CN105714251A - Coating method for novel nanometer anti-fingerprint film - Google Patents
Coating method for novel nanometer anti-fingerprint film Download PDFInfo
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- CN105714251A CN105714251A CN201610105969.4A CN201610105969A CN105714251A CN 105714251 A CN105714251 A CN 105714251A CN 201610105969 A CN201610105969 A CN 201610105969A CN 105714251 A CN105714251 A CN 105714251A
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- evaporation source
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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Abstract
The invention discloses a coating method for a novel nanometer anti-fingerprint film. According to the coating method for the novel nanometer anti-fingerprint film, nanometer anti-fingerprint film coating is conducted on a to-be-coated workpiece in a furnace cavity through a tandem type evaporation source, and under the situation that a small number of AFP pills are used, the even nanometer anti-fingerprint film can be obtained for the to-be-coated workpiece in the furnace cavity; in the coating process, the ion beam auxiliary deposition technology is adopted, the coating time of the nanometer anti-fingerprint film is greatly shortened, and the whole coating technology can be finished within 30 min; and baking and curing through additional ovens are not needed, and the technology procedure is greatly simplified as well.
Description
Technical field
The present invention relates to the film plating process of a kind of novel nano anti-fingerprint thin film.
Background technology
At present, in traditional handicraft, (film plating process of (AFP), is all after product plated film completes to nanometer anti-fingerprint thin film, takes out product from the furnace chamber of filming equipment, changes clamping smelting tool, then the product after plated film is carried out anti-fingerprint process.The plated film of traditional nanometer anti-fingerprint thin film, is realize by the mode of spraying, dip-coating or evaporation, after coating is complete, it is required for toasting for a long time, generally to toast 4-24 hour, nanometer anti-fingerprint thin film just can be made to stablize, solidify, play the effect of anti-fingerprint.
Summary of the invention
It is an object of the invention to overcome the defect of prior art, the film plating process of a kind of novel nano anti-fingerprint thin film is provided, coating process adopts ion beam assisted depositing technique, shorten the plated film time of nanometer anti-fingerprint thin film greatly, baking-curing need not be carried out by extra baking oven, also greatly simplify technological process.
The technical scheme realizing above-mentioned purpose is: the film plating process of a kind of novel nano anti-fingerprint thin film, comprises the following steps:
S1, exits to filming equipment, opens the door of filming equipment；
S2, installs nanometer anti-fingerprint thin film pill；
S3, puts into the furnace chamber of filming equipment by workpiece to be coated；
S4, closes the door of filming equipment, evacuation, makes the furnace chamber of filming equipment be in vacuum state；
S5, the workpiece to be coated in furnace chamber is carried out ion beam assisted depositing by filming equipment, and the workpiece to be coated in furnace chamber is carried out a nanometer anti-fingerprint coating thin film by filming equipment simultaneously；
S6, exits to filming equipment, has taken out a nanometer workpiece for anti-fingerprint coating thin film in furnace chamber；
S7, sends to measurement drip completing a nanometer workpiece for anti-fingerprint coating thin film angle.
The film plating process of above-mentioned a kind of novel nano anti-fingerprint thin film, wherein, in step S5, described filming equipment adopts tandem vapor deposition source that the workpiece to be coated in furnace chamber is carried out a nanometer anti-fingerprint coating thin film.
The film plating process of above-mentioned a kind of novel nano anti-fingerprint thin film, wherein, described tandem vapor deposition source includes mounting flange, evaporation source water-cooled enters electricity mouth, evaporation source water-cooled goes out electricity mouth and some evaporation sources, wherein:
Described some evaporation sources are successively set on the rear surface of described mounting flange from top to bottom, and described some evaporation sources are sequentially connected in series；The outside of each described evaporation source is provided with evaporation source baffle plate；Described evaporation source water-cooled enters electricity mouth and evaporation source water-cooled goes out electricity mouth and is arranged on the front surface of described mounting flange one on the other, described evaporation source water-cooled is entered electricity mouth and is electrically connected with the evaporation source of the top of the rear surface being positioned at described mounting flange, and described evaporation source water-cooled goes out electricity mouth and electrically connects with the evaporation source of the bottom of the rear surface being positioned at described mounting flange；
Each described evaporation source all includes gripper shoe, insulating supporting seat, two electrodes, heating plate, crucible, crucible baffle plate and four pillars, and described gripper shoe is vertically arranged；Described insulating supporting seat is arranged on the bottom of the front surface of described gripper shoe；Said two electrode is separately positioned on described insulating supporting seat, and said two electrode is positioned at the left and right sides of described gripper shoe correspondingly；Described heating plate is connected across between said two electrode, and is positioned at the front of described insulating supporting seat；Described crucible is arranged on the middle part of described heating plate；Described crucible baffle plate is arranged on the upper end of described crucible；Described four pillars are arranged on four angles of the rear surface of described gripper shoe correspondingly.
The film plating process of above-mentioned a kind of novel nano anti-fingerprint thin film, wherein, described evaporation source baffle plate is the body structure of open rearward end, and each described evaporation source is arranged in corresponding described evaporation source baffle plate.
The film plating process of the novel nano anti-fingerprint thin film of the present invention, adopt tandem vapor deposition source that the workpiece to be coated in furnace chamber is carried out a nanometer anti-fingerprint coating thin film, when using a small amount of AFP pill, the workpiece to be coated in furnace chamber can be made to obtain uniform nanometer of anti-fingerprint thin film, and in coating process, adopt ion beam assisted depositing technique, shorten the plated film time of nanometer anti-fingerprint thin film greatly, whole coating process can complete in 30min, and baking-curing need not be carried out by extra baking oven, also greatly simplify technological process.
Accompanying drawing explanation
Fig. 1 is the structural representation (master looks) of tandem vapor deposition source；
Fig. 2 is the structural representation (backsight) of tandem vapor deposition source；
Fig. 3 is the structural representation of the evaporation source of tandem vapor deposition source.
Detailed description of the invention
In order to make those skilled in the art be better understood when technical scheme, below in conjunction with accompanying drawing, its detailed description of the invention is described in detail:
Highly preferred embodiment of the present invention, the film plating process of a kind of novel nano anti-fingerprint thin film, comprise the following steps:
S1, exits to filming equipment, opens the door of filming equipment；
S2, installs nanometer anti-fingerprint thin film pill (AFP pill)；
S3, puts into the furnace chamber of filming equipment by workpiece to be coated；
S4, closes the door of filming equipment, evacuation, makes the furnace chamber of filming equipment be in vacuum state；
S5, the workpiece to be coated in furnace chamber is carried out ion beam assisted depositing by filming equipment, and the workpiece to be coated in furnace chamber is carried out a nanometer anti-fingerprint coating thin film by filming equipment simultaneously；
S6, exits to filming equipment, has taken out a nanometer workpiece for anti-fingerprint coating thin film in furnace chamber；
S7, sends to measurement drip completing a nanometer workpiece for anti-fingerprint coating thin film angle.
In step S5, filming equipment adopts tandem vapor deposition source that the workpiece to be coated in furnace chamber is carried out a nanometer anti-fingerprint coating thin film.
Referring to Fig. 1 and Fig. 2, tandem vapor deposition source 3 includes mounting flange 31, evaporation source water-cooled enters electricity mouth 32, evaporation source water-cooled goes out electricity mouth 33 and some evaporation sources 34；Some evaporation sources 34 are successively set on the rear surface of mounting flange 31 from top to bottom, and some evaporation sources 34 are sequentially connected in series；The outside of each evaporation source 34 is provided with evaporation source baffle plate 35, and the evaporation source baffle plate 35 body structure in open rearward end, each evaporation source 34 is arranged in corresponding evaporation source baffle plate 35；Evaporation source water-cooled enters electricity mouth 32 and evaporation source water-cooled goes out electricity mouth 33 and is arranged on the front surface of mounting flange 31 one on the other, evaporation source water-cooled is entered electricity mouth 32 and is electrically connected with the evaporation source 34 of the top of the rear surface being positioned at mounting flange 31, and evaporation source water-cooled goes out electricity mouth 33 and electrically connects with the evaporation source 34 of the bottom of the rear surface being positioned at mounting flange 31.
Referring to Fig. 3 again, each institute evaporation source 34 all includes gripper shoe 341,342, two electrodes 343 of insulating supporting seat, heating plate 344, crucible 345, crucible baffle plate 346 and four pillars 347, and gripper shoe 341 is vertically arranged；Insulating supporting seat 342 is arranged on the bottom of the front surface of gripper shoe 341；Two electrodes 343 are separately positioned on insulating supporting seat 342, and two electrodes 343 are positioned at the left and right sides of gripper shoe 341 correspondingly；Heating plate 344 is connected across between two electrodes 343, and is positioned at the front of insulating supporting seat 342；Crucible 345 is arranged on the middle part of heating plate 344；Crucible baffle plate 346 is arranged on the upper end of crucible 345；Four pillars 347 are arranged on four angles of the rear surface of gripper shoe 341 correspondingly.
In sum, the film plating process of the novel nano anti-fingerprint thin film of the present invention, adopt tandem vapor deposition source that the workpiece to be coated in furnace chamber is carried out a nanometer anti-fingerprint coating thin film, when using a small amount of AFP pill, the workpiece to be coated in furnace chamber can be made to obtain uniform nanometer of anti-fingerprint thin film, it addition, evaporation AFP effect is more stable than anti-fingerprint thin film such as spraying, dip-coatings, quick solidifying, standing time, anti-fingerprint effect of a specified duration became apparent from.And in coating process, adopt ion beam assisted depositing technique, and shortening the plated film time of nanometer anti-fingerprint thin film greatly, whole coating process can complete in 30min, and need not carry out baking-curing by extra baking oven, also greatly simplify technological process.
Those of ordinary skill in the art will be appreciated that, above embodiments is intended merely to the explanation present invention, and it is not used as limitation of the invention, as long as in the spirit of the present invention, to the change of embodiment described above, modification all by the Claims scope dropping on the present invention.
Claims (4)
1. the film plating process of a novel nano anti-fingerprint thin film, it is characterised in that comprise the following steps:
S1, exits to filming equipment, opens the door of filming equipment；
S2, installs nanometer anti-fingerprint thin film pill；
S3, puts into the furnace chamber of filming equipment by workpiece to be coated；
S4, closes the door of filming equipment, evacuation, makes the furnace chamber of filming equipment be in vacuum state；
S5, the workpiece to be coated in furnace chamber is carried out ion beam assisted depositing by filming equipment, and the workpiece to be coated in furnace chamber is carried out a nanometer anti-fingerprint coating thin film by filming equipment simultaneously；
S6, exits to filming equipment, has taken out a nanometer workpiece for anti-fingerprint coating thin film in furnace chamber；
S7, sends to measurement drip completing a nanometer workpiece for anti-fingerprint coating thin film angle.
2. the film plating process of a kind of novel nano anti-fingerprint thin film according to claim 1, it is characterised in that in step S5, described filming equipment adopts tandem vapor deposition source that the workpiece to be coated in furnace chamber is carried out a nanometer anti-fingerprint coating thin film.
3. the film plating process of a kind of novel nano anti-fingerprint thin film according to claim 2, it is characterised in that described tandem vapor deposition source includes mounting flange, evaporation source water-cooled enters electricity mouth, evaporation source water-cooled goes out electricity mouth and some evaporation sources, wherein:
Described some evaporation sources are successively set on the rear surface of described mounting flange from top to bottom, and described some evaporation sources are sequentially connected in series；The outside of each described evaporation source is provided with evaporation source baffle plate；Described evaporation source water-cooled enters electricity mouth and evaporation source water-cooled goes out electricity mouth and is arranged on the front surface of described mounting flange one on the other, described evaporation source water-cooled is entered electricity mouth and is electrically connected with the evaporation source of the top of the rear surface being positioned at described mounting flange, and described evaporation source water-cooled goes out electricity mouth and electrically connects with the evaporation source of the bottom of the rear surface being positioned at described mounting flange；
Each described evaporation source all includes gripper shoe, insulating supporting seat, two electrodes, heating plate, crucible, crucible baffle plate and four pillars, and described gripper shoe is vertically arranged；Described insulating supporting seat is arranged on the bottom of the front surface of described gripper shoe；Said two electrode is separately positioned on described insulating supporting seat, and said two electrode is positioned at the left and right sides of described gripper shoe correspondingly；Described heating plate is connected across between said two electrode, and is positioned at the front of described insulating supporting seat；Described crucible is arranged on the middle part of described heating plate；Described crucible baffle plate is arranged on the upper end of described crucible；Described four pillars are arranged on four angles of the rear surface of described gripper shoe correspondingly.
4. the film plating process of a kind of novel nano anti-fingerprint thin film according to claim 3, it is characterised in that described evaporation source baffle plate is the body structure of open rearward end, and each described evaporation source is arranged in corresponding described evaporation source baffle plate.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201610105969.4A CN105714251B (en) | 2016-02-26 | 2016-02-26 | A kind of film plating process of novel nano anti-fingerprint film |
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| CN201610105969.4A CN105714251B (en) | 2016-02-26 | 2016-02-26 | A kind of film plating process of novel nano anti-fingerprint film |
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| CN105714251A true CN105714251A (en) | 2016-06-29 |
| CN105714251B CN105714251B (en) | 2019-03-08 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109890157A (en) * | 2019-03-29 | 2019-06-14 | 联想(北京)有限公司 | A kind of shell and production method |
| CN110129728A (en) * | 2019-06-14 | 2019-08-16 | 东莞市广正模具塑胶有限公司 | A kind of modified AF coating material and its preparation method and application |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201317807Y (en) * | 2008-11-18 | 2009-09-30 | 昆明理工大学 | Multifunctional continuous vacuum coater |
| CN103252937A (en) * | 2013-05-31 | 2013-08-21 | 浙江星星瑞金科技股份有限公司 | High-abrasive-resistance anti-fingerprint membrane layer of display screen as well as method for preparing membrane layer |
| CN104120400A (en) * | 2013-04-26 | 2014-10-29 | 集捷明株式会社 | Mass production evaporation device and method thereof |
-
2016
- 2016-02-26 CN CN201610105969.4A patent/CN105714251B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201317807Y (en) * | 2008-11-18 | 2009-09-30 | 昆明理工大学 | Multifunctional continuous vacuum coater |
| CN104120400A (en) * | 2013-04-26 | 2014-10-29 | 集捷明株式会社 | Mass production evaporation device and method thereof |
| CN103252937A (en) * | 2013-05-31 | 2013-08-21 | 浙江星星瑞金科技股份有限公司 | High-abrasive-resistance anti-fingerprint membrane layer of display screen as well as method for preparing membrane layer |
Non-Patent Citations (2)
| Title |
|---|
| 宣天鹏: "《表面工程技术的设计与选择》", 31 May 2011, 北京：机械工业出版社 * |
| 苑希昌，张荣珍: "《新工艺新技术选编》", 28 February 1994, 北京：兵器工业出版社 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109890157A (en) * | 2019-03-29 | 2019-06-14 | 联想(北京)有限公司 | A kind of shell and production method |
| CN109890157B (en) * | 2019-03-29 | 2021-10-22 | 联想(北京)有限公司 | Shell and manufacturing method |
| CN110129728A (en) * | 2019-06-14 | 2019-08-16 | 东莞市广正模具塑胶有限公司 | A kind of modified AF coating material and its preparation method and application |
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| CN105714251B (en) | 2019-03-08 |
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