CN105865370A - White-light scanning interferometry measurement method and system - Google Patents
White-light scanning interferometry measurement method and system Download PDFInfo
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Abstract
Description
技术领域technical field
本发明涉及白光扫描干涉三维形貌测量领域,具体涉及一种基于广义相关时延估计的白光扫描干涉测量方法和系统。The invention relates to the field of white light scanning interference three-dimensional shape measurement, in particular to a white light scanning interferometry method and system based on generalized correlation time delay estimation.
背景技术Background technique
白光扫描干涉作为一种三维形貌测量方法被广泛应用于显微物体的三维形貌测量和物体表面粗糙度测量。随着精密制造业的发展,需要对一些表面高度跳变从几百纳米到几百微米的MEMS器件、半导体芯片等物体进行三维形貌测量。目前使用的探针型测量方法例如原子力显微镜和台阶仪均存在一定的局限性,不适用于此类物体的三维形貌测量。As a three-dimensional shape measurement method, white light scanning interferometry is widely used in the three-dimensional shape measurement of microscopic objects and the surface roughness measurement of objects. With the development of precision manufacturing, it is necessary to measure the three-dimensional shape of some MEMS devices, semiconductor chips and other objects whose surface height jumps from hundreds of nanometers to hundreds of microns. Currently used probe-type measurement methods such as atomic force microscopes and spherometers have certain limitations and are not suitable for the three-dimensional shape measurement of such objects.
并且,白光扫描干涉测量技术弥补了单波长干涉测量相邻点之间相位跳变大于测量波长一半时不能得到正确结果的缺点,扩大了单波长干涉测量的量程。白光扫描干涉测量技术不仅具有单波长干涉测量中对被测物体非接触、无损伤、高分辨率、高精度等优点,还能够准确地对表面本身有间断、梯度变化较大(大于记录光波的波长)的物体进行测量,如具有台阶、缺陷孔结构的物体。白光扫描干涉测量在三维形貌检测、自动加工、工业检测、产品质量控制等领域具有重要意义及广阔的应用前景。Moreover, the white light scanning interferometry technology makes up for the shortcoming that the phase jump between adjacent points of single-wavelength interferometry cannot obtain correct results when the phase jump is greater than half of the measured wavelength, and expands the range of single-wavelength interferometry. White light scanning interferometry technology not only has the advantages of non-contact, non-damage, high resolution, and high precision in single-wavelength interferometry, but also can accurately detect the surface itself with discontinuities and large gradient changes (greater than the recorded light wave). wavelength), such as objects with steps and defect hole structures. White light scanning interferometry has great significance and broad application prospects in the fields of three-dimensional shape detection, automatic processing, industrial inspection, product quality control and other fields.
白光扫描干涉使用宽光谱光源进行照明,相比单色光而言具有更短的相干长度,从而使干涉条纹只能出现在很小的空间范围内。当测量光与参考光的光程差为零时,干涉信号出现最大值,也被称为零光程差位置。这个零光程差位置就代表被测表面对应数据点的相对高度信息,所有数据点的相对高度组合成了测试表面的整体形貌。在白光扫描干涉术中,零光程差位置定位的方法是一个研究热点,已经有很多方法相继被提出。目前经常使用的方法有如下几种,即:重心方法,傅里叶变换方法,希尔伯特变换方法,傅里叶频域分析方法,连续小波变换方法及白光相移干涉法。重心方法通过计算白光干涉信号重心的方法定位零光程差位置,其计算速度较快,但是它只能应用在对称型信号上,而且计算精度受噪声影响较大。傅里叶变换方法及希尔伯特变换方法通过傅里叶变换或者希尔伯特变换求取白光干涉信号包络,通过定位包络极值的方式定位零光程差位置。虽然这两类方法可以得到包络峰值,但是他们的抗噪性能较弱。傅里叶频域分析方法通过对白光干涉信号进行傅里叶变换提取相位的方式从而求取零光程差位置,这种算法计算精度较高,但是需要标定光源的中心波长,且计算过程复杂。连续小波变换的方法计算精度高,抗噪能力较强,但是对干涉信号的包络形状有一定要求。白光相移干涉法参照了单波长相移术的操作方法,这种方法适用于处理表面较平滑物体,并且在相移间隔选取不准确时会带来较大的误差。White light scanning interferometry uses a wide-spectrum light source for illumination, which has a shorter coherence length than monochromatic light, so that interference fringes can only appear in a small spatial range. When the optical path difference between the measurement light and the reference light is zero, the interference signal has a maximum value, which is also called the zero optical path difference position. The zero optical path difference position represents the relative height information of the corresponding data points on the measured surface, and the relative heights of all data points are combined to form the overall shape of the tested surface. In white light scanning interferometry, the zero optical path difference positioning method is a research hotspot, and many methods have been proposed one after another. At present, the following methods are frequently used, namely: center of gravity method, Fourier transform method, Hilbert transform method, Fourier frequency domain analysis method, continuous wavelet transform method and white light phase shift interferometry. The center of gravity method locates the position of zero optical path difference by calculating the center of gravity of the white light interference signal, and its calculation speed is fast, but it can only be applied to symmetrical signals, and the calculation accuracy is greatly affected by noise. The Fourier transform method and the Hilbert transform method obtain the white light interference signal envelope through Fourier transform or Hilbert transform, and locate the zero optical path difference position by locating the extreme value of the envelope. Although these two types of methods can get envelope peaks, their anti-noise performance is weak. The Fourier frequency domain analysis method obtains the zero optical path difference position by Fourier transforming the white light interference signal to extract the phase. This algorithm has high calculation accuracy, but it needs to calibrate the center wavelength of the light source, and the calculation process is complicated. . The continuous wavelet transform method has high calculation accuracy and strong anti-noise ability, but it has certain requirements for the envelope shape of the interference signal. The white light phase-shift interferometry refers to the operation method of the single-wavelength phase-shift technique. This method is suitable for processing objects with smooth surfaces, and it will cause large errors when the phase-shift interval is not selected accurately.
上述诸多的白光扫描干涉零光程差定位方法都存在着各自的局限性,都有一定的适用范围。因此,设计一种更精确,更简单,更快速的提取白光干涉零光程差的位置的方法,搭建一种光路系统简捷、干涉图采集操作过程简便的系统,对于降低测量系统的复杂性、减少测量和计算时间、提高测量精度、加快测量速度是非常有意义的。The above-mentioned white light scanning interference zero optical path difference positioning methods all have their own limitations, and all of them have a certain scope of application. Therefore, designing a more accurate, simpler, and faster method of extracting the position of zero optical path difference in white light interference, and building a system with a simple optical path system and a simple interferogram acquisition operation process will help reduce the complexity of the measurement system. It is very meaningful to reduce measurement and calculation time, improve measurement accuracy and speed up measurement.
发明内容Contents of the invention
有鉴于此,有必要提出一种基于广义相关时延估计的白光扫描干涉测量方法和系统。In view of this, it is necessary to propose a white light scanning interferometry method and system based on generalized correlation time delay estimation.
一种白光扫描干涉测量系统,包括白光扫描模块、定标模块、固定平板、以及压电陶瓷微位移平台,所述白光扫描模块包括一个白光光源;一个柯勒照明系统;一个第一分束镜及一个第二分束镜,所述光源发出的光经过柯勒照明系统后进入第一分束镜并被分为物光和参考光;一个第一显微物镜和一个第二显微物镜;第一分束镜位于所述柯勒照明系统与第二显微物镜之间;成像透镜及第一、第二、第三、第四、第五平面反射镜;一个第一单色黑白图像传感器,所述参考光通过第一显微物镜入射在第一平面反射镜上,所述物光通过第二显微物镜入射在待测物体,物光和参考光反射后再各自通过第一、第二显微物镜,进而汇聚在第一分束镜后发生干涉,干涉图像经由成像透镜为第一单色黑白图像传感器所采集。所述定标模块包括一个激光器;一个第二单色黑白图像传感器。所述激光器发出的激光经由第五、第四平面反射镜后入射到第二分束镜,由第二分束镜出射的激光经由第二平面反射镜、第三平面反射镜后发生干涉,其产生的干涉条纹由第二单色黑白图像传感器所采集;所述固定平板用于固定待测物件;所述压电陶瓷微位移平台用于带动待测物体发生位移。A white light scanning interferometry system, comprising a white light scanning module, a calibration module, a fixed plate, and a piezoelectric ceramic micro-displacement platform, the white light scanning module includes a white light source; a Koehler illumination system; a first beam splitter and a second beam splitter, the light emitted by the light source enters the first beam splitter after passing through the Koehler illumination system and is divided into object light and reference light; a first microscopic objective lens and a second microscopic objective lens; The first beam splitter is located between the Kohler illumination system and the second microscope objective lens; the imaging lens and the first, second, third, fourth, and fifth plane mirrors; a first monochrome black-and-white image sensor , the reference light is incident on the first plane mirror through the first microscopic objective lens, the object light is incident on the object to be measured through the second microscopic objective lens, and the object light and the reference light are reflected and then respectively pass through the first and second mirrors. The two microscopic objective lenses are converged behind the first beam splitter and interfere with each other, and the interference image is collected by the first monochrome black-and-white image sensor through the imaging lens. The calibration module includes a laser; a second monochromatic black and white image sensor. The laser light emitted by the laser is incident on the second beam splitter after passing through the fifth and fourth plane reflectors, and the laser light emitted by the second beam splitter interferes after passing through the second plane reflector and the third plane reflector. The generated interference fringes are collected by the second monochrome black-and-white image sensor; the fixed plate is used to fix the object to be measured; the piezoelectric ceramic micro-displacement platform is used to drive the object to be measured to be displaced.
一种白光扫描干涉测量方法,其采用上述白光扫描干涉测量系统,所述方法包括:采集一系列待测物体产生的白光干涉图和激光干涉图,使用激光干涉图计算出压电陶瓷微位移平台的步进,标定白光扫描干涉的扫描步进;选取白光干涉图上的一点,对该点光强信号进行傅里叶变换处理;设置滤波窗口对所述傅里叶频谱进行频谱滤波;依次计算所有像素点的光强信号与选定像素点光强信号的零光程差位置相对位移;计算待测物体表面高度。A white light scanning interferometry method, which uses the above white light scanning interferometry system, the method comprising: collecting a series of white light interferograms and laser interferograms generated by objects to be measured, and using the laser interferograms to calculate the piezoelectric ceramic micro-displacement platform The step is to calibrate the scanning step of the white light scanning interference; select a point on the white light interferogram, and perform Fourier transform processing on the light intensity signal at this point; set the filter window to perform spectral filtering on the Fourier spectrum; The relative displacement of the light intensity signals of all pixel points and the zero optical path difference position of the light intensity signal of the selected pixel point; calculate the surface height of the object to be measured.
相对于现有技术,所述方法及系统在求取信号时延的过程中,将白光光源可以看作一个信号源,对应不同像素点干涉强度信号可以看作空间中不同接收器接收到的同源带噪信号,通过计算像素点之间干涉强度信号时延的过程来替代每个像素点干涉强度信号单独进行变换处理求取零光程差位置的过程,从而无需标定光源的中心波长,且计算精度不受干涉信号的包络形状影响,抗噪性能强,可以广泛应用于白光扫描干涉测量的信号处理中。Compared with the prior art, in the process of calculating the signal time delay, the method and system regard the white light source as a signal source, and the interference intensity signals corresponding to different pixel points can be regarded as the same signals received by different receivers in space. Source noisy signal, through the process of calculating the time delay of the interference intensity signal between pixels to replace the process of separately transforming the interference intensity signal of each pixel to obtain the position of zero optical path difference, so that there is no need to calibrate the central wavelength of the light source, and The calculation accuracy is not affected by the envelope shape of the interference signal, and the anti-noise performance is strong, so it can be widely used in signal processing of white light scanning interferometry.
附图说明Description of drawings
为了更清楚地说明本发明的技术方案,下面将对实施例中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to illustrate the technical solution of the present invention more clearly, the accompanying drawings used in the embodiments will be briefly introduced below. Obviously, the accompanying drawings in the following description are only some embodiments of the present invention. As far as the skilled person is concerned, other drawings can also be obtained based on these drawings on the premise of not paying creative work.
图1为本发明第一实施例提供的基于广义相关时延估计的白光扫描干涉测量系统的结构示意图。FIG. 1 is a schematic structural diagram of a white light scanning interferometry system based on generalized correlation time delay estimation provided by the first embodiment of the present invention.
图2为本发明第二实施例提供的白光扫描干涉测量方法的流程示意图。Fig. 2 is a schematic flow chart of a white light scanning interferometry method provided by the second embodiment of the present invention.
具体实施方式detailed description
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述。The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the drawings in the embodiments of the present invention.
第一实施例first embodiment
如图1所示,本发明第一实施例提供的白光扫描干涉测量系统500包括白光扫描模块100、定标模块200、用于固定待测物件30的固定平板40、压电陶瓷微位移平台50、以及压电陶瓷控制器60。As shown in FIG. 1 , the white light scanning interferometry system 500 provided by the first embodiment of the present invention includes a white light scanning module 100 , a calibration module 200 , a fixed plate 40 for fixing the object 30 to be measured, and a piezoelectric ceramic micro-displacement platform 50 , and a piezoelectric ceramic controller 60 .
其中所述白光扫描模块100包括:一个白光光源101、一个柯勒照明系统102、一个第一分束镜103及一个第二分束镜104、一个第一显微物镜105和一个第二显微物镜106、成像透镜107、第一单色黑白图像传感器108。Wherein said white light scanning module 100 comprises: a white light source 101, a Koehler illumination system 102, a first beam splitter 103 and a second beam splitter 104, a first microscope objective lens 105 and a second microscope An objective lens 106 , an imaging lens 107 , and a first monochromatic black and white image sensor 108 .
其中所述定标模块200包括一个激光器201;第一平面反射镜202、第二平面反射镜203、第三平面反射镜204、第四平面反射镜205、第五平面反射镜206、第二单色黑白图像传感器208。Wherein the calibration module 200 includes a laser 201; a first plane mirror 202, a second plane mirror 203, a third plane mirror 204, a fourth plane mirror 205, a fifth plane mirror 206, a second single color black and white image sensor 208.
在Z轴方向(第一方向)上,所述第一分束镜103位于所述柯勒照明系统102与第二显微物镜106之间;在Y轴方向(第二方向,Y轴垂直于Z轴)上,所述第一分束镜103位于所述成像透镜107与第一显微物镜105之间。On the Z-axis direction (first direction), the first beam splitter 103 is located between the Koehler illumination system 102 and the second microscope objective lens 106; in the Y-axis direction (the second direction, the Y-axis is perpendicular to Z axis), the first beam splitter 103 is located between the imaging lens 107 and the first microscope objective lens 105 .
另外,在Z轴方向上,所述第二显微物镜106、第三平面反射镜204、固定平板40(及待测物件30)、以及压电陶瓷微位移平台50位于第一分束镜103及第二分束镜104之间。In addition, in the Z-axis direction, the second microscope objective lens 106, the third plane mirror 204, the fixed plate 40 (and the object to be measured 30), and the piezoelectric ceramic micro-displacement platform 50 are located at the first beam splitter 103 and between the second beam splitter 104.
在本实施例中,所述白光光源101为一台卤钨灯白光光源。所述激光器201为一台波长为632.8nm的He-Ne激光器。In this embodiment, the white light source 101 is a tungsten-halogen white light source. The laser 201 is a He-Ne laser with a wavelength of 632.8nm.
工作时,所述卤钨灯白光光源101发出的光经柯勒照明系统102准直后入射至第一分束镜103,分成参考光L1和物光L2。During operation, the light emitted by the tungsten-halogen white light source 101 is collimated by the Koehler illumination system 102 and then enters the first beam splitter 103, where it is divided into reference light L1 and object light L2.
所述参考光L1通过第一显微物镜105入射在第一平面反射镜202上,所述物光L2通过第二显微物镜106入射在待测物体30,物光L2和参考光L1反射后再各自通过第一、第二显微物镜105、106,进而聚在第一分束镜103后发生干涉,干涉图像经由成像透镜107为第一单色黑白图像传感器108所采集。The reference light L1 is incident on the first plane reflector 202 through the first microscopic objective lens 105, and the objective light L2 is incident on the object to be measured 30 through the second microscopic objective lens 106, after the object light L2 and the reference light L1 are reflected Then pass through the first and second microscopic objective lenses 105 and 106 , and then gather at the first beam splitter 103 to generate interference. The interference image is collected by the first monochromatic black and white image sensor 108 through the imaging lens 107 .
在本实施例中,所述待测物体30与第二平面反射镜203通过固定平板40固定,具体是待测物体30与第二平面反射镜203分别位于所述固定平板40的两侧。使用时,调整待测物体30与第二平面反射镜203使其具有相同的垂直扫描位移。In this embodiment, the object to be measured 30 and the second plane mirror 203 are fixed by the fixed plate 40 , specifically, the object to be measured 30 and the second plane mirror 203 are respectively located on two sides of the fixed plate 40 . When in use, adjust the object 30 to be measured and the second plane mirror 203 to have the same vertical scanning displacement.
在本实施例中,除第二平面反射镜203位于第二分束镜104的一侧外,在第二分束镜104的另外两侧,分别设置了第三平面反射镜204、第四平面反射镜205。In this embodiment, except that the second plane mirror 203 is located on one side of the second beam splitter 104, on the other two sides of the second beam splitter 104, a third plane mirror 204, a fourth plane mirror 205 .
He-Ne激光器201发出的激光经由第五、第四平面反射镜206、205后入射到第二分束镜104,由第二分束镜104出射的激光经由第二平面反射镜203、第三平面反射镜204后发生干涉,其产生的干涉条纹由第二单色黑白图像传感器208所采集。The laser light emitted by the He-Ne laser 201 is incident on the second beam splitter 104 after passing through the fifth and fourth plane reflectors 206, 205, and the laser light emitted by the second beam splitter 104 passes through the second plane reflector 203, the third Interference occurs behind the plane mirror 204 , and the interference fringes generated by it are collected by the second monochrome black-and-white image sensor 208 .
在本实施例中,第一、第二分束镜103、104是两个参数一样的分束镜;第一显微物镜105和第二显微物镜106的放大倍率为10,数值孔径为0.25。In this embodiment, the first and second beam splitters 103 and 104 are beam splitters with the same parameters; the magnification of the first microscopic objective lens 105 and the second microscopic objective lens 106 is 10, and the numerical aperture is 0.25 .
第一单色黑白图像传感器108和第二单色黑白图像传感器208为两个规格相同的图像传感器。The first monochrome black-and-white image sensor 108 and the second monochrome black-and-white image sensor 208 are two image sensors with the same specification.
另外,在本实施例中待测物体14具体采用MEMSCAP公司生产的OAMEM103型MEMS器件。In addition, in this embodiment, the object 14 to be measured specifically adopts an OAMEM103 MEMS device produced by MEMSCAP.
使用时,在白光扫描干涉光路中,由压电陶瓷微位移平台50带动待测物体30,实现测量待测物体30垂直方向的扫描。从测量物体30表面不同高度的点反射的光在不同时刻与参考光达到干涉零光程差位置。When in use, in the white light scanning interference optical path, the piezoelectric ceramic micro-displacement platform 50 drives the object 30 to be measured to realize scanning in the vertical direction of the object 30 to be measured. The light reflected from points at different heights on the surface of the measurement object 30 reaches the zero optical path difference position of interference with the reference light at different times.
由此,测量待测物体30表面高度通过提取零光程差位置确定,如果要实现对待测物体30高度的精确测量,就需要对压电陶瓷微位移平台50的位移量进行精确标定,本发明中采用激光干涉标定的方法,将第二平面反射镜203与待测物体30通过固定平板40固定,在压电陶瓷微位移平台50的驱动下,待测物体30和第二平面反射镜203具有相同的垂直扫描位移,只需测量第二平面反射镜203的垂直扫描位移,相对应的就可得到待测物体30的垂直扫描位移。Thus, measuring the surface height of the object to be measured 30 is determined by extracting the position of zero optical path difference. If accurate measurement of the height of the object to be measured 30 is to be realized, it is necessary to accurately calibrate the displacement of the piezoelectric ceramic micro-displacement platform 50. The present invention In the method of laser interference calibration, the second plane mirror 203 and the object to be measured 30 are fixed by the fixed plate 40, and driven by the piezoelectric ceramic micro-displacement platform 50, the object to be measured 30 and the second plane mirror 203 have For the same vertical scanning displacement, only the vertical scanning displacement of the second plane mirror 203 can be measured, and the corresponding vertical scanning displacement of the object 30 to be measured can be obtained.
在实际测量过程中,压电陶瓷微位移平台50(由压电陶瓷微位移控制器60所控制)每移动一次,第一黑白图像传感器108和第二黑白图像传感器208会各采到一幅图像,第一黑白图像传感器108采集到包含待测物体30信息的白光干涉条纹,第二黑白图像传感器208采集到激光干涉条纹。通过相移量提取算法,对第二黑白图像传感器208采集到的干涉条纹进行计算可以得到微位移扫描台每移动一次产生的干涉条纹相移量,从而计算出对应的位移量。使用这种方法可以实现对压电陶瓷微位移扫描台位移量的精确标定。In the actual measurement process, every time the piezoelectric ceramic micro-displacement platform 50 (controlled by the piezoelectric ceramic micro-displacement controller 60) moves once, the first black-and-white image sensor 108 and the second black-and-white image sensor 208 will respectively collect an image. , the first black and white image sensor 108 collects white light interference fringes containing information about the object 30 to be measured, and the second black and white image sensor 208 collects laser interference fringes. By calculating the interference fringes collected by the second black-and-white image sensor 208 through the phase shift extraction algorithm, the phase shift of the interference fringes generated by each movement of the micro-displacement scanning stage can be obtained, thereby calculating the corresponding displacement. Using this method can achieve accurate calibration of the displacement of the piezoelectric ceramic micro-displacement scanning stage.
而对于第一黑白图像传感器108采集到的白光干涉图像,选取干涉图中的一个像素点,提取该像素点的光强函数,依次将干涉图上的所有像素点的光强函数均与选取像素点的光强函数通过广义相关时延估计算法计算出位移差,可以求出每个像素点和选定像素点零光程差位置之间相对位移,从而求出待测物体的高度,具体实现将在第二实施例中进行详述。For the white light interference image collected by the first black-and-white image sensor 108, a pixel in the interference image is selected, the light intensity function of the pixel is extracted, and the light intensity functions of all pixels on the interference image are compared with the selected pixel in turn. The light intensity function of the point calculates the displacement difference through the generalized correlation time delay estimation algorithm, and the relative displacement between each pixel point and the zero optical path difference position of the selected pixel point can be obtained, so as to obtain the height of the object to be measured. The specific implementation Details will be given in the second embodiment.
第二实施例second embodiment
请一起参阅图2,将结合本实施例将结合附图和实施例对基于广义相关时延估计的白光扫描干涉测量方法作进一步说明,在本方法中其采用第一实施例所述的白光扫描干涉测量系统500进行测量,包含以下步骤S101–S106。Please refer to FIG. 2 together. The white light scanning interferometry method based on generalized correlation time delay estimation will be further described in conjunction with this embodiment in conjunction with the accompanying drawings and embodiments. In this method, the white light scanning described in the first embodiment is used. The measurement performed by the interferometric system 500 includes the following steps S101-S106.
步骤S101、采集一系列待测物体产生的白光干涉图和激光干涉图,使用激光干涉图计算出压电陶瓷微位移平台50的步进,标定白光扫描干涉的扫描步进:Step S101, collect a series of white light interferograms and laser interferograms generated by the object to be measured, use the laser interferogram to calculate the step of the piezoelectric ceramic micro-displacement platform 50, and calibrate the scanning step of the white light scanning interference:
具体测量时,采用电脑驱动第一单色黑白图像传感器108和第二单色黑白图像传感器208同时采集一系列包含待测物体30信息的白光干涉图和激光干涉图。During specific measurement, a computer is used to drive the first monochrome black-and-white image sensor 108 and the second monochrome black-and-white image sensor 208 to simultaneously collect a series of white light interferograms and laser interferograms containing information about the object 30 to be measured.
使用相移量提取算法(参见文献《Two step demodulation algorithm based onthe orthogonality of diamond diagonal vectors》Applied Physics B 119:387–391(2015)),对激光干涉图进行计算,得到待测物体30压电陶瓷微位移平台50每移动一次产生的干涉条纹相移量,从而标定白光扫描干涉的扫描步进。Use the phase shift extraction algorithm (refer to the literature "Two step demodulation algorithm based on the orthogonality of diamond diagonal vectors" Applied Physics B 119:387–391 (2015)), calculate the laser interferogram, and obtain the measured object 30 piezoelectric ceramics The amount of phase shift of the interference fringes generated by each movement of the micro-displacement platform 50 is used to calibrate the scanning step of the white light scanning interference.
步骤S102、选取白光干涉图上的一点,对该点光强信号进行傅里叶变换处理:Step S102, select a point on the white light interferogram, and perform Fourier transform processing on the light intensity signal of the point:
例如,选取像素点(x0,y0)的光强信号I(x0,y0,z)可以表示为:For example, the light intensity signal I(x 0 ,y 0 ,z) of the selected pixel point (x 0 ,y 0 ) can be expressed as:
其中,(x0,y0)表示单个像素点在干涉图中的坐标,z是微位移器沿着光轴的扫描位置,h(x0,y0)代表测量物体的表面高度分布,a(x0,y0)为背景强度,b(x0,y0)为调制幅度,g[z-h(x0,y0)]为干涉信号的包络函数。λ0为光源的中心波长,η为实验中的随机噪声。在这里忽略附加相位延迟的影响。Among them, (x 0 , y 0 ) represents the coordinates of a single pixel point in the interferogram, z is the scanning position of the micro-displacer along the optical axis, h(x 0 , y 0 ) represents the surface height distribution of the measured object, a (x 0 ,y 0 ) is the background intensity, b(x 0 ,y 0 ) is the modulation amplitude, and g[zh(x 0 ,y 0 )] is the envelope function of the interference signal. λ 0 is the center wavelength of the light source, and η is the random noise in the experiment. The effect of additional phase delay is ignored here.
对公式(1)所表示的光强信号进行傅里叶变换得到:Perform Fourier transform on the light intensity signal represented by formula (1):
式中,G(x0,y0,fz)为g(z)的傅里叶变换频谱。In the formula, G(x 0 , y 0 , f z ) is the Fourier transform spectrum of g(z).
步骤S103、设置滤波窗口对步骤S102中的傅里叶频谱进行频谱滤波。Step S103, setting a filtering window to perform spectral filtering on the Fourier spectrum in step S102.
具体为,设置由两个中心带通矩形滤波窗口组合而成的滤波窗口H(fz),滤除(2)式中背景项频谱,消除部分噪声,这个过程可以表示为:Specifically, the filter window H(f z ) composed of two central bandpass rectangular filter windows is set to filter out the spectrum of the background term in formula (2) and eliminate part of the noise. This process can be expressed as:
步骤S104、提取所有像素点的光强信号进行变换滤波处理。Step S104 , extracting the light intensity signals of all pixels and performing transform filtering processing.
在本实施例中,所有像素点(x,y)的光强信号均可以表示为:In this embodiment, the light intensity signals of all pixel points (x, y) can be expressed as:
对公式(4)所表示的光强信号进行傅里叶变换得到:Perform Fourier transform on the light intensity signal represented by formula (4):
经滤波窗口H(fz)后的结果为:The result after filtering window H(f z ) is:
步骤S105、依次计算所有像素点的光强信号与选定像素点光强信号的零光程差位置相对位移:Step S105, sequentially calculate the relative displacement of the light intensity signal of all pixels and the zero optical path difference position of the light intensity signal of the selected pixel:
对(3)式和(6)式进行如下操作:Perform the following operations on formula (3) and formula (6):
其中*表示复共轭。对C(fz)进行傅里叶逆变换,得到:where * denotes complex conjugation. Perform inverse Fourier transform on C(f z ), get:
由广义相关时延估计的原理可知,当取得最大值时,此时的即为(x,y)像素点与(x0,y0)像素点的零光程差位置相对位移Δh。而(8)式取得最大值可以求出零光程差位置相对位移Δh的原因如下:According to the principle of generalized correlation delay estimation, when When the maximum value is obtained, the That is, the relative displacement Δh between the zero optical path difference position between the (x, y) pixel point and the (x 0 , y 0 ) pixel point. The reason why the relative displacement Δh of the position of zero optical path difference can be obtained by obtaining the maximum value in formula (8) is as follows:
式中,表示卷积。由式(8)我们可以把表示为:In the formula, Indicates convolution. From equation (8), we can put Expressed as:
设Δh=h(x,y)-h(x0,y0)为(x,y)像素点与(x0,y0)像素点的零光程差位置相对位移,那么(10)式可以表示为:Let Δh=h(x,y)-h(x 0 ,y 0 ) be the relative displacement of the zero optical path difference between the (x,y) pixel and the (x 0 ,y 0 ) pixel, then the formula (10) It can be expressed as:
从(11)式可以得出,当时,取得最大值。From (11), it can be concluded that when hour, Get the maximum value.
步骤S106、计算待测物体表面高度:Step S106, calculating the surface height of the object to be measured:
依次计算所有像素点与选取像素点的零光程差位置的相对位移,即相当于计算出了待测物体的表面高度。The relative displacement between all the pixels and the zero optical path difference position of the selected pixel is calculated sequentially, which is equivalent to calculating the surface height of the object to be measured.
至此,通过本发明提出的方法和系统500,可以从采集到的一系列白光干涉图中,恢复出待测物体的三维形貌。So far, through the method and system 500 proposed by the present invention, the three-dimensional shape of the object to be measured can be recovered from a series of collected white light interferograms.
综上所述,所述方法及系统500在求取信号时延的过程中,将白光光源101看作一个信号源,对应不同像素点干涉强度信号可以看作空间中不同接收器接收到的同源带噪信号,通过计算像素点之间干涉强度信号时延的过程来替代每个像素点干涉强度信号单独进行变换处理求取零光程差位置的过程,从而无需标定白光光源101的中心波长,且计算精度不受干涉信号的包络形状影响,抗噪性能强,可以广泛应用于白光扫描干涉测量的信号处理中。To sum up, the method and system 500 regard the white light source 101 as a signal source in the process of calculating the signal delay, and the interference intensity signals corresponding to different pixel points can be regarded as the same signal received by different receivers in space. Source noisy signal, through the process of calculating the time delay of the interference intensity signal between pixels to replace the process of separately transforming the interference intensity signal of each pixel to obtain the zero optical path difference position, so that there is no need to calibrate the central wavelength of the white light source 101 , and the calculation accuracy is not affected by the envelope shape of the interference signal, and has strong anti-noise performance, and can be widely used in signal processing of white light scanning interferometry.
与现有技术相比,本发明具有如下优点:Compared with prior art, the present invention has following advantage:
(1)相对于单波长测量方法而言,本发明提供的方法可以实现对梯度变化较大物体的测量,大大增加了测量范围,拓展了干涉测量的应用领域。(1) Compared with the single-wavelength measurement method, the method provided by the present invention can realize the measurement of objects with large gradient changes, greatly increases the measurement range, and expands the application field of interferometry.
(2)相对于其他白光扫描干涉零光程差定位算法需要对单个像素点的光强信号进行变换处理,本发明提出的方法将零光程差位置提取过程转换为通过广义相关时延估计方法来求取不同像素间的干涉信号相对位移问题。另外,本发明提出的方法操作简单,计算精度高,抗噪声性能强,无需标定光源的中心波长,并且对白光干涉信号的包络形状无要求。(2) Compared with other white light scanning interference zero optical path difference positioning algorithms, the light intensity signal of a single pixel needs to be transformed and processed. The method proposed in the present invention converts the zero optical path difference position extraction process into a generalized correlation time delay estimation method To calculate the relative displacement of the interference signal between different pixels. In addition, the method proposed by the invention has simple operation, high calculation accuracy, strong anti-noise performance, no need to calibrate the central wavelength of the light source, and no requirement for the envelope shape of the white light interference signal.
(3)本发明方法使用的系统500简单,通过单波长激光相移的方式对压电陶瓷微位移平台的扫描步进进行标定,这种方式比通过电学反馈进行步进标定的方法更加精确。(3) The system 500 used in the method of the present invention is simple, and the scanning step of the piezoelectric ceramic micro-displacement platform is calibrated by means of a single-wavelength laser phase shift, which is more accurate than the method of step calibration through electrical feedback.
以上所述是本发明的优选实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也视为本发明的保护范围。The above description is a preferred embodiment of the present invention, and it should be pointed out that for those skilled in the art, without departing from the principle of the present invention, some improvements and modifications can also be made, and these improvements and modifications are also considered Be the protection scope of the present invention.
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