level (4) on layer (1), is given an account of The thickness of matter layer (3) is T, and refractive index is N, N*T >=4* λ/4, and λ is the wavelength of visible ray, scope It is 400～700nm.
Transmission-type colored filter the most according to claim 1, it is characterised in that described dielectric layer (3) Arranging coating dielectric layer (31) and sputter dielectric layer (32) including stacking, described coating dielectric layer (31) sets Put at described the first metal layer (2) upper surface.
Transmission-type colored filter the most according to claim 2, it is characterised in that described coating medium The thickness of layer (31) is 300～1500nm, and refractive index is 1.4～5.
Transmission-type colored filter the most according to claim 2, it is characterised in that described sputter medium The refractive index of layer (32) is identical with the refractive index of described coating dielectric layer (31), described sputter dielectric layer (32) Material selected from SiOx or SiNy, wherein 0 ＜ x≤2,0 ＜ y≤2.
Transmission-type colored filter the most according to claim 1, it is characterised in that described substrate layer (1) Thickness be 50～200 μm, refractive index is 1.4～1.7.
Transmission-type colored filter the most according to claim 5, it is characterised in that described substrate layer (1) Material selected from scribbling PET or the glass of hardened layer, the thickness of described hardened layer is 1～3 μm.
Transmission-type colored filter the most according to claim 1, it is characterised in that described first metal One or more in Au, Ag, Cu, Al or Cr of the material of layer (2) and the second metal level (4), The thickness of described the first metal layer (2) is 12～30nm, and the thickness of described second metal level (4) is 12～30nm.
8. the preparation method of the transmission-type colored filter as described in any one of claim 1～7, its feature exists In, comprise the steps:
1) selection PET or glass are as substrate layer (1), at upper sputter the first metal of described substrate layer (1) Layer (2)；
2) arranging dielectric layer (3) on described the first metal layer (2), described dielectric layer (3) is the completeest Become: the first step uses coating process to be 300～1500nm in the upper a layer thickness that is coated with of described the first metal layer (2) Coating dielectric layer (31)；Second step is one layer of sputter dielectric layer (32) of sputter on described coating dielectric layer (31), Sputter material is selected from SiOx or SiNy, wherein 0 ＜ x≤2,0 ＜ y≤2.
The thickness of dielectric layer (3) is made to meet N*T >=4* λ by controlling the thickness of sputter dielectric layer (32) / 4, wherein, T is the thickness of dielectric layer (3), and N is the refractive index of dielectric layer (3), and λ is visible ray Wavelength, scope is 400～700nm；
3) at the upper sputter the second metal level (4) of described sputter dielectric layer (32).
The preparation method of transmission-type colored filter the most according to claim 8, it is characterised in that institute Stating PET and scribble hardened layer, described thin hardened layer is 1～3 μm.
The preparation method of transmission-type colored filter the most according to claim 8, it is characterised in that institute State the material of the first metal layer (2) and the second metal level (4) in Au, Ag, Cu, Al or Cr One or more, the thickness of described the first metal layer (2) is 12～30nm, described second metal level (4) Thickness be 12～30nm.
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CN110456437A (en) * 2019-07-15 2019-11-15 杭州美迪凯光电科技股份有限公司 Infrared three wave crests coating process
WO2020097865A1 (en) * 2018-11-15 2020-05-22 深圳市融光纳米科技有限公司 Optical filter, fabrication method therefor, display device and toner
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KYU-TAE LEE等: "High-Color-Purity Subtractive Color Filters with a Wide Viewing Angle Based on Plasmonic Perfect Absorbers", 《ADVANCED OPTICAL MATERIALS》 *
YEO-TAEK YOON等: "Transmission type color filter incorporating a silver film based etalon", 《OPTICS EXPRESS》 *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020097865A1 (en) * 2018-11-15 2020-05-22 深圳市融光纳米科技有限公司 Optical filter, fabrication method therefor, display device and toner
CN113518937A (en) * 2018-11-15 2021-10-19 宁波融光纳米科技有限公司 Optical filter and manufacturing method thereof, display device and toner
CN110320583A (en) * 2019-07-15 2019-10-11 杭州美迪凯光电科技有限公司 Three wave crest coating process of visible light
CN110456437A (en) * 2019-07-15 2019-11-15 杭州美迪凯光电科技股份有限公司 Infrared three wave crests coating process
CN112099124A (en) * 2020-09-25 2020-12-18 广州市佳禾光电科技有限公司 Dense light wave multiplexing optical filter

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