CN105938212B - Transmission-type colored filter and preparation method thereof - Google Patents

Transmission-type colored filter and preparation method thereof Download PDF

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Publication number
CN105938212B
CN105938212B CN201610478993.2A CN201610478993A CN105938212B CN 105938212 B CN105938212 B CN 105938212B CN 201610478993 A CN201610478993 A CN 201610478993A CN 105938212 B CN105938212 B CN 105938212B
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layer
dielectric layer
thickness
transmission
colored filter
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CN105938212A (en
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王平
吕志平
张玉春
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Zhangjiagang Kangdexin Optronics Material Co Ltd
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Zhangjiagang Kangdexin Optronics Material Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • G02B5/286—Interference filters comprising deposited thin solid films having four or fewer layers, e.g. for achieving a colour effect
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C23C14/0652—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Laminated Bodies (AREA)

Abstract

The present invention provides a kind of transmission-type colored filter and preparation method thereof, and the transmission-type colored filter includes：Substrate layer (1), the first metal layer (2), dielectric layer (3) and second metal layer (4) are equipped on the substrate layer (1) successively, the thickness of the dielectric layer (3) is T, refractive index is N, N*T >=4* λ/4, wavelength of the λ for visible ray, ranging from 400~700nm.Transmission-type colored filter of the present invention tri- peaks of RGB peak transmittance between 60%~100%, transmitance is less than 30% at 490nm and 590nm wavelength, the three peak filtering functions of RGB are just realized by simple trilamellar membrane system, utilize sputtering and coating hybrid technique, make it possible the R2R scale of mass production of the type, have broad application prospects.

Description

Transmission-type colored filter and preparation method thereof
Technical field
The present invention relates to optical element technology fields, and in particular to a kind of transmission-type colored filter.
Technical background
It is mainly absorption-type colored filter in existing market upper filter, the shortcomings that optical filter of the type is at any time Between the ability that filters can decline, and have more than 60% light loss, cause the reduction of practical transmitance, reason is absorption-type Optical filter outside non-rgb light, can also absorb quite a few rgb light other than absorbing.The Chinese patent of Zhejiang University CN105137518A propose a kind of optical filter using medium/metal/metal structure, by control the thickness of middle dielectric layer come Unimodal filtering functions in 400~700nm all-wave lengths, the problem of being realized by reflecting rather than absorbing, not having decline, tool There is higher transmitance；But it has a defect that such optical filter can be only formed unimodal perspective, such as to realize that RGB multimodals are saturating Depending on, then three kinds of optical filters of different-thickness are needed, increased so as to cause using the display element thickness of this optical filter, into This can also be increased.The present invention is the technical side that the transmission of RGB multimodals can be realized in a kind of single optical filter proposed on its basis Case.
Invention particular content：
One object of the present invention provides a kind of transmission-type colour that preparation is combined by coating process and sputtering process and filters Sheet structure is carried out the accurate control of thickness of dielectric layers by sputtering process, can be carried out so as to fulfill using individual optical filter The purpose of RGB multimodals transmission.
Another object of the present invention provides the preparation method of above-mentioned transmission-type colored filter.
To achieve the above object, the specific technical solution of the present invention is：
A kind of transmission-type colored filter, which is characterized in that including：Including substrate layer, it is equipped with successively on the substrate layer The first metal layer, dielectric layer and second metal layer, the thickness of the dielectric layer is T, and refractive index N, N*T >=4* λ/4, λ is can See the wavelength of light, ranging from 400~700nm.
Preferably, the dielectric layer includes being stacked coating dielectric layer and sputter dielectric layer, and the coating dielectric layer is set It puts in the first metal layer upper surface.
Preferably, the thickness of the coating dielectric layer is 300~1500nm, and refractive index is 1.4~5.
Preferably, the refractive index of the sputter dielectric layer is identical with the refractive index of the coating dielectric layer, and the sputter is situated between The material of matter layer is selected from SiOx or SiNy, wherein 0 ＜ x≤2,0 ＜ y≤2.
The refractive index of the sputter dielectric layer identical with the refractive index of the coating dielectric layer is for unified entire medium The refractive index of layer, the primary position for being used for accurate control and transmiting wave crest.
It is coated with dielectric layer and one layer of thicker dielectric layer is coated with by wet coating technique, the main component of coating fluid is propylene Sour lipid hardening bath.Sputter dielectric layer plates the dielectric layer of layer by sputtering process, such as SiOx or SiNx, by splashing Depositing process can accurately control thickness of dielectric layers, so as to control the quantity of wave crest transmission and position.
Thickness of dielectric layers and the principle explanation of transmission wave crest number：
As shown in Figure 2：
Wavelength with reference to visible ray is 550nm,
N0 is air layer refractive index, refractive index=1,；
N1 is coating refractive index, and refractive index assumes=1.52；
N2 is substrate layer refractive index, and refractive index assumes=1.66；
When thickness of coating T meets following condition, the reflected light in upper and lower two interfaces can generate destructive interference, shape Into a reflection Valley, that is, Peak is transmitted, due to being unsatisfactory for destructive interference item on the wave band near reference wavelength 550nm ranges Part, transmitance decline.
During 2*N1*T=(m+1/2) λ, m=0,1,2 ... integer；
N1*T is known as optical thickness；
As thickness about 90nm, N1*T is known as 1 QWOT (Quarter-Wave Optical Thickness), a quarter The optical thickness of a wavelength, 1QWOT=550/4nm=137.5nm, when dielectric layer is in 90nm or so, refractive index multiplies at 1.52 There is 1 transmission peaks in product=1QWOT；
When thickness increase, when optical thickness is close to 4 QWOT thickness, about 2 transmission peaks are will appear in visible light region；
When thickness increase, when optical thickness is close to 7 QWOT thickness, about 3 transmission peaks are will appear in visible light region；
When thickness continues to increase, it may appear that more transmission peaks.
When being applied to metal/dielectric/metal film layer result of the present invention, principle is identical.
Preferably, the thickness of the substrate layer is 50~200 μm, and refractive index is 1.4~1.7.
Preferably, the material of the substrate layer is selected from the PET or glass for being coated with hardened layer, and the thickness of the hardened layer is 1 ~3 μm.
Preferably, one kind in Au, Ag, Cu, Al or Cr of the first metal layer and the material of second metal layer or A variety of, the thickness of the first metal layer is 12~30nm, and the thickness of the second metal layer is 12~30nm.
The primary structure of the transmission-type colored filter is four layers for example above-mentioned, other auxiliary function layers (such as surface anti-reflection Film, substrate surface Obstruct membrane, surface steam or Scratch-prevention film) it can additionally add.
The preparation method of transmission-type colored filter as described above, which is characterized in that include the following steps：
1) PET or glass are selected as substrate layer, the sputter the first metal layer on the substrate layer；
2) dielectric layer is set on the first metal layer, and the dielectric layer is completed in two steps：The first step is using coating work Skill applies the coating dielectric layer that a layer thickness is 300~1500nm on the first metal layer；Second step is in the coating medium One layer of sputter dielectric layer of sputter on layer, sputter material is selected from SiOx or SiNy, wherein 0 ＜ x≤2,0 ＜ y≤2.
N*T >=4* λ/4 are met by the thickness for the thickness dielectric layer for controlling sputter dielectric layer, wherein, T is dielectric layer Thickness, N be dielectric layer refractive index, λ be visible ray wavelength, ranging from 400~700nm；
3) the sputter second metal layer on the sputter dielectric layer.
Preferably, the PET is coated with hardened layer, and the thin hardened layer is 1~3 μm.
Preferably, one kind in Au, Ag, Cu, Al or Cr of the first metal layer and the material of second metal layer or A variety of, the thickness of the first metal layer is 12~30nm, and the thickness of the second metal layer is 12~30nm.
Advantageous effect：
A kind of film layer structure of transmission-type colored filter for sputtering and being coated with hybrid technique provided by the invention, first uses Sputtering method plates one layer of thin metal layer, then realizes thicker dielectric layer plated film with wet coating technique, then with sputtering technology into The accurate control of row thickness of dielectric layers and the uppermost metal layer of sputtering.The peak transmittance at tri- peaks of RGB of whole membrane system Between 60%~100%, transmitance is less than 30% at 490nm and 590nm wavelength, is just realized by simple trilamellar membrane system The three peak filtering functions of RGB using sputtering and coating hybrid technique, make it possible the R2R scale of mass production of the type, have Wide application prospect.
Description of the drawings：
With reference to structure diagram and embodiment, the present invention is further described.
Fig. 1 is the structure diagram of transmission-type colored filter of the present invention；
Fig. 2 is interface light interference schematic diagram；
The transmitted light spectrogram that Fig. 3 is the optical thickness of dielectric layer when being 1 QWOT；
The transmitted light spectrogram that Fig. 4 is the optical thickness of dielectric layer when being 1.5 QWOT；
The transmitted light spectrogram that Fig. 5 is the optical thickness of dielectric layer when being 4 QWOT；
The transmitted light spectrogram that Fig. 6 is the optical thickness of dielectric layer when being 10.7 QWOT；
Wherein, 1, substrate layer, 2, the first metal layer, 3, dielectric layer, 4, second metal layer, 31, apply
Cloth dielectric layer, 32, sputter dielectric layer.
Specific embodiment：
In order to make the purpose , technical scheme and advantage of the present invention be clearer, with reference to the accompanying drawings and embodiments, it is right Invention is further elaborated.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, not For limiting the present invention.
Embodiment
As shown in Figure 1：A kind of transmission-type colored filter, including：Including substrate layer 1, it is equipped with successively on the substrate layer 1 The first metal layer 2, dielectric layer 3 and second metal layer 4, the thickness of the dielectric layer 3 is T, refractive index N, N*T >=4* λ/4, λ For the wavelength of visible ray, ranging from 400~700nm.
Preferably, the dielectric layer 3 includes being stacked coating dielectric layer 31 and sputter dielectric layer 32, the coating medium Layer 31 is arranged on 2 upper surface of the first metal layer.
Preferably, the thickness of the coating dielectric layer 31 is 900nm, refractive index 1.52.
Preferably, the refractive index of the sputter dielectric layer 32 is identical with the refractive index of the coating dielectric layer 31, described to splash The material for plating dielectric layer 32 is selected from SiO2Or SiN2。
The refractive index of the sputter dielectric layer 32 identical with the refractive index of the coating dielectric layer 31 is in order to unified entire The refractive index of dielectric layer 3, the primary position for being used for accurate control and transmiting wave crest.
It is coated with dielectric layer and one layer of thicker dielectric layer is coated with by wet coating technique, the main component of coating fluid is propylene Sour lipid hardening bath.Sputter dielectric layer plates the dielectric layer of layer, such as SiO by sputtering process2Or SiN2, by splashing Depositing process can accurately control thickness of dielectric layers, so as to control the quantity of wave crest transmission and position.
Preferably, the thickness of the substrate layer 1 is 120 μm, refractive index 1.53.
Preferably, the material of the substrate layer 1 is selected from the PET or glass for being coated with hardened layer, and the thickness of the hardened layer is 0.96μm。
Preferably, the one kind of the first metal layer 2 and the material of second metal layer 4 in Au, Ag, Cu, Al or Cr Or it is a variety of, the thickness of the first metal layer 2 is 16nm, and the thickness of the second metal layer 4 is 14nm.
The primary structure of the transmission-type colored filter is four layers for example above-mentioned, other auxiliary function layers (such as surface anti-reflection Film, substrate surface Obstruct membrane, surface steam or Scratch-prevention film) it can additionally add.
The preparation method of transmission-type colored filter as described above, which is characterized in that include the following steps：
1) PET or glass are selected as substrate layer 1, the sputter the first metal layer 2 on the substrate layer 1；
2) dielectric layer 3 is set on the first metal layer 2, and the dielectric layer 3 is completed in two steps：The first step is using coating Technique applies the coating dielectric layer 31 that a layer thickness is 300~1500nm on the first metal layer 2；Second step is in the coating One layer of sputter dielectric layer 32 of sputter on dielectric layer 31, sputter material are selected from SiO2Or SiN2。
N*T >=4* λ/4 are met by the thickness for the thickness dielectric layer 3 for controlling sputter dielectric layer 32, wherein, T is is situated between The thickness of matter layer 3, refractive index of the N for dielectric layer 3, wavelength of the λ for visible ray, ranging from 400~700nm；
3) the sputter second metal layer 4 on the sputter dielectric layer 32.
Embodiment transmission peaks position measurement result：
In present example, structure is 2/ dielectric layer of the first metal layer, 3/ second metal layer 4, if 3 thickness of dielectric layer is T, refractive index N are 550nm with reference to visible wavelength λ；
As shown in Figure 3：When optical thickness N*T=1 QWOT (λ/4), nearby occurs 1 in 450nm wavelength (green light) Transmission peaks；
As shown in Figure 4：As N*T increases, such as reach 1.5 QWOT, this transmission peaks is moved toward long wave, 615nm occurs The transmission peaks of (feux rouges)；
As shown in Figure 5：When N*T reaches 4 QWOT, there is two transmission peaks, respectively 434nm in visible light region (blue light) and 659nm (feux rouges)；
As N*T continues to increase, two transmission peaks move together toward long wave, and wavelength interval shortens between peak；
As shown in Figure 6：When N*T is more than 7 QWOT, when such as reaching 10.7 QWOT, occur three in visible light region Transmission peaks, respectively 450nm (blue light), 524nm (green light) and 627nm (feux rouges), you can realize the transmission of RGB multimodals；
As N*T continues to increase, three transmission peaks move together toward long wave, and wavelength interval shortens between peak；Until Four transmission peaks；
When thickness continues to increase, it may appear that more transmission peaks.
Can be seen that transmission-type colored filter of the present invention by above-mentioned experimental result need to only control middle dielectric layer 3 thickness is obtained with dichroic filter or three-colour filter, and the position for transmiting wave crest be also can be as needed Continuous moving.And controlling the thickness of dielectric layer 3 is realized by method that coating process and sputtering process are combined, i.e., Thicker dielectric layer plated film is realized with wet coating technique, the accurate control of thickness of dielectric layers is then carried out with sputtering technology.
The foregoing is merely the preferred embodiment of invention, be not intended to limit the present invention, it is all the spirit and principles in the present invention it Interior made modifications, equivalent substitutions and improvements etc., should all be included in the protection scope of the present invention.Attempt according to this to the present invention Make limitation in any form, therefore all have any modification or change for making the related present invention under identical spirit, The scope that the invention is intended to protect should be all included in.

Claims (10)

1. a kind of transmission-type colored filter, which is characterized in that including：Substrate layer (1) is equipped with successively on the substrate layer (1) The first metal layer (2), dielectric layer (3) and second metal layer (4), the thickness of the dielectric layer (3) are T, refractive index N, N*T >= The wavelength of 4* λ/4, λ for visible ray, ranging from 400~700nm.
2. transmission-type colored filter according to claim 1, which is characterized in that the dielectric layer (3) sets including being laminated Coating dielectric layer (31) and sputter dielectric layer (32) are put, the coating dielectric layer (31) is arranged on the first metal layer (2) Surface.
3. transmission-type colored filter according to claim 2, which is characterized in that the thickness of the coating dielectric layer (31) For 300~1500nm, refractive index is 1.4~5.
4. transmission-type colored filter according to claim 2, which is characterized in that the refraction of the sputter dielectric layer (32) Rate is identical with the refractive index of the coating dielectric layer (31), and the material of the sputter dielectric layer (32) is selected from SiOx or SiNy, Wherein 0 ＜ x≤2,0 ＜ y≤2.
5. transmission-type colored filter according to claim 1, which is characterized in that the thickness of the substrate layer (1) is 50 ~200 μm, refractive index is 1.4~1.7.
6. transmission-type colored filter according to claim 5, which is characterized in that the material of the substrate layer (1) is selected from The PET or glass of hardened layer are coated with, the thickness of the hardened layer is 1~3 μm.
7. transmission-type colored filter according to claim 1, which is characterized in that the first metal layer (2) and second The material of metal layer (4) is one or more in Au, Ag, Cu, Al or Cr, and the thickness of the first metal layer (2) is 12 ~30nm, the thickness of the second metal layer (4) is 12~30nm.
8. such as the preparation method of claim 1~7 any one of them transmission-type colored filter, which is characterized in that including such as Lower step：
1) PET or glass are selected as substrate layer (1), the sputter the first metal layer (2) on the substrate layer (1)；
2) dielectric layer (3) is set on the first metal layer (2), and the dielectric layer (3) is completed in two steps：The first step is using painting Cloth technique applies the coating dielectric layer (31) that a layer thickness is 300~1500nm on the first metal layer (2)；Second step is in institute One layer of sputter dielectric layer (32) of sputter on coating dielectric layer (31) is stated, sputter material is selected from SiOx or SiNy, wherein 0 ＜ x≤ 2,0 ＜ y≤2；
N*T >=4* λ/4 are met by the thickness for the thickness dielectric layer (3) for controlling sputter dielectric layer (32), wherein, T is is situated between The thickness of matter layer (3), refractive index of the N for dielectric layer (3), wavelength of the λ for visible ray, ranging from 400~700nm；
3) the sputter second metal layer (4) on the sputter dielectric layer (32).
9. the preparation method of transmission-type colored filter according to claim 8, which is characterized in that the PET is coated with firmly Change layer, the thin hardened layer is 1~3 μm.
10. the preparation method of transmission-type colored filter according to claim 8, which is characterized in that first metal Layer (2) and the material of second metal layer (4) are one or more in Au, Ag, Cu, Al or Cr, the first metal layer (2) Thickness for 12~30nm, the thickness of the second metal layer (4) is 12~30nm.
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CN113518937A (en) * 2018-11-15 2021-10-19 宁波融光纳米科技有限公司 Optical filter and manufacturing method thereof, display device and toner
CN110456437A (en) * 2019-07-15 2019-11-15 杭州美迪凯光电科技股份有限公司 Infrared three wave crests coating process
CN110320583A (en) * 2019-07-15 2019-10-11 杭州美迪凯光电科技有限公司 Three wave crest coating process of visible light
CN112099124A (en) * 2020-09-25 2020-12-18 广州市佳禾光电科技有限公司 Dense light wave multiplexing optical filter

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